KR20120007472A - Inorganic scattering films having high light extraction performance - Google Patents

Abstract

PURPOSE: An inorganic scattering film is provided to obtain a superior light extraction effect based on a light scattering effect by forming an inorganic fine-particle film containing voids on the interface of illumination elements or on a transparent substrate. CONSTITUTION: An inorganic scattering film includes an inorganic fine-particle layer with voids and a planarization layer for protecting and planarizing the inorganic fine-particle layer. The thickness of the inorganic scattering film is between 100nm and 30um. The surface flatness(Ra) of the inorganic scattering film is between 1nm and 10nm. The surface hardness of the inorganic scattering film is between 3H and 9H. The refractive index of inorganic fine-particles in the inorganic scattering film is more than or equal to 1.7.

Description

Inorganic Scattering Films Having High Light Extraction Performance

The present invention relates to an optical thin film having a high light extraction effect by light scattering effect by forming an inorganic fine particle film containing voids at the light emitting device interface or a transparent substrate (substrate) and a method of manufacturing the same.

The present invention relates to a nano-inorganic compound thin film excellent in low reflectance and light extraction characteristics or total light transmission performance. In the case of a light emitting device, reflection loss occurs in the light output due to a difference in refractive index at the light emitting device interface when light is emitted. Until now, in order to increase the light output of the light emitting device, a method of increasing the light output by scattering by forming an anti-reflection film on the surface or the transparent substrate or by etching the surface to form irregularities.

In particular, a protective film (antireflection film) having a light transmission antireflection function has been provided on a transparent substrate such as a glass or plastic substrate used for a lens or an image display device. As the antireflection film for an image display device, an antireflection film having a refractive index higher than that of the antireflection film for a synthetic resin lens and having a colorless transparent high refractive index layer was required. In general, the antireflection film is formed of a multilayer film (a high refractive index layer, an intermediate refractive index layer, and a low refractive index layer) composed of a transparent thin film layer containing a plurality of metal oxides, and the transparent thin film layers are stacked on each other and have different refractive indices. When manufacturing an antireflection film by coating, a binder resin is used as a matrix for forming the film. Usually, since such a binder resin has a refractive index of 1.45 to 1.55, the refractive index of each layer is appropriately adjusted by selecting the type and amount of the inorganic particles used therein.

In order to increase the light extraction efficiency, research is being actively conducted to form a low reflection surface by light scattering by forming irregularities or nanowires on the surface of the light emitting device. The low reflection surface structure due to scattering has a high light extraction effect because the light emitted from the light emitter is reflected at the interface to minimize the loss of conversion into heat energy. These scattered low reflection surfaces have an omnidirectional tendency and have the advantage of operating in a wide wavelength range. Because of these advantages, the low reflection film due to scattering is suitable for application to solar cells as well as light emitting devices.

That is, various solutions have been proposed for disturbing the substrate-air interface (eg, microlens or roughened surface) to affect light reaching the interface. Another is the introduction of a scattering element in the substrate or in the adhesive (see published PCT Application No. WO2002037580A1 (Chou)), thereby interrupting the substrate mode to redirect its light from the device. Several previous attempts have been made to disturb this interface by introducing scattering or diffractive elements at the core-substrate interface.

Since the fabrication of a defect-free light emitting device in contact with this light extraction layer will require a smooth planar surface, the planarity of the top surface of the light extraction film is important. However, some work has been done on corrugating the electrode structure to combine light from the emitter (M. Fujita, et al., Jpn. J. Appl. Phys. 44 (6A), pp.3669-3677 (2005)]), as a result, it is expected to have a detrimental effect on the electric field of the device. Therefore, great care must be taken to disturb these interfaces while not adversely affecting the electrical operation of the device. Practical solutions for balancing these conflicting problems have not yet been proposed.

