KR20080082718A - Color filter substrate and method of fabricating the same - Google Patents

Abstract

A color filter substrate and a method for manufacturing the same are provided to simplify the process of work by implementing spacers according to superposition of at least two color filters. A color filter substrate includes a black matrix(120), color filters(130R,130G,130B), and spacers(140). The black matrix comparts cell regions on a substrate(110). The color filters are formed on the cell regions by the black matrix. The spacers overlapped with the black matrix maintain cell gaps. The spacers are formed by overlapping at least two color filters. The color filter substrate further includes an over coating layer formed on the color filter and an alignment layer formed on the over coating layer.

Description

Color Filter Substrate and Method of Manufacturing the Same {Color Filter Substrate and Method of Fabricating the same}

1 is a cross-sectional view showing a horizontal electric field type liquid crystal display device.

2A to 2G are process drawings showing a process of forming a color filter substrate constituting a conventional horizontal field type liquid crystal display device.

3 is a plan view of a color filter substrate constituting a horizontal field type liquid crystal display device according to the present invention;

4 is a cross-sectional view of the color filter substrate taken along line II ′ in FIG. 3.

5A and 5B are a plan view and a cross-sectional view of a color filter substrate having a black matrix according to a first embodiment of the present invention;

6A and 6B are a plan view and a cross-sectional view of a color filter substrate having a pattern formed in a red color filter and a first spar according to a first embodiment of the present invention;

7A and 7B are a plan view and a cross-sectional view of a color filter substrate on which a green color filter and a second spacer pattern are formed, according to a first embodiment of the present invention;

8A and 8B are a plan view and a cross-sectional view of a color filter substrate on which a blue color filter according to a first embodiment of the present invention is formed;

9A and 9B are a plan view and a cross-sectional view of a color filter substrate on which an overcoating layer according to a first embodiment of the present invention is formed.

10A and 10B are a plan view and a sectional view of a color filter substrate on which an alignment film according to a second embodiment of the present invention is formed.

11 is a plan view of a color filter substrate according to a second embodiment of the present invention;

12 is a cross-sectional view of the color filter substrate taken along the line II ′ in FIG. 11.

13A and 13B are a plan view and a cross-sectional view of a color filter substrate having a black matrix according to a second embodiment of the present invention;

14A and 14B are a plan view and a cross-sectional view of a color filter substrate on which a red color filter and a first spacer pattern are formed according to a second embodiment of the present invention;

15A and 15B are a plan view and a cross-sectional view of a color filter substrate on which a green color filter and a second spacer pattern are formed, according to a second embodiment of the present invention;

16A and 16B are a plan view and a sectional view of a color filter substrate on which a blue color filter according to a second embodiment of the present invention is formed;

17A and 17B are a plan view and a sectional view of a color filter substrate on which an overcoating layer according to a second embodiment of the present invention is formed.

18A and 18B are a plan view and a sectional view of a color filter substrate on which an alignment film according to a second embodiment of the present invention is formed;

      <Explanation of symbols for main parts of the drawings>

100,200: color filter substrate 110,220: glass substrate

120,220: Black Matrix 130,230: Color Filter

130R, 230R: Red Color Filter 130G, 230G: Green Color Filter

130B, 230B: Blue color filter 140,240: Spacer

140a and 240a: first spacer pattern 140b and 240b: second spacer pattern

150,250: overcoating layer 160,260: alignment film

The present invention relates to a color filter substrate and a method for manufacturing the same, and more particularly, to a color filter substrate having a spacer having a structure in which at least two color filters are overlapped, and a method of manufacturing the same.

Liquid crystal display (LCD) is a device that displays an image by controlling the light transmittance of the liquid crystal by using an electric field, and is implemented as an active matrix type in which switching elements are formed for each cell, so that a computer monitor, office work, etc. It is applied to display apparatuses, such as a device and a cellular phone.

Such liquid crystal displays are roughly classified into a vertical electric field type using a vertical electric field and a horizontal electric field type using a horizontal electric field according to the electric field direction for driving the liquid crystal.

