KR20110139819A - Vapor deposition machine of e-beam type - Google Patents

Abstract

PURPOSE: A device for depositing inline type of e-beam way is provided improve the production quantity and multi evaporation of products. CONSTITUTION: A device for depositing inline type of e-beam way comprises a first chamber(10), a second chamber(20), a third chamber(30), a vacuum pump, a transfer rail part(40) and gate valves(51,52). The first chamber establishes a carrier(5) in which product installs. The second chamber evaporates the product of the carrier carried from the first chamber to the e-beam mode. The vacuum pump is respectively installed inside the first, second, and third chambers under vacuum conditions. The transfer rail part gradually transfers the carrier. The gate valve opens and closes along the first, second, and third chambers.

Description

E-beam type in-line evaporation system {VAPOR DEPOSITION MACHINE OF E-BEAM TYPE}

The present invention relates to a deposition apparatus to which an E-beam method is applied, and more particularly, to a first chamber for installing a product carrier in an e-beam method of depositing a conventional single chamber, and a product of a product carrier. The second chamber for e-beam deposition and the third chamber for recovering the product carrier are configured in parallel in the in-line form to sequentially install, deposit, and recover the product by the first, second, and third chambers. The present invention relates to a two-beam type in-line deposition apparatus that provides excellent merchandise and manufacturing productivity by increasing metal and multi-deposition of a product, which is an advantage of the beam method, and increasing the production quantity of the product.

Recently, a method of depositing on the surface of an injection molded product such as a mobile phone or a home appliance is applied, because it gives a luxury of a letter or a design to increase its commerciality.

This deposition method is mainly applied to the E-beam (E-beam) method and sputtering method.

The two-beam method is installed by mounting a product to be deposited in a single chamber in a carrier, pumping the inside of the chamber to a vacuum degree (5.0 E-5 torr) that can be deposited, and then the material of the product is evaporated from the lower deposition unit The deposition operation is performed, and when the deposition is completed, the vacuum inside the chamber is gripped and the carrier is recovered to complete the operation.

In this case, the deposition material may be made of a material having a different refractive index (for example, Ti02, SiO2, ZrO2), or a metal material (Ni, Cr, Al).

While this e-beam method provides excellent quality of letters or designs by changing colors or glittering luster depending on the angle of metal and multi deposition, the deposition process takes a lot of time and reduces manufacturing productivity. There was this.

For example, a three-layer deposition process using materials with different refractive indices takes about 15 minutes to pump the chamber to a vacuum degree that can be deposited, 10 minutes to deposit, and 6 minutes to break the vacuum inside the chamber. It takes 30 to 40 minutes, in addition to the actual deposition time, the time to pump or discard the vacuum to 20 to 30 minutes to the deposition possible vacuum was inevitably deteriorated manufacturing productivity.

On the contrary, sputtering method improves manufacturing productivity by applying in-line method by multiple chambers instead of using a single chamber, but due to metal deposition and target mounting limitations, only one oxide can be deposited, thereby degrading the merchandise. There was a problem.

Therefore, the present inventors have tried to achieve the improvement of the manufacturing productivity with the improvement of the commerciality by applying a part of the sputtering method while maintaining the advantages of the two-beam method.

The present invention has been invented to solve the above problems of the prior art, the installation of the first, second, third chamber in parallel in the in-line form in the two-beam method of conventional deposition work in a single chamber installation, deposition, Since the recovery is sequentially performed by the first, second, and third chambers, the metal and multi-deposition of the product, which is the advantage of the conventional two-beam method, are continuously deposited in the second chamber while increasing the production quantity of the product to manufacture the product performance. The aim is to provide excellent productivity.

The present invention includes a first chamber for installing a carrier on which a product is mounted, a second chamber for depositing a product of a carrier moved from the first chamber by an evaporation material by a material evaporated in a deposition unit, and A third chamber for recovering a carrier moved after the deposition is completed in the second chamber is configured in an in-line manner in parallel, wherein the first, second, and third chambers have a vacuum pump and a carrier installed for vacuum or vacuum destruction, respectively. It is characterized in that the moving rail portion for sequential movement and the gate valve for opening and closing operation between the first, second, third chambers.

The moving rail unit is characterized in that the moving rail portion is formed in an endless track shape so as to return to the first chamber after sequentially moving the carrier to the first, second, third chamber.

The present invention relates to a first chamber for installing a product carrier in a two-beam method of depositing a conventional single chamber, a second chamber for e-beam deposition on a product of a product carrier, and a third to recover a product carrier. Since the chambers are arranged inline in parallel, the installation, deposition, and recovery of products are performed sequentially by the first, second, and third chambers. It is to have an effect of providing excellent productivity and manufacturing productivity by increasing the production quantity of the product while performing the continuous.