In recent years, research has been reported to maximize light extraction efficiency by forming a light scattering layer on a transparent substrate in an OLED structure (R. Bathelt, Organic Electronics 8, 293-299 (2007)). In the research, a study to increase the light scattering efficiency by using a polyacrylic scattering film containing pores has been reported. In this case, the resin used may cause a decrease in light efficiency due to discoloration due to moisture when used for a long time. In addition, the resin used as the organic backfill has a problem that no further scattering effect will be improved because the refractive index (n = 1.4 to 1.5) is low.

In addition, according to the Republic of Korea Patent 10-2010-0138939 it introduces a silicon oxide base scattering glass plate formed by forming pores in the high refractive glass. However, such a scattering glass plate can not be applied directly to the surface of the light emitting device, there is a problem that is not appropriately applied to the substrate of various shapes and shapes.

Accordingly, the present inventors were able to maximize the light scattering effect by introducing inorganic oxide particles (eg, refractive index of 1.7 or more) having a larger refractive index than the voids (refractive index-1) as scattering particles. That is, by preparing a nano-sized high refractive index fine particle powder, and forming it as an inorganic compound nanoparticle film having pores by coating on the surface of the light emitting body or substrates of various shapes and shapes, an optical thin film having a high light extraction effect by light scattering and Its discovery has led to the present invention.

An object of the present invention is to provide an optical thin film having a high light extraction effect by light scattering effect by forming an inorganic fine particle film containing voids at the light emitting device interface or transparent substrate (substrate) and a method of manufacturing the same.

In one embodiment, an inorganic fine particle scattering film including an inorganic fine particle layer including voids and a planarization layer for protecting and planarizing the inorganic fine particle layer is provided as a scattering layer for improving light extraction.

In one embodiment of the present invention, the thickness of the inorganic fine particle scattering film is preferably 100nm ~ 30μm, the scattering film is preferably a surface flatness (Ra) of 1nm-10nm, surface hardness is 3H-9H.

In one embodiment, the planarization layer is an organic coating film formation, the organic coating film formation is preferably a polyacrylic or polyimide resin (resin), the planarization layer is an inorganic coating film formation, a silicon compound It is preferable, but not limited to these.

In one embodiment of the present invention, there is provided a method for preparing inorganic fine particles by a synthetic method by coprecipitation method, wherein the inorganic fine particles have a refractive index of 1.7 or more.

The inorganic fine particles are Li, Be, B, Na, Mg, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Ce, Ta and It is a metal oxide containing 1 or more types chosen from In.

In one embodiment, the inorganic fine particles and zirconium oxide (zirconium oxide, ZrO _2), hafnium oxide (hafnium oxide, HfO _2), tantalum oxide _{(tantalium oxide, Ta 2 O 5} ), titanium dioxide (titanium oxide, TiO ₂₎ , Simple oxides such as yttrium oxide (Y ₂ O ₃ ), zinc oxide (ZnO), yttrium oxide, magnesium oxide (MgO), calcium oxide (CaO), or cerium oxide ( composed of complex oxides or mixtures thereof such as zirconium oxide stabilized or partially stabilized by cerium oxide (CeO ₂ ) (Y ₂ O ₃ -ZrO ₂ , MgO-ZrO ₂ , CaO-ZrO ₂ , CeO ₂ -ZrO ₂ ) In particular, zirconium oxide (ZrO ₂ ) is preferably stabilized or partially stabilized by yttrium oxide (Y ₂ O ₃ ).

In one embodiment, the average particle size (D ₅₀ ) of the inorganic fine particles for the appropriate thickness of the scattering film is preferably 1nm ~ 1㎛, particularly preferably 5nm ~ 500nm, the refractive index of the inorganic fine particles is 1.7 ~ 3.0 to be.

In the scattering film including such pores, an organic or inorganic binder may be used to fix the surface structure.

In one embodiment of the invention, providing a substrate; Preparing an inorganic particulate layer comprising voids on the substrate; And it provides a method for producing an inorganic fine particle scattering film comprising the step of manufacturing a planarization layer on the inorganic fine particle layer.

In one embodiment, the inorganic fine particle layer may further comprise the step of preparing a coating liquid comprising a binder to form a coating layer. In this case, the backfill layer is over-coated on the inorganic fine particle layer, wherein the backfill layer is evaporated before the overcoating layer is coated, and the coating layer is spin coated or dip coated. -coating, slot-coating or screen printing.

