KR20060067755A - Fabricating method for ink jet print head - Google Patents

Abstract

The present invention relates to an inkjet printhead, the present invention for forming an insulating layer on the upper surface of the substrate; A heater forming step of forming a heater by chemical mechanical polishing of a unitary mosaic of a plurality of unit heater cells formed of different materials on an insulating layer; An electrode forming step of forming an electrode on an upper side of the heater; A protective layer forming step of forming a protective layer on the heater and the electrode; A flow path plate forming step of forming a flow path plate forming an ink chamber and an ink flow path above the protective layer; And a nozzle plate forming step of forming a nozzle plate on which a nozzle corresponding to the ink chamber is formed on the upper side of the flow path plate. Accordingly, the shape of the bubble formed by the heater can be controlled and discharged to the nozzle. The ink ejection characteristics can be improved, and cavitation generated by the bubbles can be prevented from being concentrated in a part of the heater, and an appropriate bubble can be formed according to the ejection method.

Description

Fabrication method for Ink jet print head             

1 is a partial cross-sectional perspective view showing the configuration of an ink jet print head according to the prior art.

2 is a cross-sectional view showing the configuration of an ink jet print head according to the prior art.

3 is a cross-sectional view showing the configuration of the inkjet frit head according to the present invention.

4 is a perspective view showing a heater of the inkjet printhead according to the first embodiment of the present invention.

5 is a perspective view showing a heater of the inkjet printhead according to the second embodiment of the present invention.

6A to 6T are cross-sectional views sequentially illustrating a manufacturing process of an inkjet printhead according to the present invention.

** Description of the symbols for the main parts of the drawings **

100: base plate

110: substrate

120: insulation layer                 

130: heater

140: electrode

150: protective layer

160: cavitation prevention layer

200: Euro plate

300: nozzle plate

The present invention relates to an inkjet printhead, and more particularly, to a method of manufacturing an inkjet printhead of a thermal drive type.

In general, an inkjet printhead is an apparatus for ejecting a small droplet of printing ink to a desired position on a recording sheet to print an image of a predetermined color.

Such inkjet printheads can be largely classified in two ways depending on the ejection mechanism of the ink droplets. One is a heat-driven inkjet printhead which generates bubbles in ink by using a heat source and ejects ink droplets by the expansion force of the bubbles, and the other is ink due to deformation of the piezoelectric body using a piezoelectric body. A piezoelectric drive inkjet printhead which discharges ink droplets by a pressure applied thereto.                         

The ink droplet ejection mechanism in the thermal drive inkjet printhead will be described in more detail as follows.

When a pulse current flows through a heater made of a resistive heating element, heat is generated in the heater and the ink adjacent to the heater is instantaneously heated to about 300 ° C. Accordingly, as the ink boils, bubbles are generated, and the generated bubbles expand and apply pressure to the ink filled in the ink chamber. As a result, the ink near the nozzle is discharged out of the ink chamber in the form of droplets through the nozzle.

1 is a partial cross-sectional perspective view showing the configuration of an inkjet printhead according to the prior art, and FIG. 2 is a sectional view showing the configuration of the inkjet frithead according to the prior art.

As shown in FIG. 1, an inkjet printhead includes a base plate 10 formed by stacking a plurality of layers of materials on a substrate, and an ink chamber 22 and an ink passage 24 stacked on the base plate 10. A flow path plate 20 to be formed and a nozzle plate 30 stacked on the flow path plate 20 to eject ink are formed.

Here, ink is filled in the ink chamber 22, and a heater 13 is provided below the ink chamber 22 to generate bubbles by heating the ink. The ink passage 24 is connected to an ink reservoir (not shown) as a passage for supplying ink into the ink chamber 22. The nozzle plate 30 is provided with a plurality of nozzles 32 through which ink is discharged at positions corresponding to the respective ink chambers 22.

The internal structure of the conventional inkjet printhead having the above-described configuration will be described with reference to FIG. 2 to provide thermal insulation and insulation between the heater 13 and the substrate 11 on a substrate 11 made of silicon (Si). An insulating layer 12 is formed, and the insulating layer 12 is mainly formed by depositing a silicon oxide film SiO ₂ on the substrate 11.

In addition, a heater 13 is formed on the insulating layer 12 to heat the ink in the ink chamber 22 to generate bubbles, and an electrode for applying a current thereto to the heater 13 is formed thereon. 14 is provided, and the electrode 14 is made of, for example, aluminum or an aluminum alloy, and is formed by stacking a predetermined thickness on the heater 13 and then patterning it into a predetermined shape.

