KR20100130669A - Photovoltaic fiber, apparatus and method of manufacturing the same - Google Patents

Abstract

PURPOSE: An optical transfer manufacturing method preparing the base of an active type electronic fabric device is provided to utilize recycle energy by using photovoltaic fabric as a solar energy. CONSTITUTION: An automatic transfer unit(10) automatically supplies a thin film-type photovoltaic film to the back-end of a film transfer line. Supporting film supports the film in at least two places. An input roller(12) and an output roller(14) perform lead-in and withdrawal of the film. A film guide(15) guides the driving of the film. An automatic cutting unit subdivides the film to a plurality of photoelectric slit yarns. A slitter support roller supports a slitter. The slitter cuts out film with a plurality of strands.

Description

Photovoltaic fiber, apparatus and method of manufacturing the same

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoelectric yarn and a method of manufacturing the same which can be variously applied to everyday living environments, and more particularly, to utilize slit yarn or monofilament fiber or conjugate fiber. The present invention relates to a photovoltaic cell having a photovoltaic function and elasticity, and to a photovoltaic cell capable of manufacturing various photoelectric fabrics using the photovoltaic cell, and a manufacturing apparatus and a method thereof.

In particular, the present invention relates to a photoelectric company, and an apparatus and method for manufacturing the same, which can overcome the limitations of the flexibility of the solar cell, thereby expanding the application range of the solar cell and promoting the industrialization of the photovoltaic textile. will be.

Recently, with the increasing interest in clean energy around the world, photoelectric conversion technology for converting solar energy into electrical energy is being developed in full swing.In the future daily life, electrical energy converted from solar energy will be used in notebooks, mobile phones, PDAs, It is expected to be used as an energy source for various devices such as clothes, handbags, tents, and awnings.

In order to use such solar energy freely in daily life, it is impossible with the current rigid form of solar cell. The hard form of solar cells is dependent on location and environment. Nevertheless, the current research on solar cells is mostly aimed at increasing efficiency, and the research on improving the physical structure of photovoltaic materials and solar cells is very rare. As a result, current technologies have difficulty overcoming these environmental limitations.

The utilization of solar energy can be improved by solar cells of structures that are independent of space and environment, and thus, solar cells must be advanced into the household goods industry in the form of installation industry. To do this, it is necessary to secure the stability of mechanical shocks and chemicals experienced in daily life, and to restore external forces such as bending and tension, and the industrial friendliness and production that can be easily incorporated into household goods. It must have the same basic requirements as the foundation.

Recently, many efforts have been made to make flexible solar cells such as dye-sensitized solar cells and polymer solar cells. Such flexible solar cells are in the form of two-dimensional film and use inorganic electrodes, but have some degree of bending, but are poor in torsional rigidity or tensile property.

In addition, the industry-friendliness of solar cells is also a problem, the environment far from the production base of household goods can give a lot of difficulties during the transplant process of solar cells. Partial transplantation from this process can reduce the amount of light that can be received, resulting in inefficient results.

Only by overcoming these technological and socio-economic problems will the solar energy be used as an industry-friendly and efficient energy source without being constrained by space and environment as a clean energy source. Recently, fabric-based solar cells have emerged as an alternative to improve utilization of such clean energy sources.

In order to solve the scientific, technological and socioeconomic problems of solar cells, the following issues must be identified academically and industrially.

First, the photoelectric fabrics required for weaving should be developed. Second, photoelectric fabrics with high photoelectric conversion efficiency should be proposed by developing an electro-textile interface means through an interdisciplinary approach with adjacent academic fields. will be.

On the other hand, fabrics (textiles) are a typical material having a high elasticity while being used a lot in everyday life, and since such fabrics can be used for exterior of household goods, it will be an optimal material for receiving solar energy. Therefore, it is very meaningful to make solar energy by adding photoelectric function to the fabric. The use of fabrics is not only for clothing but also for construction and interior, interior and exterior materials of automobiles and aircrafts. Therefore, if photoelectric fabrics with photoelectric function are developed, they can be widely used beyond space and environment. It will be beyond imagination. This is because solar energy can be used as energy sources in interior and exterior materials such as curtains as well as clothes, hats and bags. The increase in the applicable environment indicates that arithmetically a large amount of renewable energy can be utilized, and the positional dependence of energy can be overcome, so the development of the optoelectronic fabric is required.

