KR20100111132A - Pellicle de-mounter of photomask - Google Patents

Pellicle de-mounter of photomask Download PDF

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Publication number
KR20100111132A
KR20100111132A KR1020090029538A KR20090029538A KR20100111132A KR 20100111132 A KR20100111132 A KR 20100111132A KR 1020090029538 A KR1020090029538 A KR 1020090029538A KR 20090029538 A KR20090029538 A KR 20090029538A KR 20100111132 A KR20100111132 A KR 20100111132A
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KR
South Korea
Prior art keywords
pellicle
photomask
clamp
frame
adhesive
Prior art date
Application number
KR1020090029538A
Other languages
Korean (ko)
Inventor
서강준
Original Assignee
주식회사 하이닉스반도체
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 하이닉스반도체 filed Critical 주식회사 하이닉스반도체
Priority to KR1020090029538A priority Critical patent/KR20100111132A/en
Publication of KR20100111132A publication Critical patent/KR20100111132A/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: A pellicle detachment apparatus of a photo-mask is provided to prevent the contamination of a mask process progressing devices, and to extend the usage lifetime of the photo-mask. CONSTITUTION: A pellicle detachment apparatus of a photo-mask comprises the following: a mask loading unit(200) to settle the photo-mask attached with a pellicle formed with a pellicle film(110) and a frame(120); a clamp(210) coupled with the frame; and a rotary driving unit(220) detaching the pellicle with a constant speed using a stepping motor, transferring a fixed amount of force by rotating to the clamp.

Description

Pellicle de-mounter of photomask

The present invention relates to an apparatus for a photomask, and more particularly to a pellicle desorption apparatus for a photomask.

In the process of manufacturing a semiconductor device, a photolithography (photolithogrpahy) process using a photomask is used to implement a pattern to be formed on a semiconductor substrate. However, if the surface of the photomask is contaminated by particles or the like, it affects the pattern transferred to the semiconductor substrate during the exposure process. Therefore, after manufacturing the photomask as a method for preventing contamination of the photomask, a pellicle is attached to the photomask.

By the way, after attaching a pellicle on a photomask in the process of manufacturing a photomask, the pellicle is detach | desorbed for the reason of mask cleaning etc., and is occurring. In the case of a pellicle, it is attached to the mask by a pellicle adhesive, and detachment is possible when force is applied in the opposite direction to the inherent adhesive force. Therefore, a pellicle desorption apparatus is used to detach | desorb a pellicle from a photomask.

The method of detaching a pellicle using a pellicle desorption equipment is to close a clamp, which is a desorption tool, to a desorption hole existing in the pellicle frame, and to apply pressure to the pellicle in the opposite direction by using a hydraulic cylinder method. Add. Then, the pellicle is detached from the photomask by the force applied to the clamp. As described above, when the hydraulic cylinder type pellicle desorption equipment has a strong adhesive force between the mask and the pellicle, the pellicle adhesive remains on the mask surface because the desorption strength through the cylinder suddenly increases and the desorption strength is stronger than the deformation caused by the ductility of the adhesive. Is generated.

Specifically, when the elastic pellicle adhesive is detached, the shape of the adhesive is modified according to the detachment speed and the force of the frame, and when the detachment speed is high, the adhesive remains attached to the pellicle frame due to the elastic limit of the adhesive and remains on the mask surface without falling off. Boiling occurs as water is generated and remains on the mask surface.

In order to remove the adhesive residue remaining on the mask surface, it can be removed using a cleaning solution containing sulfuric acid, but further contamination such as haze dedefect is generated by the sulfate ion remaining on the mask surface. Therefore, research is required to remove the pellicle without adhesive residue to extend the service life of the photosk, to protect it from contamination, and to prevent contamination of mask processing equipment.

A pellicle desorption apparatus of a photomask according to the present invention includes a mask loading unit on which a pellicle-attached photomask is mounted, comprising a pellicle film and a frame; A clamp coupled to the frame to transmit a force to the pellicle; And a rotation driving unit which detaches the pellicle at a constant speed by a stepping motor that rotates so that a force of a constant strength is transmitted to the clamp over time.

The pellicle preferably further includes a pellicle adhesive for fixing the pellicle and the photomask between the frame and the photomask, and a detachable hole for attaching or detaching the pellicle from the photomask to the frame.

The clamp is preferably configured to include a protruding portion projecting to engage and engage with the removable hole existing in the frame and the connection portion connected to the rotation drive.

The stepping motor is preferably rotated at a predetermined angle by a digital signal.

