KR20070010777A - PREPARING METHOD FOR PLATEY alpha;- ALUMINA - Google Patents

PREPARING METHOD FOR PLATEY alpha;- ALUMINA Download PDF

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KR20070010777A
KR20070010777A KR1020050065651A KR20050065651A KR20070010777A KR 20070010777 A KR20070010777 A KR 20070010777A KR 1020050065651 A KR1020050065651 A KR 1020050065651A KR 20050065651 A KR20050065651 A KR 20050065651A KR 20070010777 A KR20070010777 A KR 20070010777A
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alumina
plate
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KR100679611B1 (en
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장윤식
이상봉
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주식회사 코델
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00Compounds of aluminium
    • C01F7/02Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/021After-treatment of oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/20Particle morphology extending in two dimensions, e.g. plate-like
    • C01P2004/24Nanoplates, i.e. plate-like particles with a thickness from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/54Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/61Micrometer sized, i.e. from 1-100 micrometer

Abstract

A process of fabricating alpha alumina platelet with desired aspect ratio of 50 to 500 is provided to the alumina platelet with neither twinning nor flocculation but with narrow particle distribution and favorable dispersion, thereby becoming raw material of various pigments, resin filler and/or polishing pad, etc. by furnace cooling hot mixture of alumina powder and other additives. The process includes the steps of: heating a mixture of alumina powder and other additives at elevational temperature rate of 180-1800deg.C/hr up to 800-950deg.C; leaving in-situ the heated material at the purposed temperature for 0.1 to 5 hours; re-heating the mixture at 300-600deg.C/hr up to 1000-1400deg.C; leaving in-situ the heated material at the purposed temperature for 1 to 10 hours; then furnace cooling the hot mixture, so that the alpha alumina platelet is obtained with average particle diameter of 10-50 micrometers, particle thickness of 0.1-0.8 micrometers and aspect ratio of 50-500. The process further includes a step of removing solvent with water at -110deg.C to room temperature after the furnace cooling step.

Description

판상 알파알루미나의 제조방법{Preparing Method for Platey α- Alumina}       Preparation method of plate-shaped alpha alumina {Preparing Method for Platey α-Alumina}

도 1a 및 도 1b는 실시예 1에서 제조한 판상 알파알루미나 입자에 대한 주사전자현미경 사진도이다.        1A and 1B are scanning electron micrographs of the plate-shaped alpha alumina particles prepared in Example 1;

도 2는 실시예 1에서 제조한 판상 알파알루미나 입자에 대한 X선 회절 피크도이다.       2 is an X-ray diffraction peak diagram of the plate-shaped alpha alumina particles prepared in Example 1. FIG.

본 발명은 펄 안료, 화장품의 체질안료, 백색안료, 수지 충진제, 연마패드 등의 원료로서 적합한 판상 알파알루미나의 제조방법에 관한 것이며, 더욱 상세하게는 쌍정이나 응집과, 미립자 또는 단편이 없으며 좁은 입도 분포를 갖고 있어 분산성이 우수한 판상 알파알루미나를 효율적으로 제조하는 방법에 관한 것이다.The present invention relates to a method for producing a plate-shaped alpha alumina suitable as a raw material for pearl pigments, cosmetic pigments, white pigments, resin fillers, polishing pads, etc. More specifically, there are no twins or agglomerates, no fine particles or fragments, and a narrow particle size. It is related with the method of manufacturing plate-like alpha-alumina which has distribution and is excellent in dispersibility efficiently.

일반적으로 판상 알루미나는 육방 타일과 유사한 입자 형태가 특징이며, 입자크기를 입자두께로 나눈 것으로 정의되는 입자의 종횡비는 약 10:1 이상이다. 이러한 입자 크기의 측정은 코울터 멀티사이저 계수기를 사용하는 등의 표준 측정법에 의하여 이루어진다.In general, the plate-shaped alumina is characterized by a particle shape similar to a hexagonal tile, and the aspect ratio of the particle defined as the particle size divided by the particle thickness is about 10: 1 or more. This particle size is measured by standard measurement methods such as using a coulter multisizer counter.

통상적으로 판상 알루미나는 알루미나 수화물을 조절, 하소시켜 시판되고 있으며(예컨대, Alcoa 사의 P-25 알루미나, 또는 Lonza 사의 MNY 알루미나 등), 통칭 "하소 알루미나"인 이러한 판상 알루미나는 작은 판상체들이 상호 강하게 융합된 응집물을 상당량 함유하고 있어 분산성이 열등하므로 화장료나 페인트 등의 안료나 수지 충진제 등으로 사용 시 퍼짐성이나 도막성, 또는 충진성에 문제를 초래하게 될 우려가 크고, 래핑 시에는 원하지 않는 스크래칭이 발생할 우려가 크다.       Typically, plate alumina is marketed by controlling and calcining alumina hydrates (e.g., P-25 alumina from Alcoa, or MNY alumina from Lonza). These plate aluminas, commonly known as "calcined alumina," are strongly fused together with small platelets. Since it contains a considerable amount of aggregates and is inferior in dispersibility, there is a high possibility of causing problems in spreadability, coating properties, or filling properties when used as a pigment or resin filler such as cosmetics or paints, and undesired scratching may occur during wrapping. There is great concern.

이러한 종래의 판상 알루미나가 갖는 문제점을 해소하기 위한 종래의 방안으로서, 일본특허공고 소 35-6977호는 원료에 대한 열처리 공정으로서 불화알루미늄 등의 광화제를 첨가하는 방법을 제안하고 있으며, 또한 일본특허공고 소 37-7750호는 수열합성법을 제안하고 있다. 그러나 이들 제조방법에 의하면 제조되는 판상 알루미나 입자의 입경의 제어가 곤란할 뿐만 아니라, 특히 판상 입자의 두께 박형화에 심각한 곤란성이 있다는 문제점이 있었다.        As a conventional method for solving the problems of the conventional plate-shaped alumina, Japanese Patent Publication No. 35-6977 proposes a method of adding a mineralizer such as aluminum fluoride as a heat treatment step for the raw material, and also a Japanese patent Bulletin 37-7750 proposes a hydrothermal synthesis method. However, according to these production methods, not only the particle size of the plate-shaped alumina particles produced is difficult to control, but there is a problem in that the thickness reduction of the plate-shaped particles is particularly difficult.