Optoelectronic fabric has the advantage of trying various electrode configurations that can increase the efficiency of solar cells by utilizing the conventional weaving, knitting technology, non-woven fabric, laminating techniques of the textile industry.

Fabrics come in a wide variety of forms, from traditional plain weaves with orthogonal weft to weft to nanowebs, which are atypical and complex. If these technologies are used in solar cell manufacturing, efficient and breakthrough electrode construction will be easy.

Recently, research on smart fabrics and garments fused with IT, NT, BT, etc. has been actively conducted in the textile and clothing field. By implementing the functions of electronic devices in the fabric, smart clothing such as MP3 player clothing and bio monitoring shirts have been commercialized, and prototypes of emotional smart clothing such as photonic clothing and hug shirts have been proposed. As such, textiles can achieve new levels of achievement through convergence with technologies such as IT, NT, and BT.

The technical problem to be achieved by the present invention, by using a slit yarn or monofilament yarn or a composite fiber technology to produce a photoelectric function having a photoelectric function and elasticity, and to produce a variety of photoelectric fabrics using the photoelectric yarn, It is an object of the present invention to provide a photoelectrically applicable device and a method for manufacturing the same.

Another technical problem to be solved by the present invention is to allow photovoltaic and its use to expand the scope of solar cells and to promote the industrialization of photovoltaic fabrics, by overcoming the limitations of the flexibility of solar cells. It is to provide a manufacturing apparatus and method.

The photoelectric yarn according to the first embodiment of the present invention for achieving the above object is a photoelectric yarn, formed by cutting a plurality of strands along the longitudinal direction from a thin film photoelectric film of a flexible material coated on both sides.

The photoelectric manufacturing apparatus according to the first embodiment of the present invention is installed on the front end of the film transfer line, a plurality of support rollers are installed side by side on the base of the film transfer line to support the film at least two places or more. And an inlet roller, an inlet roller, an outlet roller, and a film guide for guiding the running of the film, while being installed on the upper side of each support roller while pressing the film, thereby automatically supplying the thin film type photoelectric film to the rear end of the film transfer line. Automatic transfer unit; It is installed at the rear end of the film feed line, the slitter support roller is installed on the base of the film feed line to support the film supplied to the slitter, and is installed on the upper part of the slitter support roller and supplied from the automatic feeder. It consists of a slitter that is cut into a plurality of strands while pressing the film, an automatic incision for subdividing the thin-film photoelectric film into a plurality of photoelectric slit yarns.

Optoelectronic manufacturing method according to the first embodiment of the present invention, the automatic transfer process for transferring the thin film-type photoelectric film supplied to the film transfer line from the outside to the rear end of the film transfer line through a plurality of support rollers, the introduction roller and the take-out roller; And an automatic subdividing process of cutting the thin film type photoelectric film transferred through the automatic transfer process into a plurality of strands through a slitter and subdividing into a slit yarn having flexibility.

The photoelectric according to the second embodiment of the present invention for achieving the above object, the core fiber is extended in length than the original fiber length by the external force; A lower electrode formed of an electrode material on an outer circumferential surface of the expanded core fiber; A photoactive layer formed of a photoelectric material on an outer circumferential surface of the lower electrode; An upper electrode formed of an electrode material on an outer circumferential surface of the photoactive layer; A protective film formed of an insulating material on an outer circumferential surface of the upper electrode; It consists of, photoelectric radiation.

The photovoltaic manufacturing method according to the third embodiment of the present invention includes preparing a fiber to be used as a core, and expanding the core fiber to form a core fiber having a length longer than the original fiber length; A lower electrode forming step of forming a lower electrode by coating an electrode material on an outer circumferential surface of the expanded core fiber; A photoactive layer forming step of forming a photoactive layer by coating a photoelectric material on an outer circumferential surface of the lower electrode; An upper electrode forming step of forming an upper electrode corresponding to the lower electrode by coating an electrode material on an outer circumferential surface of the photoactive layer; It includes a protective film forming step of forming a protective film by coating an insulating material on the outer peripheral surface of the upper electrode.

The photoelectric yarn according to the third embodiment of the present invention for achieving the above object, the metal microfiber (or conductive polymer fibers) used as the lower electrode and the core; A photoactive layer formed of a photoelectric material on an outer circumferential surface of the micro fine yarn; An upper electrode formed of an electrode material on an outer circumferential surface of the photoactive layer; And a coating layer formed of an insulating material on an outer circumferential surface of the upper electrode.