The pellicle desorption equipment of the photomask according to the present invention may be introduced into the pellicle desorption equipment configured to apply a force in the opposite direction to the pellicle. For example, the pellicle detachment equipment of the photomask is configured to include a mask loading portion on which the mask is seated, a clamp engageable with the pellicle detachment hole, and a drive portion that pulls the clamp in a direction opposite to the pellicle attachment to enable detachment of the pellicle. The pellicle desorption apparatus according to the present invention by using a stepping motor that can rotate by a unit of a certain angle through an electrical signal by detaching the pellicle at a constant speed by a force of a constant strength, the surface of the pellicle and photomask The pellicle adhesive adhering the adhesive can be completely removed without residue.

Referring to Figure 1, the pellicle desorption apparatus according to an embodiment of the present invention, having a mask loading portion 200 is mounted a photomask having a pellicle, a clamp 210 that can be engaged with the pellicle detachment hole, And it is configured to include a rotary drive unit 220 for removing the pellicle at a constant speed by transmitting a force of a constant strength over time to the clamp 210. At this time, the rotation driving unit 220 is configured to include a stepping motor (rotating) at a predetermined angle so that the force is applied without changing the detachment strength, in order to detach the pellicle from the surface of the photomask 100. The stepping motor is rotated at an angle through the digital signal, and the pellicle coupled with the clamp 210 is pulled in the opposite direction to the pellicle attachment while the stepping motor is rotated. The clamp 210 is configured to include a protrusion connected at both ends to protrude and engage with a detachable hole 121 existing in the frame 120, and a connection part connected to the rotation driving part 220.

The rotation driving unit 220 induces the pellicle coupled to the clamp 210 through the stepping motor to be pulled by a constant speed force in the opposite direction of attachment without changing the strength with time. For example, by using a stepping motor, the clamp 210 transmits a force to the pellicle adhesive 130, thereby maintaining a constant desorption pressure before and after the critical point of the elastic limit of the pellicle adhesive 130. In this case, the pellicle adhesive 130 maintains greater adhesion to the pellicle frame 120 than the surface of the photomask 100 so that the pellicle can be detached without the residue of the pellicle adhesive 130 on the surface of the photomask 100. Can be.

On the other hand, when looking at the pellicle structure of the photomask, as shown in Figure 2, the pellicle (pellicle) is a pellicle film 110 and a pellicle film 110 that is spaced apart from a predetermined distance from the surface of the photomask 100, It consists of a frame 120, a pellicle adhesive 130 is introduced between the frame 120 and the photomask to fix the pellicle and the photomask 100. In this case, the frame 120 includes a detachable hole 121 for attaching or detaching the pellicle from the photomask. Since the pellicle composed of the pellicle film 110 and the frame 120 is attached by applying pressure in the direction of the arrow "a" on the photomask 100, the direction "a" becomes the attachment direction of the pellicle. Although not shown in detail in the drawing, the photomask 100 has a structure in which a mask pattern is formed on a light transmissive substrate. The light transmissive substrate may be formed of quartz, and the mask pattern may be formed of a light blocking pattern including chromium or a phase reversal pattern including a molybdenum compound. At this time, the mask pattern is a pattern to be formed on the wafer is disposed in the center of the photomask, the pellicle is disposed in the outer region where the pattern is not formed.

The pellicle adhesive 130 is an elastic adhesive made of acrylic (acryl) or silicone (slilcon), and when the pellicle is attached to the surface of the photomask 100 by applying pressure in the "a" direction, it has an inherent adhesive force. When a force is applied to the adhesive force of the pellicle adhesive 130 in the opposite direction to the pellicle attachment, the pellicle may be detached from the photomask 100.

Looking at the pellicle desorption process using the above-described pellicle desorption equipment, the mask loading unit 200 introduces a photomask 100 to which desorption of the pellicle is performed for reasons such as a cleaning process. At this time, the photomask 100 may be reversed and introduced to face the top. When the photomask 100 is introduced into the mask loading unit 200, as shown in FIG. 3, which shows the side of the pellicle frame, the protrusion of the clamp 210 is applied to the frame 120 by applying a force in the direction of the arrow 'b'. It is in close contact with the detachable hole 121 present in the. Then, the protrusion of the clamp 210 is engaged with the removable hole 121 is engaged. Next, as shown in FIG. 4, the pellicle is applied to the photomask beyond the critical point of the elastic limit of the adhesive 130 by applying a force in the direction of arrow 'c' to the clamp 210 engaged and engaged with the pellicle. It is induced to detach from (100). In the drawing, 'd' is a detachment distance from which the pellicle is detached from the surface of the photomask 100. When the force is applied to the pellicle adhesive 130 or more, the pellicle is detached from the photomask 100.