A passivation layer 15 is formed on the heater 13 and the electrode 14 to protect them, and the passivation layer 15 is oxidized or directly contacts the ink with the heater 13 and the electrode 14. It is mainly for depositing a silicon nitride film (SiN _X ) to prevent it from becoming.

Here, an anticavitation layer 16 is formed on a portion where the ink chamber 22 is formed on the protective layer 15, and an upper surface of the cavitation prevention layer 16 forms a bottom surface of the ink chamber 22. Tantalum (Ta) thin films are mainly used to prevent the heater 13 from being damaged by the high air pressure generated when bubbles in the ink chamber 22 disappear.

The flow path plate 20 for forming the ink chamber 22 and the ink flow path 24 is stacked on the base plate 10 formed by stacking several material layers on the substrate 11 as described above. ) Is formed by applying a photosensitive polymer by a lamination method of heating, pressing and compressing the photosensitive polymer onto the base plate 10, and then patterning the photosensitive polymer, and the coating thickness of the photosensitive polymer is discharged. It is determined by the height of the ink chamber 22 required according to the volume of the enemy.

The nozzle plate 30 having the nozzle 32 formed thereon is stacked on the upper surface of the flow path plate 20. The nozzle plate 30 is made of polyimide or nickel, and is heated and pressed onto the flow path plate 20 by using the adhesiveness of the photosensitive polymer forming the flow path plate 20.

In the structure of the conventional inkjet printhead, the heater 13 formed on the insulating layer 12 is a group consisting of titanium nitride (TiN), tantalum nitride (TaN), tantalum-aluminum alloy (TaAl), and tungsten silicide. It is formed of a single material selected from.

However, since the heater of the inkjet printhead according to the related art is formed of a single material, the shape of the bubble formed by the heater is irregularly deformed in a structure in which three surfaces are clogged and the ink flow path portion where the ink is injected is opened. This causes a nonuniformity in the ink ejection characteristics (for example, droplet speed, droplet amount, frequency, etc.) discharged to the nozzle, which has a problem that adversely affect the printing performance.

In addition, the bubble formed in the head formed of a single material heater, there is a problem that the cavitation generated by the bubble is concentrated in a portion of the heater to act as a main factor of the heater damage to shorten the life of the heater.

The present invention has been made to solve the above problems, the inkjet print that can improve the discharge characteristics of the ink discharged to the nozzle to be able to control the shape of the bubble formed by the heater irrespective of the shape of the ink chamber Its purpose is to provide a method of manufacturing a head.

In addition, an object of the present invention is to provide a method of manufacturing an inkjet print head, which can prevent the damage of the heater due to cavitation generated by the bubble by controlling the shape of the bubble formed by the heater.

The inkjet printhead manufacturing method according to the present invention for achieving the above object comprises an insulating layer forming step of forming an insulating layer on the upper surface of the substrate; A heater forming step of forming a heater by chemical mechanical polishing of a plurality of unit heater cells formed of different materials on the insulating layer in a combined mosaic form of a single layer; An electrode forming step of forming an electrode above the heater; A protective layer forming step of forming a protective layer on the heater and the electrode; A flow path plate forming step of forming a flow path plate forming an ink chamber and an ink flow path above the protective layer; And a nozzle plate forming step of forming a nozzle plate on which a nozzle corresponding to the ink chamber is formed above the flow path plate.

And a first unit heater cell forming step of depositing and forming a plurality of first unit heater cells formed in a mosaic shape in which an excess space is formed; A second unit heater cell formed of a material different from the first unit heater cell is formed in the surplus space of the first unit heater cell and the first unit heater cell, and the first unit heater cell and the second unit heater And a second unit heater cell forming step of chemically polishing the cells to form a mosaic heater combined into a single layer.

In addition, each unit heater cell, X-axis unit heater cells are formed to be divided into two or more in the direction of the X-axis of the heater; Preferably, the heater is formed of a Y-axis unit heater cell which is formed by partitioning two or more in the direction of the Y-axis of the heater.

The unit heater cell may further include at least two partitioned track unit heater cells extending concentrically from a center of the heater; And a sector unit heater cell in which at least two track unit heater cells are partitioned at the center of the heater.

