KR200396608Y1 - Plasma discharge device - Google Patents

Abstract

The present invention relates to a plasma discharge device, in the plasma discharge device that generates ions by discharge, the dielectric (110, 210) is located between the high voltage electrode 120, 220 and the ground electrode (130, 230) to which a high voltage is applied, and the surface is contaminated Titanium dioxide coating layers 141 and 241 are formed for prevention, and ultraviolet light sources 150, 160 and 250 are provided to irradiate ultraviolet rays to activate the titanium dioxide coating layers 141 and 241. Therefore, the present invention reduces the contamination of the surface due to the coating layer which is activated by the high voltage plasma energy generated during discharge and the ultraviolet light emitted from the ultraviolet light source and decomposes foreign substances such as polymer generated on the surface. It increases the cleaning cycle and the product usage cycle, and has the effect of minimizing the generation of ions and ozone even for long time use.

Description

Plasma Discharge Device {PLASMA DISCHARGE DEVICE}

The present invention relates to a plasma discharge device, and more particularly, plasma discharge to reduce the contamination of the surface by forming a coating layer that is activated by high voltage plasma energy and ultraviolet light emitted from an ultraviolet light source to prevent contamination of foreign substances such as polymers on the surface. It relates to an element.

In general, plasma discharge devices are used in various air purifiers by generating positive / negative ions or anions and ozone by application of high voltage. Referring to the conventional plasma discharge device with reference to the accompanying drawings as follows.

As shown in FIG. 1, in the plasma discharge device 10 according to the related art, the high voltage electrode 12 is provided inside the quartz tube 11, and the ground electrode 13 is disposed outside the quartz tube 11. A high voltage for discharging is applied to the high voltage electrode 12 and the ground electrode 13.

In addition, as shown in FIG. 2, in the plasma discharge device 20 according to another exemplary embodiment, the high voltage electrode 22 is provided on one side of the ceramic plate 21, and the other side of the ceramic plate 21 is provided. The ground electrode 23 is provided at the high voltage, and a high voltage for discharge is applied to the high voltage electrode 22 and the ground electrode 23 as in the exemplary embodiment.

The conventional plasma discharge devices 10 and 20 generate a discharge when a high voltage is applied to the high voltage electrodes 12 and 22 and the ground electrodes 13 and 23 through the high voltage supply unit 30 to generate positive / negative ions or negative ions and ozone. By generating the electric dust as well as deodorizing and sterilizing effect, it is widely used in the indoor air purifier.

However, such a conventional plasma discharge device (10, 20) when the high voltage is applied for a long time when the oxidation reaction of volatile organic compounds (TVOC) and odorous substances on the surface is active, as a by-product C, N, A polymer, a complex compound of O and H, is formed on the surface and fixed.

The adhesion of the polymer to the surface of the plasma discharge device (10, 20) is further promoted over time, and contaminates the surface by adsorbing foreign substances such as dust on the polymer, thereby high voltage electrodes (12, 22) and the battery Even when a high voltage was applied to the electrodes 13 and 23, the amount of generated ions or ozone was greatly reduced, and at the same time, the sterilization and deodorization effects were remarkably reduced.

Due to this problem, the conventional plasma discharge devices 10 and 20 have a problem of frequently cleaning the surface thereof, and even though dust is removed through cleaning, the amount of ions or ozone is recovered, but the polymer is removed by cleaning. Since the amount of generated ions and ozone due to the adhesion of the polymer is not restored as it was originally had a problem that is still reduced.

The present invention is to solve the above-mentioned problems, the object of the present invention is to form a coating layer for preventing contamination of foreign substances such as polymers on the surface as well as to provide a UV light source for activating the coating layer for contamination prevention for a long time The present invention also provides a plasma discharge device for reducing the contamination of the surface.

The present invention for achieving the above object is, in the plasma discharge device for generating ions by discharge, the dielectric is located between the high voltage electrode and the ground electrode to which a high voltage is applied, the titanium dioxide coating layer is formed on the surface to prevent contamination In addition, an ultraviolet light source for irradiating ultraviolet rays is provided to activate the titanium dioxide coating layer.

