KR20080003040A - In-plane-switching mode liquid crystal display device and fabrication method thereof - Google Patents

Abstract

An In-plane switching mode LCD and a fabrication method thereof are provided to ensure personal security of a user by selectively implementing a wide viewing angle mode and a narrow viewing angle mode. A gate line and a data line(115) intersect each other on a first substrate, and define red, green, blue and viewing-angle control sub-pixel regions. A thin film transistor is formed at an intersection of the gate line and the data line. A first pixel electrode and a first common electrode alternate each other at a predetermined interval in the red, green and blue sub-pixel regions. A second pixel electrode is formed in the viewing-angle control sub-pixel region. A black matrix(122) is formed as a metal layer on the second substrate at a location corresponding to a boundary of the sub-pixel regions and the thin film transistor. A second common electrode corresponds to the second pixel electrode on the black matrix.

Description

Transverse electric field type liquid crystal display device and manufacturing method thereof {In-Plane-Switching mode Liquid Crystal Display device and fabrication method

1 is a plan view of a transverse electric field type liquid crystal display device according to the prior art.

FIG. 2 is a sectional view taken along line II ′ of FIG. 1. FIG.

3 is a plan view of a transverse electric field type liquid crystal display device according to the prior art.

FIG. 2 is a sectional view taken along line II ′ of FIG. 1. FIG.

3 is a voltage distribution diagram of a general transverse electric field type liquid crystal display device.

4A and 4B are plan views of a transverse electric field type liquid crystal display device when voltage is not applied or applied.

5 is a plan view showing a part of a TFT array substrate of a transverse electric field type liquid crystal display device according to the present invention;

6 is a plan view showing a part of a color filter substrate of a transverse electric field type liquid crystal display device according to the present invention;

FIG. 7 is a cross-sectional view showing a TFT array substrate of a liquid crystal display device according to a first embodiment of the present invention, which is a cross-sectional view taken along line II-II 'of FIG. 5 and a cross-sectional view taken along line III-III' of FIG.

FIG. 8 is a cross-sectional view showing a TFT array substrate of a liquid crystal display device according to a second embodiment of the present invention, which is a cross sectional view taken along the line II-II 'of FIG. 5 and a cross-sectional view taken along the line III-III' of FIG.

9 is a cross-sectional view showing a TFT array substrate of a liquid crystal display device according to a third embodiment of the present invention, which is a cross sectional view taken along the line II-II 'of FIG. 5 and a cross-sectional view taken along the line III-III' of FIG.

10A to 10D are process flowcharts illustrating a method of manufacturing a color filter array substrate of a transverse electric field type liquid crystal display device according to a third embodiment of the present invention.

<Description of the code | symbol about the principal part of drawing>

111: lower substrate 112: gate wiring

115: data wiring 117: pixel electrode

121: upper substrate 122: black matrix

123: color filter layer 124: common electrode

125: common wiring 129: overcoat layer

517: pixel electrode for visual field control 524: common electrode for visual field control

The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device having a transverse electric field system and a method of manufacturing the same.

Recently, a liquid crystal display device, which is one of the flat panel display devices that are attracting attention, is a device for changing optical anisotropy by applying an electric field to a liquid crystal having both liquidity and optical properties of crystals. Compared with the low power consumption, small volume, large size, and high definition, it is widely used.

The LCD has a variety of modes depending on the nature of the liquid crystal and the structure of the pattern.

Specifically, TN mode (Twisted Nematic Mode) for arranging the liquid crystal directors to be twisted by 90 ° and controlling voltage by applying a voltage, and dividing one pixel into several domains to change the field of view angle of each domain. Multi-domain mode that realizes wide viewing angle, OCB mode (Optically Compensated Birefringence Mode) that compensates for the phase change of light according to the direction of light by attaching a compensation film to the outer peripheral surface of the substrate, and on one substrate In-plane switching mode in which two electrodes are formed in the liquid crystal to twist in parallel planes of the alignment layer, and a long axis of the liquid crystal molecules is vertically aligned with the alignment layer plane using a negative type liquid crystal and a vertical alignment layer. VA mode (Vertical Alignment) is various.