따라서 본 발명의 목적은 쌍정이나 응집, 미립자 또는 단편이 없으며, 좁은 입도 분포를 갖고 있어 분산성이 우수한 판상 알파알루미나의 효과적인 제조방법을 제공하기 위한 것이다.       Accordingly, an object of the present invention is to provide an effective method for producing a plate-shaped alpha alumina, which is free from twins, agglomerates, fine particles or fragments, has a narrow particle size distribution and is excellent in dispersibility.

상기한 본 발명의 목적을 원활히 달성하기 위한 본 발명의 바람직한 일 양태(樣態)에 따르면, 융제법에 의한 판상 알루미나의 제조방법에 있어서, 180~1800℃/hr의 승온 속도로 700~950℃ 까지 가열한 다음 0.1~5 시간 유지한 후, 다시 30~600℃/hr의 승온 속도로 1000~1400℃까지 재가열한 다음 1~10시간 유지 시킨 후, 실온까지 노냉(爐冷)하는 것으로 구성되는, 평균 입경이 10~50㎛이고 입자 두께 가 0.1~0.8㎛이며, 종횡비가 50~500인 판상 알파알루미나의 제조방법이 제공된다.       According to one preferred aspect of the present invention for smoothly achieving the above object of the present invention, in the method for producing a plate-shaped alumina by the fluxing method, the temperature is 700 to 950 ° C at a temperature increase rate of 180 to 1800 ° C / hr. It is heated to up to 0.1 ~ 5 hours, then reheated up to 1000 ~ 1400 ℃ at a heating rate of 30 ~ 600 ℃ / hr, and then maintained for 1 ~ 10 hours, and then cooled to room temperature. A method for producing a plate-shaped alpha alumina having an average particle diameter of 10 to 50 µm, a particle thickness of 0.1 to 0.8 µm, and an aspect ratio of 50 to 500 is provided.

상기한 본 발명의 목적을 원활히 달성하기 위한 본 발명의 바람직한 다른 일 양태에 따르면, 상기한 첫 번째 내지 두 번째 양태에 있어서 상기한 노냉에 후속하여, 상온~110℃의 물로 융제를 제거하는 것으로 구성되는 판상 알파알루미나의 제조방법이 제공된다.       According to another preferred aspect of the present invention for smoothly achieving the above object of the present invention, in the first to second aspects described above, following the furnace cooling described above, the flux is removed with water at room temperature to 110 ° C. Provided is a method for producing a plate-like alpha alumina.

상기한 본 발명의 목적을 원활히 달성하기 위한 본 발명의 바람직한 또 다른 일 양태에 따르면, 상기한 첫 번째 내지 두 번째 양태에 있어서 상기한 융제 제거에 후속하여, 분급 처리 및 산 처리로 이루어지는 후처리를 더욱 수행하는 판상 알파알루미나의 제조방법이 제공된다.        According to another preferred aspect of the present invention for smoothly achieving the above object of the present invention, in the first to second aspects described above, a post treatment consisting of a classification treatment and an acid treatment is performed following the removal of the flux. There is provided a method for producing a plate-like alpha alumina to be performed further.

본 발명에 따른 제조방법에 대하여 설명하면, 먼저 수산화알루미늄이나 황산알루미늄 등과 같은 알루미늄염 또는 이를 열처리하여 얻어진 전이 알루미나를 분쇄하여 입도를 조절한 후, NaF 혹은 AlF3 등의 불소 화합물과, 또는 NaPF6 등의 인화합물과, Na2SiF6 혹은 MgSiF6 ㆍ6H2O 등의 규소화합물, 또는 K2TiF6 혹은 Na2TiF6등의 티타늄 불화물이나 K2ZrF6 혹은 Na2ZrF6 등의 지르코늄 불화물과 같은 전이금속 불화물, 또는 MgF2와 같은 마그네슘 불화물, 또는 CaF2 혹은 CaSO4·1/2H2O의 칼슘 불화물, 그리고 융제로서의 Na2SO4(망초) 또는 Na2SO4(망초)와 K2SO4 혼합물을 첨가하고 건식 또는 습식 분쇄하여 입도조절을 한 다음, 분쇄된 혼합물을 알루미나 도가 니에 넣고 밀폐한 후 180~1800℃/hr의 승온 속도로 700~950℃ 까지 가열한 다음 0.1~5시간 유지하고, 다시 30~600℃/hr의 승온 속도로 1000~1400℃까지 재가열한 후 1~10시간 유지 시킨 후, 실온까지 노냉(爐冷)한 다음, 융제 등을 물로 녹여 낸 후, 얻어진 분말을 산 처리 한 후, 건조하고, 분급 및 분쇄하여 쌍정 및 응집, 미립자 및℃ 단편이 없는 입경 10~50㎛, 입자 두께 0.1~0.8㎛, 종횡비가 50~500인 판상 알파알루미나를 만든다.Referring to the manufacturing method according to the present invention, first, after pulverizing an aluminum salt such as aluminum hydroxide or aluminum sulfate, or a transition alumina obtained by heat treatment, fluorine compounds such as NaF or AlF 3 and NaPF 6 Phosphorus compounds such as Na 2 SiF 6 Or as MgSiF 6 and 6H 2 silicon compound such as O, or K 2 TiF 6 or Na 2 TiF 6, such as titanium fluoride and K 2 ZrF 6 or the transition metal fluoride, or MgF 2, such as zirconium fluoride, such as Na 2 ZrF 6 Such as magnesium fluoride, or calcium fluoride of CaF 2 or CaSO 4 1 / 2H 2 O, and a mixture of Na 2 SO 4 (forget) or Na 2 SO 4 (forget) and K 2 SO 4 as flux and dry or wet After pulverizing to adjust the particle size, the pulverized mixture is placed in an alumina crucible and sealed, heated to a temperature of 700 to 950 ° C. at a heating rate of 180 to 1800 ° C./hr, and then maintained for 0.1 to 5 hours. After reheating to 1000 ~ 1400 ° C. at a temperature raising rate of / hr, and holding for 1 to 10 hours, after cooling to room temperature, dissolving the flux or the like with water, and then subjecting the obtained powder to acid treatment and drying. Grading, classifying and pulverizing, twinning and agglomeration, fine particle and no particle fragments 10-50㎛, particle thickness 0. Make plate-shaped alumina with 1-0.8 μm and aspect ratio 50-500.

