KR20080011056A - Protection layer, plasma display panel manufacturing method using it, plasma display panel and manufacturing method thereof - Google Patents

Abstract

A protective layer, a protective layer manufacturing method of a plasma display panel, a plasma display panel, and a plasma display panel manufacturing method are provided to enhance emission characteristics of secondary electrons and to improve brightness and power consumption. A protective layer includes a first layer(280) and a second layer(280'). The first layer includes MgO. The second layer is formed on the first layer and includes a single crystalline metal oxide. The single crystalline metal oxide has a maximum value of cathode luminescence in a wavelength region of 300-500 nanometers. The single crystalline metal oxide is formed by supplying oxygen of 2-20sccm and argon of 0-18sccm in a gas state of a metal. The second layer is formed by coating irregularly particles including single crystalline metal powders on an entire surface of the first layer.

Description

A protective film, a method for manufacturing a protective film of a plasma display panel using the same, a plasma display panel and a method for manufacturing the same {PROTECTION LAYER, PLASMA DISPLAY PANEL MANUFACTURING METHOD USING IT, PLASMA DISPLAY PANEL AND MANUFACTURING METHOD THEREOF}

The present invention relates to a plasma display panel, and more particularly, to a protective film of a plasma display panel.

In general, a plasma display panel is a partition wall formed between an upper substrate and a lower substrate to form one unit cell, and each cell includes neon (Ne), helium (He), or a mixture of neon and helium (Ne + He) and An inert gas containing the same main discharge gas and a small amount of xenon is filled. When discharged by a high frequency voltage, the inert gas generates vacuum ultraviolet rays and emits phosphors formed between the partition walls to realize an image. Such a plasma display panel has a spotlight as a next generation display device because of its thin and light configuration.

1 is a perspective view schematically illustrating a structure of a general plasma display panel. As illustrated in FIG. 1, a plasma display panel includes a plurality of sustain electrode pairs formed by pairing a scan electrode 102 and a sustain electrode 103 on a front glass 101, which is a display surface on which an image is displayed. The lower substrate 110 having the plurality of address electrodes 113 arranged so as to intersect the plurality of sustain electrode pairs on the substrate 100 and the rear glass 111 forming the rear surface is coupled in parallel with a predetermined distance therebetween. do.

The upper substrate 100 is made of a scan electrode 102 and a sustain electrode 103, that is, a transparent electrode (a) formed of a transparent ITO material and a metal material to mutually discharge and maintain light emission of the cells in one discharge cell. The scan electrode 102 and the sustain electrode 103 provided as the bus electrode b are included in pairs. The scan electrode 102 and the sustain electrode 103 are covered by one or more upper dielectric layers 104 that limit the discharge current and insulate the electrode pairs, and to facilitate the discharge conditions on the upper dielectric layer 104 top surface. A protective film 105 on which magnesium oxide (MgO) is deposited is formed.

The lower substrate 110 is arranged such that a plurality of discharge spaces, that is, barrier ribs 112 of a stripe type (or well type) for forming discharge cells are maintained in parallel. In addition, a plurality of address electrodes 113 which perform address discharge to generate vacuum ultraviolet rays are arranged in parallel with the partition wall 112. On the upper side of the lower substrate 110, R, G, and B phosphors 114 which emit visible light for image display during address discharge are coated. A lower dielectric layer 115 is formed between the address electrode 113 and the phosphor 114 to protect the address electrode 113.

The conventional PDP having such a structure is largely formed through a glass substrate manufacturing process, an upper substrate manufacturing process, a lower substrate manufacturing process, and an assembly process. In particular, the manufacturing process of the panel during the PDP manufacturing process is as follows.

First, the manufacturing process of the upper substrate 100 limits the manufacturing process in which the scan electrode 102 and the sustain electrode 103 are formed on the upper substrate 100 and the discharge current of the scan electrode 102 and the sustain electrode 103. In addition, a process of forming an upper dielectric layer that insulates electrode pairs from each other and a process of forming a protective film formed by depositing magnesium oxide (Mgo) on the upper surface of the dielectric layer are performed.

In addition, a manufacturing process of the lower substrate 110 may include a manufacturing process in which the address electrode 113 is formed on the lower substrate 110, a manufacturing process in which a lower dielectric layer is formed to protect the address electrode 113, and a discharge cell on the upper surface of the dielectric layer. The manufacturing process in which the partition wall 112 is formed is formed and the phosphor layer emitting visible light for image display is formed on the partition wall 112.

