KR20060059558A - Cleaning apparatus of nebulizer - Google Patents

Cleaning apparatus of nebulizer Download PDF

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KR20060059558A
KR20060059558A KR1020040098681A KR20040098681A KR20060059558A KR 20060059558 A KR20060059558 A KR 20060059558A KR 1020040098681 A KR1020040098681 A KR 1020040098681A KR 20040098681 A KR20040098681 A KR 20040098681A KR 20060059558 A KR20060059558 A KR 20060059558A
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nebulizer
cleaning
chamber
sprayed
cleaning device
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KR100706238B1 (en
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이재석
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삼성전자주식회사
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/68—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using electric discharge to ionise a gas
    • G01N27/70—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using electric discharge to ionise a gas and measuring current or voltage
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow
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    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1002—Reagent dispensers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
    • G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
    • G01N35/1009—Characterised by arrangements for controlling the aspiration or dispense of liquids
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water

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Abstract

본 발명은 유도결합플라스마 질량분석기의 시료도입장치에 해당하는 네뷸라이저(nebulizer)를 효과적으로 세정할 수 있는 장치에 관한 것이다. 본 발명의 네뷸라이저 세정 장치는 네뷸라이저의 분사구가 내부공간을 향하도록 네뷸라이저가 설치되는 챔버와, 네뷸라이저의 모세관내로 파티클을 용해시키는 세정시약을 공급하는 약액공급부와, 네뷸라이저내로 분무가스를 공급하는 가스공급부 및 네뷸라이저의 분사구로부터 챔버 내부로 분무되는 분무액상으로 물을 분사하는 노즐부를 포함한다. 이러한 네뷸라이저 세정장치는 네뷸라이저의 세정시 물리적 충격 없이 화학반응을 통해 모세관 내부의 파티클을 제거할 수 있다. The present invention relates to a device capable of effectively cleaning a nebulizer corresponding to a sample introduction device of an inductively coupled plasma mass spectrometer. The nebulizer cleaning device of the present invention includes a chamber in which the nebulizer is installed so that the injection hole of the nebulizer faces the inner space, a chemical liquid supply unit supplying a cleaning reagent dissolving particles into the capillary of the nebulizer, and sprayed gas into the nebulizer. And a nozzle unit for injecting water into a spray liquid sprayed into the chamber from a gas supply unit for supplying and a nebulizer injection port. The nebulizer cleaning device can remove particles inside the capillary through chemical reaction without physical impact when cleaning the nebulizer.

Description

네뷸라이저의 세정 장치{CLEANING APPARATUS OF NEBULIZER}Cleaner of nebulizer {CLEANING APPARATUS OF NEBULIZER}

도 1은 본 발명의 실시예인 네뷸라이저의 세정 장치의 개략적인 구성도;1 is a schematic configuration diagram of a cleaning apparatus of a nebulizer which is an embodiment of the present invention;

도 2는 세정챔버 내부에 채워지는 패킹을 보여주는 도면이다. 2 is a view showing a packing filled in the cleaning chamber.

* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

110 : 네뷸라이저110: Nebulizer

120 : 챔버120: chamber

130 : 용해시약 공급부130: dissolution reagent supply unit

140 : 가스공급부140: gas supply unit

150 : 노즐부150: nozzle unit

160 : 패킹 160: packing

본 발명은 유도결합플라스마 질량분석기의 시료도입장치에 해당하는 네뷸라이저(nebulizer)를 효과적으로 세정할 수 있는 장치에 관한 것이다. The present invention relates to a device capable of effectively cleaning a nebulizer corresponding to a sample introduction device of an inductively coupled plasma mass spectrometer.

반도체 제조 공정에서는 사진, 확산, 식각, 박막공정 후 발생하는 메탈, 파티클 및 유기물 세정 목적으로 묽은불산(DHF;Diluted HF), SC1(NH4OH:H2O2:순수 =1:4:20비율의 혼합액), 황산, 초순수 (Deionized Water) 등의 케미칼(chemical)이 광범위하게 사용되고 있다. 이러한 케미칼내에 존재하는 금속오염원 (Al, Fe 등)은 반도체 디바이스(semiconductor device) 특성에 치명적이며 제대로 관리되지 않으면 대형 품질 불량사고로 이어질 수 있다. 따라서 이에 대한 금속오염정도를 파악하는것이 매우 중요하며, 이를 위해 유도결합플라스마 질량분석기가 널리 사용되고 있다.In the semiconductor manufacturing process, diluted hydrofluoric acid (DHF; Diluted HF), SC1 (NH4OH: H2O2: pure = 1: 4: 20 ratio mixture) for the purpose of cleaning metals, particles, and organics generated after photographing, diffusion, etching, and thin film process Chemicals such as sulfuric acid and deionized water are widely used. Metal contamination sources (Al, Fe, etc.) present in these chemicals are fatal to the characteristics of semiconductor devices (semiconductor device) and can lead to large quality defects if not properly managed. Therefore, it is very important to understand the degree of metal contamination for this, and inductively coupled plasma mass spectrometry is widely used for this purpose.

