KR20070016640A - Plasma generator for preprocessing in parylene coating - Google Patents

Plasma generator for preprocessing in parylene coating Download PDF

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KR20070016640A
KR20070016640A KR1020050071465A KR20050071465A KR20070016640A KR 20070016640 A KR20070016640 A KR 20070016640A KR 1020050071465 A KR1020050071465 A KR 1020050071465A KR 20050071465 A KR20050071465 A KR 20050071465A KR 20070016640 A KR20070016640 A KR 20070016640A
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vacuum chamber
base material
positive electrode
negative electrode
vacuum
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KR100735868B1 (en
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하재영
배상균
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주식회사 누리테크
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32825—Working under atmospheric pressure or higher
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges

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Abstract

본 발명은 플라즈마 발생장치에 관한 것으로서, 특히 진공챔버 내의 전극 사이에 모재를 수납할 수 있는 모재수납판을 착탈가능하게 설치하고 진공펌프를 진공챔버 내벽 여러 곳으로 연통시킴으로써, 모재에 패럴린 코팅을 하기 전에 모재표면을 효율적으로 세정, 개질하여 고분자막과의 접착성을 향상시키는 패럴린 코팅 전처리용 플라즈마 발생장치에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma generating apparatus, and in particular, a base material storage plate capable of accommodating a base material between electrodes in a vacuum chamber is detachably installed, and a parallel pump is applied to the base material by communicating a vacuum pump to various places inside the vacuum chamber. Prior to the present invention relates to a plasma generating apparatus for the parine coating pre-treatment to efficiently clean and modify the surface of the base material to improve the adhesion to the polymer film.

본 발명은 도어가 구비된 진공챔버 내에 간격을 두고 상하 교대로 설치되며 고주파가 인가되는 음전극 및 양전극과; 상기 음전극 및 양전극의 사이에 설치되며 모재를 수납할 수 있도록 다수의 슬릿이 형성되는 모재수납판과; 상기 진공챔버 내로 연장된 가스분사구를 통해 반응가스를 공급하는 가스탱크; 및 상기 진공챔버의 일측벽에 구비된 배출관을 통해 진공챔버 내의 압력을 조절하는 진공펌프; 로 구성된다.The present invention is provided with a negative electrode and a positive electrode which is installed up and down alternately at intervals in the vacuum chamber provided with a door to which high frequency is applied; A base material storage plate installed between the negative electrode and the positive electrode and having a plurality of slits formed therein to receive the base material; A gas tank supplying a reaction gas through a gas injection port extending into the vacuum chamber; And a vacuum pump controlling a pressure in the vacuum chamber through a discharge pipe provided at one side wall of the vacuum chamber. It consists of.

플라즈마, 코팅, 패럴린, 모재수납판, 전처리, 가스분사구 Plasma, coating, paraline, base material storage plate, pretreatment, gas jet

Description

패럴린 코팅 전처리용 플라즈마 발생장치{PLASMA GENERATOR FOR PREPROCESSING IN PARYLENE COATING}Plasma generator for preparative coating {PLASMA GENERATOR FOR PREPROCESSING IN PARYLENE COATING}

도 1은 본 발명에 따른 패럴린 코팅 전처리용 플라즈마 발생장치를 나타내는 정단면도,1 is a front cross-sectional view showing a plasma generating apparatus for the parallel treatment preparative according to the present invention,

도 2는 본 발명에 따른 패럴린 코팅 전처리용 플라즈마 발생장치를 나타내는 측단면도,Figure 2 is a side cross-sectional view showing a plasma generating apparatus for the parine coating pre-treatment according to the present invention,

도 3은 본 발명에 따른 패럴린 코팅 전처리용 플라즈마 발생장치를 나타내는 횡단면도이다.Figure 3 is a cross-sectional view showing a plasma generating apparatus for the parallel treatment preparative according to the present invention.