2 illustrates a method of manufacturing the upper substrate 100 of the above-described plasma display panel. As shown, processing the glass, which is the upper substrate 100, forming the discharge sustaining electrodes 102, 103 on the upper substrate 100, and forming the discharge sustaining electrodes 102, 103 on the upper substrate 100. Forming an upper dielectric layer 104 on the substrate, sealing the upper dielectric layer 104, and forming a magnesium oxide (MgO) protective film 105.

The discharge sustaining electrodes 102 and 103 are formed on the upper substrate 100 by forming two electrodes 102a and 103a, which are transparent electrodes, and a bus, which is an auxiliary electrode, on a portion of the formed two electrodes 102a and 103a. Forming the electrodes 102b and 103b.

Referring to the manufacturing method of the upper substrate 100 made of these steps, the transparent electrode (102a, 103a) is formed on the upper substrate 100 using a method such as sputtering or vacuum deposition, the transparent Bus electrodes 102b and 103b made of Cr / Cu / Cr are formed on the electrodes by sputtering.

The upper dielectric layer 104 is formed on the discharge sustaining electrodes 102 and 103 formed of the transparent electrodes 102a and 103a and the bus electrodes 102b and 103b by using a screen printing method, and on the upper dielectric layer 104. Seal it.

A protective film 105 is then formed on the surface of the upper dielectric layer 105, which is usually made of magnesium oxide (MgO), which is coated with or coated with E-beam or liquid magnesium oxide. Deposit about 500 nm.

However, the above-described protection film 105 formed of only the conventional E-beam or magnesium oxide (MgO) can increase the secondary electron emission coefficient to some extent, but there are limitations, and there are also problems such as high driving voltage and low efficiency of the PDP. .

The present invention is to solve the above problems, to provide a protective film that can increase the secondary electron emission characteristics to lower the emission voltage, control the discharge to increase the efficiency, a protective film manufacturing method using the same and a manufacturing method of the plasma display panel There is.

The present invention provides a protective film comprising a first layer containing magnesium oxide (MgO) and a second layer formed on the first layer and containing a single crystal of metal oxide.

Here, the monocrystalline metal oxide has a maximum value of cathode luminescence in the wavelength range of 300 to 500 nanometers, and is supplied to the gaseous metal with 2-20 sccm of oxygen and 0-18 sccm of argon. Characterized in that formed.

In addition, the second layer may be formed by irregularly applying particles including the metal oxide powder of the single crystal on the entire surface of the first layer.

In addition, particles may have a particle diameter of 50 nm to 1000 nm, and the metal oxide of the single crystal is an oxide of an alkali metal or an alkaline earth metal, and may be any one selected from SrCaO, MgCaO, MgSrO, and CsI, or a mixture thereof. The second layer may have a thickness of about 100 nm to about 1500 nm.

According to another embodiment of the present invention, a protective film comprising a first layer containing magnesium oxide (MgO) and a second layer formed on the first layer and made of a single crystal having a secondary electron emission coefficient greater than that of MgO It provides a plasma display panel comprising a.

Here, the single crystal has a maximum value of cathode luminescence in the wavelength region of 300 to 500 nanometers, a discharge delay time of the plasma display panel is 1.2 microseconds or less, and the surface discharge start voltage is 305 volts. The counter discharge start voltage is 250 volts or less.

According to another embodiment of the present invention, forming a first protective film containing MgO; And forming a second passivation layer including a single crystal of metal oxide powder on the first passivation layer.

Here, the monocrystalline metal oxide powder has a maximum value of cathode luminescence in a wavelength range of 300 to 500 nanometers, and is supplied to a gaseous metal at 2-20 sccm of oxygen and 0-18 sccm of argon. Can be formed.

The forming of the second passivation layer may include preparing a second passivation liquid phase by mixing a solvent, a dispersant, and a single crystal of alkali metal or alkaline earth metal oxide powder (pre-mixing) and milling the prepared second passivation layer liquid. manufacturing a protective film of a plasma display panel, comprising: milling, applying the milled second protective film liquid on the first protective film, and forming a second protective film through drying and firing. Provide a method.

Here, the second protective film liquid may be formed by mixing 1-10 wt% of the alkali metal or alkaline earth metal oxide powder of the single crystal and 90-99 wt% of the solvent and the dispersant.

