KR20050043131A - Preparation method of 4-biphenylacetic acid - Google Patents

Preparation method of 4-biphenylacetic acid Download PDF

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KR20050043131A
KR20050043131A KR1020030077919A KR20030077919A KR20050043131A KR 20050043131 A KR20050043131 A KR 20050043131A KR 1020030077919 A KR1020030077919 A KR 1020030077919A KR 20030077919 A KR20030077919 A KR 20030077919A KR 20050043131 A KR20050043131 A KR 20050043131A
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acid
formula
reaction
biphenylacetic
scheme
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KR100641825B1 (en
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김상호
이태림
김윤철
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주식회사 코오롱
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/347Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups
    • C07C51/377Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups by splitting-off hydrogen or functional groups; by hydrogenolysis of functional groups
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/18Carbon
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/44Palladium
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C227/00Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C227/04Formation of amino groups in compounds containing carboxyl groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C227/00Preparation of compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C227/38Separation; Purification; Stabilisation; Use of additives
    • C07C227/44Stabilisation; Use of additives
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C229/00Compounds containing amino and carboxyl groups bound to the same carbon skeleton
    • C07C229/40Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino groups bound to carbon atoms of at least one six-membered aromatic ring and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C229/42Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino groups bound to carbon atoms of at least one six-membered aromatic ring and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton with carboxyl groups linked to the six-membered aromatic ring, or to the condensed ring system containing that ring, by saturated carbon chains
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42Separation; Purification; Stabilisation; Use of additives
    • C07C51/50Use of additives, e.g. for stabilisation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C57/00Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms
    • C07C57/30Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings
    • C07C57/38Unsaturated compounds having carboxyl groups bound to acyclic carbon atoms containing six-membered aromatic rings polycyclic

Abstract

본 발명은 4-바이페닐아세트산의 제조 방법에 관한 것으로서, 더욱 상세하게는 (a) 팔라듐-카본 촉매 존재하에서 하기 화학식 1의 4-니트로페닐아세트산을 환원시켜 하기 화학식 2의 4-아미노페닐아세트산을 제조하는 단계; 및 (b) 소디움나이트라이트 및 산 존재하에서 상기 제조된 하기 화학식 2의 4-아미노페닐아세트산을 벤젠과 반응시켜 하기 화학식 3의 4-바이페닐아세트산을 제조하는 단계를 포함하는 4-바이페닐아세트산의 제조 방법에 관한 것이다.The present invention relates to a process for preparing 4-biphenylacetic acid, and more particularly, (a) 4-aminophenylacetic acid of formula (2) by reducing 4-nitrophenylacetic acid of formula (1) in the presence of a palladium-carbon catalyst Manufacturing step; And (b) reacting 4-aminophenylacetic acid represented by the following Chemical Formula 2 with benzene to prepare 4-biphenylacetic acid represented by the following Chemical Formula 3 in the presence of sodium nitrite and an acid. It relates to a manufacturing method.

[화학식 1][Formula 1]

[화학식 2][Formula 2]

[화학식 3][Formula 3]

본 발명의 4-바이아세트산의 제조 방법은 제조 공정이 간단하고 4-바이페닐아세트산의 순도 및 수율이 높다.The method for producing 4-biacetic acid of the present invention has a simple manufacturing process and high purity and yield of 4-biphenylacetic acid.

Description

4-바이페닐아세트산의 제조 방법{PREPARATION METHOD OF 4-BIPHENYLACETIC ACID}Production method of 4-biphenylacetic acid {PREPARATION METHOD OF 4-BIPHENYLACETIC ACID}

[산업상 이용 분야][Industrial use]

본 발명은 4-바이페닐아세트산 제조 방법에 관한 것으로서, 더욱 상세하게는 제조 공정이 간단하고 4-바이페닐아세트산의 수율 및 순도가 높은 4-바이페닐아세트산의 제조 방법에 관한 것이다.The present invention relates to a method for producing 4-biphenylacetic acid, and more particularly, to a method for producing 4-biphenylacetic acid, which has a simple manufacturing process and high yield and purity of 4-biphenylacetic acid.

[종래 기술][Prior art]

4-바이페닐아세트산은 소염진통제로 유용하게 사용되고 있는 의약품 중의 하나이다. 4-biphenylacetic acid is one of the medicines that are usefully used as anti-inflammatory drugs.

