KR20120019344A - Laser source apparatus for a light guide plate machining apparatus and method for machining a light guide plate - Google Patents

Abstract

PURPOSE: An apparatus for generating laser for a processing apparatus of a light guide plate and a method for processing a light guide plate using laser are provided to simultaneously process optical patterns of different lines by using only one laser source. CONSTITUTION: A laser light source(100) consecutively generates a laser for processing an optical pattern in a light guide plate. A shutter unit(150) changes the laser generated in the laser light source into a laser pulse form. A beam splitting unit(200) divides the laser generated in the laser light source into two or more lasers. Mirror units(310,320,330) irradiates each laser, which is separated from the beam splitting unit, to the light guide plate. A space controlling unit controls a space of optical patterns which are processed with the laser separated with the beam splitting unit.

Description

Laser generator and method for machining a light guide plate

The present invention relates to a laser generating apparatus used in a light guide plate processing apparatus using a laser, the apparatus for generating a laser irradiated for processing the light guide plate in the apparatus for processing an optical pattern using a laser on the light guide plate used in the backlight unit; A light guide plate processing method using a laser.

BACKGROUND ART Liquid crystal displays (LCDs), which are recently attracting attention as display devices, inject liquid crystals between substrates on which electrodes for controlling each pixel are formed, and form an electric field between the substrates to display image information. The state is changed and the desired image information is displayed using the transmittance difference accordingly.

Unlike a plasma display pannel (PDP), an LCD, such as a liquid crystal itself, does not emit light, but only light passes. Therefore, a light source device must be separately provided to display image information.

A light source device provided in an LCD or the like is commonly referred to as a backlight unit, and includes a light source such as a cathode ray tube for generating light, an LED, a fluorescent lamp, and a light guide plate and a prism sheet for evenly dispersing light generated from the light source.

In a backlight unit used in an LCD or the like, the light source is generally located at the end of the LCD, and several sheets including the light guide plate are required to evenly distribute the light generated at the end.

The double light guide plate is usually made of an acrylic resin to form a constant optical pattern in an intaglio or embossed on one side. The optical pattern plays a role that the light generated from the light source comes out of the light guide plate during propagation by total reflection, that is, the incident angle of the light propagated at a specific position is less than the critical angle so that the light generated from the light source provided on one side is transferred to the entire LCD. Serve evenly.

Conventionally, injection molding and the like have been used to form the optical pattern on the light guide plate. However, as the thickness of products adopting LCD and the like has become thinner and larger in size, there has been a limitation in manufacturing the light guide plate on which the optical pattern is formed. Due to this problem, devices that process optical patterns directly on the light guide plate using laser have emerged, but the output of the laser irradiated for processing on the light guide plate is not constant, so that the uniformity of the optical pattern is reduced and the laser below the processing level is irradiated to the light guide plate. As a result, there has been a problem that the defect rate due to thermal deformation after processing is high.

In addition, in order to meet mass production, rapid processing is required, but if the processing is performed quickly, not only the defect rate increases but also the processing speed is limited, and overall, the manufacturing cost of the light guide plate is much longer than that of injection molding, resulting in high manufacturing cost and low economic efficiency. There is this.

In addition, there are devices for processing a plurality of light guide plates through a plurality of laser sources in order to increase the processing speed, but there is a problem that the manufacturing cost is expensive and the size of the equipment is increased because several laser sources are required.

The present invention is to solve the above problems, an object of the present invention is to generate a laser pulse of a uniform square wave above the processing level to improve the processing quality of the light guide plate, using a single laser source at the same time several lines of optical The present invention provides a laser generating apparatus for a light guide plate processing apparatus and a light guide plate processing method using a laser which can significantly increase a processing speed as a pattern is processed.

In order to achieve the above object, the laser generating apparatus for a light guide plate processing apparatus of the present invention is a laser processing apparatus for processing an optical pattern on a light guide plate using a laser, comprising: a laser light source for generating a laser for processing the optical pattern; And a beam separation unit for separating the laser generated from the laser light source into two or more lasers, and a mirror unit for irradiating the light guide plate with each laser separated from the beam separation unit.

The laser light source may further include a shutter unit generating a continuous laser and converting the continuously generated laser into a pulsed laser.

In addition, the shutter unit is characterized in that it comprises an acoustic optical modulator (AOM).

In addition, the beam separation unit comprises a transflective mirror and a total reflection mirror, characterized in that for separating the laser generated from the laser light source into two lasers.

