KR20100079194A

KR20100079194A - Apparatus and method for detecting wafer workout errors

Info

Publication number: KR20100079194A
Application number: KR1020080137610A
Authority: KR
Inventors: 이상욱
Original assignee: 주식회사 동부하이텍
Priority date: 2008-12-30
Filing date: 2008-12-30
Publication date: 2010-07-08

Abstract

PURPOSE: A wafer workout error detecting device and a method thereof are provided to reduce the workout error occurrence rate by improving the accuracy of the wafer workout error detection by detecting the workout error of the wafer by realizing a sensor as dual. CONSTITUTION: A workout sensor(302) detects a wafer projected from a wafer cassette which is installed in a cassette platform(300) and is loaded at first. A laser sensor(304) detects the wafer projected to the front side of the chamber slit valve the second at the location between the cassette platform and chamber slit valve(306). An interlock detection unit(308) decides the wafer workout error and warns according to the detection signal from the workout sensor and laser sensor.

Description

Wafer workout error detection apparatus and method {APPARATUS AND METHOD FOR DETECTING WAFER WORKOUT ERRORS}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to wafer cassette loading in a process for manufacturing a semiconductor device, and in particular, after loading the wafer cassette into a cassette platform in a process for manufacturing a semiconductor device, the loaded wafer cassette Dual workout sensors for inspecting protruding wafers prevent more accurate workout errors and prevent wafer broken due to loading errors and reduce workout error rates. A wafer workout error detection apparatus and method for reducing productivity to improve productivity.

In general, in order to manufacture a semiconductor device, a wafer loaded into each process chamber is loaded in a wafer cassette, loaded on a cassette platform, and transferred to each process chamber.

1 shows a cassette platform 100 for loading a conventional wafer cassette and an elevator device 104 underneath the cassette platform.

Conventionally, when a wafer cassette (not shown) loaded with a plurality of wafers on the cassette platform 100 as described above is removed from the wafer cassette, the workout sensor 102 at the edge of the cassette platform 100 may be used. As a result, the workout of the wafer is sensed so that the wafer transfer is stopped and the wafer workout error is displayed.

FIG. 2 illustrates a flow diagram of a wafer workout error detection process using a conventional wafer workout sensor. Referring to FIG. 2, a conventional wafer workout error detection operation will be described in more detail.

That is, when the wafer cassette is loaded into the cassette platform 100 (S200), the wafer handler is transported to the process chamber for each wafer (S202). At this time, the wafer workout sensor 102 installed in the cassette platform 100 checks whether there is a wafer protruding on the wafer cassette after the wafer transfer (S204), and when no wafer workout is detected because there is no protruding wafer. In step S206, the wafer transfer to the next wafer is normally performed again.

However, when a wafer workout indicating that there is a protruding wafer by the wafer workout sensor 102 is detected, the wafer transfer is stopped and a wafer workout error is notified to stop the operation of the cassette platform 100 equipment. In order to check the wafer loading state of the wafer cassette, it may be performed (S208).

However, in the conventional wafer workout error detection method as described above, the wafer protruding out of the wafer cassette is detected depending on the detection signal of the wafer workout sensor 102 provided in the cassette platform 100, and thus the process is performed. When the slit valve of the process chamber (slit valve) is closed, whether the wafer is broken (broken) can not be accurately known, there is a problem that the operator has to check directly with the naked eye, such as lack of accuracy.

In addition, since the cable of the wafer workout sensor 102 moves in conjunction with the movement of the elevator device 104 of the cassette platform 100, the cable workout error increases due to the actual wafer protrusion error. Rather than being generated, a wrong workout error signal is generated due to abrasion of the cable, such that the workout of the wafer is not accurately detected by the workout sensor alone.

Therefore, the present invention is equipped with a double-out workout sensor for inspecting the protruding wafer in the loaded wafer cassette after loading the wafer cassette into the cassette platform during the manufacturing process for semiconductor device loading through more accurate workout error detection Disclosed are an apparatus and a method for detecting a wafer workout error, which prevents a wafer cracking due to an error and improves productivity by reducing a workout error occurrence rate.

