KR200389496Y1 - A dustproof mask for clean room - Google Patents

A dustproof mask for clean room Download PDF

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Publication number
KR200389496Y1
KR200389496Y1 KR20-2005-0011981U KR20050011981U KR200389496Y1 KR 200389496 Y1 KR200389496 Y1 KR 200389496Y1 KR 20050011981 U KR20050011981 U KR 20050011981U KR 200389496 Y1 KR200389496 Y1 KR 200389496Y1
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South Korea
Prior art keywords
filter paper
clean room
dust mask
lint
polyethylene
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KR20-2005-0011981U
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Korean (ko)
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김태규
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김태규
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Priority to KR20-2005-0011981U priority Critical patent/KR200389496Y1/en
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Publication of KR200389496Y1 publication Critical patent/KR200389496Y1/en

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    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A41D13/11Protective face masks, e.g. for surgical use, or for use in foul atmospheres
    • A41D13/1161Means for fastening to the user's head
    • AHUMAN NECESSITIES
    • A62LIFE-SAVING; FIRE-FIGHTING
    • A62BDEVICES, APPARATUS OR METHODS FOR LIFE-SAVING
    • A62B18/00Breathing masks or helmets, e.g. affording protection against chemical agents or for use at high altitudes or incorporating a pump or compressor for reducing the inhalation effort
    • A62B18/02Masks
    • A62B18/025Halfmasks

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  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Zoology (AREA)
  • Pulmonology (AREA)
  • Business, Economics & Management (AREA)
  • Emergency Management (AREA)
  • Respiratory Apparatuses And Protective Means (AREA)

Abstract

본 고안은 방진마스크에 관한 것으로서, 상세하게는 전면에 주름부(14)를 갖는 필터지(10)가 구비되되, 필터지(10)는 통기성을 갖는 합성수지 재질의 외피(11)를 비롯하여 중간피(12) 및 내피(13)가 중첩된 구성이며, 필터지(10)의 상부에는 얼굴 윤곽 특히 코부위에 밀착되도록 자유절곡이 가능한 폴리에틸렌(Polyethylene) 재질의 절곡스틱(40)이 삽입되고, 필터지(10)의 측부에는 신축성이 우수하고 보푸라기가 전무(全無)한 폴리우레탄(Polyurethane) 재질의 이어밴드(50)(Ear Band)가 부착된 클린룸용 방진마스크에 관한 것이다.The present invention relates to a dust mask, and in particular, the filter paper 10 having a pleated portion 14 is provided on the front surface, the filter paper 10, including the outer skin 11 of the synthetic resin material having a breathable intermediate skin 12 and the endothelial 13 is overlapped, the upper part of the filter paper 10 is inserted into the bending stick 40 of polyethylene (Polyethylene) material that can be bent freely to be in close contact with the face contour, especially the nose area, the filter The side of the paper 10 relates to an anti-vibration mask for a clean room to which ear bands 50 made of a polyurethane material having excellent elasticity and no lint are attached.

Description

클린룸용 방진마스크{A dustproof mask for clean room}Dustproof mask for clean room

본 고안은 방진마스크에 관한 것으로서, 더욱 상세하게는 방진마스크 착용시 폴리에틸렌(Polyethylene) 재질의 절곡스틱이 코부위 윤곽선에 알맞도록 절곡 밀착되어 외부의 분진 흡입이 사전에 방지되는 것이며, 또한 폴리우레탄(Polyurethane) 재질의 이어밴드(Ear band)를 방진마스크의 양측에 부착하여 종래 실밴드(또는 끈밴드)의 보푸라기 발생문제를 개선한 것이다.The present invention relates to a dust mask, and more specifically, when wearing the dust mask, a bending stick made of polyethylene material is bent to closely fit the contour of the nose, and external dust inhalation is prevented in advance. By attaching an ear band made of polyurethane to both sides of the dust mask, the problem of lint generation of the conventional seal band (or string band) is improved.