In one embodiment, it provides a glass, a light emitting device, a solar cell substrate, an organic polymer film or an illumination element comprising an inorganic fine particle scattering layer according to the method.

The nano-sized particle powder manufacturing method according to the present invention can be applied to the synthesis of various complex oxide powders as the size and shape of the composite powder can be controlled, and the inorganic scattering film including the same is provided through the nanoparticle scattering film including pores. Since it has a high light extraction effect, it can be applied to places such as image display devices, lighting elements, solar cells.

1 is a schematic view of a thin film having optical properties according to the present invention.
2 is an electron micrograph (SEM) of a cross section of a light scattering film in which an inorganic fine particle layer and a planarization layer are stacked on a glass substrate according to the present invention.
3 is a result of measuring the surface flatness (Atomic Force Microscope (AFM)) of the light scattering layer, the inorganic fine particle layer and the planarization layer.
4 is a schematic of the synthesis process of ZrO ₂ nanopowder stabilized with Y ₂ O ₃ .
5 is an x-ray diffractogram of ZrO ₂ nanopowders stabilized with Y ₂ O ₃ .
6 is an electron micrograph (SEM) of ZrO ₂ nanopowder stabilized with Y ₂ O ₃ .
7 is an electron micrograph (SEM) of ZrO ₂ nanopowder stabilized with Y ₂ O ₃ .
8 is a transmission electron micrograph (TEM) of ZrO ₂ nanopowder stabilized with Y ₂ O ₃ .
FIG. 9 is an electron micrograph (SEM) of a cross section of an inorganic fine particle layer prepared in Example 3-3 having a thickness of 9.8 μm.
FIG. 10 is an electron micrograph (SEM) of a cross section having an inorganic fine particle layer thickness of 4.4 μm prepared in Example 3-3.
FIG. 11 is an electron micrograph (SEM) of a cross section of the inorganic fine particle layer prepared in Example 3-3 having a thickness of 1.1 μm.

The present invention can provide an inorganic fine particle scattering film including a void formed in the light emitting interface to improve light extraction from the light emitting device. The inorganic particles are ZrO ₂ powders stabilized with spherical Y ₂ O ₃ having a particle size distribution and various specific surface areas controlled from several nanos to several tens of nanos.

These inorganic fine particles are prepared by purifying the aqueous solution of zirconia and aqueous solution of yttria, adjusting the pH by mixing the aqueous solution with the catalyst, solvent and neutralizing agent to make a uniform precipitate by adjusting the reaction temperature, filtering the precipitate, washing with water It can be prepared from a series of processes including uniformly mixing through, adjusting the specific surface area and crystallinity through heat treatment conditions.

Specifically, in the case of raw materials, zirconyl chloride octahydrate (ZrOCl ₃ · 8H ₂ O), zirconyl nitrate hydrate (ZrO (NO ₃ ) ₂ .xH ₂ O) or zirconium Zirconium sulfate, Yttrium nitrate hexahydrate (Y (NO ₃ ) ₃ · 6H ₂ O) or yttrium chloride hexahydrate (YCl ₃ ) for yttria 6H ₂ O) is used. Neutralizers include ammonium hydroxide (NH ₄ OH), ammonium carbonate (NH ₄ ) ₂ CO ₃ ), ammonium bicarbonate (NH ₄ HCO ₃ ), sodium hydroxide (Sodium hydroxide, NaOH) At least one substance of potassium hydroxide (KOH) is used.

The raw materials are dissolved in an appropriate amount of raw materials in water and co-precipitated by dropping a catalyst in the filtered solution.

The specific surface area of the ZrO ₂ nanoparticles stabilized with Y ₂ O ₃ can be controlled by controlling the reaction temperature after the precipitate is produced. The reaction temperature range can be synthesized within 100 ℃ at room temperature and can change the particle size distribution and specific surface area depending on the reaction temperature.