융제법에 의한 판상 알파알루미나의 제조는 전이 알루미나 또는 알루미늄염이 800~900℃ 전후에서 융제에 녹아 석출될 때 알파알루미나의 핵이 생성되고 이 핵이 성장함으로서 생성된다.       The production of plate-shaped alpha alumina by the flux method is performed by the nucleation of alpha alumina when the transition alumina or aluminum salt is dissolved and precipitated in the flux around 800 to 900 ° C., and the nucleus is grown.

이때 전이 알루미나 또는 알루미늄염을 융제에 잘 녹이기 위해 각종 첨가제가 첨가되며 이들 중 대표적인 것은 불소화합물이다.        At this time, various additives are added to dissolve the transition alumina or aluminum salt in the flux, and representative ones of these are fluorine compounds.

한편, 첨가제의 종류에 따라 핵이 성장 할 때 이방성 성장의 특성이 달라지며, 이러한 이방성 성장을 촉진시키는 물질로서는 인(P), 규소(Si), 전이금속(Ti) 등이 있으며, 이방성 성장을 저해시키는 물질로서는 마그네슘(Mg), 칼슘(Ca) 등을 들 수 있다. 따라서 P, Si, 또는 전이금속의 화합물과, Mg 또는 Ca 이온으로 구성된 화합물을 첨가하면 형상이 조절된 판상 알파알루미나의 제조가 용이하게 된다.       On the other hand, depending on the type of additives, the characteristics of anisotropic growth change when the nucleus grows, and the materials that promote such anisotropic growth include phosphorus (P), silicon (Si), transition metal (Ti), and the like. Magnesium (Mg), calcium (Ca), etc. are mentioned as a substance to inhibit. Therefore, the addition of a compound consisting of P, Si, or transition metal and a compound composed of Mg or Ca ions facilitates the production of plate-shaped alpha-alumina with controlled shape.

본 발명에 따른 융제법에 의한 판상 알파알루미나 제조는 전이 알루미나가 800~900℃ 전후에서 융제에 녹아 석출될 때 알파알루미나의 핵이 생성되고 이 핵의 성장에 의해 이루어진다. 이 때 전이 알루미나가 녹는 속도와 핵 생성 속도 및 핵 성장 속도를 제어함으로써 보다 우수한 분산성을 갖는 판상 알파알루미나 입자를 제조 할 수가 있다.       In the production of plate-shaped alpha alumina by the fluxing method according to the present invention, nuclei of alpha alumina are generated when the transition alumina is dissolved in the flux around 800 to 900 ° C. and precipitated, and the growth of the nucleus is performed. At this time, by controlling the rate of melting the transition alumina, the rate of nucleation and the rate of nuclear growth, it is possible to produce a plate-like alpha-alumina particles having better dispersibility.

그런데, 첨가제인 불화물의 증기압은 매우 높으므로 전이 알루미나 또는 알루미늄염이 알파알루미나로 전이되는 온도인 700~950℃ 전후 까지는 불화물의 증발을 최소화하는 한편, 이 온도 범위에서 균일한 분포로 핵 생성이 일어나도록 한 후 핵 성장을 지속시키면 쌍정이나 응집이 적고 미립자나 단편이 적은 판상 알파알루미나를 효과적으로 제조할 수가 있다.        However, since the vapor pressure of the fluoride as an additive is very high, the evaporation of fluoride is minimized until around 700 ~ 950 ° C., which is the temperature at which transition alumina or aluminum salt is transferred to alpha alumina, while nucleation occurs with a uniform distribution in this temperature range. If the nuclear growth is continued, the plate-shaped alumina with less twins or aggregates and fewer fine particles or fragments can be effectively produced.

따라서 전이 알루미나 또는 알루미늄염이 알파알루미나로 전이되는 온도인 700~950℃ 까지는 가급적 빠른 속도로 승온하여 불화물의 증발을 최소화할 필요성이 있으며, 따라서 승온 속도를 180~1800℃/hr, 일반적으로는 180~1200℃/hr, 바람직하게는 300~1200℃/hr, 더욱 바람직하게는 300~900℃/hr, 가장 바람직하게는 600~900℃/hr로 하여 800~950℃ 까지 가열한 다음 0.1~5시간, 바람직하게는 0.1~3시간, 더욱 바람직하게는 0.5~2시간, 가장 바람직하게는 0.5~1시간 유지시켜 핵형성을 균질하게 분포시킨 후, 다시 승온 속도를 30~600℃/hr, 바람직하게 60~400℃/hr, 더욱 바람직하게는 90~300℃/hr, 가장 바람직하게는 90~200℃/hr로 하여 1000~1400℃까지 재가열한 다음, 이 온도에 도달하면 1~10시간, 바람직하게는 1~8시간, 더욱 바람직하게는 1~5시간, 가장 바람직하게는 1~3시간 유지시킨 후, 실온까지 노냉한다.       Therefore, it is necessary to minimize the evaporation of fluoride by raising the temperature as fast as possible to 700 ~ 950 ℃, the transition temperature of the transition alumina or aluminum salt to alpha alumina, so the temperature increase rate is 180 ~ 1800 ℃ / hr, generally 180 ~ 1200 ℃ / hr, preferably 300 ~ 1200 ℃ / hr, more preferably 300 ~ 900 ℃ / hr, most preferably 600 ~ 900 ℃ / hr heated to 800 ~ 950 ℃ then 0.1 ~ 5 Time, preferably 0.1 to 3 hours, more preferably 0.5 to 2 hours, most preferably 0.5 to 1 hour to homogeneously distribute the nucleation, and then again the temperature increase rate 30 ~ 600 ℃ / hr, preferably 60 to 400 ° C./hr, more preferably 90 to 300 ° C./hr, most preferably 90 to 200 ° C./hr, reheat to 1000 to 1400 ° C., and then reach this temperature for 1 to 10 hours, Preferably after 1 to 8 hours, more preferably 1 to 5 hours, most preferably 1 to 3 hours, And furnace cooling to come.

본 발명의 제조방법에 있어서, NaF 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~2mol, 바람직하게는 0.0001~1mol, 더욱 바람직하게는 0.0001~0.7mol, 가장 바람직하게는 0.0001~0.5mol의 양으로 첨가된다.       In the production method of the present invention, the amount of NaF added is 0.0001 to 2 mol, preferably 0.0001 to 1 mol, more preferably 0.0001 to 0.7 mol, most preferably 0.0001 to 0.5 with respect to 1 mol (mol) of aluminum salt or transition alumina. is added in an amount of mol.

