KR20080080769A - Dielectric composition for plasma display panel and plasma display panel using the same, manufacturing method thereof - Google Patents

Dielectric composition for plasma display panel and plasma display panel using the same, manufacturing method thereof Download PDF

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KR20080080769A
KR20080080769A KR1020070020909A KR20070020909A KR20080080769A KR 20080080769 A KR20080080769 A KR 20080080769A KR 1020070020909 A KR1020070020909 A KR 1020070020909A KR 20070020909 A KR20070020909 A KR 20070020909A KR 20080080769 A KR20080080769 A KR 20080080769A
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mol
dielectric
composition
plasma display
display panel
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KR1020070020909A
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Korean (ko)
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변나미
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엘지전자 주식회사
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/10—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances metallic oxides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
    • H01B3/12—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances ceramics
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/22—Electrodes, e.g. special shape, material or configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/38—Dielectric or insulating layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20—Constructional details
    • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/38—Dielectric or insulating layers

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  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
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  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Gas-Filled Discharge Tubes (AREA)

Abstract

The present invention relates to a dielectric composition for a plasma display panel, a plasma display panel using the same, and a method for manufacturing the same, including 10 to 15 mol% Bi 2 O 3 , 30 to 40 mol% B 2 O 3 , 0 to 25 mol% ZnO, 2-8 mol% Al 2 O 3 , 10-15 mol% BaO, 0-5 mol% K 2 O, 1-20 mol% SrO, 1-15 mol% MgO and 1-20 mol% CaO A dielectric composition for a plasma display panel, and a plasma display panel using the same and a method of manufacturing the same. Since the present invention does not use Pb in the dielectric composition serving as the mother glass powder, it is free from environmental regulation and can prevent glass crystallization due to the use of an alkali material. Therefore, it can be used as a dielectric layer and a partition material of a plasma display at low temperature baking below 520 degreeC.

Description

Dielectric composition for plasma display panel and plasma display panel using same and method for manufacturing the same {DIELECTRIC COMPOSITION FOR PLASMA DISPLAY PANEL AND PLASMA DISPLAY PANEL USING THE SAME, MANUFACTURING METHOD THEREOF}

1 is a perspective view illustrating a discharge cell structure of a conventional plasma display panel.

2 is a cross-sectional view illustrating a plasma display panel according to Embodiment 1 of the present invention.

3 is a cross-sectional view illustrating a plasma display panel according to a second embodiment of the present invention.

4 is a cross-sectional view illustrating a plasma display panel according to a third embodiment of the present invention.

5 is a cross-sectional view illustrating a plasma display panel according to a fourth embodiment of the present invention.

6 is a schematic block diagram showing a method of manufacturing a plasma display panel according to Embodiment 8 of the present invention.

<Description of Symbols for Main Parts of Drawings>

1, 11: 1st board | substrate (upper) 2, 12: 2nd board | substrate (lower)

3, 13: partition 4, 14: second dielectric layer (lower)

5, 15: phosphor 6, 16: first dielectric layer (top)

7, 17: protective layer

9, 19: sustain electrode pair X, X1: address electrode

The present invention relates to a dielectric composition for a plasma display panel, a plasma display panel using the same and a method of manufacturing the same.

Plasma Display Panels (PDPs), which are emerging as flat panel display devices with the highest potential to lead the next-generation flat panel display market, are usually He + Xe, Ne + in discharge cells partitioned by partition walls. 147 nm vacuum ultraviolet rays generated when an inert mixed gas such as Xe, He + Xe + Ne are discharged to emit an phosphor to display an image. Such a plasma display panel is a display device that is attracting attention as a large area flat panel display due to its easy thin and large size.

Referring to FIG. 1, a discharge cell of a three-electrode AC surface discharge type plasma display panel includes a sustain electrode pair 9 formed on an upper glass substrate 1, an upper dielectric 6 formed on the sustain electrode pair 9, and a discharge electrode. The protective film 7 formed on the upper dielectric 6, the address electrode X formed on the second substrate 2, the lower dielectric 4 formed on the address electrode X, and the lower dielectric 4. The partition 3 formed above is provided.

