KR20030063035A - Plasma discharge device - Google Patents

Abstract

PURPOSE: A plasma generation device is provided to generate a uniform plasma of a high density and large scale with maintaining a high efficiency on the conductive or non conductive material at the low pressure as well as at the atmosphere pressure. CONSTITUTION: A plasma generation device includes an envelope(11), a gas inlet tube(12), a tube type electrode(13), an insulation electrode cap(14), a relative electrode(15), a sample(16) and a plasma(17). In the plasma generation device, at least more than one tube type electrodes are formed at the gas envelope(11) attached to the gas inlet tube(12) for injecting a predetermined work gas and the plasma(17) is generated between the tube type electrode(13) and the relative electrode(15) by arranging the relative electrode(15) at the portion facing to the tube type electrode(13).

Description

Plasma Generator {PLASMA DISCHARGE DEVICE}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma generator, and more particularly, to a plasma generator configured to perform surface treatment or coating of a conductive or nonconductive material at a low pressure as well as an atmospheric pressure.

Plasma is highly ionized and refers to a state in which (+) ions and (-) electrons are present at the same density and are electrically balanced to be neutral, and a discharge tube is an example.

A general plasma generating apparatus connects a substrate or a target to a power supply to which power is supplied, inserts the substrate or the target into a predetermined chamber, and makes the chamber vacuum by predetermined vacuum processing means. However, the plasma generating apparatus as described above has to perform the process in a vacuum state, and its use is limited because it is modified or deposited only on a specimen having a relatively small area.

Therefore, recently, many atmospheric pressure large-area plasma generators have been developed. The atmospheric large-area plasma generators are AC barrier type (T. Yokoyama, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D: Appl. Phys. V 23 , p1125 (1990)) , (John R. Roth, Peter P. Tsai, Chaoyu Lin, Mouuir Laroussi, Paul D. Spence, "Steady-state, Glow discharge plasma", US patent 5,387,842 (Feb. 7, 1995), "One Atmosphere, Uniform Glow Discharge Plasma ", US patent 5,414,324 (May 9, 1995)), resistor type (Yu. S. Akishev, AA Deryugin, IV Kochetov, AP Napartovich, and NI Trushkin, J. Phys. D: Appl. Phys. V 26 , p1630 (1993)), Perforated Dielectric or Capillary Type (Erich E. Kunhardt, Kurt H. Becker, "Glow plasma discharge device having electrode covered with perforated dielectric", US patent 5,872,426 (Feb. 16, 1999). The important advantages and disadvantages of each method are as follows.

The AC barrier type published in Japan and the like forms a uniform plasma, but the plasma density is low and the energy loss by the dielectric is large. The resistor type proposed in Russia uses several pin cathodes, and each pin has a resistor (1 mW / pin) to obtain a large area stable DC plasma at atmospheric pressure. However, much of the energy in the resistor is lost, resulting in inefficiency and poor plasma uniformity. Perforated Dielectric or Capillary types developed in the US also have a low plasma uniformity and energy loss due to heat generated by the combination of electrons and ions in the inner wall of the hole. The plasma density of the tubular type is up to about 100 times higher than that of the AC barrier type, but the plasma uniformity of the metal sample is significantly worsened and the plasma density is also reduced by more than 10 times.

As mentioned above, the conventional technology generates a lot of energy loss, and it is also difficult to apply to a sample such as a conductive metal. For this reason, first, there is a problem in that the plasma is not uniformly processed by discharging the plasma in a fibrous form in the metal sample to form a non-uniform plasma with uniformity of the plasma. Second, since the plasma density is not strong enough to produce and mass-produce by processing samples such as conductive metals, the most commonly used places in the surface treatment industry are non-conductive samples and weak surfaces. It is mainly used.

In addition, in the case of low-pressure plasma, it is easy to obtain a plasma that is relatively uniform in a large area, and is widely used today. High density plasmas are also possible to some extent. However, in low pressure as well as atmospheric plasma, self-current control is not possible, and there is a current control device in the power supply to control the current, which causes energy loss. In the case of low pressure plasma, a device for making low pressure is expensive, and the system itself is a batch type, and thus the continuity of the process cannot be secured, and thus it is mainly applied to expensive products.

In order to solve the above problems, an object of the present invention is to configure a high-efficiency, high-density, uniform plasma on a conductive or non-conductive material even at atmospheric pressure, including atmospheric pressure as well as low pressure in a vacuum state It is to provide a plasma generating apparatus.