유도결합플라스마 질량분석기는 반도체 제조에 사용되는 웨이퍼 또는 케미컬내 금속오염농도를 분석할 수 있는 기기로 널리 이용되고 있다. 이러한 시료들은 높은 농도의 염(鹽)을 포함하는데, 이것은 네뷸라이저(nebulizer)내 시료가 지나가는 통로인 모세관을 시간이 지남에 따라 점차로 막게되며, 따라서 정기적인 세정이 필요하게 된다. Inductively coupled plasma mass spectrometry is widely used as a device for analyzing metal contamination concentrations in wafers or chemicals used in semiconductor manufacturing. These samples contain high concentrations of salt, which gradually obstructs the capillary, the passage through which the sample in the nebulizer passes, and thus requires regular cleaning.

종래에는 이를 세정하기 위해 묽은불산(Diluted HF)에 일정시간 소킹(Soaking)후 초음파처리(Ultrasound Sonicator)를 통한 물리적충격으로 모세관내의 파티클을 제거하였다. 그러나 3회이상 세정시 테프론으로 만들어진 모세관의 뒤틀림으로 정상적인 시료도입이 이뤄지지 않아 폐기가 불가피 했다. 이처럼, 네뷸라이저의 잦은 세정은 결과적으로 네뷸라이저 수명단축의 원인을 제공하는 한계가 있다. Conventionally, in order to clean this, particles in the capillary were removed by physical shock through ultra sonication after soaking with diluted hydrofluoric acid (Diluted HF) for a certain time. However, after more than three washings, the distortion of the capillary tube made of Teflon prevented the normal sample from being introduced, which was inevitable. As such, frequent cleaning of the nebulizer is consequently limited, providing a cause for shortening the nebulizer life.

본 발명은 이와 같은 종래의 문제점을 해결하기 위한 것으로, 그 목적은 네뷸라이저의 세정시 물리적 충격 없이 화학반응과 시료도입장치의 사용환경을 접목 하여 네뷸라이저의 모세관 내부의 파티클을 제거할 수 있는 새로운 네뷸라이저의 세정 장치를 제공하는데 있다. The present invention is to solve such a conventional problem, the object of the present invention is to remove the particles inside the capillary tube of the nebulizer by combining the chemical reaction and the environment of use of the sample introduction device without physical impact when cleaning the nebulizer. It is to provide a cleaning device of the nebulizer.

상술한 목적을 달성하기 위한 본 발명의 네뷸라이저의 모세관 내의 파티클을 제거하기 위한 세정 장치는 상기 네뷸라이저의 분사구가 내부공간을 향하도록 상기 네뷸라이저가 설치되는 챔버; 상기 네뷸라이저의 모세관내로 상기 파티클을 용해시키는 용해시약을 공급하는 약액공급부; 상기 네뷸라이저내로 분무가스를 공급하는 가스공급부; 및 상기 네뷸라이저의 분사구로부터 상기 챔버 내부로 분무되는 분무액상으로 물을 분사하는 노즐부를 포함한다.Cleaning apparatus for removing particles in the capillary of the nebulizer of the present invention for achieving the above object comprises a chamber in which the nebulizer is installed so that the injection port of the nebulizer toward the inner space; A chemical liquid supply unit supplying a dissolution reagent for dissolving the particles into the capillary of the nebulizer; A gas supply unit supplying sprayed gas into the nebulizer; And a nozzle unit for injecting water into the spray liquid phase sprayed into the chamber from the injection hole of the nebulizer.