<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>

10: 진공챔버 11: 힌지10: vacuum chamber 11: hinge

12: 도어 13: 가이드레일12: Door 13: Guide rail

15: 배출관 20: 음전극15: discharge pipe 20: negative electrode

30: 양전극 40: 모재수납판30: positive electrode 40: base material storage plate

51: 가스분사구 52: 분사노즐51: gas injection port 52: injection nozzle

60: 진공펌프 70: 오일클리너60: vacuum pump 70: oil cleaner

본 발명은 플라즈마 발생장치에 관한 것으로서, 더욱 상세하게는 패럴린 코팅의 전처리 과정으로 모재표면에 플라즈마를 효율적으로 가하여 모재표면을 세정, 개질해서 고분자막과의 접착성을 향상시키는 패럴린 코팅 전처리용 플라즈마 발생장치에 관한 것이다.The present invention relates to a plasma generating device, and more particularly, to a paraline coating pretreatment plasma, in which a plasma is effectively applied to a base material surface to clean and modify the base material surface to improve adhesion to a polymer film. It relates to a generator.

플라스틱은 최근 정보화시대에 발맞춰 각 개인의 정보보관을 위한 신분증(예컨대, 주민등록증, 운전면허증, 여권, 기업내 신분증/출입증 등) 또는 신용카드 등에 널리 사용되고 있다.Plastics are widely used in identification cards (such as national ID cards, driver's licenses, passports, corporate ID cards / passports, etc.) or credit cards in keeping with the information age.

플라스틱으로 제작된 신분증 또는 신용카드 등은 사용중 많은 손상이 발생하는데, 신분증의 경우 표면에 인쇄된 인쇄물이 쉽게 화공약품(예를 들어, 유기용매 또는 산)에 지워지기 때문에 범죄의 목적으로 위조되기도 하고, 신용카드의 경우 표면의 자성띠에서 손상이 발생하게 되면 신용카드의 사용이 불가능해진다.ID cards or credit cards made of plastics cause a lot of damage during use. ID cards can be forged for criminal purposes because printed materials on the surface are easily erased by chemicals (eg organic solvents or acids). In the case of a credit card, damage to the magnetic strip on the surface of the credit card makes it impossible to use the credit card.

그에 따라, 화학적 내식성 및 열적 안정성이 높은 고분자물질을 코팅하여 신용카드의 손상, 신분증의 위조를 방지하는 기술이 제안되고 있지만, 현재 제안된 기술들에 의해 완성된 신용카드 또는 신분증의 경우 그 고분자물질의 불균일한 코팅으로 인해 취약한 부분이 발생한다.Accordingly, a technique for preventing damage to credit cards and forgery of identification cards by coating polymer materials having high chemical corrosion resistance and thermal stability is proposed, but in the case of credit cards or ID cards completed by the currently proposed technologies, The uneven coating of the vulnerable part occurs.

한편, 패럴린(Parylene)은 기상증착이 가능한 고분자 군들로 구성되며 치환기에 따라 그 명칭이 부여되는데, 어떠한 모재에도 그 형태에 관계없이 균일하게 코팅이 가능하고 특히 깊은 구멍이나 크랙 등의 속에 치밀하게 코팅될 수 있는 특징이 있다.On the other hand, parylene is composed of a group of polymers capable of vapor deposition and its name is given according to the substituent. It can be uniformly coated on any base material regardless of its shape, and especially in deep holes or cracks. There is a feature that can be coated.

그리고, 투명하고 화학적으로 매우 안정할 뿐만 아니라 현존하는 어떠한 화학용제에도 쉽게 용해되지 않기 때문에 그동안 의료장비나 전자패키징 등에 패럴린 코팅이 광범위하게 사용되어져 왔다.In addition, since it is transparent and chemically very stable and does not dissolve easily in any existing chemical solvents, the paraline coating has been widely used in medical equipment and electronic packaging.

그런데, 종래의 패럴린 코팅막은 모재에 별도의 전처리 과정없이 모재표면에 곧바로 증착되기 때문에 모재와의 접착력이 다소 약해서 강한 충격에 의해 벗겨지거나 쉽게 마모되는 등 변형이 발생한다.However, since the conventional paraline coating film is directly deposited on the surface of the base material without a separate pretreatment process, the adhesive force with the base material is somewhat weak, so that deformation occurs such as peeling off or being easily worn by a strong impact.

