KR20040034086A - Uv light division irradiation system using band pass filter - Google Patents

Uv light division irradiation system using band pass filter Download PDF

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Publication number
KR20040034086A
KR20040034086A KR1020020064148A KR20020064148A KR20040034086A KR 20040034086 A KR20040034086 A KR 20040034086A KR 1020020064148 A KR1020020064148 A KR 1020020064148A KR 20020064148 A KR20020064148 A KR 20020064148A KR 20040034086 A KR20040034086 A KR 20040034086A
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KR
South Korea
Prior art keywords
light
pass filter
band pass
light guide
ultraviolet
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Application number
KR1020020064148A
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Korean (ko)
Inventor
김삼득
Original Assignee
미르호주식회사
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Publication date
Application filed by 미르호주식회사 filed Critical 미르호주식회사
Priority to KR1020020064148A priority Critical patent/KR20040034086A/en
Publication of KR20040034086A publication Critical patent/KR20040034086A/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/283—Interference filters designed for the ultraviolet
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V17/00—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages
    • F21V17/02—Fastening of component parts of lighting devices, e.g. shades, globes, refractors, reflectors, filters, screens, grids or protective cages with provision for adjustment

Abstract

PURPOSE: An ultraviolet beam splitter system using a band pass filter is provided to reduce the maintenance by using and managing effectively a high-priced ultraviolet source. CONSTITUTION: An ultraviolet beam splitter system using a band pass filter includes a band pass filter(4), a focusing lens(8), a main light guide input part(10), and auxiliary light guide input part(6). The band pass filter(4) is installed at a lower side of a mercury xenon lamp(2) in order to transmit beams within a particular wavelength range of output beams of the mercury xenon lamp and reflect the remaining beams. The focusing lens(8) is installed at a lower side of the band pass filter to focus the output beams of the band pass filter. The main light guide input part(10) is installed at a lower side of the focusing lens to receive and irradiate the beams within the particular wavelength range. The auxiliary light guide input part(6) is installed at a left side or a right side of the band pass filter to receive and irradiate the reflected beams.

Description

밴드패스필터를 이용한 자외선 광 분할 조사장치{UV LIGHT DIVISION IRRADIATION SYSTEM USING BAND PASS FILTER}UV light splitting irradiation device using band pass filter {UV LIGHT DIVISION IRRADIATION SYSTEM USING BAND PASS FILTER}

본 발명은 자외선 광 분할 조사장치에 관한 것으로서, 보다 구체적으로는 머큐리제논 램프의 설계특성상 발광시 여러 종류의 파장 영역의 빛을 내지만 광원 장치는 특정의 한 광원만 사용한다는 점을 감안해 유브이 필터와 집광렌즈를 이용해 자외선 광을 파장대역별로 분리해 다중으로 자외선을 조사할 수 있도록 하는 장치이다.The present invention relates to an ultraviolet light splitting irradiation apparatus, and more specifically, in the design characteristics of a mercury xenon lamp, the light emitting device emits light in various wavelength ranges, but the light source device uses only one specific light source. It is a device that separates ultraviolet light by wavelength band by using a condenser lens so that ultraviolet light can be irradiated multiplely.

도 1은 종래 기술에 따른 자외선 조사장치의 구성도로써, 타원 미러(3)을 이용해 라이트가이드의 입사부(10)를 자외선 램프 하단부에 설치해 자외선을 집광하는 방식이었다. 이러한 종래의 자외선 조사방식은 도 3과 같이 200나노미터에서 600나노미터의 파장 영역에서 주파장으로 선정한 특정 광 하나만을 사용할 수 밖에 없는 방식이어서 나머지 자외선 광은 손실될 수 밖에 없는 문제점이 있다.FIG. 1 is a configuration diagram of an ultraviolet irradiation device according to the prior art, in which an incident part 10 of a light guide is installed at a lower end of an ultraviolet lamp using an elliptical mirror 3 to condense ultraviolet light. The conventional ultraviolet irradiation method has a problem that only one specific light selected as the main wavelength in the wavelength range of 200 nanometers to 600 nanometers as shown in FIG. 3 has a problem in that the remaining ultraviolet light cannot but be lost.

상기와 같은 문제점을 해결하기 위하여 안출된 것으로써 본 발명은 기본의 자외선 조사장치에서는 라이트 가이드의 입사부를 하단부에 설치한 것을 유브이 필터와 콜드미러 지지대를 타원 미러의 45도 각도에 장착해 라이트 가이드의 입사부를 하나 더 설계함으로서 광원의 빛 손실을 절감하며 효율적인 광 운용을 통해 불필요한 자원의 추가 손실을 예방하여 시스템 구성시 구조적 공간 활용에도 기여할 수 있다고 본다.In order to solve the above problems, the present invention is to install the entrance portion of the light guide at the lower end of the basic UV irradiation apparatus mounted UV filter and cold mirror support at an angle of 45 degrees of the elliptical mirror of the light guide By designing one more incident part, it is possible to reduce the light loss of the light source and to prevent the additional loss of unnecessary resources through efficient light operation, thus contributing to the utilization of structural space in the system configuration.