In this case, in the vertical field type liquid crystal display, the common electrode formed on the upper substrate and the pixel electrode formed on the lower substrate face each other to drive the liquid crystal of TN (Twisted Nemastic) mode by a vertical electric field formed therebetween. do. Such a vertical field type liquid crystal display device has a large aperture ratio, but has a narrow viewing angle of about 90 degrees.

In a horizontal electric field type liquid crystal display, an in-plane switch (hereinafter referred to as IPS) mode liquid crystal is driven by a horizontal electric field between a pixel electrode and a common electrode arranged side by side on a lower substrate. Such a horizontal field application type liquid crystal display device has a wide viewing angle of about 160 degrees while a small aperture ratio.

Hereinafter, a configuration of a horizontal field type liquid crystal display device will be described in detail with reference to FIG. 1.

As shown in FIG. 1, the horizontal field type liquid crystal display includes a black matrix 4, a color filter 6, an overcoating layer 8, a spacer 13, and an upper alignment layer that are sequentially formed on the upper substrate 2. A thin film transistor substrate and a color filter substrate comprising a color filter substrate including a thin film transistor T, a common electrode 10, a pixel electrode 56, and a lower alignment layer 52 formed on the lower glass substrate 32. A liquid crystal (not shown) is injected into an inner space between the thin film transistor substrates.

Here, the black matrix 4 is formed to overlap the region where the thin film transistor T of the lower glass substrate 32 is formed, the gate line and the data line (not shown), and partitions the cell region where the color filter 6 is to be formed. . In this case, the black matrix 4 serves to prevent light leakage and to increase external contrast by absorbing external light.

The color filter 6 is formed over the cell region separated by the black matrix 4 and the black matrix 4. In this case, the color filter 6 is formed for each of R, G, and B to implement R, G, and B colors.

The overcoating layer 8 is formed to cover the step formed by the color filter 6 to planarize the upper substrate 2.

The spacer 13 serves to maintain a cell gap between the upper glass substrate 2 and the lower glass substrate 32. The spacer 13 is simultaneously formed of the same material as the overcoating layer 8 or is formed through a subsequent process. .

The upper alignment layer 12 is formed on the overcoating layer 8 having the spacer 13 formed thereon, and serves to orient the liquid crystal interposed between the thin film transistor substrate and the color filter substrate in a predetermined direction.

The thin film transistor T constituting the thin film transistor substrate includes a gate electrode 38 formed on the lower organic substrate 32 together with a gate line (not shown), a gate electrode 38 interposed between the gate electrode 38, and a gate insulating film. Overlapping semiconductor layers 92 and 93 and a source electrode 46 and a drain electrode 48 formed with a data line (not shown) with the semiconductor layers 92 and 93 interposed therebetween.

In this case, the thin film transistor T transmits the pixel signal transmitted from the data line to the pixel electrode connected to the drain electrode 48 through the contact hole passing through the passivation layer 50 in response to the scan signal of the gate line.

The common electrode 10 is formed on the lower glass substrate 32 together with the gate line and has a stripe shape that alternates with the pixel electrode 56. Here, a reference voltage, which is a reference when driving the liquid crystal, is supplied to the common electrode through a common line (not shown).

In this case, a horizontal electric field is formed between the pixel electrode 56 supplied with the pixel signal through the thin film transistor T and the common electrode 10 supplied with the reference voltage through the common line. The image is realized by changing the light transmittance by rotating the liquid crystal molecules arranged in the horizontal direction between the color filter substrates in a predetermined direction.

The lower alignment layer 52 is formed on a protective film (not shown) covering the thin film transistor and serves to orient the liquid crystal interposed between the thin film transistor substrate and the color filter substrate in a predetermined direction.

Hereinafter, a manufacturing process of the color filter substrate constituting the conventional liquid crystal display device will be described in detail with reference to FIGS. 2A to 2G.

The black matrix 4 is formed on the glass substrate 2 through a photolithography process using a first mask.