본 발명은 상기와 같은 종래 기술의 문제점을 해결하기 위하여 안출된 것으로서, 모재에 패럴린 코팅을 하기 전에 플라즈마에 의한 세정 및 표면개질을 편리하면서도 효과적으로 수행할 수 있는 패럴린 코팅 전처리용 플라즈마 발생장치를 제공하는데 그 목적이 있다.The present invention has been made in order to solve the problems of the prior art as described above, prior to the parallel coating on the base material, the plasma generating apparatus for the parallel treatment preparative plasma treatment can be carried out conveniently and effectively while the surface modification. The purpose is to provide.

이와 같은 목적을 달성하기 위한 본 발명의 패럴린 코팅 전처리용 플라즈마 발생장치는 도어가 구비된 진공챔버 내에 간격을 두고 상하 교대로 설치되며 고주파가 인가되는 음전극 및 양전극과;In order to achieve the above object, the plasma generating apparatus for the parallel treatment of preparative coating according to the present invention is provided with a negative electrode and a positive electrode, which are alternately installed vertically at intervals in a vacuum chamber provided with a door and to which high frequency is applied;

상기 음전극 및 양전극의 사이에 설치되며 모재를 수납할 수 있도록 다수의 슬릿이 형성되는 모재수납판과; 및A base material storage plate installed between the negative electrode and the positive electrode and having a plurality of slits formed therein to receive the base material; And

상기 진공챔버 내로 연장된 가스분사구를 통해 반응가스를 공급하는 가스탱크; 및A gas tank supplying a reaction gas through a gas injection port extending into the vacuum chamber; And

상기 진공챔버의 일측벽에 구비된 배출관을 통해 진공챔버 내의 압력을 조절 하는 진공펌프;A vacuum pump controlling a pressure in the vacuum chamber through a discharge pipe provided at one side wall of the vacuum chamber;

로 구성되는 것을 특징으로 한다.Characterized in that consists of.

그리고, 상기 모재는 플라스틱, PCB, 종이, 고무 중에서 선택되며, 모재수납판은 진공챔버 양측벽에 설치된 가이드레일을 따라 슬라이딩하면서 착탈가능한 것을 특징으로 한다.The base material is selected from plastic, PCB, paper, and rubber, and the base material storage plate is removable while sliding along guide rails installed on both side walls of the vacuum chamber.

또한, 상기 진공챔버에 구비되며 진공펌프와 연통되는 배출관은 진공챔버의 일측벽 중앙부와 이 중앙부에 대칭되도록 주변부에 여러 개로 형성되는 것을 특징으로 한다.In addition, the discharge chamber provided in the vacuum chamber and in communication with the vacuum pump is characterized in that formed in the peripheral portion so as to be symmetrical to the central portion of the one side wall and the central portion of the vacuum chamber.

한편, 상기 진공챔버에 구비된 가스분사구는 음전극과 양전극의 사이로 길게 연장되어 분사노즐이 진공챔버의 중앙에 위치하는 것을 특징으로 한다.On the other hand, the gas injection port provided in the vacuum chamber is extended between the negative electrode and the positive electrode is characterized in that the injection nozzle is located in the center of the vacuum chamber.

바람직하게는, 상기 진공챔버 내의 압력을 조절하는 진공펌프에는 사용되는 오일을 필터링하는 오일클리너가 구비되는 것을 특징으로 한다.Preferably, the vacuum pump for adjusting the pressure in the vacuum chamber is characterized in that the oil cleaner for filtering the oil used is provided.

이하, 본 발명의 바람직한 실시예를 첨부된 도면을 참조하여 상세히 설명하면 다음과 같다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 1은 본 발명에 따른 패럴린 코팅 전처리용 플라즈마 발생장치를 나타내는 정단면도이고, 도 2는 본 발명에 따른 패럴린 코팅 전처리용 플라즈마 발생장치를 나타내는 측단면도이며, 도 3은 본 발명에 따른 패럴린 코팅 전처리용 플라즈마 발생장치를 나타내는 횡단면도이다.1 is a front cross-sectional view showing a plasma generating apparatus for a parine coating pretreatment according to the present invention, Figure 2 is a side cross-sectional view showing a plasma generating apparatus for a parine coating pretreatment according to the present invention, Figure 3 is a parallel according to the present invention A cross-sectional view showing a plasma generator for lean coating pretreatment.