Hereinafter, with reference to the accompanying drawings, the most preferred embodiment of the present invention will be described in more detail so that those skilled in the art can easily practice.

3 and 4 are side and partial sectional views showing a plasma discharge device according to a first embodiment of the present invention, Figures 5 and 6 are side views showing a plasma discharge device according to a second embodiment of the present invention Partial section view. As shown, in the plasma discharge device (100,200) according to the present invention, the dielectric 110 is located between the high voltage electrode 120 and the ground electrode 130 to which a high voltage is applied, and the titanium dioxide coating layer 141 is formed on the surface And ultraviolet light sources 150 and 160 that irradiate ultraviolet rays to activate the titanium dioxide coating layer 141.

The dielectric 110 is a quartz tube in this embodiment, and the high voltage electrode 120 and the ground electrode 130 are provided on the inner side and the outer side, respectively.

Titanium dioxide coating layer 141 is formed on the surface of the plasma discharge device (100,200) to prevent contamination, may be formed over the exposed surface of the plasma discharge device (100,200), preferably the ground electrode 130 is provided It is formed on the outer surface of the previous quartz tube 110. Therefore, the titanium dioxide coating layer 141 is formed on the outer surface of the quartz tube 110, and the ground electrode 130 is provided on the outer surface of the titanium dioxide coating layer 141 to facilitate the manufacture and the titanium dioxide coating layer ( The uniformity of the 141 is excellent to prevent contamination of the outer surface of the quartz tube 110 to which the polymer is directly fixed.

As shown in FIGS. 3 and 4, the ultraviolet light sources 150 and 160 are arranged at regular intervals along the circumference of the quartz tube 110 and installed in parallel with the quartz tube 110 in the first embodiment. ) Are a plurality of ultraviolet lamps 150 that irradiate ultraviolet rays almost uniformly over the whole.

The ultraviolet lamp 150 of the present embodiment is formed in the shape of a ″ ∩ ″ or a bar, and the lamp connector 152 having a pair of lamp terminals 151 to which a voltage is supplied from the power supply unit 400 at an end thereof. The lamp connector 152 is coupled to the element connector 170 provided at the end of the quartz tube 120 by the coupling unit 180 so that the lamp connector 152 is installed side by side outside the quartz tube 110.

The device connector 170 is an insulator provided with a pair of device terminals 171 electrically connected to each of the high voltage electrode 120 and the ground electrode 130, and the device terminal 171 receives a high voltage from the power supply unit 400. The high voltage is applied to the high voltage electrode 120 and the ground electrode 130 by being supplied to each other, and is fixed in the center of the coupling part 180 or fixed by screw coupling or integrally formed at the center of the coupling part 180. It can be combined with the coupling unit 180 in a manner.

The coupling unit 180 is coupled to the edge of the lamp connector 152 of the ultraviolet lamp 150 by force fitting or screwed coupling method or formed in one body with the lamp connector 152 of the ultraviolet lamp 150, such as ultraviolet rays in various ways It may be combined with the lamp connector 152 of the lamp 150.

5 and 6, the ultraviolet light source according to the second embodiment uses a coil-shaped ultraviolet lamp 160 installed to surround the outside of the quartz tube 110.

Ultraviolet lamp 160 according to the present embodiment is provided with a lamp connector 162 having a lamp terminal 161 that is supplied with power for driving from the power supply unit 400 at the end, the quartz tube 110 is provided inside Lamp connector 162 is coupled to the device connector 170 at the end of the quartz tube 110 in the positioned state is installed to wrap around the quartz tube 110 is irradiated with UV light evenly throughout the quartz tube (110). On the other hand, since the lamp connector 162 is slidably coupled to the device connector 170 or coupled by an interference fit method or the like, the ultraviolet lamp 160 and the quartz tube 110 may be detachably formed.