1 is a front configuration diagram of the present invention.
2 is a block diagram of the present invention.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

As shown in FIGS. 1 and 2, the two-beam type inline deposition apparatus of the present invention includes: a first chamber 10 for installing a carrier 5 on which a product is mounted;

A second chamber 20 for depositing a product of the carrier 5 moved in the first chamber by an e-beam method by a material evaporated from the deposition unit 70;

In parallel configuration of the third chamber (30) for recovering the carrier (5) is completed in the second chamber and moved, in an inline manner,

The first, second and third chambers 10 and 20 and 30 have a vacuum pump which is installed for the internal vacuum or the vacuum breaker, and a moving rail part 40 for sequentially moving the carrier 5, The first, second, third chambers 10, 20, 30 between the gate valve 51, 52 for opening and closing the operation is installed and configured.

At this time, the moving rail portion 40 is moved to the first, second, third and third chambers 10, 20, 30 in sequence to move the carrier 5 in the form of an endless track so as to return to the first chamber 10 again. It is preferable to form.

In addition, the material of the deposition unit 70 is capable of metal and multi-deposition by the two-beam method using a material having a different refractive index (for example Ti02, SiO2, ZrO2) and metal materials (Ni, Cr, Al), etc. Various colors can be realized, as well as color change or shiny gloss depending on the viewing angle.

As the reference numeral, reference numeral 80 denotes a rotary drive unit for rotating the carrier, and 90 denotes a chemical refilling unit of the second chamber 20.

Next will be described the operation and action of the present invention configured as described above.

First, a product to be deposited is prepared and mounted on the carrier (5).

Then, the carrier 5 is installed on the moving rail part 40 by opening the front door part of the first chamber 10 and then closing the door part.

In this state, the inside of the first chamber 10 is pumped up to a vacuum degree (5.0 E-5 torr) that can be deposited by a vacuum pump.

When the vacuum of the first chamber is completed, the gate valve 51 between the first chamber 10 and the second chamber 20 is opened, and the carrier 5 in the first chamber is moved to the moving rail part 40. Move to the second chamber 20.

At this time, the second chamber maintains a vacuum capable of depositing, and the product of the carrier moved from the first chamber performs the deposition of the product in the same manner as the conventional e-beam method.

That is, while rotating the carrier 5 by the rotary drive unit 80 to deposit the product surface in a two-beam method by the material evaporated in the deposition unit 70.

At this time, the material is a metal and multi-deposition using a material having a different refractive index (for example, Ti02, SiO2, ZrO2) and metal materials (Ni, Cr, Al) and the like to implement a variety of colors as well as color changes depending on the viewing angle It is possible to realize shiny luster.

In this way, during the deposition process in the second chamber by the e-beam method, the vacuum state of the first chamber is discarded, and the carrier 5 on which the new product is mounted is installed on the moving rail part 40. After that, it is prepared by pumping to a vacuum degree capable of deposition as described above.

When the deposition operation is completed in the second chamber, the gate valve 52 between the second chamber 20 and the third chamber 30 is opened and the carrier 5 in the second chamber is moved to the moving rail part ( 40 to move to the third chamber (30).

At this time, the third chamber 30 is in a vacuum state.

In addition, the carrier 5 mounted with the new product in the first chamber 10 is moved to the second chamber 20.

Moving the deposited carrier to the third chamber as described above, the gate valve 52 is blocked and the vacuum of the third chamber 30 is discarded, and the door part is opened to recover the carrier 5 so that the deposited product is removed. You will get

As such, the carrier installation, deposition, and carrier recovery of the first, second, and third chambers 10, 20, 30 are performed in a continuous operation.

Accordingly, the present invention is a metal of the product which is an advantage of the conventional two-beam method because the installation of the carrier, the deposition, the number of carriers by the first, second and third chambers sequentially work in the two-beam method of the conventional deposition process in a single chamber And increasing the production quantity of the product while continuously performing the deposition operation of the product in the second chamber together with the multi deposition.

5: carrier
10: first chamber 20: second chamber
30: third chamber 70: vapor deposition
51,52: gate valve

Claims (2)

In the e-beam deposition apparatus,
A first chamber 10 for installing a carrier 5 on which a product is mounted;
A second chamber 20 for depositing a product of the carrier 5 moved in the first chamber by an e-beam method by a material evaporated from the deposition unit 70;
In parallel configuration of the third chamber (30) for recovering the carrier (5) is completed in the second chamber and moved, in an inline manner,
The first, second and third chambers 10 and 20 and 30 have a vacuum pump which is installed for the internal vacuum or the vacuum breaker, and a moving rail part 40 for sequentially moving the carrier 5, 2. The two-beam inline deposition apparatus of claim 1, wherein the first and second chambers (10, 20, 30) are installed and configured to open and close a gate valve (51) (52).
The method of claim 1,
The moving rail part 40 is formed in an endless track shape so as to sequentially move the carrier 5 to the first, second, and third chambers 10, 20, 30, and then return to the first chamber 10 again. Two-beam type inline deposition apparatus, characterized in that made.

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