In one embodiment of the photoelectric fabrication method according to a third embodiment of the present invention, the electrode / photoactive layer forming step of forming a lower electrode and a photoactive layer by coating a photoelectric material on a metal microfiber (or conductive polymer fiber) to be used as the lower electrode ; An upper electrode forming step of forming an upper electrode by coating an electrode material on an outer circumferential surface of the photoactive layer; It includes a coating layer forming step of forming a coating layer by coating an insulating material on the outer peripheral surface of the upper electrode.

In the photoelectric fabrication method according to the fourth embodiment of the present invention, a conductive polymer material for forming a lower electrode and a core, an organic semiconductor material for forming a photoactive layer, and an optical spacer material are discharged from a triple coaxial electrospinning nozzle. A triple coaxial electrospinning step of forming a lower electrode layer, an organic semiconductor layer, and a spacer layer; And an upper electrode forming step of forming an upper electrode by conducting a conductive coating of an electrode material on an outer circumferential surface of the spacer layer.

According to the present invention, it will be able to lay the foundation for fabric-based active electro-textile devices, and also to secure the source technology for developing fibers with active / passive electronic functions. There will be advantages.

In addition, according to the present invention, since the fiber can be applied to industrial clothing such as defense functional clothing and building materials, automotive / ship / aviation, furniture, etc., in addition to clothing, the photovoltaic fabric developed through the present invention has all the above-mentioned environment Various applications will be possible.

In addition, according to the present invention, by using a photovoltaic fabric as a solar cell it will be able to utilize a lot of renewable energy, it will also be able to overcome the positional dependence of energy.

Hereinafter, with reference to the accompanying drawings will be described in detail the photoelectric yarn, the optoelectronic fabric and a manufacturing method according to a preferred embodiment of the present invention.

1 is a conceptual diagram of a photoelectric manufacturing process according to a first embodiment of the present invention, the photoelectric yarn 101 of the first embodiment according to the present invention may be manufactured from a thin film type photoelectric film 100 through a slit yarn manufacturing process, and automatically Consists of a transfer unit 10 and the automatic incision 20.

As shown in FIG. 1, the automatic transfer unit 10 is installed at the front end of the film transfer line, and is arranged side by side on the base 16 of the film transfer line to support the film in at least two places. An introduction roller 12 and an extraction roller 14 which are installed on the support rollers 11 and 13 and the support rollers 11 and 13 and which draw in and out the film while pressing the film drawn into the roller from the top; And a film guide 15 for guiding the running of the film from both sides, and automatically supplies the thin film photoelectric film 100 to the rear end of the film transfer line.

The automatic cutout 20 is installed at the rear end of the film transfer line, and is mounted on the base 16 of the film transfer line and is supported by the slitter support roller 21 for supporting the film supplied to the slitter 22. , A slitter supporter 23 installed at an upper portion of the slitter support roller to support the slitter, and a slitter 22 fixed to the slitter supporter and cut into multiple strands while pressing the film supplied from the automatic feeder from the top. The thin film photoelectric film 100 is subdivided into photoelectric yarns 101, ie, photoelectric slit yarns, which are slit in plural numbers along the longitudinal direction of the film.

The thin film type photoelectric film 100 includes an inorganic semiconductor photoelectric device including a polymer of a flexible material coated on both sides of a photoelectric material and CIGS (CuIn _x Ge _1-x Se ₂ ), CdTe, and CdMnTe.

In the photoelectric manufacturing process by the manufacturing apparatus as described above, the photoelectric yarn 101 can be manufactured from the thin film type photoelectric film 100 through an automatic transfer process and a granular process.

In the automatic transfer process, the thin film photoelectric film 100 supplied from the outside to the film transfer line is transferred to the rear end of the film transfer line through the plurality of support rollers 11 and 13, the introduction roller 12, and the extraction roller 14. . At this time, the film guide 15 formed on the side guides the thin film type photoelectric film 100 to proceed correctly along the driving direction.

In the segmentation process, the thin film photoelectric film 100 transferred through the automatic transfer process is cut into a plurality of strands through the slitter support roller 21 and the slitter 22 to be automatically segmented into slit photoelectric yarn 101.