In addition, the heater forming step, the first heater cell material deposition step of depositing a first heater cell material on the insulating layer; Forming a first etching mask by coating a photoresist on the surface of the first heater cell material and then patterning the photoresist by photolithography; A first unit heater cell forming step of removing a portion exposed by the first etching mask through an etching process and removing the first etching mask to form a first unit heater cell in a mosaic form with excess space; A second heater cell material deposition step of depositing a second heater cell material thicker than a thickness of the first unit heater cell on surfaces of the first unit heater cell and the insulating layer; And a second unit heater cell forming step of forming the second unit heater cell in the excess space in which the first unit heater cell is formed by polishing the second heater material and the first heater material by chemical mechanical polishing. desirable.

Hereinafter, a method of manufacturing an inkjet print head according to the present invention will be described in detail with reference to the accompanying drawings.

In the description of the present invention, terms defined are defined in consideration of functions in the present invention, which may vary according to the intention or custom of a person skilled in the art, and thus, limit the technical components of the present invention. It should not be understood as.

In addition, the same reference numerals in the drawings refer to the same components, the size of each component in the drawings may be exaggerated for clarity and convenience of description, when it is described that one layer is present on the substrate or another layer, The layer may be present on and directly in contact with the substrate or another layer, with a third layer in between.

3 is a cross-sectional view showing a configuration of an inkjet printhead according to the present invention, FIG. 4 is a perspective view showing a heater of the inkjet printhead according to the first embodiment of the present invention, and FIG. 5 is a second embodiment of the present invention. It is a perspective view which shows the heater of the inkjet printhead.

Here, although only the unit structure of the inkjet printhead is shown in the drawing, in the inkjet printhead manufactured in a chip state, a plurality of ink chambers and a plurality of nozzles are arranged in one or two rows, and arranged in three or more rows to further increase the resolution. May be

As illustrated, the inkjet printhead according to the method of manufacturing an inkjet printhead according to the present invention has a structure in which the base plate 100, the flow path plate 200, and the nozzle plate 300 are sequentially stacked.

Here, the flow path plate 200 defines an ink chamber 220 in which ink is filled therein and an ink flow path 240 for supplying ink from the ink reservoir (not shown) into the ink chamber 220. That is, the flow path plate 200 forms sidewalls surrounding the ink chamber 220 and the ink flow path 240. The nozzle plate 300 is provided with a nozzle 320 through which ink is discharged at a position corresponding to the ink chamber 220.

The base plate 100 is formed by stacking a plurality of insulating layers 120, a heater 130, an electrode 140, a protective layer 150, a cavitation prevention layer 160, and the like on the substrate 110. As the substrate 110, a silicon wafer that is widely used for manufacturing an integrated circuit is used.

Here, the insulating layer 120 serves as a heat insulating layer for suppressing the insulation between the substrate 110 and the heater 130 as well as the heat energy generated from the heater 130 to escape to the substrate 110. The insulating layer 120 is formed of a silicon oxide film (SiO ₂ ) formed by oxidizing the surface of the substrate 110 at a high temperature.

In addition, the heater 130 formed on the upper surface of the insulating layer 120 is formed in a mosaic form combined by a plurality of unit heater cells 130a and 130b, and each unit heater cell 130a and 130b. Silver is formed by a plurality of heater cell materials 130a ', 130b' selected from titanium nitride (TiN), tantalum nitride (TaN), tantalum-aluminum alloy (TaAl) or tungsten silicide.

Accordingly, the heater 130 formed in a mosaic form combined by the plurality of unit heater cells 130a and 130b may form the heater cell materials 130a 'and 130b' forming the unit heater cells 130a and 130b. By forming differently, it is possible to control the heat distribution generated in the heater 130, it is possible to control the shape of the bubble formed by the heater 130.

Here, the above-described heater 130 may be formed in the shape of a rectangle or a circle as shown in Figures 4 to 5, in the case of a square heater 130, as described above a plurality of unit heater cells ( It is formed in a grid form by the 130a, 130b, in the case of a circular heater 130 may be formed in the form of tracks and sectors partitioned by a plurality of unit heater cells (130a, 130b).

In addition, an electrode 140 for applying a current to the heater 130 is provided outside the upper surface of the heater 130 to generate a bubble by heating the ink in the ink chamber 220. It may be made of a metal layer, but may be formed by laminating two or more kinds of metal layers, and may be formed of a highly conductive metal such as aluminum (Al), tungsten (W), titanium (Ti), titanium nitride (TiN), or tantalum nitride (TaN). Is done.