현재까지 알려진 상기 4-바이페닐아세트산 제조 방법 중 대표적인 방법은 일본특개 소62-45553 및 일본특개 소62-45554호에 기재된 방법으로서, 4-페닐벤즈알데히드(4-phenylbenzaldehyde)와 2-티옥소-4-티아졸리디논(2-thioxo-4-thiazolidinone) 또는 2,4-이미다졸리디논(2,4-imidazolidinone)을 축합반응시켜 제조되는 화합물을 염기에서 과산화수소로 환원시켜 4-바이페닐아세트산을 제조하는 방법이다. Representative methods of the 4-biphenyl acetic acid production method known to date are those described in Japanese Patent Laid-Open No. 62-45553 and Japanese Patent Laid-Open No. 62-45554, 4-phenylbenzaldehyde and 2-thioxo-4 Compound prepared by condensation reaction of -thiozolidinone (2-thioxo-4-thiazolidinone) or 2,4-imidazolidinone (2,4-imidazolidinone) was reduced from base to hydrogen peroxide to prepare 4-biphenylacetic acid. That's how.

그러나 상기 방법으로 4-바이페닐아세트산을 제조하면 여러 반응단계를 거쳐야하고 각 반응단계에서 여러 가지 부산물이 생성되며 반응 종결 후 목적물을 다시 정제하는 등의 별도의 처리공정이 필요하여 반응공정이 복잡하며 최종생성물의 수율 및 순도가 낮다는 문제점이 있다.However, if 4-biphenylacetic acid is prepared by the above method, it is required to go through several reaction stages, and various by-products are generated in each reaction stage. There is a problem that the yield and purity of the final product is low.

상기 종래 기술의 문제점을 해결하기 위하여, 본 발명의 목적은 제조공정이 간단하고 4-바이페닐아세트산의 수율 및 순도가 높은 4-바이페닐아세트산의 제조 방법을 제공하기 위한 것이다.In order to solve the problems of the prior art, an object of the present invention is to provide a method for producing 4-biphenylacetic acid, which has a simple manufacturing process and high yield and purity of 4-biphenylacetic acid.

상기 목적을 달성하기 위하여, 본 발명은 (a) 팔라듐-카본 촉매 존재하에서 하기 화학식 1의 4-니트로페닐아세트산을 환원시켜 하기 화학식 2의 4-아미노페닐아세트산을 제조하는 단계; 및 (b) 소디움나이트라이트 및 산 존재하에서 상기 제조된 하기 화학식 2의 4-아미노페닐아세트산을 벤젠과 반응시켜 하기 화학식 3의 4-바이페닐아세트산을 제조하는 단계를 포함하는 4-바이페닐아세트산의 제조 방법을 제공한다.In order to achieve the above object, the present invention comprises the steps of (a) preparing 4-aminophenylacetic acid of formula (2) by reducing 4-nitrophenylacetic acid of formula (1) in the presence of a palladium-carbon catalyst; And (b) reacting 4-aminophenylacetic acid represented by the following Chemical Formula 2 with benzene to prepare 4-biphenylacetic acid represented by the following Chemical Formula 3 in the presence of sodium nitrite and an acid. It provides a manufacturing method.

[화학식 1][Formula 1]

[화학식 2] [Formula 2]

[화학식 3][Formula 3]

이하 본 발명을 더욱 상세하게 설명한다.Hereinafter, the present invention will be described in more detail.

먼저 본 발명은 (a) 팔라듐-카본 촉매 존재하에서 수소가스로 상기 화학식 1의 4-니트로페닐아세트산을 환원시켜 상기 화학식 2의 4-아미노페닐아세트산을 제조한다. 이 반응메카니즘은 하기 반응식 1과 같다.First, the present invention prepares (4-) 4-aminophenylacetic acid of Chemical Formula 2 by reducing 4-nitrophenylacetic acid of Chemical Formula 1 with hydrogen gas in the presence of a palladium-carbon catalyst. This reaction mechanism is shown in Scheme 1 below.

[반응식 1]Scheme 1

상기 반응식 1에서 4-니트로페닐아세트산은 물에서 무기염기로 염기화하여 용해된 것을 사용하는 것이 바람직하다. In Scheme 1, 4-nitrophenylacetic acid is preferably one that is dissolved by basifying with an inorganic base in water.

