KR20060127670A - Etching solution of aluminum - Google Patents
Etching solution of aluminum Download PDFInfo
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- KR20060127670A KR20060127670A KR1020050048994A KR20050048994A KR20060127670A KR 20060127670 A KR20060127670 A KR 20060127670A KR 1020050048994 A KR1020050048994 A KR 1020050048994A KR 20050048994 A KR20050048994 A KR 20050048994A KR 20060127670 A KR20060127670 A KR 20060127670A
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- aluminum
- etching
- etchant
- alumina
- bath
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims abstract description 51
- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 51
- 238000005530 etching Methods 0.000 title claims abstract description 42
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 36
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 9
- 239000004094 surface-active agent Substances 0.000 claims abstract description 8
- 235000010344 sodium nitrate Nutrition 0.000 claims abstract description 6
- 239000004317 sodium nitrate Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 abstract description 22
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 15
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000356 contaminant Substances 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 229910001868 water Inorganic materials 0.000 abstract description 4
- 238000007743 anodising Methods 0.000 abstract description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000004684 trihydrates Chemical class 0.000 description 3
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910001388 sodium aluminate Inorganic materials 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/02—Etching, surface-brightening or pickling compositions containing an alkali metal hydroxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
본 발명은 알루미늄 에칭제에 관한 것이며, 더욱 상세하게는 알루미늄의 에칭 과정에서 발생하는 수소 가스 및 알루미나와 같은 바람직하지 않은 잔류물의 생성을 억제하는 알루미늄 에칭제에 관한 것이다.FIELD OF THE INVENTION The present invention relates to aluminum etchant and more particularly to aluminum etchant that inhibits the formation of undesirable residues such as hydrogen gas and alumina that occur during the etching process of aluminum.
일반적으로 알루미늄은 화학적인 내식성이 취약하므로 알루미늄 제품을 만들 때 화학적 내식성을 증대시키기 위하여 에칭 공정과 전해 공정을 거쳐 알루미늄의 표면에 인공적으로 산화피막을 형성하며, 이렇게 형성된 알루미늄 제품의 산화피막은 견고하면서도 내식성이 크고 미세한 유공성을 구비하는 섬유상을 나타내므로 다양한 색으로 염색을 할 수 있다.In general, aluminum has a weak chemical corrosion resistance, so that an aluminum oxide film is artificially formed on the surface of the aluminum through an etching process and an electrolytic process in order to increase chemical corrosion resistance when making an aluminum product. Since the fiber has a high corrosion resistance and fine porosity, it can be dyed in various colors.
상기 알루미늄의 에칭 공정은 알루미늄의 표면에 물리적으로 흡착되어 있는 오염물(예컨대, 기름기)을 제거하기 위하여 상기 전해 공정의 전처리 공정으로 수행되며, 작업자가 산 또는 알칼리 성분을 포함하는 특정 온도(통상적으로 50℃ 전후의 온도)의 에칭제가 담겨 있는 에칭조에 알루미늄을 일정 시간 동안(통상적으로 1∼3분) 침지시킴으로써 알루미늄의 표면에 형성되어 있는 오염물을 제거하는 공정이며, 상기 전해 공정은 전해액이 담겨 있는 전해조에서 아노다이징(anodizing)을 함으로써 상기 알루미늄 표면에 상기와 같은 산화피막을 형성시키는 공정이다.The etching process of aluminum is carried out as a pretreatment process of the electrolytic process to remove contaminants (eg, greasy) that are physically adsorbed on the surface of aluminum, and the operator has a specific temperature (usually 50 A process of removing contaminants formed on the surface of aluminum by immersing aluminum in an etching bath containing an etchant of about (° C.) for a predetermined time (usually 1 to 3 minutes), and the electrolytic process is an electrolytic bath containing an electrolyte solution. By anodizing at the step of forming an oxide film as described above on the aluminum surface.
한편, 상기 알루미늄의 에칭 공정에서 사용되는 에칭제는 산성 에칭제와 알칼리성 에칭제로 구별되며, 상기 알칼리성 에칭제로는 주로 수산화나트륨(NaOH)을 주성분으로 하는 에칭제가 많이 사용된다.On the other hand, the etchant used in the aluminum etching process is divided into an acid etchant and an alkaline etchant, and as the alkaline etchant, an etchant mainly composed of sodium hydroxide (NaOH) is used.
