KR20080113762A - Apparatus for analyzing specimen - Google Patents
Apparatus for analyzing specimen Download PDFInfo
- Publication number
- KR20080113762A KR20080113762A KR1020070062621A KR20070062621A KR20080113762A KR 20080113762 A KR20080113762 A KR 20080113762A KR 1020070062621 A KR1020070062621 A KR 1020070062621A KR 20070062621 A KR20070062621 A KR 20070062621A KR 20080113762 A KR20080113762 A KR 20080113762A
- Authority
- KR
- South Korea
- Prior art keywords
- sample
- electron beam
- biprism
- objective lens
- hologram
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
- G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
- G01N21/453—Holographic interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
1 and 2 show a general transmission electron microscope for forming a hologram.
3 and 4 show the formation principle of the hologram by the biprism of the general transmission electron microscope.
5 and 6 are views showing a transmission electron microscope for forming a hologram using carbon nanotubes and nanowires according to an embodiment of the present invention.
***** Explanation of symbols for main parts of drawing *****
301,401: electron gun
302,402 condensing lens
303,403: sample
304,404: electron beam
305,405: objective lens
306,406: constant voltage supply
307,407: carbon nanotubes, nanowires
308,408: hologram recorder
The present invention relates to a sample analysis device. More specifically, the present invention relates to a biprism of a field emission-transmission electron microscope (FE-TEM).
A general transmission electron microscope is a microscope using an electron beam instead of a lens and an electron beam having properties similar to a light source instead of a light source of an optical microscope. The basic principle of imaging is the same as that of an optical microscope.
Here, since the electron beam is significantly larger in interaction with the material compared to the light beam, the thickness of the sample should be as thin as 1000 kHz and placed in a vacuum. Therefore, the transmission electron microscope is a device using the three light and dark generation principles of scattering absorption, diffraction, and phase generated when an electron beam passes through a sample.
First, when an electron beam is irradiated to the sample from the tank gun installed inside the transmission electron microscope, it is scattered in the sample, and then transmitted through the condenser lens to form a diffraction shape on the rear focal plane of the objective lens. That is, the electron beam scattered in a certain direction in the sample is collected at one point in the post focal plane.
Subsequently, a secondary wave gathered at a point in the post focal plane creates an enlarged image at the focus of the objective lens. This image is magnified and imaged on the fluorescent plate in the projection lens. Here, by adjusting the focal length between each lens, the microscope shape and the diffraction shape can be obtained as desired. The acquired images are recorded or preserved using a charged-coupled device (CCD) camera dynamically or recorded using various storage media, and processed and analyzed by an external image processing apparatus.
On the other hand, in the field emission-type transmission electron microscope (FIELD FE-TEM), an electron beam is emitted from a field emission gun. Such an electron beam is used for interference experiments of electromagnetic waves through a biprism installed inside a field emission transmission electron microscope. Thus, the phase information of the electrons passing through the inside of the specimen is reproduced using the interference image of the electron beam. Reproducing such phase information of electrons is called Electron Holography. Electron holography may reproduce a hologram image through a Fourier transform and may be divided into a phase image and an amplitude image.
Here, the phase image shows only the phase change that is changed by the characteristics of the sample, and shows the electrical and magnetic characteristics in the local region as a nano-scale image. Electron holography having such nano-resolution (Resolving Power) is generally applied to the evaluation of the electrostatic field and the magnetization distribution.
1 to 4 are diagrams showing the principle of hologram formation by a general transmission electron microscope and a biprism forming a hologram.
A general transmission electron microscope includes a plurality of lenses for transmitting an electron beam, a biprism for generating an interference fringe using an electron beam transmitted through a sample, and a recording device for forming and recording holograms by the biprism.
Here, as the material of the biprism, quartz fiber coated with platinum (Pt) or gold (Au) having an average diameter of 1 μm is used. The biprism is attached to a limited area aperture holder or the like.
When a voltage is applied to the biprism installed in the transmission electron microscope, a fringe is formed on the fluorescent plate by the interference between the material wave passing through the sample and the reference wave passing through the major region.
