KR200457049Y1 - monitoring apparatus for semiconductor manufacturing equipment - Google Patents
monitoring apparatus for semiconductor manufacturing equipment Download PDFInfo
- Publication number
- KR200457049Y1 KR200457049Y1 KR2020110008797U KR20110008797U KR200457049Y1 KR 200457049 Y1 KR200457049 Y1 KR 200457049Y1 KR 2020110008797 U KR2020110008797 U KR 2020110008797U KR 20110008797 U KR20110008797 U KR 20110008797U KR 200457049 Y1 KR200457049 Y1 KR 200457049Y1
- Authority
- KR
- South Korea
- Prior art keywords
- high voltage
- voltage zone
- cooling fan
- semiconductor manufacturing
- zone
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
Abstract
The present invention provides a real-time monitoring of the operating state of the cooling fan provided in the high voltage zone and the temperature change of the high voltage zone in a semiconductor manufacturing facility having a high voltage zone which is electrically disconnected from the outside and operated using a unique power source. The present invention relates to a monitoring device for a new semiconductor manufacturing facility.
The monitoring device of the semiconductor manufacturing equipment according to the present invention is installed in the high voltage zone 30, the detection sensor (41, 42) for detecting the RPM of the cooling fan 34 and the temperature inside the high voltage zone 30, and the high voltage zone ( 30 is installed outside the display module 60 is connected to the sensing sensors (41, 42) and the data communication through the optical cable 50, the cooling fan (while maintaining the electrical cutoff of the high-voltage zone (30) ( There is an advantage to monitor the operating state of the 34 or the temperature inside the high-voltage zone (30).
Description
The present invention can be monitored in real time the operating state of the cooling fan provided in the high voltage zone and the temperature change inside the high voltage zone in a semiconductor manufacturing facility having a high voltage zone that is electrically isolated from the outside and operated using a unique power source. The present invention relates to a monitoring device for a new semiconductor manufacturing facility.
In general, a semiconductor manufacturing process includes an implant process for forming a pattern on the surface of a wafer with an ion beam by using a medium or high cleat facility.
As shown in FIG. 1, the medium or high cleat facility is operated by a
The
In this case, since the
In addition, a plurality of
However, since the
Therefore, when an operation abnormality occurs in the
This problem is not limited to the above-described medium or high-clan facilities, and the same has occurred in semiconductor manufacturing facilities having high voltage zones that operate independently with completely disconnected electrical connections to the outside.
Therefore, there is a need for a new method for monitoring the operating state of the
On the other hand, in the semiconductor manufacturing equipment, when the
The present invention is to solve the above problems, in a semiconductor manufacturing facility having a high voltage zone that is electrically disconnected from the outside and operated using a unique power source, while maintaining the state in which the high voltage zone is completely electrically disconnected from the outside It is an object of the present invention to provide a monitoring device of a new semiconductor manufacturing facility that can monitor in real time the operating state of the cooling fan provided in the high voltage zone and the temperature change inside the high voltage zone.
The above objects and various advantages of the present invention will become more apparent from the preferred embodiments of the present invention by those skilled in the art.
According to the present invention for achieving the above object, the
According to another feature of the present invention, the detection sensor (41, 42) is provided in front of the
According to another feature of the present invention, the
According to another feature of the present invention, by monitoring the signals of the detection sensors (41, 42) received by the
According to another feature of the present invention, the semiconductor manufacturing equipment includes a
The monitoring device of the semiconductor manufacturing equipment according to the present invention is installed in the
1 is a block diagram showing a conventional semiconductor manufacturing equipment,
Figure 2 is a block diagram showing a monitoring device of a semiconductor manufacturing facility according to the present invention,
3 is a reference diagram showing an RPM sensor of a monitoring device of a semiconductor manufacturing facility according to the present invention.
Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
2 and 3 illustrate a monitoring apparatus of a semiconductor manufacturing apparatus according to the present invention, which illustrates that the semiconductor manufacturing apparatus is applied to a medium or a high cleat apparatus that forms a pattern on a surface of a wafer with an ion beam. .
In this case, the medium or high-clincher facility includes a
And, according to the present invention, the monitoring device of the semiconductor manufacturing equipment is installed in the
In detail, the
As shown in FIG. 3, the
The
The
The
To this end, an optical transmitter connected to one end of the
In this way, since the configuration of the
In addition, the
The
At this time, when the control signal is output from the
Further, the reference value for outputting a control signal for the
In this way, the monitoring device of the semiconductor manufacturing equipment according to the present invention is installed in the high-voltage zone (30) and the detection sensors (41, 42) for detecting the RPM of the
Therefore, since the
In addition, when the RPM of the
In particular, the
In the present embodiment, as an example of a semiconductor manufacturing facility, a medium or high cleat facility is illustrated, but various types of semiconductor manufacturing facilities having a high voltage region that operates independently with a completely disconnected electrical connection to the outside. Of course, the present invention can be applied to.
