KR20120023488A - Apparatus and method for continuous casting of silicon ingot - Google Patents
Apparatus and method for continuous casting of silicon ingot Download PDFInfo
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- KR20120023488A KR20120023488A KR1020100126876A KR20100126876A KR20120023488A KR 20120023488 A KR20120023488 A KR 20120023488A KR 1020100126876 A KR1020100126876 A KR 1020100126876A KR 20100126876 A KR20100126876 A KR 20100126876A KR 20120023488 A KR20120023488 A KR 20120023488A
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B30/00—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions
- C30B30/02—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions using electric fields, e.g. electrolysis
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Crystallography & Structural Chemistry (AREA)
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- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
Abstract
It is used when continuously casting polycrystalline silicon by an electron casting method, has a conductive crucible and surrounds the bottomless cooling crucible 7 and the cooling crucible 7 which are continuously cast by dissolving a silicon raw material. In the continuous casting apparatus of the silicon ingot provided with the induction coil 8 which heats the silicon raw material charged in (7) by electromagnetic induction, and the chamber 1 which accommodates each said member, Inside the chamber 1 By arranging the wool material 17 on at least part of the wall surface and / or the surface of the member accommodated in the chamber 1, contamination by metal impurities in the wafer cut out from the ingot and the ingot being cast can be reduced. have. In the present invention, the wool material 17 is preferably made of alumina fibers, silica fibers or alumina silica fibers, and preferably has a density of 1 to 100 kg / m 3 and a thickness of 3 to 50 mm.
Description
The present invention relates to a continuous casting apparatus and a continuous casting method of a silicon ingot which is a raw material of a solar cell substrate. More specifically, the present invention relates to a continuous casting apparatus and a continuous casting method of a silicon ingot capable of reducing contamination by metal impurities in an ingot to be cast and a wafer cut out from the ingot.
In recent years, the problem of global warming due to CO 2 emission and the depletion of energy resources have become serious, and as one of countermeasures against such problems, solar power generation utilizing solar energy that is exposed to inexhaustible attention has been attracting attention. Photovoltaic power generation is a power generation system that converts solar energy directly into electric power using a solar cell, and a polycrystalline silicon wafer is mainly used as a substrate of the solar cell.
Polycrystalline silicon wafers for solar cells are manufactured by slicing this ingot using a unidirectional solidified silicon ingot as a material. For this reason, in order to spread the solar cell, it is necessary to secure the quality of the silicon wafer and to reduce the cost, and to manufacture the high quality silicon ingot at a low cost in the previous step. As a method which can respond to this request, for example, as disclosed in
3 is a schematic view showing the configuration of a continuous casting apparatus (hereinafter, also simply referred to as "EMC furnace") used in the conventional EMC method. As shown in the figure, an EMC furnace includes a
In the
The
Moreover, in the
In the bottom wall of the
Immediately above the
In the EMC method using such an EMC furnace, the silicon
The
According to this EMC method, contact between the
In the continuous casting method of a silicon ingot by the EMC method using a conventional EMC furnace, when the wafer cut out from the cast silicon ingot is investigated by contamination of metal impurities by life time evaluation or total dissolution analysis, Fe Or metal impurities such as Ni, Cu, Cr are detected. Since contamination by metal impurities deteriorates photoelectric conversion efficiency when the wafer is used in a solar cell, it is desired to reduce contamination by metal impurities as much as possible in wafers cut out from the ingot and the ingot to be cast.
This invention is made | formed in view of such a situation, and it aims at providing the continuous casting apparatus and continuous casting method of the silicon ingot which can reduce the contamination by metal impurities in the ingot to be cast and the wafer cut out from an ingot. Doing.
MEANS TO SOLVE THE PROBLEM As a result of performing various tests and earnestly examining, the particle which generate | occur | produces when continuous casting of a silicon ingot by EMC method using an EMC furnace cuts the wafer cut out from the ingot and ingot cast as metal impurities. It was a contaminating factor.
4 (a) and 4 (b) are schematic diagrams showing a state in which particles generated when continuously casting a silicon ingot using a conventional continuous casting apparatus are suspended in a chamber, and FIG. 4 (a) shows generated particles. Is a state which floats in a chamber, and FIG.4 (b) shows the state which a particle mixes in a cooling crucible, respectively.
In continuous casting by the EMC method, when a silicon raw material charged into a cooling crucible is heated and dissolved by an induction coil and a plasma torch, a part of the silicon raw material is evaporated to become a vapor. As shown in FIG.4 (a), this vapor cools in the atmosphere in a chamber, becomes a particle | grain, and floats in the chamber. Particles floating in the chamber may come into contact with the inner wall surface of the chamber or the surface of a member such as a cooling crucible or an after heater housed in the chamber. Most of the floating particles fall and are deposited in the chamber, but some of the floating particles are incorporated into the cooling crucible as shown in Fig. 4B.
