KR20080038575A - Photosensitive paste composition, electrode for plasma display panel prepared therefrom, and plasma display panel comprising the same - Google Patents

Abstract

A photosensitive paste composition for an electrode of a plasma display panel is provided to reduce heat generated during the driving of a plasma display panel. A photosensitive paste composition comprises conductive powder, glass frit and an organic vehicle, wherein the glass frit comprises at least one selected from the group consisting of Bi2O3-B2O3-based glass frit, Bi2O3-B2O3-ZnO-based glass frit, P2O5-SnO-ZnO-based glass frit and B2O3-SnO-BaO-based glass frit, and is used in an amount of 5-10 wt% based on the total weight of the composition. The conductive powder includes Ag powder.

Description

Photosensitive paste composition, a plasma display panel electrode manufactured using the same, and a plasma display panel comprising the same {Photosensitive paste composition, electrode for plasma display panel prepared therefrom, and plasma display panel comprising the same}

1 is a schematic exploded perspective view showing a plasma display panel including an electrode according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along the line II-II of FIG. 1.

<Description of the symbols for the main parts of the drawings>

100: plasma display panel 110: first substrate

111: first discharge electrode 112: second discharge electrode

113: bus electrode 114: first dielectric layer

115: protective layer 120: second substrate

121: address electrode 122: second dielectric layer

130: partition 140: phosphor layer

150: discharge cell

The present invention relates to a photosensitive paste composition, a plasma display panel electrode manufactured using the same, and a plasma display panel including the same, and more particularly, when used as a plasma display panel electrode, a photosensitive paste composition capable of lowering a panel temperature. The present invention relates to a plasma display panel electrode manufactured using the same and a plasma display panel including the same.

In recent years, in the display devices, as the demand for larger size, higher density, higher precision, and higher reliability increases, various pattern processing techniques have been developed, and for forming various fine electrodes suitable for such various pattern processing techniques, There is an active research on the composition.

Plasma display panels are used in various fields because they are faster in response and larger in size than liquid crystal panels. Conventionally, as a method of forming an electrode on such a plasma display panel, the patterning method of the electrode material using the screen printing method has been generally used. However, the conventional screen printing method requires a high level of skill, and it is difficult to obtain a high-precision large screen pattern required for the plasma display panel using the screen printing method because the precision of the screen is inferior. In addition, the conventional screen printing method may cause short circuit or disconnection due to the screen during printing, and there is a limitation in that the resolution is limited to form a fine pattern.

Therefore, in recent years, a photolithography method using a photosensitive conductive paste has been developed to form a high precision electrode circuit suitable for a large area. This is performed by printing the photosensitive conductive paste on the entire surface of a glass substrate or the like, then subjecting it to a predetermined drying process, exposing it using an ultraviolet exposure apparatus with a photomask, and then shielding the uncured portion of the photomask with a predetermined developer solution. And a patterned electrode are formed by baking the cured layer that is cured and then cured to a predetermined temperature.

On the other hand, in the conventional photosensitive conductive paste used in the photolithography method, materials such as PbO-SiO ₂ based on PbO and PbO-B ₂ O ₃ -SiO ₂ based have been used.

However, in the plasma display panel including the electrode made of the conventional photosensitive conductive paste, a large amount of heat is generated in the panel itself or a TCP (tape carrier package), which is a signal transmission means included in the panel, when such a large amount of heat is generated. When this occurs, not only the durability of the plasma display panel is deteriorated, but also heat is applied to the circuit elements, thereby degrading the performance of the circuit elements and reducing the overall discharge efficiency.

Therefore, there is a need for developing an electrode paste composition capable of minimizing heat generated when the plasma display panel is driven.

It is a main object of the present invention to provide a photosensitive paste composition for an electrode which can reduce heat generated when driving a plasma display panel, a plasma display panel electrode manufactured using the same, and a plasma display panel including the same.

The present invention provides a photosensitive paste composition comprising a conductive powder, glass frit and an organic vehicle, wherein the glass frit is Bi ₂ O ₃ -B ₂ O ₃ based, Bi ₂ O ₃ -B ₂ O ₃ -ZnO System, P ₂ O ₅ -SnO-ZnO-based and B ₂ O ₃ -SnO-BaO-based at least one selected from the group having a content of 5% to 10% by weight based on the photosensitive paste composition The photosensitive paste composition is disclosed.

