KR20100089923A - Liquid crystal display and method for manufacturing the same - Google Patents

Abstract

PURPOSE: An LCD device and a method for manufacturing the same is provided to form a trench on the reiteration part of a color filter, thereby preventing a speed cone from being formed on the reiteration part. CONSTITUTION: Color filters(230R,230G) are formed on a first substrate(110) and a light blocking film(220). A gate line and data line(171) are formed on the color filters. A TFT(154) is connected to the gate line and the data line. A pixel electrode(191) is connected to the TFT transistor. The color filters are overlapped on the upper part of the light blocking film. A trench(111) is formed on a part of corresponding to the data line and the TFT transistor.

Description

Liquid crystal display device and its manufacturing method {LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME}

The present invention relates to a liquid crystal display device and a manufacturing method thereof, and more particularly, to a liquid crystal display device in which a thin film transistor and a pixel electrode are arranged on a color filter and a light blocking member.

The liquid crystal display is one of the most widely used flat panel display devices. The liquid crystal display includes two display panels on which electrodes are formed and a liquid crystal layer interposed therebetween to rearrange the liquid crystal molecules of the liquid crystal layer by applying a voltage to the electrode. The display device controls the amount of light transmitted.

Among the liquid crystal display devices, which are currently mainly used are structures in which electric field generating electrodes are provided on two display panels, respectively. Among these, a plurality of thin film transistors and pixel electrodes are arranged in a matrix form on one display panel (hereinafter referred to as a 'thin film transistor display panel'), and red, green, and other display panels (hereinafter, referred to as a 'common electrode display panel'). The main structure is the structure in which the blue color filter is formed and the common electrode covers the whole surface.

However, since the liquid crystal display device is formed on a display panel having a different pixel electrode and a color filter, it is difficult to accurately align the pixel electrode and the color filter, thereby causing an alignment error. In order to solve this problem, a structure in which a light blocking member such as a color filter and a black matrix is formed on the same display panel as the pixel electrode has been proposed.

Among these structures, an array on color filter structure in which a color filter and a black matrix are first formed on a substrate, and a plurality of thin film transistors and pixel electrodes are formed thereon forms a color filter and then overlaps the color filters. An insulating film is formed to planarize the step difference.

However, these insulating films result in increased cost, lower productivity, and lower yields due to reduced side light leakage margin and process addition. In addition, if the insulating film is not formed, defects such as disconnection due to the step and bending between the color filters may occur.

The problem to be solved by the present invention is to remove the step of the overlapping portion of the color filter.

In an exemplary embodiment of the present invention, a liquid crystal display includes a first substrate, a light shielding film formed on the first substrate, a color filter formed on the first substrate and the light shielding film, gate lines and data lines formed on the color filter, gate lines and data. A thin film transistor connected to a line, a pixel electrode connected to the thin film transistor, and a second substrate facing the first substrate and including a common electrode, the color filters overlap each other on the top of the light shielding film.

The first substrate may have a trench formed in a portion corresponding to the data line and the thin film transistor.

The light blocking film may be formed in the trench.

The first substrate may be made of alkali glass.

The display device may further include an insulating film formed between the first substrate and the color filter.

The insulating film may have an opening that exposes the first substrate.

The light shielding film may be formed in the opening.

A method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention includes forming a photoresist pattern on a first substrate, forming a trench in the first substrate, forming a light shielding film in the trench, and forming a light blocking film on the first substrate and the light shielding film. Forming a color filter, forming a gate line, a data line, and a thin film transistor connected to the gate line and the data line on the color filter, and forming a pixel electrode connected to the thin film transistor.

Forming the trench in the first substrate may include wet etching the first substrate using a mixture of phosphoric acid, sulfuric acid, ammonium fluoride, and ultrapure water using the photoresist pattern as a mask.

The forming of the light blocking film in the trench may include forming the light blocking member on the photoresist pattern and the trench, and performing a lift off process to remove the light blocking member formed on the photoresist pattern and the photoresist pattern.

The method may further include forming a barrier film on the first substrate before forming the photoresist pattern.

The forming of the trench in the first substrate may include exposing the first substrate by etching the barrier layer using the photoresist pattern as a mask, and exposing the exposed portion of the first substrate using an acid containing fluorine using the photoresist pattern as a mask. Wet etching may include the step of wet etching.

The forming of the light blocking film in the trench may include removing the photoresist pattern, forming the light blocking member on the barrier film and the trench, developing the light blocking member after back exposure, and removing the light blocking member formed on the barrier film. Removing the membrane.

