KR20080053730A - Manufacturing method of common electrode panel and display device includindg thesame - Google Patents

Abstract

A method for manufacturing a common electrode display panel and a display device having the same are provided to reduce manufacturing cost by using an identical mask in forming color filters, without the necessity of using different masks according to types of color filters. A light blocking member(220) is formed on an insulating substrate. On the insulating substrate, spacers(222) for the first through third light holes are formed. Color filters(230R,230G,230B), which respectively are thinner than the spacers, are formed on the insulating substrate. An overcoat(250) is formed on the color filters, and a common electrode(270) is formed on the overcoat.

Description

The manufacturing method of a common electrode display panel, and the display apparatus including the same {MANUFACTURING METHOD OF COMMON ELECTRODE PANEL AND DISPLAY DEVICE INCLUDINDG THESAME}

1 is a layout view of a transflective liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 2 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along the line II-II. FIG.

3 to 6 are cross-sectional views illustrating a method of manufacturing a common electrode display panel according to an exemplary embodiment of the present invention, in the order of their processes.

The present invention relates to a common electrode display panel and a display device including the same.

Liquid crystal display (LCD) is one of the most widely used flat panel display devices. Currently, two display panels are provided with a field generating electrode and a polarizer and the liquid crystal contained therebetween. Layer.

Among the liquid crystal display devices, one of the two display panels currently used includes a plurality of pixel electrodes, which are a kind of field generating electrodes, and a thin film transistor (TFT) for switching a voltage applied to the pixel electrodes. The other is a liquid crystal display provided with a common electrode and a color filter, which are different types of field generating electrodes.

Since the liquid crystal display is a light-receiving display device that does not emit light by itself, the light emitted from a backlight lamp provided at the rear of the liquid crystal display passes through the liquid crystal layer or receives light from outside such as natural light. The image is displayed by passing the liquid crystal layer and then reflecting the liquid crystal layer. The former case is called a transmission liquid crystal display device, and the latter case is called a reflective liquid crystal display device.

Recently, transflective or transflective liquid crystal display devices, which use backlights or use external light depending on the environment, have been developed and mainly used in small and medium sized display devices.

The color filter of the transflective liquid crystal display includes a light hole for compensating for the difference in luminance between reflected light and transmitted light.

However, in order to form a color filter including light holes, a mask having a different pattern may be used according to the type of the color filter.

Therefore, there is a problem that the process is complicated and expensive due to the process of manufacturing the masks respectively.

Accordingly, the technical problem to be achieved by the present invention is to reduce the production cost while simplifying the process of forming a color filter including light holes.

In order to achieve the above technical problem, a method of manufacturing a common electrode display panel according to the present invention includes the steps of forming a light blocking member on a substrate, forming a spacer for first to third light holes on the substrate, and first to third on the substrate. Forming a color filter having a thickness lower than that of the light hole spacer, forming an overcoat on the color filter, and forming a common electrode on the overcoat.

The planar pattern of the first to third light hole spacers may be formed in a circular or polygonal shape.

The area of the first to third light hole spacers may be formed in the order of the first light hole spacers> the second light hole spacers and the third light hole spacers.

The first to third light hole spacers may be formed of a photocurable transparent material.

The overcoat may be formed of a thermosetting transparent material.

According to another aspect of the present invention, a display panel includes a first substrate, a light blocking member formed on a first substrate, a spacer for first to third light holes formed on a first substrate, and a first substrate. And a color filter having a thickness lower than that of the first to third light hole spacers, an overcoat formed on the color filter, and a common electrode formed on the overcoat.

The planar pattern of the first to third light hole spacers may be circular or polygonal.

The area of the first to third light hole spacers may be in the order of the first light hole spacers> the second light hole spacers and the third light hole spacers.

The spacer for the first to third light holes may be a photocurable transparent material.

The overcoat may be a thermosetting transparent material.

A second substrate facing the first substrate, a gate line formed on the second substrate, a data line crossing the gate line, a thin film transistor connected to the gate line and the data line, and a pixel electrode connected to the thin film transistor; The pixel electrode may include a transparent electrode and a reflective electrode formed on a predetermined region of the transparent electrode.

The spacer for the light hole may correspond to the reflective electrode.

The color filter may include a first portion surrounding the light aperture spacer and a second portion formed on the light aperture spacer, and the first portion and the second portion may be separated.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. When a part of a layer, film, area, plate, etc. is over another part, this includes not only the part directly above the other part but also another part in the middle. On the contrary, when a part is just above another part, it means that there is no other part in the middle.