도시된 바와 같이, 본 발명의 패럴린 코팅 전처리용 플라즈마 발생장치는 진공챔버(10), 음전극(20), 양전극(30), 가스탱크(미도시), 모재수납판(40) 및 진공 펌프(60) 등으로 이루어진다.As shown, the plasma generating apparatus for the parallel treatment of the present invention is a vacuum chamber 10, a negative electrode 20, a positive electrode 30, a gas tank (not shown), a base material storage plate 40 and a vacuum pump ( 60).

진공챔버(10)는 상부 전방에 설치되며 힌지(11)에 의해 회동하면서 개폐되는 도어(12)가 구비되고, 이 진공챔버(10)의 내부에는 고주파가 인가되는 음전극(20)과 양전극(30)이 간격을 두고 상하로 교대 설치된다.The vacuum chamber 10 is provided in the upper front and is provided with a door 12 that opens and closes while being rotated by the hinge 11, the negative electrode 20 and the positive electrode 30 to which a high frequency is applied inside the vacuum chamber 10. ) Alternately installed up and down at intervals.

음전극(Cathode)(20)은 주전극(21)이 진공챔버(10)의 일측 하부로부터 천장 근처까지 뻗은 분배전극(22)으로 연장되며, 이 분배전극(22)은 일정한 간격마다 진공챔버(10)의 타측벽 인접부까지 수평으로 더 연장된다.The negative electrode 20 extends to the distribution electrode 22 in which the main electrode 21 extends from the bottom of one side of the vacuum chamber 10 to the vicinity of the ceiling, and the distribution electrode 22 is a vacuum chamber 10 at regular intervals. Further extends horizontally to the other side wall adjacent to the wall.

양전극(Anode)(30)은 ㄷ자 모양으로 양측단이 상기 수평으로 연장된 음전극(20)의 사이사이에 배치되며 양측단이 진공챔버(10)의 양측벽에 설치된 가이드레일(13)을 따라 전후로 슬라이딩하면서 착탈가능하다.The positive electrode 30 is formed in a U-shape between two horizontal ends between the horizontally extending negative electrodes 20, and both ends are guided back and forth along the guide rails 13 installed on both side walls of the vacuum chamber 10. Detachable while sliding.

상기 가이드레일(13)에는 양전극(30)이 부드럽게 이동하도록 일정한 간격마다 양전극(30)과 접촉하는 롤러를 구비하는 것이 바람직하다.The guide rail 13 is preferably provided with a roller in contact with the positive electrode 30 at regular intervals so that the positive electrode 30 moves smoothly.

모재수납판(40)은 상기 음전극(20) 및 양전극(30)의 사이에 설치되는데, 카드 형태의 모재를 수납할 수 있도록 프레임에 많은 수의 슬릿이 미세한 간격을 두고 세로로 형성되며, 일실시예로 양측 지지대(41)가 양전극(30)에 삽입, 고정된다.The base material storage plate 40 is installed between the negative electrode 20 and the positive electrode 30, and a large number of slits are formed vertically at a fine interval in the frame to accommodate the base material in the form of a card. For example, both support members 41 are inserted into and fixed to the positive electrode 30.

따라서, 모재수납판(40)은 진공챔버(10) 양측벽에 설치된 가이드레일(13)을 따라 슬라이딩하는 양전극(30)과 함께 진공챔버(10)로부터 편리하게 착탈가능해진다.Accordingly, the base material storage plate 40 can be conveniently detached from the vacuum chamber 10 together with the positive electrode 30 sliding along the guide rails 13 provided on both side walls of the vacuum chamber 10.

바람직하게는, 상기 모재로는 플라스틱, PCB, 종이, 고무 등이 사용된다.Preferably, the base material is plastic, PCB, paper, rubber and the like.