통상 방진마스크는 유독가스 배출이 심한 화학공장이나, 금속가루 및 용접흄(Fume)등이 발생되는 금속제련 현장 또는 제지관련이나 방직공장에서 작업자의 건강을 보호하기 위하여 착용되고 있으며, 한편으로는 분진 발생이 극히 제한적이어야 할 반도체 연구실(또는 반도체 제조현장)에서 반도체의 품질을 높이고자 방진마스크가 착용되고 있다.Dust masks are usually worn to protect workers' health at chemical plants, where toxic gas emissions are high, metal smelting sites where metal powder and welding fumes are generated, or in paper-related or textile mills. In this semiconductor lab (or semiconductor manufacturing site) that should be extremely limited, dust masks are being worn to improve the quality of semiconductors.

반도체 연구실이나 반도체 생산라인의 클린룸(Clean Room)에서는 방진마스크는 물론 방진복, 방진화 등을 착용하여 몸이나 의복을 통해서 유입될 수 있는 미세먼지나 오염물질을 원천 차단하여 반도체의 품질을 제고하고 있다.In the clean room of the semiconductor lab or semiconductor production line, wear a dust mask, dustproof clothes, dustproof shoes, etc. to block the fine dust or contaminants that can flow through the body or clothing, and improve the quality of the semiconductor. have.

이러한 클린룸용 방진마스크는 작업자의 건강을 보호하기 위한 것이기 보다는 반도체의 고품질을 유지하고자 하는 것으로, 방진마스크 자체가 보푸라기 발생이 없어야 함에도 불구하고, 종래의 이어밴드(Ear Band)가 보푸라기가 발생될 수 있는 실 또는 끈 재질이어서 이에 대한 개선이 요구되고 있다.The dust mask for clean room is intended to maintain the high quality of the semiconductor rather than to protect the health of the worker, although the dust mask itself should not have a lint, the conventional ear band (ear band) can cause lint. It is a thread or string material that needs improvement.

한편, 종래 방진마스크에 사용되는 절곡와이어(30)는 도 1에서 도시한 바와같이 철심(31)에 폴리염화비닐(PVC, Poly Vinyl Chloride)의 피복(32)이 코팅된 것이어서, 방진마스크의 소각 폐기시 인체에 해롭고 독성이 강한 다이옥신(Dioxine)이 배출되는 문제점이 있었고, 또한 소각후 철심(31)을 별도로 분리해야 하는 불편함이 있었다.On the other hand, the bending wire 30 used in the conventional dust mask is coated with a coating 32 of polyvinyl chloride (PVC, Polyvinyl Chloride) on the iron core 31, as shown in Figure 1, incineration of the dust mask There was a problem that dioxin (Dioxine) is harmful and harmful to the human body at the time of disposal, there is also a inconvenience to separate the iron core 31 after incineration.

따라서, 본 고안은 상술한 바와같은 문제점을 감안하여 창안한 것으로서, 본 고안에 따른 클린룸용 방진마스크의 상부에는 소각 폐기시 다이옥신이 거의 발생되지 않는 폴리에틸렌(Polyethylene) 재질의 절곡스틱이 삽입되고, 이어밴드(Ear band) 또한 보푸라기 발생이 전무한 폴리우레탄(Polyurethane) 재질의 이어밴드(Ear band)를 부착하여 클린룸의 분진 발생이 극도로 제한되도록 한다.Therefore, the present invention was conceived in view of the above-described problems, and the upper part of the dust mask for a clean room according to the present invention is inserted a bending stick made of polyethylene (Polyethylene) material which hardly generates dioxin upon incineration disposal. Ear band is also attached to the ear band (Polyurethane) made of no lint generation so that the dust generation in the clean room is extremely limited.