The transflective mirror and the total reflection mirror may be arranged in a line on a path through which the laser generated by the laser light source passes.

The mirror unit may include a first mirror unit and a second mirror unit to correspond to the two lasers separated from the beam splitter, and each mirror unit may include a reflection mirror and a focusing lens. .

The transflective mirror may be provided between the reflective mirror and the focusing lens of any one of the first mirror portion and the second mirror portion.

In addition, the reflective mirror of any one of the first mirror portion or the second mirror portion is characterized in that the semi-transparent mirror of the beam separation unit.

In addition, the first mirror portion and the second mirror portion is characterized in that spaced in the vertical direction to the path of the separated laser so as to irradiate the light guide plate with the two lasers at the same time.

The apparatus may further include a distance adjusting unit that adjusts a separation distance of the first mirror portion and the second mirror portion according to the characteristics of the optical pattern.

The apparatus may further include a gap adjusting unit configured to adjust a distance between the simultaneously processed optical patterns so as to irradiate a light guide plate with the laser separated from the beam separation unit, to simultaneously process a plurality of optical patterns.

The beam separation unit may include a plurality of transflective mirrors and a plurality of total reflection mirrors to separate the laser generated from the laser light source into a plurality of lasers, and the gap adjusting unit may include the plurality of transflective mirrors or total reflection mirrors. By adjusting the reflection angle of some of the semi-transmissive mirror or the total reflection mirror is characterized in that for adjusting the interval of the optical pattern processed on the light guide plate.

The beam separation unit may include a plurality of transflective mirrors and a total reflection mirror to separate the laser generated from the laser light source into a plurality of lasers, and the gap adjusting unit may be disposed on a laser path between the transflective mirror and the total reflection mirror. It is characterized by adjusting the distance of the optical pattern by adjusting the separation distance.

In addition, the mirror unit comprises a reflecting mirror and a focusing lens is provided by the number of lasers separated from the beam separation unit, the spacing control unit is to adjust the separation distance on the laser path between the mirror portion and the optical pattern It characterized in that to adjust the interval of.

In addition, the mirror unit comprises a reflecting mirror and a focusing lens is provided by the number of laser separated from the beam separation unit, the spacing adjusting unit is adjusted to the reflection angle of the reflecting mirror included in each mirror unit to the optical pattern It characterized in that to adjust the interval of.

The apparatus may further include an output adjusting unit configured to adjust the output of the laser on the path of each separated laser so as to equalize the deviation of the laser output separated by the beam separating means.

In addition, the laser light source is characterized in that the laser light source for generating a laser having a wavelength of 1.7μm or more.

In addition, the laser light source is characterized in that the carbon dioxide laser.

In addition, the light guide plate processing method using the laser of the present invention in order to achieve the above object in the light guide plate processing method for processing an optical pattern on the light guide plate using a laser processing apparatus, generating a laser for processing the optical pattern step; Separating the generated laser into two or more lasers; Simultaneously irradiating the separated laser on the light guide plate to process an optical pattern.

In addition, the step of generating the laser, characterized in that it further comprises the step of generating a continuous laser for the processing of the optical pattern and converting into a pulsed laser using a shutter unit.

In the separating of the two or more lasers, the generated laser may be separated into two lasers by using a transflective mirror and a total reflection mirror.

The method may further include uniformly adjusting the output of each laser separated after the separation by the two or more lasers.

Further, in the step of processing the optical pattern, in order to allow the separated laser to be irradiated to the light guide plate at the same time characterized in that the vertical distance to the laser path between the mirror portion for irradiating the separated laser to the light guide plate, characterized in that it is characterized in that .

The present invention having the above configuration has the effect of uniformly generating a laser optimized for light guide plate processing.

In addition, by generating a laser continuously and generating a laser pulse of a predetermined period according to the optical pattern by using a shutter device, there is an effect that can be processed quickly and uniformly light guide plate.

In addition, there is an effect that can process a plurality of optical patterns at the same time using a single laser source.