The transverse electric field type liquid crystal display device is generally composed of a color filter substrate (hereinafter referred to as an upper substrate) and a thin film array substrate (hereinafter referred to as a lower substrate) disposed opposite to each other and having a liquid crystal layer therebetween.

That is, a black matrix for preventing light leakage and a color filter layer of R, G, and B for implementing color on the black matrix are formed on the upper substrate.

The lower substrate includes gate wirings and data wirings defining unit pixels, switching elements formed at intersections of the gate wirings and data wirings, and a common electrode and a pixel electrode alternately crossing each other to generate a transverse electric field. .

Hereinafter, a transverse electric field type liquid crystal display device according to the related art will be described with reference to the accompanying drawings.

1 is a plan view of a transverse electric field type liquid crystal display device according to the related art, and FIG. 2 is a cross-sectional view taken along line II ′ of FIG. 1.

First, as shown in FIG. 1, the gate wiring 12 and the data wiring 15 that are vertically intersected on the lower substrate 11 to define a pixel, and the gate wiring 12 and the data wiring 15 ), A thin film transistor (TFT) disposed at an intersection of the plurality of transistors, a common wiring 25 disposed in the pixel to be parallel to the gate wiring 12, and branches from the common wiring 25 to the data wiring 15. A plurality of common electrodes 24 parallel to each other, a plurality of pixel electrodes 17 connected to drain electrodes of the thin film transistor TFT and interposed in parallel with the common electrode between the common electrodes 24; The capacitor electrode 26 extending from the pixel electrode 17 and overlapping the common wiring 25 is provided.

The thin film transistor TFT may include a gate electrode 12a branched from the gate line 12, a gate insulating layer (not shown) formed on the entire surface including the gate electrode 12a, and an upper portion of the gate electrode 12a. And a source electrode 15a and a drain electrode 15b branched from the data line 15 and formed at both ends of the semiconductor layer 14 respectively.

The pixel electrode 17 is connected to the drain electrode 15b through the drain contact hole 19.

The common electrode 24 and the pixel electrode 17 may be formed using a transparent conductive metal having excellent light transmittance as a material.

In order to separate the two patterns between the common electrode 24 and the pixel electrode 17, an insulating film is further provided as shown in FIG. 2, and in FIG. 2, a gate insulating film formed of silicon nitride or silicon oxide, etc. 13).

In this case, in addition to forming the common electrode 24 first and then forming the pixel electrode 17 thereafter and separating the insulating layer therebetween, the pixel electrode 17 is formed first and the common electrode 24 is subsequently formed. The common electrode 24 and the pixel electrode 17 may be formed on the same layer without forming an insulating film.

A passivation layer 16 is further provided on the entire surface including the pixel electrode 17 to protect various patterns.

Meanwhile, as shown in FIG. 2, on the upper substrate 21, there is a black matrix 22 that prevents light leakage, and a color filter layer made of color resists of R, G, and B between the black matrices 22. 23, an overcoat layer 29 is formed on the color filter layer 23 to protect the color filter layer 23 and to planarize the surface of the color filter layer 23. As shown in FIG.

In this case, the black matrix 23 extends over the common electrodes 24 at both ends of the common electrodes 24 in the pixel to block light leakage at the edges of the pixels.

However, the common electrode 24 formed at the edge of the pixel among the common electrodes 24 may overlap the data line 15 to perform the role of the black matrix 22 instead. At this time, the common electrode 24 should be formed of a light shielding layer such as a metal layer.

The lower substrate 11 and the color filter substrate 21 of the transverse electric field type liquid crystal display device are opposed to each other by a sealing material (not shown) having adhesive properties, as shown in FIG. The liquid crystal layer 31 is formed in between.

In the horizontal field type liquid crystal display device configured as described above, both the common electrode 24 and the pixel electrode 17 are formed on the same substrate so as to rotate the liquid crystal molecules 32 in a horizontal state with respect to the substrate. A voltage is applied between the two electrodes to generate a horizontal electric field with respect to the substrate.

For this reason, the change of the birefringence of the liquid crystal with respect to the visual direction is small, and the viewing angle characteristic is much superior to the conventional TN type liquid crystal display device.

