KR20040022478A - Transflective liquid crystal display panel with embossing pattern having an effective reflective region and method for fabricating the same - Google Patents

Abstract

PURPOSE: A transflective liquid crystal display panel having an embossing structure of an effective reflecting region is provided to maximize reflection efficiency. CONSTITUTION: A transflective liquid crystal display panel includes a substrate(110) on which a thin film transistor(125) and lines connected to the thin film transistor to receive external signals are formed, and an insulating layer(130) that is formed on the substrate and has a plurality of first embossed portions. The liquid crystal display further includes a transparent electrode(140) and a reflecting electrode(150). The transparent electrode is formed on the insulating layer and has a plurality of the second embossed portions respectively corresponding to the plurality of the first embossed portions. The reflecting electrode is formed on predetermined regions of the second embossed portions to reflect external light.

Description

Reflective-transmissive liquid crystal display panel having an uneven structure having an efficient reflection area and a method for manufacturing the same.

The present invention relates to a reflective-transmissive liquid crystal display panel, and more particularly, to a reflective-transmissive liquid crystal display panel capable of maximizing reflection efficiency with respect to external light to the same area, and to manufacturing the reflective-transmissive liquid crystal display panel. To provide a method.

Recently, a liquid crystal display has been developed, which is lighter, smaller, and has a function such as full-color, high resolution, and the like, compared to a CRT display device. As a result, the liquid crystal display device has come to be widely used as a display device of computer monitors, home wall-mounted televisions, and other information processing devices, which are representative information processing devices.

A liquid crystal display device applies voltage to a specific molecular array of a liquid crystal and converts it into another molecular array, and visually changes the optical properties such as birefringence, photoreactivity, dichroism, and light scattering characteristics of the liquid crystal cell that emit light by the molecular arrangement. It is a display using the modulation of the light by a liquid crystal cell by converting into.

Since the liquid crystal display is a passive optical device that does not emit light by itself, an image is displayed by using a backlight assembly attached to the rear surface of the liquid crystal panel. Accordingly, the size and the light efficiency of the liquid crystal display are changed according to the backlight assembly structure, and thus the mechanical and optical characteristics of the overall liquid crystal display are affected.

Among the various flat panel display devices currently developed, liquid crystal displays are thinner and lighter than other display devices, have low power consumption and low driving voltage, and are widely used in various electronic devices because they can display images close to cathode ray tubes. Is being used.

The liquid crystal display device is a transmissive liquid crystal display device that displays an image using a backlight positioned on the back of the liquid crystal cell depending on the light source, a reflective liquid crystal display device using external natural light, and displays in a dark place where no indoor or external light source exists The device is classified into a transflective liquid crystal display device which operates in a transmissive display mode for displaying using the internal light source of the device itself and in a reflective display mode for reflecting and displaying external incident light in an outdoor high-illuminance environment.

1 is a plan view schematically illustrating a pixel portion of a reflection-transmissive liquid crystal display panel having a conventional uneven structure, and FIG. 2 is a cross-sectional view taken along line AA ′ of FIG. 1.

Referring to FIGS. 1 and 2, the pixel portion 100 of the reflection-transmissive liquid crystal display panel having a conventional uneven structure is divided into a reflection region composed of a reflective electrode 50 and a transmission region composed of a transparent electrode 40.

The thin film transistor 25 is formed on the substrate 10, the gate electrode 12, the gate insulating layer 14 made of silicon nitride, the active pattern 16 made of an amorphous silicon film, and the n ⁺ doped amorphous silicon film ( an ohmic contact pattern 18 formed of an a-Si film, a source electrode 20 and a drain electrode 22 overlapping both edges of the active pattern 16.

In the state where the thin film transistor 25 is formed on the upper surface of the substrate 10, an insulating film 30 having an uneven structure made of an inorganic material or an organic material is formed over the entire surface of the substrate 10. A transparent electrode 40 made of indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) is formed on the top surface of the insulating layer 30.

A reflective electrode 50 made of a single metal film or a double metal film, such as aluminum (Al), molybdenum (Mo) or molybdenum-aluminum (Mo / AL), silver (Ag), or the like is formed in the reflective region above the insulating film 30. do.

