KR20120051916A - Surface treatment to verticality type substrate transfer apparatus - Google Patents

Surface treatment to verticality type substrate transfer apparatus Download PDF

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Publication number
KR20120051916A
KR20120051916A KR1020100113287A KR20100113287A KR20120051916A KR 20120051916 A KR20120051916 A KR 20120051916A KR 1020100113287 A KR1020100113287 A KR 1020100113287A KR 20100113287 A KR20100113287 A KR 20100113287A KR 20120051916 A KR20120051916 A KR 20120051916A
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South Korea
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substrate transfer
transfer apparatus
support
type substrate
frame
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KR1020100113287A
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Korean (ko)
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최현철
김영균
정인순
윤종국
문동진
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엠파워(주)
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Priority to KR1020100113287A priority Critical patent/KR20120051916A/en
Priority to PCT/KR2011/005148 priority patent/WO2012067332A1/en
Publication of KR20120051916A publication Critical patent/KR20120051916A/en

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C25D17/04—External supporting frames or structures
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C25D17/08—Supporting racks, i.e. not for suspending
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE: A surface-processed vertical type substrate transfer apparatus is provided to minimize an amount of used chemical solutions existing on the surface of the substrate transfer apparatus by polishing the surface of the vertical type substrate transfer apparatus. CONSTITUTION: A frame(110) is comprised of a pair of support frames(112) and a pair of horizontal frames(114). A plurality of space parts is formed on the horizontal frame. A chucking member(120) performs a chucking process with respect to the outer circumferential surface of a substrate which is vertically inserted from the outside. The chucking member is comprised of driving tongs, a clamp, a support block, and a support device. The support block is comprised of a fixed stand and a support stand projected from the fixed stand.

Description

표면처리된 수직형 기판 이송장치{SURFACE TREATMENT TO VERTICALITY TYPE SUBSTRATE TRANSFER APPARATUS}SURFACE TREATMENT TO VERTICALITY TYPE SUBSTRATE TRANSFER APPARATUS}

본 발명은 표면처리된 수직형 기판 이송장치에 관한 것으로서, 더욱 상세하게는 수직 방식 기판이송장치의 표면을 매끄럽게 처리하여 사용된 약액이 기판이송장치 표면에 잔존하는 것을 최소화할 수 있게 함으로써 기판처리공정에서의 수율을 증대시킬 수 있는 표면처리된 수직형 기판 이송장치에 관한 것이다.
The present invention relates to a surface-treated vertical substrate transfer device, and more particularly, to a substrate processing process by smoothly treating the surface of the vertical substrate transfer device so as to minimize the remaining chemical liquid on the surface of the substrate transfer device. It relates to a surface-treated vertical substrate transfer device that can increase the yield in the.

일반적으로 기판은 전자장비의 구동에 필요한 특정 회로패턴을 형성시킨 것으로 박판 형태의 표면에 다수의 패턴들을 증착, 식각, 세정 등의 공정 반복하여 거치면 형성하게 된다. 이러한 공정 과정에는 각각의 공정으로 이송하는 이송장치가 구비되게 되는데 통상 투입된 기판을 롤러에 의해 이송하며 공정을 실시하도록 하고 있다.In general, the substrate is formed by forming a specific circuit pattern required for driving the electronic equipment, it is formed by repeating a plurality of patterns, such as deposition, etching, cleaning process on the surface of the thin plate form. In this process, a transfer device for transferring to each process is provided. Usually, the substrate is introduced by rollers to carry out the process.

본 출원인이 출원한 특허 제10-2010-0039399호에 기재된 수직형 기판이송장치에 관한 기술에서 종래의 일반적인 수평 이동 방식의 기판이송장치를 개선하도록 하고 있는바,In the technology related to the vertical substrate transfer device described in the Patent Application No. 10-2010-0039399 filed by the applicant to improve the conventional substrate transfer device of the conventional horizontal movement method,

이러한 수직형 기판이송장치에서는 기판이 척킹된 상태에서 세정 또는 전처리 모듈을 통과하며 공정을 위한 약액을 분사하여 기판을 처리하는데 분사된 약액이 기판이송장치에 붙어 있는 상태로 다음 공정에 진입하는 경우가 있어 남아 있는 약액으로 인해 불량요인이 발생하는 문제점이 있었다.
In such a vertical substrate transfer apparatus, a chemical liquid for processing is injected through a cleaning or pretreatment module while the substrate is chucked, and the chemical liquid injected to enter the next process is attached to the substrate transfer apparatus. There was a problem that caused a bad factor due to the remaining drug solution.