2 is a conceptual diagram illustrating a photoelectric fabrication process according to a second embodiment of the present invention. The photoelectric yarn 200 according to the second embodiment of the present invention includes a core fiber 201, a lower electrode 202, and a photoactive layer 203. ) And an upper electrode 204 and a protective film 205, and from the stretchable core fiber, a manufacturing process as shown in FIG. It may be prepared through a step, a protective film forming step, a buckle forming step.

Core fiber 201 is to prepare a stretchable fiber to be used as a core, by applying an external force through the core fiber expansion step, the length is increased by the external force has a length that is extended than the original core fiber (201a) length It is preferable to use.

The lower electrode 202 is formed through the lower electrode forming step, and is formed by coating an electrode material on the outer circumferential surface of the expanded core fiber.

The photoactive layer 203 is formed on the outer circumferential surface of the lower electrode through the photoactive layer forming step, and is formed by coating a photoelectric material composed of a polymer composite or a solution-based inorganic material.

The upper electrode 204 is formed by coating an electrode material with a transparent material on the outer circumferential surface of the photoactive layer through the upper electrode forming step.

The protective film 205 is formed by coating an insulating material on the outer circumferential surface of the upper electrode through a protective film forming step, and the insulating material is preferably made of a flexible material that is transparent and free to expand or contract.

The photovoltaic cell according to the second embodiment manufactured as described above is subjected to the step of returning the extended length photoelectric beam 200 having the protective film to its original length, thereby showing wrinkles on the surface thereof as shown in FIG. 2. The photoelectric yarn 200a having wrinkles may be formed, and the photoelectric yarn 200a having wrinkles formed on the surface thereof may be freely stretched, compressed, or bent as necessary. In particular, in the case of photoelectric wrinkles formed on the surface, the photoelectric device materials coated thereon are subjected to compressive stress, and buckling occurs to form wrinkles on the surface to alleviate the stress. The corrugated photoelectric fiber is flat when stretched from the outside, and reacts to external force by changing to a corrugated form when a compressive force in the longitudinal direction is applied from the outside. In the case of lateral bending of the fiber, the outer side is stretched and the inner side is more corrugated, which reacts to external forces. As a result, it is possible to implement a fiber-optoelectronic device having both flexibility and elasticity.

3 is a conceptual diagram illustrating a photoelectric fabrication process according to a third embodiment of the present invention, the photoelectric yarn 300 of the third embodiment according to the present invention is a metal microfiber including stainless steel, aluminum, copper, molybdenum ( Or a conductive polymer fiber) 301, a photoactive layer 302, 303, an upper electrode 304, and a protective film (not shown in the drawing), and the elastic metal microfiber (or conductive polymer fiber) as shown in FIG. It may be manufactured through a manufacturing process, that is, an electrode / photoactive layer forming step, an upper electrode forming step, and a coating layer forming step.

Metal microfiber (or conductive polymer fiber) 301 is a flexible material that can be used as the lower electrode and the core, it may be made in the form of a spring, a variety of metal microfiber including stainless steel, aluminum, copper, molybdenum It may be used and may vary depending on the type of semiconductor to be coated. As the conductive polymer that can be used as another lower electrode and core, various polymers including PEDOT / PSS mixture, polyaniline, polypyrrole can be used, and the material to be used may also be determined depending on the band gap of the organic semiconductor to be coated.

The photoactive layers 302 and 303 are formed by coating a photoelectric material on an outer circumferential surface of the metal microfiber (or conductive polymer fiber) to be used as a lower electrode, and the semiconductor layer 302 and the precursor layer 303 are formed through an electrode / photoactive layer forming step. Is formed. In this electrode / photoactive layer formation step, the first semiconductor is deposited by depositing inorganic semiconductor photoelectric nanoparticles including CIGS (CuIn _x Ge _1-x Se ₂ ), CdTe, and CdMnTe on the metal microfiber (or conductive polymer fiber) 301. The semiconductor layer 302 may be formed by forming a layer and forming a second semiconductor layer by coating one material selected from CdS and ZnS on the outer circumferential surface of the first semiconductor layer. In the organic material-based material, the inner electrode is composed of an organic conductive polymer such as PDOT / PSS in the innermost layer, an organic polymer semiconductor including P3HT is formed in the second layer, and the sol is formed in the third layer. Layered metal oxides comprising TiO ₂ , which are capable of gel technique. After this operation, an outer electrode is formed by coating the outermost metal. Here, the metal oxide including TiO ₂ not only forms the fiber of the cylinder structure but also serves as a spacer between the metal and the organic semiconductor. Organic conductive polymers for internal electrodes that can be used in this structure may be conjugated polymers including pure PDOT, a mixture of PDOT / PSS, polyaniline, polypyrrole, polyphenyline. As the organic semiconductor layer, polythiophene-based semiconductors and mixtures thereof represented by P3HT and P3OT can be used. As the spacer, various kinds of sol-gel oxides including TiO ₂ , SiO ₂ , SnO ₂ are possible. The external electrode may be a variety of metal materials including aluminum, gold, copper, silver, molybdenum, tungsten and the like.