도 1은 종래 기술에 따른 자외선 조사장치의 구성도,1 is a block diagram of a ultraviolet irradiation device according to the prior art,

도 2는 본 발명에 따른 자외선 광 분할 조사장치의 구성도,2 is a block diagram of an ultraviolet light splitting irradiation apparatus according to the present invention,

도 3은 일반적인 광 분할 조사장치에 사용되는 광분포 특성도.3 is a light distribution characteristic diagram used in a general light splitting apparatus;

<도면의 주요 부호에 대한 설명><Description of Major Symbols in Drawing>

1: 램프 고정볼트2: 머큐리 제논램프1: Fixing bolt 2: Mercury xenon lamp

3: 타원미러4: 밴드패스필터3: elliptical mirror 4: band pass filter

5: 열차단 필터6: 라이트가이드입사부5: thermal cut-off filter 6: light guide inlet

7: 밴드패스필터지지대8: 집광렌즈7: Band pass filter support 8: Condensing lens

9: 열차단필터10: 라이트가이드입사부9: thermal cutoff filter 10: light guide entrance part

이하, 첨부된 도면을 참조하여 본 발명의 실시예를 상세히 설명하면 다음과같다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

도 2는 본 발명에 따른 자외선 광 분할 조사장치의 구성도로써, 전술한 목적을 달성하기 위한 자외선 광 분할 조사장치는 머큐리제논 램프(2)에 45도 각도로 구성한 밴드패스필터(4)의 주 광원부(램프하우스)와 집광렌즈(8)부의 보조 광원으로 분리 할 수 있다.2 is a configuration diagram of an ultraviolet light splitting irradiation apparatus according to the present invention, wherein the ultraviolet light splitting irradiation apparatus for achieving the above-mentioned object is a main portion of the band pass filter 4 configured at a 45 degree angle to the mercury xenon lamp 2. The light source unit (lamphouse) and the condenser lens 8 can be separated into an auxiliary light source.

도 2에서 도시한 바와 같이 본 발명에 따른 자외선 광 분할 조사장치는 머큐리제논 램프에서 발광된 여러 종류의 자외선광이 밴드패스필터와 열차단 필터를 거쳐 특정파장대역의 자외선 광을 45도 방향으로 굴절시켜 램프하우스 우측부에 집광함으로서 주 광원으로의 역할을 수행할수 있다.As shown in FIG. 2, in the ultraviolet light splitting irradiation apparatus according to the present invention, various types of ultraviolet light emitted from a mercury xenon lamp are refracted to ultraviolet rays of a specific wavelength band in a 45 degree direction through a band pass filter and a thermal barrier filter. By condensing on the right side of the lamp house can serve as a main light source.

보조광원으로는 특정파장대역의 365나노미터를 걸러낸 나머지 자외선광인 405나노미터와 436나노미터의 광이 자외선 필터를 통과하며 약간의 빛 손실을 집광렌즈부를 장착함으로서 빛의 산란을 막아 광 파워를 높여 주광원 못지 않는 광강도를 낼 수 있다.As the auxiliary light source, the remaining 405 nanometers and 436 nanometers, which are 365 nanometers of a specific wavelength band, are passed through the ultraviolet filter. Increase the intensity of light as much as the main light source.

본 발명의 주요 구성은 밴드패스필터(4)를 엑스, 와이, 제트의 3축의 광축에 정확히 45도각도롤 설계해, 라이트가이드입사부의 2차 촛점에 정확히 집광할 수 있게 한다. 그리고 2차 광원의 빛 효율을 높이기 위해 집광렌즈를 밴드패스필터의 최대한 가까운 위치에 장착해야 하며 고배율의 렌즈를 필요로 한다.The main constitution of the present invention is to design the band pass filter 4 at an angle of exactly 45 degrees to the optical axes of the three axes of the X, Y, and jets, so that the light pass incident light can be accurately focused on the secondary focus. In order to increase the light efficiency of the secondary light source, the condenser lens should be mounted as close as possible to the band pass filter, and a high magnification lens is required.

본 발명에 따른 자외선 광분할 장치는 광원부가 하나이고 라이트가이드의 입사부가 두 곳이 되므로 도면 2와 같이 광원부의 우측에 입사부 한곳과 하단부에 입사부 한곳을 설치해야 한다.In the ultraviolet light splitting apparatus according to the present invention, since the light source unit has one light source and the light guide has two incidence parts, the incidence part and the incidence part must be installed on the right side of the light source part as shown in FIG.

그리고 도면 2와 같이 하단부의 라이트가이드 입사부에 라이트가이드의 체결을 용이하게 하기 위해 하단부에 받침대를 만들 수 있다.In addition, as shown in FIG. 2, in order to facilitate fastening of the light guide to the light guide incidence portion of the lower portion, a pedestal may be formed at the lower portion.