In addition, the solvent is alcohol (alcohol), glycol (Glycol or Diol), propylene glycol ethers (Propylene Glycol Ether), propylene glycol acetates (Propylene Glycol Acetate), ketones (ketone), butyl carbitol acetate (BCA: Butyl Carbitol Acetate, xylene, terpineol, texanol, water or mixtures thereof may be used.

In addition, the dispersant may be acrylic, epoxy, urethane, acrylic urethane, alkyd, poly amid polymer, polycarboxylic acid, or mixtures thereof. Can be used.

In addition, the coating of the second protective film liquid on the first protective film may use any one selected from a spray coating method, a bar coating method, a screen printing method, and a green sheet method. have.

In addition, drying and firing may be performed at 100 to 200 ° C. according to the kind of the solvent, and then fired at 400 to 600 ° C. to form the second protective film.

The second passivation layer may be formed by irregularly leaving particles in the form of clusters on the entire surface of the first passivation layer through the drying and firing.

According to another embodiment of the present invention, the steps of sequentially forming a transparent electrode and the upper dielectric layer on the upper substrate, and forming a first protective film containing MgO on the upper dielectric layer and a single crystal on the first protective film Forming a second passivation layer containing an alkali metal or alkaline earth metal oxide powder, and bonding the lower substrate and the upper substrate on which the address electrode is formed. to provide.

Here, the alkali metal or alkaline earth metal oxide powder has a maximum value of cathode luminescence in the wavelength range of 300 to 500 nanometers, and in a gaseous metal, 2 to 20 sccm of oxygen and 0 to 18 sccm of argon. It may be supplied to form.

In addition, the second passivation layer may be irregularly formed in a cluster form of particles including a single crystal of the metal oxide powder on the entire surface of the first passivation layer.

The lower substrate and the upper substrate may be bonded to each other by applying a sealing material on the lower substrate.

The effects of the protective film, the protective film manufacturing method using the same, and the plasma display panel manufacturing method according to the present invention described above are as follows.

There is an effect that secondary electron emission characteristics in the protective film are improved when the plasma display panel is driven.

Secondary electron emission characteristics of the plasma display panel are improved, so that surface discharge and counter discharge start voltages are reduced, and luminance and discharge efficiency are high, thereby reducing power consumption and discharge delay time.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention that can specifically realize the above object will be described. The same components as in the prior art are given the same names and the same reference numerals for convenience of description, and detailed description thereof will be omitted.

3 is a cross-sectional view illustrating an upper substrate structure of a plasma display panel according to an exemplary embodiment of the present invention.

A protective film of a plasma display panel according to an exemplary embodiment of the present invention will be described with reference to FIG. 3.

The protective film of the plasma display panel according to the preferred embodiment of the present invention has a two-layer structure, and is formed on the electrodes 290a and 290b on the upper substrate 270 and the dielectric layer 275 to protect the electrodes. Similarly, a first layer 280 including magnesium oxide (MgO) and a particle 280 'formed on the first layer 280 and including a single crystal metal oxide powder form a second layer. .

Here, the second layer 280 ′ is formed by irregularly applying particles including the single crystal metal oxide powder on the entire surface of the first layer. The monocrystalline metal oxide has a maximum value of cathode luminescence in the wavelength range of 300 to 500 nanometers, and is formed by supplying oxygen in a gaseous state of 2-20 sccm and argon 0-18 sccm. Can be. Here, the metal oxide of the single crystal is any one selected from SrCaO, MgCaO, MgSrO, and CsI as an oxide of an alkali metal or alkaline earth metal, or a mixture thereof.

In addition, the thickness of the first layer 280 is set to 500 to 800 nm, and the thickness of the second layer 280 'is set to 100 nm to 1.5 m, and the particles containing the single crystal metal oxide powder to be used are formed. A particle diameter of 50 to 1000 nm is used.

Particles containing a single crystal of metal oxide powder are irregularly formed in the form of a cluster on the entire surface of the first layer 280, so that the surface of the protective film is not flat but roughly formed. Therefore, the surface area where ultraviolet ions collide with the protective film during gas discharge of the plasma display panel increases, so that the amount of secondary electrons can be increased and the discharge start voltage can be lowered. As a result, the discharge efficiency is increased and jitter is reduced. .

4 and 5 are graphs showing the surface discharge and the opposite discharge voltage of the plasma display panel according to the present invention described above.

As shown in FIG. 4, the surface discharge occurs at about 320 volts in the conventional plasma display panel, but the surface discharge occurs at 305 volts or less in the plasma display panel according to the present invention. As shown in FIG. 5, the conventional plasma display panel has a counter discharge at about 258 volts, but the plasma display panel according to the present invention has a counter discharge at 250 volts or less. Therefore, the present invention can lower the discharge start voltage and lower the power consumption of the plasma display panel.