한편, 무수 황산알루미늄의 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~0.1mol, 바람직하게는 0.0001~0.05mol, 더욱 바람직하게는 0.0001~0.01mol, 가장 바람직하게는 0.01~0.001mol의 양으로 첨가된다.       On the other hand, the addition amount of the anhydrous aluminum sulfate is 0.0001 to 0.1 mol, preferably 0.0001 to 0.05 mol, more preferably 0.0001 to 0.01 mol, most preferably 0.01 to 0.001 mol with respect to 1 mol (mol) of aluminum salt or transition alumina Is added in the amount of.

AlF3의 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~1mol, 바람직하게는 0.0001~0.5mol, 더욱 바람직하게는 0.0001~0.3mol, 가장 바람직하게는 0.01~0.1mol의 양으로 첨가된다.AlF 3 is added in an amount of 0.0001 to 1 mol, preferably 0.0001 to 0.5 mol, more preferably 0.0001 to 0.3 mol, and most preferably 0.01 to 0.1 mol relative to 1 mol of aluminum salt or transition alumina. do.

또한, KPF6 또는 NaPF6로 대표되는 인불화물 및 인이온의 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~0.3mol, 바람직하게는 0.0001~0.1mol, 더욱 바람직하게는 0.0001~0.05mol, 가장 바람직하게는 0.0001~0.01mol의 양으로 첨가된다.In addition, the addition amount of the fluoride and the phosphorus ion represented by KPF 6 or NaPF 6 is 0.0001 to 0.3 mol, preferably 0.0001 to 0.1 mol, more preferably 0.0001 to 0.05 with respect to 1 mol (mol) of aluminum salt or transition alumina. mol, most preferably in an amount of 0.0001 to 0.01 mol.

선택적 첨가 성분으로서의 Na2SiF6 또는 MgSiF6 ㆍ6H2O로 대표되는 규소불화물 및 규소이온을 첨가할 경우, 그 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~0.1mol, 바람직하게는 0.0001~0.03mol, 더욱 바람직하게는 0.0001~0.01mol, 가장 바람직하게는 0.0001~0.005mol의 범위이다.When adding silicon fluorides and silicon ions represented by Na 2 SiF 6 or MgSiF 6 .6H 2 O as optional additives, the addition amount is 0.0001 to 0.1 mol, preferably 1 mol (mol) of aluminum salt or transition alumina. Is 0.0001 to 0.03 mol, more preferably 0.0001 to 0.01 mol, and most preferably 0.0001 to 0.005 mol.

선택적 첨가 성분으로서의 K2TiF6 또는 Na2TiF6로 대표되는 티타늄불화물 및 티타늄이온을 첨가할 경우, 그 첨가량은 알루미늄염 또는 전이알루미나 1몰(mol)에 대하여 0.0001~0.3mol, 바람직하게는 0.0001~0.1mol,더욱 바람직하게는 0.000~0.05mol, 가장 바람직하게는 0.0001~0.03mol의 범위이다.When titanium fluoride and titanium ions represented by K 2 TiF 6 or Na 2 TiF 6 as optional additives are added, the amount is 0.0001 to 0.3 mol, preferably 0.0001 to 1 mol of aluminum salt or transition alumina. 0.1 mol, more preferably 0.000 to 0.05 mol, most preferably 0.0001 to 0.03 mol.

선택적 첨가 성분으로서의 MgF2로 대표되는 마그네슘이온을 첨가할 경우, 그 첨가량은 알루미늄염 또는 전이알루미나 1몰(mol)에 대하여 0.0001~0.2mol, 바람직하게는 0.0001~0.1mol, 더욱 바람직하게는 0.0001~0.05mol, 가장 바람직하게는 0.0001~0.02mol의 범위이다. When magnesium ions represented by MgF 2 as optional additives are added, the added amount is 0.0001 to 0.2 mol, preferably 0.0001 to 0.1 mol, more preferably 0.0001 to 1 mol (mol) of aluminum salt or transition alumina. 0.05 mol, most preferably 0.0001 to 0.02 mol.

선택적 첨가 성분으로서의 CaF2 및 CaSO4·1/2H2O 대표되는 칼슘이온을 첨가할 경우, 그 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~1.0 mol, 바람직하게는 0.0001~0.7mol, 더욱 바람직하게는 0.0001~0.5mol, 가장 바람직하게는 0.0001~0.2mol의 범위이다.When CaF 2 and CaSO 4 1 / 2H 2 O representative calcium ions are added as optional additives, the added amount is 0.0001 to 1.0 mol, preferably 0.0001 to 0.7 with respect to 1 mol (mol) of aluminum salt or transition alumina. mol, more preferably 0.0001 to 0.5 mol, most preferably 0.0001 to 0.2 mol.

선택적 첨가 성분으로서의 K2ZrF6 또는 Na2ZrF6 대표되는 지르코늄불화물 및 지르코늄 이온을 첨가할 경우, 그 첨가량은 알루미늄염 또는 전이 알루미나 1몰(mol)에 대하여 0.0001~0.5mol, 바람직하게는 0.0001~0.2 mol, 더욱 바람직하게는 0.0001~0.1mol, 가장 바람직하게는 0.0001~0.05mol의 범위이다.When optional zirconium fluorides and zirconium ions represented by K 2 ZrF 6 or Na 2 ZrF 6 as optional additives are added, the amount is 0.0001 to 0.5 mol, preferably 0.0001 to 1 mol (mol) of aluminum salt or transition alumina. 0.2 mol, more preferably 0.0001 to 0.1 mol, most preferably 0.0001 to 0.05 mol.

열처리된 시료를 수세과정을 통하여 효과적으로 융제인 망초(Na2SO4)를 제거하기 위해 시료 100g 당 상온~110℃, 바람직하게는 30~80℃, 더욱 바람직하게는 30~60℃, 가장 바람직하게는 35~50℃의 물 1L에 넣고 물을 교반기로 교반하면서 융제를 제거한다.In order to remove the heat-treated sample to effectively remove the flux (Na 2 SO 4 ) through the washing process, room temperature ~ 110 ℃, preferably 30 ~ 80 ℃, more preferably 30 ~ 60 ℃, most preferably per 100 g of the sample Put 1L of water at 35 ~ 50 ℃ to remove the flux while stirring the water with a stirrer.