1 is a schematic block diagram of a laser generating apparatus for a light guide plate processing apparatus according to an embodiment of the present invention,
2 is a first embodiment of a laser generating apparatus for a light guide plate processing apparatus of the present invention;
3A is an energy graph of a laser generated in a conventional laser generating apparatus for light guide plate processing,
3b is an energy graph of the laser pulse generated in the laser generating apparatus for light guide plate processing according to the present invention;
4 is a view showing a state in which an embodiment of the output control unit of the present invention is installed,
5 is a second embodiment of the laser generating apparatus for light guide plate processing apparatus of the present invention;
6 is a schematic perspective view of a laser generating apparatus for a light guide plate processing apparatus of the present invention;
7 is an enlarged view of an optical pattern of a light guide plate processed using the laser generator for the light guide plate processing apparatus of the present invention,
8 is a flowchart of a light guide plate processing method using a laser according to an embodiment of the present invention;
FIG. 9 is a graph illustrating absorption versus wavelength of a laser of an acrylic light guide plate,
10 is a third embodiment of the laser generating apparatus for light guide plate processing apparatus of the present invention;
11 to 16 are views showing various embodiments of the gap adjusting unit of the laser generating apparatus for light guide plate processing apparatus of the present invention.

Hereinafter, a laser generating apparatus for a light guide plate processing apparatus and a light guide plate processing method using a laser will be described in detail with reference to the accompanying drawings.

1 is a schematic block diagram of a laser generating apparatus for light guide plate processing according to an embodiment of the present invention. Laser generating apparatus for light guide plate processing according to an embodiment of the present invention is a laser light source 100 and a laser generated from the laser light source 100 to continuously generate a laser for processing the optical pattern (B) on the light guide plate A mirror for irradiating the light guide plate with each laser separated from the beam separation unit 200 and the beam separation unit 200 to separate the laser generated from the shutter unit 150 and the laser light source 100 to convert the form into two or more lasers It comprises a spacing adjusting unit 600 for adjusting the spacing of the optical pattern processed by the laser separated by the unit 310, 320. 330 and the beam separation unit 200. In FIG. 1, a plurality of mirrors are shown, but in some cases, all lasers separated by one mirror may be incident and irradiated onto the light guide plate 1. In addition, the shutter unit 150 may not be installed when precise dot processing is unnecessary.

The laser light source 100 is a light source for generating a laser for processing the optical pattern B on the light guide plate 1, and the laser generated by the laser generator is irradiated to the light guide plate 1 to correspond to the optical pattern. And all shapes that form an optical pattern such as a rectangle).

There are various types of laser light source 100 depending on the principle of its generation or the material used for amplification of the laser, and the characteristics of the laser generated according to this also vary. FIG. 9 is a graph of reflectance versus wavelength of a laser of an acrylic resin used as the light guide plate 1, and it can be seen that only a specific wavelength laser has an excellent absorption rate for an acrylic resin. Therefore, in order to process the optical pattern on the light guide plate 1, the energy of the laser must be transferred to the acrylic and for this purpose, the laser must be absorbed into the acrylic. Therefore, it is suitable to process the optical pattern uniformly and efficiently by using the light of the wavelength range which is excellent in the absorption rate.

Especially, CO2 laser is a gas laser using transition between vibration levels of carbon dioxide, and it is suitable for processing light guide plate using laser because it has high absorbency to acrylic resin used as material of light guide plate and can be easily oscillated using RF signal. Laser light source. However, in order to form an optical pattern, a laser having a pulse shape corresponding to the pattern needs to be irradiated to the light guide plate 1, so that an RF signal is applied to a carbon dioxide laser light source to generate a laser pulse corresponding to the optical pattern. The period of the RF signal is adjusted according to the optical pattern to be processed.

The dots forming the optical pattern have to be uniform in size in order to distribute the light evenly throughout the LCD, and the dot forming the optical pattern is not processed unless the energy of the laser becomes more than a predetermined size. 3A and 3B are graphs showing the energy of the laser and the laser pulse generated in the conventional laser generator and the laser generator according to the present invention. As described above, the energy of the laser irradiated to the light guide plate 1 is at a predetermined level (processing). Level) is higher than the dot processing. However, in the case of the laser generated by the conventional laser generator, it can be seen that the energy of the generated laser increases exponentially when the generation signal is applied to the laser light source, and decreases exponentially when the laser stop signal is applied. Therefore, the energy graph shown in FIG. 3A is shown, and in the case of ① and ③ sections, energy having a processing level or less cannot be processed so that the dots forming the light guide plate 1 optical pattern cannot be processed. ② Only the sections form dots on the light guide plate 1. The laser beam irradiated in the sections 1 and 3 is absorbed by the light guide plate 1 to cause thermal deformation of the light guide plate 1. Such thermal deformation causes plastic deformation of the light guide plate 1, which causes a failure rate. On the contrary, as shown in FIG. 3B, the laser generating apparatus of the present invention generates uniform laser pulses at or above the processing level and all have energy above the processing level. It is formed uniformly.

