KR101065251B1 - Manufacturing method of micro lens array having function of shadow mask - Google Patents

Abstract

According to the present invention, a chromium film and a photoresist film are coated on a quartz substrate in order, and the photoresist film is exposed and developed to have a predetermined shape of a plurality of holes to form a pattern photoresist film, and to have a plurality of holes corresponding to the pattern. A first step of manufacturing a hole-forming chromium film substrate by etching a chromium film to form a hole-forming chromium film capable of serving as a shadow mask, and then peeling off the pattern photoresist remaining on the hole-forming chromium film; The hole-forming chromium film substrate is etched to form a microlens-shaped portion in an array form corresponding to a plurality of holes provided in the hole-forming chromium film in a negative manner on the quartz substrate, and remains in a state covering the microlens-shaped portion of the quartz substrate. A second step of manufacturing the microlens substrate from the hole-forming chromium film substrate by removing the hole-forming chromium film and coating the microlens-shaped portion of the quartz substrate with an optical adhesive to form a layered microlens portion; And a third step of combining the microlens substrate and the other hole-forming chromium film substrate in a state where the microlens portion and the hole-forming chromium film are overlapped so as to face each other, thereby completing a microlens array having a shadow mask function. It provides a method of manufacturing a microlens array having a shadow mask function, characterized in that it comprises a.

Micro Lens, Hole Forming Chrome Film, Adjustment Jig, Optical Adhesive, Shadow Mask

Description

Manufacturing method of microlens array with shadow mask function {MANUFACTURING METHOD OF MICRO LENS ARRAY HAVING FUNCTION OF SHADOW MASK}

The present invention relates to a method of manufacturing a microlens array, and more particularly, to a method of manufacturing a microlens array having a shadow mask function to prevent ghosting from occurring by blocking unnecessary light transmission.

In general, a microlens array refers to an optical device in which a large number of lenses having a diameter of about tens to hundreds of micrometers are arranged vertically and horizontally according to a predetermined arrangement rule.

The microlens array is used to collect incident light with high efficiency, and is applied to an exposure apparatus, a projection TV, an LCD, a digital camera, and various laser applications used in an exposure process during a semiconductor manufacturing process.

Such microlens arrays are configured to condense incident light with high efficiency in applied devices and devices to realize vivid image quality or improved sensitivity. However, in the case of the conventional type of microlens array, the ghost phenomenon due to unnecessary light transmission cannot be prevented, so that a defect occurs during the exposure process in an exposure apparatus requiring a high degree of precision, In a camera or the like, deterioration of quality such as blurring or overlapping the boundary of an implemented image may occur.

In consideration of this problem, in order to prevent ghosting from occurring, a type of integrated shadow mask having a plurality of holes, that is, a shadow mask-integrated microlens array including a microlens and a shadow mask is provided. It has been disclosed.

However, in the process of manufacturing the shadow mask integrated microlens array as described above, it is not only difficult to align the position between the microlens and the shadow mask, but also it is not easy to adjust the distance between each other to suit the focal length of the lens. to be.

In particular, in the case of a microlens array applied to an exposure apparatus, hundreds of thousands of fine lenses arranged in a 1024 × 768 structure in a horizontal and vertical direction, for example, are integrated on a substrate having a horizontal and vertical length of about 10 to 50 mm. The difficulty is easily understood when considering that the spacing and position alignment should be made in the sub-μm unit.

As invented to solve the above problems,

The present invention can precisely adjust the distance between the microlens and the component that performs the function of the shadow mask, the position alignment between the plurality of holes and the corresponding individual microlenses provided in the component that serves as the shadow mask An object of the present invention is to provide a method of manufacturing a microlens array having a shadow mask function that can be precisely performed.

The present invention for realizing this,

A chromium film coating process of coating a chromium film on a quartz substrate, a photoresist coating process of coating a photoresist film on the chromium film, and exposing the photoresist film to have a predetermined shape of a plurality of holes and then developing the photoresist film pattern to form a pattern photoresist film. Process, a chromium film etching process for forming a hole forming chromium film capable of performing a role of a shadow mask by etching the chromium film to have a plurality of holes corresponding to the pattern, and the pattern photosensitive film remaining on the hole forming chromium film A first step of manufacturing a hole-forming chromium film substrate comprising a photoresist film removing step of peeling off;

Etching of the hole-forming chromium film substrate manufactured in the first step to form a microlens-shaped portion in an array form corresponding to the plurality of holes provided in the hole-forming chromium film on the quartz substrate A chromium film removing step of removing the hole-forming chromium film remaining in a state covering the microlens-shaped portion of the quartz substrate; and coating the microlens-shaped portion of the quartz substrate with an optical adhesive to form a layered microlens portion. A second step of manufacturing a microlens substrate with the hole-forming chromium film substrate comprising an adhesive coating process to; And

In the state in which the other hole-forming chromium film substrate manufactured in the first step is superimposed on the microlens substrate manufactured in the second step so that the microlens portion and the hole-forming chromium film face each other. A third step of combining a microlens substrate and the hole-forming chromium film substrate to complete a microlens array having a shadow mask function;

It provides a method of manufacturing a microlens array having a shadow mask function, characterized in that it comprises a.

In addition, the adhesive coating process is performed through a rotatable coating apparatus, characterized in that for controlling the thickness of the microlens portion by adjusting the number of rotation of the rotatable coating apparatus.