A contact hole 45 is formed at a position of the insulating layer 30 to expose the drain electrode 22 of the thin film transistor 25, and the drain electrode 22 of the thin film transistor 25 is formed through the contact hole 45. It is electrically connected to the reflective electrode 50.

Natural light incident from the outside into the pixel unit 100 of the liquid crystal display panel is reflected in the reflection region and travels toward the color filter substrate (not shown). The external light generated by the external light source passes through the transmission region and travels toward the color filter.

In the conventional reflection-transmissive liquid crystal display panel as described above, external natural light is reflected on both the convex and concave surfaces of the uneven portion of the reflective electrode 50, but most of the light traveling toward the color filter substrate is the convex surface of the uneven portion. It is reflected from the top of.

That is, in the conventional reflective-transmissive liquid crystal display panel having an uneven structure, the reflective electrode 50 is formed in the entire area of the uneven structure only in a part of the pixel portion 100 to be used as the reflective region, and the pixel portion 100 is formed. By using only the transmissive region 60 without forming the reflective electrode 50 in the rest of the region, it operates in the reflective mode and the transmissive mode.

In this case, since the reflective electrode 50 is not formed in the uneven portion of the transmission region 60, the reflection efficiency is inferior.

SUMMARY OF THE INVENTION An object of the present invention proposed to solve the above problems is to provide a reflection-transmissive liquid crystal display panel capable of maximizing reflection efficiency for external light compared to the same area.

In addition, an object of the present invention is to provide a method of manufacturing a reflection-transmissive liquid crystal display panel that can maximize the reflection efficiency of the external area compared to the same area.

1 is a plan view schematically illustrating a pixel portion of a reflection-transmissive liquid crystal display panel having a conventional uneven structure.

FIG. 2 is a cross-sectional view taken along line AA ′ of FIG. 1.

3 is a plan view schematically illustrating a pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a first embodiment of the present invention.

4 is a cross-sectional view taken along line BB ′ of FIG. 3.

FIG. 5 is an enlarged cross-sectional view of an area used as a reflection area and a transmission area in the pixel portion of a reflection-transmissive liquid crystal display panel having a concave-convex structure according to a first embodiment of the present invention.

FIG. 6 is an enlarged cross-sectional view illustrating a region used as a reflection region and a transmission region of the pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a third exemplary embodiment of the present invention.

7 is a cross-sectional view of a pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a second preferred embodiment of the present invention.

8A is a plan view illustrating a region used as a reflective region and a transmissive region of a pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a fourth exemplary embodiment of the present invention.

8B is a plan view illustrating a region used as a reflective region and a transmissive region of the pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a fifth exemplary embodiment of the present invention.

9A to 9D are views illustrating a manufacturing process for forming the pixel portion of the reflection-transmissive liquid crystal display panel having the uneven structure of FIG. 3.

10A to 10B illustrate a part of a manufacturing process for forming the pixel portion of the reflective-transmissive liquid crystal display panel having the uneven structure of FIG. 5.

<Explanation of symbols for the main parts of the drawings>

10, 110: substrate 12, 112: gate electrode

40, 140: transparent electrode 50, 150: reflective electrode

160: first region 170: second region

According to an aspect of the present invention, a reflective-transmissive liquid crystal display panel includes a thin film transistor and a substrate connected with the thin film transistor to receive an external signal, and a plurality of first substrates formed on the substrate. An insulating film having an uneven portion, a transparent electrode formed on the insulating film so as to have a plurality of second uneven portions corresponding to each of the plurality of first uneven portions, and an entire area of the second uneven portion belonging to the first region on the transparent electrode; And a reflective electrode formed on a first portion of the convex surface of the second uneven portion belonging to the second region on the transparent electrode to operate as a reflective region reflecting external light.

In addition, a reflective-transmissive liquid crystal display panel according to the present invention for achieving the above object, a thin film transistor and a substrate connected to the thin film transistor to receive an external signal, and formed on the substrate and a plurality of An insulating film having a first uneven portion, a reflecting region formed in a first portion of the entire surface of the first uneven portion belonging to the first region on the insulating film and a convex surface of the first uneven portion belonging to the second region on the insulating film to reflect external light And a transparent electrode formed on the reflective electrode.

