KR20040091047A - 나노 크기 다공성 필름의 제조방법 - Google Patents

나노 크기 다공성 필름의 제조방법 Download PDF

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Publication number
KR20040091047A
KR20040091047A KR10-2004-7012627A KR20047012627A KR20040091047A KR 20040091047 A KR20040091047 A KR 20040091047A KR 20047012627 A KR20047012627 A KR 20047012627A KR 20040091047 A KR20040091047 A KR 20040091047A
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KR
South Korea
Prior art keywords
nanoparticles
particles
monomers
mixture
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR10-2004-7012627A
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English (en)
Korean (ko)
Inventor
소잉훙
뉴칭산제이
다운센드폴에이치3세
마틴스티븐제이
칼란타르토마스에이치
가드스칼스제임스피
브루자케네쓰제이
보크케빈제이
Original Assignee
다우 글로벌 테크놀로지스 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 다우 글로벌 테크놀로지스 인크. filed Critical 다우 글로벌 테크놀로지스 인크.
Publication of KR20040091047A publication Critical patent/KR20040091047A/ko
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/28—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/665—Porous materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/48—Insulating materials thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
    • C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
    • C08G2261/312—Non-condensed aromatic systems, e.g. benzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2351/00—Characterised by the use of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Formation Of Insulating Films (AREA)
  • Polyethers (AREA)
KR10-2004-7012627A 2002-02-15 2003-02-07 나노 크기 다공성 필름의 제조방법 Ceased KR20040091047A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10,077,646 2002-02-15
US10/077,646 US20030165625A1 (en) 2002-02-15 2002-02-15 Method of making a nanoporous film
PCT/US2003/003826 WO2003070813A1 (en) 2002-02-15 2003-02-07 Method of making a nanoporous film

Publications (1)

Publication Number Publication Date
KR20040091047A true KR20040091047A (ko) 2004-10-27

Family

ID=27752702

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2004-7012627A Ceased KR20040091047A (ko) 2002-02-15 2003-02-07 나노 크기 다공성 필름의 제조방법

Country Status (8)

Country Link
US (1) US20030165625A1 (https=)
EP (1) EP1476500A4 (https=)
JP (1) JP2005517785A (https=)
KR (1) KR20040091047A (https=)
CN (1) CN1643045A (https=)
AU (1) AU2003216205A1 (https=)
TW (1) TW200303878A (https=)
WO (1) WO2003070813A1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4765076B2 (ja) * 2003-02-20 2011-09-07 ダウ グローバル テクノロジーズ エルエルシー ポリアリーレンの合成方法及びその方法により製造されたポリアリーレン
WO2004090018A1 (en) * 2003-04-02 2004-10-21 Dow Global Technologies Inc. Multifunctional substituted monomers and polyarylene compositions therefrom
JP2007515501A (ja) * 2003-09-19 2007-06-14 ダウ グローバル テクノロジーズ インコーポレイティド 多官能性モノマー及びそれからのポリアリーレン組成物
JP2007505976A (ja) * 2003-09-19 2007-03-15 ダウ グローバル テクノロジーズ インコーポレイティド 結合ポラゲン含有多官能性モノマー及びそれからのポリアリーレン組成物
US7585928B2 (en) * 2003-10-21 2009-09-08 Dow Global Technologies Multifunctional monomers containing bound mesogenic poragen forming moieties and polyarylene compositions therefrom
US7626059B2 (en) 2003-10-21 2009-12-01 Dow Global Technologies Inc. Multifunctional ethynyl substituted monomers and polyarylene compositions therefrom
JP4506953B2 (ja) * 2004-05-28 2010-07-21 日本電気株式会社 共重合高分子膜およびその作製方法
US20080090007A1 (en) * 2004-06-10 2008-04-17 Niu Q Jason Method Of Forming A Nanoporous Dielectric Film
US8535702B2 (en) 2005-02-01 2013-09-17 Boston Scientific Scimed, Inc. Medical devices having porous polymeric regions for controlled drug delivery and regulated biocompatibility
US7960442B2 (en) * 2005-04-20 2011-06-14 International Business Machines Corporation Nanoporous media templated from unsymmetrical amphiphilic porogens
US7482389B2 (en) 2005-04-20 2009-01-27 International Business Machines Corporation Nanoporous media with lamellar structures
US7723438B2 (en) 2005-04-28 2010-05-25 International Business Machines Corporation Surface-decorated polymeric amphiphile porogens for the templation of nanoporous materials
JP4788415B2 (ja) * 2006-03-15 2011-10-05 ソニー株式会社 半導体装置の製造方法
US7842938B2 (en) * 2008-11-12 2010-11-30 Seagate Technology Llc Programmable metallization cells and methods of forming the same
US9868820B2 (en) 2014-08-29 2018-01-16 Rohm And Haas Electronic Materials Llc Polyarylene materials

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5700844A (en) * 1996-04-09 1997-12-23 International Business Machines Corporation Process for making a foamed polymer
WO2000031183A1 (en) * 1998-11-24 2000-06-02 The Dow Chemical Company A composition containing a cross-linkable matrix precursor and a poragen, and a porous matrix prepared therefrom
US6172128B1 (en) * 1999-04-09 2001-01-09 Honeywell International Inc. Nanoporous polymers crosslinked via cyclic structures
US6359091B1 (en) * 1999-11-22 2002-03-19 The Dow Chemical Company Polyarylene compositions with enhanced modulus profiles

Also Published As

Publication number Publication date
AU2003216205A1 (en) 2003-09-09
US20030165625A1 (en) 2003-09-04
EP1476500A4 (en) 2006-09-20
JP2005517785A (ja) 2005-06-16
EP1476500A1 (en) 2004-11-17
TW200303878A (en) 2003-09-16
CN1643045A (zh) 2005-07-20
WO2003070813A1 (en) 2003-08-28

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