여과된 시료를 건조한 후, 제조된 판상 알루미나를 기류식 분급기를 사용하여 과도하게 응집된 입자를 제거한 후, 판 밀 등으로 분쇄한 후 다시 기류식 분급기를 사용하여 분급한 후, 산 처리하고 수세 건조하여 쌍정 및 응집, 미립자나 단 편이 없는 본 발명에 따른 판상 알루미나를 제조할 수 있다.       After drying the filtered sample, the plate-shaped alumina was removed by using an air flow classifier to remove the aggregated particles, and then pulverized with a plate mill or the like and classified again using an air flow classifier, followed by acid treatment and washing with water. Thus, the plate-shaped alumina according to the present invention without twins and agglomeration, fine particles or fragments can be produced.

이하, 실시예를 통하여 본 발명을 더욱 상세히 설명하기로 하나 이는 본 발명을 예증하기 위한 것일 뿐 본 발명을 제한하고자 하는 것은 아니다.       Hereinafter, the present invention will be described in more detail with reference to Examples, which are intended to illustrate the present invention but are not intended to limit the present invention.

실시예 1 Example 1

먼저 수산화알루미늄을 700℃에서 2시간 열처리하여 전이 알루미나로 전환시켰다.        First, aluminum hydroxide was heat-treated at 700 ° C. for 2 hours to convert to transition alumina.

1 리터 용량의 볼밀에 직경 5mm 알루미나 볼 700g, 전환된 전이 알루미나 50g, 황산나트륨 500g, KPF6 0.89g, NaF 9.00g, AlF3 1.94g, MgSiF6 ㆍ6H2O 0.73g, MgF2 0.67g를 넣고 48시간 건식 분쇄하였다. 분쇄 후 볼을 제거한 후 혼합물을 알루미나 도가니에 넣고 뚜껑을 덮은 다음, 1200℃에서 2시간 열처리 한 후 노냉하고, 열처리된 시료를 50℃물로 황산나트륨 등을 제거한 후 90℃에서 1몰 염산용액으로 2시간 처리한 후 수차례 수세하고 여과 건조하였다. 700 millimeters of 5mm alumina balls, 50g converted transition alumina, 500g sodium sulfate, 0.89g KPF 6 , Na00 9.00g, AlF 3 1.94g, MgSiF 6 0.73 g of 6H 2 O and 0.67 g of MgF 2 were added and dry pulverized for 48 hours. After grinding, the ball was removed, the mixture was placed in an alumina crucible, and the lid was covered. Then, the mixture was heat-treated at 1200 ° C. for 2 hours, and then cooled. The heat-treated sample was removed from sodium sulfate with 50 ° C. water, and then dried at 90 ° C. for 1 hour with 1 mol hydrochloric acid solution. After treatment, the product was washed with water several times and filtered and dried.

결과의 판상 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크는 알파알루미나뿐 이었다. SEM에 의한 관찰에서는 입자는 판상체이고, 입자크기는 10~50㎛, 두께 0.1~0.7㎛이었다(도 1a 및 도 1b와 도 2 참조).       When the resulting plate alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. In the observation by SEM, the particles were plate-shaped bodies, and the particle size was 10 to 50 µm and 0.1 to 0.7 µm in thickness (see FIGS. 1A and 1B and 2).

얻어진 판상 알파알루미나를 물에 현탁 교반 했을 때 아름다운 유선이 관찰되었다.       Beautiful streamline was observed when the obtained plate-shaped alpha alumina was suspended and stirred in water.

실시예 2Example 2

먼저 수산화알루미늄을 700℃에서 2시간 열처리하여 전이 알루미나로 전환시켰다.        First, aluminum hydroxide was heat-treated at 700 ° C. for 2 hours to convert to transition alumina.

1 리터 용량의 볼밀에 직경 5mm 알루미나볼 700g, 전환된 전이 알루미나 50g, 황산나트륨 500g, KPF6 0.89g, NaF 9.00g, AlF3 1.94g, Na2SiF6 0.51g, CaF2 0.85g, CaSO4·1/2H2O 4.88g를 넣고 48시간 건식 분쇄하였다. 분쇄 후 볼을 제거한 다음, 혼합물을 알루미나 도가니에 넣고 뚜껑을 덮은 다음, 1200℃에서 2시간 열처리 한 후 노냉하고, 열처리된 시료를 물로 세척하여 황산나트륨 등의 제거를 제거한 후 90℃에서 1몰 염산용액으로 5시간 처리하고 수차례 수세한 후 여과 건조하였다. 결과의 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크는 알파알루미나뿐 이었다. SEM에 의한 관찰에서는 입자는 판상체이고, 입자크기는 10~50㎛, 두께 0.1~0.7㎛이었다.In a 1 liter ball mill, 700 mm diameter alumina balls 700 g, converted transition alumina 50 g, sodium sulfate 500 g, KPF 6 0.89 g, NaF 9.00 g, AlF 3 1.94 g, Na 2 SiF 6 0.51 g, CaF 2 0.85 g, CaSO 4 4.88 g of 1 / 2H 2 O was added and dry pulverized for 48 hours. After grinding, the ball was removed, the mixture was placed in an alumina crucible, and the lid was covered. Then, the mixture was heat-treated at 1200 ° C. for 2 hours, and then cooled. The heat-treated sample was washed with water to remove sodium sulfate and the like. 5 hours, washed several times, and dried by filtration. When the resulting alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. In the observation by SEM, the particles were plate-shaped bodies, and the particle size was 10 to 50 µm and 0.1 to 0.7 µm in thickness.

얻어진 판상 알파알루미나를 물에 현탁 교반 했을 때 유선이 관찰되었다       Streamline was observed when the obtained plate-shaped alpha-alumina was suspended and stirred in water.

실시예 3Example 3

먼저 수산화알루미늄을 700℃에서 2시간 열처리하여 전이 알루미나로 전환시켰다.        First, aluminum hydroxide was heat-treated at 700 ° C. for 2 hours to convert to transition alumina.