The upper electrode 304 is formed by coating a nanometer-level metal film on the outer circumferential surface of the precursor layer 303 of the photoactive layer through an upper electrode forming step, and by electroless plating, and metal-doped ZnO. , SnO ₂ is formed as a transparent electrode by coating any material selected from the solution process.

The coating layer is formed by coating an insulating material on the outer circumferential surface of the upper electrode through a coating layer forming step, and is made of any one material selected from polypropylene (Polypropylene) and PET (polyethylene terephthalate) polymers with weak crystallinity.

4 is a conceptual diagram illustrating a photoelectric fabrication process according to a fourth embodiment of the present invention. The photoelectric radiation 400 according to the fourth embodiment of the present invention includes a lower electrode layer 401, an organic semiconductor layer 402, and a spacer. A layer 403, an upper electrode 404, and a protective film, including a stretchable polymer material, an organic semiconductor material, and an optical spacer material, which are conductive, are manufactured using a triple coaxial electrospinning apparatus as shown in FIG. That is, it can be manufactured through the triple coaxial electrospinning step, the upper electrode forming step, the coating layer forming step.

In the triple coaxial electrospinning step, the electrode polymer including PEDOT / PSS, polypyrrole, and polyaniline forming the lower electrode layer has an active layer including P3HT / PCBM forming an organic semiconductor layer at an inner nozzle of the triple coaxial electrospinning apparatus. The mixture is discharged from the center nozzle of the triple coaxial electrospinning apparatus, and the oxide precursor containing TiOx to be used as the optical spacer is discharged from the outer nozzle of the triple coaxial electrospinning apparatus, respectively, so that the lower electrode layer 401 and the organic semiconductor layer 402 are discharged. The spacer layer 403 is formed.

The lower electrode layer 401 is made of an electrode polymer material including PEDOT / PSS, polypyrrole, and polyaniline to form a core, and the lower electrode layer by the conductive polymer material is discharged from the inner nozzle of the triple coaxial electrospinning apparatus. To form.

The organic semiconductor layer 402 is made of a mixed photoelectric material containing P3HT / PCBM to form a photoactive layer, and the organic semiconductor layer by the photoelectric material is formed by ejecting it from the center nozzle of the triple coaxial electrospinning apparatus. .

The optical spacer of the spacer layer 403 is made of an oxide containing TiOx and is formed by ejecting it from the outer nozzle of the triple coaxial electrospinning apparatus.

The upper electrode 404 is formed by coating an electrode material on the outer circumferential surface of the precursor layer 403 of the photoactive layer through the upper electrode forming step, and a transparent electrode material containing ZnO, SnO ₂ doped with metal in a solution process The coating is formed into a transparent electrode.

The coating layer is formed by coating an insulating material on the outer circumferential surface of the upper electrode through a coating layer forming step, and uses an engineering plastic material such as polypropylene (Polypropylene), PET (polyethylene terephthalate), or PEN with weak crystallinity as a material.

FIG. 5 is a reference photograph illustrating a knitting method of fabricating an optoelectronic fabric using the photoelectric fabric manufactured by the photoelectric fabrication process of FIG. 1, and is formed by the slitted photoelectric fabric 101 as well as the second to fourth embodiments. Each of the optoelectronics 200, 300, 400 is also woven (a), piece (b), embroider (c), quilting (d), printing (e), as illustrated in (a) to (f) of FIG. Optoelectronic fabrics will be able to be fabricated using a variety of textile (textile) methods, such as braiding (f).

In the case of using the photoelectric device according to the present invention, when manufacturing a digital device such as a mobile phone, it is expected that the smart textile can be manufactured by weaving a Jacquard loom rather than manufacturing a PCB in a plastic housing. If we make the most of these technologies and apply them to the field of renewable energy, we are confident that we will be able to create new fields of green growth with academic and industrial synergy.

