KR20100036484A - Stamp and stamping method using thereof - Google Patents
Stamp and stamping method using thereof Download PDFInfo
- Publication number
- KR20100036484A KR20100036484A KR1020080095728A KR20080095728A KR20100036484A KR 20100036484 A KR20100036484 A KR 20100036484A KR 1020080095728 A KR1020080095728 A KR 1020080095728A KR 20080095728 A KR20080095728 A KR 20080095728A KR 20100036484 A KR20100036484 A KR 20100036484A
- Authority
- KR
- South Korea
- Prior art keywords
- stamp
- shape
- multilayer
- support
- stamping part
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Abstract
The present invention relates to a multilayer stamp and a method of manufacturing the same, a nanoimprint system equipped with a multilayer stamp, and a method for nanoimprinting a display panel using the multilayer stamp, the multilayer stamp comprising: a support made of a first material; A stamping part formed on the support part and made of a second material having a greater hardness than the first material; It consists of a coating film for preventing adhesion (粘着) coated on the stamping portion.
Accordingly, the present invention implements a multi-layered stamp of a double structure of a hard stamping part and a soft support part having elasticity, and has excellent flexibility to correct an uneven state of an object to form a uniform pattern. It is possible to produce a stamp of the roll type is effective.
In addition, the present invention can apply a uniform pressure to a large area object with a multi-layer stamp, there is an effect that can form a uniform pattern.
In addition, since the support portion of the multilayer stamp is made of an elastic material to improve adhesion by vacuum, the present invention has an effect of performing a smooth patterning process.
Description
The present invention relates to a stamp and a method for producing the same, and more particularly, to a multi-layer stamp and a method for producing the same that can form a uniform pattern.
Implant technology was proposed in the mid-1990s and is currently attracting attention as an alternative to low-productivity electron beam lithography and expensive optical lithography.
On the other hand, recent advances in IT technology require finer patterns for high speed operation and low power consumption operation of devices.
Such micronized patterns are typically made using lithographic techniques, and as micronization progresses further, the devices required for those techniques become more expensive.
Therefore, various researches are currently being conducted on techniques for forming fine patterns at low cost.
However, when the nano-process is performed on a large-area substrate using such a conventional stamp, when the uniformity of the substrate to form the pattern does not secure nanoscale precision, it is impossible to form the pattern over the entire hard stamp. .
The present invention to solve the above problems, by implementing a multi-layered stamp of the double structure of the hard stamping portion and the soft support portion having elasticity, excellent flexibility to correct the uneven state of the object to form a uniform pattern It is an object of the present invention to provide a stamp and a method which can be done.
A support made of a first material; A stamping part formed on the support part and made of a second material having a greater hardness than the first material; It consists of a coating film for preventing adhesion (粘着) coated on the stamping portion.
The stamping portion is bonded to the support portion using an adhesive.
The adhesive is a thermosetting or ultraviolet curable adhesive.
The first material is characterized in that the material having an elastic force.
Preparing a support made of a first material; Preparing a stamping part made of a second material having a hardness greater than that of the first material; Coating an anti-stick material coated on the stamping part to form an anti-stick coating film; Bonding the stamping part to the support part using an adhesive;
The anti-stick coating film is characterized in that the self-assembled monolayer (Self assembled monolayer).
In addition, the first material is an elastic rubber, the second material is characterized in that one of the metal, silicon and quartz.
According to the present invention as described above, by implementing a multi-layered stamp of the dual structure of the hard stamping portion and the soft support portion having elasticity, excellent flexibility to correct the uneven state of the object to form a uniform pattern effect There is.
A support made of a first material; A stamping part formed on the support part and made of a second material having a greater hardness than the first material; It consists of a coating film for preventing adhesion (粘着) coated on the stamping portion.
The stamping portion is bonded to the support portion using an adhesive.
The adhesive is a thermosetting or ultraviolet curable adhesive.
The first material is characterized in that the material having an elastic force.