The precipitate is separated from the powder and the liquid through a filtration process and then washed.

After the above process, the precipitate is dried for 24 hours at 100 ℃ to remove the moisture and then heat treated for 1 to 5 hours in the temperature range of 200 ~ 1100 ℃ to obtain a spherical powder of several nano to several tens of nanometers.

By the above-described method, it is possible to obtain a nanopowder having a particle size of 1 to 500 nm and a specific surface area of 5 to 100 m ² / g. The shape, size and distribution of the formed particles were observed by scanning electron microscope (FE-SEM) and transmission electron microscope (TEM). The crystallinity of the particles was observed by X-ray diffractometer (XRD).

When manufacturing an optical thin film by coating, it is necessary to appropriately control the optical properties by selecting the type and amount of inorganic particles used therein, and for this purpose, it is very important to uniformly disperse the inorganic fine particles without aggregation. That is, these materials are prepared in the form of nano-sized particles and dispersed in an organic solvent or water. The particles should be excellent in dispersion stability in the dispersed solution. To this end, a dispersant, a binder, a plasticizer, and the like together with the inorganic fine particles may be dissolved and used in a solvent. The organic solvent may be a single substance or a mixture thereof selected from alcohols, ethers, acetates, ketones or toluene.

Specifically, Alcohol of methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, isobutyl alcohol, or diacetone alcohol; Ethers of tetrahydrofuran, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether, and propylene glycol alcohol ether; Acetates of methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, propylene glycol butyl ether acetate; Acetone acetone, or ketones of acetone are used, but is not limited thereto.

Moreover, it is also possible to use a high boiling point solvent together with the said solvent. Combinations of high boiling point solvents include N-methyl formamide, N, N-dimethyl formamide, N-methyl acetamide, N, N-dimethyl acetamide, N-methyl pyrrolidone, dimethyl sulfoxide or benzyl ethyl ether Solvents may be used.

According to the present invention, a method of manufacturing a multifunctional optical film for improving light extraction includes coating a layer of a material having a high refractive index on a light emitting device surface or a transparent substrate. Nanostructured features can be imparted within the organic material to create nanostructured surfaces. The planarizing material may then be overcoated to form a planarization layer on the nanostructured surface.

In the preparation of the optical thin film, a spin coating method was basically used. The dispersion was applied onto a glass plate and then spin coated. At this time, the concentration of the inorganic material dispersion was controlled in the range of 5 ~ 20%, the spin speed during the spin coating was coated with a thin film under the conditions of 500 ~ 5000rpm. After the spin coating was completed, heat was applied at 100 ° C. for 30 seconds to stabilize the glass surface particles and dry the thin film surface. In order to increase the fixation and adhesion between the glass surface and the inorganic particulate layer material and to form a planarization layer on the nanostructured surface, a polymer thin film was applied and subjected to thermal curing at 230 ° C. for 30 minutes.

However, this coating method is not limited when forming the light scattering layer by the inorganic fine particles including voids. In addition to the spin coating method, a scattering film may be formed by inorganic fine particles including pores on the surface of the light emitting device by various methods such as dip coating, slot coating, and screen printing.

The light scattering film is composed of inorganic particles having a high refractive index, a material having a different refractive index, and a coating film formation capable of fixing the structure. The light scattering film is a material having a different refractive index from the light scattering particles and has a large refractive index difference (refractive index ~ 1). It is most appropriate when it is done. In addition, the voids formed at the light emitting interface are formed between the inorganic fine particles when the inorganic fine particles are laminated to the particles according to the size. The size and amount of the pores can be adjusted according to the control of the inorganic particles, the size and shape is not limited.

On the other hand, the flattening layer formation is a sticky material that can adhere the nanoparticles of the inorganic fine particle layer to the support, in order to fix the structure in which the light scattering nanoparticles and voids are mixed and to secure the adhesion to the substrate (substrate) It is also used to planarize and strengthen the surface of the light scattering film.