본 발명의 실시예에 따르면, 상기 네뷸라이저의 세정장치는 상기 챔버 내부에 채워지는 복수의 패킹(packing)들을 더 포함하여, 상기 네뷸라이저의 분사구로부터 분무되는 분무액이 비산하지 않고 상기 패킹들 표면에 달라붙게 되면, 상기 물에 녹아 배수된다.According to an embodiment of the invention, the cleaning device of the nebulizer further comprises a plurality of packings (packing) to be filled in the chamber, the surface of the packings without the spray liquid sprayed from the injection port of the nebulizer When stuck to the water, it is dissolved in the water and drained.

본 발명의 실시예에 따르면, 상기 패킹은 내부가 빈 원통형으로 이루어질 수 있다. According to an embodiment of the present invention, the packing may be formed in a hollow cylindrical shape.

본 발명의 실시예에 따르면, 상기 용해시약은 불산(HF)이 희석된 초순수일 수 있다.According to an embodiment of the present invention, the dissolution reagent may be ultrapure water in which hydrofluoric acid (HF) is diluted.

본 발명의 실시예에 따르면, 상기 용해시약은 불산이 50% 희석된 초순수일 수 있다.According to an embodiment of the present invention, the dissolution reagent may be ultrapure water diluted with 50% hydrofluoric acid.

예컨대, 본 발명의 실시예들은 여러 가지 형태로 변형될 수 있으며, 본 발명 의 범위가 아래에서 상술하는 실시예들로 인해 한정되어 지는 것으로 해석되어져서는 안 된다. 본 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 발명을 보다 완전하게 설명하기 위해서 제공되어지는 것이다. 따라서, 도면에서의 요소의 형상 등은 보다 명확한 설명을 강조하기 위해서 과장되어진 것이다. For example, the embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. These examples are provided to more fully explain the present invention to those skilled in the art. Accordingly, the shape of the elements in the drawings and the like are exaggerated to emphasize a clearer description.

이하, 본 발명의 실시예를 첨부된 도면 도 1 및 도 2에 의거하여 상세히 설명한다. 또, 상기 도면들에서 동일한 기능을 수행하는 구성 요소에 대해서는 동일한 참조 번호를 병기한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to FIGS. 1 and 2. In addition, in the drawings, the same reference numerals are denoted together for components that perform the same function.

도 1은 본 발명의 실시예인 네뷸라이저의 세정 장치의 개략적인 구성도이며, 도 2는 세정챔버 내부에 채워지는 패킹을 보여주는 도면이다. 1 is a schematic configuration diagram of a cleaning device of a nebulizer according to an embodiment of the present invention, Figure 2 is a view showing a packing to be filled in the cleaning chamber.

도 1에 도시된 바와 같이 본 발명의 실시예인 네뷸라이저의 세정 장치(100)는 본 발명은 반도체 제조공정에 사용되는 케미컬 또는 웨이퍼내 금속오염을 분석하는 유도결합플라스마 질량분석기에서 시료도입기에 해당되는 네뷸라이저를 물리적인 충격없이 세정하는 장치를 제공한다.As shown in FIG. 1, the cleaning device 100 of the nebulizer according to the embodiment of the present invention corresponds to a sample introduction device in an inductively coupled plasma mass spectrometer for analyzing metal contamination in a chemical or wafer used in a semiconductor manufacturing process. An apparatus is provided for cleaning a nebulizer without physical impact.

구체적으로는, 상기 네뷸라이저의 세정장치(100)는 분석과정에서 발생되는 시료도입기인 네뷸라이저(110)내 모세관(112)을 막고있는 파티클을 화학적으로 용해시켜 세정하는 장치로써, 본 발명에서 사용되는 파티클 용해 시약(세정약액)은 불산(HF)이고, 용해 반응식은 화학식1로 표시할 수 있다. Specifically, the cleaning device 100 of the nebulizer is a device for chemically dissolving and cleaning particles blocking the capillary tube 112 in the nebulizer 110, which is a sample introduction device generated in the analysis process, used in the present invention. Particle dissolution reagent (cleaning solution) is hydrofluoric acid (HF), the dissolution reaction can be represented by the formula (1).

[화학식1][Formula 1]

파티클(주로 SiO2) + HF(용해시약) -> SiF4(g) + H2O(l) Particles (mainly SiO2) + HF (dissolution reagent)-> SiF4 (g) + H2O (l)

상기 화학식1에서 l은 액체, g는 기체를 의미한다. In Chemical Formula 1, l means liquid and g means gas.