Here, the conductive powder may be Ag powder.

Here, the specific surface area of the Ag powder may be 0.3 m ² / g to 2.0 m ² / g, and the average particle diameter may be 0.1 μm to 5.0 μm.

Here, the average particle diameter of the glass frit may be 5.0 μm or less.

Here, the organic vehicle may include a binder, a crosslinking agent, a photoinitiator and a solvent.

Here, the binder may include a copolymer of a monomer having a carboxyl group and at least one ethylenically unsaturated monomer.

Here, the monomer having a carboxyl group may include at least one selected from the group consisting of acrylic acid, methacrylic acid, fumaric acid, maleic acid, vinyl acetate, and anhydrides thereof.

Here, the ethylenically unsaturated monomer, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate It may include at least one selected from the group consisting of, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, ethylene glycol monomethyl ether acrylate and ethylene glycol monomethyl ether methacrylate.

Herein, the binder is one selected from the group consisting of glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate and 3,4-epoxycyclohexylmethyl acrylate and the carboxyl group of the copolymer. It may further comprise a crosslinkable group formed by the reaction.

Here, the molecular weight of the copolymer is 5,000g / mol to 50,000g / mol, the acid value may be 20mgKOH / g to 100mgKOH / g.

Here, the crosslinking agent may include at least one selected from the group consisting of diacrylate-based, triacrylate-based, tetraacrylate-based and hexaacrylate-based.

Wherein the photoinitiator is benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,2-diethoxyacetophenone, 2, 2-dimethoxy-2-phenyl-2-phenylacetophenone, 2-methyl- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1 -(4-morpholinophenyl) -1-butanone, bis (2,6-dimethoxybenzoyl) -2, 4,4-trimethylpentylphosphineoxide and bis (2,4,6-trimethylbenzoyl) phenyl It may include at least one selected from the group consisting of phosphine oxide.

Here, the solvent is ethyl carbitol, butyl carbitol, ethyl carbitol acetate, butyl carbitol acetate, texanol, terpin oil, dipropylene glycol methyl ether, dipropylene glycol ethyl ether, dipropylene glycol monomethyl ether acetate, γ At least one selected from the group consisting of butyrolactone, cellosolve acetate, butyl cellosolve acetate and tripropylene glycol.

Here, the organic vehicle may further include at least one selected from the group consisting of cellulose, hydroxymethyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, carboxyethyl cellulose and carboxyethyl methyl cellulose.

Here, the organic vehicle may further include at least one additive selected from the group consisting of a sensitizer, a polymerization inhibitor, an antioxidant, an ultraviolet light absorber, an antifoaming agent, a dispersant, a leveling agent, and a plasticizer.

Here, the plasma display panel electrode may be manufactured using the photosensitive paste composition as described above.

Here, the plasma display panel may include the plasma display panel electrode as described above.

Hereinafter, the present invention will be described in more detail.

The photosensitive paste composition according to the present invention comprises a conductive powder, glass frit and an organic vehicle.

As the conductive powder, silver (Ag) powder, gold, copper, platinum, palladium, aluminum or alloy powder thereof may be used.

Although the particle shape of the said electroconductive powder does not have a restriction | limiting in particular, If it is spherical in shape of the particle | grains of the said electroconductive powder, since it has a characteristic superior to plate form or amorphous in filling rate and ultraviolet transmittance, it is preferable to form in spherical form.

Hereinafter, the case where silver powder is used as electroconductive powder is demonstrated to an example.

It is preferable that the surface area of the said silver (Ag) powder is 0.3 m <^2> / g-2.0 m <^2> / g, and average particle diameter is 0.1 micrometer-5.0 micrometers. Here, when the surface area of the silver powder is less than 0.3 m ² / g or the average particle diameter is larger than 5.0 μm, the straightness of the pattern of the fired layer is poor, and the resistance of the fired layer is increased. If the surface area exceeds 2.0 m ² / g or the average particle diameter is less than 0.1 μm, the dispersibility and the exposure sensitivity of the paste are poor, which is not preferable.