본 발명의 다른 실시예로서, 상기 모재수납판(40) 자체를 양전극(30)과 별도 로 진공챔버(10)의 양측벽에 설치된 가이드레일(13)을 따라 슬라이딩하도록 구성하는 것도 가능하다.As another embodiment of the present invention, the base material storage plate 40 itself may be configured to slide along the guide rails 13 installed on both side walls of the vacuum chamber 10 separately from the positive electrode 30.

가스탱크(분출구)(미도시)는 상기 진공챔버(10) 내에서 플라즈마화할 반응가스를 공급하는데, 이를 위해 가스분사구(51)와 연통되며 이 가스분사구(51)는 플라즈마화를 촉진하기 위해 음전극(20)과 양전극(30)의 사이로 길게 수평 연장되어 끝단에 구비된 분사노즐(52)이 진공챔버(10)의 중앙에 위치한다.A gas tank (outlet) (not shown) supplies a reaction gas to be plasmaized in the vacuum chamber 10, for communication with the gas injection port 51, and the gas injection port 51 is a negative electrode to promote plasma formation. A spray nozzle 52 provided at the end extending horizontally between the electrode 20 and the positive electrode 30 is positioned at the center of the vacuum chamber 10.

진공펌프(60)는 진공챔버(10) 내의 압력을 조절하기 위해 진공챔버(10)의 일측벽에 구비된 배출관(15)과 연통되는데, 이 배출관(15)은 압력조절을 신속, 균일하게 수행하기 위해 진공챔버(10)의 일측벽 중앙부와 이 중앙부에 대칭되도록 주변부에 여러 개로(도면에서는 일실시예로 중앙부 포함 3개) 형성된다.The vacuum pump 60 is in communication with the discharge pipe 15 provided on one side wall of the vacuum chamber 10 to adjust the pressure in the vacuum chamber 10, the discharge pipe 15 performs the pressure control quickly and uniformly In order to be symmetrical to the central portion of the one side wall of the vacuum chamber 10 and a plurality of peripheral portions (three in the embodiment including the central portion in the drawing) are formed.

또한, 본 발명의 일실시예로 상기 진공펌프(60)에는 구동을 위해 사용되는 오일 내에 개재되는 불순물을 주기적으로 정제하기 위해 필터가 내장된 오일클리너(70)가 구비될 수 있다.In addition, in one embodiment of the present invention, the vacuum pump 60 may be provided with an oil cleaner 70 with a built-in filter to periodically purify impurities contained in the oil used for driving.

상기와 같이 구성된 본 발명의 패럴린 코팅 전처리용 플라즈마 발생장치는 다음과 같이 작용한다.The plasma generating apparatus for the parallel processing of the present invention configured as described above operates as follows.

먼저, 모재에 패럴린 코팅을 하기 위한 전처리 과정으로 플라즈마 발생장치의 진공챔버(10) 내에 설치된 모재수납판(40)의 슬릿에 모재를 배치시키는데, 이 때 모재수납판(40)이 진공챔버(10)의 가이드레일(13)을 따라 슬라이딩하면서 착탈가능하기 때문에 모재의 수납이 편리하다.First, the base material is disposed in the slit of the base material storage plate 40 installed in the vacuum chamber 10 of the plasma generating apparatus as a pretreatment process for applying a paraline coating on the base material, wherein the base material storage plate 40 is a vacuum chamber ( It is convenient to receive the base material because it is detachable while sliding along the guide rail 13 of 10).

그리고, 진공펌프(60)가 배출관(15)을 통해 진공챔버(10) 내의 압력을 조절 하는데, 배출관(15)이 진공챔버(10)의 일측벽 중앙부와 이 중앙부에 대칭되도록 주변부에 여러 개로 형성되므로 진공챔버(10)의 전 내부공간에 걸쳐서 압력조절을 신속, 균일하게 수행할 수 있다.Then, the vacuum pump 60 adjusts the pressure in the vacuum chamber 10 through the discharge pipe 15, the discharge pipe 15 is formed in a plurality of peripheral parts so as to be symmetrical to the central portion and the central wall of the one side wall of the vacuum chamber 10 Therefore, it is possible to quickly and uniformly adjust the pressure over the entire inner space of the vacuum chamber 10.