In addition, as the thickness of the light guide plate becomes thinner, the dot size of the optical pattern formed on the light guide plate becomes smaller. To form such a small dot, the width of the laser pulse must be small. In addition, in order to achieve a high-speed processing that is suitable for mass production, not only a laser pulse having a uniform size and sufficient energy for processing a light guide plate should be generated, but also a short cycle of each pulse.

However, the carbon dioxide laser has a waveform in which the energy of the laser generated when the laser is generated or stopped by the RF signal increases exponentially and decreases exponentially as shown in FIG. 3A. Therefore, when a laser pulse is generated by a certain period of RF signal, the energy waveform of the laser does not have the shape of a square wave but is exponentially increased and then exponentially decreased. The RF signal period is shortened to process at speeds that are acceptable. As the RF signal cycle becomes shorter, the laser oscillated by the CO2 laser shows a waveform in which the energy decreases even before reaching the processing energy level (because the section ② is not formed). Lasers below the processing level continue to be transmitted to the light guide plate, causing thermal deformation of the light guide plate. In addition, as laser oscillation and interruption are repeated at short intervals, there is a problem that the size of the processed dot is not constant because the energy of the oscillated laser is not constant.

The present invention is to control the laser light source 100 to generate a laser continuously and to provide a shutter unit 150 to block or pass through the laser output continuously to generate a pulse of uniform size for each pulse, Not only does the laser pulse above the processing level energy be generated, but there is an effect that the waveform of the laser pulse can be a square wave. That is, instead of turning on / off the carbon dioxide laser to generate the laser pulse, the carbon dioxide laser is controlled to be blocked / passed by using the shutter unit 150 while continuing to generate a laser pulse suitable for processing. This enables the generation of laser pulses with high quality and uniform energy even at high processing speeds to meet mass productivity. For example, with a CO2 laser, the minimum on / off time is 150μs, but if the processing speed is 4m / s, dots below 0.6mm cannot be processed. However, the shutter unit 150 can be turned on / off about 1μs much shorter than the on / off time of the laser, so that the laser pulse can be generated even if the processing speed is suitable for mass production.

Accordingly, as the dot of the optical pattern processed on the light guide plate 1 is uniformly formed and only the laser of the processing level or more is irradiated, the optical pattern can be processed while minimizing the thermal deformation of the light guide plate 1 and is also suitable for mass production. There is an effect that can supply a high quality laser suitable for processing even at the processing speed.

Of course, if the size of the dot is sufficiently large, irrespective of the optical pattern or slow processing, it is not necessary to install the shutter unit 150 as described above.

As described above, the shutter unit 150 is a device for generating a laser pulse by blocking and passing the laser generated continuously. The shutter unit 150 may be used as long as the device can block or pass the laser for a very short time. However, it is preferable to use an AOM (Acoustic Optical Modulator) in which the refractive index is changed by the RF signal for ease of control of the shutter unit 150. In AOM, the internal refractive index is changed by the RF signal, and accordingly, the refractive angle of the laser is changed. By using the difference in refractive index, the laser beam irradiated to the light guide plate 1 can be transmitted or blocked.

The beam separation means 200 is configured to separate the laser generated from the laser light source 100 into two or more lasers. An embodiment of the beam separating means 200 will be described with reference to FIG. 2.

The beam splitter 200 of FIG. 2 may include a transflective mirror 220 and a total reflection mirror 210. The semi-transmissive mirror 220 is an optical configuration that transmits 50% of the incident laser and reflects 50% of the incident laser. The reflected laser is guided through the reflective mirror 312 and the focusing lens 314 of the first mirror 310. The laser beam irradiated to (1) and transmitted is irradiated to the light guide plate 1 through the reflection mirror 322 and the focusing lens 324 of the second mirror portion 320 to process the optical pattern. 5 is a second embodiment of the beam separating means 200, the semi-transmissive mirror 220 is not arranged in a line with the total reflection mirror 210, the reflective lens 312 and the focusing lens of the first mirror portion 310 314 is provided between 314 to transmit 50% of the laser reflected through the reflective lens 312 of the first mirror portion 310 and reflects 50%. In addition, FIG. 10 illustrates a reflection mirror 312 or 322 of either the first mirror part 310 or the second mirror part 320 as the third embodiment of the beam separation unit 200. It is installed as a transflective mirror 220. Of course, in the third embodiment, the total reflection mirror 210, the semi-transmissive mirror 220, and the remaining reflection mirrors of the first and second mirror portions are arranged in a line on the laser path to separate the laser into two lasers. Although the result is not different from the beam separating means shown in Fig. 2, the first embodiment uses only one transflective mirror, which is advantageous in terms of manufacturing cost. However, the second embodiment has a short optical distance after passing through the transflective mirror, resulting in a laser output. There is an advantage of reducing the deviation of the third embodiment has the advantages of both the first embodiment and the second embodiment.