Here, the content of the silver powder, it is preferable to have a content of 60% by weight to 80% by weight based on the photosensitive paste composition. Here, when the content of the silver powder is less than 60% by weight based on the photosensitive paste composition, the line width shrinkage of the conductive layer may be severe during firing and disconnection may occur. In addition, when the content of the silver powder is greater than 80% by weight relative to the photosensitive paste composition, a desired pattern cannot be obtained due to insufficient crosslinking reaction due to poor printability and lowering of light transmission.

As the glass frit, a Bi ₂ O ₃ -B ₂ O ₃ system, a Bi ₂ O ₃ -B ₂ O ₃ -ZnO system, a P ₂ O ₅ -SnO-ZnO system, a B ₂ O ₃ -SnO-BaO system, or the like is used. One or two or more selected may be used in combination.

Although the particle shape of the said glass frit is not specifically limited, It is preferable that it is so spherical that an average particle diameter is 5.0 micrometers or less. Here, when the average particle diameter of the said glass frit exceeds 5.0 micrometers, there exists a problem that a baking layer becomes nonuniform and a straightness worsens, and it is unpreferable.

In addition, the glass frit preferably has a softening temperature of 400 ° C to 600 ° C. If the softening temperature is less than 400 ℃ interferes with the decomposition of organic matter during firing, if the softening temperature exceeds 600 ℃ there is a problem that the softening of the glass frit cannot occur. This is because the glass substrate is bent at a temperature at which the firing temperature exceeds 600 ° C, and therefore the firing temperature cannot be used at 600 ° C or higher.

The glass frit preferably has a content of 5% by weight to 10% by weight based on the photosensitive paste composition. Although details will be described later, when the content of the glass frit is less than 5% by weight with respect to the photosensitive paste composition, the exothermic temperature of the plasma display panel on which the formed electrode is disposed increases, and the content of the glass frit increases the photosensitive paste. If it is greater than 10% by weight with respect to the composition, the electrical resistance of the formed electrode is sharply increased because it adversely affects the discharge.

In addition, the photosensitive paste composition according to the present invention comprises an organic vehicle.

The organic vehicle comprises a binder, a crosslinking agent, a photoinitiator and a solvent.

The binder comprises a copolymer of a monomer having a carboxyl group with one or more ethylenically unsaturated monomers.

The copolymer of the monomer having a carboxyl group and one or more ethylenically unsaturated monomers serves to cause the photosensitive paste composition according to the present invention to develop in an aqueous alkali solution.

The content of the copolymer, it is preferable to have a content of 5% by weight to 10% by weight based on the photosensitive paste composition. Here, when the content of the copolymer is less than 5% by weight based on the photosensitive paste composition, the printability is lowered, and when the content of the copolymer is greater than 10% by weight based on the photosensitive paste composition, poor developability and surroundings of the baked film This is undesirable because it can cause residue to occur.

The monomer having a carboxyl group is preferably selected from the group consisting of acrylic acid, methacrylic acid, fumaric acid, maleic acid, vinyl acetic acid and anhydrides thereof, the ethylenically unsaturated monomer is methyl acrylate, methyl methacrylate, ethyl acrylic Ethyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, ethylene glycol Preference is given to at least one selected from the group consisting of monomethyl ether acrylate and ethylene glycol monomethyl ether methacrylate.

As the binder, a carboxyl group of the copolymer may be reacted with an ethylenically unsaturated compound, and consequently, a component having a crosslinking reaction added thereto may be used. As the ethylenically unsaturated compound, glycidyl methacrylate, 3 Those selected from the group consisting of, 4-epoxycyclohexylmethyl methacrylate and 3,4-epoxycyclohexylmethyl acrylate can be used.

In addition, although the copolymer may be used alone as a binder, cellulose, hydroxymethyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, carboxyethyl cellulose and carboxyethyl methyl cellulose may be used for the purpose of improving membrane leveling or thixotropy. It is also possible to use a mixture of one or more materials selected from the group consisting of.