As shown in FIGS. 3 and 4, when the voltage applied to the biprism is increased, spatial resolution may be obtained by decreasing the fringe spacing S and increasing the width W. FIG. However, in order to obtain good spatial resolution and to increase the field of view (FOV), the constant voltage applied to the biprism must be increased above a certain level. On the other hand, as the deflection angle γ shown in FIG. 4 increases as the constant voltage applied to the biprism increases, the spatial coherency decreases. This decrease in the degree of spatial matching lowers the contrast of the hologram formed on the fluorescent plate.
In addition, as a conventional quartz fiber (Quartz Fiber) has a thick average diameter of 1um level, there is a problem in that the shadow effect (Shadow Effect) formed by the biprism itself appears. Therefore, the overall shadowing power (Resolving Power) of the transmission electron microscope is lowered by this shadow effect, thereby having a detection limit of the electron holography analysis.
An object of the present invention to solve this problem is to provide a sample analysis device that can reduce the shadow effect caused by the biprism of the transmission electron microscope, and can obtain an analysis result of the improved electron holography.
Sample analysis apparatus using carbon nanotube (CNT) according to the present invention for solving the above technical problem is to focus the electron beam irradiated from the electric field electron gun, the electron electron beam irradiated by the electron emission by the field emission effect of the electron sample Supplying voltage to the bi-prism and bi-prism using a condenser lens irradiated to the object, an objective lens forming an enlarged image of the sample by the electron beam transmitted through the sample, and a carbon nanotube generating an interference fringe from the electron beam transmitted through the objective lens. And a hologram recording device for forming a hologram using an interference fringe generated by the constant voltage supply unit and the biprism.
Herein, the carbon nanotubes preferably have a diameter of 1 nm to 1 μm.
Herein, the length of the carbon nanotubes is preferably 0.5 mm to 10 cm.
Here, the carbon nanotubes are preferably tubular single-walled nanotubes in which carbon atoms are connected by hexagonal rings.
Sample analysis apparatus using a nanowire according to the present invention is a field electron gun for irradiating an electron beam by the field emission effect of electrons, a condenser lens for condensing the electron beam irradiated from the field electron gun, irradiated to the sample, an electron beam transmitted through the sample Using an objective lens for forming an enlarged image of the sample by using the light source, a biprism using nanowires to generate an interference pattern from an electron beam transmitted through the objective lens, a constant voltage supply unit supplying voltage to the biprism, and an interference pattern generated from the biprism. And a hologram recording device for forming a hologram.
Herein, the nanowires preferably have a diameter of 1 nm to 1 μm.
Here, the length of the nanowires is preferably 0.5 mm to 10 cm.
Hereinafter, with reference to the accompanying drawings will be described a preferred embodiment of the present invention;
[Sample Analysis Device Using Carbon Nanotubes]
5 and 6 are diagrams showing a sample analysis device according to an embodiment of the present invention.
Referring to FIG. 5, a sample analyzing apparatus according to an embodiment of the present invention may include a
First, the
Here, the field emission effect is an effect in which electrons tunnel from the surface of the conductor to the vacuum plane, and when a strong electric field is given to the conductor, the potential energy of the vacuum portion is lowered, which causes the Fermi level to be in the Fermi level. The electrons break through the energy barrier and are released into the vacuum.
Using the field emission effect, the electron beam irradiated from the
Herein, the electron beam transmitted through the
Subsequently, an object wave is transmitted to the
Thereafter, the material wave and the reference wave are transmitted through the
Subsequently, the material wave and the reference wave transmitted through the
Here, the
In addition, the
Here, the diameter of the
In addition, the length of the
The
In addition,
Accordingly, in the biprism using the
Subsequently, the electrodes of the
As the high voltage is applied by the improved mechanical strength of the
Subsequently, an interference fringe obtained from an object wave and a reference wave with increased phase coherence is hologramed through a hologram recording device 308 (Media To Record the Electron Hologram). Is formed.
6 is a sample analysis apparatus using a multi-biprism.
Here, as shown in FIG. 5, a plurality of
[Sample Analysis Apparatus Using Nanowire]
5 and 6 are diagrams showing a sample analysis device according to an embodiment of the present invention.
Referring to FIG. 5, a sample analyzing apparatus according to an embodiment of the present invention may include a
First, the
Here, the field emission effect is an effect in which electrons tunnel from the surface of the conductor to the vacuum plane, and when a strong electric field is given to the conductor, the potential energy of the vacuum portion is lowered, which causes the Fermi level to be in the Fermi level. The electrons break through the energy barrier and are released into the vacuum.
