KR20100127511A - Manufacturing method of micro lens array having function of shadow mask - Google Patents

Abstract

PURPOSE: A method for manufacturing a micro lens array with a show mask function is provided to prevent a ghost phenomenon. CONSTITUTION: A chrome film(20) is coated on a quartz board(10). A light sensitive film is coated on the chrome film. A pattern light sensitive film(30') is formed by exposing and developing the light sensitive film and a pattern comprised of a plurality of holes is formed. A hole forming chrome film(20') for forming a shadow mask is formed by including a plurality of holes and etching the chrome film.

Description

Manufacturing method of microlens array with shadow mask function {MANUFACTURING METHOD OF MICRO LENS ARRAY HAVING FUNCTION OF SHADOW MASK}

The present invention relates to a method of manufacturing a microlens array, and more particularly, to a method of manufacturing a microlens array having a shadow mask function to prevent ghosting from occurring by blocking unnecessary light transmission.

In general, a microlens array refers to an optical device in which a large number of lenses having a diameter of about tens to hundreds of micrometers are arranged vertically and horizontally according to a predetermined arrangement rule.

The microlens array is used to collect incident light with high efficiency, and is applied to an exposure apparatus, a projection TV, an LCD, a digital camera, and various laser applications used in an exposure process during a semiconductor manufacturing process.

Such microlens arrays are configured to condense incident light with high efficiency in applied devices and devices to realize vivid image quality or improved sensitivity. However, in the case of the conventional type of microlens array, the ghost phenomenon due to unnecessary light transmission cannot be prevented, so that a defect occurs during the exposure process in an exposure apparatus requiring a high degree of precision, In a camera or the like, deterioration of quality such as blurring or overlapping the boundary of an implemented image may occur.

In consideration of this problem, in order to prevent ghosting from occurring, a type of integrated shadow mask having a plurality of holes, that is, a shadow mask-integrated microlens array including a microlens and a shadow mask is provided. It has been disclosed.

However, in the process of manufacturing the shadow mask integrated microlens array as described above, it is not only difficult to align the position between the microlens and the shadow mask, but also it is not easy to adjust the distance between each other to suit the focal length of the lens. to be.

In particular, in the case of the microlens array applied to the exposure apparatus, hundreds of thousands of fine lenses arranged in a 1024 × 768 structure in a horizontal and vertical direction, for example, are integrated on a substrate having a width of about 10 to 50 mm. The difficulty is easily understood, considering that the spacing and position alignment in the sub-μm unit should be made.

As invented to solve the above problems,

The present invention can precisely adjust the distance between the microlens and the component that performs the function of the shadow mask, the position alignment between the plurality of holes and the corresponding individual microlenses provided in the component that serves as the shadow mask An object of the present invention is to provide a method of manufacturing a microlens array having a shadow mask function that can be precisely performed.

The present invention for realizing this,

A chromium film coating process of coating a chromium film on a quartz substrate, a photoresist coating process of coating a photoresist film on the chromium film, and exposing the photoresist film to have a predetermined shape of a plurality of holes and then developing the photoresist film pattern to form a pattern photoresist film. Process, a chromium film etching process for forming a hole forming chromium film capable of performing a role of a shadow mask by etching the chromium film to have a plurality of holes corresponding to the pattern, and the pattern photosensitive film remaining on the hole forming chromium film A first step of manufacturing a hole-forming chromium film substrate comprising a photoresist film removing step of peeling off;

Etching of the hole-forming chromium film substrate manufactured in the first step to form a microlens-shaped portion in an array form corresponding to the plurality of holes provided in the hole-forming chromium film on the quartz substrate And a chromium film removing step of removing the hole-forming chromium film remaining in a state covering the microlens-shaped portion of the quartz substrate; And

In the state in which the other hole-forming chromium film substrate manufactured in the first step is superimposed on the microlens substrate manufactured in the second step so that the microlens-shaped portion and the hole-forming chromium film face each other, the two substrates are overlapped. A gap adjusting step of disposing a predetermined distance, an adhesive filling step of forming a microlens by filling an optical adhesive in an internal space between the hole-forming chromium film substrate and the microlens substrate, the microlens substrate and the hole-forming chrome film And a second alignment step of aligning the relative positions of the substrates by fine adjustment, and an ultraviolet curing step of integrating the microlens substrate and the hole-forming chromium film substrate by curing the microlens portion with ultraviolet rays. A shadow mask with a lens substrate and the hole-forming chromium film substrate of the first step And a third step of completing the microlens array having the stroke function. The method of manufacturing the microlens array having the shadow mask function is provided.