In more detail, an opaque material composed of an opaque metal, an opaque resin, or the like is coated on the glass substrate 2 in its entirety.

Thereafter, by performing a photolithography process on the opaque material using the first mask, as illustrated in FIG. 2A, the black matrix 4 which partitions the cell region on the glass substrate 2 and prevents light leakage phenomenon. Finally form.

After the black matrix is formed as described above, R, G, and B color filters are sequentially formed in the cell region partitioned by the black matrix 4.

In more detail, the red photosensitive color resin is entirely deposited on the glass substrate 2 on which the black matrix 4 is formed.

Thereafter, by performing a photolithography process on the red photosensitive color resin using the second mask, as shown in FIG. 2B, the red color filter R is formed in the cell region partitioned by the black matrix.

After the red color filter is formed as described above, a green photosensitive color resin is deposited on the glass substrate 2 in its entirety.

Thereafter, by performing a photolithography process on the green photosensitive color resin using the third mask, as shown in FIG. 2C, the green color filter G is formed in the cell region partitioned by the black matrix.

After the green color filter R is formed as described above, a blue photosensitive color resin is deposited on the glass substrate 2.

Then, by performing a photolithography process on the blue resin using a fourth mask, as shown in Figure 2d, to form a green color filter (G) in the cell region partitioned by a black matrix.

After the color filter is formed as described above, a spacer 13 is formed on the overcoating layer formed on the glass substrate to maintain the sal gap between the two substrates.

In more detail, by coating an organic insulator on the glass substrate 2 on which the color filter 6 is formed, as shown in FIG. 2E, the step formed by the color filter is removed to remove the glass substrate 2. ), An overcoat layer 8 is formed.

At this time, by performing an entire coating process on the glass substrate on which the overcoating layer is formed, and then performing a photolithography process using a fifth mask, as shown in FIG. 2F, a column formed to overlap the black matrix and maintaining a cell gap The spacer 13 is formed.

Thereafter, an alignment film 12 for aligning the liquid crystal in a predetermined direction is formed on the glass substrate 2 on which the spacer 13 is formed, thereby maintaining the cell gap on the black matrix 4 as shown in FIG. 2G. Finally, the color filter substrate on which the spacer 13 was formed was completed.

Conventionally, in the case of forming the color filter substrate through the manufacturing process as described above, as a separate mask process for forming a spacer to maintain the cell gap between the substrate is carried out not only increases the process time (Tact Time) but also the work process There was a problem with this complexity.

In order to solve the above problems, the present invention provides a color filter substrate and a method of manufacturing the same by overlapping at least two color filters to form column spacers, which can reduce the mask process and simplify the work process. There is.

In order to achieve the above object, the color filter substrate according to the present invention comprises a black matrix formed on the substrate to partition the cell region; A color filter formed in the cell region partitioned by the black mattress; And a spacer formed to overlap the black matrix and maintaining a cell gap, wherein the spacer is configured to have at least two color filters overlapped with each other.

Here, the color filter substrate according to the present invention is characterized in that it further comprises an over-coating layer for removing the step formed by the color filter to planarize the surface of the substrate.

The color filter according to the present invention is characterized in that it is formed in an island form in a cell region partitioned by a black matrix.

The color filter according to the present invention is characterized in that the cell region is integrally formed with the black matrix region where the spacer is formed.

A spacer according to the present invention includes a first spacer pattern composed of a first color filter constituting a color filter; And a second spacer pattern constituting the color filter and including a second spacer pattern formed to overlap the first spacer pattern.

The first and second color filters according to the present invention may be any one of a red color filter, a green color filter, and a blue color filter constituting the color filter.

The spacer according to the present invention is characterized in that it is formed to have a height of 3.1㎛ to 4.5㎛ to maintain the cell gap.

In order to achieve the above object, a method of manufacturing a color filter substrate according to the present invention, forming a black matrix partitioning a cell region on the substrate; Forming a color filter in the cell region partitioned by the black mattress; And forming a spacer overlapping with the black matrix and maintaining a cell gap; The spacer is characterized in that the configuration of the at least two color filters are superimposed.