Meanwhile, as shown in FIGS. 3 to 6, when titanium dioxide (TiO ₂ ) of the titanium dioxide coating layer 141 is activated by high voltage plasma energy and ultraviolet rays, the activation is stimulated through substitution with titanium (Ti), that is, activation In order to promote the reaction by lowering the energy, a trivalent or pentavalent metal coating layer 142 is formed on the surface of the titanium dioxide coating layer 141.

The trivalent or pentavalent metal coating layer 142 is a trivalent metal such as cobalt (Co), lanthanum (La), yttrium (Y), iron (Fe), preferably iron (Fe), niobium (Nb), A pentavalent metal such as vanadium (V) is preferably vanadium (V). Thus, even if the coating layer 142 of the metal is formed on the plasma discharge devices 100 and 200, the manufacturing cost is not significantly affected. Iron (Fe) or pentavalent vanadium (V) of titanium dioxide (TiO ₂ ) through substitution with titanium (Ti) of the titanium dioxide coating layer 141 upon activation by high voltage plasma energy and ultraviolet energy of ultraviolet light sources 150 and 160. By activating the catalysis more, it maximizes the contamination prevention of the surface.

7 is a side view showing a plasma discharge device according to a third embodiment of the present invention, as shown, the plasma discharge device 300 according to the present embodiment is a high voltage electrode to which a high voltage is applied as in the previous embodiment The dielectric 210 is positioned between the 220 and the ground electrode 230, and a titanium dioxide coating layer 241 is formed on the surface. However, the dielectric 210 is composed of a ceramic plate 210 having a predetermined area in which the high voltage electrode 220 and the ground electrode 230 are provided on both sides thereof, and an ultraviolet lamp (UV light source) as an ultraviolet light source outside the ceramic plate 210. 250) is installed.

Like the previous embodiment, the titanium dioxide coating layer 241 may be formed over the surface exposed to the outside of the plasma discharge device 300, and preferably may be formed only on the high voltage electrode 220 side where the polymer is fixed. have. That is, the titanium dioxide coating layer 241 includes the outer surface of the high voltage electrode 220 on the side where the high voltage electrode 220 is provided in the ceramic plate 210, that is, the titanium dioxide in the portion where the polymer is actually stuck. The coating layer 241 may be formed.

The ultraviolet lamp 250 according to the present embodiment has a ″ ∩ ″ shape or a bar shape, and is installed to face the titanium dioxide coating layer 241 on the outside of the ceramic plate 210, preferably as shown in FIG. 7. It is provided on the side where the high voltage electrode 220 where more foreign substances such as a polymer is formed.

The lamp connector 252 provided at the end of the ultraviolet lamp 250 of the present exemplary embodiment is slidably in one direction to the element connector 260 provided at one side of the ceramic plate 210 in order to be installed outside the ceramic plate 210. The UV lamp 250 is detachably coupled to the ceramic plate 210 by being coupled or coupled by an interference fit method or the like.

On the other hand, the device connector 260 and the lamp connector 252 has a pair of device terminals 261 and the lamp terminal 251 as in the previous embodiment.

In addition, in the titanium dioxide coating layer 241 of the present embodiment, a trivalent metal such as iron (Fe) or a pentavalent metal coating layer 242 such as vanadium (V) may be formed on the surface thereof, as in the previous embodiment. .

Referring to the accompanying drawings, the manufacturing method of the plasma discharge device (100, 200, 300) of the present invention is as follows.

8 is a flowchart illustrating a method of manufacturing a plasma discharge device according to the present invention. As shown, the manufacturing method of the plasma discharge device according to the present invention is largely the step (S10) of coating the surface of the plasma discharge device (100,200,300) with titanium dioxide (TiO ₂ ), the surface coated with titanium dioxide (TiO ₂ ) Coating (S20) with a trivalent or pentavalent metal and installing ultraviolet light sources (150,160,250) outside (S30).