The present invention as described above is a wafer workout error detection device, which is installed between a cassette platform and a workout sensor for primary detection of a wafer protruding from a wafer cassette loaded on the cassette platform, and between the cassette platform and the slit valve of the chamber. And a laser sensor for secondaryly detecting a wafer positioned to protrude up to the front of the slit valve, and an interlock detection unit for determining a wafer workout error according to detection signals from the workout sensor and the laser sensor, and warning the warning. .

In addition, the present invention provides a method for detecting a wafer workout error, comprising the steps of: loading a wafer cassette into a cassette platform, first detecting a wafer protruding from the wafer cassette through a workout sensor installed in the cassette platform; Second detection of the protruding wafer through a laser sensor installed in front of the chamber slit valve during the first detection of the protruding wafer, and determining wafer workout errors when there is a secondary detection through the laser sensor It includes.

In the present invention, in the apparatus and method for detecting wafer workout, the workout sensor is primarily installed on the cassette platform, and the laser sensor is secondly installed on the front of the chamber slit valve. By detecting the workout error, the accuracy of the wafer workout error detection can be increased to reduce the workout error occurrence rate. In addition, the accurate workout error detection as described above can reduce the down time for the cassette platform equipment has the advantage of improving productivity.

Hereinafter, with reference to the accompanying drawings will be described in detail the operating principle of the present invention. In the following description of the present invention, if it is determined that a detailed description of a known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted. The following terms are defined in consideration of the functions of the present invention, and may be changed according to the intentions or customs of the user, the operator, and the like. Therefore, the definition should be made based on the contents throughout the specification.

3 illustrates a configuration of an apparatus for detecting a wafer workout error according to an embodiment of the present invention.

Hereinafter, an operation of each component of the wafer workout error detection apparatus of the present invention will be described in detail with reference to FIG. 3.

First, the workout sensor 302 installed on the cassette platform 300 includes a wafer protruding from a wafer cassette (not shown) loaded on the cassette platform 300. Unlike the related art, a laser sensor ) To check if the workout occurs on the wafer cassette using the light reflectivity of the loadlock. At this time, the workout sensor 302 is a laser amplifier type (laser amplifier type) to reduce the malfunction of the workout sensor 302 by the vertical movement (elevator moving) of the cassette platform 300.

The laser sensor 304 is installed directly in front of the inlet of the chamber slit valve 306 to which the wafer is transported to check if the wafer is likely to be broken if the chamber slit valve 306 is closed, and the direct cassette platform equipment A sensor detection signal is generated to determine whether phase action is required.

The interlock detector 308 detects whether a wafer workout error occurs according to signals detected by the wafer workout sensor 302 and the laser sensor 304.

That is, when the wafer workout is detected by the workout sensor 302 and the wafer workout is not detected by the laser sensor 304, the interlock detection unit 308 does not determine a wafer workout error as in the prior art. After closing the chamber slit valve 306 immediately without any action on the cassette platform 300 equipment, the cable and physical condition check of the workout sensor in connection with the mis loading of the wafer or the elevator ). This is because if the workout is not detected in the laser sensor 304, the degree of protrusion of the wafer on the wafer cassette is not large, or the cable problem of the workout sensor 302 is likely to be high.

4 illustrates an operation control flow for accurately detecting a wafer workout error in the wafer workout error detection apparatus according to an exemplary embodiment of the present invention. Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS. 3 and 4.

First, when the wafer cassette is loaded into the cassette platform 300 (S400), the wafer cassette is transferred to the process chamber for each wafer by a wafer handler (S402).

At this time, the wafer workout sensor 302 installed in the cassette platform 300 detects primarily whether there is a wafer protruding on the wafer cassette after the wafer is transferred (S404).

At this time, if there is no wafer protruding on the wafer cassette and no wafer workout is detected, the wafer transfer to the next wafer is normally performed again (S406).