Accordingly, the present invention provides a plasma generating apparatus for processing a predetermined specimen, wherein at least one tubular electrode is formed in a gas container with a gas injection tube for injecting a predetermined working gas, and is opposed to the tubular electrode. The counter electrode is disposed at the portion to generate a plasma between the tubular electrode and the counter electrode.

In addition, the present invention provides a plasma generating apparatus for processing a predetermined specimen, forming a plate-shaped electrode having at least one or more tubular holes in a gas container with a gas injection tube for injecting a predetermined working gas, Placing a counter electrode on a portion of the plate-shaped electrode opposite to generate a plasma between the plate-shaped electrode and the counter electrode.

In addition, the present invention is a plasma generating apparatus for processing a predetermined specimen, at least one side of the gas container with a gas injection tube for injecting a predetermined working gas is composed of a dielectric plate, at least on the dielectric plate Inserting one or more tubular electrodes, and placing the counter electrode in a portion facing the tubular electrode to generate a plasma between the tubular electrode and the counter electrode.

In addition, the present invention is a plasma generating apparatus for processing a predetermined specimen, at least one side of the gas container with a gas injection tube for injecting a predetermined working gas is composed of a dielectric plate, at least one or more plate-shaped electrode And immersing the inside of the dielectric plate, installing a counter electrode on the dielectric plate between the plate-shaped electrodes, and forming at least one gas outlet on the dielectric plate between the plate-shaped electrode and the counter electrode.

In addition, the present invention provides a plasma generating apparatus for processing a predetermined specimen, comprising: another gas container having another gas inlet tube, and at least one side of the other gas container provided in the other gas container; A working gas container having a working gas chamber which does not mix with a working gas inlet tube, at least one tubular electrode provided on the dielectric plate, a counter electrode and a counter electrode provided on a dielectric plate between the tubular electrodes; At least one or more formed on the dielectric plate between the tubular electrodes and is characterized in that it comprises a different gas ejection hole for extending another gas delivery tube for delivering another gas thereon.

In addition, the present invention provides a plasma generating apparatus for processing a predetermined specimen, comprising: another gas container having another gas inlet tube, and at least one side of the other gas container provided in the other gas container; A working gas container having a working gas chamber which is incompatible with the working gas chamber, the working gas container including a working gas inlet tube, at least one plate electrode immersed on the dielectric plate, and at least one counter electrode disposed on the dielectric plate between the plate electrodes; At least one formed on a dielectric plate between the counter electrode and the plate-shaped electrode and extending with another gas delivery pipe for delivering another gas thereon, and another gas ejection hole for releasing another gas, and a dielectric between the counter electrode. It includes at least one working gas blowing hole formed in the plate It is characterized by a ship.

1a to 1c is a basic view of the plasma generating apparatus by the tubular electrode according to the present invention,

Figure 1a is a side cross-sectional view of the plasma generating apparatus by a tubular electrode,

1B is a partial perspective view of a head portion of a plasma generating device by a tubular electrode;

Fig. 1C is a bottom view of the plasma generator with the tubular electrode.

2A to 2D are detailed views of tubular electrodes and insulator electrode caps of various forms according to the present invention;

Figure 2a is composed of only a tubular electrode,

2b is a case consisting of a tubular electrode and an insulator electrode cap,

2C shows an insulator tube configured inside the electrode in the tubular electrode and the insulator electrode cap,

FIG. 2D illustrates a case where an insulator tube is formed inside the electrode in the tubular electrode and the insulator electrode cap, and the lens and the erasing electrode are formed on the insulator electrode cap. FIG.

3A to 3F are self explanatory diagrams of current control by an insulator electrode cap when an AC power supply according to the present invention is applied.

4A and 4B are views showing positions in waveforms of an AC power source corresponding to each state of FIGS. 3A to 3F according to the present invention.

4A is a diagram when a pulse waveform;

4B is a diagram of a sinusoidal waveform;

5A to 5D are explanatory diagrams of a self control of a current in an insulator electrode cap by an erasing power supply when a DC power supply according to the present invention is applied.

FIG. 6 is a view showing positions in waveforms of erase power supplies corresponding to respective states of FIGS. 5A to 5D according to the present invention; FIG.

7 is a diagram showing the distribution of plasma by computer simulation in the form of the electrode of Figure 2b according to the present invention.

8 is a diagram showing the distribution of plasma by computer simulation in the form of the electrode of Figure 2c according to the present invention.

FIG. 9 is a diagram showing a distribution diagram of plasma by computer simulation in the form of the electrode of FIG. 2D according to the present invention. FIG.

10A to 10J are cross-sectional views showing various structures of the insulator electrode cap according to the present invention.