상기와 같은 목적을 달성하고자 하는 본 고안에 따른 클린룸용 방진마스크는 전면을 수차례 접어 주름부(14)를 갖도록 한 필터지(10)가 구비되되, 필터지(10)는 통기성을 갖는 합성수지 재질의 외피(11)를 비롯하여 중간피(12) 및 내피(13)가 중첩된 구성이며, 필터지(10)의 상부에는 얼굴 특히 코부위에 밀착되도록 자유절곡이 가능한 폴리에틸렌(Polyethylene) 재질의 절곡스틱(40)이 삽입되고, 필터지(10)의 양측에는 신축성이 우수하고 보푸라기 발생이 전무한 폴리우레탄(Polyurethane) 재질의 이어밴드(50)(Ear Band)가 부착된 구성이다.Dust mask for clean room according to the present invention to achieve the above object is provided with a filter paper 10 to have a wrinkle portion 14 by folding the front several times, the filter paper 10 is a synthetic resin material having breathability The outer skin 11, including the intermediate skin 12 and the endothelial 13 overlapping configuration, the upper portion of the filter paper 10, the bending stick made of polyethylene (Polyethylene) material that can be bent freely to be in close contact with the face, especially the nose area 40 is inserted, and both sides of the filter paper 10 are excellent in elasticity, and the ear band 50 (Ear Band) made of polyurethane (Polyurethane) having no fluff generation is attached.

이하, 본 고안의 목적을 달성할 수 있는 바람직한 실시예의 기술구성 및 효과를 첨부된 도면을 참고하여 설명하면 다음과 같다.Hereinafter, with reference to the accompanying drawings the technical configuration and effects of a preferred embodiment that can achieve the object of the present invention is as follows.

도 1은 종래 방진마스크를 설명하기 위한 사시도로서, 도 1에 도시한 바와같이 필터지(10)의 양측에는 보푸라기 발생이 가능한 실밴드(51)(또는 끈밴드)가 부착된다.1 is a perspective view illustrating a conventional dust mask, and as shown in FIG. 1, a seal band 51 (or a strap band) capable of generating lint is attached to both sides of the filter paper 10.

상기 실밴드(51)는 보푸라기 발생 빈도가 높은 것은 아니지만, 최적의 방진(防塵)상태가 요구되어야 하는 클린룸(Clean Room)에서의 사용은 부적절한 것이다.Although the seal band 51 does not have a high frequency of lint occurrence, its use in a clean room where an optimal dustproof condition is required is inappropriate.

아울러 도 2는 필터지(10)의 적층 사시도로서, 클린룸용 방진마스크에 사용되는 필터지(10) 또한, 외피(11)는 통기성이 우수한 합성수지를 사용하여 작업중 착용자가 필터지(10)를 만지더라도 그로인해 보푸라기가 발생되지 않도록 하였다.In addition, Figure 2 is a laminated perspective view of the filter paper 10, the filter paper 10 used in the dust mask for the clean room, the outer shell 11 is a synthetic resin with excellent breathability, the wearer touches the filter paper 10 during operation Even so, lint did not occur.

도 1에 도시한 절곡와이어(30)는 방진마스크가 얼굴의 윤곽선에 알맞게 밀착되도록 한 것으로서, 코부위의 윤곽선과 방진마스크 사이의 틈을 통해 분진이 체내로 흡입되는 것을 방지하며, 특히 클린룸에서는 작업자의 입김이 여과없이 방진마스크 외부로 배출되는 것을 방지하기 위한 것이다.The bending wire 30 shown in FIG. 1 is a dust mask to be in close contact with the contour of the face, and prevents dust from being sucked into the body through the gap between the contour of the nose and the dust mask, especially in a clean room. This is to prevent the worker's breath from being discharged to the outside of the dust mask without filtration.