The gap adjusting process includes turning the hole-forming chromium film substrate on the upper fixing block, inserting the microlens substrate on the lower fixing block, and then assembling the upper fixing block and the lower fixing block. It is characterized in that it is carried out in such a way that the distance between the formed chromium film substrate and the microlens substrate is kept constant.

In the adhesive filling process, the optical adhesive is discharged while the air in the internal space is discharged at a negative pressure through a vacuum pump while the internal space formed between the hole-forming chromium film substrate and the microlens substrate is sealed. Suction into the inner space, it characterized in that it is carried out in a manner to form the micro lens unit corresponding to the shape of the inner space.

Further, the positioning process, the microlens substrate and the hole in the state in which the upper fixing block is fitted to the fixing jig, and the lower fixing block is inserted into the adjusting jig which can be fine-adjusted in the X, Y and θ directions. Characterized in that the relative position of the formed chromium film substrate to be aligned in a fine adjustment.

By providing a method of manufacturing a microlens array having a shadow mask function as described above, the present invention uses a hole-forming chromium film substrate and a microlens substrate, but by manufacturing a microlens substrate with a hole-forming chrome film substrate, a shadow mask The gap between the hole-forming chromium film and the microlens portion which performs the role of and the position alignment between the plurality of holes and the corresponding individual microlenses provided in the hole-forming chromium film can be precisely made in an easy manner. Therefore, it is possible to provide a microlens array having a high quality shadow mask function that can effectively prevent ghosting, and to achieve various effects such as manufacturing cost reduction and suitable for mass production.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in more detail.

The method of manufacturing a microlens array having a shadow mask function according to the present invention includes a first step of manufacturing a hole-forming chromium film substrate, a second step of manufacturing a microlens substrate, and a microlens substrate and a hole-forming chromium film. And combining the substrates to complete the microlens array with the shadow mask function. In the second step, the hole-forming chromium film substrate manufactured in the first step is processed into an additional process to produce a microlens substrate, and in the third step, the microlens substrate manufactured in the second step and the other manufactured in the first step are processed. One hole-forming chromium film substrate is combined to form a microlens array with a shadow mask function.

1 is an exemplary view sequentially illustrating a first step of manufacturing a hole-forming chromium film substrate according to the present invention.

In the first step of manufacturing the hole-forming chromium film substrate 100, as shown in FIG. 1, the chromium film coating process of coating the chromium film 20 on the quartz substrate 10 (see FIG. 1A). ), A photosensitive film coating process for coating the photosensitive film 30 on the chromium film 20 (see (b) of FIG. 1), the photosensitive film 30 is exposed to develop a pattern having a predetermined shape consisting of a plurality of holes and then developed to form a pattern photosensitive film Photoresist pattern forming process (see FIG. 1C) for forming the photoresist, and a hole capable of acting as a shadow mask by etching the chromium film 20 to have a plurality of holes 25 corresponding to the photoresist pattern. A chromium film etching process for forming the formed chromium film 20 '(see FIG. 1 (d)), and a photoresist film removing process for removing the pattern photoresist film 30' remaining on the hole-forming chromium film 20 '(Fig. 1 (e)).

In more detail, the chromium film 20 is coated on the quartz substrate 10 having a predetermined thickness, for example, a thickness of 2 mm to 5 mm, and then the photosensitive film 30 is coated on the chromium film 20. (See FIG. 1 (a) and (b)). Then, the photosensitive film 30 is exposed to have a pattern having a predetermined shape and then developed to form a pattern photosensitive film 30 'having a pattern in the form of a plurality of holes 35 (see FIG. 1C). ). Subsequently, etching is performed in such a manner that the etching solution penetrates into the chromium film 20 through the plurality of holes 35 formed in the photosensitive film 30 ', so that the chromium film 20 is also formed in the photosensitive film 30'. By forming a plurality of holes 25 corresponding to the shape of the hole 35 of the hole 35, a hole-forming chromium film made of chromium film having a plurality of holes 25 arranged according to a predetermined rule corresponding to the above pattern ( 20 ') (see FIG. 1 (d)). The hole forming chromium film 20 ′ may serve as a shadow mask by providing a plurality of holes. In such a chromium film etching process, an etching solution that selectively etches only the chromium film 20 without penetrating the quartz substrate 10 through appropriate selection of chemicals to be included is used. Subsequently, by removing the pattern photosensitive film 30 'remaining in the coated state on the hole-forming chromium film 20', the hole-forming chromium film substrate 100 made of the hole-forming chromium film 20 'and the quartz substrate 10 is removed. ) Can be obtained (see FIG. 1E).