The molecular weight of the copolymer is preferably 5,000g / mol to 50,000g / mol, the acid value is preferably 20mgKOH / g to 100mgKOH / g. Here, when the molecular weight of the copolymer is less than 5,000 g / mol, the printability of the paste is inferior, when the molecular weight of the copolymer exceeds 50,000 g / mol is not preferable because there is a problem that the non-exposed part is not removed during development. In addition, when the acid value of the copolymer is less than 20mgKOH / g, developability is inferior, when it exceeds 100mgKOH / g is not preferable because there is a problem that is developed to the exposed portion.

Monofunctional and polyfunctional monomers may be used as the crosslinking agent, and generally a polyfunctional monomer having good exposure sensitivity is used. Such polyfunctional monomers include, but are not limited to, diacrylates such as ethylene glycol diacrylate (EGDA); Triacrylates such as trimethylolpropanetriacrylate (TMPTA), trimethylolpropaneethoxylatetriacrylate (TMPEOTA), or pentaerythritol triacrylate; Tetraacrylates such as tetramethylolpropane tetraacrylate or pentaerythritol tetraacrylate; And hexaacrylates such as dipentaerythritol hexaacrylate (DPHA).

The content of the crosslinking agent is preferably 20% by weight to 150% by weight based on the binder. When the content of the crosslinking agent is less than 20% by weight with respect to the binder, the exposure sensitivity is lowered, and thus a fired film line width of a desired size is obtained. It is not preferable to produce a residue in the calcined film when it cannot be obtained and exceeds 150% by weight based on the binder.

Examples of the photoinitiator include, but are not limited to, benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,2-die Methoxyacetophenone, 2,2-dimethoxy-2-phenyl-2-phenylacetophenone, 2-methyl- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl- 2-dimethylamino-1- (4-morpholinophenyl) -1-butanone, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphineoxide and bis (2,4, One or more selected from the group consisting of 6-trimethylbenzoyl) phenylphosphine oxide can be used.

The content of the photoinitiator is preferably 10% by weight to 50% by weight based on the crosslinking agent. When the content of the photoinitiator is less than 10% by weight with respect to the crosslinking agent, the exposure sensitivity of the paste is lowered, and thus, a fired film having a desired size. If the line width cannot be obtained and the content exceeds 50% by weight based on the crosslinking agent, a problem arises in that the line width of the fired film is small or the unexposed part does not develop.

As the solvent, the binder and the photoinitiator may be dissolved, and a boiling point of 150 ° C. or more may be used while being well mixed with the crosslinking agent and other additives. Herein, when the boiling point of the solvent is less than 150 ° C., the tendency of volatilization in the manufacturing process of the composition, in particular, the 3-roll mill process, becomes a problem, and the solvent is volatilized too quickly at the time of printing, which is not preferable. not. Preferred solvents capable of satisfying the above conditions include, but are not limited to, ethyl carbitol, butyl carbitol, ethyl carbitol acetate, butyl carbitol acetate, texanol, terpin oil, dipropylene glycol methyl ether, dipropylene One or more selected from the group consisting of glycol ethyl ether, dipropylene glycol monomethyl ether acetate, γ-butyrolactone, cellosolve acetate, butyl cellosolve acetate and tripropylene glycol may be used.

The content of the solvent is preferably 100 to 500% by weight based on the binder, when the solvent is less than 100% by weight of the binder, the viscosity of the paste is too high to print It is not preferable because there is a problem that does not work properly, and when the content exceeds 500% by weight with respect to the binder, there is a problem that printing is not possible because the viscosity is too low.

In addition, the organic vehicle includes a sensitizer to improve sensitivity, a polymerization inhibitor and an antioxidant to improve the preservation of the composition, an ultraviolet light absorber to improve the resolution, an antifoaming agent to reduce bubbles in the composition, a dispersant to improve dispersibility, printing It may further include additives such as leveling agents to improve flatness of the film and plasticizers to impart thixotropic properties.

Another embodiment of the present invention provides a plasma display panel electrode manufactured using the photosensitive paste composition described above.

The plasma display panel electrode is manufactured by forming and firing a fine pattern.