In addition, the adhesive coating process is performed through a spray coating device, it characterized in that the thickness of the microlens portion is adjusted by adjusting the spraying amount of the spray coating device.

Furthermore, the second step may further include an ultraviolet curing process for curing the microlens portion formed by the adhesive coating process with ultraviolet rays, and a polishing process for fine polishing the surface of the cured microlens portion.

In addition, the third step, the focal length confirmation step of confirming the focal length of the microlens portion provided in the microlens substrate manufactured in the second step, the spacer having a predetermined thickness selected according to the identified focal length A gap adjusting step of inserting the microlens substrate and the hole-forming chromium film substrate so as to be positioned along an edge; inserting the microlens substrate into a fixing jig, and inserting the hole-forming chromium film substrate in the X, Y, and θ directions. In the state where it is fitted in the fine-adjustable adjustment jig, the alignment of the microlens portion and the hole-forming chromium film is made by using an alignment mark formed at each outer edge so that the center between the plurality of holes corresponds to the center of the shape portion of the microlens 1: 1. Positioning step of finely aligning the relative position, and the microlens substrate by the spacer And a bonding process for integrating the microlens substrate and the hole-forming chromium film substrate by injecting an optical adhesive into a gap formed between the hole-forming chromium film substrate and curing with ultraviolet rays.

Here, the focal length checking step, using a focal length measuring device including a microscope having a laser light source, an optical expander disposed in front of the laser light source and a CCD disposed in front of the optical expander, wherein the optical enlarger and the The microlens substrate is disposed between the microscopes.

On the other hand, in the third step, the shape of the microlens in the state in which the microlens substrate is fitted to the fixing jig, and the hole-forming chromium film substrate is inserted into the adjustment jig finely adjustable in the X, Y and θ directions. Position alignment process of aligning the relative positions of the microlens portion and the hole-forming chromium film with fine adjustment using an alignment mark formed on each outer edge so that the centers of the plurality of holes correspond to 1: 1 in the partial center. And a pressurizing step of pressing the hole-forming chromium film substrate toward the microlens substrate at a predetermined pressure to be in close contact with the microlens substrate, and an ultraviolet curing step of curing the microlens part with ultraviolet rays.

On the other hand, the second step is a bubble removing step of removing the bubbles contained in the microlens portion formed in the adhesive coating process by putting in a vacuum chamber, an ultraviolet curing process of curing the microlens portion with ultraviolet rays, and cured It characterized in that it further comprises a thickness adjusting process for adjusting the thickness by polishing the surface of the micro lens unit.

In the third step, the microlens substrate and the hole-forming chromium film face each other so that a small amount of the optical adhesive is dropped on the microlens substrate prepared in the second step. A gap stabilization step of arranging the other hole-forming chromium film substrates manufactured in the first step so as to overlap each other, and then spreading the optical adhesives by rubbing each other until the gap between the two substrates is minimized, the jig fixing the microlens substrate. The hole-forming chromium film substrate to the adjustment jig finely adjustable in the X, Y and θ directions so that the center between the plurality of holes corresponds to the center of the shape portion of the microlens 1: 1. Fine adjustment of the relative position of the microlens portion and the hole-forming chromium film by using the alignment mark formed on each outside As to cure the optical adhesive expanded by aligning step, and the gap stabilizing step to align with ultraviolet rays, it characterized in that it comprises a UV bonding process for integrating the microlens substrate and the chromium film substrate forming the hole.

By providing a method of manufacturing a microlens array having a shadow mask function as described above, the present invention uses a hole-forming chromium film substrate and a microlens substrate, but by manufacturing a microlens substrate with a hole-forming chrome film substrate, a shadow mask The gap between the hole-forming chromium film and the microlens portion which performs the role of and the position alignment between the plurality of holes and the corresponding individual microlenses provided in the hole-forming chromium film can be precisely made in an easy manner. Accordingly, it is possible to provide a microlens array having a high quality shadow mask function that can effectively prevent ghosting, and to achieve various effects such as manufacturing cost reduction and being suitable for mass production.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in more detail.

The method of manufacturing a microlens array having a shadow mask function according to the present invention includes a first step of manufacturing a hole-forming chromium film substrate, a second step of manufacturing a microlens substrate, and a microlens substrate and a hole-forming chromium film. And combining the substrates to complete the microlens array with the shadow mask function. In the second step, the hole-forming chromium film substrate manufactured in the first step is processed into an additional process to manufacture the microlens substrate, and in the third step, the microlens substrate manufactured in the second step and the other manufactured in the first step are processed. One hole-forming chromium film substrate is combined to form a microlens array with a shadow mask function.

1 is an exemplary view sequentially illustrating a first step of manufacturing a hole-forming chromium film substrate according to the present invention.

In the first step of manufacturing the hole-forming chromium film substrate 100, as shown in FIG. 1, the chromium film coating process of coating the chromium film 20 on the quartz substrate 10 (see FIG. 1A). ), A photosensitive film coating process for coating the photosensitive film 30 on the chromium film 20 (see (b) of FIG. 1), the photosensitive film 30 is exposed to develop a pattern having a predetermined shape consisting of a plurality of holes and then developed to form a pattern photosensitive film A photoresist pattern forming process for forming a film (see (c) of FIG. 1), and a hole capable of acting as a shadow mask by etching the chromium film 20 to include a plurality of holes 25 corresponding to the pattern of the photoresist film. A chromium film etching process for forming the formed chromium film 20 '(see FIG. 1 (d)), and a photoresist film removing process for removing the pattern photoresist film 30' remaining on the hole-forming chromium film 20 '(Fig. 1 (e)).