The method for manufacturing a microlens array with a shadow mask function according to the present invention uses two hole-forming chromium film substrates 100 manufactured in the first step as described above. That is, one hole forming chromium film substrate 100 is used as it is, and the other hole forming chromium film substrate is further subjected to the second step described later, and is integrated with each other in the third step which will be described in detail below. The result is a microlens array with a shadow mask function.

The hole forming chromium film 20 ', which forms the hole forming chromium film substrate 100 manufactured by the same method as the first step, is formed to have a plurality of holes according to a pattern of a predetermined shape. When completed as an array, it acts as a shadow mask. However, the hole forming chromium film 20 'of the hole forming chromium film substrate 100 used to manufacture the microlens substrate in the second step described in detail below is removed in the process of manufacturing the microlens substrate.

2 is an exemplary view sequentially illustrating a second step of manufacturing a microlens substrate according to the present invention.

In the second step of manufacturing the microlens substrate 200, as shown in FIG. 2, the hole-forming chromium film substrate 100 prepared in the first step is etched to be provided in the hole-forming chromium film 20 ′. A quartz substrate etching process (see FIG. 2B) of forming a microlens-shaped portion 15 in an array form corresponding to the plurality of holes 25 in a negative manner (see FIG. 2B), and the quartz substrate 10. And a chromium film removing step (see FIG. 2C) to remove the hole-forming chromium film 20 'remaining in the state covered with the microlens-shaped portion 15 of FIG.

In more detail, first, the hole-forming chromium film manufactured in the first step in such a manner that the etching solution penetrates into the quartz substrate 10 through the plurality of holes 25 formed in the hole-forming chromium film 20 '. The substrate 100 is etched so that microlens-shaped portions 15 in an array form corresponding to the plurality of holes 25 provided in the hole-forming chromium film 20 'are formed intaglio on the quartz substrate 10. .

The etching solution used in such a quartz substrate etching process is a component controlled to include other types of chemicals, and the etching solution used in the above-described chromium film etching process controlled to prevent penetration into the quartz substrate 10. It's something else. After forming the microlens-shaped portion 15 on the quartz substrate 10 by etching, the hole-forming chromium film 20 'remaining on the quartz substrate 10 with the microlens-shaped portion 15 covered is removed. do. That is, the hole-forming chromium film 20 'in the process of manufacturing the microlens substrate 200 is used for forming the microlens-shaped portion 15 in a predetermined arrangement through a quartz substrate etching process and then removed. It does not act as a shadow mask.

FIG. 3 is an exemplary view sequentially illustrating a third step of completing a microlens array with a shadow mask function according to the present invention, and FIG. 4 is a perspective view schematically illustrating the gap adjusting process according to the present invention. 5 is a plan view schematically illustrating the position alignment process according to the present invention.

The third step of completing the microlens array with a shadow mask function is, as shown in FIG. 3, the microlens substrate 200 manufactured through the second step and the second lens manufactured through the first step. A process of joining another hole-forming chromium film substrate 100 which has not been subjected to the step, and the microlenses manufactured in the second step such that the microlens-shaped portion 15 and the hole-forming chromium film 20 'face each other. The microlens substrate 200 and the hole-forming chromium film substrate 100 are integrally coupled in a state in which the other hole-forming chromium film substrate 100 manufactured in the first step is overlapped on the substrate 200. It is done in such a way.

Specifically, in the third step, the microlens-shaped portion 15 and the hole-forming chromium film 20 ′ face each other on the microlens substrate 200 manufactured in the second step. In the state in which the hole-forming chromium film substrate 100 is overlapped, an interval adjusting process for arranging the two substrates 200 and 100 to have a predetermined interval, and between the hole-forming chromium film substrate 100 and the microlens substrate 200. An adhesive filling process of filling the space 250 with the optical adhesive 145 to form the microlens part 300, in which the relative positions of the microlens substrate 200 and the hole-forming chromium film substrate 100 are aligned with fine adjustment. And a UV curing step of integrating the microlens substrate 200 and the hole-forming chromium film substrate 100 by curing the position alignment process and the microlens unit 300 with ultraviolet rays.