3 is a voltage distribution diagram of a general transverse electric field liquid crystal display device, and FIGS. 4A and 4B are plan views of a transverse electric field liquid crystal display device when no voltage is applied and applied.

As shown in FIG. 3, when 5V is applied to the common electrode 24 and 0V is applied to the pixel electrode 17, an equipotential surface is distributed parallel to the electrode in the portion immediately above the electrode, and rather in the region between the two electrodes. The equipotential surface is distributed close to the vertical.

Therefore, since the direction of the electric field is perpendicular to the equipotential surface, a horizontal electric field rather than a vertical electric field is present between the common electrode 24 and the pixel electrode 17, a vertical electric field rather than a horizontal electric field on each electrode, and horizontal and vertical at the electrode edges. The electric field is complex.

The transverse electric field type liquid crystal display device uses the electric field to control the arrangement of liquid crystal molecules.

As shown in FIG. 4A, when a sufficient voltage is applied to the liquid crystal molecules 32 initially oriented in the same direction as the transmission axis of one polarizing plate, as shown in FIG. 4B, the long axis of the liquid crystal molecules 32 is the electric field. Are arranged side by side. If the dielectric anisotropy of the liquid crystal is negative, the short axis of the liquid crystal molecules is arranged side by side in the electric field.

Specifically, the first and second polarizing plates attached to the outer substrates of the lower substrate and the upper substrate that are opposed to each other are disposed such that their transmission axes are perpendicular to each other, and the rubbing direction of the alignment layer formed on the lower substrate is determined by the transmission axis of any one polarizing plate. Side by side is normally black mode.

That is, if no voltage is applied, the liquid crystal molecules 32 are arranged as shown in FIG. 4A to show a black state, and if voltage is applied, the liquid crystal molecules 32 are shown as shown in FIG. 4B. It is arranged side by side in the electric field to indicate a white state.

However, the transverse electric field type liquid crystal display according to the related art has an advantage of having a wide viewing angle. However, when a computer is used for personal reasons, such an advantage may cause a negative function of invading privacy from neighboring people.

Therefore, in the related art, a liquid crystal panel for viewing angle control is further attached to the main liquid crystal panel for security or privacy protection, thereby realizing a narrow viewing angle by causing excessive light leakage in a black state in left and right viewing angle directions. In addition to the additional liquid crystal panel to be manufactured, there is a problem that the thickness and weight of the product is more than doubled, and misalignment when attaching the liquid crystal panel and the main liquid crystal panel for the field of view control This may occur, and when used in the wide viewing angle mode, since the light incident from the backlight must pass through the liquid crystal panel for the field of view control, there is a problem that the front luminance may be significantly reduced.

The present invention includes a red, green, and blue subpixel region and a subpixel region for visual field control to facilitate a manufacturing process, and to provide a transverse electric field type liquid crystal display device capable of selectively driving a narrow viewing angle mode and a wide viewing angle mode, and a manufacture thereof. It is a first object to provide a method.

Another object of the present invention is to provide a transverse electric field type liquid crystal display device and a method of manufacturing the same, which prevents light leakage due to step generation while preventing exposure of the black matrix.

The transverse electric field type liquid crystal display device of the present invention for achieving the above-mentioned first and second objects crosses the first substrate and the second substrate vertically and horizontally on the first substrate for red, green, blue, and visual field control. A gate wiring and a data wiring defining a subpixel region, a thin film transistor formed at an intersection region of the gate wiring and a data wiring, a first pixel electrode formed to be alternately spaced apart from each other in the red, green, and blue subpixel regions; A first common electrode, a second pixel electrode formed in the field of view control subpixel region, a black matrix formed at a position corresponding to a boundary of the subpixel region and a thin film transistor on the second substrate, and on the black matrix An overcoat layer formed on the red, green, and blue subpixel regions, and formed on the black matrix to correspond to the second pixel electrode. And the second common electrode forms an electric field or electroless state.

Red, green, and blue color filters are further formed on positions corresponding to the red, green, and blue subpixels on the black matrix of the second substrate.

When the black matrix is formed of a metal layer, the overcoat layer is formed so that the black matrix is not exposed.

When the black matrix is formed of an organic resin material, the overcoat layer is formed to expose the black matrix.