Here, since the inner wall of the chamber and the member housed in the chamber are made of stainless steel, copper, alumina, or carbon material, the particles suspended in the chamber come into contact with the inner wall surface of the chamber or the surface of the member housed in the chamber. Is contaminated with metal impurities such as Fe, Ni, Cu, and Cr. The present inventors have found that a wafer cut out from a cast ingot is a metal impurity as a result of particles floating in the chamber and contaminated with metal impurities in a cooling crucible and contaminating with a silicon raw material to contaminate the ingot to be cast with metal impurities. I thought it was contaminated.
MEANS TO SOLVE THE PROBLEM As a result of carrying out various tests and earnestly examining, the present inventors arrange | positioned the wool material on the inner wall surface of a chamber or the surface of the member accommodated in a chamber in the continuous casting apparatus used for EMC method. It has been recognized that the amount of particles floating in the chamber can be incorporated into the cooling crucible, thereby reducing the contamination of the cast ingot and the wafer cut out from the ingot with metallic impurities.
This invention is completed based on said recognition, and makes the summary the continuous casting apparatus of the silicon ingot of following (1)-(3), and the continuous casting method of the silicon ingot of following (4).
(1) Silicon which is used for continuous casting of polycrystalline silicon by an electron casting method, has a conductivity, and has a bottomless cooling crucible for dissolving and continuously casting a silicon raw material, and surrounding the cooling crucible and charged into the cooling crucible. In a continuous casting apparatus of a silicon ingot having an induction coil for heating a raw material by electromagnetic induction and a chamber for accommodating each member, at least part of an inner wall surface of the chamber and / or a surface of a member accommodated in the chamber. Continuous casting apparatus of a silicon ingot, characterized in that the wool material is arranged in the.
(2) The continuous casting apparatus of the silicon ingot according to the above (1), wherein the wool material is made of alumina fiber, silica fiber or alumina silica fiber.
(3) The continuous casting apparatus of the silicon ingot according to (1) or (2), wherein the wool member has a density of 1 to 100 kg /
(4) A continuous casting method of a silicon ingot, wherein the polycrystalline silicon is continuously cast by an electron casting method using the continuous casting apparatus of the silicon ingot according to any one of the above (1) to (3).
In the continuous casting apparatus and continuous casting method of the silicon ingot of the present invention, the particles contaminated with metallic impurities can be prevented from being mixed into the ingot to be cast by capturing particles floating in the chamber with a wool material. For this reason, the contamination by metal impurities can be reduced in the ingot to be cast and the wafer cut out from the ingot.
BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic diagram explaining the continuous casting apparatus of the silicon ingot of this invention.
FIG. 2 is a view for explaining an example of a state in which a wool material captures particles suspended in a chamber in a continuous casting apparatus of a silicon ingot of the present invention.
It is a schematic diagram which shows the structure of the continuous casting apparatus used for the conventional EMC method.
4 (a) and 4 (b) are schematic diagrams showing a state in which particles generated when continuously casting a silicon ingot using a conventional continuous casting apparatus are suspended in a chamber. It is a state which floats in a chamber, and FIG.4 (b) shows the state which a particle mixes in a cooling crucible, respectively.
5 is a schematic diagram illustrating a position at which a silicon ingot is divided.
Fig. 6 is a diagram showing the life time values of wafers obtained by Examples and Comparative Examples of the present invention.
It is a figure which shows the Fe and Ni density | concentration in the wafer obtained by the example of this invention and a comparative example.
(Form to carry out invention)
EMBODIMENT OF THE INVENTION Below, the continuous casting apparatus and continuous casting method of the silicon ingot of this invention are demonstrated based on drawing.
1: is a schematic diagram explaining the continuous casting apparatus of the silicon ingot of this invention. The electroforming apparatus of this invention shown in the same figure is based on the structure of the continuous casting apparatus shown in said FIG. 3, The same code | symbol is attached | subjected to the same structure as that, and the overlapping description is abbreviate | omitted suitably. The continuous casting device shown in the same figure adds the
The continuous casting apparatus of the silicon ingot of the present invention is used when continuously casting polycrystalline silicon by an electron casting method, has a conductivity, and has a
By arranging the
FIG. 2 is a view for explaining an example of a state in which a wool material captures particles floating in a chamber in a continuous casting apparatus of a silicon ingot of the present invention. In the same figure, the side wall surface in the inner wall surface of the
Particularly, particles having a particle diameter of 1 µm or less require time from being suspended to falling and deposited, since they are difficult to fall. In addition, particles having a particle diameter of 1 μm or less are likely to float again by the flow of the atmosphere in the chamber even when they are dropped and deposited. The wool material can capture particles having a particle diameter of 1 μm or less, and the particles having a particle size of 1 μm or less are difficult to float again because the fibers of the
In this way, by the wool material disposed on the inner wall surface of the chamber and / or the surface of the member accommodated in the chamber, the particles floating in the chamber can be captured, thereby reducing the amount of particles floating in the chamber. For this reason, the continuous casting apparatus of the silicon ingot of the present invention can reduce the amount of particles suspended in the chamber and contaminated with metal impurities in the cooling crucible, so that the wafer cut out from the ingot and the ingot being cast can be replaced with metal impurities. Contamination can be reduced.