Preparing a support made of a first material; Preparing a stamping part made of a second material having a hardness greater than that of the first material; Coating an anti-stick material coated on the stamping part to form an anti-stick coating film; Bonding the stamping part to the support part using an adhesive;
The anti-stick coating film is characterized in that the self-assembled monolayer (Self assembled monolayer).
In addition, the first material is an elastic rubber, the second material is characterized in that one of the metal, silicon and quartz.
A multilayer stamp comprising a support part made of a first material, a stamping part formed of the second material and having a hardness greater than that of the first material, and an anti-stick coating film coated on the stamping part; A support on which a plurality of vacuum suction holes for vacuum suction of the support of the multilayer stamp are exposed on the upper portion; A vacuum pump connected to the plurality of vacuum suction holes; The object to be stamped can be pressed, and a multi-layer stamp composed of a roller with a light source attached thereto.
The roller is equipped with a multi-layer stamp, characterized in that a reflector is further provided to prevent the light of the light source from being emitted to the outside.
Preparing a display panel on which a curing film to be nanoimprinted is formed; Preparing a multi-layer stamp comprising a support made of a first material, a stamping part formed of the second material and having a hardness greater than that of the first material, and an anti-stick coating film coated on the stamping part; Pressing the multilayer stamp onto the curing film to form a pattern formed on the display panel; Curing the pattern formed on the display panel; The multi-layer stamp is nanoimprinted on the display panel using the multi-layer stamp, which is separated from the pattern formed on the display panel.
The multilayer stamp is characterized in that the flexible (Flexible).
Moreover, the I-shaped protrusion part is provided in the surface, It is characterized by the flat form.
In addition, the surface is provided with a T-shaped protrusion, characterized in that the plate shape. In addition, an L-shaped protrusion is provided on the surface, and is characterized by having a flat plate shape. Moreover, the I-shaped protrusion part is provided in the surface, It is characterized by the cylindrical shape. In addition, the surface is provided with a T-shaped protrusion, characterized in that the cylindrical shape. In addition, an L-shaped protrusion is provided on the surface, and is characterized by having a cylindrical shape.
In addition, the stamp is used to automatically determine the recognition of the unfinished shape by the automatic inspection function and the combination of the component patterns to compensate for it.
Using a stamp is characterized in that the pattern structure for adjusting the ink amount for the flexible line pattern configuration in the portion overlapping with the existing shape is reduced.
The stamp is used to receive the required shape using the CAD drawing input and form the shape automatically or manually.
1 is a cross-sectional view showing a conventional stamp method.
2 is a perspective view of the stamp of FIG. 1.
3 shows an I stamp according to the present invention.
4 shows a T stamp according to the present invention.
5 shows an L-shaped stamp according to the present invention.
6 shows a cylindrical stamp according to the invention.
7 shows a gap between stamps according to the invention.
Claims (26)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080095728A KR20100036484A (en) | 2008-09-30 | 2008-09-30 | Stamp and stamping method using thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080095728A KR20100036484A (en) | 2008-09-30 | 2008-09-30 | Stamp and stamping method using thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100036484A true KR20100036484A (en) | 2010-04-08 |
Family
ID=42213977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080095728A KR20100036484A (en) | 2008-09-30 | 2008-09-30 | Stamp and stamping method using thereof |
Country Status (1)
Country | Link |
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KR (1) | KR20100036484A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9211575B2 (en) | 2010-12-09 | 2015-12-15 | Korea Institute Of Machinery & Materials | Method of manufacturing roll for roll printing/roll imprinting |
KR20180032847A (en) * | 2016-09-23 | 2018-04-02 | 울산과학기술원 | Stamper |
-
2008
- 2008-09-30 KR KR1020080095728A patent/KR20100036484A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9211575B2 (en) | 2010-12-09 | 2015-12-15 | Korea Institute Of Machinery & Materials | Method of manufacturing roll for roll printing/roll imprinting |
KR20180032847A (en) * | 2016-09-23 | 2018-04-02 | 울산과학기술원 | Stamper |
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WITN | Withdrawal due to no request for examination |