Each of the sustain electrode pairs 9 has a transparent electrode 9a such as indium tin oxide (ITO), a line width smaller than the line width of the transparent electrode 9a, and one edge of the transparent electrode 9a. It includes a metal bus electrode (9b) formed in. The metal bus electrode 9b is formed through an ashing process after stacking Cr / Cu / Cr by vapor deposition. The first dielectric 6 and the protective film 7 are laminated on the first substrate 1 on which the sustain electrode pairs 9 are formed by screen printing or vacuum deposition. In the first dielectric 6, wall charges generated during plasma discharge accumulate to maintain the discharge, and serve as a diffusion barrier for sputtering ions during plasma discharge, thereby preventing electrode damage of the sustain electrode pair 9 due to ion sputtering. Done. The protective layer 7 is formed on the first dielectric layer 6 to a thickness of approximately 5000 Å to prevent damage to the first dielectric layer 6 and the sustain electrode pair 9 due to sputtering generated during plasma discharge. In addition, the emission efficiency of secondary electrons is increased. As the protective layer 7, magnesium oxide (MgO) is usually used.

The second dielectric 4 and the partition 3 are formed on the second substrate 2 on which the address electrode X is formed, and the phosphor 5 is formed on the surfaces of the second dielectric 4 and the partition 3 by screen printing. ) Is formed. The phosphor 5 is excited by vacuum ultraviolet rays (VUV) generated during plasma discharge of the mixed gas injected into the discharge cells to generate visible light of any one of red, green, and blue. The address electrode 2 is formed to intersect with the sustain electrode pair 9. The partition 3 is formed by a screen printing process, a mold method, or the like. The partition wall 3 maintains discharge by forming wall charges and improves luminous efficiency by reflecting visible light emitted from the phosphor 5. In addition, the barrier rib 3 prevents electrical and optical cross talk between the cells, thereby preventing the ultraviolet rays and the visible light generated by the discharge from leaking to the adjacent discharge cells. The second dielectric 4 improves the luminous efficiency of the plasma display panel by reflecting back visible light radiated backward from the phosphor 5 and serves as a base layer of the partition wall 3. At the same time, the second dielectric 4 serves as a diffusion barrier to prevent the electrode material constituting the address electrode X from being diffused into the phosphor 5.

Here, the method of forming the upper dielectric (6) is about 40,000 cps by mixing 20-30 mol% of organic binder in borosilicate glass powder of 1 ~ 2㎛ sized grains containing about 60mol% or more of Pb. After having the viscosity, the entire surface is coated on the upper glass substrate 1 on which the sustain electrode pairs 9 are formed by screen printing, and then fired at a temperature of 550 to 580 ° C. The dielectric constant of the upper dielectric 6 has a value ranging from 14 to 16, and exhibits a light transmittance that transmits about 70% of visible light at 550 nm, which is the center wavelength. In order to form the lower dielectric 4 and the partition wall 3, first, a fine powder oxide such as TiO 2 and Al 2 O 3 in a fine glass powder containing about 60 mol% or more of PbO is mixed with an organic solvent. To add a paste having a viscosity of about 40,000 cps. After the paste is prepared as described above, the entire surface is coated with a thickness of 20 to 25 μm on the lower glass substrate 2 on which the address electrode X is formed by screen printing. Dielectric 4 is formed. Thereafter, the paste is applied on the lower dielectric material 4 to a thickness of 120 to 200 μm, and the barrier ribs 3 are formed by firing after forming the barrier rib pattern through screen printing, sand blasting, molding, or the like. . Here, the fine powder oxide improves the reflection characteristics of the partition 3 and the lower dielectric 4, adjusts the dielectric constant, and secures impact resistance.

In the plasma display panel, the high distortion glass of PD-200 is used as the first substrate and the second substrate, but the use of soda-lime glass is actively considered. This is because soda-lime glass is about 1/6 times cheaper than PD-200, which is advantageous in terms of unit cost. Therefore, studies on the use of soda-lime glass substrates have been actively conducted to improve the price competitiveness of the overall plasma display panel.