4 and 5 show the discharge characteristics of the protective film of the plasma display panel with the conventional film type protective film and the protective film with the metal oxide of the plasma display panel according to the present invention. Here, the metal oxide is the above-described single crystal metal oxide.

film Metal oxide Cotton discharge 320 V 303 V Counter discharge 258 V 247 V

FIG. 6 is a graph showing jitter characteristics of the plasma display panel according to the present invention, and FIG. 7 is a graph showing cathode ray emission characteristics of a metal oxide as a protective film material of the plasma display panel according to the present invention.

As shown in FIG. 6, the plasma display panel having the conventional film type protective film has a discharge delay time of about 2 microseconds, but the plasma display panel according to the present invention has a discharge delay time of 1.2 microseconds or less. Here, the jitter characteristics of the protective film of the plasma display panel with the conventional film type protective film and the protective film with the metal oxide of the plasma display panel according to the present invention are shown in the table below.

film Metal oxide T _{99 .9} 2.265 1.115 T _f 0.600 0.785 T _avg 0.982 0.928 sigma 0.249 0.054 T _sc6z 2.477 1.252

In this case, the Tf (formative time) was a little faster for the film-type protective film, but the rest of the time, the metal oxide is faster, it can be seen that the overall discharge delay time is shortened. The improvement of the jitter characteristic is due to the cathode ray emission characteristic of the metal oxide provided in the second protective film as shown in FIG. 7 having a maximum value at 300 to 500 micrometers.

In addition, the plasma display panel according to the embodiment of the present invention is formed on the first layer and the first layer containing magnesium oxide (MgO), the second layer made of a single crystal having a secondary electron emission coefficient greater than the magnesium oxide It can be made including a protective film configured to include.

Thus, the present invention was formed by mixing a predetermined alkali metal or alkaline earth metal powder to MgO powder, it was possible to increase the secondary electron emission coefficient, an example thereof is shown in Table 1.

Deposition method Shield Secondary electron emission factor E-beam MgO 0.33 MgO + alkali metal 0.53-0.60 Sputtering MgO 0.40 MgO + Alkaline Earth Metals 0.56-0.62

8 is a schematic block diagram illustrating a method of manufacturing a protective film for a plasma display panel according to an embodiment of the present invention, including forming a first protective film including MgO and including a single crystal metal oxide powder on the first protective film. It can be roughly divided into the step of forming a second protective film. At this time, the thickness of the first protective film is formed to 500 to 800 nm, and the thickness of the second protective film is formed to be 100 nm to 1500 nm. Since the method of forming the first protective film is the same as in the conventional art, it will be omitted.

As shown in FIG. 8, first, a solvent, a dispersant, and a single crystal metal oxide powder are mixed to prepare a second passivation layer liquid (Pre-mixing) (S810), wherein the single crystal metal oxide powder is 1 to 10. Wt%, the solvent and the dispersant are mixed in 90 to 99% by weight, the solvent is alcohol (alcohol), glycol (Glycol or Diol), propylene glycol ether (Propylene Glycol Ether), propylene glycol acetate (Propylene Glycol Acetate, ketone, Butyl Carbitol Acetate (BCA: Butyl Carbitol Acetate), Xylene, Terpineol, Texanol, Water, or a mixture thereof, or the dispersant Uses acrylic, epoxy, urethane, acrylic urethane, alkyd, poly amid polymer, Poly Carboxylic Acid or PCA. .

And, the step of preparing the liquid phase is continued for 1 to 10 minutes at 2000 ~ 4000rpm, the milling step is lasted for 10 to 60 minutes at 6000 ~ 10000rpm, the solvent, dispersant and single crystal metal oxide powder for a predetermined time The mixture is stirred by stirring (for example, 1 hour), and a second protective film liquid phase is prepared through ultrasonic dispersion using an ultrasonic dispersion machine.

Next, the prepared second protective film liquid phase (milling) (S820). Here, the second protective film liquid phase is milled through a milling machine.

Next, the method of applying the milled second protective film liquid on the first protective film is any one selected from spray coating method, bar coating method, screen printing method, green sheet method It is applied to the entire surface on the first protective film using the method (S830).