본 발명은 상기와 같은 문제점을 해결하기 위해 안출된 것으로서, 본 발명의 목적은 수직 방식 기판이송장치의 표면을 매끄럽게 처리하여 사용된 약액이 기판이송장치 표면에 잔존하는 것을 최소화할 수 있게 함으로써 기판처리공정에서의 수율을 증대시킬 수 있는 표면처리된 수직형 기판 이송장치를 제공함에 있다.
The present invention has been made to solve the above problems, an object of the present invention is to smoothly process the surface of the vertical substrate transfer device substrate processing by minimizing the remaining chemical liquid on the substrate transfer device surface To provide a surface-treated vertical substrate transfer apparatus that can increase the yield in the process.

본 발명은 앞서 본 목적을 달성하기 위하여 다음과 같은 구성을 가진다.The present invention has the following structure in order to achieve the above object.

본 발명의 외부로부터 수직하게 투입된 기판 외주면을 척킹하는 다수개의 척킹부재; 및 지지 프레임 및 수평 프레임에 의해 상기 척킹부재가 구비되는 프레임;을 포함하여 이루어지는 수직형 기판이송장치에 있어서, 상기 수직형 기판이송장치의 표면에 코팅재를 도포하여 코팅한다.A plurality of chucking member for chucking the outer peripheral surface of the substrate vertically introduced from the outside of the present invention; And a frame provided with the chucking member by a support frame and a horizontal frame, wherein the vertical substrate transfer apparatus includes a coating material coated on a surface of the vertical substrate transfer apparatus.

그리고 상기 코팅재는 테프론(Teflon) 또는 레이던트(Raydent) 중 선택된 어느 하나에 의해 이루어지는 것이 바람직하다.
And the coating material is preferably made of any one selected from Teflon (Reflon) or Radont (Raydent).

본 발명에 따르면, 수직 방식 기판이송장치의 표면을 매끄럽게 처리하여 사용된 약액이 기판이송장치 표면에 잔존하는 것을 최소화할 수 있게 함으로써 기판처리공정에서의 수율을 증대시킬 수 있는 효과가 있다.
According to the present invention, by smoothly treating the surface of the vertical substrate transfer apparatus, it is possible to minimize the remaining chemicals on the surface of the substrate transfer apparatus, thereby increasing the yield in the substrate processing process.

도 1은 본 발명의 수직형 기판이송장치를 나타내는 사시도.
도 2는 도 1에 도시된 척킹부재를 나타내는 사시도.
도 3은 도 1에 도시된 A 부분을 나타내는 부분 확대도.1 is a perspective view showing a vertical substrate transfer device of the present invention.
2 is a perspective view showing the chucking member shown in FIG.
3 is a partially enlarged view showing a portion A shown in FIG. 1;

이하, 본 발명의 바람직한 실시 예들을 첨부된 도면을 참고하여 더욱 상세히 설명한다. 본 발명의 실시 예들은 여러 가지 형태로 변형될 수 있으며, 본 발명의 범위가 아래에서 설명하는 실시 예들에 한정되는 것으로 해석되어서는 안 된다. 본 실시 예들은 당해 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에게 본 발명을 더욱 상세하게 설명하기 위해서 제공되는 것이다. 따라서 도면에 나타난 각 요소의 형상은 보다 분명한 설명을 강조하기 위하여 과장될 수 있다.
Hereinafter, preferred embodiments of the present invention will be described in more detail with reference to the accompanying drawings. The embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited to the embodiments described below. The embodiments are provided to explain the present invention to a person having ordinary skill in the art to which the present invention belongs. Accordingly, the shape of each element shown in the drawings may be exaggerated to emphasize a more clear description.