1 리터 용량의 볼밀에 직경 5mm 알루미나볼 700g, 수산화알루미늄 75g, 황산나트륨 500g, KPF6 0.89g, NaF 9.00g, AlF3 1.94g, MgSiF6 6H2O 0.73g, MgF2 0.67g 를 넣고 48시간 건식 분쇄하였다. 분쇄 후 볼을 제거하고, 혼합물을 알루미나 도가니에 넣고 뚜껑을 덮은 다음, 1200℃에서 2시간 열처리 한 후 노냉하고, 열처리된 시료를 물로 세척하여 황산나트륨 등의 제거를 제거한 후 90℃에서 1몰 염산용액으로 5시간 처리한 후 수차례 수세한 후 여과 건조하였다. 1mm ball mill, 700mm diameter alumina ball 700g, aluminum hydroxide 75g, sodium sulfate 500g, KPF 6 0.89g, NaF 9.00g, AlF 3 1.94g, MgSiF 6 6H 2 O 0.73 g and 0.67 g of MgF 2 were added and dry pulverized for 48 hours. After grinding, the ball is removed, the mixture is placed in an alumina crucible, and the lid is covered. Then, the mixture is heat-treated at 1200 ° C. for 2 hours, and then cooled. The heat-treated sample is washed with water to remove sodium sulfate and the like. After 5 hours treatment with water washed several times and dried by filtration.

결과의 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크는 알파알루미나뿐 이였다. SEM에 의한 관찰에서는 입자는 판상체이고, 입자크기는 10~40㎛, 두께 0.1~0.7㎛이었다.       When the resulting alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. In the observation by SEM, the particles were plate-shaped bodies, and the particle size was 10 to 40 µm and 0.1 to 0.7 µm in thickness.

이 판상체 알파알루미나를 물에 현탁 교반 했을 때 유선이 관찰되었다       Mammary gland was observed when this platelet alpha alumina was suspended and stirred in water.

실시예 4Example 4

먼저 수산화알루미늄을 700℃에서 2시간 동안 열처리하여 전이 알루미나로 전환시켰다.        First, aluminum hydroxide was heat-treated at 700 ° C. for 2 hours to convert to transition alumina.

1리터 용량의 볼밀에 직경 5mm 알루미나볼 700g, 전환된 전이 알루미나 50g, 황산나트륨 500g, KPF6 0.45g, NaF 5.94g, AlF3 1.94g, K2TiF6 2.08g, MgF2 0.25g, MgSiF6 6H2O 0.24g를 넣고 48시간 건식 분쇄하였다. 분쇄 후 볼을 제거하고 혼합물을 알루미나 도가니에 넣고 뚜껑을 덮은 다음, 1200℃에서 2시간 열처리 한 후 노냉하고, 열처리된 시료를 물로 세척하여 황산나트륨 등의 제거를 제거한 후 90℃에서 1몰 염산용액으로 5시간 처리한 후 수차례 수세하고 여과 건조하였다. 700 liters of 5mm alumina balls, 50g converted transition alumina, 500g sodium sulfate, 0.45g KF 6 , NaF 5.94g, AlF 3 1.94g, K 2 TiF 6 2.08g, MgF 2 0.25g, MgSiF 6 6H 2 O 0.24 g was added and pulverized dry for 48 hours. After grinding, the ball is removed, the mixture is placed in an alumina crucible, and the lid is covered. After the heat treatment at 1200 ° C. for 2 hours, the furnace is cooled and then cooled. The heat-treated sample is washed with water to remove sodium sulfate and the like. After treatment for 5 hours, the product was washed several times and filtered and dried.

결과의 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크는 알파알루미나뿐 이였다. SEM에 의한 관찰에서는 입자는 판상체이고, 입자크기는 10~50㎛, 두께 0.1~0.7㎛ 이었다.       When the resulting alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. In the observation by SEM, the particle was a plate-like body, and the particle size was 10 to 50 µm and 0.1 to 0.7 µm in thickness.

얻어진 판상 알파알루미나를 물에 현탁 교반 했을 때 유선이 관찰되었다.       Streamline was observed when the obtained plate-shaped alpha alumina was suspended and stirred in water.

실시예 5Example 5

먼저 수산화알루미늄을 700℃에서 2시간 열처리하여 전이 알루미나로 전환시켰다.        First, aluminum hydroxide was heat-treated at 700 ° C. for 2 hours to convert to transition alumina.

1리터 용량의 볼밀에 직경 5mm 알루미나볼 700g, 전환된 전이 알루미나 50g, 황산나트륨 500g, KPF6 0.89g, NaF 9.00g, AlF3 1.94g, K2ZrF6 1.35g, CaF2 0.85g, CaSO4·1/2H2O 4.88g를 넣고 48시간 건식 분쇄하였다. 분쇄 후 볼을 제거한 다음, 혼합물을 알루미나 도가니에 넣고 뚜껑을 덮은 후 1200℃에서 2시간 열처리 한 다음, 노냉하고, 열처리된 시료를 5L의 물에 넣고 교반하여 황산나트륨 등을 제거한 후 90℃에서 1몰 염산용액으로 5시간 처리하고 수차례 수세한 후 여과 건조하였다. 700 g of 5mm alumina balls, 50 g of converted transition alumina, sodium sulfate 500 g, KPF 6 0.89 g, NaF 9.00 g, AlF 3 1.94 g, K 2 ZrF 6 1.35 g, CaF 2 0.85 g, CaSO 4 4.88 g of 1 / 2H 2 O was added and dry pulverized for 48 hours. After grinding, the ball was removed, the mixture was placed in an alumina crucible, covered with a lid, and then heat-treated at 1200 ° C. for 2 hours. The furnace was then cooled, and the heat-treated sample was added to 5 L of water, stirred to remove sodium sulfate, and the like. The solution was treated with hydrochloric acid for 5 hours, washed several times, and filtered and dried.

결과의 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크 는 알파알루미나뿐 이였다. SEM에 의한 관찰에서는 입자가 판상체이고, 입자크기는 20~40㎛, 두께 0.2~0.7㎛이었다.       When the resulting alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. In the observation by SEM, the particles were plate-shaped bodies, and the particle sizes were 20 to 40 µm and 0.2 to 0.7 µm in thickness.

얻어진 판상 알파알루미나를 물에 현탁 교반 했을 때 유선이 관찰되었다.       Streamline was observed when the obtained plate-shaped alpha alumina was suspended and stirred in water.

실시예 6Example 6

먼저 수산화알루미늄을 700℃에서 2시간 열처리하여 전이 알루미나로 전환시켰다.        First, aluminum hydroxide was heat-treated at 700 ° C. for 2 hours to convert to transition alumina.

