KR20090031007A - Method for manufacturing color filter and method for manufacturing tft-lcd using the same - Google Patents

Abstract

A method for manufacturing a black matrix, a method for manufacturing a pixel, a method for manufacturing ito and a method for manufacturing a color filter having the black matrix, pixel and ITO are directly form a predetermined pattern by using a nozzle dispenser when manufacturing a TFT-LCD, thereby drastically reducing the number of processes and equipment necessary for forming a pattern required for a color filter manufacturing process. A pixel manufacturing process comprises a process of coating photoresist(PR) having color and a process of drying the coated PR. An ITO manufacturing process comprises a process of coating ITO coating solution on the top of a substrate and a process of drying the ITO coating solution coated on the top of the substrate. Therefore, 10 sub processes are entirely decreased in a BM manufacturing process and the ITO manufacturing process.

Description

Method for manufacturing color filter and method for manufacturing thin film transistor liquid crystal display using same {Method for Manufacturing Color Filter And Method for Manufacturing TFT-LCD Using the Same}

The present invention relates to a method for manufacturing a color filter and a method for manufacturing a thin film transistor liquid crystal display (TFT-LCD) using the same. More specifically, the present invention relates to a color filter (hereinafter referred to as "CF") process including a black matrix (hereinafter referred to as "BM") process used in the manufacture of a TFT-LCD. By directly forming the predetermined pattern by using a nozzle dispenser instead of a plurality of facilities for performing a predetermined pattern forming process required in a predetermined process, the number of processes required for the CF manufacturing process and the number of equipment used are remarkable. The present invention relates to a color filter manufacturing method and a method of manufacturing a thin film transistor liquid crystal display (TFT-LCD) using the same, as well as reducing material costs (coating liquids), equipment and facility costs, and line installation space.

Recently, a thin film transistor liquid crystal display (hereinafter referred to as "TFT-LCD") is widely used in addition to a plasma display panel (PDP) in the display monitor or TV field. Among them, one pixel of the TFT-LCD panel is composed of three pixels or cells (hereinafter, referred to as "cells") consisting of R, G, and B, and the width of the pixel is as fine as about 0.03 mm. The size of a thin film transistor (hereinafter referred to as "TFT") formed in one pixel is of course much smaller than one pixel width. In particular, in order to achieve a high resolution of 1600 x 1200, the number of pixels and the number of TFTs are required to be 1.19 million. When calculating this on a cell-by-cell basis, three cells (R, G, B) are required for one pixel, requiring 576 million cells and TFTs. In order to manufacture such a high-definition TFT-LCD, the entire process itself requires a very high level of precision, and therefore, a level of the process required for semiconductor manufacturing is required.

The TFT-LCD panel manufacturing process is mainly divided into a TFT manufacturing process, a color filter (CF) manufacturing process, a cell manufacturing process, and a module manufacturing process. One panel is made through a cell manufacturing process using two glasses that have undergone a TFT manufacturing process and a CF manufacturing process. Thereafter, the panel is subjected to a module manufacturing process to produce one TFT-LCD panel which is actually used for a display monitor or a TV.

The TFT manufacturing process in the above-described manufacturing process of the TFT-LCD panel is a process of forming a basic electrode, and more specifically, a process of forming an electrode of each cell.

1A is a diagram showing a schematic process for manufacturing a TFT according to the prior art. Referring to FIG. 1A, a TFT manufacturing process according to the prior art includes five steps of 1. gate electrode generation, 2. insulation film and semiconductor film generation, 3. data electrode generation, 4 passivation film generation, and 5. pixel electrode generation. . The TFT manufacturing process performed in these five steps requires at least one or more pattern steps in each step. This pattern process is applied in a similar manner to the CF manufacturing process described later. The pattern process is itself a very precise and complex process. At least several pattern processes are required to manufacture one TFT-LCD panel. Each of these multiple pattern processes consists of approximately similar sub-processes, although not using the same deposition material and the same process method. The following describes the schematic sub-processes used for each pattern process.