Various effects can be added by laminating the planarization layer on the inorganic fine particle layer. First, the inorganic fine particle layer may have a flatness (Ra) value of 20 nm to 200 nm depending on the coating method or additives. In order to obtain lower flatness Ra, the planarization layer may be stacked and used. Surface flatness (Ra) is measured through AFM (Atomic Force Microscope). Secondly, the inorganic fine particle layer has a weak surface hardness and the coating layer formation is laminated to prevent the scattering layer structure from being collapsed by physical force, thereby strengthening the mechanical strength of the inorganic fine particle structure as well as the surface. The mechanical strength of the surface was measured using the pencil hardness test method (KS-D-6711-92) and the surface hardness was measured using the MITSUBISHI pencil.

The light scattering layer of the present invention comprises a light scattering layer comprising a planarization layer including inorganic particles having a high refractive index, an inorganic fine particle layer including pores having different refractive indices, and a fixed material which is a material capable of flattening while fixing the structure. . The above is illustrated in FIG.

The flatness (Ra) of the surface of the composed inorganic fine particle layer was roughly about 0.18 μm before stacking the deposits, and the flatness of the surface was lowered to 2 to 5 nm due to the stacking of the deposits. Surface flatness (Ra) was measured by AFM (Atomic Force Microscope), and the cross-sections of the inorganic particulate layer and the planarization layer were observed by scanning electron microscope (FE-SEM), and the results are shown in FIGS. 2 and 3. It was.

The electron micrograph of FIG. 2 confirms that the cross section is laminated with the glass-inorganic fine particle layer-flattening layer, and it can be confirmed that the surface of the planarization layer is flat.

The mechanical strength of the surface after lamination of the adherend was measured using a pencil hardness measurement method (KS-D-6711-92), and the surface hardness was measured using an MITSUBISHI pencil. The result of the inorganic fine particle layer has a surface hardness of about 6B, the hardness can be increased to 3H ~ 6H by adding a planarization layer (Fig. 3).

The thin films made by the above method were measured to have different transmittance, scattering transmittance, scattering reflectance, and scattering layer according to thin film material, thin film thickness, thin film formation method, and void formation method. These optical properties were measured in the 350 ~ 800nm wavelength region using a UV / Vis spectrometer.

Hereinafter, the present invention will be described in detail by the following examples. However, the following examples are merely to illustrate the invention, but the content of the present invention is not limited by the following examples.

Example

Example  1. Preparation of Inorganic Particles

Example  1-1.

12.5 wt% ZrOCl ₃ · 8H ₂ O and 2 wt% Y (NO ₃ ) ₃ · 6H ₂ O were dissolved in water and reacted with a mixture of ammonium hydroxide (NH ₄ OH) to precipitate at pH = 9.00 The prepared solution. The prepared precipitated solution is reacted at room temperature for 1 hour to complete the reaction. The precipitate and the solution are separated by filtration and washed while dispersing the separated precipitate in distilled water. The water is removed through a 1 μm pore filter and the washing is repeated. The water-removed precipitate was dried at 100 ° C. for 24 hours in a drier, and heat treated at 800 ° C. for 1 hour in an air atmosphere in an electric furnace. The process is shown in FIG.

In addition, x-ray diffraction analysis results and the SEM image of the synthesized nano-powder are shown in FIGS. 5 and 6, respectively.

Example  1-2.

12.5 wt% ZrOCl ₃ · 8H ₂ O and 2 wt% (NO ₃ ) ₃ · 6H ₂ O were dissolved in distilled water containing additives and reacted with a mixture of ammonium hydroxide (NH ₄ OH) to pH = A solution precipitated at 9.00 was prepared. The prepared precipitated solution was reacted at room temperature for 1 hour, and then the reaction temperature was raised to 60 ° C., followed by reaction for 3 hours to complete the reaction. Since the process is the same as in Example 1-1. X-ray diffraction analysis results and the SEM image of the synthesized nanopowders are shown in FIGS. 5 and 7, respectively.

Example  1-3.