A passivation layer 150 is formed on the heater 130 and the electrode 140 to protect them. The protection layer 150 is for preventing the heater 130 and the electrode 140 from being oxidized or coming into direct contact with ink. The protective layer 150 is formed of a silicon nitride film (SiN) or a polysilicon film.

In addition, an anti-cavitation layer 160 is formed on a portion where the ink chamber 220 is formed on the protective layer 150. The cavitation prevention layer 160 is to prevent the heater 130 from being damaged by the high pressure generated when the upper surface forms the bottom surface of the ink chamber 220 and the bubbles in the ink chamber 220 disappear. It is formed of a tantalum (Ta) thin film or a tungsten (W) thin film.

Hereinafter, the manufacturing method of the inkjet printhead according to the present invention having the structure as described above will be described.

6A to 6T are cross-sectional views sequentially illustrating a manufacturing process of an inkjet printhead according to the present invention.

First, referring to FIG. 6A, a silicon wafer is processed to a thickness of about 300 to 500 μm as the substrate 110 in this embodiment. Silicon wafers are widely used in the manufacture of semiconductor devices and are effective for mass production. On the other hand, shown in Figure 6a shows a very small portion of the silicon wafer, the inkjet printhead according to the present invention can be manufactured in a state of tens to hundreds of chips on one wafer.

The insulating layer 120 is formed on the prepared upper surface of the silicon substrate 110. The insulating layer 120 may be formed of a silicon oxide film (SiO ₂ ) having a thickness of about 1 to 3 μm formed on the surface of the substrate 110 when the surface of the substrate 110 is oxidized at a high temperature.

Thereafter, the heater 130 is formed on the upper surface of the insulating layer 120. Here, the heater 130 formed on the insulating layer 120 is formed in a mosaic form by a plurality of unit heater cells may be formed of two or more unit cells, in the present invention, two types of unit cells It demonstrates as follows.

6B to 6H are views illustrating a step of forming the heater 130 on the insulating layer 120.

 Specifically, as shown in FIG. 6B, the first heater cell material 130a ′ is deposited on the insulating layer 120. Here, the first heater cell material 130a ′ is selected from, for example, titanium nitride (TiN), tantalum nitride (TaN), tantalum-aluminum alloy (TaAl), or tungsten silicide, such as sputtering. It may be performed by physical vapor deposition (PVD).

Thereafter, a photoresist is applied to the surface of the first heater cell material 130a ′ deposited as shown in FIGS. 6C to 6E, and then patterned by photolithography (PR ₁ ) to form a first etching mask. To form (M ₁ ).

Subsequently, the portion of the first heater cell material 130a 'exposed by the first etching mask M ₁ is removed by dry or wet etching, and the first photoresist is removed by ashing and strip, which is a conventional photoresist removing process. The etching mask M ₁ is removed and a first unit heater cell 130a patterned into a predetermined shape is formed as shown in FIG. 6F.

Thereafter, as shown in FIG. 6G, the second heater cell material 130b ′ is deposited on the surfaces of the first unit heater cell 130a and the insulating layer 120 formed in a predetermined shape, and the second heater cell is deposited. The material 130b ′ is formed thicker than the thickness of the first unit heater cell 130a while covering both the first unit heater cell 130a and the insulating layer 120 on which the first unit heater cell 130a is formed.

 Here, the second heater cell material 130b 'may be formed of, for example, titanium nitride (TiN), tantalum nitride (TaN), tantalum-aluminum alloy (TaAl), or tungsten silicide in which the first heater cell material 130a' is selected. ) Is selected from the remaining materials except for the material selected as the first heater cell material 130a ', and may be performed by physical vapor deposition (PVD), such as sputtering.

Thereafter, chemical mechanical polishing (CMP) is performed on the second unit heater cell 130b deposited while covering both the first unit heater cell 130a and the first unit heater cell 130a. As shown in 6h, the heater 130 in which the second unit heater cell 130b is formed is formed in the surplus space of the remaining portion in which the first unit heater cell 130a is formed.