상기 절곡와이어(30)는 탄성을 갖는 철심(31)과 철심(31)을 코팅한 폴리염화비닐(PVC, Poly Vinyl Chloride)의 피복(32)으로 구성된 것으로, 방진마스크의 소각 폐기시 인체에 해롭고 독성이 강한 다이옥신(Dioxine)이 배출되는 문제점이 있으며, 또한 소각물에서 철심(31)을 별도 분리하여 처리해야 하는 번거로움이 있다.The bending wire 30 is composed of an iron core 31 having elasticity and a coating 32 of polyvinyl chloride (PVC) coated with the iron core 31, which is harmful to the human body when incineration of the dust mask is incinerated. Dioxine is a strong toxicity (Dioxine) is discharged, there is also a hassle to separate and process the iron core (31) from the incineration.

도 3은 본 고안에 따른 클린룸용 방진마스크의 사시도이며, 도 4는 본 고안의 확대 측단면도이다.3 is a perspective view of a dust mask for a clean room according to the present invention, Figure 4 is an enlarged side cross-sectional view of the present invention.

도 3에서와 같이, 본 고안은 전면에 주름부(14)를 갖는 필터지(10)의 상단에 자유절곡이 가능한 가소성(可塑性)의 절곡스틱(40)이 삽입된다.As shown in FIG. 3, the present invention inserts a plastic bending stick 40 that can be freely bent at an upper end of a filter paper 10 having a pleat 14 on its front surface.

절곡스틱(40)은 소각시 다이옥신과 같이 인체에 해로운 유독물질이 거의 발생되지 않는 폴리에틸렌(Polyethylene) 재질인데다, 종래처럼 철심(31)과 같이 소각 폐기후 별도 분리해야 하는 구성이 없는 것이어서, 소각 과정의 불편함을 개선한 것이다.Bending stick (40) is a polyethylene (Polyethylene) material that hardly generates toxic substances harmful to the human body, such as dioxin during incineration, and there is no configuration that must be separated after incineration, such as iron core (31), incineration process It is to improve the inconvenience.

한편, 도 3에 부착된 이어밴드(50)(Ear Band)는 종래 실밴드(51)의 보푸라기 발생 문제를 개선하고자, 보푸라기 발생이 전무(全無)한 폴리우레탄(Polyurethane) 재질의 이어밴드(50)(Ear Band)를 부착하였다.On the other hand, the ear band 50 (Ear Band) attached to Figure 3 is to improve the problem of the occurrence of lint of the conventional seal band 51, the ear band of a polyurethane (Polyurethane) material with no lint generation ( 50) (Ear Band) was attached.

폴리우레탄 재질의 이어밴드(50)는 보푸라기 발생이 전무한데다, 신축성 및 인장강도가 우수하여 클린룸용 방진마스크의 귀걸이 밴드로 손색이 없다 할 것이다.The ear band 50 made of polyurethane has no lint generation, and has excellent elasticity and tensile strength, and thus will have no problem as an earring band of a dust mask for a clean room.

상기한 필터지(10)의 접지 및 이어밴드(50)의 부착은 공히 초음파를 통해서 융착부(20)가 형성되도록 열융착하며, 착용시에는 주름부(14)를 펼쳐 코부터 턱아래까지 전개시켜 착용한다.The grounding of the filter paper 10 and the attachment of the ear band 50 are thermally fused so that the fusion unit 20 is formed through ultrasonic waves, and when worn, the wrinkles 14 are unfolded from the nose to the bottom of the chin. Wear it.

결국, 본 고안의 기술요지는 방진마스크에 있어서, 필터지(10)의 상단에는 얼굴 윤곽에 따라 자유절곡이 가능한 폴리에틸렌(Polyethylene) 재질의 절곡스틱(40)이 삽입되고, 필터지(10)의 양측에는 보푸라기의 발생이 전무(全無)한 폴리우레탄(Polyurethane) 재질의 이어밴드(50)(Ear Band)가 부착된 것을 특징으로 하는 클린룸용 방진마스크이다.As a result, in the anti-dust mask of the present invention, the bending stick 40 made of polyethylene material, which is freely bent according to the contour of the face, is inserted into the upper end of the filter paper 10, and the filter paper 10 Both sides are a dust mask for a clean room, characterized in that the ear band 50 (Ear Band) made of a polyurethane (Polyurethane) material with no generation of lint.