In more detail, the chromium film 20 is coated on the quartz substrate 10 having a predetermined thickness, for example, a thickness of 2 mm to 5 mm, and then the photosensitive film 30 is coated on the chromium film 20. (See FIG. 1 (a) and (b)). Then, the photosensitive film 30 is exposed to have a pattern having a predetermined shape and then developed to form a pattern photosensitive film 30 'having a pattern in the form of a plurality of holes 35 (see FIG. 1C). ). Subsequently, etching is performed in such a manner that the etching solution penetrates into the chromium film 20 through the plurality of holes 35 formed in the photosensitive film 30 ', so that the chromium film 20 is also formed in the photosensitive film 30'. By forming a plurality of holes 25 corresponding to the shape of the hole 35 of the hole 35, a hole-forming chromium film made of a chromium film material having a plurality of holes 25 arranged according to a predetermined rule corresponding to the above pattern 20 ') (see FIG. 1 (d)). The hole forming chromium film 20 ′ may serve as a shadow mask by providing a plurality of holes. In such a chromium film etching process, an etching solution that selectively etches only the chromium film 20 without penetrating the quartz substrate 10 through appropriate selection of chemicals to be included is used. Subsequently, by removing the pattern photosensitive film 30 'remaining in the coated state on the hole-forming chromium film 20', the hole-forming chromium film substrate 100 made of the hole-forming chromium film 20 'and the quartz substrate 10 is removed. ) Can be obtained (see FIG. 1E).

In the method of manufacturing a microlens array with a shadow mask function according to the present invention, a microlens array with a shadow mask function is completed by using two hole-forming chromium film substrates manufactured in the first step as described above. In contrast to the second step of manufacturing the microlens substrate and the third step of combining the microlens substrate and the hole-forming chromium film substrate to be described below, the first step is commonly applied to various embodiments. do.

The hole forming chromium film 20 ', which forms the hole forming chromium film substrate 100 manufactured by the same method as the first step, is formed to have a plurality of holes according to a pattern of a predetermined shape. When completed as an array, it acts as a shadow mask. However, the hole forming chromium film 20 'of the hole forming chromium film substrate 100 used to manufacture the microlens substrate in the second step described in detail below is removed in the process of manufacturing the micro lens substrate.

2 is an exemplary view sequentially illustrating a second step of manufacturing a microlens substrate according to the first embodiment of the present invention.

According to the first preferred embodiment of the present invention, the second step of manufacturing the microlens substrate 200-1, as shown in FIG. 2, uses the hole-forming chromium film substrate 100 manufactured in the first step. A quartz substrate etching process for etching the microlens-shaped portions 15 in an array form corresponding to the plurality of holes 25 provided in the hole-forming chromium film 20 'in a negative manner on the quartz substrate 10 (FIG. 2). (B) of FIG. 2), the chromium film removing step of removing the hole-forming chromium film 20 ′ remaining in the state covering the microlens-shaped portion 15 of the quartz substrate 10 (see FIG. 2C). In the adhesive coating process (see (d) of FIG. 2) to form a layered microlens portion 150-1 by coating the microlens-shaped portion 15 of the quartz substrate 10 with an optical adhesive, An ultraviolet curing process (see FIG. 2E) for curing the formed microlens portion 150'-1 with ultraviolet rays, and a cured microlens And a polishing step (see FIG. 2 (f)) for finely polishing the surface of the portion 150'-1.

In more detail, first, the hole-forming chromium film manufactured in the first step in such a manner that the etching solution penetrates into the quartz substrate 10 through the plurality of holes 25 formed in the hole-forming chromium film 20 '. The substrate 100 is etched so that microlens-shaped portions 15 in an array form corresponding to the plurality of holes 25 provided in the hole-forming chromium film 20 'are formed intaglio on the quartz substrate 10. . The etching solution used in the quartz substrate etching process is a component adjusted to include other types of chemicals, and the etching solution used in the above-described chromium film etching process adjusted to prevent penetration into the quartz substrate 10. It is different from. After forming the microlens-shaped portion 15 on the quartz substrate 10 by etching, the hole-forming chromium film 20 'remaining on the quartz substrate 10 with the microlens-shaped portion 15 covered is removed. do. That is, the hole-forming chromium film 20 'in the process of manufacturing the microlens substrate is used for forming the microlens-shaped portion 15 in a predetermined arrangement through a quartz substrate etching process and then removed, and the shadow is removed. It does not act as a mask.

Subsequently, the microlens-shaped portion 15 of the quartz substrate 10 is coated with a fluid gel-type optical adhesive to form a layered microlens portion 150-1. This adhesive coating process is carried out through a rotary coating device (not shown), commonly referred to as a 'spin coater', and controls the rotational speed of the rotary coating device in a layered manner on the quartz substrate 10. The thickness of the micro lens unit 150-1 to be formed is adjusted. In addition, the adhesive coating process may be performed through a spray coating apparatus, in which case the thickness of the microlens portion to be formed is controlled by adjusting the spraying amount of the spray coating apparatus.

The microlens unit 150-1 made of the optical adhesive in the uncured state is cured by ultraviolet rays in the process of performing an ultraviolet curing process, and finally, the surface of the cured microlens unit 150 ′-1 is finely polished. Through the polishing process, the microlens substrate 200-1 having the microlens portion 150 ′-1 can be obtained.