On the other hand, as described above, a material containing lead (Pb) was used for the dielectric layer formed on the first substrate. However, as problems such as environmental pollution due to Pb are emerging, regulations on Pb-containing materials are being reinforced day by day. Accordingly, research into a composition capable of replacing Pb-containing materials as a dielectric composition for plasma display panels has been actively conducted, and bismuth (Bi) based dielectric compositions and zinc (Zn) based dielectric compositions are widely known.

However, since the Zn-based dielectric composition has a high glass transition temperature, when the soda-lime glass substrate is used, there is a problem that it does not meet the dielectric baking conditions. That is, since the soda-lime glass substrate mainly used as the substrate for the plasma display panel because of the unit price is advantageous, heat deformation occurs when heated to about 550 ° C. or higher.

However, since the Zn-based dielectric composition has a glass transition temperature of more than 550 ° C., it is required that the temperature necessary for the firing process, which is essential for forming the dielectric layer, that is, the firing temperature is higher than 550 ° C., There was a problem that thermal deformation of the soda-lime glass substrate occurs during the firing process.

The present invention is to solve the above problems, an object of the present invention to provide a dielectric composition for a plasma display panel that can be produced at a low firing temperature, a plasma display panel using the same and a method of manufacturing the same.

Another object of the present invention is to provide a dielectric composition for a plasma display panel that does not contain Pb, which is free from environmental pollution, and can be manufactured at low cost, a plasma display panel using the same, and a method of manufacturing the same.

Another object of the present invention is to provide a dielectric composition for a plasma display panel, a plasma display panel using the same, and a method of manufacturing the same, which do not add an alkali metal oxide, thereby preventing yellowing from occurring in an electrode.

Dielectric composition according to an embodiment of the present invention for achieving the above object is 10 to 15 mol% Bi 2 O 3 , 30 to 45 mol% B 2 O 3 , 25 to 35 mol% ZnO, 4 to 8 mol% Is characterized by having a composition ratio containing Al 2 O 3 , 1-10 mol% BaO and 0-10 mol% K 2 O.

According to another aspect of the present invention, there is provided a plasma display panel including a first substrate on which a first dielectric is formed, a second substrate on which a second dielectric is formed, and a gap between the first substrate and the second substrate. Wherein the first and second dielectrics or partitions comprise 10-15 mol% Bi 2 O 3 , 30-45 mol% B 2 O 3 , 25-35 mol% ZnO, 4-8 mol% Al 2 It is characterized by having a composition ratio containing O 3 , 1-10 mol% BaO and 0-10 mol% K 2 O.

In another aspect of the present invention, there is provided a method of manufacturing a plasma display panel, which includes a first electrode, a first substrate having a first dielectric, and a second electrode, a second dielectric, and a partition wall. 2 preparing a substrate, 10-15 mol% Bi 2 O 3 , 30-45 mol% B 2 O 3 , 25-35 mol% ZnO, 4-8 mol% Al 2 O 3 , 1-10 mol% BaO And preparing a paste by mixing a vehicle with a dielectric composition containing 0-10 mol% of K 2 O, applying the paste onto a substrate, and baking the paste to form a paste in the first, second dielectric and partition walls. It characterized in that it comprises a step of forming at least one.

Here, the dielectric composition or the first and second dielectrics and barrier ribs may include at least one of TiO 2 , MgO, CaO, and P 2 O 5 in order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE). One has a composition ratio further included in 0 to 10 mol%, or at least any one of CoO, CuO, Cr 2 O 3 , MnO, FeO, NiO has a composition ratio further included in 0 to 0.5 mol%. In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CeO 2 , Er 2 O 3 , Nd 2 O 3 , and Pr 2 O 3 has a composition ratio further contained in an amount of 0 to 10 mol%.

In addition, the paste has a composition ratio including a dielectric composition of 70 to 90 wt% powder and a vehicle of 10 to 30 wt%, and the paste is applied by at least one of screen printing, dispensing, and inkjet method. .

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

In the accompanying drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. On the other hand, when a part such as a layer, film, region, plate, etc. is formed or positioned on another part, it is formed directly on the other part and not only in direct contact but also when another part exists in the middle thereof It should also be understood to include.