도 1 및 도 2에 도시된 바에 의하면, 본 발명의 수직형 기판이송장치(10)는 프레임(110)과 척킹부재(120)로 이루어지며, 표면에 코팅재가 도포되어 약액이 수월하게 흐를 수 있도록 하고 있다.As shown in Figure 1 and 2, the vertical substrate transfer device 10 of the present invention is composed of a frame 110 and the chucking member 120, the coating material is applied to the surface so that the chemical liquid flows easily Doing.

상기 프레임(110)은 한쌍의 지지 프레임(112)과 한쌍의 수평 프레임(114)이 서로 연결되어 구성되며, 상기 수평 프레임(114)에는 하측 방향으로 개방된 다수개의 공간부(116)가 형성되어 있고, 또한 지지 프레임과 수평 프레임이 연결된 중앙 부분은 기판(S)이 삽입될 수 있게 공간을 갖고 있다. 또한 상기 프레임은 하나의 구성으로 설명하고 있으나 기판의 이송 상태에 따라 베이스 프레임(미도시) 상에 대수개를 구비시킬 수도 있으나 본 발명에서는 하나의 프레임에 의해 구성만을 설명한다.The frame 110 is composed of a pair of support frames 112 and a pair of horizontal frames 114 are connected to each other, the horizontal frame 114 is formed with a plurality of spaces 116 open in the downward direction In addition, the central portion to which the support frame and the horizontal frame are connected has a space in which the substrate S can be inserted. In addition, the frame is described in one configuration, but may be provided on the base frame (not shown) according to the transfer state of the substrate, but in the present invention, only one frame will be described.

상기 척킹부재(120)는 수평 프레임에 구비된 상태로 설명하기로 한다. 또한 척킹부재(120)는 가동 집게(121), 고정 집게(122), 탄성체(123), 지지 블록(124), 지지수단(125) 및 기준축(126)으로 이루어진다.The chucking member 120 will be described in a state provided in the horizontal frame. In addition, the chucking member 120 is composed of a movable forceps 121, a fixed forceps 122, an elastic body 123, a support block 124, a support means 125, and a reference shaft 126.

상기 가동 집게(121)는 중앙 부분에는 기준축이 고정되는 통공(121a))이 형성되며, 상기 통공(121a)을 중심으로 상부바(121a)와 하부바(121c)가 각각 엇갈리게 연장되게 형성되며, 상기 상부바(121b)에는 지지수단이 축 결합되는 홈(121d)이 형성되어 있고, 상기 상부바 일측에는 고정대(127)가 돌출 형성되어 있다. 여기서 상기 하부바 단부 일측에는 고정체(128)가 구비되며, 상기 고정체는 탄성체로서 고무재 또는 우레탄 중 어느 하나로 이루어지는 것이 바람직하나 탄성력을 갖는 것이면 어떠한 것도 가능하다.The movable tongs 121 are formed in the center portion of the through-hole (121a) is fixed to the reference axis is formed, the upper bar (121a) and the lower bar (121c) are formed alternately extending around the through-hole (121a), respectively. The upper bar 121b is provided with a groove 121d through which the supporting means is axially coupled, and a fixing bar 127 protrudes from one side of the upper bar. Here, a fixed body 128 is provided at one end of the lower bar, and the fixed body is preferably made of any one of a rubber material and urethane as an elastic body, but may have any elasticity.

상기 고정 집게(122)는 상기 가동 집게 측과 맞닿아 지지되는 지지편(122a)과 상기 지지편에서 연장되어 고정 집게를 고정시키게 하는 고정편(122b)으로 이루어지고, 상기 지지편과 고정편은 서로 단차지게 형성되어 있다.The fixing force 122 is composed of a support piece (122a) that is supported in contact with the movable forceps side and a fixing piece (122b) extending from the support piece to fix the fixing forceps, the support piece and the fixing piece It is formed stepped with each other.

상기 탄성체(123)는 일정 길이를 갖는 코일 스프링이 양단에는 고정고리(123a)가 형성되어 있다. 또한 본 발명에서는 상기 탄성체를 코일 스프링을 이용도록 하고 있으나 상기 가동 집게에 대해 탄성력을 인가할 수 있는 것이면 어떠한 것도 가능하다.The elastic body 123 has a fixed spring (123a) is formed at both ends of the coil spring having a predetermined length. In the present invention, the elastic body is to use a coil spring, but any one can be used as long as the elastic force can be applied to the movable forceps.