The wool material is preferably disposed in more areas of the inner wall surface of the chamber, so long as it does not interfere with continuous casting. Since particles floating in the chamber are swept to all positions in the chamber by the atmospheric flow, the amount of particles trapped by the wool increases as the area where the wool is disposed on the inner wall surface of the chamber increases. For this reason, by arrange | positioning a wool material in more area | regions, it is possible to further reduce the quantity of the particle | grains which float in a chamber, and to reduce the contamination by metal impurities in the ingot to be cast and the wafer cut out from an ingot further.
In addition, it is preferable that the wool member is disposed in more regions of the surface of the member accommodated in the chamber, so long as it does not interfere with continuous casting. Since the particles floating in the chamber also come into contact with the member contained in the chamber, the amount of particles trapped by the wool increases as the wool is disposed in more regions of the surface of the member contained in the chamber. This is because the amount of particles suspended in the chamber can be further reduced, and contamination of metal impurities with the ingot to be cast and the wafer cut out from the ingot can be further reduced.
Specifically, as shown in FIG. 1, a wool member can be disposed on the inner wall surface and the side wall surface of the
As a method of arranging a wool material on the inner wall surface of a chamber or the surface of the member accommodated in a chamber, various methods conventionally used can be employ | adopted, For example, it is a sheet shape using a heat-resistant binding band. It is possible to tie the wool material, or to hang the sheet-shaped wool material on the hook formed on the inner wall surface of the chamber.
It is preferable that the wool member does not contain metal impurities that cause contamination at the point of being accommodated in the chamber, and has heat resistance at the point of becoming high temperature during continuous casting. In addition, since the wool material captures and holds particles contaminated with metallic impurities, it is necessary to replace the ingot every time the continuous casting is carried out or periodically, and it is preferable that the wool material is low in cost. For this reason, it is preferable that the continuous casting apparatus of the silicon ingot of this invention uses what consists of alumina fiber, a silica fiber, or an alumina silica fiber as a wool material. By using the wool material which consists of alumina fiber, a silica fiber, or an alumina silica fiber, the concern about the contamination, heat resistance, and cost by the above-mentioned metal impurity can be eliminated.
It is preferable to use a wool material having a density of 1 to 100 kg /
On the other hand, if the density of the wool material is less than 1 kg /
If the thickness of the wool material exceeds 50 mm, handling becomes difficult, and workability falls when arrange | positioning or replacing a wool material on the inner wall surface of a chamber or the surface of the member accommodated in a chamber. On the other hand, when the thickness of the wool material is less than 3 mm, the amount of particles that can be captured by the wool material decreases, and there is a concern that contamination by metal impurities in the ingot and the wafer cut out from the ingot cannot be reduced. As for the thickness of a wool material, 5-20 mm is more preferable.
The amount of particles captured by the wool member disposed on the inner wall surface of the chamber or the surface of the member accommodated in the chamber varies depending on the position in the chamber. For example, in the continuous casting device shown in FIG. 1, the inner wall surface of the chamber located above the cooling
This is because most of the particles are generated in the upper part of the cooling crucible and float in the chamber above the cooling crucible, and part of it is swept into the atmosphere flow to float in the chamber below the cooling crucible. For this reason, the amount of particles floating in the chamber above the cooling crucible becomes larger than the amount of particles floating in the chamber below the cooling crucible.
Therefore, it is preferable that the continuous casting apparatus of the silicon ingot of this invention adjusts the density and thickness of a wool material for every position according to the quantity of the particle | grains captured by the position arrange | positioned. For example, in the continuous casting device shown in FIG. 1, the thickness of the wool material disposed on the inner wall surface of the chamber located above the cooling
The continuous casting method of the silicon ingot of the present invention is characterized by continuously casting polycrystalline silicon by the electronic casting method using the above-described continuous casting device of the present invention. For this reason, in the continuous casting method of the silicon ingot of the present invention, since the particles floating in the chamber can be captured by the wool material and the amount of particles floating in the chamber can be reduced, the metal impurities are suspended in the chamber. The amount of contaminated particles incorporating into the cooling crucible is reduced.