In addition, the detection sensors (41, 42) is an RPM sensor (41) for measuring the rotational speed of the blade (34a) of the cooling
In addition, the
It is to be understood that the foregoing is merely illustrative of one preferred embodiment of the present invention and that modifications and variations may be made thereto without departing from the spirit of the invention.
10.
30.
50.
70. Control Unit
Claims (5)
Installed in the high voltage zone 30 is operated by the power output from the generator 32 as a power source and a sensing sensor for sensing the operating state of the cooling fan 34 or the internal temperature of the high voltage zone 30, 41, 42),
Installed on the outside of the high voltage region 30 is operated by a common commercial power source and includes a display module 60 is connected to the sensing sensors (41, 42) and data communication through the optical cable 50,
The detection sensors (41, 42),
RPM sensor 41 is provided in front of the cooling fan 34 to measure the rotational speed of the cooling fan 34,
Is installed inside the high voltage zone 30 includes a temperature sensor 42 for measuring the temperature of each part inside the high voltage zone 30,
The semiconductor manufacturing facility includes a load port 10 for loading a wafer,
The control unit 70 is connected to the load port 10 and monitors the signals of the detection sensors 41 and 42 received by the display module 60.
The control unit 70 is a control signal for switching the load port 10 to an idling state when the RPM of the cooling fan 34 is lowered below the set reference value or the internal temperature of the high voltage region 30 is higher than the set reference value. Monitoring device for semiconductor manufacturing equipment characterized in that it outputs.
The RPM sensor 41,
An infrared irradiation unit 41a for irradiating infrared rays to the front surface of the blade 34a of the cooling fan 34;
And an infrared receiver (41b) for receiving infrared rays reflected from the front surface of the blade (34a).
When the RPM of the cooling fan 34 is lowered below the set reference value or the internal temperature of the high voltage zone 30 is raised above the set reference value by monitoring the signals of the sensing sensors 41 and 42 received by the display module 60. And monitoring means (61) for outputting an alarm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2020110008797U KR200457049Y1 (en) | 2011-09-30 | 2011-09-30 | monitoring apparatus for semiconductor manufacturing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2020110008797U KR200457049Y1 (en) | 2011-09-30 | 2011-09-30 | monitoring apparatus for semiconductor manufacturing equipment |
Publications (1)
Publication Number | Publication Date |
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KR200457049Y1 true KR200457049Y1 (en) | 2011-12-02 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR2020110008797U KR200457049Y1 (en) | 2011-09-30 | 2011-09-30 | monitoring apparatus for semiconductor manufacturing equipment |
Country Status (1)
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KR (1) | KR200457049Y1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101232834B1 (en) * | 2012-07-24 | 2013-02-13 | 손규태 | Apparatus and method for monitoring the cooling fan of a semiconductor manufacturing equipment |
KR20200042785A (en) * | 2018-10-16 | 2020-04-24 | 박근배 | A Diagnostic System for Cooling Fan Using Wind Power |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002116218A (en) * | 2000-10-11 | 2002-04-19 | Iwatsu Electric Co Ltd | Monitoring apparatus for operating environment of air- cooled fan |
JP2006284129A (en) * | 2005-04-04 | 2006-10-19 | Nec Engineering Ltd | Cooling system for sealed device |
-
2011
- 2011-09-30 KR KR2020110008797U patent/KR200457049Y1/en active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002116218A (en) * | 2000-10-11 | 2002-04-19 | Iwatsu Electric Co Ltd | Monitoring apparatus for operating environment of air- cooled fan |
JP2006284129A (en) * | 2005-04-04 | 2006-10-19 | Nec Engineering Ltd | Cooling system for sealed device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101232834B1 (en) * | 2012-07-24 | 2013-02-13 | 손규태 | Apparatus and method for monitoring the cooling fan of a semiconductor manufacturing equipment |
KR20200042785A (en) * | 2018-10-16 | 2020-04-24 | 박근배 | A Diagnostic System for Cooling Fan Using Wind Power |
KR102124782B1 (en) | 2018-10-16 | 2020-06-19 | 박근배 | A Diagnostic System for Cooling Fan Using Wind Power |
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