Hereinafter, a method of manufacturing a color filter display panel according to an exemplary embodiment of the present invention will be described with reference to the accompanying drawings.

First, the structure of a liquid crystal display according to an exemplary embodiment of the present invention will be described in detail with reference to FIGS. 1 and 2.

1 is a layout view of a transflective liquid crystal display according to an exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along the line II-II.

The liquid crystal display according to the present exemplary embodiment includes a thin film transistor array panel 100 and a common electrode panel 200 facing each other, and a liquid crystal layer 3 interposed between the two display panels 100 and 200.

First, the thin film transistor array panel 100 will be described.

A plurality of gate lines 121 and storage electrode lines 131 are formed on an insulating substrate 110 made of transparent glass or plastic.

The gate line 121 transmits a gate signal and mainly extends in a horizontal direction. Each gate line 121 includes a plurality of gate electrodes 124 protruding upward and end portions 129 having a large area for connection with another layer or an external driving circuit. A gate driving circuit (not shown) for generating a gate signal may be mounted on a flexible printed circuit film (not shown) attached to the substrate 110 or directly mounted on the substrate 110, It may be integrated into the substrate 110. When the gate driving circuit is integrated on the substrate 110, the gate line 121 may extend to be directly connected to the gate driving circuit.

The storage electrode line 131 receives a predetermined voltage and almost extends in parallel with the gate line 121. Each storage electrode line 131 is positioned between two adjacent gate lines 121 and is close to a lower side of the two gate lines 121. The storage electrode line 131 includes an extension 133 extending up and down. However, the shape and arrangement of the storage electrode line 131 may be modified in various ways.

The gate line 121 and the storage electrode line 131 may be formed of aluminum-based metals such as aluminum (Al) and aluminum alloys, silver-based metals such as silver (Ag) and silver alloys, and gold such as gold (Au) and gold alloys. It is preferably made of a series metal, a copper-based metal such as copper (Cu) and a copper alloy, a molybdenum-based metal such as molybdenum (Mo) and a molybdenum alloy, chromium (Cr), titanium (Ti), tantalum (Ta), and the like. Do. However, the gate line 121 and the storage electrode line 131 may have a multilayer structure including two conductive layers (not shown) having different physical properties. One of these conductive films is made of low resistivity metal to reduce signal delay or voltage drop. In contrast, the other conductive film is made of a material having excellent physical, chemical, and electrical contact properties with other materials, particularly indium tin oxide (ITO) and indium zinc oxide (IZO). However, the gate line 121 and the storage electrode line 131 may be made of various metals and conductors.

Side surfaces of the gate line 121 and the storage electrode line 131 are inclined with respect to the surface of the substrate 110, and the inclination angle is preferably about 30 ° to 80 °.

A gate insulating layer 140 made of silicon nitride (SiN _x ) or silicon oxide (SiO ₂ ) is formed on the gate line 121 and the storage electrode line 131.

On the gate insulating layer 140, a plurality of linear semiconductors 151 made of hydrogenated amorphous silicon (amorphous silicon is abbreviated 'a-Si'), polycrystalline silicon, or the like are formed. The linear semiconductor 151 mainly extends in the longitudinal direction and includes a plurality of projections 154 extending toward the gate electrode 124. The linear semiconductor 151 has a wider width in the vicinity of the gate line 121 and the storage electrode line 131 and covers them widely.

A plurality of linear and island ohmic contacts 161 and 165 are formed on the semiconductors 151 and 154. The ohmic contacts 161 and 165 are n + hydrogenated amorphous silicon in which n-type impurities such as phosphorus (P) are heavily doped, or p + hydrogenated amorphous silicon or silicide in which p-type impurities such as boron (B) are heavily doped. (silicide) can be made. The linear ohmic contact 161 has a plurality of protrusions 163, and the protrusion 163 and the island-type ohmic contact 165 are paired and disposed on the protrusion 154 of the semiconductor 151.

Side surfaces of the semiconductor 151 and the ohmic contacts 161 and 165 are also inclined with respect to the surface of the substrate 110 and the inclination angle is about 30 to 80 degrees.

A plurality of data lines 171 and a plurality of drain electrodes 175 are formed on the ohmic contacts 161 and 165 and the gate insulating layer 140.

The data line 171 transmits a data signal and mainly extends in the vertical direction to cross the gate line 121 and the storage electrode line 131. Each data line 171 includes a plurality of source electrodes 173 extending toward the gate electrode 124 and an end portion 179 having a large area for connection with another layer or an external driving circuit. A data driving circuit (not shown) for generating a data signal is mounted on a flexible printed circuit film (not shown) attached to the substrate 110, directly mounted on the substrate 110, or integrated in the substrate 110. Can be. When the data driving circuit is integrated on the substrate 110, the data line 171 may be extended to be directly connected to the data driving circuit.