Coating with titanium dioxide (TiO ₂ ) (S10) may be coated over the exposed surface of the plasma discharge device (100, 200, 300), as already mentioned, the plasma discharge device according to the first and second embodiments ( In the case of the 100,200, the high voltage electrode 120 and the ground electrode 130 are made of titanium dioxide (TiO ₂ ) from the dielectric 110 of the quartz tube provided on the inner and outer surfaces, respectively, before the ground electrode 130 is provided. In the case of the plasma discharge device 300 according to the third embodiment, the high voltage electrode 220 is provided in the dielectric 210 of the ceramic plate having the high voltage electrode 220 and the ground electrode 230 provided on both sides thereof. It is preferable to coat with titanium dioxide (TiO ₂ ) including the outer surface of the high voltage electrode 220 on the side.

Coating (S10) with titanium dioxide (TiO ₂ ) is the plasma discharge device (100,200,300), preferably in the case of the plasma discharge device (100,200) according to the first and second embodiments, the quartz tube 110, In the case of the plasma discharge device 300 according to the embodiment, the side on which the high voltage electrode 220 is provided on the ceramic plate 210 is immersed in a solution containing a titanium (Ti) catalyst for 30 minutes to 1 hour 30 minutes (S11). , The plasma discharge device (100,200,300) is taken out of the solution of titanium (Ti) and heated and dried at 100 to 150 ° C for 4 hours to 6 hours (S12), and the dried plasma discharge device (100,200,300) at 300 to 550 ° C for 1 hour. Calcinations are performed for 30 minutes to 2 hours and 30 minutes to form coating layers 141 and 241 of titanium dioxide (TiO ₂ ) on surfaces exposed to the plasma discharge devices 100, 200 and 300 to the outside.

A solution containing a titanium (Ti) catalyst uses water as a solvent in Ti (OCH (CH ₃ ) ₂ ) ₄ so that the concentration of the solution is about 50%. This happens and becomes a suspension state.

2 Ti (OCH (CH ₃ ) ₂ ) ₄ → ₂ TiO ₂ + ₄ HOC (CH ₃ ) ₂

Thus, after immersing the plasma discharge device (100,200,300) for 1 hour in the suspension containing the titanium catalyst (S11), taken out of the suspension and dried for 5 hours at 100 ℃ (S12), calcined at 500 ℃ for 2 hours to discharge the plasma The coating of titanium catalyst on the device (100,200,300) (S13), while calcination at 500 ℃ for 2 hours, TiO ₂ is coated on the surface of the plasma discharge device (100,200,300), 4HO-C (CH ₃ ) _{2 in the} suspension Is decomposed into CO ₂ and H ₂ O as shown in the following reaction formula 2.

4HOC (CH ₃ ) ₂ + 8 O ₂ → 3CO ₂ + 5H ₂ O

The step of coating with trivalent or pentavalent metal (S20), for example, is selected by coating either one of iron (Fe) as a trivalent metal or vanadium (V) as a pentavalent metal.

Coating (S20) with a trivalent or pentavalent metal includes iron (Fe) as a trivalent metal or vanadium (V) as a trivalent metal in the plasma discharge devices 100, 200 and 300 having the titanium dioxide coating layers 141 and 241 formed thereon. Immerse the solution included for 30 minutes to 1 hour 30 minutes (S21), take out the plasma discharge device (100, 200, 300) from a solution of iron (Fe) or vanadium (V) and heated at 100 to 150 ℃ for 4 hours to 6 hours After drying (S22), the dried plasma discharge device (100,200,300) is exposed to an ultraviolet (UV) lamp to form a coating layer of iron or vanadium (142,242) on the surface of the titanium dioxide coating layer (141,241) of the plasma discharge device (100,200,300) To be formed (S23).

When the iron coating layer is formed as the trivalent or pentavalent metal coating layers 142 and 242, the solution containing iron (Fe) is made to have a concentration of 50% by using water as a solvent in Fe (NO ₃ ) ₃ . After immersing the discharge element for 1 hour in a solution containing such iron (Fe) catalyst (S21), taken out of the solution and dried at 100 ℃ for 5 hours (S22) and then exposed to ultraviolet (UV) lamp at room temperature plasma The photocatalytic action of titanium oxide (TiO ₂ ) coated on the discharge devices (100, 200, 300) is oxidatively decomposed to decompose nitrogen oxides (NOx) into N ₂ and O ₂ and evaporate. 100,200,300).