Here, the first substrate is an upper substrate of a plasma display panel in which a sustain electrode pair consisting of a transparent electrode and a bus electrode, an upper dielectric layer, and a passivation layer are sequentially formed, and the second substrate is an address electrode and a lower dielectric layer for generating a discharge electrode pair and a discharge electrode. The lower substrate of the plasma display panel is sequentially formed, and the electrode and dielectric provided in the first substrate are referred to as the first electrode and the first dielectric, and the electrode and dielectric provided in the second substrate are similar to the second electrode. It will be referred to as a second dielectric.

2 is a cross-sectional view illustrating a plasma display panel according to Embodiment 1 of the present invention.

As shown in FIG. 2, the plasma display panel according to Embodiment 1 of the present invention includes a first dielectric 16, which is a low-temperature fired dielectric. The basic composition of the dielectric composition, the first dielectric 16, which is the upper dielectric, is composed of Bi 2 O 3 , B 2 O 3, and BaO.

The composition is mixed with a vehicle in a powder state having a particle size of 1 to 1.5 µm, made of a dielectric paste having a viscosity of 40,000 to 60,000 cps, and then coated on the first substrate 11 and baked at a temperature of 520 ° C. or less. Through the first dielectric 16 is completed.

Looking at the specific composition ratio of the dielectric composition, 10 to 15 mol% Bi 2 O 3 , 30 to 40 mol% B 2 O 3 , 0 to 25 mol% ZnO, 2 to 8 mol% Al 2 O 3 , 10 to 15 mol% Has a composition ratio of 0 to 5 mol% K 2 O, 1 to 20 mol% SrO, 1 to 15 mol% MgO and 1 to 20 mol% CaO.

The Bi 2 O 3 serves as a glass former when added with B 2 O 3 or SiO 2, and serves to increase the coefficient of thermal expansion and dielectric constant.

The B 2 O 3 is generally added as a flux for promoting a solid phase reaction, but there is a disadvantage in that the glass transition temperature is improved by improving the glass forming ability, thereby adding the appropriate amount of the above-mentioned composition ratio.

The ZnO not only plays a role of lowering the coefficient of thermal expansion and glass transition temperature while increasing the vitrification forming ability, but also absorbs the orange light generated by the discharge of Ne from the discharge gas injected into the interior of the plasma display panel, thereby improving the color purity of the plasma display panel. It also prevents the phenomenon of deterioration.

The Al 2 O 3 is added to assist in mixing or printing powders in the dielectric composition and to prevent crystallization.

The BaO acts as an alkaline earth and acts as a tree planting agent, and when a certain amount is added, it lowers the glass transition temperature, but when added in excess (10 mol% or more), it causes crystallization.

The SrO is added to control properties such as glass transition temperature and thermal expansion coefficient.

The SiO 2 is added to prevent crystallization of the dielectric composition.

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

3 is a cross-sectional view illustrating a plasma display panel according to a second embodiment of the present invention.

As shown in FIG. 3, the plasma display panel according to the second exemplary embodiment of the present invention includes a partition wall 13 which is a low-temperature fired dielectric. The basic composition of the dielectric composition as the partition 13 is made of Bi 2 O 3 , B 2 O 3 and BaO.

The composition is mixed with a vehicle in a powder state having a particle size of 1 to 1.5 μm, made of a dielectric paste having a viscosity of 40,000 to 60,000 cps, and then coated on the first substrate 11 and patterned, and then at a temperature of 520 ° C. or less. The first dielectric 16 is completed through a process of firing.

Looking at the specific composition ratio of the dielectric composition, 10 to 15 mol% Bi 2 O 3 , 30 to 40 mol% B 2 O 3 , 0 to 25 mol% ZnO, 2 to 8 mol% Al 2 O 3 , 10 to 15 mol% Has a composition ratio comprised of 0 to 5 mol% of K 2 O, 1 to 20 mol% of SrO, 1 to 15 mol% of MgO, and 1 to 20 mol% of CaO.

Here, 10-15 mol% TiO 2 which is a high refractive index filler. Or 10 to 20 wt% of Al 2 O 3 .

The Bi 2 O 3 serves as a glass former when added with B 2 O 3 or SiO 2, and serves to increase the coefficient of thermal expansion and dielectric constant.