Other objects and features of the present invention in addition to the above objects will become apparent from the description of the embodiments with reference to the accompanying drawings.

Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

First, the configuration and operation of the color filter substrate according to the first embodiment of the present invention will be described.

As shown in FIGS. 3 and 4, the color filter substrate according to the first embodiment of the present invention includes a black matrix 120 formed on the glass substrate 110 and a cell partitioned by the black matrix 120. The color filter 130 formed in an island pattern in the region, the spacer 140 formed to overlap the black matrix 120 and maintaining a cell gap, and the step formed by the color filter 130 are removed to remove the glass substrate 110. ) And an alignment layer 160 formed on the overcoat layer 150 to align the liquid crystal molecules in a predetermined direction.

The black matrix 120 is formed in the form of a matrix on the glass substrate 110 to partition the plurality of cell regions in which the color filter 130 is to be positioned, and to prevent optical interference between adjacent cell regions.

Here, the black matrix 120 is formed to overlap the gate line, the data line, and the thin film transistor, which are other regions except for the pixel region of the thin film transistor substrate.

In this case, the black matrix 120 is deposited on the glass substrate 110 with an opaque metal such as chromium (Cr or CrOx) to have a thickness of about 1500 to 2000 1500 and a line width of 5 to 25 μm. It is formed by patterning it through a photolithography process and an etching process.

In addition, the black matrix 120 is formed by forming an insulating resin on the glass substrate 110 to have a thickness of 1.0 to 1.5 μm and a line width of 5 to 25 μm, and then patterning the insulating resin through a photolithography process and an etching process. It may be.

The color filter 130 is formed in a plurality of cell regions partitioned by the black matrix 102 and includes a red color filter 130R for red, a green color filter 130G for green, and a blue color. It consists of a blue color filter 130B.

Here, the color filter 130 is formed through a photolithography process using a mask after sequentially spraying the photosensitive color resin having red, green and blue on the glass substrate through a pigment spraying method.

In this case, the red color filter 130R, the green color filter 130G, and the blue color filter 130B constituting the color filter 130 are formed in an island shape in the cell region partitioned by the black matrix 120.

The spacer 140 is formed to overlap the black matrix 120 and serves to maintain a cell gap for filling the liquid crystal between the two substrates, and the red color filter 130R, the green color filter 130G, and the blue color. At least two color filters of the color filter 130B are formed to have an overlapping structure to have a predetermined height.

That is, the spacer 140 is formed by stacking the first spacer pattern 140a and the second spacer pattern 140b including at least one of a red color filter 130R, a green color filter 130G, and a blue color filter 130B. It is formed into a structure.

In this case, the spacer is preferably formed to have a height of about 3.1㎛ to 4.5㎛ in order to maintain a cell gap in which the liquid crystal is filled between the substrate.

The overcoat layer 150 serves to planarize the surface of the glass substrate 110 by removing the step formed by the color filter 130. The overcoating layer 150 may include a spacer 140 formed to overlap the black matrix 120. It is formed entirely on the glass substrate 110 to cover.

The alignment layer 160 is formed to cover the overcoat layer 150 on which the spacer 140 is formed, and serves to orient the liquid crystal filled between the cell gaps in a predetermined direction. In this case, the alignment layer 160 is formed through a rubbing process using an organic alignment layer such as polyimide, and an alignment groove (not shown) for aligning the liquid crystal in a predetermined direction is formed.

Hereinafter, a method of manufacturing the color filter substrate 100 according to the first embodiment of the present invention will be described in detail.

First, a black matrix is formed on a substrate through a first mask process according to the present invention.

Referring to FIGS. 5A and 5B, an opaque metal such as chromium (Cr or CrOx), such as chromium (Cr or CrOx), may be formed on the glass substrate 110 constituting the color filter substrate 100 to have a thickness of about 1500 to 2000 μs and 5. It is deposited to have a line width of ˜25 μm.