In more detail, in the gap adjusting process, the hole-forming chromium film substrate 100 is flipped over and inserted into the upper fixing block 310 and the microlens substrate 200 is inserted into the lower fixing block 320. In the process of assembling the 310 and the lower fixing block 320, the gap between the hole-forming chromium film substrate 100 and the microlens substrate 200 is maintained in a constant manner. That is, the upper fixing block 310 and the lower fixing block 320 are formed to accommodate the hole-forming chromium film substrate 100 and the microlens substrate 200, respectively, when the microlens substrate 200 and the holes are assembled to each other. The formed chromium film substrate 100 is formed in a structure to maintain a constant gap.

In the adhesive filling process, the internal space 250 is sealed by a negative pressure through the vacuum pump 150 while the internal space 250 formed between the hole-forming chromium film substrate 100 and the microlens substrate 200 is sealed. The optical adhesive 145 is sucked into the inner space 250 while discharging the air, and thus the microlens part 300 corresponding to the shape of the inner space 250 is formed. As shown in FIG. 4, for the sealing of the inner space 250, the upper fixing block 310 and the lower fixing block 320 are formed in a structure in which the boundary portions of the edges contacting each other during assembly are in close contact with each other. In order to discharge the air in the space 250 and to suck the optical adhesive 145 into the interior space 250 to have a discharge passage 180 and the suction passage 170 in two different positions of the boundary of the edge Is formed.

A pipe connected to the vacuum pump 150 is connected to the discharge passage 180 formed when the upper fixing block 310 and the lower fixing block 320 are assembled, and a gel (gel) is connected to the suction passage 170 of the other side. The pipe connected to the tank 140 containing the optical adhesive 145 in the () state is connected. Therefore, when the vacuum pump 150 is operated, the air in the internal space 250 formed between the hole-forming chromium film substrate 100 and the microlens substrate 200 is discharged through the discharge passage 180. As the air in the space 250 is discharged, the optical adhesive 145 is sucked by the negative pressure formed in the interior space 250 to fill the interior space 250. As the air in the inner space 250 is discharged to the outside by the vacuum pump 150, it is possible to prevent the bubbles in the optical adhesive 145 in the process of filling the optical adhesive 145, As a result, it is possible to prevent the deterioration of the quality of the microlens unit 300 formed of the optical adhesive 145.

After the adhesive filling process is completed, the lower fixing block 320 is inserted into the fixing jig 210, and the upper fixing block 310 is inserted into the adjusting jig 110 which can be finely adjusted in the X, Y and θ directions. In the above, the alignment process is performed in such a manner that the relative positions of the microlens substrate 200 and the hole-forming chromium film substrate 100 are aligned by fine adjustment.

In more detail, as shown in part (c) of FIG. 3 and FIG. 5, the fixing jig 210 is combined with the lower fixing block 320 in a wrapping form below, and the center portion except for the edge portion. It is formed in an open form. And, the adjusting jig 110 is coupled to the upper fixing block 310 in the form of wrapping from above, assembled on the fixing jig 210 to enable the θ direction rotation about the reference axis 113 on the fixing jig 210. do. In addition, the adjustment jig 110 is provided with adjustment means 115, 117 that can fine-tune the upper fixing block 310 coupled to the inside in the X direction and the Y direction. Position fixing process using the fixing jig 210 and the adjusting jig 110 as described above, of the adjusting jig 110 coupled with the upper fixing block 310 on the fixing jig 210 combined with the lower fixing block 320. Through rotation in the θ direction, the angles of the microlens substrate 200 coupled to the lower fixing block 320 and the hole forming chromium film substrate 100 coupled to the upper fixing block 310 coincide with each other, and then the adjustment jig 110 is used. Fine adjustment in the X and Y direction through the adjustment means 115, 117 provided in the), the hole coupled to the microlens substrate 200 and the upper fixing block 310 coupled to the lower fixing block 320 The forming chromium film substrate 100 is performed in a manner to adjust the position. Then, after the alignment is completed, the fixing jig 210 and the adjusting jig 110 are maintained in a fixed state so that relative position variation does not occur until the integration through the UV curing process described later is completed.

In the state where the alignment process is completed, as shown in part (d) of FIG. 3, the microlens substrate 200 is cured by irradiating with ultraviolet rays to cure the microlens unit 300 made of the optical adhesive in an uncured state. ) And the hole-forming chromium film substrate 100 are integrated, thereby obtaining a microlens array having a completed shadow mask function. That is, the microlens array having a shadow mask function, in which the hole forming chromium film 20 'of the hole forming chromium film substrate 100 serves as a shadow mask, is provided.