In the first or second embodiment of the beam separation means 200, the separated laser is irradiated to the light guide plate 1 simultaneously through the mirror portions 310, 320, and 330 to process and process several lines of optical patterns at once. There is an advantage that can significantly reduce the time. In order to simultaneously irradiate the separated laser on the light guide plate, for example, the distance between the mirror portions (the distance perpendicular to the laser path) may be adjusted to process different optical patterns. Referring to FIG. 6, the laser A separated through the transflective mirror 220 and the total reflection mirror 210 is incident on the reflecting mirrors 312 and 322 of the first and second mirror portions, respectively, and irradiates the light guide plate 1. However, there is a distance deviation in the vertical direction in the laser path by d between the first mirror portion 310 and the second mirror portion 320 to process an optical pattern such as B. In order to obtain an optical pattern such as B, a deviation in the reflection angle of the reflection mirrors 312 and 322 as well as the distance deviation in the vertical direction in the laser path or a deviation in the reflection angle between the transflective mirror 220 and the total reflection mirror 210 is obtained. Or spaced apart a predetermined distance on the laser path of the semi-transmissive mirror 220 and the total reflection mirror 210. In addition, according to the configuration of the beam separation means 200 may be a distance deviation in the separated laser itself, in this case it may not be necessary for the distance deviation between the mirror portion.

11 to 16 are views illustrating an example of the gap adjusting unit 600 of the present invention. FIG. 11 is to adjust the distance between the mirror parts 310, 320, and 330 to adjust the gap of the optical pattern irradiated to the light guide plate. In the illustrated drawing, one of the reflection mirrors 312 and 322 is used as the transflective mirror 220. Referring to FIG. 11, when the distance between the mirror portions in the vertical direction on the laser path is adjusted, the position of the laser falling to the focusing lenses 314 and 324 is changed, and after passing through the focusing lens, the direction of the separated laser is B and B, respectively. ', And thus the spacing between the optical patterns is changed to L1 and L2. Of course, the distance between the optical patterns will change the most if the distance in the vertical direction of the laser path is changed, but if the distance in the laser path is different even if not in the vertical direction, the position of the laser incident on the focusing lens will change. Of course, it is different. In addition, although the separation distance of the whole mirror part may be adjusted, the same effect can also be obtained by adjusting the separation distance of the focusing lenses 314 and 324 contained in each mirror part.

FIG. 12 illustrates a case in which the reflection angles of the reflection mirrors 312 and 322 are adjusted among the mirrors, and the position of the laser falling to the focusing lenses 314 and 324 is changed by the reflection angles of the reflection mirrors. The interval will be different.

FIG. 13 illustrates a case in which the reflection angle of the total reflection mirror 210 or the transflective mirror 220 is adjusted, and when the reflection angle of either the total reflection mirror 210 or the transflective mirror 220 is adjusted, the incident light enters the reflection mirror of the mirror unit. As the angle of the laser is changed, the distance between the optical patterns is changed.

14, 15, and 16 illustrate a case in which the separation distance on the laser path of the total reflection mirror 210 and the transflective mirror 220 is adjusted, and the separation on the laser path between the total reflection mirror 210 and the transflective mirror 220 is shown. If the distance is changed, the position of the laser incident on the reflecting mirror of the mirror part is changed, the distance of the optical pattern is changed.