Forming the fine pattern of the plasma display panel electrode, the photosensitive paste composition prepared as described above is printed on the surface of the substrate using a screen printing machine using a screen mask such as SUS 325 mesh or SUS 400 mesh, and the coated specimen Dry at a temperature of 80 ° C. to 150 ° C. for 5 to 30 minutes in a convection oven or IR oven, and then exposed to a pattern of 300 nm to 450 nm using a suitable light source over the formed paste coating film. And developing at a temperature of about 30 ° C. with a suitable alkaline developer such as Na ₂ CO ₃ solution, KOH, TMAH or the like.

In addition, the baking process is performed by baking the fine pattern formed as mentioned above at 500 degreeC-600 degreeC in an electric furnace etc. for 10 to 30 minutes.

Another embodiment of the present invention provides a plasma display panel 100 including the plasma display panel electrode manufactured as described above.

Hereinafter, a plasma display panel 100 in which an electrode made of the photosensitive paste composition according to the present invention is disposed will be described with reference to FIGS. 1 and 2.

The plasma display panel electrode made of the photosensitive paste composition according to the present invention may be used to manufacture the white layer of the bus electrode 113, the address electrode 121, and the like among the following plasma display panel 100 structures.

1 is a schematic exploded perspective view of a plasma display panel according to an embodiment of the present invention, Figure 2 is a cross-sectional view taken along the line II-II of FIG.

1 and 2, the plasma display panel 100 according to the exemplary embodiment of the present invention is disposed in parallel with the transparent first substrate 110 and spaced apart at predetermined intervals from the first substrate 110. The second substrate 120 is provided.

In the present embodiment, since the first substrate 110 is transparent, visible light generated by the discharge passes through the first substrate 110, but the present invention is not limited thereto. That is, while the first substrate of the present invention is opaque, the second substrate may be configured to be transparent, and the first substrate and the second substrate may be configured to be transparent at the same time. In addition, the first substrate and the second substrate of the present invention may be made of a semi-transparent material, it may be configured by embedding a color filter on the surface or inside.

On the first substrate 110, stripe-shaped first discharge electrodes 111, second discharge electrodes 112, and bus electrodes 113 are formed.

One of the first discharge electrode 111 and the second discharge electrode 112 functions as a scan electrode and the other function as a common electrode, and is usually made of a transparent electrode made of indium tin oxide (ITO). have.

The bus electrode 113 is installed on the lower surfaces of the first discharge electrode 111 and the second discharge electrode 112, and is formed of a metal material and formed in a narrow width to reduce line resistance.

The first dielectric layer 114 is formed on the first discharge electrode 111, the second discharge electrode 112, and the bus electrode 113.

The first dielectric layer 114 prevents the first discharge electrode 111 and the second discharge electrode 112 from being directly energized during the sustain discharge, and charged particles are discharged from the first discharge electrode 111 and the second discharge electrode 112. ), And to prevent charged particles from being damaged, and to induce charged particles to accumulate wall charges. PbO, B ₂ O ₃ , SiO _2, and the like are used as such dielectrics.

A protective layer 115 is formed on the surface of the first dielectric layer 114. The protective layer 115 is damaged by the first discharge electrode 111 and the second discharge electrode 112 by sputtering of plasma particles. It serves to reduce the discharge voltage by emitting secondary electrons.

The address electrode 121 is formed on the second substrate 120.

The address electrode 121 performs an address discharge together with a discharge electrode serving as a scan electrode among the first discharge electrode 111 and the second discharge electrode 112.

The second dielectric layer 122 is formed on the address electrode 121, and the second dielectric layer 122 is formed of the same material as the first dielectric layer 114, and serves to protect the address electrode 121.

Meanwhile, in the present exemplary embodiment, the first discharge electrode 111 and the second discharge electrode 112 are disposed in parallel on the first substrate 110, and the address electrode 121 is disposed on the second substrate 120. In the case of the plasma display panel of the present invention, the first discharge electrode 111 and the second discharge electrode 112 can be driven without the address electrode 121. In this case, the first discharge electrode and the second discharge can be driven. The electrodes are arranged to cross so that one of them simultaneously performs the addressing action.