Thereafter, the photolithography process using the first mask is performed on the opaque metal deposited on the glass substrate 110, thereby forming a plurality of cells in which the color filters 130 are formed by forming a matrix on the glass substrate 110. A black matrix 120 is formed that partitions the region and prevents optical interference between adjacent cell regions.

In this case, the black matrix 120 formed on the glass substrate 110 may be formed by forming an insulating resin to have a thickness of 1.0 to 1.5 μm and a line width of 5 to 25 μm, and then pattern the same through a photolithography process.

After forming the black matrix 120 as described above, a red color filter is formed in the cell region partitioned by the black matrix through a second mask process according to the present invention.

6A and 6B, a red photosensitive color resin is completely coated on the glass substrate 101 partitioned by the black matrix 102 using the pigment spraying method.

Thereafter, a photolithography process using a second mask is performed on the red photosensitive color resin, thereby forming a red color filter 130R having an island pattern in the cell region partitioned by the black matrix 102.

In this case, the first spacer pattern 140a including the red color filter 130R is formed in a region overlapping the black matrix 120 through a photolithography process using the second mask.

After forming the red color filter 130R constituting the first spacer pattern 140a as described above, the green color filter is formed in the cell region partitioned by the black matrix 120 through the third mask process according to the present invention. To form 130G.

Referring to FIGS. 7A and 7B, a green photosensitive color resin is completely coated on the substrate on which the red color filter 130R is formed by using a pigment spraying method.

Subsequently, a photolithography process using a third mask is performed on the green photosensitive color resin, thereby forming a green color filter 130G having an island pattern in the cell region bounded by the black matrix 120.

In this case, the photolithography process using the third mask is formed to overlap the first spacer 140a and the second spacer 140b formed of the green color filter 130G is formed.

That is, a spacer including a first spacer pattern 140a composed of a red color filter 130R and a second spacer pattern 140b composed of a green color filter 130G at a position where the black matrix 120 is formed. 140 is finally formed.

After forming the red color filter 130R, the green color filter 130G, and the spacer 140 as described above, the cell region partitioned by the black matrix 120 through the fourth mask process according to the present invention is blue. The color filter 130B is formed.

Referring to FIGS. 8A and 8B, the blue photosensitive color resin is completely coated on the glass substrate 110 having the red color filter 130R, the green color filter 130G, and the spacer 140 by using a pigment spray method. do.

Thereafter, a photolithography process using a fourth mask is performed on the blue photosensitive color resin to finally form a blue color filter 130B representing blue in the cell region partitioned by the black matrix 120.

After the color filter 130 and the spacer 140 are formed as described above, the overcoat layer 150 is formed to planarize the surface of the substrate according to the present invention.

9A and 9B, a thermosetting resin, more specifically a thermosetting resin such as polydimethyl siloxane, is formed on the glass substrate 110 to compensate for the step formed by the color filter 130. .

Here, the over coating layer 150 serves to remove the step formed by the color filter 130, so that the alignment layer 160 formed through the subsequent process can be formed in a flat shape on the glass substrate 110. Do this.

After the overcoat layer 150 is formed as described above, the alignment layer 160 for liquid crystal alignment is formed on the overcoat layer 150 according to the present invention.

Referring to FIGS. 10A and 10B, an organic alignment layer such as polyimide is completely coated on the glass substrate 110 on which the overcoating layer 150 is formed.

Subsequently, by performing a rubbing process on the organic alignment layer formed on the overcoating layer, an alignment layer 160 having an alignment groove for aligning the liquid crystal filled between the cell gaps formed by the spacer 140 in a predetermined direction is finally formed. .

Hereinafter, the structure and operation of the liquid crystal display panel according to the second embodiment of the present invention will be described.