The B 2 O 3 is generally added as a flux for promoting a solid phase reaction, but there is a disadvantage in that the glass transition temperature is improved by improving the glass forming ability, thereby adding the appropriate amount of the above-mentioned composition ratio.

The ZnO not only plays a role of lowering the coefficient of thermal expansion and glass transition temperature while increasing the vitrification forming ability, but also absorbs the orange light generated by the discharge of Ne from the discharge gas injected into the interior of the plasma display panel, thereby improving the color purity of the plasma display panel. It also prevents the phenomenon of lowering.

The Al 2 O 3 is added to assist in mixing or printing powders in the dielectric composition and to prevent crystallization.

The BaO acts as an alkaline earth and acts as a tree planting agent, and when a certain amount is added, it lowers the glass transition temperature, but when added in excess (10 mol% or more), it causes crystallization.

The SrO is added to control properties such as glass transition temperature and thermal expansion coefficient.

The SiO 2 is added to prevent crystallization of the dielectric composition.

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

4 is a sectional view showing a plasma display panel according to a third embodiment of the present invention.

As shown in FIG. 4, the plasma display panel according to Embodiment 3 of the present invention includes a second dielectric 14 which is a low temperature fired dielectric. The basic composition of the dielectric composition, which is the lower dielectric, the second dielectric 14, is composed of Bi 2 O 3 , B 2 O 3, and BaO.

The composition is mixed with a vehicle in a powder having a particle size of 1 to 1.5 µm, made of a dielectric paste having a viscosity of 40,000 to 60,000 cps, and then coated on the entire surface of the second substrate 12 and baked at a temperature of 520 ° C. or less. Through the second dielectric 14 is completed.

Looking at the specific composition ratio of the dielectric composition, 10 to 15 mol% Bi 2 O 3 , 30 to 40 mol% B 2 O 3 , 0 to 25 mol% ZnO, 2 to 8 mol% Al 2 O 3 , 10 to 15 mol% Has a composition ratio comprised of 0 to 5 mol% of K 2 O, 1 to 20 mol% of SrO, 1 to 15 mol% of MgO, and 1 to 20 mol% of CaO.

Here, 10-15 mol% TiO 2 which is a high refractive index filler. Or 10 to 20 wt% of Al 2 O 3 .

The Bi 2 O 3 serves as a glass former when added with B 2 O 3 or SiO 2, and serves to increase the coefficient of thermal expansion and dielectric constant.

The B 2 O 3 is generally added as a flux for promoting a solid phase reaction, but there is a disadvantage in that the glass transition temperature is improved by improving the glass forming ability, so that the appropriate amount of the above-described composition ratio is added.

The ZnO not only plays a role of lowering the coefficient of thermal expansion and glass transition temperature while increasing the vitrification forming ability, but also absorbs the orange light generated by the discharge of Ne from the discharge gas injected into the interior of the plasma display panel, thereby improving the color purity of the plasma display panel. It also prevents the phenomenon of deterioration.

The Al 2 O 3 is added to assist in mixing or printing powders in the dielectric composition and to prevent crystallization.

The BaO acts as an alkaline earth and acts as a tree planting agent, and when a certain amount is added, it lowers the glass transition temperature, but when added in excess (10 mol% or more), it causes crystallization.

The SrO is added to control properties such as glass transition temperature and thermal expansion coefficient.

The SiO 2 is added to prevent crystallization of the dielectric composition.

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

5 is a cross-sectional view illustrating a plasma display panel according to a fourth embodiment of the present invention.

As shown in FIG. 5, the plasma display panel according to the fourth exemplary embodiment includes a first dielectric 16, a second dielectric 14, and a partition 13, which are low-temperature fired dielectrics. The basic composition of the first dielectric 16 as the upper dielectric, the second dielectric 14 as the lower dielectric, and the partition 13 as the dielectric is Bi 2 O 3 , B 2 O 3 and BaO. Is done.

The composition is mixed with a vehicle in a powder state having a particle size of 1 to 1.5 µm, made of a dielectric paste having a viscosity of 40,000 to 60,000 cps, and then completely coated on the first and second substrates 11 and 12 and having a temperature of 520 ° C. or less. The first and second dielectrics 16 and 14 are completed through a process of firing at the same, and the entire surface of the first and second dielectrics 16 and 14 is similarly coated on the second substrate 12 and patterned, and then fired at a temperature of 520 ° C. or lower. 13) is completed.