3 is an exemplary view sequentially illustrating a third step of completing a microlens array having a shadow mask function according to a first embodiment of the present invention, and FIG. 4 is a focal length according to the first embodiment of the present invention. FIG. 5 is a layout view schematically illustrating the identification process, and FIG. 5 is a plan view schematically illustrating the alignment process according to the present invention.

According to the first preferred embodiment of the present invention, the third step of completing the microlens array with the shadow mask function is, as shown in Figure 3, the microlens substrate 200-1 manufactured through the second step ) And another hole-forming chromium film substrate 100 which is manufactured through the first step and then does not go through the second step, wherein the microlens portion 150'-1 and the hole-forming chromium film are combined. The microlens in a state in which the other hole-forming chromium film substrate 100 manufactured in the first step is disposed on the microlens substrate 200-1 manufactured in the second step so that the 20 ′ faces each other. The substrate 200-1 and the hole forming chromium film substrate 100 are integrally coupled to each other.

Specifically, the third step, the focal length confirmation step of confirming the focal length of the microlens unit 150'-1 provided in the microlens substrate 200-1 manufactured in the second step (see FIG. 4), A gap adjusting process of inserting the spacer 130 having a predetermined thickness selected according to the identified focal length is positioned along the edge between the microlens substrate 200-1 and the hole forming chromium film substrate 100 (FIG. a)), the microlens substrate 200-1 is inserted into the fixing jig 210, and the hole-forming chromium film substrate 100 is adjusted to the adjustment jig 110 which can be finely adjusted in the X, Y and θ directions. In the fitted state, the centers of the plurality of holes 25 correspond to the center of the shape portion 15 of the microlens by using an alignment mark formed at each outer side so as to correspond 1: 1 with the microlens portion 150'-1. Position alignment process of finely aligning the relative position of the hole-forming chromium film 20 '(Fig. 3 (b) and Fig. 5) and an optical adhesive is injected into the gap formed between the microlens substrate 200-1 and the hole-forming chromium film substrate 100 by the spacer 130, and then cured with ultraviolet rays to cure the microlens substrate 200. -1) and the bonding process (see FIG. 3C) of integrating the hole-forming chromium film substrate 100.

In more detail, the microlenses provided in the microlens substrate 200-1 manufactured in the second step prior to adjusting the distance between the microlens unit 150 ′-1 and the hole forming chromium film 20 ′ The focal length confirmation process of confirming the focal length of the unit 150'-1 is performed. In the focal length confirmation step, as illustrated in FIG. 4, a focal point including a microscope 80 having a laser light source 60, an optical expander 70 disposed in front of the laser light source, and a CCD disposed in front of the optical expander. The distance measuring device is used, and the operation of checking the focal length is performed while the microlens substrate 200-1 is disposed between the optical expander 70 and the microscope 80.

Then, in order to appropriately adjust the distance between the microlens portion 150'-1 and the hole-forming chromium film 20 ', as shown in part (a) of FIG. A spacer 130 having a thickness is inserted to be positioned along an edge between the microlens substrate 200-1 and the hole-forming chromium film substrate 100.

Subsequently, the adjustment jig 210 which pinches the microlens substrate 200-1 positioned below the fixing jig 210 and finely adjusts the hole-forming chromium film substrate 100 in the X, Y, and θ directions can be used. The microlens portion 150'-1 using the alignment marks formed on the respective outer edges so that the centers of the plurality of holes 25 correspond to the centers of the shape portions 15 of the microlenses 1: 1. And the relative position of the hole-forming chromium film 20 'by fine adjustment.

As shown in part (b) of FIG. 3 and in FIG. 5, the fixing jig 210 is coupled to the microlens substrate 200-1 in a form of a wrapper below, and has an open center portion except for an edge portion. Is formed. In addition, the adjusting jig 110 is coupled to the hole-forming chromium film substrate 100 in the form of wrapping from above, and the fixing jig 210 may be rotated in the θ direction about the reference axis 113 on the fixing jig 210. Is assembled on. In addition, the adjustment jig 110 includes adjustment means 115 and 117 that can fine-tune the hole-forming chromium film substrate 100 coupled thereinto in the X and Y directions. In the position alignment process using the fixing jig 210 and the adjusting jig 110, the adjusting jig combined with the hole-forming chromium film substrate 100 on the fixing jig 210 coupled with the microlens substrate 200-1. Through the rotation in the θ direction of 110, the angles of the microlens substrate 200-1 and the hole-forming chromium film substrate 100 coincide with each other, and then the adjusting means 115 and 117 provided in the adjusting jig 110. Through fine adjustment in the X and Y directions. Then, the fixing jig 210 and the adjusting jig 110 are maintained in a fixed state so that relative positional change does not occur until the completion of the position alignment and the bonding through the optical adhesive described later.

After completing the alignment process, as shown in part (c) of FIG. 3, the spacer 130 is inserted between the microlens substrate 200-1 and the hole-forming chromium film substrate 100. Injecting the optical adhesive 140 in the gap, and irradiated with ultraviolet light once again to bond in a manner to cure the optical adhesive 140 injected into the gap by the microlens substrate 200-1 and the hole-forming chromium film substrate 100 ) Can be integrated to obtain a microlens array with a completed shadow mask function. That is, the microlens array having a shadow mask function, in which the hole forming chromium film 20 'of the hole forming chromium film substrate 100 serves as a shadow mask, is provided.

