KR20100129991A - Vbb level sensor apparatus of semiconductor memory apparatus - Google Patents
Vbb level sensor apparatus of semiconductor memory apparatus Download PDFInfo
- Publication number
- KR20100129991A KR20100129991A KR1020090048627A KR20090048627A KR20100129991A KR 20100129991 A KR20100129991 A KR 20100129991A KR 1020090048627 A KR1020090048627 A KR 1020090048627A KR 20090048627 A KR20090048627 A KR 20090048627A KR 20100129991 A KR20100129991 A KR 20100129991A
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- level
- voltage
- vbb
- bias voltage
- operating temperature
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
- G11C5/143—Detection of memory cassette insertion or removal; Continuity checks of supply or ground lines; Detection of supply variations, interruptions or levels ; Switching between alternative supplies
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
- G11C5/145—Applications of charge pumps; Boosted voltage circuits; Clamp circuits therefor
- G11C5/146—Substrate bias generators
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
- G11C7/04—Arrangements for writing information into, or reading information out from, a digital store with means for avoiding disturbances due to temperature effects
Abstract
Description
The present invention relates to a semiconductor memory device, and more particularly, to a substrate bias voltage level sensing device of a semiconductor memory device.
Due to the high speed, high density, and low power of semiconductor memory devices, internal voltages have been used in semiconductor memory devices. The internal voltage is generated using a method of generating a reference voltage and charge pumping or down-converting the generated reference voltage. Typical internal voltages using charge pumping include boost voltage and substrate bias voltage (VBB). In addition, a representative internal voltage using down-converting or the like is a core voltage.
In general, the boosted voltage is a voltage for applying a potential higher than the external voltage VDD to the gate of the cell transistor when the cell data is accessed so that there is no loss of the cell data.
In addition, the substrate bias voltage VBB is used to increase the safety and reduce the channel leakage current by reducing the change in the threshold voltage Vt due to the body effect on the cell transistor. That is, in order to prevent loss of data stored in the cell transistor, the voltage for applying a bias voltage lower than the ground voltage VSS to the substrate of the cell transistor.
In addition, the core voltage CORE reduces the power loss of the core CORE and down-converts the external voltage VDD for stable operation of the core. It is the voltage that causes a constant potential to form against fluctuations.
The internal voltage generators for generating the internal voltages VPP, VBB, and VCORE described above are designed to operate with a constant deviation within the operating voltage range and the operating range temperature of the semiconductor memory device.
In general, in order to drive the semiconductor memory, an external voltage VDD is applied to the semiconductor memory, and the power-up signal is enabled when a predetermined potential is sufficient to operate the semiconductor memory.
At this time, when the power-up signal is enabled, the semiconductor memory device starts to generate internal power through charge pumping and down-converting.
Hereinafter, an apparatus for detecting a substrate bias voltage level of a general semiconductor memory will be described with reference to FIGS. 1 and 2.
1 is a block diagram illustrating a substrate bias voltage level sensing device according to the prior art.
Referring to FIG. 1, a conventional substrate bias voltage level sensing device includes a
The
The
The VBB pump enable signal VBB_PUMP_EN is a signal for operating a VBB pump (not shown).
2 is a waveform diagram of a substrate bias voltage target level according to the prior art.
Referring to FIG. 2, the reference voltage VREF maintains a constant level regardless of the operating temperature. The VBB target level is a target level value of the substrate bias voltage VBB and has a dependency on the reference voltage VREF.
That is, it can be seen that the conventional VBB target level is independent of the operating temperature and has a dependency on the reference voltage VREF generating the gate bias voltage. Therefore, in order to adjust the VBB target level, the control unit may only adjust the level of the reference voltage VREF or adjust the size of the transistor in the
In general, the substrate bias voltage VBB is used to increase the data retention time by increasing the threshold voltage of the cell transistor. However, when the threshold voltage of a cell transistor is high, a large amount of time is required to charge a cell with a desired amount of charge because a high threshold voltage must be overcome in order to write data to the cell during a write operation. need. This phenomenon becomes more severe as the temperature decreases, because the threshold voltage of the cell transistor increases as the temperature decreases.
However, as described above, the substrate bias voltage (VBB) level sensing device according to the prior art tends to maintain a constant threshold value of the VBB target level as the operating temperature decreases, thereby increasing the threshold voltage of the cell transistor. And eventually cause a tWR (time write recovery) failure.
Accordingly, an object of the present invention is to change the VBB target level according to the operating temperature so as to correspond to the threshold voltage of the cell transistor that changes according to the change in operating temperature. It is an object of the present invention to provide a substrate bias voltage level sensing device of a semiconductor memory device capable of improving the work loss.