When the black matrix protective film of the organic resin material is further provided on the black matrix of the metal layer, the overcoat layer is formed to expose the black matrix protective film.

The method of manufacturing a transverse electric field type liquid crystal display device of the present invention for achieving the above-described first and second objects defines a red, green, and blue subpixel area and a subpixel area for view control by crossing each other on a first substrate. Forming a gate wiring and a data wiring; forming a thin film transistor at a position where the gate wiring and the data wiring cross; and a plurality of first parallel to the data wiring in the red, green, and blue subpixel regions; Forming a common electrode, a plurality of first pixel electrodes intersecting with the first common electrode, forming a second pixel electrode in the field of view control subpixel area, and forming a second pixel electrode facing the first substrate. Forming a black matrix on a second substrate, forming a red, green, and blue color filter on a second substrate on which the black matrix is formed; Forming an overcoat layer in the red, green, and blue subpixel regions on the filter; forming a second common electrode on a second substrate on the second substrate on which the overcoat layer is formed; And forming a liquid crystal layer between the first and second substrates.

When the black matrix is formed of a metal layer, the overcoat layer is formed so that the black matrix is not exposed.

When the black matrix is formed of an organic resin material, the overcoat layer is formed to expose the black matrix.

When the black matrix protective film of the organic resin material is further provided on the black matrix of the metal layer, the overcoat layer is formed to expose the black matrix protective film.

An embodiment of a transverse electric field type liquid crystal display device and a method of manufacturing the same according to the present invention having the above characteristics will be described in detail with reference to the accompanying drawings.

5 illustrates a TFT array substrate 100 of a transverse electric field type liquid crystal display device according to the present invention.

As shown in FIG. 5, the TFT array substrate 100 includes a lower substrate 111, a plurality of gate wirings 112 arranged in a row on the lower substrate 111, and perpendicular to the gate wiring 112. A plurality of intersecting data lines 115 and a plurality of sub-pixel regions Pr, Pg, Pb, and Pv defined by the gate lines 112 and the data lines 115 are provided.

Meanwhile, four subpixel regions of the plurality of subpixel regions, that is, a red subpixel region Pr, a green subpixel region Pg, a blue subpixel region Pb, and a white subpixel region Pv, It is defined as a pixel area.

In this case, each of the red subpixel area Pr, the green subpixel area Pg, the blue subpixel area Pb, and the white subpixel area Pv is formed at the intersection of the data line and the gate line to switch voltage. And a thin film transistor (TFT).

Meanwhile, three subpixel regions of the four subpixel regions, that is, the red subpixel region Pr, the green subpixel region Pg, and the blue subpixel region Pb are common to the gate wiring 112 in common. The plurality of common electrodes 124 branched from the wiring 125 to the subpixel area, and the pixel electrode 117 connected to the thin film transistor and adjacent to the common electrode 124 formed in the subpixel area are formed. It is provided.

The white subpixel region Pv, which is the remaining subpixel region of the four subpixel regions, includes a pixel electrode 517 for controlling the field of view, which is connected to the thin film transistor and is formed as a plate in the subpixel region.

The subpixel area, that is, the white subpixel area, including the view control pixel electrode 517 formed of this plate is referred to as the view control subpixel area.

This will be described in more detail with reference to FIG. 7, which is a cross-sectional view taken along line II-II ′ of FIGS. 5 and 5. 7 is a cross-sectional view illustrating a TFT array substrate of the liquid crystal display device according to the first embodiment of the present invention on the line II-II ′ of FIG. 5.

5 and 7 illustrate a blue subpixel region Pr and a white subpixel region Pv among a plurality of subpixel regions of the TFT array substrate according to the present invention.

The TFT array substrate 100 on which the blue subpixel region Pr and the white subpixel region Pv are formed has a lower substrate 111 and a gate wiring of a low resistance metal material on the lower substrate 111 (not shown in FIG. 7). In FIG. 5, 112 is formed in predetermined regions, and a gate insulating layer 113, such as an inorganic insulating material, is formed on the lower substrate 111 on which the gate wiring is formed. The data line 115, which is a low-resistance metal material intersecting with the gate line of the substrate on which the gate insulating layer 113 is formed, is formed. A protective film 116, which is an organic insulating material, is formed on the substrate on which the data line 115 is formed.