6 is an exemplary view sequentially illustrating a second step of manufacturing a microlens substrate according to the second embodiment of the present invention.

According to the second preferred embodiment of the present invention, the second step of manufacturing the microlens substrate, as shown in Figure 6, by etching the hole-forming chromium film substrate 100 prepared in the first step, hole-forming chromium Quartz substrate etching process (see Fig. 6 (b)) to form a microlens-shaped portion 15 in an array form corresponding to a plurality of holes provided in the film 20 'in a negative manner (see Fig. 6B), quartz The process of removing the chromium film (refer to FIG. 6C) of removing the hole-forming chromium film 20 'remaining in the state covering the microlens-shaped portion 15 of the substrate 10, and the quartz substrate 10 An adhesive coating process (see (d) of FIG. 6) is formed by coating the microlens-shaped portion 15 with an optical adhesive to form a layered microlens portion 150-2. That is, the second preferred embodiment of the present invention, unlike the first embodiment described above, does not include an ultraviolet curing step and a polishing step.

In more detail, first, the hole-forming chromium film manufactured in the first step in such a manner that the etching solution penetrates into the quartz substrate 10 through the plurality of holes 25 formed in the hole-forming chromium film 20 '. The substrate 100 is etched so that microlens-shaped portions 15 in an array form corresponding to the plurality of holes 25 provided in the hole-forming chromium film 20 'are formed negatively on the quartz substrate 10. do. The etching solution used in the quartz substrate etching process is also component controlled to include other types of chemicals, and the etching solution used in the chromium film etching process described above which is controlled so as not to penetrate the quartz substrate 10. It's something else. After forming the microlens-shaped portion 15 on the quartz substrate 10 by etching, the hole-forming chromium film 20 'remaining on the quartz substrate 10 with the microlens-shaped portion 15 covered is removed. do.

Subsequently, the microlens-shaped portion 15 of the quartz substrate 10 is coated with a fluid gel type optical adhesive to form a layered microlens portion 150-2, thereby forming a microlens portion 150-. It is possible to obtain a microlens substrate 200-2 having 2). Such an adhesive coating process is performed through a rotating coating apparatus called a 'spin coater', and the microlens portion 150-2 to be formed in a layer on the quartz substrate 10 by controlling the rotational speed of the rotating coating apparatus. It will control the thickness of. In addition, the adhesive coating process may be carried out through a spray coating apparatus, in which case by adjusting the spraying amount of the spray coating apparatus, the thickness of the microlens portion to be formed is adjusted.

However, in the second embodiment, since the UV curing process is not included, in the state in which the second step is completed, the microlens unit 150-2 formed through the adhesive coating process still maintains the fluid gel state. do.

7 is an exemplary diagram sequentially illustrating a third step of completing a microlens array with a shadow mask function according to a second embodiment of the present invention;

According to the second preferred embodiment of the present invention, the third step of completing the microlens array with the shadow mask function is shown in FIG. 7, the microlens substrate 200-manufactured through the second step. 2) and the process of combining the other hole-forming chromium film substrate 100 which is manufactured through the first step and not followed by the second step, the microlens portion 150-2 and the hole-forming chromium film The microlens substrate in a state in which the other hole-forming chromium film substrate 100 manufactured in the first step is disposed on the microlens substrate 200-2 manufactured in the second step so that the 100 faces each other. (200-2) and the hole-forming chromium film substrate 100 is integrally coupled.

Specifically, the third step, the micro jig substrate 200-2 is inserted into the fixing jig 210, and the adjustment jig for fine-adjusting the hole-forming chromium film substrate 100 in the X direction, the Y direction and the θ direction ( 110, the microlens unit 150-2 using an alignment mark formed at each outer side such that the center between the plurality of holes 25 corresponds to the center of the shape portion 15 of the microlens 1: 1. ) And the position alignment process of finely aligning the relative positions of the hole-forming chromium film 20 '(see FIG. 7 (a)), and the hole-forming chrome toward the microlens substrate 200-2 in the aligned state. A pressurization step (see FIG. 7B) to press the film substrate 100 to a predetermined pressure and bring it into close contact, and an ultraviolet curing step of curing the microlens unit 150-2 with ultraviolet rays (FIG. 7C). Reference).

As shown in part (a) of FIG. 7 and in FIG. 5, the fixing jig 210 is coupled to the microlens substrate 200-2 in a form of a wrapper below, and has a center portion except for an edge portion in an open form. Is formed. In addition, the adjusting jig 110 is coupled to the hole-forming chromium film substrate 100 in the form of wrapping from above, and the fixing jig 210 may be rotated in the θ direction about the reference axis 113 on the fixing jig 210. Is assembled on. In addition, the adjustment jig 110 includes adjustment means 115 and 117 that can fine-tune the hole-forming chromium film substrate 100 coupled thereinto in the X and Y directions. In the position alignment process using the fixing jig 210 and the adjusting jig 110, the adjusting jig coupled with the hole-forming chromium film substrate 100 on the fixing jig 210 coupled with the microlens substrate 200-2. Through the rotation in the θ direction of 110, the angles of the microlens substrate 200-2 and the hole-forming chromium film substrate 100 are coincident with each other, and then the adjusting means 115 and 117 provided in the adjusting jig 110. Through fine adjustment in the X and Y directions.