특히, 상기 진공펌프(60)에 필터가 내장된 오일클리너(70)를 구비하는 경우에는 구동을 위해 사용되는 오일 내에 개재되는 불순물이 주기적으로 정제되어 진공펌프(60)의 사용수명을 향상시키게 된다.In particular, when the vacuum cleaner 60 includes an oil cleaner 70 having a built-in filter, impurities contained in the oil used for driving are periodically purified to improve the service life of the vacuum pump 60. .

다음에, 가스탱크가 진공챔버(10) 내로 반응가스를 공급하면서 고주파가 인가되는데, 가스탱크와 연통된 가스분사구(51)가 음전극(20)과 양전극(30)의 사이로 길게 수평 연장되면서 분사노즐(52)이 진공챔버(10)의 중앙에 위치하기 때문에 반응가스가 진공챔버(10)의 내부공간에 균등하게 확산되어 플라즈마화가 촉진된다.Next, a high frequency is applied while the gas tank supplies the reaction gas into the vacuum chamber 10. The gas injection port 51 communicating with the gas tank extends horizontally between the negative electrode 20 and the positive electrode 30, and the injection nozzle. Since 52 is located at the center of the vacuum chamber 10, the reaction gas is uniformly diffused in the inner space of the vacuum chamber 10, thereby promoting plasma formation.

이에 더하여, 음전극(20) 중 주전극(21)이 진공챔버(10)의 일측 하부로부터 천장 근처까지 뻗은 분배전극(22)으로 연장되고, 이 분배전극(22)은 일정한 간격마다 진공챔버(10)의 타측벽 인접부까지 수평으로 더 연장됨과 아울러, 양전극(30)이 음전극(20)의 사이사이에 배치되므로 진공챔버(10)의 내부공간 전체에 걸쳐서 공급된 가스의 반응이 더욱 활성화된다.In addition, the main electrode 21 of the negative electrode 20 extends from the lower side of one side of the vacuum chamber 10 to the distribution electrode 22 extending from the bottom to the ceiling, and the distribution electrode 22 is the vacuum chamber 10 at regular intervals. In addition to extending further horizontally to the other side wall adjacent to), the positive electrode 30 is disposed between the negative electrode 20, the reaction of the supplied gas is further activated throughout the entire interior space of the vacuum chamber 10.

이와 같이 구성된 본 발명의 패럴린 코팅 전처리용 플라즈마 발생장치는 모재에 패럴린 코팅을 하기 위한 전처리 과정으로 모재표면에 플라즈마를 편리하면서도 균일하게 가하여 모재표면을 세정, 개질함으로써 궁극적으로 향후 패럴린 고분자막과의 접착성 및 내마모성 등을 현저히 향상시키는 유용한 효과를 발휘한다.Plasma generator for the preparative coating of the present invention configured as described above is a pretreatment process for applying a paraline coating on the base material, thereby conveniently and uniformly applying plasma to the base material surface to clean and modify the base material surface. It has a useful effect of remarkably improving the adhesiveness and abrasion resistance.

본 발명은 기재된 구체예에 대해서만 상세히 기재되었지만 본 발명의 사상과 범위내에서 다양하게 변경 또는 변형하여 실시할 수 있음은 본 발명이 속하는 기술분야의 당업자에게는 자명한 것이며, 따라서 그러한 변경 또는 변형은 첨부된 특허청구범위에 속한다 해야 할 것이다.Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various changes or modifications can be made within the spirit and scope of the present invention, and thus such changes or modifications are attached thereto. Belong to the claims.