1 is a conceptual diagram illustrating a photoelectric manufacturing process according to a first embodiment of the present invention.

2 is a conceptual diagram illustrating a photoelectric manufacturing process according to a second embodiment of the present invention.

3 is a conceptual diagram illustrating a photoelectric manufacturing process according to a third embodiment of the present invention.

4 is a conceptual diagram illustrating a photoelectric manufacturing process according to a fourth embodiment of the present invention.

5 is a reference photograph illustrating a method of manufacturing an optoelectronic fabric using any one photoelectric fabric produced by the photoelectric fabrication process of FIGS. 1 to 4.

<Explanation of symbols for the main parts of the drawings>

10: automatic feed unit 11, 13: support roller

12: drawing roller 14: drawing roller

15: film guide 16: base

20: automatic incision 21: slitter support roller

22: slitter 23: slitter support

100: thin film type photoelectric film 101,200,300,400: photoelectric

201,201a: core fiber 202: lower electrode

203: photoactive layer 204: upper electrode

205: protective film 301: metal microfiber

302,303 photoactive layer 304: upper electrode

401: lower electrode layer 402: organic semiconductor layer

403: spacer layer 404: upper electrode

Claims (25)

A plurality of support rollers installed at the front end of the film conveying line and spaced apart side by side on the base of the film conveying line to support the film at least at two or more places, An automatic feeder (10) configured to automatically pull in and pull out the roller and the draw roller, and a film guide for guiding the running of the film, to automatically supply the thin film type photoelectric film to the rear end of the film transfer line; It is installed at the rear end of the film feed line, the slitter support roller is installed on the base of the film feed line to support the film supplied to the slitter, and is installed on the upper part of the slitter support roller and supplied from the automatic feeder. Optoelectronic manufacturing apparatus characterized in that consisting of; a slitter which is cut into a plurality of strands while pressing the film to be divided into an automatic incision (20) for subdividing the thin film type photoelectric film into a plurality of photoelectric slit yarns. An automatic transfer process for transferring the thin film type photoelectric film supplied from the outside to the film transfer line to the rear end of the film transfer line through a plurality of support rollers, an introduction roller, and an extraction roller; And an automatic subdivision process of cutting the thin film type photoelectric film transferred through the automatic transfer process into multiple strands through a slitter and subdividing into slit yarns. The photoelectric yarn produced by the manufacturing method of claim 2, wherein the photoelectric material is formed by cutting a plurality of strands along the longitudinal direction from a thin film photoelectric film of a flexible material coated on both sides. The method of claim 3, wherein the thin film photoelectric film, Optoelectronics comprising a polymer and an inorganic semiconductor-based thin-film photoelectric device including CIGS (CuIn _x Ge _1-x Se ₂ ), CdTe, CdMnTe. Core fiber 201a; A lower electrode 202 formed of an electrode material on an outer circumferential surface of the core fiber; A photoactive layer 203 formed of a photoelectric material on an outer circumferential surface of the lower electrode; An upper electrode 204 formed of an electrode material on an outer circumferential surface of the photoactive layer; A protective film 205 formed of an insulating material on an outer circumferential surface of the upper electrode; Photoelectric photoelectric comprising a. A lower electrode forming step of forming a lower electrode by coating an electrode material on an outer circumferential surface of a fiber to be used as a core; A photoactive layer forming step of forming a photoactive layer by coating a photoelectric material on an outer circumferential surface of the lower electrode; An upper electrode forming step of forming an upper electrode corresponding to the lower electrode by coating an electrode material on an outer circumferential surface of the photoactive layer; And a protective film forming step of forming a protective film by coating an insulating material on the outer circumferential surface of the upper electrode. A core fiber 201 extended in length from the original fiber length by an external force; A lower electrode 202 formed of an electrode material on an outer circumferential surface of the expanded core fiber; A photoactive layer 203 formed of a photoelectric material on an outer circumferential surface of the lower electrode; An upper electrode 204 formed of an electrode material on an outer circumferential surface of the photoactive layer; A protective film 205 formed of an insulating material on an outer circumferential surface of the upper electrode; Photoelectric photoelectric comprising a. Preparing a fiber to be used as a core, the core fiber expansion step of forming a core fiber extending in length than the original fiber length; A lower electrode forming step of