이상 설명한 바와 같이 본 발명의 유브이필터를 이용한 자외선 광분할 조사장치에 의하면 고가의 자외선 광원을 효율적으로 이용 관리함으로서 제조 및 유지보수의 비용을 절감할 수 있으며, 자외선 광을 이용한 노광기나 경화기 시스템의 제작 시 불필요한 광원의 수가 적어지기 때문에 공간 활용의 장점이 있다. 또한 자외선광을 분할함으로서 경화제나 도료,잉크등 광응용화학약품의 선정시에 파장대역의 반응범위가 좁아져서 자외선의 특성에 맞는 케미칼 선정에 정확도를 기여할 수 있다.As described above, according to the ultraviolet light splitting irradiation apparatus using the UV filter of the present invention, the cost of manufacturing and maintenance can be reduced by efficiently using and managing expensive ultraviolet light sources, and manufacturing an exposure machine or a curing machine system using ultraviolet light. Since the number of unnecessary light sources is reduced, there is an advantage of space utilization. In addition, by dividing the ultraviolet light, the reaction range of the wavelength band is narrowed at the time of the selection of photo-applying chemicals such as curing agent, paint, ink, etc., which contributes to accuracy in selecting chemicals suitable for the characteristics of ultraviolet light.

Claims (2)

머큐리제논 램프에 의해 출사된 광원을 분할 조사하는 장치에 있어서,In the device for dividing the light source emitted by the mercury xenon lamp, 상기 머튜리제논 램프의 하측에 설치되어 상기 램프에 의해 출사된 광 중 특정 파장 영역의 광을 투과시키고 그 이외의 광은 반사시키도록 설치되는 밴드패스필터와;A band pass filter disposed under the matrices xenon lamp and configured to transmit light in a specific wavelength region among light emitted by the lamp and reflect other light; 상기 밴드패스필터의 하측에 설치되어 상기 필터를 통해 투과된 광을 집광시키는 소정의 집광렌즈;A predetermined condenser lens provided below the band pass filter to condense light transmitted through the filter; 상기 집광렌즈의 하측에 설치되어 집광된 특정 파장의 광을 수광한 후 조사시키는 메인 라이트가이드 입사부 및;A main light guide incidence unit installed below the condenser lens and configured to receive and irradiate light having a specific wavelength focused therein; 상기 밴드패스필터의 좌측 또는 우측에 설치되어 상기 반사된 광을 수광한 후 조사시키는 보조 라이트가이드 입사부를 포함하는 밴드패스필터를 이용한 자외선 광 분할 조사장치.An ultraviolet light splitting irradiation apparatus using a bandpass filter provided on the left or right side of the bandpass filter and including an auxiliary light guide incidence unit for receiving and reflecting the reflected light. 제 1항에 있어서, 상기 라이트가이드의 입사부에 다른 유니트를 사용해 조광하는 자외선 조사장치.The ultraviolet irradiation device according to claim 1, wherein the light guide unit adjusts light by using another unit at an incident part of the light guide.
KR1020020064148A 2002-10-21 2002-10-21 Uv light division irradiation system using band pass filter KR20040034086A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101131905B1 (en) * 2009-09-22 2012-04-03 (주)조양메디칼인더스트리 A beam splitter
KR20230033375A (en) 2021-09-01 2023-03-08 에이피시스템 주식회사 Ultraviolet curing apparatus, bending protect layer forming system and method for ultraviolet curing

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6080805A (en) * 1983-10-11 1985-05-08 Takashi Mori Artificial light source device
JPH05340802A (en) * 1991-07-04 1993-12-24 Toshiba Corp Device for detecting turning-on of illuminating light source
JPH06160724A (en) * 1992-11-17 1994-06-07 Nikon Corp Flash photolysis microscope
JPH0712726A (en) * 1993-06-24 1995-01-17 Dainippon Screen Mfg Co Ltd Optical device for measuring transmitted light
KR19980087421A (en) * 1997-05-27 1998-12-05 다나카 아키히로 Optical path split ultraviolet irradiation device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6080805A (en) * 1983-10-11 1985-05-08 Takashi Mori Artificial light source device
JPH05340802A (en) * 1991-07-04 1993-12-24 Toshiba Corp Device for detecting turning-on of illuminating light source
JPH06160724A (en) * 1992-11-17 1994-06-07 Nikon Corp Flash photolysis microscope
JPH0712726A (en) * 1993-06-24 1995-01-17 Dainippon Screen Mfg Co Ltd Optical device for measuring transmitted light
KR19980087421A (en) * 1997-05-27 1998-12-05 다나카 아키히로 Optical path split ultraviolet irradiation device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101131905B1 (en) * 2009-09-22 2012-04-03 (주)조양메디칼인더스트리 A beam splitter
KR20230033375A (en) 2021-09-01 2023-03-08 에이피시스템 주식회사 Ultraviolet curing apparatus, bending protect layer forming system and method for ultraviolet curing

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