As shown in FIGS. 11 and 12, the color filter substrate according to the second embodiment of the present invention includes a black matrix 220 formed on the glass substrate 210 and a cell partitioned by the black matrix 220. The glass substrate 210 is formed by removing the color filter 230 integrally formed in the region, the spacer 240 formed to overlap the black matrix 220 and maintaining the cell gap, and the step formed by the color filter 230. ) And an alignment layer 260 formed on the overcoat layer 250 to align the liquid crystal in a predetermined direction.

The black matrix 220 is formed in a matrix form on the glass substrate 220 to partition a plurality of cell regions in which the color filter 230 is to be positioned and to prevent optical interference between adjacent cell regions.

Here, the black matrix 220 is formed to overlap the gate line, the data line, and the thin film transistor, which are other regions except the pixel region of the thin film transistor substrate.

The color filter 230 is formed in a plurality of cell regions partitioned by the black matrix 220. The color filter 230 implements a red color filter 230R that implements red, a green color filter 230G that implements green, and a color that implements blue. It consists of a blue color filter 230B.

Here, the red color filter 230R, the green color filter 230G, and the blue color filter 230B constituting the color filter 230 may form a cell region and a spacer 240 partitioned by the black matrix 220. It is integrally formed to cover the black matrix area.

The spacer 240 is formed to overlap the black matrix 220 and serves to maintain a cell gap for filling the liquid crystal between the two substrates, and the red color filter 230R, the green color filter 230G, and the blue color. At least two color filters of the filter 230B are formed to have an overlapping structure to have a predetermined height.

That is, the spacer 240 is formed by stacking a first spacer pattern 240a and a second spacer pattern 240b including at least one of a red color filter 230R, a green color filter 230G, and a blue color filter 230B. It is formed into a structure.

At this time, the spacer 240 is preferably formed to have a height of about 3.1㎛ to 4.5㎛ to maintain the cell gap between the two substrates.

The overcoating layer 250 serves to planarize the glass substrate 210 by removing a step formed by the color filter 230 and to cover the spacer 240 formed to overlap the black matrix 220. The front surface is formed on the glass substrate 210.

The alignment layer 260 is formed on the overcoating layer 250 formed with the spacers 240 to align the liquid crystal molecules in a predetermined direction.

Hereinafter, a method of manufacturing a color filter substrate according to a second embodiment of the present invention will be described in detail.

First, the black matrix 220 is formed on the substrate 210 through the first mask process according to the present invention.

13A and 13B, a black matrix 220 made of an opaque metal such as chromium (Cr or CrOx) or an insulating resin is formed on the substrate 210 constituting the color filter substrate.

Here, the black matrix 220 is formed in a matrix form on the substrate 210 to partition a plurality of cell regions in which the color filters 230 are to be formed and to prevent optical interference between adjacent cell regions.

After the black matrix 220 is formed as described above, the red color filter 230R and the first spacer pattern 240a constituting the color filter 230 are formed through the second mask process according to the present invention.

Referring to FIGS. 14A and 14B, a red photosensitive color resin is completely coated on the substrate 210 partitioned by the black matrix 220 using the pigment spraying method.

Thereafter, a photolithography process using a second mask is performed on the red photosensitive color resin, thereby forming a red color filter 104R configured to cover the cell region partitioned by the black matrix 220 and a partial region of the black matrix. do.

In this case, a first spacer pattern 240a including a red color filter 230R covering a portion of the black matrix 220 is formed through a photolithography process using a second mask.

After the red color filter and the first spacer pattern are formed as described above, the green color filter 230G and the second spacer pattern constituting the color filter 230 are formed through the third mask process according to the present invention.

15A and 15B, a green photosensitive color resin is completely coated on the substrate 210 on which the red color filter 230R is formed by using a pigment spraying method.

Thereafter, a photolithography process using a third mask is performed on the photosensitive color resin of green, so that the green region is integrally formed to cover the cell region partitioned by the black matrix 220 and a partial region of the black matrix 220. The color filter 230G is formed.

In this case, the photolithography process using the third mask is formed to overlap the first spacer pattern 240a and the second spacer pattern 240b formed of the green color filter 230G is formed.