In addition, the method of manufacturing a reflection-transmissive liquid crystal display panel according to the present invention for achieving the above object, forming a thin film transistor and a wiring connected to the thin film transistor to receive an external signal on the substrate, An insulating film having a plurality of first uneven portions is formed on the insulating film, a transparent electrode is formed on the insulating film so as to have a plurality of second uneven portions corresponding to each of the plurality of first uneven portions, and a first region on the transparent electrode is formed. And forming a reflective electrode on a first portion of the entire surface of the second concave-convex portion belonging and the convex surface of the second concave-convex portion belonging to the second region on the transparent electrode.

In addition, the method of manufacturing a reflection-transmissive liquid crystal display panel according to the present invention for achieving the above object, forming a thin film transistor and a wiring connected to the thin film transistor to receive an external signal on the substrate, An insulating film having a plurality of first uneven portions is formed in the first portion, and a reflective region is formed on a first portion of the entire surface of the first uneven portion belonging to the first region on the insulating film and on the convex surface of the first uneven portion belonging to the second region on the insulating film. Forming a transparent electrode on the reflective electrode.

Therefore, even when using a transmission area having the same area as in the prior art, it is possible to maximize the reflection efficiency of the external light compared to the same area.

Hereinafter, a liquid crystal display according to an exemplary embodiment of the present invention will be described in more detail with reference to FIGS. 2A to 7.

3 is a plan view schematically illustrating a pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a first exemplary embodiment of the present invention, and FIG. 4 is a cross-sectional view taken along line BB ′ of FIG. 3.

3 and 4, the pixel portion 300 of the reflective-transmissive liquid crystal display panel having a concave-convex structure according to the first embodiment of the present invention may include a first region 160 having a reflective electrode 150 formed on a surface thereof. It is divided into the second region 170 in which a reflective electrode is selectively formed on only a part of the convex surface of the uneven portion of the transparent electrode 140.

The thin film transistor 125 is formed on the substrate 110, and includes a gate electrode 112, a gate insulating layer 114 made of silicon nitride, an active pattern 116 made of an amorphous silicon film, and an n ⁺ doped amorphous silicon film ( an ohmic contact pattern 118 formed of an a-Si film, a source electrode 120 and a drain electrode 122 overlapping both edges of the active pattern 116.

In the state where the thin film transistor 125 is formed on the upper surface of the substrate 110, an insulating film 130 having an uneven structure made of an inorganic material or an organic material is formed over the entire surface of the substrate 110. A transparent electrode 40 made of indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) is formed on the top surface of the insulating layer 130.

A reflective electrode 150 made of molybdenum-aluminum (Mo / AL) is preferably formed on a part of the convex surface of the uneven portion of the transparent electrode 140 among the first region 160 and the second region 170 on the insulating layer 130. Is formed.

In addition to molybdenum-aluminum (Mo / AL), the reflective electrode 150 may be formed of a single metal layer or a double metal layer such as aluminum (Al), molybdenum (Mo), or silver (Ag). 3 and 4, the shape of the concave-convex portion has a shape of the concave-convex portion close to the circle, but may have a concave-convex portion close to the polygon in addition to the circle. .

A contact hole 145 is formed at a position of the insulating layer 130 to expose the drain electrode 122 of the thin film transistor 125, and the drain electrode 122 of the thin film transistor 125 is formed through the contact hole 145. It is electrically connected to the reflective electrode 150.

A part of natural light incident from the outside into the pixel portion 300 of the liquid crystal display panel is reflected by the reflective electrode 150 formed in the first region 160 and proceeds toward the color filter substrate (not shown).

In addition, a part of the natural light incident from the outside to the pixel portion 300 of the liquid crystal display panel is reflected by the reflective electrode 150 formed on a part of the convex surface of the uneven portion of the second region 170 to the color filter substrate (not shown). Proceed.

On the other hand, the external light generated by the external light source is formed in the portion where the reflective electrode 150 is not formed in the second region 170, that is, the remaining portion other than the convex portion of the uneven portion where the reflective electrode 150 is formed. It passes through the transparent electrode 140 and proceeds toward the color filter.

FIG. 5 is an enlarged cross-sectional view of an area used as a reflection area and a transmission area in the pixel portion of a reflection-transmissive liquid crystal display panel having a concave-convex structure according to a first embodiment of the present invention.