Claims (5)

도어가 구비된 진공챔버 내에 간격을 두고 상하 교대로 설치되며 고주파가 인가되는 음전극 및 양전극과;A negative electrode and a positive electrode which are installed alternately in a vertical chamber at intervals in a vacuum chamber provided with a door and to which high frequency is applied; 상기 음전극 및 양전극의 사이에 설치되며 모재를 수납할 수 있도록 다수의 슬릿이 형성되는 모재수납판과;A base material storage plate installed between the negative electrode and the positive electrode and having a plurality of slits formed therein to receive the base material; 상기 진공챔버 내로 연장된 가스분사구를 통해 반응가스를 공급하는 가스탱크; 및A gas tank supplying a reaction gas through a gas injection port extending into the vacuum chamber; And 상기 진공챔버의 일측벽에 구비된 배출관을 통해 진공챔버 내의 압력을 조절하는 진공펌프;A vacuum pump controlling a pressure in the vacuum chamber through a discharge pipe provided at one side wall of the vacuum chamber; 로 구성되는 것을 특징으로 하는 패럴린 코팅 전처리용 플라즈마 발생장치.Plasma generator for parallel processing preparative, characterized in that consisting of. 제 1항에 있어서,The method of claim 1, 상기 모재는 플라스틱, PCB, 종이, 고무 중에서 선택되며, 모재수납판은 진공챔버 양측벽에 설치된 가이드레일을 따라 슬라이딩하면서 착탈가능한 것을 특징으로 하는 패럴린 코팅 전처리용 플라즈마 발생장치.The base material is selected from plastic, PCB, paper, rubber, and the base material storage plate is detachable while sliding along the guide rails installed on both side walls of the vacuum chamber. 제 1항 또는 제 2항에 있어서,The method according to claim 1 or 2, 상기 진공챔버에 구비되며 진공펌프와 연통되는 배출관은 진공챔버의 일측벽 중앙부와 이 중앙부에 대칭되도록 주변부에 여러 개로 형성되는 것을 특징으로 하 는 패럴린 코팅 전처리용 플라즈마 발생장치.And a plurality of discharge pipes provided in the vacuum chamber and communicating with the vacuum pump are formed in a plurality of peripheral parts so as to be symmetrical with the central part of one side wall of the vacuum chamber and the central part of the vacuum chamber. 제 3항에 있어서,The method of claim 3, 상기 진공챔버에 구비된 가스분사구는 음전극과 양전극의 사이로 길게 연장되어 분사노즐이 진공챔버의 중앙에 위치하는 것을 특징으로 하는 패럴린 코팅 전처리용 플라즈마 발생장치.The gas injection port provided in the vacuum chamber is extended long between the negative electrode and the positive electrode so that the injection nozzle is located in the center of the vacuum chamber, the plasma generating apparatus for the parallel treatment preparative. 제 4항에 있어서,The method of claim 4, wherein 상기 진공챔버 내의 압력을 조절하는 진공펌프에는 사용되는 오일을 필터링하는 오일클리너가 구비되는 것을 특징으로 하는 패럴린 코팅 전처리용 플라즈마 발생장치.The plasma generator for controlling the parine coating, characterized in that the vacuum pump for adjusting the pressure in the vacuum chamber is provided with an oil cleaner for filtering the oil used.
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Publication number Priority date Publication date Assignee Title
WO2020004769A1 (en) * 2018-06-29 2020-01-02 한국세라믹기술원 Gas sensor electrode manufacturing method and gas sensor
CN110890267A (en) * 2019-12-24 2020-03-17 昆山索坤莱机电科技有限公司 Plasma photoresist device
CN112820614A (en) * 2020-12-31 2021-05-18 深圳泰德半导体装备有限公司 Plasma cleaning equipment

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EP1073091A3 (en) * 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
WO2001019144A1 (en) * 1999-09-09 2001-03-15 Anelva Corporation Inner-electrode plasma processing apparatus and method of plasma processing

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020004769A1 (en) * 2018-06-29 2020-01-02 한국세라믹기술원 Gas sensor electrode manufacturing method and gas sensor
CN110890267A (en) * 2019-12-24 2020-03-17 昆山索坤莱机电科技有限公司 Plasma photoresist device
CN112820614A (en) * 2020-12-31 2021-05-18 深圳泰德半导体装备有限公司 Plasma cleaning equipment

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