The heater 130 formed of the first and second unit heater cells 130a and 130b may be formed by a heater cell material selected from two or more types by repeatedly performing the above process. It is possible to control the temperature distribution of the heater 130 by changing the heater cell material and the arrangement of the unit heater cells 130a and 130b forming the 130 to form the shape of the bubble formed by the heater 130 in the ink chamber and Can be adjusted according to the ink ejecting method

That is, the heater cell materials of the first and second unit heater cells 130a and 130b forming the heater 130 are selected and formed by selecting different types of heater cell materials having different amounts of heat, and each unit heater cell ( By forming different arrangements of the 130a and 130b, the heat distribution generated from the heater 130 can be controlled to control the shape of the bubble formed by the heater 130.

Here, the above-described heater 130 may be formed in a rectangular or circular shape, in the case of the rectangular heater 130, a plurality of unit heater cells 130a each composed of two or more in the direction of the X-axis and Y-axis , 130b) is formed in a lattice shape, and in the case of the circular heater 130, each of the plurality of unit heater cells 130a and 130b is divided into tracks and sectors, and each track and sector is composed of two or more kinds. Can be formed.

The heater 130 is formed by the first and second unit heater cells 130a and 130b as shown in FIG. 6H by the above-described process.

6I to 6L, an electrode layer 140 ′ is formed on the upper side of the heater 130 formed by the first and second unit heater cells 130a and 130b. . The electrode layer 140 ′ is formed by sputtering a metal material having good conductivity such as aluminum (Al), tungsten (W), titanium (Ti), titanium nitride (TiN), or tantalum nitride (TaN). It can be formed by depositing to a thickness of about 2㎛.

The photoresist is coated on the surface of the electrode layer 140 ′ formed as described above, and then patterned by photolithography PR ₂ to form a second etching mask M ₂ . Subsequently, a portion of the electrode layer 140 ′ exposed by the second etching mask M ₂ is removed by dry or wet etching, and the second etching mask M ₂ is removed by ashing and strip, which is a conventional photoresist removing process. ), The electrode 140 is formed outside the upper surface of the heater 130 as shown in FIG. 6L.

Meanwhile, as described above, the electrode 140 may be formed of two or more metal layers. When the electrode 140 is formed of two metal layers, the electrode 140 may be formed by depositing two metal layers made of different metal materials, and then etching masks. The two metal layers are etched together to form electrodes 140.

Next, as shown in FIG. 6m, the protective layer 150 is formed on the surfaces of the heater 130 and the electrode 140. The protective layer 150 protects the heater 130 and the electrode 140, and deposits a silicon nitride film (SiN) to about 1 μm to 3 μm by physical vapor deposition (PVD) or chemical vapor deposition (CVD). Or by depositing polysilicon.

Thereafter, the cavitation prevention layer 160 is formed on the protective layer 150. 6N to 6R illustrate a step of forming the cavitation prevention layer 160 on the protective layer 150.

Specifically, as shown in FIG. 6N, a tantalum thin film 160 ′ is deposited on the protective layer 150 by sputtering to a thickness of about 0.1 μm to about 1.0 μm. In this case, the tantalum thin film 160 ′ may be replaced with a tungsten thin film.

Then, after the photoresist is applied to the surface of the tantalum thin film 160 ′ formed as described above, it is patterned by photolithography (PR ₃ ) to form a third etching mask (M ₃ ). Subsequently, a portion of the tantalum thin film 160 ′ exposed by the third etching mask M ₃ is removed by dry or wet etching, and the third etching mask M is removed by ashing and strip which is a conventional photoresist removing process. ₃ ) Remove.

Then, as illustrated in FIG. 6R, the cavitation prevention layer 160 is formed, and the substrate 110, the insulating layer 120, the heater 130, the electrode 140, the protective layer 150, and the cavitation prevention layer 160 are formed. Base plate 100 consisting of is completed.

Next, as shown in FIG. 6S, the flow path plate 200 defining the ink chamber 220 and the ink flow path 240 is stacked on the base plate 100.

The flow path plate 200 may be formed by applying a photosensitive polymer such as polyimide to the base plate 100 to a predetermined thickness and then patterning it by photolithography.

Here, the coating thickness of the photosensitive polymer is about 25 to 35㎛, which is appropriately determined by the height of the ink chamber 220 required according to the volume of the ink droplets ejected, the height of the range different from the illustrated height May have

Specifically, the photosensitive polymer may be dried or filmed or liquid. When the photosensitive polymer is a dry film, it is applied by a lamination method of heating, pressing and compressing it on the base plate 100. When the photosensitive polymer is a liquid, the base plate ( 100) by a spin coating method.