Looking at the specific composition ratio of the dielectric composition, 10 to 15 mol% Bi 2 O 3 , 30 to 40 mol% B 2 O 3 , 0 to 25 mol% ZnO, 2 to 8 mol% Al 2 O 3 , 10 to 15 mol% Has a composition ratio of 0 to 5 mol% K 2 O, 1 to 20 mol% SrO, 1 to 15 mol% MgO and 1 to 20 mol% CaO.

Here, the second dielectric 14 and the partition wall 13 are 10 to 15 mol% of TiO 2 , which is a high refractive index filler. Or 10 to 20 wt% of Al 2 O 3 .

The Bi 2 O 3 serves as a glass former when added with B 2 O 3 or SiO 2, and serves to increase the coefficient of thermal expansion and dielectric constant.

The B 2 O 3 is generally added as a flux for promoting a solid phase reaction, but there is a disadvantage in that the glass transition temperature is improved by improving the glass forming ability, thereby adding the appropriate amount of the above-mentioned composition ratio.

The ZnO not only plays a role of lowering the coefficient of thermal expansion and glass transition temperature while increasing the vitrification forming ability, but also absorbs the orange light generated by the discharge of Ne from the discharge gas injected into the interior of the plasma display panel, thereby improving the color purity of the plasma display panel. It also prevents the phenomenon of lowering.

The Al 2 O 3 is added to assist in mixing or printing powders in the dielectric composition and to prevent crystallization.

The BaO acts as an alkaline earth and acts as a tree planting agent, and when a certain amount is added, it lowers the glass transition temperature, but when added in excess (10 mol% or more), it causes crystallization.

The SrO is added to control properties such as glass transition temperature and thermal expansion coefficient.

The SiO 2 is added to prevent crystallization of the dielectric composition.

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

Hereinafter, embodiments 5 to 7 of the present invention will be described in detail.

Figure 112007017748615-PAT00001

Example  5

To prepare the dielectric composition according to the invention 12.0 mol% Bi 2 O 3 , 37.3 mol% B 2 O 3 , 26.25 mol% ZnO, 8.1 mol% BaO, 4.0 mol% Al 2 O 3 , 3.6 A glass matrix composition was prepared by mixing in a composition ratio of mol% K 2 O, 1.46 mol% SrO, 5.83 mol% MgO, and 1.46 mol% CaO. As a result, the dielectric constant was 11 to 14, Experimental values of a coefficient of thermal expansion of 85 to 92x10 &lt; -7 &gt;

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

Example  6

12.0 mol% Bi 2 O 3 , 37.3 mol% B 2 O 3 , 0 mol% ZnO, 8.1 mol% BaO, 4.0 mol% Al 2 O 3 , 3.6 mol to prepare a dielectric composition according to the present invention. A glass matrix composition was prepared by mixing the composition ratio of% K 2 O, 5.83 mol% SrO, 5.83 mol% MgO, and 23.33 mol% CaO. As a result, the dielectric constant of the glass matrix composition was 11 to 14 and thermal expansion. The experimental value of the coefficient of 85-92x10 <-7> degreeC and calcination temperature of 520 degreeC or less was obtained.

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

Example  7

To prepare the dielectric composition according to the invention 12.0 mol% Bi 2 O 3 , 37.3 mol% B 2 O 3 , 8.75 mol% ZnO, 8.1 mol% BaO, 4.0 mol% Al 2 O 3 , 3.6 A glass matrix composition was prepared by mixing in a composition ratio of mol% K 2 O, 5.83 mol% SrO, 5.83 mol% MgO, and 23.33 mol% CaO. As a result, the dielectric constant was 11 to 14, Experimental values of a coefficient of thermal expansion of 85 to 92x10 &lt; -7 &gt;

In order to finely adjust the dielectric constant, glass transition temperature (Tg), and thermal expansion coefficient (CTE) of the composition, at least one of TiO 2 , MgO, CaO, and P 2 O 5 may be added at a composition ratio of 0 to 10 mol%. More may be added.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

6 is a schematic block diagram showing a method of manufacturing a plasma display panel according to Embodiment 8 of the present invention.