After the alignment process is completed, the fixing jig 210 and the adjusting jig 110 remain fixed so that relative positional change does not occur. As shown in part (b) of FIG. 7, in this state, The pressing process of applying a predetermined pressure from above and below through the fixing jig 210 and the adjusting jig 110 is performed.

Through the pressure control acting in the process of performing the pressing process, the thickness of the microlens unit 150-2 in the uncured state is adjusted. Even in the state in which the pressurization process is completed, the fixing jig 210 and the adjusting jig 110 are maintained in a fixed state so that relative position change does not occur.

Finally, in the state in which the microlens substrate 200-2 and the hole-forming chromium film substrate 100 are fixed in such a manner that the relative positional variation is limited by the fixing jig 210 and the adjusting jig 110, FIG. As shown in part (c) of FIG. 7, the microlens portion 150'-2 made of the optical adhesive in the uncured state is cured by ultraviolet rays in the process of performing an ultraviolet curing process, thereby completing a shadow mask function. It is possible to obtain a micro lens array having a. That is, the microlens substrate 200-2 and the hole-forming chromium film substrate 100 are integrated in the process of hardening the microlens unit 150 ′-2, depending on the fixing jig 210 and the adjusting jig 110. The result is a microlens array with a shadow mask function in a stable state where the relative position cannot be changed without the need.

On the other hand, the position alignment process and the pressing process included in the second step according to the second embodiment, as the microlens portion 150-2 made of the optical adhesive is a process performed in the uncured state, the microlens portion It may be desirable to be carried out in a vacuum chamber (not shown) to exclude the possibility that bubbles will be contained in 150-2.

In addition, the position alignment process and the pressing process described above may be performed in a different order or simultaneously.

8 is an exemplary view sequentially illustrating a second step of manufacturing the microlens substrate according to the third embodiment of the present invention.

According to the third preferred embodiment of the present invention, the second step of manufacturing the microlens substrate, as shown in Figure 8, by etching the hole-forming chromium film substrate 100 prepared in the first step, hole-forming chromium Quartz substrate etching process of engraving microlens-shaped portions 15 in an array form corresponding to a plurality of holes 25 provided in the film 20 'on the quartz substrate 10 in an engraved manner (see FIG. 8B). ), A chromium film removal process for removing the hole-forming chromium film 20 'remaining in the state covering the microlens-shaped portion 15 of the quartz substrate 10 (see FIG. 8C), and the quartz substrate 10 In the adhesive coating process (see (d) of FIG. 8) of coating the microlens-shaped portion 15 of) with an optical adhesive to form a layered microlens portion 150-3, it is put in a vacuum chamber Bubble removal process for removing the bubbles contained in the formed microlens portion 150-3, the microlens portion 150'-3 An ultraviolet curing process (see FIG. 8 (e)) for curing with ultraviolet rays, and a thickness adjusting process for adjusting the thickness by polishing the surface of the cured microlens unit 150 ″ -3 (see FIG. 8 (f)). It includes.

In more detail, first, the hole-forming chromium film manufactured in the first step in such a manner that the etching solution penetrates into the quartz substrate 10 through the plurality of holes 25 formed in the hole-forming chromium film 20 '. The substrate 100 is etched so that microlens-shaped portions 15 in an array form corresponding to the plurality of holes 25 provided in the hole-forming chromium film 20 'are formed intaglio on the quartz substrate 10. . The etching solution used in the quartz substrate etching process is also component controlled to include other chemicals, and the component is controlled so as not to penetrate the quartz substrate 10, the etching solution used in the above-described chromium film etching process. It is different from. After forming the microlens-shaped portion 15 on the quartz substrate 10 by etching, the hole-forming chromium film 20 'remaining on the quartz substrate 10 with the microlens-shaped portion 15 covered is removed. do.

Subsequently, the microlens-shaped portion 15 of the quartz substrate 10 is coated with a fluid gel type optical adhesive to form a layered microlens portion 150-3. Such an adhesive coating process, as in the above embodiments may be carried out through a rotary coating device to adjust the thickness by adjusting the number of revolutions. In addition, the adhesive coating process may be carried out through a spray coating apparatus, in which case by adjusting the spraying amount of the spray coating apparatus, the thickness of the microlens portion to be formed is adjusted. However, as the thickness can be adjusted by a separate thickness adjusting process, it may be not required to do this. However, in the third embodiment, it is preferable that the coating thickness of the microlens portion 150-3 is thicker than in the case of the first embodiment.

Subsequently, a bubble contained in the microlens unit 150-3 formed in the adhesive coating process by removing the air bubbles in the vacuum chamber (not shown) is removed. This bubble removal process is particularly important when the adhesive coating process is not performed through the rotary coating apparatus, and is also important because it is likely to contain bubbles as the microlens portion 150-3 is thickly coated. I will.

Subsequently, as in the case of the first embodiment, the microlens portion 150'-3 made of the optical adhesive in the uncured state is cured by ultraviolet rays during the ultraviolet curing process, and finally the microlens portion is cured. The microlens substrate 200-3 including the microlens portion 150 ″ -3 is manufactured through a thickness adjusting process of polishing the surface of the 150 " -3 to adjust the thickness. Here, the thickness adjusting process is similar to the polishing process of the first embodiment, while the polishing process focuses only on the fine polishing of the surface, whereas the thickness adjusting process performed in the third embodiment is performed by polishing the microlenses. It can be said that the emphasis is directly on the thickness of the portion 150 "-3.