As such, when the photosensitive polymer coated on the base plate 100 is selectively exposed using a photomask that protects the portion where the ink chamber 220 and the ink flow path 240 are to be formed, the exposed portion is cured and thus chemically resistant. And high mechanical strength.

Subsequently, when the uncured portion of the photosensitive polymer is dissolved and removed by using a solvent, the ink chamber 220 and the ink flow passage 240 are formed, and at the same time, the portion cured by exposure forms the flow path plate 200 surrounding them. To form.

Finally, as shown in FIG. 6t, the nozzle plate 300 having the nozzle 320 is formed on the flow path plate 200. The nozzle plate 300 is made of polyimide or nickel, and is heated and pressed onto the flow path plate 200 by using the adhesiveness of the photosensitive polymer forming the flow path plate 200.

After the above steps, an inkjet printhead according to the present invention having a structure as shown in Fig. 6T is completed.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and equivalent other embodiments are possible. For example, the materials used to construct each element of the printhead in the present invention may use materials not illustrated.

In addition, the specific numerical values exemplified in each step may be adjusted beyond the exemplified ranges within the range in which the manufactured printhead can operate normally. In addition, as a method of laminating and forming each material is merely illustrated, various deposition methods may be applied.

In particular, since the present invention has a main feature in the heater forming method of the base plate, the flow path plate and the nozzle plate laminated thereon may be formed by various other methods known from the above-described method. For example, the nozzle plate may be integrally formed using the same material as the flow path plate. Therefore, the true technical protection scope of the present invention will be defined by the appended claims.

As described above, according to the manufacturing method of the inkjet printhead according to the present invention, by providing a heater formed of a plurality of heater cells, it is possible to control the shape of the bubble formed by the heater, discharge the ink discharged to the nozzle It is possible to improve the characteristics, thereby improving the printing performance of the inkjet print head.

In addition, there is an effect that can prevent the cavitation generated by the bubble is concentrated in a portion of the heater to extend the life of the heater.

In addition, regardless of the chamber shape of the inkjet head, by controlling the shape of the bubble formed by the heater there is an effect that can form a suitable bubble according to the discharge method.

Claims (5)

An insulating layer forming step of forming an insulating layer on an upper surface of the substrate; A heater forming step of forming a heater by chemical mechanical polishing of a plurality of unit heater cells formed of different materials on the insulating layer in a combined mosaic form of a single layer; An electrode forming step of forming an electrode above the heater; A protective layer forming step of forming a protective layer on the heater and the electrode; A flow path plate forming step of forming a flow path plate forming an ink chamber and an ink flow path above the protective layer; And a nozzle plate forming step of forming a nozzle plate having a nozzle corresponding to the ink chamber on an upper side of the flow path plate. A first unit heater cell forming step of depositing and forming a plurality of first unit heater cells formed in a mosaic shape in which an excess space is formed; A second unit heater cell formed of a material different from the first unit heater cell is formed in the surplus space of the first unit heater cell and the first unit heater cell, and the first unit heater cell and the second unit heater And a second unit heater cell forming step of chemically polishing the cells to form a mosaic heater combined into a single layer. The method of claim 1 or 2, wherein each unit heater cell, An X-axis unit heater cell formed to be divided into two or more in the direction of the X-axis of the heater; The inkjet printhead manufacturing method according to claim 1, wherein the heater unit is formed of a Y-axis unit heater cell which is formed by partitioning two or more in the Y-axis direction of the heater. The method of claim 1 or 2, wherein each unit heater cell, Two or more partitioned track unit heater cells extending concentrically from the center of the heater; And a sector unit heater cell in which at least two track unit heater cells are partitioned at the center of the heater. The method of claim 1, wherein the heater forming step, Depositing a first heater cell material on the insulating layer; Forming a first etching mask by coating a photoresist on the surface of the first heater cell material and then patterning the photoresist by photolithography; A first unit heater cell forming step of removing a portion exposed by the first etching mask through an etching process and removing the first etching mask to form a first unit heater cell in a mosaic form with excess space; A second heater cell material deposition step of depositing a second heater cell material thicker than a thickness of the first unit heater cell on surfaces of the first unit heater cell and the insulating layer; And a second unit heater cell forming step of forming the second unit heater cell in the excess space in which the first unit heater cell is formed by polishing the second heater material and the first heater material by chemical mechanical polishing. A method of manufacturing an inkjet printhead, characterized by the above-mentioned.

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