As shown in FIG. 6, a step 61 of preparing a second substrate having a first electrode, a first substrate having a first dielectric, and a second substrate having a second electrode, a second dielectric, and a partition wall, of 10 to 15 mol% Bi 2 O 3 , 30-40 mol% B 2 O 3 , 0-25 mol% ZnO, 2-8 mol% Al 2 O 3 , 10-15 mol% BaO, 0-5 mol% K 2 O, 1- Preparing a paste by mixing a dielectric composition having a composition ratio of 20 mol% SrO, 1-15 mol% MgO, and 1-20 mol% CaO with a vehicle (62), and applying the paste on a substrate (63). And firing the paste to form at least one of the first, second dielectrics or barrier ribs.

Here, in order to fine-tune the dielectric constant, glass transition temperature (Tg) and thermal expansion coefficient (CTE) of the composition, TiO 2 , MgO, CaO, P 2 O 5 At least one or more of these may be further added at a composition ratio of 0 to 10 mol%.

In addition, in order to suppress coloring of the composition and electrode reactivity, at least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO is further added in a composition ratio of 0 to 0.5 mol%, or CeO 2 , Er 2 At least one or more of O 3 , Nd 2 O 3 , and Pr 2 O 3 may be further added at a composition ratio of 0 to 10 mol%.

Here, in the step 62 of preparing the paste, first, the dielectric composition (glass) mixed at the above composition ratio is melted at a high temperature, and then immersed in water at room temperature or quenched dry using twin rolls and then pulverized with a grinder. If necessary, by mixing with a filler (dryer) and dried, a mother glass powder can be produced.

Next, 70 to 90 wt% of the parent glass powder prepared as described above and 10 to 30 wt% of vehicle are mixed. In this case, the vehicle may be mixed with 0 to 15 wt% binder, 0 to 80 wt% solvent, 0 to 5 wt% dispersant and the like to assist in mixing or printing the powders. At this time, the solvent may be used alcohol, glycol, propylene glycol ether, propylene glycol acetate, ketone, BCA, Xylene, Terpineol, Texanol, water, etc., the dispersant Acryl system having a large dispersing effect The dispersant is mainly used.

The step 63 of applying the paste onto the substrate is applied to the entire surface of the layer capable of forming any one of the first, second dielectrics or barrier ribs by at least one of screen printing, dispensing, and inkjet printing.

Next, the prepared paste is applied to the entire surface of the layer capable of forming at least one of the first and second dielectrics or barrier ribs and baked at a temperature of 520 ° C. or lower, thereby selecting any one of the first and second dielectrics or barrier ribs. To form.

In addition, the dielectric composition described in the above-described embodiments can be widely applied to not only the first and second dielectrics and partition walls of the plasma display panel but also to the sealing portion (the actual material) for bonding the first and second substrates.

The above embodiment is an example for explaining the technical idea of the present invention in detail, and the present invention is not limited to the above embodiment, various modifications and combinations are possible, and various embodiments of the technical idea are all present invention Naturally, it belongs to the protection scope of.

As described above, the dielectric composition for plasma display panel according to the embodiment of the present invention, the plasma display panel using the same, and a method of manufacturing the same may be manufactured by coating a low-temperature plastic dielectric composition on a low cost soda-lime glass substrate. Therefore, the price competitiveness of the plasma display panel can be improved as a whole, and since Pb is not used, it is also free from environmental regulations.

In addition, the present invention has the effect of not increasing the coefficient of thermal expansion compared to the lower glass transition temperature, it is possible to provide a high transmittance plasma display panel, it is possible to improve the overall price competitiveness of the plasma display panel. .

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the embodiments, but should be defined by the claims.