Next, a second passivation layer is formed by drying and firing the second passivation layer liquid applied on the first passivation layer (S840) (S850). Here, according to the type of the solvent, the particles are dried at 100 to 200 ℃, fired at 400 to 600 ℃ by containing particles of a single crystal of the metal oxide powder irregularly left in a cluster form on the entire surface on the first protective film, the second protective film Is formed.

9 is a schematic block diagram illustrating a method of manufacturing a plasma display panel according to an embodiment of the present invention.

As shown in FIG. 9, first, a glass is processed to prepare an upper substrate (S910), and a transparent electrode (ITO) and two electrodes are formed on the upper substrate, and on a portion of the two electrodes. A bus electrode serving as an auxiliary electrode is sequentially deposited to form a discharge sustaining electrode (S920).

Next, an upper dielectric layer is formed on the formed electrodes (S930), and a first passivation layer including MgO is formed on the dielectric layer (S940). Here, the most used material is MgO, but zirconium oxide (ZrO), hafnium oxide (HfO), cesium oxide (CeO ₂ ), thorium oxide (ThO ₂ ), or lanthanum oxide (La ₂ O ₃ ) may be used. . MgO can usually be formed using a vacuum deposition method such as electron beam deposition.

Next, a second passivation layer including a single crystal metal oxide powder is formed on the first passivation layer (S950). It is preferable that the second protective film is formed only on a part of the first protective film, that is, above the transparent electrode ITO. Therefore, as described above, the second protective film liquid is formed using any one method selected from spray coating method, bar coating method, screen printing method, and green sheet method. Particles containing a single crystal of metal oxide powder are irregularly formed in a cluster form on the entire surface of the first passivation layer. Here, the ratio of the second protective film liquid varies depending on the coating method. For example, in the case of inkjet, 10 wt% or less is suitable. This particle acts as a second protective film, and emits a UV ultraviolet ray (VUV) having a wavelength of 147 nm generated by a discharge gas such as Xe during plasma display discharge with UV having a wavelength of 250 nm, resulting in improved luminance.

Next, a sealing material is coated on the lower substrate and the lower substrate on which the address electrode is formed, and bonded to the upper substrate (S960) to complete the plasma display panel.

On the other hand, the terms used in the present invention (terminology) are terms defined in consideration of the functions in the present invention may vary according to the intention or practice of those skilled in the art, the definitions are the overall contents of the present invention It should be based on.

The present invention is not limited to the above-described embodiments, and can be modified by those skilled in the art as can be seen from the appended claims, and such modifications are within the scope of the present invention.

The above-described protective film according to the present invention may be provided in the plasma display panel, thereby improving secondary electron emission characteristics, and improving luminance and power consumption.

1 is a schematic perspective view showing the structure of a general plasma display panel;

2 is a schematic block diagram illustrating a method of manufacturing an upper substrate of a general plasma display panel;

3 is a cross-sectional view illustrating an upper substrate structure of a plasma display panel according to an embodiment of the present invention.

4 is a graph showing the surface discharge voltage of the plasma display panel according to the present invention,

5 is a graph showing the counter discharge voltage of the plasma display panel according to the present invention;

6 is a graph showing jitter characteristics of the plasma display panel according to the present invention;

7 is a graph showing cathode light emission characteristics of a metal oxide as a protective film material of a plasma display panel according to the present invention;

8 is a schematic block diagram illustrating a method of manufacturing a protective film of a plasma display panel according to an embodiment of the present invention.

9 is a schematic block diagram illustrating a method of manufacturing a plasma display panel according to an embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

100: upper substrate 110: lower substrate

102: scan electrode pair 103: sustain electrode pair

270: upper substrate 275: upper substrate dielectric

280: first protective film 280 ′: second protective film

290: sustain electrode pair 290a: transparent electrode

290b: bus electrode

Claims (25)