At this time, in order to apply a force in the opposite direction to the pellicle attached to the clamp 210, by driving the rotary drive unit 220 connected to the clamp 210 to induce the stepping motor to be rotated by a predetermined angle unit. Then, a constant pressure is applied to the clamp 210 in the opposite direction to the pellicle attachment, while the force is transmitted to the clamp 210, the desorption pressure to the pellicle adhesive 130 is kept constant. Because of this, as time increases, the pellicle adhesive 130 maintains greater adhesion to the pellicle frame 120 than to the photomask 100 surface, so that the pellicle adhesive 130 can be detached without a residue of the adhesive on the surface of the photomask 100. Do.

Meanwhile, the pellicle may be detached by applying a force in a direction opposite to the pellicle attachment with a hydraulic cylinder. However, if a force is transmitted to the clamp depending on the amount of fluid through the hydraulic cylinder, the ductility of the pellicle adhesive is not taken into account, so that the greatest force is transmitted just before the adhesive falls out of the elastic limit of the adhesive. In this case, there is a problem that the adhesive is broken from the center of the adhesive, and the adhesive remains on the surface of the photomask.

5 is a graph comparing changes in tensile strength until the clamp is detached when the clamp is applied using a hydraulic cylinder and a stepping motor. As shown in FIG. 5, when looking at the tensile strength 300 of applying a force to the clamp with the hydraulic cylinder (A), the pressure strength from the time point P1 of applying the force to the pellicle to the time point P2 at which the pellicle is detached It can be seen that the largest tensile strength 300 is issued immediately before the desorption point P2 because the is not controlled. On the other hand, when the force is applied to the clamp by using a stepping motor (B), when looking at the tensile strength (310), by applying a force to the clamp by controlling the pressure intensity applied to the clamp while rotating at a constant speed by the stepping motor It can be seen that a constant tensile strength 310 is maintained from the time point P1 to the time point P2 at which the pellicle is detached.

FIG. 6 is a graph illustrating a detachment distance of a pellicle falling from a photomask surface when using a hydraulic cylinder and a stepping motor. As shown in FIG. 6, in the case of the hydraulic cylinder (A), the detachment distance 400 of the cylinder is gradually increased while the cylinder pulling distance is gradually increased by the adhesive force of the pellicle adhesive. Distance 400 is maximum. On the other hand, when using a stepping motor (B), a constant speed is transmitted as the stepping motor rotates and a force is transmitted to the clamp, so that it can be seen that the detachment distance increases until the pellicle is detached. As such, as a result of detaching the pellicle from the photomask, as shown in FIG. 8, when the hydraulic cylinder is used (A), the pellicle adhesive remains on the photomask surface, whereas when the stepping motor is used (B) It can be seen that the adhesive is desorbed without residues on the photomask surface.

As mentioned above, although preferred embodiments of the present invention have been described in detail, the present invention is not limited thereto, and various modifications can be made by those skilled in the art within the technical spirit of the present invention.

1 to 4 are views shown to explain the pellicle desorption equipment of the photomask according to the present invention.

5 to 7 are views illustrating a comparison between a pellicle desorption apparatus using a pellicle desorption apparatus and a hydraulic cylinder of a photomask according to the present invention.

Claims (4)

A mask loading unit to which a pellicle-attached photomask comprising a pellicle film and a frame is seated; A clamp coupled to the frame to transmit a force to the pellicle; And The pellicle detachment equipment of the photomask including a rotary drive for detaching the pellicle at a constant speed by a stepping motor that rotates to transmit a constant strength of force over time to the clamp. The method of claim 1, And the pellicle further comprises a pellicle adhesive for fixing the pellicle and the photomask between the frame and the photomask, and a detachable hole for attaching or detaching the pellicle from the photomask to the frame. The method of claim 1, The clamp is a pellicle detachment equipment of the photomask comprising a projecting portion which is coupled to engage with the detachable hole existing in the frame and both ends, and the connection portion connected to the rotary drive. The method of claim 1, The stepping motor is a pellicle detachment equipment of a photomask that rotates at a predetermined angle by a digital signal.
KR1020090029538A 2009-04-06 2009-04-06 Pellicle de-mounter of photomask KR20100111132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020090029538A KR20100111132A (en) 2009-04-06 2009-04-06 Pellicle de-mounter of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090029538A KR20100111132A (en) 2009-04-06 2009-04-06 Pellicle de-mounter of photomask

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KR20100111132A true KR20100111132A (en) 2010-10-14

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160034800A (en) * 2014-09-22 2016-03-30 신에쓰 가가꾸 고교 가부시끼가이샤 Pellicle frame and pellicle
US9575421B2 (en) 2014-09-04 2017-02-21 Samsung Electronics Co., Ltd. Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9575421B2 (en) 2014-09-04 2017-02-21 Samsung Electronics Co., Ltd. Apparatus for protecting extreme ultra violet mask and extreme ultra violet exposure apparatus including the same
KR20160034800A (en) * 2014-09-22 2016-03-30 신에쓰 가가꾸 고교 가부시끼가이샤 Pellicle frame and pellicle

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