According to another exemplary embodiment of the present invention, a method of manufacturing a liquid crystal display device includes forming an insulating film on a first substrate, forming a photoresist pattern on the insulating film, forming an opening exposing the first substrate on the insulating film, and Forming a light blocking film, forming a color filter on the insulating film and the light blocking film, forming a thin film transistor connected to the gate line, the data line and the gate line and the data line on the color filter, and forming a pixel electrode connected to the thin film transistor. Steps.

The first substrate may be formed of alkali glass.

The forming of the opening for exposing the first substrate in the insulating layer may include exposing the first substrate by etching the insulating layer using the photoresist pattern as a mask.

The forming of the light blocking film in the opening may include forming the light blocking member on the opening and the photoresist pattern, and performing a lift off process to remove the light blocking member formed on the photoresist pattern and the photoresist pattern.

According to the embodiment of the present invention, since a step is formed by forming a trench in a portion where the color filters overlap, a step does not occur in a portion where the color filters overlap, and there is no need to perform a planarization step thereafter.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. Whenever a portion of a layer, film, region, plate, or the like is referred to as being "on" another portion, it includes not only the case where it is "directly on" another portion, but also the case where there is another portion in between. On the contrary, when a part is "just above" another part, there is no other part in the middle.

Next, a method of reducing the step of the color filter according to the embodiment of the present invention will be described in detail with reference to FIGS. 1 to 3.

<First Embodiment>

1 is a flowchart illustrating a method of reducing a step of a color filter according to a first embodiment of the present invention.

As shown in FIG. 1, a photosensitive film pattern is formed on a substrate (S10). After the photoresist film is formed on the substrate, a photoresist pattern is formed to expose a portion where the trench is to be formed.

Next, a trench is formed in the substrate using the photoresist pattern as a mask (S20). When forming the trench, a wet etching process is carried out using a glass etching solution, in order to form an undercut, in order to subsequently remove the light blocking member by a lift-off method.

Next, a light blocking member is laminated on the photoresist pattern and the trench of the substrate (S30). At this time, the light blocking member is not formed in the undercut portion.

Next, the photosensitive film pattern is removed by a lift-off method (S40). At this time, since the light blocking member formed on the photosensitive film pattern is also removed, a light blocking film is formed in the trench.

Next, a color filter is formed (S50).

In this way, since the trench is formed in the portion where the color filters overlap, the step is formed, so that no step occurs in the portion where the color filters overlap, so that the planarization step may not be performed afterwards.

Second Embodiment

2 is a flowchart illustrating a method of reducing a step of a color filter according to a second embodiment of the present invention.

Unlike the first embodiment, the second embodiment uses an acid containing fluorine as an etching solution.

As shown in Fig. 2, a barrier film is laminated on the substrate (P10). The barrier film is formed of a metal such as copper, molybdenum, chromium and the like so as not to be damaged when the trench is subsequently formed on the substrate.

Subsequently, a photoresist pattern is formed on the barrier film (P20), and the barrier film is etched using the photoresist pattern as a mask (P30).

Next, a trench is formed in the substrate using the photosensitive film pattern as a mask (P40). At this time, a wet etching process is performed, and an acid containing fluorine is used as the etching solution.

Next, the photosensitive film pattern is removed (P50), and a light blocking member is formed in the barrier film and the trench (P60).

Next, back exposure and development are performed to remove the light blocking member on the barrier film, and a light shielding film is formed in the trench (P70).

Next, the barrier film is removed (P80) to form a color filter (P90).

In this way, since the trench is formed in the portion where the color filters overlap, the step is formed, so that no step occurs in the portion where the color filters overlap, so that the planarization step may not be performed afterwards.

Third Embodiment

3 is a flowchart illustrating a method of reducing a step of a color filter according to a third embodiment of the present invention.

Unlike the first embodiment, the third embodiment forms a substrate from alkali glass.

As shown in FIG. 3, an insulating film is laminated on the substrate (G10). Alkali substrates are susceptible to thermal and physical influences, so an insulating film is laminated.

Subsequently, a photosensitive film pattern is formed on the insulating film (G20), and the opening is exposed to expose the substrate by etching the insulating film using the photosensitive film pattern as a mask (G20). At this time, a wet etching process is performed to form an undercut.

Next, a light blocking member is formed in the photoresist pattern and the opening (G40), and the photoresist pattern is removed by a lift-off method (G50). At this time, since the light blocking member formed on the photosensitive film pattern is also removed, the light blocking film is formed in the opening.

Next, a color filter is formed (G60).