1. Deposition process: The deposition process basically thins the final product on the glass (e.g., metal if the final product is a metal electrode, semiconductor if it is a semiconductor, and insulator if an insulating film). It is a process of coating. In particular, when the final product is a metal material, a sputtering method is used. When the final product is a semiconductor or an insulating film, a plasma enhanced chemical vapor deposition (hereinafter referred to as "PECVD") method is used.

2. Cleaning process: It is a process for removing the foreign matter on the glass after the above-described deposition process is completed.

3. Photoresist (Photo Register: hereinafter referred to as "PR") Coating Process: The process of forming a film made of PR on the glass after the cleaning process is completed. In this case, the formed film uses a photosensitive material that reacts sensitively to ultraviolet rays.

4. Exposure process: It is the process of irradiating an ultraviolet-ray after forming the desired mask pattern on glass on which the PR coating process was completed.

5. Development process: The exposed glass is developed to weaken the portion irradiated with ultraviolet rays due to the mask pattern, and the portion not irradiated with ultraviolet rays is kept in the PR coating state to remove only the portion exposed to the ultraviolet rays.

6. Etching process: The process of removing the deposition film of the part except the part covered by PR (namely, the part which is not irradiated with the ultraviolet-ray in the exposure process). More specifically, a wet etching method using a solvent is used for a metal film, and a dry etching method using plasma is used for a semiconductor and an insulator.

7. PR stripping process: The PR remaining after the etching process is removed using a solvent.

8. Inspection process: After the said PR peeling process is completed, it is a process of confirming abnormality of a final product.

In addition, unlike a PDP or organic light emitting diodes (“OLED”), a TFT-LCD does not emit light by itself, but instead emits a constant light emitted from a back light. Adjust the brightness of the light by adjusting the orientation of. Since the backlight itself is white light, the amount of light transmitted is controlled by changing the alignment of the liquid crystal, but CF is an important function for realizing colors corresponding to R, G, and B. The process for manufacturing such CF (hereinafter referred to as "CF manufacturing process") is located on the upper plate (upper glass) of the TFT-LCD panel, and is performed in a separate process from the TFT manufacturing process. In such a CF manufacturing process, a pattern process is required as described above with respect to the TFT manufacturing process.

Figure 1b is a schematic view showing a CF manufacturing process according to the prior art. Referring to FIG. 1B, a CF manufacturing process according to the prior art includes 1. a black matrix (BM) manufacturing process, 2. a pixel manufacturing process, and 3. a transparent electrode material having good permeability and conductivity and excellent chemical and thermal stability. It is made of an ITO manufacturing process of forming a transparent electrode using an oxide (Indium Tin Oxide: "ITO"). Each process is described in detail below.

1. BM manufacturing process: The BM manufacturing process is a process of forming a BM pattern on glass, similar to the above-mentioned TFT manufacturing process, the BM deposition process-> cleaning process-> PR coating process-> exposure process-> developing process-> The pattern process which consists of a sub process of an etching process-> a peeling process is calculated | required. The pattern process required for this BM manufacturing process is shown in FIG. 2A.

2. Pixel manufacturing process: The pixel manufacturing process requires a separate pattern process (cell formation pattern process) for each cell in order for the TFT-LCD to generate each cell corresponding to three colors of red, green, and blue. Do. The pattern process required in such a pixel manufacturing process is slightly different from the pattern process required in the above-described TFT manufacturing process and BM manufacturing process. More specifically, the pattern process required in the pixel manufacturing process does not require a deposition process and a cleaning process, and only a sub process consisting of a coating process, an exposure process, a developing process, and a drying (firing) process of a PR having color is required. . The pattern process required for such a pixel manufacturing process is shown in FIG. 2B.