A partition wall 130 is formed on the second dielectric layer 122. The partition wall 130 maintains a discharge distance and prevents electro-optic crosstalk between discharge cells.

The partition 130 forms a discharge space together with the first discharge electrode 111, the second discharge electrode 112, and the address electrode 121, which are called discharge cells 150, and the discharge cells 150 are Each form a sub-pixel.

In addition, as shown in FIG. 1, in the embodiment of the present invention, the cross section of the discharge cell 150 defined by the partition wall 130 is illustrated as being rectangular, but the present invention is not limited thereto. It may also be formed in a polygonal form, such as a circle, an ellipse, or the like, and the partition wall may be formed in a stripe pattern to form an open partition wall.

On the other hand, red, green, and blue phosphors are coated on the upper surface of the second dielectric layer 122 and the sidewalls of the partition 130 forming the lower surface of the discharge cell to form the phosphor layer 140.

The phosphor layers 140 have a component for generating visible light by receiving ultraviolet rays. The red phosphor layer formed in the red light emitting cell includes phosphors such as Y (V, P) O ₄ : Eu, and the green light emitting cell The green phosphor layer formed at includes a phosphor such as Zn ₂ SiO ₄ : Mn, and the blue phosphor layer formed at the blue light emitting discharge cell includes a phosphor such as BAM: Eu.

After the first substrate 110 and the second substrate 120 are sealed, the space inside the assembled plasma display panel 100 is filled with air, thereby completely removing the air in the assembled plasma display panel 100. By exhausting, air is replaced with an appropriate discharge gas capable of increasing the efficiency of discharge. As the discharge gas, a mixed gas such as Ne-Xe, He-Xe, He-Ne-Xe is often used.

Hereinafter, the present invention will be described in more detail with reference to Examples of preparing a photosensitive paste composition, but the scope of the present invention is not limited to the following Examples.

Example

Example 1 Preparation of Photosensitive Paste Composition

Silver powder (spherical, specific surface area 0.78 m ² / g, average particle diameter = 1.5 μm) 65.0 weight%, Bi ₂ O ₃ -B ₂ O ₃ system glass frit (amorphous, average particle diameter = 1.6 μm), 1.0 weight%, 5.1 wt% binder (polymer poly (MMA-co-MAA), molecular weight 15,000 g / mol), 0.3 wt% photoinitiator (2,2-dimethoxy-2-phenyl-2-phenylacetophenone), crosslinking agent (tetramethylol Propanetetraacrylate) 5.1% by weight, solvent (Texanol) 22.3% by weight and other additives (antifoaming agent (BYK-354: Big Chemical)) 1.2% by weight, and stirred with a stirrer, and then 3-roll mill By kneading, a photosensitive paste composition according to the present invention was prepared. In the preparation of the photosensitive paste composition, an organic vehicle was prepared by first blending a binder, a photoinitiator, a crosslinking agent and a solvent, and then glass frit and silver powder were added.

Example 2. Preparation of Photosensitive Paste Composition

65.0 wt% silver powder, 3.0 wt% Bi ₂ O ₃ -B ₂ O ₃ based glass frit, 5.3 wt% binder, 0.3 wt% photoinitiator, 5.2 wt% crosslinking agent, 20.0 wt% solvent, and 1.2 wt% other additives A photosensitive paste composition according to Example 2 was prepared in the same manner as in Example 1, except that the composition was prepared by mixing.

Example 3. Preparation of Photosensitive Paste Composition

65.0 wt% silver powder, 5.0 wt% Bi ₂ O ₃ -B ₂ O ₃ based glass frit, 5.4 wt% binder, 0.4 wt% photoinitiator, 5.2 wt% crosslinking agent, 17.6 wt% solvent and 1.3 wt% other additives A photosensitive paste composition according to Example 3 was prepared in the same manner as in Example 1, except that the composition was prepared by mixing.

Example 4. Preparation of Photosensitive Paste Composition

Is a ratio of the powder _{65.0%, Bi 2 O 3 -B} 2 O 3 based glass frit and 8.0% by weight, 5.3% by weight of binder, 0.4% by weight of a photoinitiator, a cross-linking agent 5.2% by weight, 14.4% by weight solvent, and other additives 1.4% by weight A photosensitive paste composition according to Example 4 was prepared in the same manner as in Example 1, except that the composition was prepared by mixing.