The drain electrode 175 is separated from the data line 171 and faces the source electrode 173 with respect to the gate electrode 124. Each drain electrode 175 has a wider area 177 and the other end portion having a rod shape. The extension 177 of the drain electrode 175 overlaps the extension 133 of the storage electrode line 131, and the rod-shaped end portion is partially surrounded by the source electrode 173 bent in a J shape.

One gate electrode 124, one source electrode 173, and one drain electrode 175 together with the protrusion 154 of the semiconductor 151 form one thin film transistor (TFT). A channel of the transistor is formed in the protrusion 154 between the source electrode 173 and the drain electrode 175.

The data line 171 and the drain electrode 175 are preferably made of a refractory metal such as molybdenum, chromium, tantalum, and titanium, or an alloy thereof, and include a refractory metal film (not shown) and a low resistance conductive film. It may have a multilayer structure including (not shown). Examples of the multilayer structure include a double layer of chromium or molybdenum (alloy) lower layer and an aluminum (alloy) upper layer, and a triple layer of molybdenum (alloy) lower layer and aluminum (alloy) interlayer and molybdenum (alloy) upper layer. However, the data line 171 and the drain electrode 175 may be made of various metals or conductors.

The side of the data line 171 and the drain electrode 175 may also be inclined at an inclination angle of about 30 ° to about 80 ° with respect to the surface of the substrate 110.

The ohmic contacts 161 and 165 exist only between the semiconductor 151 below and the data line 171 and the drain electrode 175 thereon, and lower the contact resistance therebetween. In most places, the width of the linear semiconductor 151 is smaller than the width of the data line 171. However, as described above, the width of the linear semiconductor 151 is widened at the portion where it meets the gate line 121 to smooth the profile of the surface. Prevents disconnection. The semiconductor 151 has an exposed portion between the source electrode 173 and the drain electrode 175, and not covered by the data line 171 and the drain electrode 175.

A passivation layer 180 is formed on the data line 171, the drain electrode 175, and the exposed semiconductor 151.

The passivation layer 180 includes a lower layer 180p made of an inorganic insulator such as silicon nitride or silicon oxide and an upper layer 180q made of an organic insulator. The upper passivation layer 180q preferably has a dielectric constant of 4.0 or less, may have photosensitivity, and irregularities are formed on a surface thereof. In addition, an opening that exposes a portion of the lower passivation layer 180p is formed in the upper passivation layer 180q. However, the passivation layer 180 may have a single layer structure made of an inorganic insulator or an organic insulator.

In the passivation layer 180, a plurality of contact holes 182 and 185 exposing the end portion 179 and the drain electrode 175 of the data line 171 are formed, respectively, and the passivation layer 180 and the gate insulating layer are formed. A plurality of contact holes 181 exposing the end portion 129 of the gate line 121 are formed at 140.

A plurality of pixel electrodes 191 and a plurality of contact assistants 81 and 82 are formed on the passivation layer 180.

Each pixel electrode 191 is curved along the unevenness of the upper passivation layer 180q, and includes a transparent electrode 192 and a reflective electrode 194 thereon. The transparent electrode 192 is made of a transparent conductive material such as ITO or IZO, and the reflective electrode 194 is made of a reflective metal such as aluminum, silver, chromium or an alloy thereof. However, the reflective electrode 194 has a low-resistance reflective upper film (not shown) such as aluminum, silver, or an alloy thereof, and a lower film (not shown) having good contact properties with ITO or IZO such as molybdenum-based metal, chromium, tantalum, and titanium. It may have a double membrane structure.

The reflective electrode 194 is positioned in the opening of the upper passivation layer 180q and has a transmission window 195 exposing the transparent electrode 192. The reflective electrode 194 exists only on a portion of the transparent electrode 192 to expose another portion of the transparent electrode 192, and the exposed portion of the transparent electrode 192 is positioned in the opening of the upper passivation layer 180q.

The pixel electrode 191 is physically and electrically connected to the drain electrode 175 through the contact hole 185 and receives a data voltage from the drain electrode 175. The pixel electrode 191 to which the data voltage is applied is formed between the two electrodes 191 and 270 by generating an electric field together with the common electrode 270 of the common electrode display panel 200 to which the common voltage is applied. The direction of the liquid crystal molecules of the liquid crystal layer 3 is determined. The polarization of light passing through the liquid crystal layer 3 varies according to the direction of the liquid crystal molecules determined as described above. The pixel electrode 191 and the common electrode 270 form a capacitor (hereinafter, referred to as a "liquid crystal capacitor") to maintain an applied voltage even after the thin film transistor is turned off.