In addition, when the trivalent or pentavalent metal coating layers 142 and 242 are formed with a vanadium coating layer, the vanadium (V) solution uses V (C ₃ H ₇ O) ₅ as a solvent so that the concentration of the solution is 50%. do. After immersing the discharge device for 1 hour in the solution containing such a vanadium (V) catalyst (S21) and taking out the plasma discharge device (100,200,300) from the solution and dried for 5 hours at 100 ℃ (S22). And when exposed to ultraviolet (UV) lamp at ambient temperature is oxidative decomposition by the photocatalytic action of the titanium oxide (TiO ₂₎ coated in a plasma discharge device (100,200,300) an organic oxide _{((C 3 H 7 O)} 5) is a CO ₂ Decomposed into H ₂ O and evaporated, only the metal vanadium (V) is coated on the surface of the plasma discharge device (100, 200, 300) (S23).

As described above, the ultraviolet light sources 150, 160, and 250 are assembled outside the plasma discharge devices 100, 200, and 300 on which the titanium dioxide coating layers 141 and 241 and the trivalent or pentavalent metal coating layers 142 and 242 are formed.

The operation of the plasma discharge device according to the present invention as follows.

Positive / negative ions through discharge by applying a high voltage to the high voltage electrode portions 120, 220 and the ground electrodes 130, 230 through the device terminals 171, 261 by the power supply 400 to the plasma discharge devices 100, 200, 300 installed in the air purifier or the like. It generates anion and ozone to purify the air through electric dust collection, deodorization, sterilization, and the like.

Plasma discharge device (100, 200, 300) is active for a long time when high voltage is applied to the oxidation reaction of volatile organic compounds (TVOC) and odorous substances on the surface of the active, as a by-product of the composite compound of C, N, O, H (polymer) is formed on the surface, at this time, the titanium dioxide catalyst of the titanium dioxide coating layer (141,241) of the plasma discharge device (100,200,300) is activated by the high voltage plasma energy due to the discharge to volatile organic compounds and odorous substances to CO ₂ and By completely decomposing with H ₂ O, the byproduct polymer does not stick to the surface of the plasma discharge device (100, 200, 300). At this time, the titanium dioxide coating layer (141, 241) is further activated by the ultraviolet light emitted from the ultraviolet light source (150, 160, 250) by the voltage supplied through the lamp terminal (151, 161, 251) by the power supply unit 400 of the volatile organic compounds and odorous substances Improve resolution

Particularly, titanium (Ti) of the titanium dioxide coating layers 141 and 241 is tetravalent (Ti ⁴⁺ ), but iron (Fe) is trivalent (Fe ³⁺ ) in the case of the iron coating layer in the trivalent or pentavalent metal coating layers 142 and 242. In the case of the vanadium coating layer, since vanadium (V) is ^pentavalent (V ⁵⁺ ), catalysis is further activated by replacing titanium (Ti) with iron (Fe) or vanadium (V) in titanium oxide (TiO ₂ ). Actively inhibit polymer formation by promoting the reaction by lowering the activation energy.

FIG. 9 shows an example of the amount of ion generation over time for a device in which the coating layers 141 and 142 according to the present invention are formed on the surface of the plasma discharge device in an air purifier using the same plasma discharge device and a conventional device that is not. Shown. As shown, the conventional plasma discharge device can be seen that the amount of ion generation is drastically reduced compared to the initial use over time, the plasma discharge device 100 according to the present invention is found that the decrease in the amount of ion generation is small Can be. 9 illustrates a case in which the ultraviolet light source 150 is not installed in the device in which the coating layers 141 and 142 are formed, the ultraviolet light source 150 is provided to activate the coating layers 141 and 142 by ultraviolet light. Increasing the amount of ion generation is much smaller than this.