The bias voltage sensing device of the semiconductor memory device of the present invention for achieving the above object is a temperature sensing unit for outputting a temperature sensing signal having a voltage level that is changed in accordance with a change in operating temperature by applying an external voltage, the temperature sensing signal and A VBB pump receiving a reference voltage and receiving a bias generator for varying levels of the first and second bias voltages according to the voltage level of the temperature sensing signal, and the first and second bias voltages and the substrate bias voltage; And a VBB sensor generating an enable signal and controlling whether the VBB pump enable signal is activated by changing a target level of the substrate bias voltage.
According to the present invention, when the operating temperature is low, the absolute value of the VBB target level is adjusted to be small, and when the operating temperature is high, the absolute value of the VBB target level is adjusted to be large, thereby deteriorating the characteristics of the memory cell transistor according to the change in the operating temperature. It can be improved.
Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.
3 is a block diagram illustrating a substrate bias voltage level sensing device of a semiconductor memory device according to an embodiment of the present invention.
As shown in FIG. 3, the substrate bias voltage (VBB) level sensing apparatus of the present invention includes a
The
The
The
4 is a detailed circuit diagram of the temperature sensor shown in FIG. 3.
As shown in FIG. 4, the
For example, when the operating temperature is lowered, the threshold voltages of the MOS transistors N1 and N2 are increased to reduce the amount of current sink flowing to the first node A. At this time, the output voltage is output from the first node A. The level of the temperature sensing signal DET_Th is lowered.
On the contrary, when the operating temperature increases, the threshold voltage of the MOS transistor decreases to increase the amount of current sinking to the first node A. Thus, the level of the temperature sensing signal DET_Th output from the first node A is increased. Is higher than the low temperature. That is, the voltage level of the temperature detection signal DET_Th is changed according to temperature.
More specifically, the
FIG. 5 is a detailed circuit diagram of the bias generator illustrated in FIG. 3.
As illustrated in FIG. 5, the
More specifically, the
The
Next, the
The
More specifically, when the operating temperature is lowered, the degree of turn-on of the second PMOS transistor P2 to which the temperature sensing signal DET_Th of the low voltage level output from the
Therefore, the first bias voltage VSN output from the second node node B is output at the 'low' level, and the second bias voltage VSP output from the third node node C is at the 'high' level. Is output.
On the contrary, when the operating temperature increases, the degree of turn-on of the second PMOS transistor P2 to which the temperature sensing signal DET_Th of the high voltage level output from the
Therefore, the turn-on degree of the sixth NMOS transistor N6 to which the voltage of the second node node B is applied increases, and the turn-on degree of the fifth PMOS transistor P5 decreases as the temperature increases. Gets bigger As the amount of current sinking of the sixth NMOS transistor N6 increases, the third node node C has a lower 'low' level.
Therefore, the level of the first bias voltage VSN output from the second node node B is output at a 'high' level, and the level of the second bias voltage VSP output from the third node node C is Output is at the 'low' level.
Hereinafter, a detailed circuit configuration of the
The
6 is a waveform diagram of a substrate bias voltage target level according to an embodiment of the present invention.
As shown in FIG. 6, when the operating temperature decreases, the level of the second bias voltage VSP input to the
As a result, the absolute value of the VBB target level decreases when the operating temperature decreases, thereby increasing the VBB level (absolute value decrease) at low temperature. Therefore, when the operating temperature is low, the threshold voltage increase of the transistor can be attenuated to some extent to prevent tWR failing.
FIG. 7 is an exemplary diagram illustrating a circuit diagram of the VBB sensor illustrated in FIG. 1.
As shown in FIG. 7, the
The
Hereinafter, the operation and configuration of the
When the operating temperature decreases, the second bias voltage applied to the gate of the sixth PMOS transistor P6 at a constant voltage level becomes smaller as the absolute value of the VBB target level decreases as the threshold voltage of the transistor increases. Increase the VSP).
At this time, since the turn-on degree of the eighth NMOS transistor N8 decreases, the voltage level of the fourth node node D requires a voltage lower than the existing level. Therefore, the voltage level of the fifth node node E may be output at a 'high' level to activate the VBB pump enable signal VBB_PUMP_EN output from the sixth node node F.
On the contrary, when the operating temperature is higher than the low temperature, the second bias voltage VSP applied to the gate of the sixth PMOS transistor P6 is increased by increasing the absolute value of the VBB target level according to the change according to the threshold voltage drop of the transistor. By lowering the voltage level of the fourth node (node D) is output to the 'low' level. In this case, the VBB pump enable signal VBB_PUMP_EN output from the sixth node F may be deactivated.