상기 무기염기로는 일반적으로 사용되는 무기염기는 모두 사용가능하나 그 중 수산화나트륨, 수산화칼륨 등의 바람직하게 사용될 수 있다. 상기 무기염기의 사용량은 1 내지 2 당량이 바람직하다. As the inorganic base, any of the inorganic bases generally used may be used, but among them, sodium hydroxide, potassium hydroxide and the like may be preferably used. The amount of the inorganic base used is preferably 1 to 2 equivalents.

상기 반응식 1에서 촉매로 사용되는 팔라듐-카본 촉매는 5 내지 10 %의 것을 사용하는 것이 바람직하다. 또한, 상기 팔라듐-카본 촉매의 사용량은 상기 화학식 1의 4-니트로페닐아세트산 100 g에 대하여 1.5 내지 3.5 g이 바람직하다. 상기 팔라듐-카본 촉매의 사용량이 상기 화학식 1의 4-니트로페닐아세트산 100 g에 대하여 1.5 g 미만이면 상기 반응식 1이 원활히 진행되지 않는 문제점이 있고, 3.5 g을 초과하면 반응시간은 짧아지지만 고가의 팔라듐-카본 촉매의 사용량이 많아져 경제적이지 못한 단점이 있다.The palladium-carbon catalyst used as the catalyst in Scheme 1 is preferably used 5 to 10%. In addition, the amount of the palladium-carbon catalyst used is preferably 1.5 to 3.5 g based on 100 g of 4-nitrophenylacetic acid of Chemical Formula 1. When the amount of the palladium-carbon catalyst used is less than 1.5 g with respect to 100 g of 4-nitrophenylacetic acid of Chemical Formula 1, Scheme 1 may not proceed smoothly. -The amount of carbon catalyst used is not economical disadvantages.

상기 반응식 1에서 상기 화학식 1의 4-니트로페닐아세트산의 환원제로 사용되는 수소가스의 압력은 1 내지 20 기압이 바람직하며 3 내지 7 기압이 더욱 바람직하다.In Scheme 1, the pressure of the hydrogen gas used as the reducing agent of 4-nitrophenylacetic acid of Chemical Formula 1 is preferably 1 to 20 atm and more preferably 3 to 7 atm.

또한, 상기 반응식 1의 반응시간은 4 내지 12 시간이 바람직하다. 이 반응시간은 첨가되는 팔라듐-카본 촉매의 사용량에 따라 적절한 시간을 선택할 수 있다.In addition, the reaction time of Scheme 1 is preferably 4 to 12 hours. This reaction time can be selected according to the amount of the palladium-carbon catalyst used.

최종 생성물의 수율 및 순도를 높이기 위하여 상기 반응식 1이 끝난 후 팔라듐-카본 촉매를 여과하여 제거하는 공정을 더욱 실시할 수 있다. 또한, 상기 반응식 1의 반응이 끝난 후의 반응액에 산을 첨가하여 상기 화학식 2의 4-아미노페닐아세트산을 추출하는 공정을 더욱 실시할 수 있다.In order to increase the yield and purity of the final product, the process of filtering and removing the palladium-carbon catalyst may be further performed after the completion of Scheme 1. In addition, a step of extracting 4-aminophenylacetic acid of Chemical Formula 2 by adding an acid to the reaction solution after the reaction of Scheme 1 may be further performed.

이 때 첨가되는 산으로는 일반적으로 사용되는 산은 모두 사용가능하나 황산, 염소산, 아세트산 등이 바람직하게 사용될 수 있다. 또한 산의 첨가량은 2 내지 10 당량이 바람직하게 사용될 수 있다.As the acid to be added at this time, any acid generally used may be used, but sulfuric acid, chloric acid, acetic acid and the like may be preferably used. In addition, the amount of acid added may be preferably used in 2 to 10 equivalents.

상기 반응식 1의 반응이 끝난 후의 반응액에 추출용매를 첨가하여 상기 화학식 2의 4-아미노페닐아세트산을 포함하는 유기층을 분리한다. 이 분리된 유기층에 마그네슘설페이트 등을 사용하여 건조시켜 여과하면 순도가 높은 상기 화학식 2의 4-아미노페닐아세트산이 얻어진다.An extraction solvent is added to the reaction solution after the reaction in Scheme 1 to separate the organic layer containing 4-aminophenylacetic acid of the formula (2). When the separated organic layer is dried using magnesium sulfate or the like and filtered, 4-aminophenylacetic acid of Chemical Formula 2 having high purity is obtained.