Proceed as in Example 1-2, the additive is added dropwise to the aqueous solution of zirconia and aqueous solution of yttria. After the reaction at room temperature for 1 hour, the reaction temperature was raised to 60 ° C and further reaction was performed for 3 hours. Thereafter, the process is the same as in Example 1-1. The particles obtained by this method yielded smaller particles than in the reaction in Example 1-2.

From the above results, it can be seen that the crystallinity of the YSZ powder prepared in Example 1-1 is further developed (see FIG. 5).

The morphology and particle size of the YSZ particles prepared in Example 1-1 were confirmed by transmission electron microscope (TEM) images. The size of the particle through the transmission electron micrograph is about 50 ~ 60nm. The results are shown in FIG.

Example  2. Preparation of Thin Film

Example  2-1.

Nanosized zirconia powder is mixed with additives in an organic solvent. This solution is milled for 3 hours to prepare a dispersion. The dispersion is coated on a glass substrate, the solvent is dried at 100 ° C. for 30 seconds, and then heated at 250 ° C. for 30 minutes to deposit an inorganic fine particle layer. Then, a polyacrylic compound was coated on the inorganic fine particle layer to stack the planarization layer.

Example  2-2.

A yttria powder having a nano size was prepared in the same manner as in Example 2-1, and an inorganic fine particle layer and a planarization layer were laminated.

Example  2-3.

Yttria stabilized zirconia (YSZ) having a size of 50-60 nm was prepared in the same manner as in Example 2-1, and an inorganic fine particle layer and a planarization layer were laminated. At this time, the coating conditions were changed to stack an inorganic fine particle layer having a thickness of 1 ~ 10㎛.

Comparative example  One

After coating the silicon organic compound having a pore-generating factor on the glass substrate, the solvent was dried at 100 ℃ for 30 seconds, and then heated at 230 ℃ for 30 minutes to form a silicon oxide layer containing pores on the glass.

Comparative example  2

Only the glass substrates used in Example 2 and Comparative Example 1 were used.

The glass substrates including the scattering film prepared in Examples 2-1, 2-2, 2-3 and Comparative Example 1, and the glass substrates used in Comparative 2 were measured using a UV / Vis spectrometer to measure transmittance and reflectance. From these results, these values in 550 nm wavelength are shown in Table 1.

Inorganic fine particle layer Scattering Layer Thickness (㎛) Scattering transmittance (%) Permeability (%) Total reflectance (%) Example 2-1 ZrO2 1.8 49.8 36.9 11.2 Example 2-2 Y2O3 2.1 49.4 38.6 10.2 Example 2-3 YSZ 9.8 50.9 One 44.7 4.2 57.9 4.3 34.7 2 60.6 13.8 21.2 1.1 34.5 48.6 13.7 Comparative Example 1 Silicon oxide with voids 1.5 6 84.8 7.8 Comparative Example 2 x x 0 91.6 8.7

As shown in Table 1, in Comparative Example 2, the glass substrate, in which the scattering layer is not laminated, undergoes permeation and reflection and does not cause light scattering. (Comparative Example 1).

Example 2-1 showed higher scattering transmittance than the silicon oxide layer containing pores. That is, it can be seen that the scattering film by the ZrO ₂ inorganic fine particles shows high scattering efficiency and can increase the light extraction effect.

In Example 2-2, the scattering layer using the Y ₂ O ₃ powder also had a scattering transmittance of about 50% and showed excellent performance in the light extraction effect.

Example 2-3 shows better light scattering efficiency through Yttria stabilized Zirconia (YSZ) composite oxide inorganic fine particles. The scattering transmittance is shown by the light scattering layer thickness and coating method. Forward transmittance, scattering transmittance, reflectance can be adjusted, and the degree of voids can be adjusted. 9, 10, and 11 are electron micrographs of the light scattering layers stacked in Example 2-3 having 2 μm, 4.4 μm, and 9,8 μm, respectively, and light scattering layers having various thicknesses may be stacked. The degree of the void can also be obtained in various ways. Therefore, it is believed that this can show various types of light extraction effects.