The transflective liquid crystal display device including the thin film transistor array panel 100, the common electrode display panel 200, the liquid crystal layer 3, and the like is a transmissive area TA defined by the transparent electrode 192 and the reflective electrode 194, respectively. And a reflection area RA. Specifically, the portion located below the transmission window 195 becomes the transmission area TA, and the portion located below the reflection electrode 194 becomes the reflection area RA.

In the transmissive area TA, light is incident on the back side of the liquid crystal display, that is, the thin film transistor array panel 100, passes through the liquid crystal layer 3 and exits the front side, that is, toward the common electrode display panel 200. In the reflective area RA, the light enters the liquid crystal layer 3, enters the liquid crystal layer 3, is reflected by the reflective electrode 194, passes through the liquid crystal layer 3, and exits to the front surface. At this time, the bending of the reflective electrode 194 induces diffuse reflection of light to prevent the object from being reflected on the screen.

Since there is no upper passivation layer 180q in the transmission area TA, the thickness of the liquid crystal layer 3 or the cell gap in the transmission area TA is greater than the cell gap in the reflection area RA. In particular, it is preferable that the cell spacing in the transmission area TA is twice the cell spacing in the reflection area RA.

The pixel electrode 191 and the drain electrode 175 extended part 177 connected thereto overlap the storage electrode line 131 including the storage electrode 133. A capacitor formed by the pixel electrode 191 and the drain electrode 175 electrically connected to the pixel electrode 191 overlapping the storage electrode line 131 is called a storage capacitor, and the storage capacitor enhances the voltage holding capability of the liquid crystal capacitor.

The contact auxiliary members 81 and 82 are connected to the end portion 129 of the gate line 121 and the end portion 179 of the data line 171 through the contact holes 181 and 182, respectively. The contact auxiliary members 81 and 82 compensate for and protect the adhesion between the end portion 129 of the gate line 121 and the end portion 179 of the data line 171 and the external device.

Next, the common electrode display panel 200 will be described.

A light blocking member 220 is formed on an insulating substrate 210 made of transparent glass, plastic, or the like. The light blocking member 220 is also referred to as a black matrix and defines a plurality of opening regions facing the pixel electrode 191 while preventing light leakage between the pixel electrodes 191.

The light hole spacer 222 is formed on the substrate 210. The light hole spacer 222 is located in an opening area surrounded by the light blocking member 220. The light hole spacer 222 is a photocurable material and passes external light.

A plurality of color filters 230R, 230G, and 230B are also formed on the substrate 210 and are arranged so as to almost fit into the opening region surrounded by the light blocking member 220. The color filters 230R, 230G, and 230B are separated from the first portion 230R1 and the first portion 230R1 surrounding the light hole spacer 222 and are formed on the light hole spacer 222. Second portion 230R2. Here, the color filters 230R, 230G, and 230B are lower in thickness than the light hole spacer 222, and the light hole spacer 222 protrudes above the color filter. The color filters 230R, 230G, and 230B may extend in the vertical direction along the pixel electrode 191 to form a stripe. Each color filter 230 may display one of primary colors such as three primary colors of red, green, and blue.

The area of the light hole spacer 222 varies depending on the visibility of the color filters 230R, 230G, and 230B. The area of the spacer 222 may be changed in the order of blue> red> green. The planar pattern of the light hole spacer 222 may be formed in a circular or polygonal shape. For example, the blue color filter is circular, the red color filter is one rectangle, and the green color filter is two rectangles, depending on the area. May be formed (see FIG. 3).

An overcoat 250 is formed on the color filters 230R, 230G, 230B, the light hole spacer 222, and the light blocking member 220. The overcoat 250 may be made of a thermosetting (organic) insulator, protects the color filters 230R, 230G, and 230B, prevents the color filter 230 from being exposed, and provides a flat surface.

The common electrode 270 is formed on the overcoat 250. The common electrode 270 is preferably made of a transparent conductive conductor such as ITO or IZO.

Alignment layers 11 and 21 are disposed on the inner surfaces of the display panels 100 and 200, and at least one polarizer is disposed on the outer surfaces of the display panels 100 and 200. (Not shown) is provided.

The liquid crystal layer 3 is vertically or horizontally aligned.

The liquid crystal display further includes a plurality of elastic spacers (not shown) that hold the thin film transistor array panel 100 and the common electrode panel 200 to form a gap therebetween.