상기 추출용매로는 벤젠, 에틸아세테이트, 에테르, 메틸렌클로라이드 등의 바람직하게 사용될 수 있다. The extraction solvent may be preferably used, such as benzene, ethyl acetate, ether, methylene chloride.

상기 반응식 1을 거친 다음 (b) 소디움나이트라이트(NaNO2) 및 산 존재하에서 상기 반응식 1에서 제조된 화학식 2의 4-아미노페닐아세트산을 벤젠과 반응시켜 화학식 3의 4-바이페닐아세트산을 제조한다. 반응 메카니즘은 하기 반응식 2와 같다.After passing through Scheme 1, (b) 4-biphenylacetic acid of Formula 3 is prepared by reacting 4-aminophenylacetic acid of Formula 2 prepared in Scheme 1 with benzene in the presence of sodium nitrite (NaNO 2 ) and an acid. . The reaction mechanism is shown in Scheme 2 below.

[반응식 2]Scheme 2

반응식 1에서 제조된 상기 화학식 2의 4-아미노페닐아세트산을 포함하는 반응 여액에 소디움나이트라이트, 산 및 벤젠을 첨가하여 반응액을 제조한 후 이 반응액의 온도를 낮춘다. To the reaction filtrate containing 4-aminophenylacetic acid of Formula 2 prepared in Scheme 1, sodium nitrite, acid, and benzene were added to prepare a reaction solution, and then the temperature of the reaction solution was lowered.

상기 반응식 2에 사용되는 소디움나이트라이트의 사용량은 0.8 내지 5 당량이 바람직하고 0.8 내지 1.2 당량이 더욱 바람직하다.The amount of sodium nitrite used in Scheme 2 is preferably 0.8 to 5 equivalents, more preferably 0.8 to 1.2 equivalents.

상기 반응식 2에 사용될 수 있는 산으로는 일반적으로 사용되는 산은 모두 사용가능하며 염소산, 아세트산 등이 바람직하다.As the acid that can be used in Scheme 2, any acid generally used may be used, and chloric acid and acetic acid are preferable.

또한 상기 반응식 2에 첨가되는 벤젠의 사용량은 1 내지 50 당량이 바람직하고, 10 내지 20 당량이 더욱 바람직하다.In addition, the amount of benzene added to Scheme 2 is preferably 1 to 50 equivalents, more preferably 10 to 20 equivalents.

또한, 상기 반응식 2의 반응온도는 0 내지 10 ℃가 바람직하다. 이 반응온도는 첨가되는 소디움나이트라이트의 량에 적절히 조절할 수 있다.In addition, the reaction temperature of Scheme 2 is preferably 0 to 10 ℃. This reaction temperature can be suitably adjusted with the quantity of sodium nitrite added.

소디움나이트라이트의 사용량이 5 당량을 초과하거나 상기 반응식 2의 반응온도가 10 ℃를 초과하면 반응시간은 짧아지나 반응이 지나치게 격렬히 진행되고 또한, 반응부산물이 과량 생성되어 수율이 저하되는 문제점이 있어 바람직하지 않다.If the amount of sodium nitrite exceeds 5 equivalents or the reaction temperature of reaction formula 2 exceeds 10 ° C., the reaction time is shortened, but the reaction proceeds too vigorously, and the reaction byproducts are excessively generated, resulting in a decrease in yield. Not.

상기 반응식 2가 끝난 후 반응액을 층분리하여 결정을 얻어 본 발명의 4-바이페닐아세트산을 제조한다.After the reaction scheme 2, the reaction solution was separated by layer to obtain crystals to prepare 4-biphenylacetic acid of the present invention.

본 발명의 4-바이페닐아세트산의 제조 방법의 전체 반응메카니즘은 하기 반응식 3과 같다.The overall reaction mechanism of the production method of 4-biphenylacetic acid of the present invention is shown in Scheme 3 below.

[반응식 3]Scheme 3

이상 살펴본 바와 같이, 본 발명의 4-바이페닐아세트산의 제조 방법은 제조공정이 간단하고 상기 방법을 통하여 제조되는 최종 목적물인 4-바이페닐아세트산의 수율 및 순도가 높다.As described above, the production method of 4-biphenyl acetic acid of the present invention is simple, and the yield and purity of 4-biphenyl acetic acid, which is the final target product prepared through the method, is high.