However, when a wafer workout indicating that there is a wafer protruding by the wafer workout sensor 302 is detected, in the present invention, a wafer workout error is not immediately generated, as in the prior art, but directly in front of the chamber slit valve 306. The laser sensor 304 installed at the second stage detects whether the wafer is taken out (S408).

In this case, if the wafer workout is also detected in the laser sensor 304, since the wafer may be broken when the chamber slit valve 306 is closed, the wafer may be transferred without closing the chamber slit valve 306. In the stopped state, the interlock detector 308 displays a wafer workout error so that the wafer loading state check for the wafer cassette can be performed (S410).

However, in contrast, if the wafer workout is not detected in the laser sensor 304, the wafer workout error is likely because the protrusion of the wafer on the wafer cassette is not large or the cable problem of the workout sensor 302 is likely. After closing the chamber slit valve 306 immediately without any action on the cassette platform 300 equipment, the interlock detection unit 308 of the workout sensor in conjunction with the misloading or elevator of the wafer The cable and physical condition check will be displayed.

Accordingly, the occurrence rate of unnecessary wafer workout errors due to malfunction of the workout sensor 302 can be reduced, and productivity can be improved by reducing operation down time for the cassette platform 300 equipment.

As described above, in the present invention, in the apparatus and method for detecting wafer workout, the sensor is installed in a manner in which the workout sensor is primarily installed on the cassette platform and the laser sensor is secondly installed in front of the chamber slit valve. By detecting the workout error of the wafer, the accuracy of wafer workout error detection can be increased, thereby reducing the occurrence rate of workout error. In addition, accurate workout error detection can reduce downtime for cassette platform equipment, improving productivity.

While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention. Accordingly, the scope of the invention should not be limited by the described embodiments but should be defined by the appended claims.

1 is a diagram illustrating a conventional cassette platform and a cassette platform elevator apparatus,

2 is a flow chart of a conventional wafer workout detection process;

3 is a block diagram of a workout error detection apparatus according to an embodiment of the present invention;

4 is a flowchart of a workout detection process according to an embodiment of the present invention.

300: cassette platform 302: workout sensor

304: laser sensor 306: slit valve

308: interlock detection unit

Claims

A wafer workout error detection device,

A workout sensor for primary detection of a wafer protruding from a wafer cassette installed and loaded on the cassette platform;

A laser sensor positioned between the cassette platform and the chamber slit valve to secondly detect a wafer protruding to the front surface of the chamber slit valve;

The interlock detection unit determines a wafer workout error according to the detection signals from the workout sensor and the laser sensor and warns of the wafer workout error.

Wafer workout error detection apparatus comprising a.

The method of claim 1,

The laser sensor,

Wafer workout error detection apparatus, characterized in that implemented in 1 to 4.

The method of claim 1,

The interlock detection unit,

If there is a primary detection of the wafer protruding from the workout sensor and there is no secondary detection of the laser sensor, the wafer miss error on the wafer cassette or the loading of the workout sensor is not determined without determining the wafer workout error. Wafer workout error detection apparatus, characterized by informing wire abnormality.

As a wafer workout error detection method,

Loading a wafer cassette into the cassette platform,

Firstly detecting a wafer protruding from the wafer cassette through a workout sensor installed in the cassette platform;

Secondly detecting the protruding wafer through a laser sensor installed in front of a chamber slit valve during the first detection of the protruding wafer;

Determining a wafer workout error when there is secondary detection through the laser sensor

Wafer workout error detection method comprising a.

The method of claim 4, wherein

If there is a primary detection of the wafer protruding from the workout sensor and there is no secondary detection of the laser sensor, the wafer workout error is not determined and the miss loading of the wafer on the wafer cassette or the workout sensor is not determined. Informing the wire abnormality

Wafer workout error detection method further comprising.

The method of claim 4, wherein

The laser sensor,

Wafer workout error detection method, characterized in that implemented in 1 to 4.