In this way, since an insulating film is formed on the alkali glass substrate, and an opening is formed in a portion where the color filter overlaps, a step is formed, so that a step does not occur in the portion where the color filter overlaps.

Next, a liquid crystal display device manufactured by applying a method for reducing the step difference of the color filters according to the first to third embodiments and a manufacturing method thereof will be described.

<Fourth Embodiment>

4 is a layout view of a liquid crystal display according to a fourth exemplary embodiment of the present invention, and FIG. 5 is a cross-sectional view taken along the line VV of the liquid crystal display of FIG. 4.

4 and 5, the liquid crystal display according to the fourth exemplary embodiment of the present invention includes a thin film transistor array panel 100 and a common electrode panel 200 facing the thin film transistor array panel 100 and between the two display panels 100 and 200. It includes a liquid crystal layer (3) in the.

First, the thin film transistor array panel 100 will be described.

The trench 111 is formed in the substrate 110 made of an insulating material such as glass or plastic. The trench 111 is formed below the overlapping portion of the thin film transistor, the data line 171, and the color filters 230R, 230G, and 230B described later.

A light blocking film 220 is formed in the trench 111, and color filters 230R, 230G, and 230B are formed on the substrate 110 and the light blocking film 220, and the color filters 230R, 230G, and 230B are formed. The light blocking film 220 overlaps each other.

The plurality of gate lines 121 including the gate electrode 124 on the color filters 230R, 230G, and 230B, the gate insulating layer 140, the plurality of semiconductors 154, and the plurality of ohmic contacts 163 and 165 thereon. ), A plurality of data lines 171 and a plurality of drain electrodes 175 are formed in this order.

The gate line 121 transmits a gate signal and mainly extends in a horizontal direction, and the data line 171 transmits a data signal and mainly extends in a vertical direction and crosses the gate line 121. Each data line 171 includes a plurality of source electrodes 173 extending toward the gate electrode 124. The drain electrode 175 is separated from the data line 171 and faces the source electrode 173 around the gate electrode 124.

The semiconductor 154 is positioned over the gate electrode 124, and the ohmic contacts 163 and 165 thereon are disposed only between the semiconductor 154 and the data line 171 and the drain electrode 175 so as to be disposed between the two. Lower the contact resistance.

One gate electrode 124, one source electrode 173, and one drain electrode 175 together with the semiconductor 154 constitute one thin film transistor (TFT), and the channel of the thin film transistor is a source. It is formed in the semiconductor 154 between the electrode 173 and the drain electrode 175. The thin film transistor is positioned above the trench 111.

The passivation layer 180 is formed on the gate line 121, the data line 171, and the thin film transistor. In the passivation layer 180, a contact hole 185 exposing the drain electrode 175 is formed.

The pixel electrode 191 is formed on the passivation layer 180. The pixel electrode 191 is connected to the drain electrode 175 through the contact hole 185 and receives a data voltage from the drain electrode 175.

The common electrode panel 200 faces the thin film transistor array panel 100 and includes a substrate 210 and a common electrode 270 formed thereon. However, the common electrode 270 may be formed on the thin film transistor array panel 100.

The liquid crystal layer 3 is positioned between the common electrode panel 200 and the thin film transistor array panel 100.

6 to 9 are diagrams sequentially illustrating a method of manufacturing a liquid crystal display according to a fourth exemplary embodiment of the present invention.

6 to 9, after the photoresist pattern 50 is formed on the substrate 110, the trench 110 is formed by etching the substrate 110 using the photoresist pattern 50 as a mask. At this time, a wet process is performed using a glass etching solution made of a mixture of phosphoric acid, sulfuric acid, ammonium fluoride (NH 4 F) and ultrapure water to form the undercut (A).

Next, the light blocking member 225 is stacked on the photosensitive film pattern 50 and the trench 111. At this time, the light blocking member 225 is not laminated to the undercut A portion.

Next, the lift-off process is performed to remove the photosensitive film pattern 50. At this time, the light blocking member 225 stacked on the photoresist pattern 50 is also removed to form the light blocking film 220 inside the trench 111.

Subsequently, color filters 230R, 230G, and 230B are formed on the substrate 110 and the light shielding film 220. The color filters 230R, 230G, and 230B overlap the light shielding film 220.

After that, as illustrated in FIG. 5, the gate line 121, the gate insulating layer 140, the semiconductor layer 154, the ohmic contact layers 163 and 165, and the data line are disposed on the color filters 230R, 230G, and 230B. 171, the drain electrode 175, the passivation layer 180, and the pixel electrode 191 are formed.