이하 본 발명의 바람직한 실시예 및 비교예를 기재한다. 그러나 하기한 실시예는 본 발명의 바람직한 일 실시예일뿐 본 발명이 하기한 실시예에 한정되는 것은 아니다. Hereinafter, preferred examples and comparative examples of the present invention are described. However, the following examples are only preferred embodiments of the present invention and the present invention is not limited to the following examples.

(실시예 1)(Example 1)

증류수 90 g에 수산화나트륨 4 g을 용해시킨 후 4-니트로페닐아세트산 18.1 g을 첨가하여 반응액을 제조한 후 이 반응액을 교반하였다. 이 반응액에 5%의 팔라듐-카본을 0.36 g 투입하고 5 기압의 수소를 가압하여 10 시간 동안 반응시켰다. 반응이 끝난 후 반응액에서 셀라이트로 코팅된 여과기를 사용하여 5% 팔라듐-카본을 여과하였다. After dissolving 4 g of sodium hydroxide in 90 g of distilled water, 18.1 g of 4-nitrophenylacetic acid was added to prepare a reaction solution, and the reaction solution was stirred. 0.36 g of 5% palladium-carbon was added to the reaction solution, and the reaction was carried out for 10 hours by pressurizing hydrogen at 5 atmospheres. After the reaction, 5% palladium-carbon was filtered using a filter coated with celite in the reaction solution.

상기 반응액에서 팔라듐-카본을 여과한 반응액에 염소산 12 ㎖, 소디움나이트라이트 6.9 g을 순서대로 투입하고 반응액의 온도를 5 ℃로 냉각하였다. 이 반응액에 벤젠 78 g을 첨가하여 2 시간동안 격렬하게 교반하였다. 반응이 완료되면 상기 반응액을 층분리하여 상층의 유기층을 분리하였다. 이 분리된 유기층 반응액을 마그네슘설페이트로 건조하고 농축하여 농축액을 제조하였다. 이 농축액에 아세톤을 첨가하고 결정화한 후 여과지에 여과하여 4-바이페닐아세트산 15.7 g(수율 74%)을 얻었다.(m??p: 166 ℃, IR: 1688 ㎝-1, 1H NMR: δ3.7(2H), δ7.3 ~ 7.9(9H))12 ml of chloric acid and 6.9 g of sodium nitrite were sequentially added to the reaction solution which filtered the palladium-carbon from the reaction solution, and the temperature of the reaction solution was cooled to 5 ° C. 78 g of benzene was added to the reaction solution, and the mixture was stirred vigorously for 2 hours. When the reaction was completed, the reaction solution was separated by layers to separate the upper organic layer. The separated organic layer reaction solution was dried over magnesium sulfate and concentrated to prepare a concentrate. Addition of acetone to the concentrated solution and filtered on a filter paper and then crystallized to obtain 4-biphenyl-acetic acid 15.7 g (yield 74%) (m ?? p: . 166 ℃, IR: 1688 ㎝ -1, 1 H NMR: δ3 .7 (2H), δ7.3 to 7.9 (9H))

(실시예 2)(Example 2)

증류수 90 g에 수산화나트륨 4.4 g을 용해시킨 후 4-니트로페닐아세트산 18.1 g을 첨가하여 반응액을 제조한 후 이 반응액을 교반하였다. 이 반응액에 5%의 팔라듐-카본을 0.36 g 투입하고 10 기압의 수소를 가압하여 2 시간동안 반응시켰다. 반응이 끝난 후 반응액에서 셀라이트로 코팅된 여과기를 사용하여 5% 팔라듐-카본을 여과하였다. After dissolving 4.4 g of sodium hydroxide in 90 g of distilled water, 18.1 g of 4-nitrophenylacetic acid was added to prepare a reaction solution, and the reaction solution was stirred. 0.36 g of 5% palladium-carbon was added to the reaction solution, and the reaction was carried out for 2 hours by pressurizing hydrogen at 10 atm. After the reaction, 5% palladium-carbon was filtered using a filter coated with celite in the reaction solution.