Claims (14)

10-15 mol% Bi 2 O 3 ; 30-40 mol% B 2 O 3 ; 0-25 mol% ZnO; 2 to 8 mol% Al 2 O 3 ; 10-15 mol% BaO; 0-5 mol% K 2 O; 1-20 mol% SrO; 1-15 mol% MgO; And A dielectric composition for a plasma display panel having a composition ratio of 1 to 20 mol% CaO. The method of claim 1, wherein the dielectric composition, TiO 2 , MgO, CaO, P 2 O 5 to fine tune the dielectric constant, glass transition temperature (Tg) and coefficient of thermal expansion (CTE) of the composition At least one of the dielectric composition for a plasma display panel characterized in that it has a composition ratio further contained in 0 to 10mol%. The method of claim 1, wherein the dielectric composition, In order to suppress coloring of the composition and electrode reactivity, at least any one of CoO, CuO, Cr 2 O 3 , MnO, FeO, and NiO has a composition ratio further comprising 0 to 0.5 mol%. Dielectric composition. The method of claim 1, wherein the dielectric composition, In order to suppress coloring of the composition and electrode reactivity, at least one of CeO 2 , Er 2 O 3 , Nd 2 O 3 , and Pr 2 O 3 has a composition ratio further comprising 0 to 10 mol%. Dielectric composition for panel. A first substrate having a first electrode, a first dielectric, and a protective film; A second substrate having a second electrode, a second dielectric, a phosphor, and a partition wall; The first and second dielectrics or partitions include 10-15 mol% Bi 2 O 3 , 30-40 mol% B 2 O 3 , 0-25 mol% ZnO, 2-8 mol% Al 2 O 3 , 10-15 mol% A plasma display panel having a composition ratio comprised of BaO, 0-5 mol% K 2 O, 1-20 mol% SrO, 1-15 mol% MgO, and 1-20 mol% CaO. The method of claim 5, wherein the first and second dielectrics or partitions, TiO 2 , MgO, CaO, P 2 O 5 At least one of the plasma display panel, characterized in that having a composition ratio further contained in 0 to 10mol%. The method of claim 5, wherein the first and second dielectrics or partitions, At least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, NiO has a composition ratio further comprises 0 to 0.5 mol%. The method of claim 5, wherein the first and second dielectrics or partitions, At least one of CeO 2 , Er 2 O 3 , Nd 2 O 3 , and Pr 2 O 3 has a composition ratio further comprising 0 to 10 mol%. Preparing a first substrate having a first electrode, a first dielectric, and a second substrate having a second electrode, a second dielectric, and a partition wall; 10-15 mol% Bi 2 O 3 , 30-40 mol% B 2 O 3 , 0-25 mol% ZnO, 2-8 mol% Al 2 O 3 , 10-15 mol% BaO, 0-5 mol% K 2 O, a mixture of dielectric composition to the vehicle contained in the CaO SrO, MgO and the 1~20mol% of 1~15mol% 1~20mol% to prepare a paste; Applying the paste onto a substrate; And Baking the paste to form at least one of the first, second dielectrics, and barrier ribs. The method of claim 9, wherein the dielectric composition, TiO 2 , MgO, CaO, P 2 O 5 At least any one of the plasma display panel manufacturing method characterized in that it has a composition ratio further contained in 0 to 10mol%. The method of claim 9, wherein the dielectric composition, At least one of CoO, CuO, Cr 2 O 3 , MnO, FeO, NiO has a composition ratio further comprising 0 to 0.5 mol%. The method of claim 9, wherein the dielectric composition, At least one of CeO 2 , Er 2 O 3 , Nd 2 O 3 , and Pr 2 O 3 has a composition ratio further comprised of 0 to 10 mol%. The method of claim 9, wherein the paste, A method of manufacturing a plasma display panel, comprising a composition ratio comprising a dielectric composition of 70 to 90 wt% powder and a vehicle of 10 to 30 wt% The method of claim 9, wherein the application of the paste, A method of manufacturing a plasma display panel using at least one of screen printing, dispensing, and inkjet printing.
KR1020070020909A 2007-03-02 2007-03-02 Dielectric composition for plasma display panel and plasma display panel using the same, manufacturing method thereof KR20080080769A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101952930A (en) * 2009-03-13 2011-01-19 松下电器产业株式会社 Plasma display panel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101952930A (en) * 2009-03-13 2011-01-19 松下电器产业株式会社 Plasma display panel
US8362680B2 (en) 2009-03-13 2013-01-29 Panasonic Corporation Plasma display panel having low residual stress

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