Referring to FIG. 5, the reflective electrode 150 is selectively formed on the top of the convex surface of the uneven portion that reflects well among the uneven portions, and used as the reflective region. Only the transparent electrode 140 is formed in the remaining portions except for the convex portion of the uneven portion where the reflective electrode 150 is formed, and is used as the transmission region.

When the external light generated from the external light source passes through the transmission region, as shown in FIG. 5, a difference occurs in the transmission distance L1 to the convex surface of the uneven portion and the transmission distance L2 to the concave surface of the uneven portion. Accordingly, the transmission of external light through the concave surface of the uneven portion is higher than the transmission through the convex surface. That is, in the present invention, a portion having high transmission efficiency among the uneven parts is used as the transmission region, and a reflection electrode 150 is formed at the portion having low transmission efficiency to be used as the reflection region. Therefore, the reflection efficiency can be improved even when the pixel portion having the same area is used as compared with the conventional reflection-transmissive liquid crystal display panel.

On the other hand, the distance W1 between the reflective electrode 150 formed on a part of the convex surface of the uneven part and the reflective electrode 150 formed on a part of the convex surface of the adjacent uneven part is not less than a predetermined distance, preferably about 4 micrometers (um). It is preferable in the manufacturing process to make it possible. That is, when the pattern of the reflective electrode 150 is formed by etching, at least about 4 micrometers (um) is preferable to stabilize the pattern formation.

In addition, it is preferable in the manufacturing process that the width W2 of the concave surface of the concave-convex portion is equal to or greater than a predetermined interval, preferably about 3 micrometers (um). That is, the width of the concave surface of the uneven portion is preferably at least about 3 micrometers (um) or more in order to ensure the minimum concave surface.

FIG. 6 is an enlarged cross-sectional view illustrating a region used as a reflection region and a transmission region of the pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a third exemplary embodiment of the present invention.

Referring to FIG. 6, the reflective electrode 150 is further extended from the top of the convex surface of the concave and convex portion of FIG. 5 to be formed on the convex surface of the concave and convex portion. As shown in FIG. 6, the reflective electrode 150 is formed in a state in which the interval W1 between the adjacent reflective electrodes 140 formed on the uneven portion and the width W2 of the concave surface of the uneven portion are maintained at a predetermined interval. The part to be varied is possible.

7 is a cross-sectional view of a pixel portion of a reflective-transmissive liquid crystal display panel having a concave-convex structure according to a second preferred embodiment of the present invention. Components that perform the same functions as those of the pixel portion of the reflective-transmissive liquid crystal display panel having the uneven structure shown in FIG. 4 are denoted by the same reference numerals, and a separate description thereof will be omitted.

Referring to FIG. 7, unlike in FIG. 4, the reflective electrode 150 is first formed on the upper surface of the insulating layer 130, and then the transparent electrode 140 is formed.

First, in the state where the thin film transistor 125 is formed on the upper surface of the substrate 110, an insulating film 130 having an uneven structure made of an inorganic material or an organic material is formed over the entire surface of the substrate 110. A reflective electrode 150 made of molybdenum-aluminum (Mo / AL) is preferably formed on a part of the convex surface of the uneven portion of the first region 160 and the second region 170 on the insulating layer 130. Formed to act as a reflective area. In addition to molybdenum-aluminum (Mo / AL), the reflective electrode 150 may be formed of a single metal layer or a double metal layer such as molybdenum (Mo) or silver (Ag).

The shape of the concave-convex portion may have a shape of the concave-convex portion close to the polygon in addition to the circular shape, and other shapes may be used as long as it has a concave-convex structure.

A transparent electrode 140 made of indium-tin-oxide (ITO) or indium-zinc-oxide (IZO) is formed on the upper surface of the reflective electrode 150.

A part of natural light incident from the outside into the pixel portion 300 of the liquid crystal display panel is transmitted by the transparent electrode 140 and reflected by the reflective electrode 150 formed in the first region 160 to the color filter substrate (not shown). Proceed.