A first layer comprising magnesium oxide (MgO); And And a second layer formed on the first layer and containing a single crystal of a metal oxide. The method of claim 1, wherein the metal oxide of the single crystal, A protective film, characterized in that the cathode luminescence has a maximum value in the wavelength range of 300 ~ 500 nanometers. The method of claim 2, wherein the metal oxide of the single crystal, A protective film formed by supplying oxygen in a gaseous state of 2 to 20 sccm and argon to 0 to 18 sccm. The method of claim 1, wherein the second layer, A protective film, characterized in that formed on the front of the first layer of the particles containing the metal oxide powder of the single crystal irregularly applied. The method of claim 4, wherein the particle, A protective film, wherein the particles have a diameter of 50 to 1000 nm. The method of claim 1, wherein the metal oxide of the single crystal, An oxide of an alkali metal or an alkaline earth metal, which is any one selected from SrCaO, MgCaO, MgSrO, and CsI, or a mixture thereof. The method of claim 1, wherein the second layer, A protective film, characterized in that the thickness is 100 ~ 1500nm. A first layer comprising magnesium oxide (MgO); And And a protective layer formed on the first layer, the second layer comprising a single crystal having a secondary electron emission coefficient greater than that of MgO. The method of claim 8, wherein the single crystal, A plasma display panel characterized in that the cathode luminescence has a maximum value in the wavelength range of 300 to 500 nanometers. The method of claim 9, A plasma display panel, wherein the discharge delay time is 1.2 microseconds or less, the surface discharge start voltage is 305 volts or less, and the counter discharge start voltage is 250 volts or less. Forming a first passivation layer including MgO; And Forming a second protective film containing a single crystal of metal oxide powder on the first protective film. The method of claim 11, wherein the single crystal metal oxide powder, A method of manufacturing a protective film for a plasma display panel, characterized in that the cathode luminescence has a maximum value in the wavelength range of 300 to 500 nanometers. The method of claim 12, wherein the single crystal metal oxide powder, A method of manufacturing a protective film for a plasma display panel, characterized in that the gas is formed by supplying oxygen at 2 to 20 sccm and argon at 0 to 18 sccm. The method of claim 11, wherein the forming of the second passivation layer comprises: Preparing a second protective film liquid phase by mixing a solvent, a dispersant, and a single crystal of an alkali metal or alkaline earth metal oxide powder (Pre-mixing); Milling the prepared second protective film liquid phase; Applying the milled second protective film liquid on the first protective film; And Forming a second passivation layer through drying and firing; and a method of manufacturing a passivation layer for a plasma display panel. The method of claim 14, wherein the second protective film liquid phase, A method of manufacturing a protective film for a plasma display panel, characterized in that the monocrystalline alkali metal or alkaline earth metal oxide powder is mixed with 1 to 10% by weight, and the solvent and dispersant are mixed at 90 to 99% by weight. The method of claim 15, wherein the solvent, Alcohol, Glycol or Diol, Propylene Glycol Ether, Propylene Glycol Acetate, Ketone, Butyl Carbitol Acetate (BCA) And xylene, terpineol, texanol, water, or a mixture thereof. The method of claim 15, wherein the dispersing agent, The use of acrylics, epoxys, urethanes, acrylic urethanes, alkyds, poly amid polymers, polycarboxylic acids, or mixtures thereof A protective film manufacturing method of a plasma display panel. The method according to claim 14, wherein the coating of the second protective film liquid on the first protective film A spray coating method, a bar coating method, a screen printing method, a method of manufacturing a protective film for a plasma display panel, characterized by using any one selected from a green sheet method. The method of claim 14, wherein the drying and firing, Drying at 100-200 degreeC according to the kind of said solvent, baking at 400-600 degreeC, and forming said 2nd protective film, The protective film manufacturing method of the plasma display panel characterized by the above-mentioned. The method of claim 14, wherein the second protective film, Particles containing a single crystal alkali metal or alkaline earth metal oxide powder through the drying and firing is irregularly formed in a cluster form on the entire surface of the first protective film, characterized in that formed in the protective film of the plasma display panel. Sequentially forming a transparent electrode and an upper dielectric layer on the upper substrate; Forming a first passivation layer including MgO on the upper dielectric layer; Forming a second passivation layer including a single crystal of alkali metal or alkaline earth metal oxide powder on the first passivation layer; And And bonding the lower substrate on which the address electrode is formed and the upper substrate. The method of claim 21, wherein the alkali metal or alkaline earth metal oxide powder, A method of manufacturing a plasma display panel, characterized in that the cathode luminescence has a maximum value in the wavelength range of 300 to 500 nanometers. The method of claim 22, wherein the alkali metal or alkaline earth metal oxide powder, A method of manufacturing a plasma display panel, characterized in that the gas is formed by supplying oxygen at 2 to 20 sccm and argon at 0 to 18 sccm. The method of claim 21, wherein the second protective film, Particles containing a single crystal of the metal oxide powder on the entire surface of the first protective film is irregularly formed in a cluster form, characterized in that the manufacturing method of the plasma display panel. The method of claim 21, wherein the bonding of the lower substrate and the upper substrate, And manufacturing a sealing material on the lower substrate and bonding the sealing material to the upper substrate.

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