The common electrode 124 branched from the common wiring and the pixel electrode 117 adjacent to the common electrode 124 are formed in the blue subpixel region Pr on which the protective film 116 is formed. In the formed white subpixel area Pv, only the pixel electrode 517 for view control, which is formed as a plate in the area, is formed.

In addition, the pixel electrode 117 formed in the blue subpixel area Pr and the pixel electrode 517 for view control formed in the white subpixel area Pv are respectively the drain electrode 115a of the thin film transistor (TFT in FIG. 5). Each is connected.

In this case, the thin film transistor (TFT of FIG. 5) may include a gate electrode 112a branched from the gate line 112, a gate insulating layer 113 formed on the entire surface including the gate electrode 112a, and the gate electrode ( The semiconductor layer 114 formed by sequentially depositing amorphous silicon (a-si) and amorphous silicon ion-implanted with impurities into the gate insulating layer 113 on the upper portion and the data line 115 branched off from the semiconductor layer ( 114) source / drain electrodes 115a and 115b respectively formed on the edges.

Next, FIG. 6 illustrates the color filter array substrate 120 disposed to face the TFT array substrate 100 with the liquid crystal layer 132 interposed therebetween.

More detailed description will be made with reference to FIG. 7, which is a cross-sectional view taken along line III-III ′ of FIGS. 6 and 6. FIG. 7 is a cross-sectional view of a transverse electric field type liquid crystal display device according to a first exemplary embodiment of the present invention on the line II-II ′ of FIG. 5.

6 and 7, the color filter array substrate 120 includes an upper substrate 121, a thin film transistor (TFT) region, a gate wiring 112, and a data wiring 115 of the lower substrate 111. ) And a black matrix 122 formed to block the light leakage generating region around the light matrix.

In this case, the black matrix 222 uses a metal such as chromium oxide (CrOx) or chromium (Cr).

In this case, each of the red subpixel area Pr, the green subpixel area Pg, the blue subpixel area Pb, and the white subpixel area Pv of the lower substrate 121 on which the black matrix 122 is formed is formed in the black. Red, Green, and Blue containing pigments that implement color in the red subpixel area Pr, green subpixel area Pg, and blue subpixel area Pb on the matrix 122. A color filter layer 123 in which color resists of blue are arranged in a predetermined order, and an overcoat layer 129 for planarizing an inner surface of the upper substrate are formed.

The field control subpixel area, which is a white subpixel area of the lower substrate 121 on which the black matrix 122 is formed, has a common electrode 524 for viewing control on the black matrix 122. The field control common electrode 524 is connected to the field control common wiring 525, and the field control common wiring 525 is formed on the patterned overcoat layer 129.

The transverse electric field type liquid crystal display device having the TFT array substrate 100 and the color filter array substrate 120 configured as described above is driven in a wide viewing angle mode and a narrow viewing angle mode.

In more detail, when driving in the wide viewing angle mode, a black voltage is applied to the subpixel area Pv for the field of view control to be in a black state. In this case, when no voltage is applied to the red, green, and blue subpixel areas Pr, Pg, and Pb, the entire black state is displayed. When the voltage is applied, the white state is displayed.

In the narrow viewing angle mode, when an appropriate voltage is applied to the subpixel region Pv for view control, the liquid crystal molecules are twisted and arranged vertically. In this case, when no voltage is applied to the red, green, and blue subpixel areas Pr, Pg, and Pb, since a horizontal electric field is not formed, it is represented as normally black mode, and thus red, green, and no voltage are applied at the front viewing angle. Retardation is largely represented by the liquid crystal molecules of the subpixel region Pv for visual field control, which is expressed in the normally black mode by the blue subpixel regions Pr, Pg, and Pb, and at the left and right viewing angles. The contrast is reduced, and light leakage occurs due to an overcoat layer step between the subpixel area Pv for viewing control and the other subpixel areas Pr, Pg, and Pb. You will have a viewing angle.