In addition, a part of the natural light incident from the outside to the pixel portion 300 of the liquid crystal display panel is transmitted by the transparent electrode 140 and is reflected by the reflective electrode 150 formed on a part of the convex surface of the uneven portion of the second region 170. Proceed toward the color filter substrate.

On the other hand, the external light generated by the external light source is formed in the portion where the reflective electrode 150 is not formed in the second region 170, that is, the remaining portion other than the convex portion of the uneven portion where the reflective electrode 150 is formed. It passes through the transparent electrode 140 and proceeds toward the color filter.

8A and 8B are plan views illustrating regions used as reflective and transmissive regions of the pixel portion of the reflective-transmissive liquid crystal display panel having the uneven structure according to the fourth and fifth embodiments of the present invention, respectively.

8A and 8B, the reflectance may be adjusted by increasing or decreasing the area of the second region 170 of the reflection-transmissive liquid crystal display panel according to the present invention. In the case of FIG. 8B, the area of the second region 170 is smaller than that of FIG. 8A, so that the reflectance is larger than that of FIG. 8A and the transmittance is smaller. That is, the area of the second region 170 may be increased or decreased as described above in order to make an appropriate level of reflective region-reflective-transmissive liquid crystal display panel.

9A to 9D are views illustrating a manufacturing process for forming the pixel portion of the reflection-transmissive liquid crystal display panel having the uneven structure of FIG. 3.

Referring to FIG. 9A, after depositing a first metal film on a transparent substrate 110 made of glass, quartz, or sapphire, patterning the first metal film by a photolithography process using a first mask to form a gate line (not shown). And a gate wiring connected to a gate electrode 112 of the thin film transistor branched from the gate line and a gate pad (not shown) connected to an end of the gate line to apply a scan voltage to the gate electrode 112. .

Silicon nitride is deposited on the entire surface of the substrate 110 on which the gate wiring is formed by a plasma-enhanced chemical vapor deposition (PECVD) method to form a gate insulating layer 114.

An amorphous silicon film, for example, is deposited on the gate insulating film 114 to a predetermined thickness by a PECVD method, and an n ⁺ doped amorphous silicon film, for example, as an ohmic contact layer is deposited to a predetermined thickness by a PECVD method. Next, the active layer and the ohmic contact layer are patterned by a photolithography process using a second mask to form an active pattern 116 formed of an amorphous silicon layer on the gate insulating layer 114 over the gate electrode 112 and n ⁺ doping. An ohmic contact pattern 118 formed of the amorphous silicon film is formed.

Referring to FIG. 9B, a data line formed of a metal film is formed on the active pattern 116 and the gate insulating layer 114. The data line crosses the source electrode 120, the drain electrode 122, and the gate line and overlaps the drain electrode 122, respectively overlapping the edges of both sides of the active pattern 116 (not shown). And a data pad (not shown) connected to an end of the data line to transmit an image signal.

Subsequently, the exposed ohmic contact pattern 118 between the source electrode 120 and the drain electrode 122 is removed by, for example, reactive ion etching (RIE). Then, the exposed active region between the source / drain electrodes 120 and 122 becomes a channel region of the thin film transistor.

The active pattern 116, the ohmic contact pattern 118, and the data line may be formed using two masks, but the active pattern 116, the ohmic contact pattern 118, and the data line may be formed using one mask. May be formed.

Referring to FIG. 9C, an insulating film 130 made of an inorganic material or an organic material is formed by depositing silicon nitride to a predetermined thickness on the entire surface of the substrate 110 on which the thin film transistor is formed. Subsequently, the insulating layer 130 is etched by a photolithography process using a fourth mask to form a contact hole 145 exposing the drain electrode 122.

An uneven structure is formed on the surface of the insulating film 130. Next, a transparent electrode layer such as ITO or IZO is deposited on the uneven portion of the insulating layer 130 and patterned to form the transparent electrode 140. Subsequently, the reflective electrode layer is deposited thereon, and as described above, the reflective electrode layer of the predetermined region is removed by a photolithography process to form the reflective electrode 150.

10A to 10B illustrate a part of a manufacturing process for forming the pixel portion of the reflective-transmissive liquid crystal display panel having the uneven structure of FIG. 5. Hereinafter, the description of the same parts as in FIGS. 9A to 9D will be omitted.