예컨대, 상기 수산화나트륨 에칭제를 이용하는 알루미늄의 에칭 공정에서는 아래의 화학식 1에 나타낸 바와 같이, 알루미늄이 에칭제에 용해되면서 알루민산나트륨(2NaAlO2)과 함께 수소 가스를 발생시키며, 이때 발생하는 수소 가스에 의해 알루미늄의 표면에 물리적으로 흡착되어 있는 기름기와 같은 오염물이 제거되면서 상기 알루미늄의 표면이 미려한 금백색을 띠게 된다.For example, in the etching process of aluminum using the sodium hydroxide etchant, as shown in the following Chemical Formula 1, aluminum is dissolved in the etchant to generate hydrogen gas together with sodium aluminate (2NaAlO 2 ), which is generated at this time. By removing the contaminants such as grease that is physically adsorbed on the surface of the aluminum, the surface of the aluminum has a beautiful gold-white color.
하지만, 상기 수산화나트륨 에칭제를 이용하는 알루미늄의 에칭 공정에서 발생하는 수소 가스는 작업자의 안면부에 따가운 느낌의 자극을 주어 작업 능률을 저하시키는 원인이 된다.However, the hydrogen gas generated in the etching process of aluminum using the sodium hydroxide etchant gives a stimulus of feeling warm to the face of the operator and causes a decrease in work efficiency.
특히, 상기 알루미늄이 에칭제에 용해되는 시간이 지나갈수록 알루미늄의 용해도가 저하되면서 에칭제에 용해된 알루미늄이 과포화 상태에 도달하게 되는데, 이 경우 아래의 화학식 2에 나타낸 바와 같이, 상기 알루민산나트륨이 물과 반응함에 따라서 생성되는 수산화알루미늄(2Al(OH)3)이 수화되어 알루미나3수화물(Al2O3·3H2O)을 생성하고, 이렇게 생성된 알루미나3수화물 중 알루미나는 에칭조의 바닥에 침전되어 쌓이면서 딱딱한 덩어리(scale)로 되어 작업자가 수시로 에칭조의 바닥에 침전된 알루미나 덩어리를 제거해야 하는 번거로움이 있을 뿐만 아니라, 침전된 알루미나 덩어리의 양에 비례하여 에칭제 부족을 초래하므로 에칭제 보충 주기가 짧아지고 부족한 에칭제를 보충할 때마다 알루미늄의 에칭 원가가 상승하는 문제점이 있다.In particular, as the aluminum dissolves in the etchant, as the solubility of the aluminum decreases, the aluminum dissolved in the etchant reaches a supersaturated state. In this case, as shown in Formula 2 below, the sodium aluminate is The aluminum hydroxide (2Al (OH) 3 ) produced by the reaction with water is hydrated to produce alumina trihydrate (Al 2 O 3 · 3H 2 O), and the alumina in the alumina trihydrate thus precipitated at the bottom of the etching bath. As it accumulates, it becomes a hard scale, which makes it difficult for the operator to remove the alumina mass deposited on the bottom of the etching tank from time to time. When the shortening and replenishing the insufficient etching agent there is a problem that the etching cost of the aluminum rises.
2Al(OH)3 -> Al2O3·3H2O 2Al (OH) 3 -> Al 2 O 3 · 3H 2 O
본 발명은 상기한 종래의 문제점을 해결하기 위한 것으로서, 본 발명의 목적은 종래의 수산화나트륨 에칭제에 질산나트륨(NaNO3)과 계면활성제를 추가함으로써 알루미늄의 에칭 과정에서 발생하는 수소 가스 및 알루미나와 같은 바람직하지 않은 잔류물의 생성을 억제하는 알루미늄 에칭제를 제공하는데 있다.The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to add hydrogen nitrate (NaNO 3 ) and a surfactant to a conventional sodium hydroxide etchant and hydrogen gas and alumina generated in the etching process of aluminum and It is to provide an aluminum etchant that inhibits the formation of such undesirable residues.
본 발명의 상기한 목적을 달성하기 위하여, 수산화나트륨 5∼20중량%와 질산나트륨 1∼8중량%, 계면활성제 0.01∼0.05중량% 및 잔여성분이 물로 이루어진 알루미늄 에칭제를 제공한다.In order to achieve the above object of the present invention, 5 to 20% by weight of sodium hydroxide, 1 to 8% by weight of sodium nitrate, 0.01 to 0.05% by weight of a surfactant and the residual component is provided with an aluminum etchant.