3. ITO manufacturing process: The ITO manufacturing process consists of sub-processes in the same manner as the BM manufacturing process described above, specifically, ITO deposition process-> cleaning process-> PR coating process-> exposure process-> developing process-> The pattern process which consists of a sub process of an etching process-> a peeling process is calculated | required. The pattern process required for this ITO manufacturing process is shown in FIG. 2A.

In addition, in addition to the three processes described above, the CF manufacturing process includes a panel driving method (for example, a vertical alignment (hereinafter referred to as "VA") method and an in-place switching (hereinafter referred to as "IPS"). Several processes may be added depending on the method, and the twisted nematic ("TN") method.

On the other hand, with respect to each pattern process required in the above-described BM manufacturing process, the following sub-processes and equipment used to perform these sub-processes are shown in Table 1 below.

TABLE 1

Sub process name Process purpose Used equipment Initial cleaning Decontamination on the substrate (glass) Initial scrubber 1. Cleaning before deposition Decontamination on the substrate (glass); And particle removal before deposition Cleaner Before Deposition 2. BM Deposition Determining the area of each pixel to prevent light leakage; Color contrast and improve contrast between R, G and B Sputtering equipment 3. Cleaning before exposure Decontamination on the substrate (glass); And adhesion to PR by making the deposited film hydrophilic Pre-exposure cleaner 4. BM exposure BM Area Selection Tasks Coating Equipment / Exposure / Developer / Oven 5. BM Common Fault Inspection Mask defect inspection Common fault checker 6. Etching / Peeling After the exposure process, the part where the BM is opened is removed to secure the BM area. Wet Etchers / Peelers 7. BM completion inspection Defect inspection after BM completion BM Checker

In addition, in relation to the pattern process required in the above-described pixel manufacturing process, the following sub-processes and equipment used to perform these sub-processes are shown in Table 2 below.

TABLE 2

Sub process name Process purpose Used equipment Pre-exposure cleaning Decontamination on the substrate (glass); And hydrophilization of the deposited film to improve adhesion of CF to PR Pre-exposure cleaner 1.R (Red) Exposure R counterpart cell region selection shaping Coating Equipment / Exposure / Developer / Oven 2.G (Green) Exposure G-adaptive cell region selection shaping operation Coating Equipment / Exposure / Developer / Oven 3. B (Blue) exposure B counterpart cell region selection shaping operation Coating Equipment / Exposure / Developer / Oven

As described above, it can be seen that a number of service maintenance is required to perform each sub-process required in the BM manufacturing process and the pixel manufacturing process of the CF manufacturing process. Therefore, the following problems arise in the prior art.

1. Since a large number of processes are required to perform the CF manufacturing process, the total tact time required for the manufacture of the TFT-LCD becomes considerably longer.

2. Since a large number of equipment is required to perform the CF manufacturing process, the equipment and facility costs required for the manufacture of TFT-LCDs increase significantly.

3. Since a large number of processes are required to carry out the CF manufacturing process, the material cost (coating liquid) is significantly increased.

4. Since a large number of equipment is required to perform the CF manufacturing process, a considerable amount of space is required for line installation for such a large number of equipment.

5. Due to the problems 1 to 4 described above, the productivity of TFT-LCD manufacturing is lowered.

Therefore, there is a need for a method of forming a new pattern that solves the above problems.

The present invention by directly forming a predetermined pattern using a nozzle dispenser in the manufacture of TFT-LCD to significantly reduce the number of processes and equipment used for pattern formation required in the CF manufacturing process, It is to solve the problem.

More specifically, according to a first aspect of the present invention, a method of manufacturing a black matrix (BM) used in the manufacture of a thin film transistor liquid crystal display (TFT-LCD), comprising: coating a BM coating liquid on a substrate; And it is to provide a black matrix manufacturing method comprising the step of drying the BM coating liquid coated on the substrate.

According to a second aspect of the present invention, an ITO manufacturing method used in the manufacture of a thin film transistor liquid crystal display (TFT-LCD), comprising: coating an ITO coating solution on a substrate; And it is to provide an ITO manufacturing method comprising the step of drying the ITO coating liquid coated on the substrate.