9 is an exemplary view sequentially illustrating a third step of completing a microlens array with a shadow mask function according to a third embodiment of the present invention.

According to a third preferred embodiment of the present invention, the third step of completing the microlens array with the shadow mask function is, as shown in FIG. 9, the microlens substrate 200-3 manufactured through the second step. ) And another hole-forming chromium film substrate 100 which is manufactured through the first step and then not passed through the second step, and includes the microlens portion 150 "-3 and the hole-forming chromium film. The microlens in a state in which the other hole-forming chromium film substrate 100 manufactured in the first step is disposed on the microlens substrate 200-3 manufactured in the second step so that the 20 ′ faces each other. The substrate 200-3 and the hole forming chromium film substrate 100 are integrally coupled to each other.

Specifically, in the third step, in the state in which a small amount of the optical adhesive is dropped on the microlens substrate prepared in the second step (see FIG. 9 (a)), the hole formation with the microlens portion 150 ″ -3 is formed. Another hole-forming chromium film substrate 100 manufactured in the first step is disposed on the microlens substrate 200-3 so that the chromium film 20 ′ faces each other, and then the gap between the two substrates is minimized. The gap stabilization step of unfolding the optical adhesive by rubbing each other (see FIG. 9 (b)), inserting the microlens substrate 200-3 into the fixing jig 210, and placing the hole-forming chromium film substrate 100 in the X direction. In the state in which the adjustment jig 110 finely adjustable in the Y direction and the θ direction, the centers of the plurality of holes 25 correspond to the center of the shape portion 15 of the microlens so as to correspond 1: 1. Relative position of the microlens portion 150 "-3 and the hole forming chromium film 20 'by using the alignment mark Position alignment process (see FIG. 9 (c)) to fine-tune the alignment, and the optical adhesive unfolded by the gap stabilization process is cured with ultraviolet light, and the microlens substrate 200-3 and the hole forming chromium film substrate 100 UV bonding process (refer FIG. 9 (d)) which integrates the process.

In more detail, as shown in parts (a) and (b) of FIG. 9, the gap stabilization process may be performed by using a microlens substrate 200-3 prepared in a second step by using a small amount of one or two drops of the optical adhesive. In the state where it is dropped on the cured microlens portion 150 ″ -3 on the upper side, the other one manufactured in the first step so that the microlens portion 150 ″ -3 and the hole-forming chromium film 20 'face each other. The hole-forming chromium film substrates 100 are overlapped and then rubbed with each other until the gap between the two substrates is minimized. In this process, the optical adhesive 145 is spread evenly while being spread evenly, and if it lasts for a predetermined time, the optical adhesive 145 can not be further thinned to reach a state where the interval is minimized.

Subsequently, the adjustment jig 110 which pinches the microlens substrate 200-3 positioned below the fixing jig 210 and finely adjusts the hole-forming chromium film substrate 100 in the X, Y and θ directions can be used. Microlens portion 150 " -3 using an alignment mark formed at each outer edge such that the center between the plurality of holes 25 corresponds to the center of the shape portion 15 of the microlens in a state of And the relative position of the hole-forming chromium film 20 'by fine adjustment.

Specifically, as shown in part (c) of FIG. 9 and FIG. 5, the fixing jig 210 is combined with the microlens substrate 200-3 in a form of wrapping from below, and the center part except the edge part is opened. It is formed in the form of. In addition, the adjusting jig 110 is coupled to the hole-forming chromium film substrate 100 in the form of wrapping from above, and the fixing jig 210 may be rotated in the θ direction about the reference axis 113 on the fixing jig 210. Is assembled on. In addition, the adjustment jig 110 includes adjustment means 115 and 117 that can fine-tune the hole-forming chromium film substrate 100 coupled thereinto in the X and Y directions. In the position alignment process using the fixing jig 210 and the adjusting jig 110, the adjusting jig coupled with the hole-forming chromium film substrate 100 on the fixing jig 210 coupled with the microlens substrate 200-3. Through the rotation in the θ direction of 110, the angles of the microlens substrate 200-3 and the hole-forming chromium film substrate 100 coincide with each other, and then the adjusting means 115 and 117 provided in the adjusting jig 110. Through fine adjustment in the X and Y directions. Then, after the alignment is completed, the fixing jig 210 and the adjusting jig 110 are maintained in a fixed state so that relative position variation does not occur until the ultraviolet bonding process through UV curing described later is completed.

After completion of the alignment process, as shown in part (d) of FIG. 9, the thin film is present in a thinly stretched state between the hole-forming chromium film 20 'and the microlens portion 150 "-3 by irradiation with ultraviolet rays. The ultraviolet bonding process is performed in such a manner as to cure the optical adhesive 145 to integrate the microlens substrate 200-3 and the hole-forming chromium film substrate 100, thereby providing a microlens having a completed shadow mask function. You will get an array.

The microlens array having a shadow mask function manufactured by the above-described manufacturing method includes a hole-forming chromium film substrate 100 manufactured in the first step and another hole-forming chromium film substrate 100 in the second step. The hole forming chromium film 20 'of the hole forming chromium film substrate 100 having a plurality of holes is formed of the microlens substrates 200-1, 200-2 and 200-3 manufactured using It serves as a shadow mask to prevent ghosting, and thus has a shadow mask function. In other words, the hole-forming chromium film 20 'of the hole-forming chromium film substrate 100 used to manufacture the microlens substrate in the second step does not constitute a microlens array having a shadow mask function, but only a microlens. When the quartz substrate etching process for manufacturing the substrate is performed, the microlens-shaped portion 15 is used to form the microlens-shaped portion 15 in the quartz substrate in a predetermined arrangement, and does not serve as a shadow mask.