이상에서 살펴본 바와 같이 본 고안에 따른 클린룸용 방진마스크는 소각 폐기시 환경 유해물질인 다이옥신이 거의 발생되지 않는데다, 보푸라기의 발생을 원천 차단할 수 있으므로, 최적의 방진(防塵)상태가 요구되는 반도체의 클린룸에서 사용하기에 적합하다 할 것이다.As described above, the dust mask for a clean room according to the present invention hardly generates dioxin, which is an environmentally harmful substance during incineration, and can block the generation of lint, so that an optimal dustproof condition is required. It will be suitable for use in clean rooms.

도 1은 종래 방진마스크의 사시도1 is a perspective view of a conventional dust mask

도 2는 필터지의 적층 사시도2 is a laminated perspective view of the filter paper

도 3은 본 고안에 따른 클린룸용 방진마스크의 사시도3 is a perspective view of a dust mask for clean room according to the present invention

도 4는 본 고안의 확대 측단면도Figure 4 is an enlarged side cross-sectional view of the present invention

< 도면의 주요부분에 대한 부호의 설명 ><Description of Symbols for Major Parts of Drawings>

10 : 필터지10: filter paper

11 : 외피11: outer jacket

12 : 중간피12: intermediate blood

13 : 내피13: endothelial

14 : 주름부14 wrinkles

20 : 융착부20: fusion

30 : 절곡와이어30: bending wire

31 : 철심31: iron core

32 : 피복32: sheath

40 : 절곡스틱40: bending stick

50 : 이어밴드(Ear Band)50: Ear Band

51 : 실밴드51: thread band

Claims (1)

방진마스크에 있어서,In the dust mask, 필터지(10)의 상단에는 얼굴 윤곽에 따라 자유절곡이 가능한 폴리에틸렌(Polyethylene) 재질의 절곡스틱(40)이 삽입되고, 필터지(10)의 양측에는 보푸라기의 발생이 전무(全無)한 폴리우레탄(Polyurethane) 재질의 이어밴드(50)(Ear Band)가 부착된 것을 특징으로 하는 클린룸용 방진마스크.The top of the filter paper 10 is inserted into the bending stick 40 made of polyethylene material that can be bent freely according to the contour of the face, and both sides of the filter paper 10 are made of poly having no lint generation. Dust mask for clean room, characterized in that the ear band (50) (Ear Band) made of polyurethane (Polyurethane) is attached.
KR20-2005-0011981U 2005-04-29 2005-04-29 A dustproof mask for clean room KR200389496Y1 (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190104703A (en) * 2018-03-02 2019-09-11 김한주 Wrinkle mask and method of manufacturing the same
KR102025804B1 (en) * 2019-05-24 2019-11-04 주식회사 서울세미텍 Functional mask with length adjusting part
KR20220000097U (en) 2020-07-02 2022-01-11 주식회사 맥스코리아 The flat type folding mask

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190104703A (en) * 2018-03-02 2019-09-11 김한주 Wrinkle mask and method of manufacturing the same
KR102028827B1 (en) 2018-03-02 2019-10-04 김한주 Wrinkle mask and method of manufacturing the same
KR102025804B1 (en) * 2019-05-24 2019-11-04 주식회사 서울세미텍 Functional mask with length adjusting part
CN111972741A (en) * 2019-05-24 2020-11-24 首尔世美泰科 Functional mask with length adjusting part
WO2020242026A1 (en) * 2019-05-24 2020-12-03 주식회사 서울세미텍 Functional mask having length adjustment parts
KR20220000097U (en) 2020-07-02 2022-01-11 주식회사 맥스코리아 The flat type folding mask

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