11A and 11B are diagrams illustrating an integrated insulator electrode cap type plasma generator according to another embodiment of the present invention.

11A is a side cross-sectional view of the plasma generator of the integral insulator electrode cap type;

Fig. 11B is a side sectional view of the plasma generator of the integral insulator electrode cap type with a lens and an erasing electrode;

12A and 12B illustrate a plasma generating apparatus in which an integrated insulator electrode cap is applied to a hole-shaped plate electrode according to another embodiment of the present invention.

12A is a cross-sectional view of a side surface of a plasma generator of an insulator electrode cap type integrated with a plate-shaped electrode with holes;

Fig. 12B is a sectional view of a side surface of the plasma generator of the insulator electrode cap type integral to the plate-shaped electrode with holes with lens and erase electrode;

13A and 13B are diagrams illustrating an individual voltage-applied tube type plasma generator according to still another embodiment of the present invention.

13A is a sectional view of the side of an individual voltage-applied tube type plasma generator;

Fig. 13B is a three-dimensional view of the head portion of an individual voltage applying tube type plasma generator.

14A and 14B are diagrams of a high pressure distribution apparatus for an individual voltage-applied tube type plasma generator according to still another embodiment of the present invention.

14A is a DC high pressure distribution device diagram;

14B is an alternating current high pressure distribution device.

FIG. 15 is a cross-sectional view of a side surface of a plasma generating apparatus with a tubular electrode having a plasma reactor according to another embodiment of the present invention; FIG.

16A and 16B are diagrams illustrating an integrated insulator electrode cap type plasma generator having a coplanar electrode structure according to still another embodiment of the present invention.

FIG. 16A is a cross-sectional view of a side surface of the plasma generator of an integrated insulator electrode cap type in which a coplanar counter electrode is exposed; FIG.

FIG. 16B is a cross-sectional view of a side surface of an integrated insulator electrode cap type plasma generator having a coplanar counter electrode submerged in a dielectric; FIG.

17A and 17B are cross-sectional views of a side surface of an integrated insulator electrode cap type plasma generating apparatus having a lens and an erasing electrode in a coplanar counter electrode structure according to another embodiment of the present invention.

17A is a cross-sectional view of a side surface of an integrated insulator electrode cap type plasma generator having a lens and an erase electrode in a structure in which a coplanar counter electrode is exposed;

FIG. 17B is a cross-sectional view of a side surface of an integrated insulator electrode cap type plasma generator having a lens and an erase electrode in a structure in which a coplanar counter electrode is immersed in a dielectric; FIG.

18A and 18B are plasma generating device diagrams of a coplanar electrode structure having a gas outlet,

18A is a cross-sectional view of a side surface of a plasma generator of a type in which a counter electrode is exposed;

Fig. 18B is a sectional view of the side of a plasma generator of a type in which a counter electrode is immersed inside a dielectric;

19A to 19C are diagrams of plasma generating apparatuses of two types of gas use according to still another embodiment of the present invention.

19A is a side cross-sectional view of a plasma generator of an integrated insulator electrode cap type in which a coplanar counter electrode using two kinds of gases is exposed;

Fig. 19B is a side cross-sectional view of the plasma generator of the integrated insulator electrode cap type having a lens and an erasing electrode in a structure in which a coplanar counter electrode using two kinds of gases is exposed;

Fig. 19C is a side sectional view of a plasma generator of the type in which a counter electrode using two gases is exposed;

<Description of Major Symbols in Drawing>

11; Container 12; Gas injection pipe

13; Tubular electrode 13b; Lens and Elimination Electrode

14; Insulator electrode cap 14b; Insulator tube

15; Counter electrode 16; Psalter

17; Plasma 111; Vessel

114; Integral insulator electrode cap plate 111b; Insulator plate

121; Container 123; Electrode with holes in plate

124; An insulator electrode cap 121b in the form of a plate; Lens and eliminating electrode fixing plate

131; AC power supply 132; High pressure distribution device

133; Wire 141; High voltage transformer

142; Choke coil 143; Insulation oil

144; High pressure distribution device vessel 145; DC rectifier

146; Capacitor 151; Insulator containers

152; Reactor electrode 153; Metal plate to fix the tubular electrode

154; Reactor plasma 155; Power supply

165; Coplanar counter electrode 168; Gas jet hole

185; Counter electrode 189; Plate-shaped electrode

191: other gas inlet tube 192: another gas container

193: working gas chamber 194: other gas chamber

195: other gas delivery tube 196: other gas blowing hole

197: other gas zone 198: working gas blowing hole

D1: inner diameter of tubular electrode

D2: Open hole diameter of insulator electrode cap

D3: inner diameter of lens electrode

A: Inner side of insulator electrode cap

L1: Distance from the end of the tubular electrode to the position of the smallest open hole of the electrode cap

L2: Exposed electrode length inside the tubular electrode

L3: Distance from the end of the tubular electrode to the lens and the erasing electrode

L4: thickness of lens and erase electrode

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the case where it is determined that the gist of the present invention may be unnecessarily obscured, detailed description thereof will be omitted.