화학식1의 반응에서와 같이 모세관을 막고있는 대부분의 파티클은 규산(SiO2)로 이루어져 있다. 이 모세관에 약간의 압력을 가하여 불산(HF)를 공급해주게 되면 모세관 내에서 화학식1과 같은 반응이 일어나게 된다. 반응 후 생성물은 물에 잘 녹는 테트라플루오르실란(SiF4) 기체로 모세관을 막는 파티클은 화학식1의 반응을 통해 제거되는 것이다. As in the reaction of Formula 1, most of the particles blocking the capillary are made of silicic acid (SiO 2). When the hydrofluoric acid (HF) is supplied by applying a slight pressure to the capillary tube, the reaction of Chemical Formula 1 occurs in the capillary tube. After the reaction, the product is a tetrafluorosilane (SiF4) gas soluble in water to block the capillary particles are to be removed through the reaction of formula (1).

상기 장치의 구성은 도 1에서와 같이 실제적으로 유도결합플라스마 질량분석기에 설치될 때의 환경을 간이로 구성하여 네뷸라이저가 정상적으로 작동하는 가운데 모세관내의 파티클을 제거할 수 있도록 하였다.The configuration of the device was to simply configure the environment when actually installed in the inductively coupled plasma mass spectrometer as shown in Figure 1 so that the particles in the capillary tube can be removed while the nebulizer is operating normally.

도 1을 참조하면, 상기 네뷸라이저 세정 장치(100)는 챔버(120), 용해시약 공급부(130), 가스공급부(140), 노즐부(150) 그리고 패킹(160)들을 포함한다. 상기 챔버(120)에는 상기 네뷸라이저(110)의 분사구(114)가 내부공간을 향하도록 설치된다. 상기 약액공급부(130)는 용해시약 보관용기(132)와, 공급라인(134)을 포함하며, 상기 공급라인(134)은 상기 네뷸라이저의 모세관(112)내로 용해시약을 공급하기 위해 상기 네뷸라이저의 제1포트(116a)에 연결된다. 이때, 상기 파티클 용해시약은 불산 50% + 초순수 50% 함유된 것을 사용할 수 있다. Referring to FIG. 1, the nebulizer cleaning device 100 includes a chamber 120, a dissolution reagent supply unit 130, a gas supply unit 140, a nozzle unit 150, and a packing 160. The chamber 120 is installed such that the injection hole 114 of the nebulizer 110 faces the inner space. The chemical solution supply unit 130 includes a dissolution reagent storage container 132 and a supply line 134, and the supply line 134 supplies the nebulizer to supply the dissolution reagent into the capillary tube 112 of the nebulizer. Is connected to the first port 116a. At this time, the particle dissolution reagent may be used that contains 50% hydrofluoric acid + 50% ultrapure water.

상기 가스공급부(140)는 가스공급라인이 상기 네뷸라이저의 제2포트(116b)에 연결되어 상기 네뷸라이저로 분무가스인 질소가스(1.0 ~ 2.0L/min)를 공급하게 된다. The gas supply unit 140 is connected to the second port 116b of the nebulizer gas supply line to supply the nitrogen gas (1.0 ~ 2.0L / min) of the spray gas to the nebulizer.

상기 챔버(120)의 상부에는 상기 네뷸라이저의 분사구(114)로부터 상기 챔버 내부로 분무되는 분무액상으로 물을 분사하는 노즐부(150)가 설치되어 있다. The upper part of the chamber 120 is provided with a nozzle unit 150 for injecting water into the spray liquid sprayed into the chamber from the injection port 114 of the nebulizer.

한편, 상기 챔버(150) 내부에는 복수의 패킹(packing)(160)들이 채워져 있어, 상기 네뷸라이저의 분사구로부터 분무되는 분무액이 비산하지 않고 상기 패킹들 표면에 달라붙게 되고, 패킹(160)들 표면에 달라붙은 분무액들은 상기 노즐부(150)로부터 분사되는 물에 녹아 챔버 하단으로 떨어져서 외부로 배수된다. 도 2에 도시된 바와 같이, 상기 패킹(160)은 내부가 빈 원통형으로 이루어질 수 있다. 이와 같이, 본 발명의 네뷸라이저 세정 장치(100)는 챔버(120) 상단에 스프레이 노즐(150)을 설치하고, 그 내부에 패킹(160)들을 가득 채워 분무된 맹독성의 불산을 포함하는 분무액이 챔버내에서 비산하지 않고 물에 녹아 배수될 수 있도록 정화장치를 구성함으로 안전사고를 예방할 수 있다. 이때 모든 작업은 배기속력이 11m/sec 이상인 청정후드내에서 진행되어야 한다.Meanwhile, a plurality of packings 160 are filled in the chamber 150 such that the sprayed liquid sprayed from the injection hole of the nebulizer does not scatter and adheres to the packings surface. The sprayed liquid stuck to the surface is melted in the water sprayed from the nozzle unit 150 and falls to the bottom of the chamber to be drained to the outside. As shown in FIG. 2, the packing 160 may have a cylindrical shape inside. As such, the nebulizer cleaning device 100 of the present invention has a spray nozzle 150 installed on the top of the chamber 120 and filled with packings 160 therein, such that a spray solution containing highly toxic hydrofluoric acid is sprayed. Safety accidents can be prevented by constructing a purifier that can be dissolved in water and drained without being scattered in the chamber. All work should be carried out in a clean hood with an exhaust speed of 11 m / sec or more.