The microlens array having such a shadow mask function may be commercialized in combination with the upper fixing block 310 and the lower fixing block 320, and separates the upper fixing block 310 and the lower fixing block 320. Through an additional process, the microlens substrate 200 and the hole-forming chromium film substrate 100 may be manufactured in a form that includes only.

Although the present invention has been described in detail only with respect to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the technical idea of the present invention, and such changes and modifications belong to the appended claims. It will be natural.

1 is an exemplary view sequentially showing a first step of manufacturing a hole-forming chromium film substrate according to the present invention,

2 is an exemplary view sequentially illustrating a second step of manufacturing a microlens substrate according to the present invention;

3 is an exemplary view sequentially illustrating a third step of completing a microlens array with a shadow mask function according to the present invention;

4 is a perspective view schematically illustrating to explain a gap adjusting process according to the present invention;

5 is a plan view schematically showing the position alignment process according to the present invention.

* Description of the symbols for the main parts of the drawings *

10: quartz substrate 15: microlens shape portion

20: chromium film 20 ': hole-forming chromium film

30: photosensitive film 30 ': pattern photosensitive film

100: hole-forming chromium film substrate 110: adjustment jig

113: reference axis 115, 117: adjusting means

140: tank 145: optical adhesive

150: vacuum pump 170: suction passage

180: discharge passage 200: microlens substrate

210: fixed jig 250: internal space

300: microlens portion 310: upper fixing block

320: lower fixed block

Claims (4)

A chromium film coating process of coating a chromium film on a quartz substrate, a photoresist coating process of coating a photoresist film on the chromium film, and exposing the photoresist film to have a predetermined shape of a plurality of holes and then developing the photoresist film pattern to form a pattern photoresist film. Process, a chromium film etching process for forming a hole forming chromium film capable of performing a role of a shadow mask by etching the chromium film to have a plurality of holes corresponding to the pattern, and the pattern photosensitive film remaining on the hole forming chromium film A first step of manufacturing a hole-forming chromium film substrate comprising a photoresist film removing step of peeling off; Etching the hole-forming chromium film substrate prepared in the first step to form a microlens-shaped portion of the array form corresponding to the plurality of holes provided in the hole-forming chromium film on the quartz substrate intaglio And a chromium film removing step of removing the hole-forming chromium film remaining in a state covering the microlens-shaped portion of the quartz substrate; And In the state in which the other hole-forming chromium film substrate manufactured in the first step is superimposed on the microlens substrate manufactured in the second step so that the microlens-shaped portion and the hole-forming chromium film face each other, the two substrates are overlapped. A gap adjusting step of disposing a predetermined distance, an adhesive filling step of forming a microlens by filling an optical adhesive in an internal space between the hole-forming chromium film substrate and the microlens substrate, the microlens substrate and the hole-forming chrome film And a second alignment step of aligning the relative positions of the substrates by fine adjustment, and an ultraviolet curing step of integrating the microlens substrate and the hole-forming chromium film substrate by curing the microlens portion with ultraviolet rays. Shadow mask with the lens substrate and the hole-forming chromium film substrate of the first step A; a third step of completing the micro-lens array having a greater functionality A method of manufacturing a microlens array having a shadow mask function, characterized in that it comprises a. The method of claim 1, The gap adjusting process, The hole-forming chromium film substrate is turned over and inserted into the upper fixing block, the microlens substrate is inserted into the lower fixing block, and the hole-forming chromium film substrate and the microlens are assembled in the process of assembling the upper fixing block and the lower fixing block. The method of manufacturing a microlens array with a shadow mask function, characterized in that the gap between the substrate is carried out in a constant manner. 3. The method of claim 2, The adhesive filling process, In the state in which the inner space formed between the hole-forming chromium film substrate and the microlens substrate is sealed, the optical adhesive is sucked into the inner space while discharging the air in the inner space by a negative pressure through a vacuum pump, thereby And a method of forming the microlens portion corresponding to the shape of the space. The method of claim 2 or 3, The position alignment process, While the upper fixing block is inserted into the fixing jig and the lower fixing block is inserted into the adjusting jig which can be fine-adjusted in the X, Y and θ directions, the relative positions of the microlens substrate and the hole-forming chromium film substrate are adjusted. The method of manufacturing a microlens array having the shadow mask function, characterized in that the alignment is performed in a manner of fine adjustment.

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