Although the present invention has been described in detail only with respect to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made within the scope of the technical idea of the present invention, and such changes and modifications belong to the appended claims. It will be natural.

1 is an exemplary view sequentially showing a first step of manufacturing a hole-forming chromium film substrate according to the present invention,

2 is an exemplary view sequentially illustrating a second step of manufacturing a microlens substrate according to the first embodiment of the present invention;

3 is an exemplary diagram sequentially illustrating a third step of completing a microlens array with a shadow mask function according to a first embodiment of the present invention;

4 is a layout diagram schematically illustrating a focal length checking process according to a first embodiment of the present invention;

5 is a plan view schematically illustrating the position alignment process according to the present invention;

6 is an exemplary view sequentially illustrating a second step of manufacturing the microlens substrate according to the second embodiment of the present invention;

7 is an exemplary diagram sequentially illustrating a third step of completing a microlens array with a shadow mask function according to a second embodiment of the present invention;

8 is an exemplary view sequentially illustrating a second step of manufacturing a microlens substrate according to a third embodiment of the present invention;

9 is an exemplary view sequentially illustrating a third step of completing a microlens array with a shadow mask function according to a third embodiment of the present invention;

* Description of the symbols for the main parts of the drawings *

10: quartz substrate 15: microlens shape portion

20: chromium film 20 ': hole-forming chromium film

30: photosensitive film 30 ': pattern photosensitive film

60: laser light source 70: optical expander

80: microscope 100: hole-forming chromium film substrate

110: adjustment jig 113: reference axis

115, 117: adjusting means 130: spacer

140, 145: optical adhesive

150-1. 150'-1, 150-2, 150'-2, 150-3, 150'-3, 150 "-3: microlens section

200-1, 200-2, 200-3: Microlens substrate

210: fixed jig

Claims (9)

A chromium film coating process of coating a chromium film on a quartz substrate, a photoresist coating process of coating a photoresist film on the chromium film, and exposing the photoresist film to have a predetermined shape of a plurality of holes and then developing the photoresist film pattern to form a pattern photoresist film. Process, a chromium film etching process for forming a hole forming chromium film capable of performing a role of a shadow mask by etching the chromium film to have a plurality of holes corresponding to the pattern, and the pattern photosensitive film remaining on the hole forming chromium film A first step of manufacturing a hole-forming chromium film substrate comprising a photoresist film removing step of peeling off; Etching the hole-forming chromium film substrate prepared in the first step to form a microlens-shaped portion of the array form corresponding to the plurality of holes provided in the hole-forming chromium film on the quartz substrate intaglio A chromium film removing step of removing the hole-forming chromium film remaining in a state covering the microlens-shaped portion of the quartz substrate; and coating the microlens-shaped portion of the quartz substrate with an optical adhesive to form a layered microlens portion. A second step of manufacturing a microlens substrate with the hole-forming chromium film substrate comprising an adhesive coating process to; And In the state in which the other hole-forming chromium film substrate manufactured in the first step is superimposed on the microlens substrate manufactured in the second step so that the microlens portion and the hole-forming chromium film face each other. And a third step of combining the microlens substrate and the hole-forming chromium film substrate to complete a microlens array having a shadow mask function. The third step may include a focal length checking step of checking a focal length of the microlens unit provided in the microlens substrate manufactured in the second step; A gap adjusting process of inserting a spacer having a predetermined thickness selected according to the identified focal length to be positioned along an edge between the microlens substrate and the hole forming chromium film substrate; The microlens substrate is inserted into the fixing jig, and the hole-forming chromium film substrate is inserted into the adjusting jig which can be fine-adjusted in the X, Y and θ directions. A position alignment process of finely aligning the relative positions of the microlens portion and the hole-forming chromium film by using an alignment mark formed on each outer side so that the center of the lens corresponds 1: 1; and The bonding process of integrating the microlens substrate and the hole-forming chromium film substrate by injecting an optical adhesive into the gap formed between the microlens substrate and the hole-forming chromium film substrate by the spacer and curing the UV lens with ultraviolet light. A method of manufacturing a microlens array having a shadow mask function, characterized in that it comprises a. The method of claim 1, The adhesive coating process is carried out through a rotary coating device, the method of manufacturing a microlens array with the shadow mask function, characterized in that for controlling the thickness of the microlens portion by adjusting the number of rotation of the rotary coating device. . The method of claim 1, The adhesive coating process is performed through a spray coating device, the method of manufacturing a microlens array with the shadow mask function, characterized in that for controlling the thickness of the microlens portion by adjusting the spraying amount of the spray coating device. The method of claim 1, The second step, An ultraviolet curing process for curing the microlens portion formed in the adhesive coating process with ultraviolet rays, and And a polishing process of finely polishing the cured surface of the microlens portion. delete The method of claim 1, The focal length confirmation step, Using a focal length measuring device comprising a microscope including a laser light source, an optical expander disposed in front of the laser light source, and a CCD disposed in front of the optical expander, wherein the microlens substrate is disposed between the optical enlarger and the microscope The method of manufacturing a microlens array having the shadow mask function, characterized in that performed in one state. delete delete delete

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