상기 반응액에 벤젠 100 ㎖를 첨가하여 추출하여 유기층을 분리하였다. 이 유기층을 마그네슘설페이트로 건조하고 여과한 여액을 모은 다음 이 여액에 아세트산 36 g, 소디움나이트라이트 6.9 g을 순서대로 투입하고 반응액의 온도를 5 ℃로 냉각하였다. 이 반응액에 벤젠 78 g을 첨가하고 2 시간 동안 격렬하게 교반하였다. 반응이 완료되면 물을 첨가하고 추출하여 상층의 유기층을 분리하였다. 이 유기층에 물을 첨가하고 1N 수산화나트륨으로 염기화하여 물층을 분리하였다. 물층을 분리하여 4N 염소산을 천천히 적가하며 산성화하였다. 이 때 생성된 결정을 여과하였다. 여과된 결정을 아세토니트릴에서 재결정하여 4-바이페닐아세트산 14.5 g(수율 69%)을 얻었다.100 ml of benzene was added to the reaction solution to extract the organic layer. The organic layer was dried over magnesium sulfate, and the filtrate was collected, and 36 g of acetic acid and 6.9 g of sodium nitrite were sequentially added to the filtrate, and the reaction solution was cooled to 5 deg. 78 g of benzene was added to the reaction solution, and the mixture was stirred vigorously for 2 hours. When the reaction was completed, water was added and extracted to separate the upper organic layer. Water was added to the organic layer and the mixture was basified with 1N sodium hydroxide to separate the water layer. The water layer was separated and acidified slowly with dropwise addition of 4N chloric acid. The crystals produced at this time were filtered off. The filtered crystals were recrystallized in acetonitrile to give 14.5 g (69% yield) of 4-biphenylacetic acid.

(m??p: 166.5 ℃, IR: 1690 ㎝-1, 1H NMR: δ3.7(2H), δ7.3 ~ 7.9(9H))(m ?? p: 166.5 ° C., IR: 1690 cm −1, 1 H NMR: δ3.7 (2H), δ7.3 to 7.9 (9H))

(비교예 1)(Comparative Example 1)

3-바이페닐알데히드 3 g을 무수아세트산 4.8 ㎖에 용해시켰다. 2-티옥소-4-티아졸리디논(2-thioxo-4-thiazolidinone) 2.4 g, 소디움아세테이트 1.4 g, 톨루엔 20 ㎖에 넣고 2 시간 환류시켰다. 아세트산에테르로 추출하고 물로 세정, 건조하고, 감압농축하여 5-(4'-바이페닐릴메틸리덴)-2-티옥소-4-티아졸리디논 4.6 g(수율 94%)을 제조하였다.3 g of 3-biphenylaldehyde was dissolved in 4.8 ml of acetic anhydride. 2.4 g of 2-thioxo-4-thiazolidinone, 1.4 g of sodium acetate, and 20 ml of toluene were added and refluxed for 2 hours. Extracted with ether acetate, washed with water, dried and concentrated under reduced pressure to prepare 4.6 g (yield 94%) of 5- (4'-biphenylylmethylidene) -2-thioxo-4-thiazolidinone.

5-(4'-바이페닐릴메틸리덴)-2-티옥소-4-티아졸리디논 3.0에 20% 수산화나트륨용액 10 ㎖를 첨가하고 4 시간동안 가열환류하였다. 그 다음 반응액을 냉각 후 벤젠으로 세정하였다. 물층을 염산으로 산성화하고 아세트산 에테르로 추출하였다. 추출 후 물, 포화 염화나트륨 용액으로 차례로 세정하고 농축하여 4-바이페닐릴피루브산 1.3 g(수율 48%)을 제조하였다.10 ml of 20% sodium hydroxide solution was added to 5- (4'-biphenylylmethylidene) -2-thioxo-4-thiazolidinone 3.0 and heated to reflux for 4 hours. The reaction solution was then cooled and washed with benzene. The water layer was acidified with hydrochloric acid and extracted with acetic acid ether. After extraction, the mixture was washed with water, saturated sodium chloride solution, and concentrated to prepare 1.3 g of 4-biphenylylpyruvic acid (yield 48%).