The liquid crystal display may further include a sealant (not shown) for coupling the thin film transistor array panel 100 and the common electrode panel 200. The sealing material is positioned at the edge of the common electrode display panel 200.

In the transmission area TA, since the pixel electrode 191 is formed of only the transparent electrode 192, light may be transmitted. Therefore, in the transmission area TA, an image is mainly displayed by using light from a lamp (not shown) of the backlight device. That is, light emitted from the lamp passes through the liquid crystal layer 300 and the color filter 230 once to display an image.

On the other hand, in the reflective region RA, since the pixel electrode 191 includes the opaque reflective electrode 194, light emitted from the lamp of the backlight device is reflected by the reflective electrode 194 and thus does not enter the liquid crystal layer 300, but color Since the light incident from the filter display panel 200 is reflected by the reflective electrode 194 and exits again, the image is mainly displayed using external light incident through the light hole gap member 222.

Next, a method of manufacturing the common electrode display panel illustrated in FIGS. 1 and 2 will be described with reference to FIGS. 3 to 6.

3 to 6 are cross-sectional views illustrating a method of manufacturing a common electrode display panel according to an exemplary embodiment of the present invention, in the order of their processes.

As illustrated in FIG. 3, a material having excellent light blocking properties, such as chromium, is deposited on the insulating substrate 210, and the light blocking member 220 is formed by a photolithography process.

The photocurable transparent material is coated on the substrate and then patterned by a photo process to form the spacer 222 for the light hole.

Next, as shown in FIG. 4, the photosensitive resin including the pigment is coated on the substrate 210 by a spin coating method or the like. Then, the photosensitive resin is exposed and developed, and then hard baked to form a blue color filter 230B. The color filter 230B is formed to have a thickness lower than that of the light hole spacer 222. This is to prevent the light hole spacer 222 from being completely covered by forming the color filter 230B to be cut by using the step between the color filter 230B and the light hole spacer 222.

Next, as shown in FIG. 5, the process of FIG. 4 is repeated to form green 230G and red 230R color filters. The order of forming the color filters of blue, green and red may be changed. The red, blue, and green color filters 230R, 230G, and 230B may be formed using the same mask even though the forming order is different. Therefore, the cost for manufacturing the mask can be reduced as compared with using a different mask according to the shape of the light hole in the related art.

Next, as shown in FIG. 6, an overcoat 250 is formed by applying a transparent insulator and thermally curing the same. The common electrode 270 is formed by depositing ITO, IZO, or the like on the overcoat 250 by sputtering.

As described above, according to the present invention, a color filter may be formed, and each color filter may be formed using the same mask, thereby reducing manufacturing costs.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

Claims (13)

Forming a light blocking member on the substrate, Forming a spacer for first to third light holes on the substrate; Forming a color filter having a thickness lower than that of the first to third light hole spacers on the substrate; Forming an overcoat on the color filter, and Forming a common electrode on the overcoat Method of manufacturing a common electrode display panel comprising a. In claim 1, And forming a planar pattern of the first to third light hole spacers in a circular or polygonal shape. In claim 2, The area of the first to third light hole spacers is formed in the order of the first light hole spacers> the second light hole spacers> the third light hole spacers. Method of manufacturing a common electrode display panel. In claim 1, The first to third light hole spacers are formed of a photocurable transparent material. In claim 1, The overcoat is formed of a thermosetting transparent material. First substrate, A light blocking member formed on the first substrate, First to third light hole spacers formed on the first substrate, A color filter formed on the first substrate and having a thickness lower than that of the first to third light hole spacers; An overcoat formed on the color filter, and Common electrode formed on the overcoat Display device comprising a. In claim 6, The flat pattern of the first to third light hole spacers is circular or polygonal. In claim 7, And an area of the first to third light hole spacers in order of first light hole spacers> second light hole spacers to third light hole spacers. In claim 6, The first to third light hole spacers are photocurable transparent materials. In claim 6, The overcoat is a thermosetting transparent material. In claim 6, A second substrate facing the first substrate, A gate line formed on the second substrate, A data line intersecting the gate line, A thin film transistor connected to the gate line and the data line, and Further comprising a pixel electrode connected to the thin film transistor, The pixel electrode includes a transparent electrode and a reflective electrode formed on a predetermined region of the transparent electrode. In claim 11, And the light hole spacer corresponds to the reflective electrode. In claim 6, The color filter includes a first portion surrounding the light hole spacer and a second portion formed on the light hole spacer, And the first portion and the second portion are separated.

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