1리터 용량의 볼밀에 직경 5mm 알루미나볼 700g, 전환된 전이 알루미나 50g, 무수황산알루미늄 0.5g, 황산나트륨 500g, KPF6 0.89g, NaF 7.00g, AlF3 1.94g, Na2SiF6 0.67g, CaF2 0.85g, CaSO4·1/2H2O 4.88g를 넣고 48시간 건식 분쇄하였다. 분쇄 후 볼을 제거하고 혼합물을 알루미나 도가니에 넣고 뚜껑을 덮은 다음 1200℃에서 2시간 열처리 한 후 노냉하고, 열처리된 시료를 5L의 물에 넣고 교반하여 황산나트륨 등의 제거를 수행한 후 90℃에서 1몰 염산용액으로 5시간 처리하고 수차례 수세한 후 여과 건조하였다. 700g 5mm alumina ball, converted transition alumina 50g, 0.5g anhydrous aluminum sulfate, sodium sulfate 500g, KPF 6 0.89g, NaF 7.00g, AlF 3 1.94g, Na 2 SiF 6 0.67g, CaF 2 0.85 g and 4.88 g of CaSO 4 1 / 2H 2 O were added thereto, followed by dry grinding for 48 hours. After grinding, the ball is removed, the mixture is placed in an alumina crucible, and the lid is covered, and then heat-treated at 1200 ° C. for 2 hours, and then cooled. The heat-treated sample is placed in 5 L of water and stirred to remove sodium sulfate, and then at 1 ° C. at 90 ° C. The mixture was treated with molar hydrochloric acid solution for 5 hours, washed several times, and filtered and dried.

결과의 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크는 알파알루미나뿐 이였다. SEM에 의한 관찰에서는 입자가 판상체이고, 입자크기는 20~35㎛, 두께 0.2~0.7㎛이었다.       When the resulting alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. In the observation by SEM, the particle was a plate-shaped body, the particle size was 20 ~ 35㎛, thickness 0.2 ~ 0.7㎛.

얻어진 판상 알파알루미나를 물에 현탁 교반 했을 때 유선이 관찰되었다       Streamline was observed when the obtained plate-shaped alpha-alumina was suspended and stirred in water.

실시예 7 Example 7

실시예 1에서 제조된 판상 알파알루미나 1kg을 기류식 분급기를 사용하여 분급([(주)원진TECH WJTS~015] 사용, 2500~5000회/분 회전수, 블로어의 압력 0.3~0.7기압, 찬넬 에어압 1.5~2.5기압, 노즐 압력 1.5~2.5기압)한 후, 휠밀(wheel mill)을 사용하여 분쇄하고 분쇄된 것을 기류식 분급기로 재분급(2500~5000회/분 회전수, 블로어의 압력 0.3~0.7기압, 찬넬 에어압 1.5~2.5기압, 노즐 압력 1.5~2.5기압)한 후 오염물질 제거를 위해 왕수로 재처리하여 건조하였다. 얻어진 판상체 알루미나 입자를 X선 회절에 의해 조사해 본 결과 검출된 회절피크는 알파알루미나뿐 이였다. 또한 SEM에 의한 관찰 결과, 쌍정이나 응집이 없는 판상체 입자인 것으로 판명되었다. 결과의 입자크기는 10~30㎛, 두께는 0.1~0.7㎛이었다.       1kg of plate-shaped alpha alumina prepared in Example 1 was classified using an air flow classifier ([Wonjin TECH WJTS ~ 015], 2500 ~ 5000 cycles / minute rotation speed, blower pressure 0.3 ~ 0.7 atmosphere, channel air) Pressure 1.5 ~ 2.5 atmosphere, nozzle pressure 1.5 ~ 2.5 atmosphere), pulverize using wheel mill and reclassify the pulverized product with air classifier (2500 ~ 5000 cycles / minute rotation speed, blower pressure 0.3 ~ 0.7 atm, channel air pressure 1.5-2.5 atm, nozzle pressure 1.5-2.5 atm), and then retreated with aqua regia to remove contaminants. When the obtained plate-shaped alumina particles were examined by X-ray diffraction, only the detected diffraction peaks were alpha alumina. Moreover, as a result of observation by SEM, it turned out that it was plate-shaped particle | grains without twins or aggregation. The resulting particle size was 10 to 30 µm and the thickness was 0.1 to 0.7 µm.

결과의 판상 알파알루미나를 물에 현탁 교반 했을 때 유선이 관찰되었다       Mammary gland was observed when the resulting plate-shaped alumina was suspended in water and stirred.

상술한 바와 같이, 본 발명의 제조방법에 따라 제조되는 판상 알루미나는 순수한 판상 알파알루미나로서 쌍정이나 응집, 미립자 또는 단편이 없으며, 좁은 입도 분포를 갖고 있으며, 얻어지는 판상 입자는 입자 크기 10~50㎛, 두께 0.1~0.8㎛이고, 종횡비 50~500으로서 물에 현탁 교반하면 아름다운 유선을 나타내므로, 그 우수한 분산성으로 인하여 펄 안료, 화장품의 체질안료, 백색안료, 수지 충진제, 연마패드 등의 원료로서 적합하게 사용될 수가 있다.       As described above, the plate-shaped alumina prepared according to the production method of the present invention is pure plate-shaped alumina, which is free from twins, aggregates, fine particles or fragments, has a narrow particle size distribution, and the resulting plate-shaped particles have a particle size of 10 to 50 μm, Its thickness ranges from 0.1 to 0.8 µm and its aspect ratio is 50 to 500, which results in a beautiful streamline when suspended and agitated in water. Therefore, it is suitable as a raw material for pearl pigments, cosmetic pigments, white pigments, resin fillers and polishing pads due to its excellent dispersibility. Can be used.