According to a third aspect of the present invention, there is provided a pixel manufacturing method for use in the manufacture of a thin film transistor liquid crystal display (TFT-LCD), comprising the steps of: coating a photoresist (PR) having color; And to provide a pixel manufacturing method comprising the step of drying the coated PR.

According to a fourth aspect of the present invention, there is provided a color filter (CF) manufacturing method for use in the manufacture of a thin film transistor liquid crystal display (TFT-LCD), comprising: a black matrix (BM) manufacturing process; Pixel manufacturing process; And an ITO manufacturing process, wherein the black matrix (BM) manufacturing process comprises: coating a BM coating solution on a substrate; And drying the BM coating liquid coated on the substrate, wherein the pixel manufacturing process comprises: coating a photoresist (PR) having color; And drying the coated PR, wherein the ITO manufacturing process comprises coating an ITO coating solution on the substrate; And it is to provide a color filter manufacturing method comprising the step of drying the ITO coating liquid coated on the substrate.

According to a fifth aspect of the present invention, there is provided a method of manufacturing a thin film transistor liquid crystal display (TFT-LCD), comprising: a TFT manufacturing process; Black matrix (BM) manufacturing process; Pixel manufacturing process; And a color filter (CF) manufacturing process including an ITO manufacturing process; Cell manufacturing process; And a module manufacturing process, wherein the black matrix (BM) manufacturing process comprises: coating a BM coating solution on a substrate; And drying the BM coating liquid coated on the substrate, wherein the pixel manufacturing process comprises: coating a photoresist (PR) having color; And drying the coated PR, wherein the ITO manufacturing process comprises coating an ITO coating solution on the substrate; And it is to provide a thin film transistor liquid crystal display manufacturing method comprising the step of drying the ITO coating liquid coated on the substrate.

According to a sixth aspect of the present invention, in the present invention according to the first to fifth aspects, coating the BM coating liquid, coating the PR having the color, and coating the ITO coating liquid Is performed by one nozzle dispenser each.

Further advantages of the present invention will become apparent from the following description with reference to the accompanying drawings in which like or like reference numerals designate like elements.

According to the method for manufacturing a color filter according to the present invention and a method for manufacturing a thin film transistor liquid crystal display using the same, the following effects are achieved.

1. A total of 16 sub-processes are reduced, including a total of 10 sub-processes reduced in the BM and ITO manufacturing processes and 6 sub-processes reduced in the pixel manufacturing process, respectively, compared to the conventional CF manufacturing process. In addition, as the sub-process decreases, the total tact time required for the manufacture of the TFT-LCD is significantly reduced.

2. In the present invention, since only the nozzle dispenser is used as the equipment used in the CF manufacturing process, the equipment and facility costs due to the reduction of the equipment used are significantly reduced by approximately 70% compared to the prior art.

3. In the present invention, since the coating liquid (raw material) used in the CF manufacturing process is used only as necessary to form a pattern, unlike the prior art, there is no consumption of raw materials due to the entire surface deposition or coating, development, etching and peeling of the raw material. Cost savings related to raw materials are achieved.

4. In the present invention, the space required for line installation is significantly reduced by approximately 70% due to the reduction of the equipment used.

5. The productivity of TFT-LCD manufacturing is remarkably increased due to the effects of 1 to 4 described above.

Hereinafter, the present invention will be described with reference to embodiments and drawings of the present invention.

3A is a flow chart showing a BM manufacturing process and an ITO manufacturing process among the CF manufacturing processes required for manufacturing the TFT-LCD panel according to the present invention.