Example 5. Preparation of Photosensitive Paste Composition

Is in a proportion of 65.0% by weight of _{powder, Bi 2 O 3 -B 2 O} 3 based glass frit and 10.0% by weight, 5.2% by weight of binder, 0.4% by weight of a photoinitiator, a cross-linking agent 5.1% by weight, 14.6% by weight solvent, and other additives 1.4% by weight A photosensitive paste composition according to Example 5 was prepared in the same manner as in Example 1, except that the composition was prepared by mixing.

Comparative Example 1. Preparation of the photosensitive paste composition according to the prior art

65.0 wt% silver powder, 3.0 wt% PbO-based glass frit (average particle diameter = 1.6 μm), 5.3 wt% binder, 0.3 wt% photoinitiator, 5.2 wt% crosslinking agent, 19.9 wt% solvent and 1.3 wt% other additives A photosensitive paste composition according to the prior art was prepared according to the same method as in Example 1 except that the composition was prepared by blending.

Performance test

Using the compositions of Examples 1, 2, 3, 4, 5 and Comparative Example 1, after forming the address electrodes of the plasma display panel, the line resistance of each address electrode was measured. Thereafter, the plasma display panel was assembled and driven to measure the exothermic temperature of the plasma display panel, respectively. At this time, the ambient temperature at the time of measurement was 25 degreeC.

The evaluation results are shown in Table 1 below.

Example 1 Example 2 Example 3 Example 4 Example 5 Comparative Example 1 Temperature of plasma display panel 59.7 ℃ 56.1 ℃ 53.2 ℃ 50.8 ℃ 46.6 ℃ 53.7 ℃ Line resistance of the address electrode 24.1Ω 25.3Ω 27.2Ω 30.6Ω 33.8Ω 26.9Ω

From the results of Table 1 above, in the case of using the Bi ₂ O ₃ -B ₂ O ₃ -based glass frit, it has an appropriate address line resistance that does not affect the discharge, and at the time of the panel driving, Comparative Example 1 In order to reduce the heating value to lower the temperature of the panel, it can be seen that the content of the glass frit should have a content of 5% by weight to 10% by weight relative to the photosensitive paste composition.

That is, when the content of the Bi ₂ O ₃ -B ₂ O ₃ -based glass frit is less than 5 wt% with respect to the photosensitive paste composition, the temperature of the plasma display panel exceeds 53.2 ° C. (here, Comparative Example 1, the temperature of the panel is 53.7 ℃), the problem caused by the high temperature of the panel is likely to occur. In addition, when the content of the Bi ₂ O ₃ -B ₂ O ₃ -based glass frit is greater than 10 wt% with respect to the photosensitive paste composition, the line resistance of the formed address electrode exceeds 33.8 kPa, which is bad for address discharge. There is room for impact.

As described above, the photosensitive paste composition is prepared such that the content of the Bi ₂ O ₃ -B ₂ O ₃ based glass frit according to the present embodiments has a content of 5% by weight to 10% by weight based on the photosensitive paste composition. If the electrode is formed from the photosensitive paste composition, heat generated during the driving of the plasma display panel can be reduced. As a result, there is an advantage that the durability and discharge efficiency of the plasma display panel can be improved.

On the other hand, in Examples 1, 2, 3, 4, and 5, only Bi ₂ O ₃ -B ₂ O ₃ system was used as the glass frit. As described above, the glass frit of the present invention is Bi ₂ O ₃ -B. ₂ O ₃ type, Bi ₂ O ₃ -B ₂ O ₃ -ZnO-based, P ₂ O ₅ -SnO-ZnO-based, B ₂ O ₃ with one or two or more selected from -SnO-BaO-based can be used by mixing In this case, the proper content ratio of the glass frit should be in the range of 5% by weight to 10% by weight based on the photosensitive paste composition, and at the same time, the formed electrode has an appropriate wire resistance value that does not affect the discharge. As compared with the case of the related art, heat generated during panel driving can be reduced.