In addition, when voltage is applied to the red, green, and blue subpixel regions Pr, Pg, and Pb, a horizontal electric field is formed, and thus, red, green, and blue subpixel regions Pr, Pg, and Pb applied to the voltage at the front viewing angle. In the left and right viewing angle directions, retardation is largely generated by the liquid crystal molecules of the subpixel region Pv for which voltage is applied, so that contrast is reduced. Left, right viewing angles get worse and have a narrow viewing angle.

Such a transverse electric field type liquid crystal display device can be selectively driven in a wide viewing angle mode and a narrow viewing angle mode.

On the other hand, as shown in Figure 7, due to the black matrix 122 of the metal layer, the red, green, blue subpixel regions (Pr, Pg, Pb) and the overcoat layer 129 on which the overcoat layer 129 is formed are formed. Steps are generated in the unused white subpixel area Pv, which may cause light leakage.

8 is a transverse electric field liquid crystal display according to a second embodiment of the present invention in which light leakage is prevented due to a reduced step between red, green, and blue subpixel areas Pr, Pg, and Pb and white subpixel areas Pv. The device is shown.

The TFT array substrate 100 shown in FIG. 8 has the same structure as the TFT array substrate 100 shown in FIG.

As shown in FIG. 8, the color filter array substrate 220 includes an upper substrate 221, a thin film transistor (TFT) region, a gate wiring 112, a data wiring 115, and the like of the lower substrate 111. The black matrix 222 is formed to block the surrounding light leakage generating region.

In this case, the black matrix 222 forms a carbon-based organic resin material.

In this case, each of the red subpixel area Pr, the green subpixel area Pg, the blue subpixel area Pb, and the white subpixel area Pv of the lower substrate 221 on which the black matrix 222 is formed, is black. Red, Green, and Blue containing pigments that implement color in the red subpixel area Pr, green subpixel area Pg, and blue subpixel area Pb on the matrix 222. A color filter layer 223 in which color resists of blue are arranged in a predetermined order, and an overcoat layer 229 for planarizing the inner surface of the upper substrate are formed.

In addition, in the field control subpixel area, which is a white subpixel area of the lower substrate 221 on which the black matrix 222 is formed, the field control common electrode 624 is formed on the black matrix 222. The field control common electrode 624 is connected to the field control common wiring 625, and the field control common wiring 625 is formed on a black matrix 222 formed of a carbon-based organic resin material.

The overcoat layer 229 is patterned on the black matrix 222 by a black matrix 222 formed of a carbon-based organic resin material to a lower height than the overcoat layer 129 of the first embodiment of the present invention. Can be formed.

In other words, the overcoat layer 229 in the first embodiment of the present invention flattens the inner surface of the upper substrate while simultaneously preventing the short circuit of the black matrix 129 formed of the metal material and the electrodes formed on the overcoat layer. Although the black matrix should be formed to completely overlap, the second embodiment of the present invention forms the black matrix 222 with a carbon-based organic resin material, so that the overcoat layer flattens the inner surface of the upper substrate. It may be formed only in order to have a thickness lower than that of the overcoat layer 129 in the first embodiment of the present invention.

Therefore, due to the black matrix 222 of the organic resin material, the red, green, and blue subpixel regions Pr, Pg, and Pb on which the overcoat layer 229 is formed and the white subpixel region on which the overcoat layer 229 is not formed are formed. The step difference in (Pv) can be reduced to prevent the occurrence of light leakage.

Meanwhile, after the black matrix 222 of the organic resin material is formed, a subsequent process, that is, a process of forming the common wire 625 for controlling the field of view and the common electrode 624 for controlling the field of view, should be performed. Process defects, such as peeling, occur in the black matrix 222 of the resin material, and the peeled organic resin material is exposed to the liquid crystal and the alignment layer to cause an afterimage.

FIG. 9 illustrates a liquid crystal display of a transverse electric field method according to a third embodiment of the present invention in which light leakage is prevented due to a step difference while preventing exposure of the black matrix 222.

The TFT array substrate 100 shown in FIG. 9 has the same structure as the TFT array substrate 100 shown in FIG.