Referring to FIG. 3A, a nozzle dispenser (not shown) is used to perform the BM manufacturing process and the ITO manufacturing process among the CF manufacturing processes required for manufacturing the TFT-LCD panel. When performing a BM manufacturing process using such a nozzle dispenser, the BM manufacturing process includes coating a BM coating liquid on two sub-processes, namely, a substrate (glass); And drying (preventing) the BM coating liquid coated on the substrate. In addition, when performing an ITO manufacturing process using a nozzle dispenser, the ITO manufacturing process includes coating an ITO coating liquid on two sub-processes, namely, a substrate (glass); And drying (predetermining) the ITO coating liquid coated on the substrate. Therefore, the BM manufacturing process and the ITO manufacturing process according to the present invention are completed in only two processes using one use equipment (nozzle dispenser), respectively.

More specifically, the desired BM pattern or ITO pattern is obtained by directly forming only the required BM pattern or ITO pattern using a nozzle dispenser, and then drying (firing) the formed BM pattern or ITO pattern. As a result, in the prior art, when forming a BM pattern or an ITO pattern, a plurality of used equipment and depositions, such as deposition equipment (for example, sputtering equipment or PECVD equipment), coating equipment (for example, coating apparatus such as slit die), and deposition Seven sub-processes are required, including cleaning, PR coating, exposure, development, etching, and peeling, but in the present invention only two sub-processes including one use equipment (nozzle dispenser) and coating and drying (firing) Is required. Therefore, in the BM manufacturing process and the ITO manufacturing process according to the present invention, five sub-processes are reduced, respectively, and ten sub-processes are reduced as a whole.

3B is a flowchart illustrating a pixel manufacturing process of the CF manufacturing process required for manufacturing the TFT-LCD panel according to the present invention.

Referring to FIG. 3B, a nozzle dispenser (not shown) is used to perform a pixel manufacturing process of the CF manufacturing process required for manufacturing a TFT-LCD panel. When the pixel fabrication process is performed using such a nozzle dispenser, the pixel fabrication process may include coating two sub-processes, namely, PRs having colors; And drying (preventing) the coated PR. Therefore, the pixel manufacturing process according to the present invention is completed in only two processes using one use equipment (nozzle dispenser), respectively.

More specifically, a desired cell pattern is obtained by directly forming only the respective cell patterns corresponding to the colors of R, G, and B in the required pixels using a nozzle dispenser, and then drying (firing) the formed cell patterns. As a result, in the prior art, when forming a cell pattern, a number of used equipment such as coating equipment (e.g., coating apparatus such as a slit die), an exposure machine, a developer, and an oven and PR coating, exposure, development, and drying ( Four sub-processes of firing) are required, but only one use equipment (nozzle dispenser) and two sub-processes including PR coating and drying (firing) are required in the present invention. Therefore, in the pixel manufacturing process according to the present invention, two sub-processes are reduced at the time of forming a cell corresponding to R, G, and B, respectively, compared to the prior art, thereby reducing the total of six sub-processes.

As described above, the CF manufacturing process according to the present invention includes a total of 10 sub-processes reduced in the BM manufacturing process and the ITO manufacturing process, and a total of 6 sub-processes reduced in the pixel manufacturing process, respectively, compared to the conventional CF manufacturing process. Sixteen subprocesses are reduced.

In addition, in the present invention, since only the nozzle dispenser is used as the equipment used in the CF manufacturing process, the equipment cost due to the reduction of the equipment used is significantly reduced by about 70% compared to the prior art.

Furthermore, in the present invention, since the coating liquid (raw material) used in the CF manufacturing process is used only as necessary to form the pattern, unlike the prior art, there is no consumption of raw materials due to the entire surface deposition or coating, development, etching and peeling of the raw material, and thus, approximately 50 Cost savings related to raw materials are achieved.

In addition, due to the reduced equipment used, the space required for line installation is also significantly reduced by approximately 70%.

Furthermore, the productivity of TFT-LCD manufacturing increases markedly.

As various modifications may be made to the constructions and methods described and illustrated herein without departing from the scope of the invention, it is intended that all matter contained in the above description or shown in the accompanying drawings be exemplary, and not intended to limit the invention. It is not. Therefore, the scope of the present invention should not be limited by the above-described exemplary embodiments, but should be defined only in accordance with the following claims and their equivalents.