상기와 같이 이루어진 알루미늄 에칭제는 알루미늄의 표면에 물리적으로 흡착되어 있는 오염물(예컨대, 기름기)을 제거하기 위하여 통상의 알루미늄 전해 공정의 전처리 공정으로 수행되는 알루미늄의 에칭 공정에 사용된다.The aluminum etchant made as described above is used in the etching process of aluminum that is performed by a pretreatment process of a conventional aluminum electrolysis process to remove contaminants (eg, oily) that are physically adsorbed on the surface of aluminum.
이하, 본 발명의 바람직한 실시예에 대하여 상세히 설명하며, 이 실시예는 이하의 특허청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자라면 누구든지 다양한 변경 실시가 가능하다.Hereinafter, preferred embodiments of the present invention will be described in detail, and this embodiment can be used by anyone skilled in the art without departing from the spirit of the present invention as claimed in the following claims. Various changes can be made.
[실시예 1]Example 1
수산화나트륨 10중량%와 질산나트륨 1중량%, 계면활성제 0.01중량% 및 잔여성분이 물로 이루어진 알루미늄 에칭제는 에칭조에 담겨진 상태에서 60℃∼70℃의 온도로 유지되며, 작업자가 상기 에칭조에 담겨 있는 에칭제를 60℃∼70℃의 온도로 유지시키면서 에칭용 알루미늄을 1∼3분 동안 침지시키면, 상기 알루미늄의 표면에 물리적으로 흡착되어 있는 오염물(예컨대, 기름기)이 제거된다.An aluminum etchant consisting of 10% by weight of sodium hydroxide, 1% by weight of sodium nitrate, 0.01% by weight of surfactant and residual components in water is maintained at a temperature of 60 ° C. to 70 ° C. in the state of being contained in the etching bath. When the etching aluminum is immersed for 1 to 3 minutes while the etching agent is maintained at a temperature of 60 ° C to 70 ° C, contaminants (eg, oily) physically adsorbed on the surface of the aluminum are removed.
특히, 이때 알루미늄이 에칭제에 용해되면서 생성되는 수소 가스(화학식 1 참조)는 상기 계면활성제에 의해 에칭제의 상부 표면에 형성되는 막에 의해 차단되어 작업자의 안면부에 직접 접촉하지 못한다.In particular, the hydrogen gas (see Formula 1) generated as aluminum is dissolved in the etchant is blocked by the film formed on the upper surface of the etchant by the surfactant and thus does not directly contact the face of the operator.
또한, 알루미늄이 에칭제에 용해되면서 생성되는 종래의 알루미나3수화물(화학식 2 참조)은 아래의 화학식 3과 같이 상기 질산나트륨과 반응하여 질산알미늄과 수산화나트륨, 물 및 산소를 생성하므로, 종래에 에칭조의 바닥에 침전되어 쌓이던 알루미나는 생성되지 않는다.In addition, the conventional alumina trihydrate (see Formula 2), which is produced while aluminum is dissolved in an etchant, reacts with the sodium nitrate to generate aluminum nitrate, sodium hydroxide, water, and oxygen as shown in Formula 3 below, and thus, conventional etching The alumina that settled on the bottom of the bath is not produced.
상기 실시예 1과 같이 수산화나트륨과 질산나트륨을 주성분으로 포함하는 알루미늄 에칭제는 수산화나트륨만을 주성분으로 포함하는 종래의 알루미늄 에칭제와 비교해 볼 때, 다음과 같이 차별된다.Compared with the conventional aluminum etchant containing only sodium hydroxide as a main component, the aluminum etchant comprising sodium hydroxide and sodium nitrate as a main component, as in Example 1, is differentiated as follows.
첫째로, 알루미늄의 에칭 공정 중에 작업자의 안면부에 따가운 느낌의 자극을 주는 수소 가스가 계면활성제에 의해 형성된 막에 의해 차단되므로 상대적으로 작업 능률을 향상시킨다.First, the hydrogen gas, which gives a warm feeling to the operator's face during the etching process of aluminum, is blocked by the film formed by the surfactant, thereby improving the work efficiency relatively.