As shown in FIG. 9, the color filter array substrate 300 includes an upper substrate 321, a thin film transistor (TFT) region, a gate wiring 112, a data wiring 115, and the like of the lower substrate 111. The black matrix 721 formed of a metal material to block surrounding light leakage generation regions, and the black matrix protective layer 722 formed of an organic resin material overlapping the black matrix 721 to prevent the black matrix 721 from being exposed. A color filter layer 323 in which blue color resists containing pigments that implement color in the blue subpixel area Pb are arranged in a predetermined order, and an overcoat layer for planarizing an inner surface of the upper substrate ( 329) is formed.

In addition, a part of the black matrix passivation layer 722 overlaps with a portion of the black matrix passivation layer 722 in the field control subpixel area Pv on which the black matrix 721 is formed, and a view control common electrode 724 is formed on the entire surface of the field control subpixel area. The field control common electrode 724 is connected to the field control common wiring 725, and the field control common wiring 725 is formed to overlap a part of the black matrix protective layer 722.

10A to 10D are process flowcharts illustrating a method of manufacturing a color filter array substrate of a transverse electric field type liquid crystal display device according to a third embodiment of the present invention.

First, as illustrated in FIG. 10A, metal materials such as chromium oxide (CrOx) or chromium (Cr) and organic resin materials such as carbon may be sequentially disposed on the substrate 321 on which the color filter array substrate is to be formed. To be deposited.

Subsequently, a patterning process using a photolithography process or the like is performed on the organic resin material and the metal material to form a black matrix 721 and a black matrix protective layer 722. Meanwhile, the line width of the black matrix 721 is formed to be wider than the line width of the black matrix protective layer 722 during the patterning process.

Subsequently, as shown in FIG. 10B, a heat treatment process is performed on the entire surface of the substrate on which the black matrix protective layer 722 is formed so that the black matrix protective layer 722 is also formed on the sidewall of the black matrix 721.

That is, when the heat treatment process is performed on the black matrix protective layer 722 formed of the organic resin material, the black matrix protective layer 722 that is wider than the line width of the black matrix 721 flows, and thus the sidewalls of the black matrix 721 The black matrix protective layer 722 is formed.

Next, as shown in FIG. 10C, the blue subpixel area Pb on the black matrix 721 includes a blue color containing a pigment that implements color in the blue subpixel area Pb. After applying a resist and irradiating light with a mask, a developer is applied to form a desired pattern to complete the color filter layers 323 of R, G, and B in each pixel region.

Subsequently, an overcoat layer 329 is formed by coating an insulating material on the entire surface of the substrate 111 on the color filter layer 323.

As shown in FIG. 10D, a metal material of a low resistance material is deposited on the white subpixel area Pv, and then a patterning process such as a photolithography process is performed to form a common wiring 725 for the subpixel. .

Subsequently, a transparent conductive film is deposited on the entire surface of the substrate 321 on which the common pixel 725 for the sub pixel is formed, and then a patterning process such as a photolithography process is performed to be adjacent to the common pixel 725 for the sub pixel. The common electrode 724 is formed.

Accordingly, in the transverse electric field type liquid crystal display device which can be implemented by selecting the wide viewing angle mode or the narrow viewing angle mode as described above, the black matrix protective film is formed on the black matrix and then the overcoat layer is formed to thereby expose the black matrix. While preventing the light leakage phenomenon due to the step difference is prevented.

Although the present invention has been described in detail with reference to specific examples, this is for describing the present invention in detail, and the transverse electric field type liquid crystal display device and the manufacturing method thereof according to the present invention are not limited thereto, and the present invention is not limited thereto. It is apparent that modifications and improvements are possible by those skilled in the art.

The present invention can select and implement a wide viewing angle mode or a narrow viewing angle mode in a transverse electric field type liquid crystal display device, and has a first effect of improving security of an individual.

In addition, the present invention has a second effect that the process is simple and excellent in light efficiency by adding a subpixel for view control inside the liquid crystal panel to control the viewing angle without having to provide a separate device outside the liquid crystal panel for controlling the viewing angle. .

In addition, the present invention provides a user with resilience to the security range, and can be used not only for one person, but also when using more than one person can see the screen in high quality without inconvenience and secure a third security It works.

In addition, the present invention has a fourth effect of forming a black matrix protective film on the black matrix and then forming an overcoat layer to prevent light leakage due to step generation while preventing exposure of the black matrix.