1A is a diagram showing a schematic process for manufacturing a TFT according to the prior art.

Figure 1b is a schematic view showing a CF manufacturing process according to the prior art.

FIG. 2A is a flowchart illustrating a BM manufacturing process and an ITO manufacturing process among CF manufacturing processes required for manufacturing a TFT-LCD panel according to the prior art.

FIG. 2B is a flow chart showing a pixel manufacturing process of the CF manufacturing process required for manufacturing a TFT-LCD panel according to the prior art.

3A is a flow chart showing a BM manufacturing process and an ITO manufacturing process among the CF manufacturing processes required for manufacturing the TFT-LCD panel according to the present invention.

3B is a flowchart illustrating a pixel manufacturing process of the CF manufacturing process required for manufacturing the TFT-LCD panel according to the present invention.

Claims (13)

In the manufacturing method of a black matrix (BM) used at the time of manufacture of a thin film transistor liquid crystal display (TFT-LCD), Coating the BM coating solution on the substrate; And Drying the BM coating liquid coated on the substrate Black matrix manufacturing method comprising a. The method of claim 1, Coating the BM coating liquid is performed by a nozzle dispenser. In the manufacturing method of the ITO used at the time of manufacture of a thin film transistor liquid crystal display (TFT-LCD), Coating the ITO coating solution on the substrate; And Drying the ITO coating liquid coated on the substrate ITO manufacturing method comprising a. The method of claim 3, wherein Coating the ITO coating liquid is performed by a nozzle dispenser. In the pixel manufacturing method used at the time of manufacture of a thin film transistor liquid crystal display (TFT-LCD), Coating a photo resist (PR) having color; And Drying the coated PR Pixel manufacturing method comprising a. The method of claim 5, The pixel is a pixel manufacturing method of any one of R, G, B. The method according to claim 5 or 6, Coating the PR with the color is performed by a nozzle dispenser. In the manufacturing method of the color filter (CF) used at the time of manufacture of a thin film transistor liquid crystal display (TFT-LCD), Black matrix (BM) manufacturing process; Pixel manufacturing process; And ITO manufacturing process Including, The black matrix (BM) manufacturing process Coating the BM coating solution on the substrate; And Drying the BM coating liquid coated on the substrate Including, The pixel manufacturing process Coating a photo resist (PR) having color; And Drying the coated PR Including; The ITO manufacturing process Coating an ITO coating solution on the substrate; And Drying the ITO coating liquid coated on the substrate Containing Color filter manufacturing method. The method of claim 8, The color filter manufacturing method wherein the color is any one of R, G, B. The method according to claim 8 or 9, Coating the BM coating liquid is performed by a first nozzle dispenser, Coating the PR with the color is performed by a second nozzle dispenser, Coating the ITO coating liquid is performed by a third nozzle dispenser Color filter manufacturing method. In the manufacturing method of a thin film transistor liquid crystal display (TFT-LCD), TFT manufacturing process; Black matrix (BM) manufacturing process; Pixel manufacturing process; And a color filter (CF) manufacturing process including an ITO manufacturing process; Cell manufacturing process; And Module manufacturing process Including, The black matrix (BM) manufacturing process Coating the BM coating solution on the substrate; And Drying the BM coating liquid coated on the substrate Including, The pixel manufacturing process Coating a photo resist (PR) having color; And Drying the coated PR Including; The ITO manufacturing process Coating an ITO coating solution on the substrate; And Drying the ITO coating liquid coated on the substrate Containing Thin film transistor liquid crystal display manufacturing method. The method of claim 11, A thin film transistor liquid crystal display manufacturing method, wherein the color is any one of R, G, and B. The method of claim 11 or 12, Coating the BM coating liquid is performed by a first nozzle dispenser, Coating the PR with the color is performed by a second nozzle dispenser, Coating the ITO coating liquid is performed by a third nozzle dispenser Thin film transistor liquid crystal display manufacturing method.

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