Therefore, when using the plasma discharge device (100, 200, 300) according to the present invention can not only greatly reduce the amount of ion generation, but also significantly increase the cleaning period, it is also possible to improve the use cycle.

As described above, the plasma discharge device according to the present invention reduces the contamination of the surface due to the coating layer which is activated by the high voltage plasma energy generated during discharge and the ultraviolet light emitted from the ultraviolet light source to decompose foreign substances such as polymer generated on the surface. This increases the cleaning cycle of the surface and the usage cycle of the product, and has the effect of minimizing the generation of ions or ozone even for long time use.

As described above is just one embodiment for implementing the plasma discharge device according to the present invention, the present invention is not limited to the above embodiment, as claimed in the utility model registration claims below Without departing from the gist, any person having ordinary knowledge in the field to which the present invention belongs will have a technical spirit of the present invention to the extent that various modifications can be made.

1 is a side cross-sectional view showing a plasma discharge device according to a conventional embodiment,

2 is a side cross-sectional view showing a plasma discharge device according to another embodiment of the prior art,

3 is a side view showing a plasma discharge device according to a first embodiment of the present invention,

4 is a partial cross-sectional view of FIG.

5 is a side view showing a plasma discharge device according to a second embodiment of the present invention,

6 is a partial cross-sectional view of FIG. 5,

7 is a partial cross-sectional view showing a plasma discharge device according to a third embodiment of the present invention,

8 is a flowchart illustrating a method of manufacturing a plasma discharge device of the present invention,

9 is a graph comparing the amount of ion generation between the plasma discharge device of the present invention and the conventional plasma discharge device.

<Description of Symbols for Main Parts of Drawings>

110,210: dielectric (110: quartz tube, 210: ceramic plate)

120,220: high voltage electrode 130,230: ground electrode

141,241 titanium dioxide coating layer 142,242 trivalent or pentavalent metal coating layer

150,160,250: UV light source 151,161,251: Lamp terminal

152,162,252: Lamp connector 170,260: Device connector

171,261: device terminal 180: coupling part

Claims (8)

In a plasma discharge device that generates ions by discharge, A dielectric is located between the high voltage electrode and the ground electrode to which a high voltage is applied, Titanium dioxide coating layer is formed on the surface to prevent contamination, An ultraviolet light source for irradiating ultraviolet rays is provided to activate the titanium dioxide coating layer Plasma discharge element. The method of claim 1, The dielectric is, The titanium dioxide coating layer is formed on the outer surface, and the high voltage electrode and the ground electrode is provided on the inner surface and the outer surface of the titanium dioxide coating layer, respectively Plasma discharge device, characterized in that. The method of claim 2, The ultraviolet light source is A plurality of ultraviolet lamps arranged along the circumference of the quartz tube and installed side by side with the quartz tube; Plasma discharge device, characterized in that. The method of claim 2, The ultraviolet light source, Coil-shaped ultraviolet lamp installed to surround the outside of the quartz tube Plasma discharge device, characterized in that. The method of claim 1, The dielectric is, The high voltage electrode and the ground electrode are respectively provided on both sides, and the ceramic plate on which the titanium dioxide coating layer is formed, including the outer surface of the high voltage electrode on the side where the high voltage electrode is provided Plasma discharge device, characterized in that. The method of claim 5, The ultraviolet light source, Ultraviolet lamp which is installed to face the titanium dioxide coating layer on the outside of the ceramic plate Plasma discharge device, characterized in that. The method according to any one of claims 1 to 6, Forming a coating layer of a trivalent or pentavalent metal on the surface of the titanium dioxide coating layer to stimulate the activation through substitution with titanium when the titanium dioxide is activated. Plasma discharge device, characterized in that. The method of claim 7, wherein The trivalent or pentavalent metal is, Iron as said trivalent metal or vanadium as said pentavalent metal Plasma discharge device, characterized in that.