That is, a spacer composed of a first spacer pattern 240a composed of a red color filter 230R and a second spacer pattern 240b composed of a green color filter 230G at a position overlapping the black matrix 220 according to the present invention. 240 is finally formed.

After forming the red color filter 230R, the green color filter 230G, and the spacer 240 as described above, the blue color filter 230B constituting the color filter 230 through a fourth mask process according to the present invention. ).

Referring to FIGS. 16A and 16B, a blue photosensitive color resin is entirely coated on the substrate 210 on which the red color filter 230R, the green color filter 230G, and the spacer 240 are formed by using a pigment spraying method. .

Thereafter, a photolithography process using a fourth mask is performed on the blue photosensitive color resin, thereby the blue color filter 230B integrally configured to cover the cell region partitioned by the black matrix 220 and a part of the black matrix. ).

After the color filter 230 and the spacer 240 are formed as described above, the overcoat layer 250 is formed to planarize the surface of the substrate 210 according to the present invention.

As shown in FIGS. 17A and 17B, an overcoating layer 250 formed of a thermosetting resin is formed on the substrate 210 to compensate for the step formed by the color filter 230.

Here, the overcoating layer 250 removes the step formed on the substrate 210 by the color filter 230, whereby the alignment layer 260 formed through the subsequent process is formed on the reflow substrate 210 in a flat shape. It has a role to make it possible.

After the overcoating layer 250 is formed as described above, an alignment layer 260 for liquid crystal alignment is formed on the overcoating layer 250 according to the present invention.

18A and 18B, an alignment layer 260 comprising polyimide or the like on the substrate 210 on which the overcoating layer 250 is formed and aligning liquid crystals filled between cell gaps formed by spacers in a predetermined direction is provided. Finally formed.

As described above, the color filter substrate and the manufacturing method thereof according to the present invention provide an effect of reducing the mask process and simplifying the work process by forming a spacer by overlapping at least two color filters.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (14)

A black matrix formed on the substrate and partitioning the cell region; A color filter formed in a cell region partitioned by the black mattress; And A spacer formed to overlap with the black matrix and maintaining a cell gap; The spacer is a color filter substrate, characterized in that formed in the form of at least two color filters overlap. The method of claim 1, An overcoating layer formed on the color filter; And And an alignment layer formed on the overcoating layer. The method of claim 1, And the color filter is formed in an island shape in a cell region partitioned by the black matrix. The method of claim 1, And the color filter is formed to overlap the cell region and the black matrix region where the spacer is formed. The method of claim 1, The spacer, A first spacer pattern composed of a first color filter constituting the color filter; And And a second spacer pattern formed of a second color filter constituting the color filter and overlapping the first spacer pattern. The method of claim 5, wherein And the first and second color filters are any one of a red color filter, a green color filter, and a blue color filter constituting the color filter. The method of claim 5, wherein The spacer is formed to have a height of 3.1㎛ to 4.5㎛ in order to maintain the cell gap. Forming a black matrix defining a cell region on the substrate; Forming a color filter in a cell region partitioned by the black mattress; And Forming a spacer overlapping the black matrix and maintaining a cell gap; The spacer is a method of manufacturing a color filter substrate, characterized in that formed in the form of at least two color filters overlap. The method of claim 8, Forming an overcoat layer on the color filter; And And forming an alignment layer on the overcoating layer. The method of claim 8, And the color filter is formed in an island shape in a cell region partitioned by the black matrix. The method of claim 8, And the color filter is formed to overlap the cell region and the black matrix region where the spacer is formed. The method of claim 1, Forming the spacers, Overlapping a first color filter constituting the color filter on the black matrix to form a first spacer pattern; And And overlapping a second color filter constituting the color filter on the first spacer pattern to form a second spacer pattern. The method of claim 12, And the first and second color filters are any one of a red color filter, a green color filter, and a blue color filter constituting the color filter. The method of claim 12, The spacer is a manufacturing method of a color filter substrate, characterized in that formed to have a height of 3.1㎛ to 4.5㎛ to maintain the cell gap.

Images