The common electrode display panel 200 forms a common electrode 270 on the insulating substrate 210.

Next, after the liquid crystal is dropped on one of the thin film transistor array panel 100 and the common electrode display panel 200, the two display panels 100 and 200 are assembled.

In this way, since the trench is formed in the portion where the color filters overlap, the step is formed, so that no step occurs in the portion where the color filters overlap, so that the planarization step may not be performed afterwards.

<Fifth Embodiment>

The liquid crystal display according to the fifth embodiment of the present invention has the same structure as that of the liquid crystal display according to the fourth embodiment. However, unlike the fourth embodiment, the etchant uses an acid containing fluorine.

10 to 15 are diagrams sequentially illustrating a method of manufacturing a liquid crystal display according to a fifth exemplary embodiment of the present invention.

10 to 15, the barrier film 120 is formed on the substrate 110. The barrier film 120 is formed of a metal such as copper, molybdenum, chromium, and the like so as not to be damaged when the trench is subsequently formed on the substrate, and has a thickness of 100 kPa or more.

Subsequently, after the photoresist pattern 50 is formed on the barrier film 120, the barrier film 120 is etched using the photoresist pattern 50 as a mask. Then, the substrate 110 is etched using the photoresist pattern 50 as a mask to form the trench 111. At this time, the etchant is subjected to a wet process using an etchant consisting of an acid containing fluorine.

In the etching process, the etchant may damage the photoresist pattern 50, and the barrier film 120 serves to prevent the photoresist pattern 50 from being damaged by the etchant.

Subsequently, the light blocking member 225 is laminated on the photosensitive film pattern 50 and the trench 111, and subjected to back exposure, followed by development, to form the light blocking film 220 inside the trench 111.

Subsequently, after the barrier layer 120 is removed, the color filters 230R, 230G, and 230B are formed on the substrate 110 and the light blocking layer 220. The color filters 230R, 230G, and 230B are superimposed on the light shielding film 220.

The subsequent process is the same as in the fourth embodiment.

In this way, since the trench is formed in the portion where the color filters overlap, the step is formed, so that no step occurs in the portion where the color filters overlap, so that the planarization step may not be performed afterwards.

Sixth Example

The liquid crystal display device according to the sixth embodiment of the present invention is almost the same as the structure of the liquid crystal display device according to the fourth embodiment, and forming the substrate from alkali glass is different from the fourth embodiment.

16 is a cross-sectional view of a liquid crystal display according to a sixth embodiment of the present invention, and FIGS. 17 to 20 are views sequentially illustrating a method of manufacturing a liquid crystal display according to a sixth embodiment of the present invention.

As shown in FIG. 16, an insulating film 130 is formed on a substrate 110 made of alkali glass. The opening 131 is formed in the insulating layer 130. The opening 131 is formed below the overlapping portions of the color filters 230R, 230G, and 230B, the thin film transistor, and the data line 171 described later.

The light blocking film 220 is formed in the opening 131, and the color filters 230R, 230G, and 230B are formed on the substrate 110 and the light blocking film 220, and the color filters 230R, 230G, and 230B are formed. The light blocking film 220 overlaps each other.

The plurality of gate lines 121 including the gate electrode 124 on the color filters 230R, 230G, and 230B, the gate insulating layer 140, the plurality of semiconductors 154, and the plurality of ohmic contacts 163 and 165 thereon. ), A plurality of data lines 171 and a plurality of drain electrodes 175 are formed in this order.

The subsequent structure is the same as in the fourth embodiment.

17 to 20, after preparing a substrate 110 made of alkali glass, an insulating film 130 is formed on the substrate 110. Since the alkali glass substrate is vulnerable to heat or physical influence, the insulating glass 130 is formed. At this time, the insulating film 130 is preferably formed to a thickness of 500 to 1000 500.

The photoresist pattern 50 is formed on the insulating layer 130, and the openings 131 are formed to expose the substrate 110 by etching the insulating layer 130 using the photoresist pattern 50 as a mask. At this time, a wet etching process is performed in order to form the undercut (A).

Next, the light blocking member 225 is stacked on the photosensitive film pattern 50 and the opening 131. At this time, the light blocking member 225 is not laminated to the undercut A portion.

Next, the lift-off process is performed to remove the photosensitive film pattern 50. At this time, the light blocking member 225 stacked on the photoresist pattern 50 is also removed to form the light blocking film 220 inside the opening 131.