4-바이페닐릴피루브산 2.0 g에 0.5% 수산화나트륨용액 15 ㎖와 30% 과산화수소 4 ㎖를 가하고 25 ℃에서 4 시간동안 교반하였다. 이 용액을 톨루엔으로 세정하였다. 물층을 염산으로 산성화하고 아세트산에테르를 이용하여 추출하였다. 추출 후 물, 포화 염화나트륨용액으로 차례로 세정하고 농축하여 목적화합물 4-바이페닐아세트산 1.5 g(수율 85%)를 제조하였다. 이 결정을 메틸에틸케톤에서 재결정하였다. 상기 3단계의 공정을 통하여 제조된 4-바이페닐아세트산의 수율은 38 %였다.To 2.0 g of 4-biphenylylpyruvic acid, 15 ml of 0.5% sodium hydroxide solution and 4 ml of 30% hydrogen peroxide were added and stirred at 25 ° C for 4 hours. This solution was washed with toluene. The aqueous layer was acidified with hydrochloric acid and extracted with acetic acid ether. After extraction, water and saturated sodium chloride solution were washed sequentially and concentrated to prepare 1.5 g (yield 85%) of the target compound 4-biphenylacetic acid. This crystal was recrystallized in methyl ethyl ketone. The yield of 4-biphenylacetic acid prepared through the three step process was 38%.

(수율평가)(Evaluation)

상기 실시예 1 내지 2 및 비교예 1에 나타난 바와 같이, 실시예 1 내지 2의 4-바이페닐아세트산 제조 방법을 통하여 4-바이페닐아세트산을 제조하면 최종 생성물의 수율이 각각 74% 및 69%로 비교예 1의 방법에 의하여 4-바이페닐아세트산을 제조한 경우의 수율(38%)에 비하여 거의 두배나 증가하였다.As shown in Examples 1 to 2 and Comparative Example 1, when 4-biphenyl acetic acid was prepared through the 4-biphenyl acetic acid production method of Examples 1 to 2, the yields of the final products were 74% and 69%, respectively. By the method of Comparative Example 1, the yield was almost doubled compared to the yield (38%) when 4-biphenylacetic acid was prepared.

상술한 바와 같이, 본 발명의 4-바이페닐아세트산의 제조 방법은 제조 공정이 간단하고 4-비닐아세트산의 순도 및 수율이 높다.As mentioned above, the manufacturing method of 4-biphenyl acetic acid of this invention is simple in a manufacturing process, and the purity and yield of 4-vinyl acetic acid are high.

Claims (1)

(a) 팔라듐-카본 촉매 존재하에서 하기 화학식 1의 4-니트로페닐아세트산을 환원시켜 하기 화학식 2의 4-아미노페닐아세트산을 제조하는 단계; 및(a) preparing 4-aminophenylacetic acid of formula (2) by reducing 4-nitrophenylacetic acid of formula (1) in the presence of a palladium-carbon catalyst; And (b) 소디움나이트라이트 및 산 존재하에서 상기 제조된 하기 화학식 2의 4-아미노페닐아세트산을 벤젠과 반응시켜 하기 화학식 3의 4-바이페닐아세트산을 제조하는 단계(b) reacting 4-aminophenylacetic acid of Chemical Formula 2 prepared above with benzene in the presence of sodium nitrite and an acid to prepare 4-biphenylacetic acid of Chemical Formula 3 를 포함하는 4-바이페닐페닐아세트산 제조 방법.4-biphenylphenylacetic acid production method comprising a. [화학식 1][Formula 1] [화학식 2][Formula 2] [화학식 3][Formula 3]
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US11274087B2 (en) 2016-07-08 2022-03-15 Richter Gedeon Nyrt. Industrial process for the preparation of cariprazine
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USRE49110E1 (en) 2008-07-16 2022-06-21 Richter Gedeon Nyrt. Pharmaceutical formulations containing dopamine receptor ligands
USRE49302E1 (en) 2008-07-16 2022-11-15 Richter Gedeon Nyrt. Pharmaceutical formulations containing dopamine receptor ligands
WO2010070368A1 (en) * 2008-12-17 2010-06-24 Richter Gedeon Nyrt. Process for the preparation of trans 4-amino-cyclohexyl acetic acid ethyl ester hcl
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US11274087B2 (en) 2016-07-08 2022-03-15 Richter Gedeon Nyrt. Industrial process for the preparation of cariprazine
US11547707B2 (en) 2019-04-10 2023-01-10 Richter Gedeon Nyrt. Carbamoyl cyclohexane derivatives for treating autism spectrum disorder

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