이상에서, 본 발명에 따른 네뷸라이저의 구성 및 작용을 상기한 설명 및 도면에 따라 도시하였지만 이는 예를 들어 설명한 것에 불과하며 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 다양한 변화 및 변경이 가능함은 물론이다. In the above, the configuration and operation of the nebulizer according to the present invention has been shown in accordance with the above description and drawings, but this is only an example, and various changes and modifications are possible without departing from the technical spirit of the present invention. to be.

이와 같은 본 발명에 의하면, 세정에 의한 네뷸라이저의 수명단축 없이 그 내부의 모세관을 세정할 수 있어, 네뷸라이저를 반 영구적으로 사용할 수 있는 이점이 있다. According to the present invention, it is possible to clean the capillaries therein without shortening the life of the nebulizer by cleaning, there is an advantage that the nebulizer can be used semi-permanently.

Claims (5)

네뷸라이저의 모세관 내의 파티클을 제거하기 위한 세정 장치에 있어서:In the cleaning device for removing particles in the capillary of the nebulizer: 상기 네뷸라이저의 분사구가 내부공간을 향하도록 상기 네뷸라이저가 설치되는 챔버;A chamber in which the nebulizer is installed such that an injection hole of the nebulizer faces an inner space; 상기 네뷸라이저의 모세관내로 상기 파티클을 용해시키는 용해시약을 공급하는 약액공급부;A chemical liquid supply unit supplying a dissolution reagent for dissolving the particles into the capillary of the nebulizer; 상기 네뷸라이저내로 분무가스를 공급하는 가스공급부;A gas supply unit supplying sprayed gas into the nebulizer; 상기 네뷸라이저의 분사구로부터 상기 챔버 내부로 분무되는 분무액상으로 물을 분사하는 노즐부를 포함하는 것을 특징으로 하는 네뷸라이저의 세정 장치.And a nozzle unit for injecting water into the spray liquid phase sprayed into the chamber from the injection hole of the nebulizer. 제1항에 있어서,The method of claim 1, 상기 네뷸라이저의 세정장치는The cleaning device of the nebulizer 상기 챔버 내부에 채워지는 복수의 패킹(packing)들을 더 포함하여,Further comprising a plurality of packings (filling) to be filled in the chamber, 상기 네뷸라이저의 분사구로부터 분무되는 분무액이 비산하지 않고 상기 패킹들 표면에 달라붙게 되면, 상기 물에 녹아 배수되는 것을 특징으로 하는 네뷸라이저의 세정 장치.The nebulizer cleaning device, characterized in that when the sprayed liquid sprayed from the injection hole of the nebulizer clings to the surface of the packings without being scattered, it is dissolved in the water and drained. 제2항에 있어서,The method of claim 2, 상기 패킹은 원통형으로 이루어지는 것을 특징으로 하는 네뷸라이저의 세정 장치.The packing device of the nebulizer, characterized in that consisting of a cylindrical. 제1항에 있어서,The method of claim 1, 상기 용해시약은 불산(HF)이 희석된 초순수인 것을 특징으로 하는 네뷸라이저의 세정 장치.The dissolution reagent is a cleaning device of the nebulizer, characterized in that the ultra-pure water diluted with hydrofluoric acid (HF). 제1항에 있어서,The method of claim 1, 상기 용해시약은 불산이 50% 희석된 초순수인 것을 특징으로 하는 네뷸라이저의 세정 장치.The dissolution reagent is a cleaning device of the nebulizer, characterized in that the ultra-pure water diluted 50% hydrofluoric acid.
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