The above-described spacing adjusting unit 600 may be adjusted by a motor or the like as well as manually adjusting, and when the spacing adjusting unit 600 is adjusted by a motor or the like, it is possible to vary the spacing of the optical patterns processed on one light guide plate 1. There is an advantage that more efficient light guide plate processing is possible. That is, the light guide plate 1 is composed of a light incident part to which light of a light source is incident and a light facing part opposite to the light guide plate. Can be achieved. For this reason, it may be necessary to adjust the spacing of the optical patterns in one light guide plate processing because the spacing of the optical patterns of the light receiving part is large and the spacing of the optical patterns of the light receiving part can be kept narrow. In this case, if the spacing control unit 600 made of a control unit and a motor is designed to interlock so that the spacing of the optical patterns processed on one light guide plate is adjusted, there is an advantage that the optical patterns can be processed more quickly and efficiently.

The distance adjusting unit 500 may further include a distance adjusting unit between the mirrors. The distance adjusting unit 500 may simply adjust the distance in the vertical direction to the laser path by adjusting the insertion degree of the bolt by inserting the bolt and inserting the bolt between each mirror portion. Alternatively, after making a long hole in the support member for fixing the mirror portion, and after the appropriate distance deviation between the mirror portion may be fixed by bolts to make a deviation between the mirror portion.

However, when adjusting the distance with the bolt as described above, there is an advantage that the optical configuration is firmly fixed to process a stable optical pattern, but it is difficult to control the distance between the pattern during the processing of the light guide plate.

Of course, it is also possible to configure the distance control unit 500 by installing a motor or the like.

An output control unit 400 may be installed to adjust the output of the laser beam passing through the focusing lens of the mirror unit 310, 320, 330 in case there is an output deviation between the laser beams separated from the beam separation means 200. have. This is for maintaining the size of the dot processed in the light guide plate 1 uniformly because there may be a deviation between the size of the dot processed according to the output deviation of the laser. The output control unit 400 may use a polarization filter or the like, but may also use a method of scattering a part of the incident laser using a rod of sharp metal as shown in FIG. 4. In the case of using a polarizing filter, etc., there is an advantage in that the precise adjustment is possible while the manufacturing cost is increased, and the method shown in FIG. 4 has the disadvantage in that the manufacturing cost is inexpensive while the precise adjustment is difficult. In addition, adjusting the output after passing through the focusing lens is the most direct adjustment, but may be adjusted before transmission. That is, the output control unit 400 may be located anywhere unless the front end of the beam separating means 200.

Although the beam separating means 200 is the simplest to separate the two lasers by using the semi-transmissive mirror 220 and the total reflection mirror 210, respectively, three or more lasers using multiple transflective mirrors It can also be separated. In this case, the optical configuration is complicated, but at the same time, the number of optical patterns that can be processed increases, thereby increasing the processing speed.

In addition, the beam separation means 200 may not only use the transflective mirror 220 and the total reflection mirror 210, but also any optical configuration as long as it can separate the beam.

FIG. 7 is an illustration of an optical pattern processed by simultaneously irradiating a laser separated by the beam separating means 200 to the light guide plate 1, which is processed by a laser separated by the beam separating means 200 two from above. It can be seen that the unit of the scale is mm, and there is little variation between dots, which indicates that there is almost no output deviation of the laser after beam separation.

8 is a flowchart of a light guide plate processing method using a laser according to an embodiment of the present invention, and descriptions overlapping with those of the laser generating apparatus for the light guide plate processing apparatus will be omitted.

The light guide plate processing method using the laser of the present invention first generates a laser in the laser light source 100 (S100), the generated laser is separated into two or more lasers through the beam separation means 200 (S110). Is incident on the mirrors 310, 320, and 330 and simultaneously irradiated onto the light guide plate to process the optical pattern.

Laser light source: 100 Shutter unit: 150
Beam Separation Unit: 200 Mirror: 300
Output control unit: 400 Distance control unit: 500
Spacing unit: 600

Claims (24)