Therefore, the continuous casting method of the silicon ingot of the present invention can reduce the contamination of the ingot formed by melting and solidifying the particles contaminated with the metal impurities with the silicon raw material with the metal impurities, and as a result, from the cast ingot In the cut out wafer, contamination by metal impurities can be reduced.
(Example)
In order to confirm the effect of the continuous casting apparatus and continuous casting method of the silicon ingot of this invention, the following test was done.
[Exam conditions]
In this test, the silicon ingot which consists of a cut length of 7000 mm was continuously cast by the EMC method using the continuous casting apparatus shown in the said FIG. In the continuous casting apparatus used for this test, as shown in the said FIG. 1, while arrange | positioning a wool material in the upper wall surface and the side wall surface among the inner wall surfaces of the
In Example 1 of the present invention, a wool material having a density of 10 kg /
5 is a schematic diagram illustrating a position at which a silicon ingot is divided. As shown to the same figure, the
The wafers cut out of the examples of the present invention and the comparative examples were each measured for life time values, and the concentrations of Fe and Ni were measured by total solution analysis to investigate contamination by metal impurities. In the measurement of the lifetime value, the surface damage layer was etched with hydrofluoric acid on the cut wafer, and then the surface oxide film was removed with buffered hydrofluoric acid (BHF). In addition, after chemical passivation of the wafer surface with iodine, the lifetime value of the wafer surface was measured by the μ-PCD method.
[Test result]
Fig. 6 is a diagram showing the life time values of wafers obtained by Examples and Comparative Examples of the present invention. In the same figure, a life time value is shown by the relative value which made the comparative example the reference | standard (1.0). From the results shown in the same drawings, in Examples 1 and 2 of the present invention, the lifetime value was increased in comparison with the comparative example, and it was confirmed that contamination by metal impurities in the wafer cut out from the cast ingot was reduced.
FIG. 7: is a figure which shows Fe and Ni density | concentration in the wafer obtained by the example of this invention, and a comparative example. In the same figure, the relative value which made Fe and Ni concentration the comparative example the reference | standard (1.0) is shown. From the results shown in the same drawings, in Examples 1 and 2 of the present invention, it was confirmed that the Fe and Ni concentrations were lower than those of the comparative examples, and that contamination by metal impurities in the wafer cut out from the cast ingot was reduced.
From these, it became clear that the continuous casting apparatus of the silicon ingot of this invention and the continuous casting method using the same can reduce the contamination by metal impurities in the wafer cut out from the cast ingot by arrange | positioning a wool material.
In the continuous casting apparatus and continuous casting method of the silicon ingot of the present invention, the particles contaminated with metallic impurities can be prevented from being mixed into the ingot to be cast by capturing particles floating in the chamber with a wool material. For this reason, the contamination by metal impurities can be reduced in the ingot to be cast and the wafer cut out from the ingot.
Therefore, if the continuous casting apparatus and continuous casting method of the silicon ingot of this invention are applied to manufacture of the wafer for solar cells, it can contribute greatly to the quality improvement of a solar cell.
1: chamber
2: shutter
3: silicon ingot
4: outlet
5: inert gas inlet
6: exhaust port
7: floorless cooling crucible
8: induction coil
9: after heater
10: top plate
11: raw material introduction pipe
12: silicon raw material
13: molten silicon
14: plasma torch
15: support
16: support rod
17: wool ash
18: particle
31: Split Ingot
Claims (5)
A wool material is disposed on at least a portion of either or both of an inner wall surface of the chamber and a surface of a member accommodated in the chamber.
A continuous casting apparatus for a silicon ingot, wherein the wool material is made of alumina fiber, silica fiber or alumina silica fiber.
The wool material is a continuous casting device of silicon ingot, characterized in that the density is 1 ~ 100kg / ㎥ and thickness is 3 ~ 50mm.
Applications Claiming Priority (2)
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JPJP-P-2010-180768 | 2010-08-12 | ||
JP2010180768A JP2012041197A (en) | 2010-08-12 | 2010-08-12 | Apparatus and method for continuously casting silicon ingot |
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KR20120023488A true KR20120023488A (en) | 2012-03-13 |
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JP (1) | JP2012041197A (en) |
KR (1) | KR20120023488A (en) |
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CN104701407B (en) * | 2013-12-05 | 2017-09-01 | 骆志炯 | The surface wool manufacturing processing method of solar cell |
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- 2010-08-12 JP JP2010180768A patent/JP2012041197A/en active Pending
- 2010-12-13 KR KR1020100126876A patent/KR20120023488A/en not_active Application Discontinuation
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