As described above, when the photosensitive paste composition according to the present invention is used for forming the electrode of the plasma display panel, there is an effect that the heat generated when the plasma display panel is driven can be significantly reduced.

Although the present invention has been described with reference to the embodiments shown in the drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and equivalent other embodiments are possible. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (17)

In a photosensitive paste composition comprising a conductive powder, glass frit and an organic vehicle, The glass frit is selected from the group consisting of Bi ₂ O ₃ -B ₂ O ₃ , Bi ₂ O ₃ -B ₂ O ₃ -ZnO, P ₂ O ₅ -SnO-ZnO and B ₂ O ₃ -SnO-BaO A photosensitive paste composition comprising at least one selected, and having a content of 5% by weight to 10% by weight based on the photosensitive paste composition. The method of claim 1, The conductive powder is Ag powder photosensitive paste composition. The method of claim 2, The specific surface area of the Ag powder is 0.3m ² / g to 2.0m ² / g, the average particle diameter is 0.1㎛ to 5.0㎛ photosensitive paste composition. The method of claim 1, The average particle diameter of the said glass frit is 5.0 micrometers or less. The method of claim 1, The organic vehicle is a photosensitive paste composition comprising a binder, a crosslinking agent, a photoinitiator and a solvent. The method of claim 5, The binder is a photosensitive paste composition comprising a copolymer of a monomer having a carboxyl group and at least one ethylenically unsaturated monomer. The method of claim 6, The monomer having a carboxyl group, the photosensitive paste composition comprising at least one selected from the group consisting of acrylic acid, methacrylic acid, fumaric acid, maleic acid, vinyl acetic acid and anhydrides thereof. The method of claim 6, The ethylenically unsaturated monomers are methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, 2 A photosensitive paste composition comprising at least one selected from the group consisting of hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, ethylene glycol monomethyl ether acrylate and ethylene glycol monomethyl ether methacrylate. The method of claim 6, The binder is one selected from the group consisting of glycidyl methacrylate, 3,4-epoxycyclohexylmethyl methacrylate and 3,4-epoxycyclohexylmethyl acrylate and reacts with the carboxyl group of the copolymer. The photosensitive paste composition which further contains the crosslinkable group formed by this. The method of claim 6, The molecular weight of the copolymer is 5,000g / mol to 50,000g / mol, the acid value is 20mgKOH / g to 100mgKOH / g photosensitive paste composition. The method of claim 5, The crosslinking agent is a photosensitive paste composition comprising at least one selected from the group consisting of diacrylates, triacrylates, tetraacrylates and hexaacrylates. The method of claim 5, The photoinitiator, benzophenone, methyl o-benzoylbenzoate, 4,4-bis (dimethylamine) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,2-diethoxyacetophenone, 2,2- Dimethoxy-2-phenyl-2-phenylacetophenone, 2-methyl- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- ( 4-morpholinophenyl) -1-butanone, bis (2,6-dimethoxybenzoyl) -2, 4,4-trimethylpentylphosphineoxide and bis (2,4,6-trimethylbenzoyl) phenylphosphine A photosensitive paste composition comprising at least one selected from the group consisting of oxides. The method of claim 5, The solvent is ethyl carbitol, butyl carbitol, ethyl carbitol acetate, butyl carbitol acetate, texanol, terpin oil, dipropylene glycol methyl ether, dipropylene glycol ethyl ether, dipropylene glycol monomethyl ether acetate, γ-buty A photosensitive paste composition comprising at least one selected from the group consisting of rolactone, cellosolve acetate, butyl cellosolve acetate, and tripropylene glycol. The method of claim 5, The organic vehicle further comprises at least one selected from the group consisting of cellulose, hydroxymethyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, carboxyethyl cellulose and carboxyethyl methyl cellulose. The method of claim 5, The organic vehicle further comprises at least one additive selected from the group consisting of sensitizers, polymerization inhibitors, antioxidants, ultraviolet light absorbers, antifoaming agents, dispersants, leveling agents and plasticizers. The plasma display panel electrode manufactured using the photosensitive paste composition of any one of Claims 1-15. A plasma display panel comprising the plasma display panel electrode of claim 16.

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