상기 지지 블록(124)은 판체 형태의 고정대(124a)와 상기 고정대에서 돌출된 지지대(124b)로 이루어지며 상기 지지대에는 측면을 관통하는 통공(124c)이 형성되어 있다.The support block 124 is composed of a plate-shaped holder 124a and a support 124b protruding from the holder, and the support has a through hole 124c penetrating the side surface.

상기 지지수단(125)은 후술하는 가압수단이 가압될 때 가압력을 인가받아 전달하는 것으로 가압력을 완충할 수 있는 것이면 어떠한 것도 가능하나 바람직하게 하는 롤러를 이용한다.The support means 125 may be any one as long as it can buffer the pressing force by applying the pressing force when the pressing means described later is pressurized, but preferably using a roller.

예컨대 본 발명은 도 3에 도시된 바와 같이 각각의 구성요소를 이루는 표면을 연마하여 표면 거칠기를 다듬어 매끄럽게 한 후 여기에 다시 코팅재를 도포하여 코팅함으로써 공정 중 기판을 처리하기 위한 약액이 수직형 기판이송장치에 묻었을 시 하부로 쉽게 흘러내려 장치에 고이는 현상을 방지하게 하여 고인 약액으로 인해 공정을 방해하는 것을 최소화할 수 있게 하고 있다.For example, in the present invention, as shown in FIG. 3, the surface of each component is polished to smooth the surface roughness, and then apply a coating material thereon to apply the coating material to coat the chemical liquid for treating the substrate during the process. When buried in the device, it easily flows down to prevent the accumulation of water in the device, thereby minimizing the disruption of the process due to the accumulated chemicals.

여기서 상기 코팅재는 테프론 또는 레이던트 중 어느 하나로 이루어지는 것이 바람직하다. 이는 테프론이나 레이던트는 모재의 표면에 얇은 방막으로 도포될 수 있고 접착성이 강한 약액이라 하더라도 코팅된 표면에 달라붙지 않아 장치에 약액의 잔존이 발생하지 않기 때문이다.Here, the coating material is preferably made of any one of Teflon or radant. This is because Teflon or radant can be applied as a thin film on the surface of the base material, and even a strong adhesive liquid does not stick to the coated surface, and thus no chemical liquid remains in the device.

본 발명은 상기에 기술된 실시예들에 의해 한정되지 않고, 당업자들에 의해 다양한 변형 및 변경을 가져올 수 있으며, 이는 첨부된 청구항에서 정의되는 본 발명의 취지와 범위에 포함된다.The present invention is not limited by the embodiments described above, and various changes and modifications can be made by those skilled in the art, which are included in the spirit and scope of the present invention as defined in the appended claims.

Claims (2)

외부로부터 수직하게 투입된 기판 외주면을 척킹하는 다수개의 척킹부재; 및
지지 프레임 및 수평 프레임에 의해 상기 척킹부재가 구비되는 프레임;을 포함하여 이루어지는 수직형 기판이송장치에 있어서,
상기 수직형 기판이송장치의 표면에 코팅재를 도포하여 코팅하는 것을 특징으로 하는 수직형 기판이송장치.A plurality of chucking member for chucking the outer peripheral surface of the substrate vertically introduced from the outside; And
In the vertical substrate transfer apparatus comprising a; frame provided with the chucking member by a support frame and a horizontal frame,
Vertical substrate transfer device, characterized in that for coating by coating a coating material on the surface of the vertical substrate transfer device. 제 1 항에 있어서,
상기 코팅재는 테프론(Teflon) 또는 레이던트(Raydent) 중 선택된 어느 하나에 의해 이루어지는 것을 특징으로 하는 수직형 기판이송장치.The method of claim 1,
The coating material is a vertical substrate transfer device, characterized in that made of any one selected from Teflon (Reflon) or (Raydent).
KR1020100113287A 2010-11-15 2010-11-15 Surface treatment to verticality type substrate transfer apparatus KR20120051916A (en)

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CN212677457U (en) * 2020-06-29 2021-03-09 东莞宇宙电路板设备有限公司 Positioning driving device for disc hanging rack

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