While the invention has been described with reference to exemplary embodiments so far, those skilled in the art will appreciate that various changes can be made therein and equivalents may be substituted for elements thereof without departing from the scope of the invention. You will know. In addition, many modifications may be made to adapt a particular situation and material to the teachings of the invention without departing from the essential scope thereof. Therefore, it is intended that the present invention not be limited to the particular embodiments disclosed as the best mode contemplated for carrying out the invention, but that the invention will include all embodiments falling within the scope of the appended claims.

Claims (20)

As a scattering film for improving light extraction,
An inorganic fine particle scattering film comprising an inorganic fine particle layer containing voids and a planarization layer for protecting and planarizing the inorganic fine particle layer. The method of claim 1,
The scattering film, characterized in that the thickness of the inorganic fine particle scattering film is 100nm ~ 30μm. The method of claim 1,
The surface flatness (Ra) of the inorganic fine particle scattering film is a scattering film, characterized in that 1nm-10nm. The method of claim 1,
The surface hardness of the inorganic fine particle scattering film is a scattering film, characterized in that 3H-9H. The method of claim 1,
The planarization layer is an organic coating film formation, the organic coating film formation is a scattering film, characterized in that the resin of the polyacrylic or polyimide. The method of claim 1,
The planarization layer is an inorganic coating film formation, the inorganic coating film formation is a scattering film, characterized in that the silicon compound. A method for producing inorganic fine particles by the synthesis method by coprecipitation method. The method of claim 7, wherein
The inorganic fine particles have a refractive index of 1.7 or more method for producing inorganic fine particles. The method of claim 7, wherein
The inorganic fine particles are Li, Be, B, Na, Mg, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Ce, Ta and Method for producing inorganic particles, characterized in that the metal oxide containing at least one selected from In. The method of claim 9,
The metal oxide may be zirconium oxide (zrO ₂ ); Hafnium oxide (HfO ₂ ); Tantalium oxide (Ta ₂ O ₅ ); Titanium dioxide (TiO ₂ ); Yttrium oxide (Y ₂ O ₃ ); Zinc oxide (ZnO); Zirconium oxide stabilized or partially stabilized with yttrium oxide, magnesium oxide (MgO), calcium oxide (CaO) or cerium oxide (CeO ₂ ) (Y ₂ O ₃ -ZrO ₂ , MgO- ZrO ₂ , CaO-ZrO ₂ , CeO ₂ -ZrO ₂ ) or a mixture thereof. The method of claim 10,
The metal oxide is zirconium oxide (zirconium oxide, ZrO ₂ ) stabilized or partially stabilized by yttrium oxide (Y ₂ O ₃ ) method for producing inorganic particles. The method of claim 7, wherein
The particle average size (D ₅₀ ) of the inorganic fine particles is a method for producing inorganic fine particles, characterized in that 1nm ~ 1㎛. The method of claim 7, wherein
The average particle size (D ₅₀ ) of the inorganic fine particles is a method for producing inorganic fine particles, characterized in that 5nm ~ 500nm. The method of claim 7, wherein
The refractive index of the inorganic fine particles is a method for producing inorganic fine particles, characterized in that 1.7 to 3.0. Providing a substrate;
Preparing an inorganic particulate layer comprising voids on the substrate; And
Method for producing an inorganic fine particle scattering film comprising the step of manufacturing a planarization layer on the inorganic fine particle layer. 16. The method of claim 15,
The inorganic fine particle layer is a method for producing an inorganic fine particle scattering film, further comprising the step of preparing a coating liquid comprising a binder to form a coating layer. 16. The method of claim 15,
A method of manufacturing an inorganic fine particle scattering film, characterized in that over-coating a backfill layer on the inorganic fine particle layer. 16. The method of claim 15,
The backfill layer is a method for producing an inorganic fine particle scattering film, characterized in that the solvent is evaporated before overcoating. 16. The method of claim 15,
The coating layer is spin coating, dip-coating, slot-coating or screen printing (screen printing) method for producing an inorganic fine particle scattering film. A glass, a light emitting device, a solar cell substrate, an organic polymer film, or an illumination element comprising the inorganic fine particle scattering film according to claim 1.

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