Claims (12)

융제법에 의한 판상 알루미나의 제조방법에 있어서,         In the manufacturing method of the plate-shaped alumina by the fluxing method, 180~1800℃/hr의 승온 속도로 800~950℃ 까지 가열한 후 0.1~5 시간 유지하고, 다시 30~600℃/hr의 승온 속도로 1000~1400까지 재가열한 후 1~10시간 유지고, 이어서 실온까지 노냉(爐冷)하는 것으로 구성되는,         After heating to 800 ~ 950 ℃ at a heating rate of 180 ~ 1800 ℃ / hr, and maintained for 0.1 ~ 5 hours, and reheated to 1000 ~ 1400 at a temperature rising rate of 30 ~ 600 ℃ / hr, and then maintained for 1 to 10 hours, Next, consisting of furnace cooling to room temperature, 평균 입경이 10~50㎛이고 입자 두께가 0.1~0.8㎛이며, 종횡비가 50~500인 판상 알파알루미나의 제조방법.        A method for producing a plate-shaped alpha alumina having an average particle diameter of 10 to 50 µm, a particle thickness of 0.1 to 0.8 µm, and an aspect ratio of 50 to 500. 제1항에 있어서, 상기한 노냉에 후속하여, 상온~110℃의 물로 융제를 제거하는 것으로 구성되는 판상 알파알루미나의 제조방법.        The method for producing a plate-shaped alpha alumina according to claim 1, wherein the flux is removed with water at room temperature to 110 ° C following the furnace cooling. 제2항에 있어서, 상기한 융제 제거에 후속하여, 분급 처리 및 산 처리로 이루어지는 후처리를 더욱 수행하는 것으로 구성되는 판상 알파알루미나의 제조방법.        The method for producing a plate-shaped alpha alumina according to claim 2, further comprising a post treatment consisting of a classification treatment and an acid treatment subsequent to the removal of the flux. 제1항 내지 제3항 중 어느 한 항에 있어서, 무수황산알루미늄 첨가량이 수산화알루미늄 또는 전이 알루미나 1몰에 대하여 0.0001~0.1몰의 양으로 첨가되는 판상 알파알루미나 제조방법.       The method for producing a plate-shaped alpha alumina according to any one of claims 1 to 3, wherein the amount of anhydrous aluminum sulfate added is added in an amount of 0.0001 to 0.1 mole with respect to 1 mole of aluminum hydroxide or transition alumina. 제1항 내지 제3항 중 어느 한 항에 있어서, NaF가 알루미늄염 또는 전이 알루미나 1몰에 대하여 0.0001~2몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.       The method for producing a plate-shaped alpha alumina according to any one of claims 1 to 3, wherein NaF is added in an amount of 0.0001 to 2 moles with respect to 1 mole of aluminum salt or transition alumina. 제1항 내지 제3항 중 어느 한 항에 있어서, AlF3가 알루미늄염 또는 전이 알루미나 1몰에 대하여 0.0001~1몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The method for producing a plate-shaped alpha alumina according to any one of claims 1 to 3 , wherein AlF 3 is added in an amount of 0.0001 to 1 mole with respect to 1 mole of aluminum salt or transition alumina. 제1항 내지 제3항 중 어느 한 항에 있어서, KPF6 또는 NaPF6의 인불화물 또는 인 이온이 알루미늄염 또는 전이 알루미나 1몰에 대하여 0.0001~0.3몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The method for producing a plate-shaped alpha alumina according to any one of claims 1 to 3, wherein the fluoride or phosphorus ion of KPF 6 or NaPF 6 is added in an amount of 0.0001 to 0.3 moles with respect to 1 mole of aluminum salt or transition alumina. . 제1항 내지 제3항 중 어느 한 항에 있어서, Na2SiF6 또는 MgSiF6 6H2O의 규소불화물 또는 규소이온이 알루미늄염 또는 전이 알루미나 1몰에 대하여 0.0001~0.1몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The method of claim 1, wherein Na 2 SiF 6 or MgSiF 6. A method for producing a plate-shaped alpha alumina in which silicon fluoride or silicon ions of 6H 2 O are added in an amount of 0.0001 to 0.1 mole with respect to 1 mole of aluminum salt or transition alumina. 제1항 내지 제3항 중 어느 한 항에 있어서, K2TiF6 또는 Na2TiF6로 대표되는 티타늄불화물 또는 티타늄이온이 알루미늄염 또는 전이알루미나 1몰에 대하여 0.0001~0.3몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The titanium fluoride or titanium ion represented by any one of claims 1 to 3, which is represented by K 2 TiF 6 or Na 2 TiF 6 , is added in an amount of 0.0001 to 0.3 mol based on 1 mol of aluminum salt or transition alumina. Method for producing plate-shaped alpha alumina. 제1항 내지 제3항 중 어느 한 항에 있어서, MgF2의 마그네슘이온이 알루미늄염 또는 전이알루미나 1몰에 대하여 0.0001~0.2몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The method for producing a plate-shaped alpha alumina according to any one of claims 1 to 3, wherein magnesium ions of MgF 2 are added in an amount of 0.0001 to 0.2 mol relative to 1 mol of an aluminum salt or transition alumina. 제1항 내지 제3항 중 어느 한 항에 있어서, CaF2 또는 CaSO4·1/2H2O의 칼슘이온이 알루미늄염 또는 전이 알루미나 1몰에 대하여 0.0001~1.0몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The plate-shaped alpha-alumina according to any one of claims 1 to 3, wherein calcium ions of CaF 2 or CaSO 4 1 / 2H 2 O are added in an amount of 0.0001 to 1.0 mole with respect to 1 mole of aluminum salt or transition alumina. Manufacturing method. 제1항 내지 제3항 중 어느 한 항에 있어서, K2ZrF6 또는 Na2ZrF6의 지르코늄불화물 및 지르코늄이온이 알루미늄염 또는 전이 알루미나 1몰에 대하여 0.0001~0.5몰의 양으로 첨가되는 판상 알파알루미나의 제조방법.The plate-like alpha according to any one of claims 1 to 3, wherein zirconium fluoride and zirconium ions of K 2 ZrF 6 or Na 2 ZrF 6 are added in an amount of 0.0001 to 0.5 moles with respect to 1 mole of aluminum salt or transition alumina. Method for producing alumina.
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EP3121150A4 (en) * 2014-03-17 2017-01-25 Cqv Co., Ltd. Plate-like aluminum oxide and preparation method therefor
JP2017516734A (en) * 2014-03-17 2017-06-22 Cqv株式会社Cqv Co., Ltd. Plate-like aluminum oxide and method for producing the same
US9758677B2 (en) 2014-03-17 2017-09-12 Cqv Co., Ltd. Plate-like aluminum oxide and preparation method therefor
KR20220136689A (en) * 2021-04-01 2022-10-11 포세라 (주) Alpha alumina with excellent aspect ratio and free of heavy metals and its manufacturing method

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