Using the field emission effect, the electron beam irradiated from the
Herein, the electron beam transmitted through the
Subsequently, an object wave is transmitted to the
Thereafter, the material wave and the reference wave are transmitted to the
Subsequently, the material wave and the reference wave transmitted through the
Here, the
Here, the diameter of the
In addition, the length of the
The electrodes of the
The
6 is a sample analysis apparatus using a multi-biprism.
Here, as shown in FIG. 5, a plurality of
As described above, those skilled in the art will appreciate that the present invention can be implemented in other specific forms without changing the technical spirit or essential features. Therefore, the above-described embodiments are to be understood in all respects as illustrative and not restrictive, and the scope of the present invention is indicated by the appended claims rather than the foregoing description, and the meaning and scope of the claims and All changes or modifications derived from the equivalent concept should be interpreted as being included in the scope of the present invention.
As described in detail above, the sample analysis device according to the present invention can minimize the shadow effect by the biprism itself using carbon nanotubes and nanowires having a thin diameter of the nano level.
In addition, it is possible to obtain an analysis result of improved electron holography by carbon nanotubes having a stable bonding structure of carbon atoms.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070062621A KR20080113762A (en) | 2007-06-26 | 2007-06-26 | Apparatus for analyzing specimen |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070062621A KR20080113762A (en) | 2007-06-26 | 2007-06-26 | Apparatus for analyzing specimen |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20080113762A true KR20080113762A (en) | 2008-12-31 |
Family
ID=40370969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020070062621A KR20080113762A (en) | 2007-06-26 | 2007-06-26 | Apparatus for analyzing specimen |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20080113762A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230052355A (en) | 2021-10-12 | 2023-04-20 | 에이치비솔루션㈜ | Analysis system with tof-meis |
-
2007
- 2007-06-26 KR KR1020070062621A patent/KR20080113762A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20230052355A (en) | 2021-10-12 | 2023-04-20 | 에이치비솔루션㈜ | Analysis system with tof-meis |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Cho et al. | Quantitative evaluation of spatial coherence of the electron beam from low temperature field emitters | |
US8841613B2 (en) | Method and system for 4D tomography and ultrafast scanning electron microscopy | |
JP6039775B2 (en) | Plasmon evaluation method, plasmon evaluation apparatus, and optical pickup | |
Storeck et al. | Nanotip-based photoelectron microgun for ultrafast LEED | |
Beyer et al. | Low energy electron point source microscopy: beyond imaging | |
JP2010517233A (en) | Improved particle beam generator | |
JP6353127B2 (en) | Transmission low-energy electron microscope | |
JP2010286419A (en) | Microcontact type prober | |
JP5934965B2 (en) | Electron beam equipment | |
JP2008004452A (en) | Illumination device, illumination method, optical detector, and light detection method | |
US7469039B2 (en) | Device and method for generating an x-ray point source by geometric confinement | |
JP5102968B2 (en) | Conductive needle and method of manufacturing the same | |
EP0189498B1 (en) | Field-emission scanning auger electron microscope | |
JP2005083857A (en) | Nanotube probe and its manufacturing method | |
JP6937310B2 (en) | Electron source and electron beam irradiator | |
JP4919404B2 (en) | Electron microscope, electron beam hologram creating method, and phase reproduction image creating method | |
Schmid et al. | In‐line holography using low‐energy electrons and photons: Applications for manipulation on a nanometer scale | |
KR20080113762A (en) | Apparatus for analyzing specimen | |
TW201743043A (en) | A method for characterizing two dimensional nanomaterial | |
JP6418706B2 (en) | Adjustable ampere phase plate for charged particle imaging systems | |
JP2004319149A (en) | Electron source and electron beam device using it | |
CN108666192A (en) | Charged particle beam apparatus | |
Rose et al. | Nanoscale chemical imaging using synchrotron x‐ray enhanced scanning tunneling microscopy | |
Dorozhkin et al. | Low-energy electron point source microscope as a tool for transport measurements of free-standing nanometer-scale objects: Application to carbon nanotubes | |
JP2005093106A (en) | Scanning electron microscope |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision | ||
J301 | Trial decision |
Free format text: TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20090217 Effective date: 20100531 |