Claims (18)

A first substrate and a second substrate; Gate wiring and data wiring intersecting longitudinally and horizontally on the first substrate to define red, green, blue, and sub-pixel areas for view control; A thin film transistor formed at an intersection of the gate wiring and the data wiring; A first pixel electrode and a first common electrode which are alternately spaced apart from each other in the red, green, and blue subpixel regions; A second pixel electrode formed in the field control subpixel area; A black matrix formed of a metal layer on a boundary of the subpixel region and a position corresponding to the thin film transistor on the second substrate; And a second common electrode formed on the black matrix to correspond to the second pixel electrode. The method of claim 1, And a red, green, and blue color filter formed at a position corresponding to the red, green, and blue subpixels on the black matrix of the second substrate. According to claim 1, And an overcoat layer formed on the red, green, and blue subpixel areas on the black matrix. The method of claim 3, wherein the overcoat layer And the black matrix is formed so as not to be exposed. The method of claim 1, wherein the black matrix A transverse electric field liquid crystal display device, further comprising a black matrix protective film of an organic resin material. The method according to claim 3 or 5, wherein the overcoat layer And the black matrix protective layer is exposed. A first substrate and a second substrate; Gate wiring and data wiring intersecting longitudinally and horizontally on the first substrate to define red, green, blue, and sub-pixel areas for view control; A thin film transistor formed at an intersection of the gate wiring and the data wiring; A first pixel electrode and a first common electrode formed to be staggered from each other at predetermined intervals in the red, green, and blue subpixel areas; A second pixel electrode formed in the field control subpixel area; A black matrix formed of an organic resin material on a boundary of the subpixel region and a position corresponding to the thin film transistor on the second substrate; And a second common electrode formed on the black matrix to correspond to the second pixel electrode. The method of claim 7, wherein And a red, green, and blue color filter formed at a position corresponding to the red, green, and blue subpixels on the black matrix of the second substrate. The method of claim 7, wherein And an overcoat layer formed on the red, green, and blue subpixel areas on the black matrix. The method of claim 9, wherein the overcoat layer And the black matrix is exposed to each other. Forming a gate line and a data line on the first substrate, the gate line and the data line defining red, green, and blue subpixel areas and a subpixel area for view control; Forming a thin film transistor at a position where the gate line and the data line cross each other; Forming a plurality of first common electrodes parallel to the data lines in the red, green, and blue subpixel regions, and a plurality of first pixel electrodes that cross and cross the first common electrodes; Forming a second pixel electrode in the field control subpixel area; Forming a black matrix on a second substrate facing the first substrate with a metal layer; Forming red, green and blue color filters on the second substrate on which the black matrix is formed; Forming a second common electrode at a position corresponding to the second pixel electrode on a second substrate on which the overcoat layer is formed; Forming a liquid crystal layer between the first and second substrates. 12. The method of claim 11, further comprising forming an overcoat layer in the red, green, and blue subpixel areas on the color filter. The method of claim 11 or 12, wherein the overcoat layer And the black matrix is formed so as not to be exposed. The method of claim 11, wherein the black matrix The transverse electric field liquid crystal display device further comprising the step of forming a black matrix protective film of an organic resin material. The method according to claim 12 or 14, wherein the overcoat layer And the black matrix protective layer is exposed. Forming a gate line and a data line on the first substrate, the gate line and the data line defining red, green, and blue subpixel areas and a subpixel area for view control; Forming a thin film transistor at a position where the gate line and the data line cross each other; Forming a plurality of first common electrodes parallel to the data lines in the red, green, and blue subpixel regions, and a plurality of first pixel electrodes that cross and cross the first common electrodes; Forming a second pixel electrode in the field control subpixel area; Forming a black matrix of an organic resin material on a second substrate facing the first substrate; Forming red, green and blue color filters on the second substrate on which the black matrix is formed; Forming a second common electrode at a position corresponding to the second pixel electrode on a second substrate on which the overcoat layer is formed; Forming a liquid crystal layer between the first and second substrates. 17. The method of claim 16, further comprising forming an overcoat layer in the red, green, and blue subpixel areas on the color filter. The method of claim 17, wherein the overcoat layer is And forming the black matrix so as to expose the black matrix.

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