More specifically, a sixth PMOS transistor P6 having a gate terminal applied with the second bias voltage VSP, a source terminal receiving an external voltage VDD, and a drain terminal connected with a fourth node node D, A seventh NMOS transistor N7 having a gate terminal connected to the ground voltage VSS, a drain terminal connected to the fourth node node D, and a source terminal receiving a substrate bias voltage VBB, and a gate terminal connected to the ground voltage VSS. A seventh PMOS transistor P7 is applied with a second bias voltage VSP, a source terminal is applied with an external voltage VDD, a drain terminal is connected to a fifth node node E, and a gate terminal is the fourth node. an eighth NMOS transistor N8 connected to a node D, a source terminal connected to a ground voltage VSS, a drain terminal connected to a fifth node E, and a gate terminal connected to the fifth node E), the source terminal receives the external voltage (VDD), the drain terminal is connected to the sixth node (node F) Is an eighth PMOS transistor P8, a ninth NMOS transistor N9 having a gate terminal connected to the fifth node node E, a drain terminal connected to the sixth node F, and a gate terminal thereof The first bias voltage VSN is applied, the source terminal is connected to the ground voltage VSS, and the drain terminal includes a tenth NMOS transistor N10 connected to the source terminal of the ninth NMOS transistor N9.
Accordingly, the present invention provides a
That is, when the operating temperature is high, the absolute value of the VBB target level is increased, and when the operating temperature is low, the magnitude of the absolute value of the VBB target level is decreased, thereby decreasing the increase of the threshold voltage of the transistor to some extent when the operating temperature is decreased. You can do it. As a result, the tWR can be prevented from occurring when the operating temperature is lowered and the leakage current of the transistor can be cut off.
As such, those skilled in the art will appreciate that the present invention can be embodied in other specific forms without changing the technical spirit or essential features thereof. Therefore, the above-described embodiments are to be understood as illustrative in all respects and not as restrictive. The scope of the present invention is shown by the following claims rather than the detailed description, and all changes or modifications derived from the meaning and scope of the claims and their equivalents should be construed as being included in the scope of the present invention. .
1 is a block diagram showing a substrate bias voltage level sensing device according to the prior art;
2 is a waveform diagram of a substrate bias voltage target level according to the prior art;
3 is a block diagram illustrating a substrate bias voltage level sensing device of a semiconductor memory device according to an embodiment of the present invention;
4 is a detailed circuit diagram of a temperature sensing unit shown in FIG. 3;
5 is a detailed circuit diagram of the bias generator shown in FIG. 3;
6 is a waveform diagram of a substrate bias voltage target level according to an embodiment of the present invention, and
FIG. 7 is an exemplary diagram illustrating a circuit diagram of the substrate bias voltage sensor illustrated in FIG. 3.
<Detailed Description of Main Drawing Codes>
100: temperature sensing unit 200: bias generating unit
300: VBB sensor
Claims (8)
Priority Applications (1)
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KR1020090048627A KR20100129991A (en) | 2009-06-02 | 2009-06-02 | Vbb level sensor apparatus of semiconductor memory apparatus |
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KR1020090048627A KR20100129991A (en) | 2009-06-02 | 2009-06-02 | Vbb level sensor apparatus of semiconductor memory apparatus |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107085447B (en) * | 2016-02-16 | 2022-02-01 | 中芯国际集成电路制造(上海)有限公司 | Pump body structure for multi-time program memory and electronic device |
EP4102505A4 (en) * | 2020-08-27 | 2023-10-04 | Changxin Memory Technologies, Inc. | Memory adjustment method and adjustment system, and semiconductor device |
US11886721B2 (en) | 2020-08-27 | 2024-01-30 | Changxin Memory Technologies, Inc. | Method and system for adjusting memory, and semiconductor device |
-
2009
- 2009-06-02 KR KR1020090048627A patent/KR20100129991A/en not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107085447B (en) * | 2016-02-16 | 2022-02-01 | 中芯国际集成电路制造(上海)有限公司 | Pump body structure for multi-time program memory and electronic device |
EP4102505A4 (en) * | 2020-08-27 | 2023-10-04 | Changxin Memory Technologies, Inc. | Memory adjustment method and adjustment system, and semiconductor device |
US11886721B2 (en) | 2020-08-27 | 2024-01-30 | Changxin Memory Technologies, Inc. | Method and system for adjusting memory, and semiconductor device |
US11928357B2 (en) | 2020-08-27 | 2024-03-12 | Changxin Memory Technologies, Inc. | Method and system for adjusting memory, and semiconductor device |
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