10A to 10B, the reflective electrode layer is first deposited on the insulating layer 130 having the uneven structure, and then the reflective electrode 150 is formed by removing the reflective electrode layer of the predetermined region by photolithography as described above. . Next, a transparent electrode layer such as ITO or IZO is deposited on the reflective electrode 150 and the uneven portion of the insulating layer 130, and patterned to form the transparent electrode 140. The manufacturing process of FIGS. 10A to 10B may be performed using the same mask pattern as the mask pattern used in the manufacturing process of FIGS. 9A to 9D.

According to the reflection-transmissive liquid crystal display device having the concave-convex lens structure as described above, a reflective film is selectively formed on the top of the convex surface of the concave-convex portion that reflects well among the concave-convex portions of the pixel portion of the reflection-transmissive liquid crystal display panel to the reflection area. The concave surface of the uneven portion is used as the transmission area.

Therefore, even when using a transmission area having the same area as in the prior art, it is possible to maximize the reflection efficiency of the external light compared to the same area.

In addition, while maximizing the reflection efficiency with respect to the external light to the same area of the reflection-transmission liquid crystal display device, the ratio of the reflection area of the pixel portion of the reflection-transmission liquid crystal display panel may be adjusted as necessary.

Although the above has been described with reference to a preferred embodiment of the present invention, those skilled in the art will be variously modified and changed within the scope of the present invention without departing from the spirit and scope of the invention described in the claims below. I can understand that you can.

Claims (10)

A substrate formed with a thin film transistor and a wire connected to the thin film transistor to receive an external signal; An insulating film formed on the substrate and having a plurality of first uneven parts; A transparent electrode formed on the insulating film to have a plurality of second uneven portions corresponding to each of the plurality of first uneven portions; And A reflective electrode formed on a first portion of the entire surface of the second uneven portion belonging to the first region on the transparent electrode and the convex surface of the second uneven portion belonging to the second region on the transparent electrode, and acting as a reflective region reflecting external light. Reflective-transmissive liquid crystal display panel comprising a. The reflection-transmissive liquid crystal display panel according to claim 1, wherein the first portion is formed on a top portion of a convex surface of the second uneven portion belonging to the second region. The reflection-transmissive liquid crystal display panel of claim 1, wherein a portion of the second uneven parts of the second region except for the first portion operates as a transmission region. The reflective-transmissive liquid crystal display panel of claim 1, wherein the first region is a region including at least the thin film transistor. The reflection-transmissive liquid crystal display panel of claim 4, wherein the first region further comprises a region where wirings connected to the thin film transistors are formed. The reflection-transmissive liquid crystal display panel of claim 3, wherein the reflectance of the reflection-transmissive liquid crystal display panel is adjusted by varying the size of the first region or the second region. The reflective-transmissive liquid crystal display panel of claim 1, wherein the reflective electrode is formed of molybdenum-aluminum (Mo / AL). A substrate formed with a thin film transistor and a wire connected to the thin film transistor to receive an external signal; An insulating film formed on the substrate and having a plurality of first uneven parts; A reflective electrode formed on a first portion of a front surface of the first uneven portion belonging to the first region on the insulating film and a convex surface of the first uneven portion belonging to the second region on the insulating film to reflect external light; And A transparent electrode formed on the reflective electrode Reflective-transmissive liquid crystal display panel comprising a. Forming a thin film transistor and a wire connected to the thin film transistor to receive an external signal on a substrate; Forming an insulating film having a plurality of first uneven portions on the substrate; Forming a transparent electrode on the insulating film to have a plurality of second uneven portions corresponding to each of the plurality of first uneven portions; And Forming a reflective electrode on a first portion of the entire area of the second uneven portion belonging to the first region on the transparent electrode and the convex surface of the second uneven portion belonging to the second region on the transparent electrode; Method for manufacturing a reflection-transmissive liquid crystal display panel comprising a. Forming a thin film transistor and a wire connected to the thin film transistor to receive an external signal on a substrate; Forming an insulating film having a plurality of first uneven portions on the substrate; Forming a reflective region on a first portion of the entire area of the first uneven portion belonging to the first region on the insulating film and the convex surface of the first uneven portion belonging to the second region on the insulating film; And Forming a transparent electrode on the reflective electrode.