둘째로, 알루미늄의 에칭 공정 중에 에칭조의 바닥에 침전되어 쌓이면서 딱딱한 덩어리(scale)로 되는 알루미나가 생성되지 않으므로 종래에 작업자가 수시로 에칭조의 바닥에 침전된 알루미나 덩어리를 제거해야 하는 번거로움이 해소된다.Secondly, since the alumina that becomes a hard scale is formed as it is deposited and accumulated at the bottom of the etching bath during the etching process of aluminum, the inconvenience of the operator having to remove the alumina lump deposited at the bottom of the etching bath is eliminated in the related art.
셋째로, 알루미늄의 에칭 공정 중에 에칭조의 바닥에 침전되어 쌓이면서 딱딱한 덩어리(scale)로 되는 알루미나가 생성되지 않으므로 종래와 같이 침전된 알루미나 덩어리의 양에 비례하여 부족해진 에칭제를 보충할 필요가 없고, 종래에 비 해 에칭제 보충 주기가 연장됨에 따라서 알루미늄의 에칭 원가를 절감시킬 수 있다.Thirdly, since the alumina that becomes a hard scale is formed as it is deposited and accumulated at the bottom of the etching bath during the etching process of aluminum, it is not necessary to replenish the insufficient etchant in proportion to the amount of the alumina mass deposited as in the prior art. As the etching agent replenishment period is extended, the etching cost of aluminum can be reduced.
상술한 바와 같은 본 발명에 따른 알루미늄 에칭제를 사용하면, 알루미늄의 에칭 공정 중에 작업자의 안면부에 따가운 느낌의 자극을 주는 수소 가스가 계면활성제에 의해 형성된 막에 의해 차단되므로 작업 능률을 향상시킬 수 있고, 알루미늄의 에칭 공정 중에 에칭조의 바닥에 침전되어 쌓이면서 딱딱한 덩어리(scale)로 되는 알루미나가 생성되지 않으므로 종래에 작업자가 수시로 에칭조의 바닥에 침전된 알루미나 덩어리를 제거해야 하는 번거로움이 해소될 뿐만 아니라, 종래에 비해 에칭제 보충 주기가 연장됨에 따라서 알루미늄의 에칭 원가를 절감시킬 수 있다.By using the aluminum etchant according to the present invention as described above, since the hydrogen gas, which gives a warm feeling to the face of the operator during the etching process of aluminum, is blocked by the film formed by the surfactant, the working efficiency can be improved. During the etching process of aluminum, the alumina that becomes a hard scale is formed as it is deposited and accumulated at the bottom of the etching bath, thus eliminating the inconvenience of having to remove the alumina mass deposited on the bottom of the etching bath in the past. As the etching agent replenishment period is extended as compared with the related art, etching cost of aluminum may be reduced.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106367791A (en) * | 2016-11-11 | 2017-02-01 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | Alkaline three-in-one grinding process capable of integrating pretreatment of aluminum with on-line recycle of aluminum hydroxide |
| CN106367792A (en) * | 2016-11-11 | 2017-02-01 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | Aluminum pretreatment alkaline three-in-one online recycling system for demolding alkaline liquor for extruding mold aluminum material heads and aluminum hydroxide |
| CN106757268A (en) * | 2016-11-11 | 2017-05-31 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | The aluminium pre-treatment three-in-one and alkali liquid regeneration of alkalescence and aluminium hydroxide online recycling technique |
| KR20190008803A (en) * | 2017-07-17 | 2019-01-25 | 오제민 | Method for lusterless aluminum |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106367791A (en) * | 2016-11-11 | 2017-02-01 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | Alkaline three-in-one grinding process capable of integrating pretreatment of aluminum with on-line recycle of aluminum hydroxide |
| CN106367792A (en) * | 2016-11-11 | 2017-02-01 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | Aluminum pretreatment alkaline three-in-one online recycling system for demolding alkaline liquor for extruding mold aluminum material heads and aluminum hydroxide |
| CN106757268A (en) * | 2016-11-11 | 2017-05-31 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | The aluminium pre-treatment three-in-one and alkali liquid regeneration of alkalescence and aluminium hydroxide online recycling technique |
| CN106367791B (en) * | 2016-11-11 | 2018-10-02 | 佛山市三水雄鹰铝表面技术创新中心有限公司 | Aluminium pre-treatment and aluminium hydroxide online recycling and the three-in-one frosting technology of alkalinity |
| KR20190008803A (en) * | 2017-07-17 | 2019-01-25 | 오제민 | Method for lusterless aluminum |
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