In the laser processing apparatus for processing an optical pattern on a light guide plate using a laser,
A laser light source for generating a laser for processing the optical pattern;
A beam separation unit for separating the laser generated from the laser light source into two or more lasers,
Laser generating apparatus for a light guide plate processing apparatus comprising a mirror unit for irradiating the light guide plate for each laser separated from the beam separation unit.
In claim 1,
The laser light source generates a continuous laser,
Laser generating apparatus for light guide plate processing apparatus further comprises a shutter unit for converting the continuously generated laser into a pulsed laser
In claim 2,
The shutter unit is a laser generating device for a light guide plate processing apparatus, characterized in that it comprises an acoustic optical modulator (AOM).
In claim 1,
The beam separation unit includes a transflective mirror and a total reflection mirror,
Laser generating apparatus for light guide plate processing apparatus, characterized in that for separating the laser generated from the laser light source into two laser.
In claim 4,
And the transflective mirror and the total reflection mirror are arranged in a line on a path through which the laser generated by the laser light source passes.
In claim 4,
The mirror part includes a first mirror part and a second mirror part so as to correspond to two lasers separated from the beam separation means, respectively.
And each mirror unit comprises a reflecting mirror and a focusing lens.
In claim 6,
The transflective mirror is a laser generating device for a light guide plate processing apparatus, characterized in that provided between the reflection mirror and the focusing lens of any one of the first mirror portion or the second mirror portion.
In claim 6,
The reflective mirror of any one of the first mirror portion and the second mirror portion is a semi-transmissive mirror of the beam separation unit, the laser generating apparatus for light guide plate processing apparatus.
In claim 6,
And the first mirror portion and the second mirror portion are spaced in a direction perpendicular to the path of the separated laser so that the two lasers are irradiated to the light guide plate at the same time.
In claim 9,
And a distance adjusting unit for adjusting a separation distance of the first mirror portion and the second mirror portion according to the characteristics of the optical pattern.
In claim 1,
And a spacing adjusting unit for adjusting the spacing of the simultaneously processed optical patterns to irradiate a laser separated from the beam separation unit to the light guide plate to simultaneously process a plurality of optical patterns.
In claim 11,
The beam separation unit includes a plurality of transflective mirrors and a plurality of total reflection mirrors to separate the laser generated from the laser light source into a plurality of lasers,
The gap adjusting unit is a laser generating device for a light guide plate processing apparatus, characterized in that for adjusting the interval of the optical pattern processed on the light guide plate by adjusting the reflection angle of some of the semi-transmissive mirror or the total reflection mirror. .
In claim 11,
The beam separation unit includes a plurality of transflective mirrors and total reflection mirrors to separate the laser generated from the laser light source into a plurality of lasers,
The gap adjusting unit is a laser generating device for a light guide plate processing apparatus, characterized in that for adjusting the distance of the optical pattern by adjusting the separation distance on the laser path between the transflective mirror and the total reflection mirror.
In claim 11,
The mirror unit includes a reflection mirror and a focusing lens and is provided by the number of lasers separated from the beam separation unit.
The gap adjusting unit is a laser generating device for a light guide plate processing apparatus, characterized in that for adjusting the distance of the optical pattern by adjusting the separation distance on the laser path between the mirror portion.
In claim 11,
The mirror unit includes a reflection mirror and a focusing lens and is provided by the number of lasers separated from the beam separation unit.
The gap adjusting unit is a laser generating device for a light guide plate processing apparatus, characterized in that for adjusting the interval of the optical pattern by adjusting the reflection angle of the reflection mirror included in each mirror.
In claim 1,
And an output control unit for adjusting the output of the laser on the paths of the separated lasers to equalize the deviation of the laser outputs separated by the beam separation means.
In claim 1,
And said laser light source is a laser light source for generating a laser having a wavelength of 1.7 μm or more.
In claim 17,
The laser light source for processing the light guide plate, characterized in that the laser light source is a carbon dioxide laser.
In the light guide plate processing method of processing an optical pattern on the light guide plate using a laser processing device,
Generating a laser for processing the optical pattern;
Separating the generated laser into two or more lasers;
The light guide plate processing method using a laser comprising the step of simultaneously irradiating the separated laser to the light guide plate to process the optical pattern.
In claim 19,
In the step of generating the laser,
Generating a continuous laser for processing the optical pattern and converting into a pulsed laser using a shutter unit further comprising a light guide plate processing method using a laser.
In claim 19,
In the step of separating by two or more lasers,
The light guide plate processing method using a laser, characterized in that for separating the generated laser into two laser using a transflective mirror and a total reflection mirror.
In claim 19,
Light guide plate processing method using a laser further comprising the step of uniformly adjusting the output of each laser separated after separation by the two or more lasers.
In claim 19,
In the step of processing the optical pattern,
Light guide plate processing method using a laser, characterized in that for adjusting the vertical distance in the laser path between the mirror portion for irradiating the separated laser to the light guide plate so that the separated laser is irradiated simultaneously to the light guide plate.
In claim 19,
The step of processing the optical pattern,
Light guide plate processing method using a laser, characterized in that further comprising the step of adjusting the interval between the optical pattern processed by the separated laser.

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