Subsequently, color filters 230R, 230G, and 230B are formed on the substrate 110 and the light shielding film 220. The color filters 230R, 230G, and 230B overlap the light shielding film 220.

The subsequent steps are the same as in the fourth embodiment.

In this way, since an insulating film is formed on the alkali glass substrate, and an opening is formed in a portion where the color filter overlaps, a step is formed, so that a step does not occur in the portion where the color filter overlaps.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

1 is a flowchart illustrating a method of reducing a step of a color filter according to a first embodiment of the present invention.

2 is a flowchart illustrating a method of reducing a step of a color filter according to a second embodiment of the present invention.

3 is a flowchart illustrating a method of reducing a step of a color filter according to a third embodiment of the present invention.

4 is a diagram illustrating a liquid crystal display according to a fourth exemplary embodiment of the present invention.

FIG. 5 is a cross-sectional view of the liquid crystal display of FIG. 4 taken along the line VV. FIG.

6 to 9 are diagrams sequentially illustrating a method of manufacturing a liquid crystal display according to a fourth exemplary embodiment of the present invention.

10 to 15 are diagrams sequentially illustrating a method of manufacturing a liquid crystal display according to a fifth exemplary embodiment of the present invention.

16 is a cross-sectional view of a liquid crystal display according to a sixth exemplary embodiment of the present invention.

17 to 20 are diagrams sequentially illustrating a method of manufacturing a liquid crystal display according to a sixth embodiment of the present invention.

<Description of Main Reference Signs>

110, 210: substrate 111: trench

130: insulating film 131: opening

220: light shielding film 230R, 230G, 230B: color filter

Claims (17)

First substrate, A light shielding film formed on the first substrate, A color filter formed on the first substrate and the light blocking film; A gate line and a data line formed on the color filter; A thin film transistor connected between the gate line and the data line, A pixel electrode connected to the thin film transistor, and A second substrate opposite the first substrate, the second substrate including a common electrode; And the color filters overlap each other on the light blocking layer. In claim 1, And the first substrate has a trench formed in a portion corresponding to the data line and the thin film transistor. In claim 2, And the light blocking layer is formed inside the trench. In claim 1, And the first substrate is made of alkali glass. In claim 4, A liquid crystal display further comprising an insulating film formed between the first substrate and the color filter. In claim 5, The insulating layer has an opening that exposes the first substrate. In claim 6, And the light blocking film is formed in the opening. Forming a photoresist pattern on the first substrate, Forming a trench in the first substrate, Forming a light shielding film in the trench, Forming a color filter on the first substrate and the light blocking film; Forming a thin film transistor connected to the gate line, the data line, and the gate line and the data line on the color filter; Forming a pixel electrode connected to the thin film transistor Method of manufacturing a liquid crystal display comprising a. In claim 8, Forming a trench in the first substrate is And wet etching the first substrate by using a mixture of phosphoric acid, sulfuric acid, ammonium fluoride, and ultrapure water using the photoresist pattern as a mask. The method of claim 9, Forming a light shielding film in the trench Forming a light blocking member on the photoresist pattern and the trench; And removing the photoresist pattern and the light blocking member formed on the photoresist pattern by performing a lift-off process. In claim 8, And forming a barrier film on the first substrate before forming the photoresist pattern. In claim 11, Forming a trench in the first substrate is Etching the barrier layer using the photoresist pattern as a mask to expose the first substrate; And wet-etching the exposed portion of the first substrate using an acid containing fluorine using the photoresist pattern as a mask. In claim 12, Forming a light shielding film in the trench Removing the photoresist pattern; Forming a light blocking member on the barrier layer and the trench; Developing the light blocking member after back exposure to remove the light blocking member formed on the barrier film; And removing the barrier layer. Forming an insulating film on the first substrate, Forming a photoresist pattern on the insulation layer; Forming an opening in the insulating layer to expose the first substrate, Forming a light shielding film in the opening; Forming a color filter on the insulating film and the light blocking film; Forming a thin film transistor connected to the gate line, the data line, and the gate line and the data line on the color filter; Forming a pixel electrode connected to the thin film transistor Method of manufacturing a liquid crystal display comprising a. The method of claim 14, The first substrate is formed of an alkali glass. 16. The method of claim 15, Forming an opening exposing the first substrate in the insulating film; And etching the insulating film using the photoresist pattern as a mask to expose the first substrate. The method of claim 16, Forming a light shielding film in the opening Forming a light blocking member on the opening and the photoresist pattern; And removing the photoresist pattern and the light blocking member formed on the photoresist pattern by performing a lift-off process.

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