forming a lower electrode by coating an electrode material on an outer circumferential surface of the expanded core fiber; A photoactive layer forming step of forming a photoactive layer by coating a photoelectric material on an outer circumferential surface of the lower electrode; An upper electrode forming step of forming an upper electrode corresponding to the lower electrode by coating an electrode material on an outer circumferential surface of the photoactive layer; And a protective film forming step of forming a protective film by coating an insulating material on the outer circumferential surface of the upper electrode. The method of claim 8, And a buckling forming step of returning the photoelectric yarn of the extended length in which the protective film is formed to the original length to form a wrinkle on the surface thereof. The method according to claim 8, wherein the photoactive layer, Optoelectronics manufacturing method characterized in that formed of a photoelectric material consisting of a polymer composite or a solution-based inorganic material. The method of claim 8, wherein the upper electrode, The photoelectric manufacturing method characterized in that formed of a transparent material. The method of claim 8, wherein the protective film, A photovoltaic manufacturing method comprising a flexible material that is transparent and free to expand or contract. The photoelectric yarn produced by the manufacturing method of any one of Claims 6 or 8-12. A metal microfiber (or conductive polymer fiber) 301 used as a lower electrode and a core; Photoactive layers 302 and 303 formed of a photoelectric material on an outer circumferential surface of the metal microfiber (or conductive polymer fiber); An upper electrode 304 formed of an electrode material on an outer circumferential surface of the photoactive layer; And a coating layer formed of an insulating material on an outer circumferential surface of the upper electrode. An electrode / photoactive layer forming step of forming a lower electrode and a photoactive layer by coating a photoelectric material on a metal microfiber (or conductive polymer fiber) to be used as the lower electrode; An upper electrode forming step of forming an upper electrode by coating an electrode material on an outer circumferential surface of the photoactive layer; And a coating layer forming step of forming a coating layer by coating an insulating material on the outer circumferential surface of the upper electrode. The method of claim 15, wherein the metal microfiber, Optoelectronics manufacturing method characterized in that the spring form. The method of claim 15, wherein the metal microfiber, A photoelectric manufacturing method comprising: any one material selected from stainless steel, aluminum, molybdenum, and copper. The method of claim 15, wherein forming the photoactive layer, Forming a first semiconductor layer by depositing inorganic semiconductor nanoparticles including CIGS (CuIn _x Ge _1-x Se ₂ ), CdTe, and CdMnTe on a metal microfiber (or conductive polymer fiber) used as a core; And forming a second semiconductor layer by coating any one material selected from CdS and ZnS on an outer circumferential surface of the first semiconductor layer. The method of claim 18, wherein the photoactive layer forming step, And coating an oxide material on an outer circumferential surface of the second semiconductor layer to form a precursor layer to be used as an optical spacer. The method of claim 15, wherein the upper electrode, The photoelectric manufacturing method characterized in that the coating of any one of the metal-doped ZnO, SnO ₂ transparent electrode material selected by a solution process to form a transparent electrode. The method of claim 16, wherein the coating layer, Optoelectronic manufacturing method, characterized in that made of an engineering plastic material selected from polypropylene (Polypropylene), polyethylene terephthalate (PET), PEN weakened crystallinity. 22. A photovoltaic fabric produced by the method according to any one of claims 15 to 21. The conductive polymer material for forming the lower electrode and the core, and the organic semiconductor material and the spacer material for forming the photoactive layer are discharged from the triple coaxial electrospinning nozzle, so that the lower electrode layer 401, the organic semiconductor layer 402, and the optical Triple coaxial electrospinning step of forming the spacer layer 403; And an upper electrode forming step of forming an upper electrode (404) by coating a metal film of an electrode material on an outer circumferential surface of the spacer layer. The method of claim 23, wherein the three-charge coaxial electrospinning step, Polymers for electrodes containing PEDOT / PSS, polypyrrole, and polyaniline can be found in the coaxial inner nozzle, the active layer mixture containing the semiconductor layer P3HT / PCBM in the middle nozzle, and the oxide precursor containing TiOx to be used as the optical spacer. A photovoltaic manufacturing method comprising: discharging from the nozzles to form a lower electrode layer, an organic semiconductor layer, and a spacer layer, respectively. A photovoltaic fabric produced by the method according to any one of claims 23 to 24.

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