Figures 1a to 1c is a basic view of the plasma generating apparatus by the tubular electrode according to the present invention, Figure 1a is a side cross-sectional view of the plasma generating apparatus by the tubular electrode, Figure 1b is a part of the head portion of the plasma generating apparatus by the tubular electrode Fig. 1C is a bottom view of the plasma generator with the tubular electrode.

As shown in FIG. 1A, the plasma generating apparatus according to the present invention includes a gas container 11, a gas injection tube 12, a tubular electrode 13, an insulator electrode cap 14 having a small hole, and a lower side of a specimen. It consists of a counter electrode 15 to be installed or formed and a specimen 16 to be surface treated or coded. When the working gas is injected through the gas injection tube 12 and sprayed on the specimen 16 through the tubular electrode 13, when an alternating current or direct current voltage is applied to the tubular electrode 13 and the counter electrode 15. It is a structure which generates the high density plasma 17. As shown in FIG. In this case, as the working gas, various gases such as argon, helium, air, nitrogen, oxygen, water vapor, methane, acetylene, metal organisms, and fluorine-based gas may be used. In addition, the pressure of the gas is to be used within the range of 10-5 ~ 1520 Torr. As the material of the tubular electrode, an electrically conductive material or compound such as metal, carbon, indium tin oxide (ITO), titanium nitride (TiN), titanium carbon (TiC), titanium boron (TiB2), or the like may be used. Especially when oxidant gas is used, tubular electrodes of electrically conductive compounds are used.

In addition, as shown in FIGS. 1B and 1C, the tubular electrodes are diagonally staggered so that the plasma generated from the tubular electrodes can be uniformly processed on the specimen. However, the tubular electrode may be arranged in various ways depending on the size of the specimen and the deposition site of the plasma.

The tubular electrode according to the present invention can, firstly, lower the breakdown voltage than the electrode in the form of a plate by a high density non-uniform electric field formed at the end of the tube. That is, the driving voltage can be lowered. Secondly, since the plasma is generated inside the tubular electrode, the plasma can be spread by the electric field formed around the tube. Thirdly, energy loss caused by dielectrics can be reduced. Dielectrics attached to the conventional ordinary plate-like electrodes exist to control the current and to obtain a uniform plasma. The problem is that a large amount of plasma energy is lost in the dielectric, and the plasma density is dependent on the dielectric capacitance of the dielectric and thus a strong plasma. Couldn't get it. Fourth, when an alternating current or direct current is applied to the tubular electrode and the counter electrode, a plasma is formed between the tubular electrode and the specimen. The working gas is injected through the tubular electrode, that is, a neutral gas having high ions, electrons, and energy in the plasma. (Hereinafter referred to as "active gas") is injected onto the specimen surface. In particular, the average lifetime of the high-energy neutral gas is longer than that of ions, and the breakdown voltage of the region in which the active gas is present is lower than that of the surroundings, thereby forming a discharge in the shape of the region in which the active gas is present. That is, a low driving voltage can be secured. The injection of the working gas causes the active gas to be mainly present on the surface of the specimen, so that plasma is formed at the surface of the specimen, thereby reducing the generation of plasma in an unnecessary space, thereby improving efficiency and obtaining a uniform plasma.

2A to 2D are detailed views of various types of tubular electrodes and insulator electrode caps according to the present invention, and FIG. 2A is a tubular electrode only, and FIG. 2B is a tubular electrode and an insulator electrode cap. FIG. 2D illustrates a case where an insulator tube is configured inside the electrode in the electrode and the insulator electrode cap, and FIG. 2D shows a case where the insulator tube is configured inside the electrode in the tubular electrode and the insulator electrode cap, and the lens and the erase electrode are formed on the insulator electrode cap.

Fig. 2A uses only the tubular electrode 13 and is very simple in structure. This structure is very useful for processing electrically nonconductive specimens and uses alternating voltage. In addition, the use of non-conductive specimens can ensure plasma uniformity. On the surface of the non-conductive specimen, the plasma spreads itself uniformly by the magnetic repulsion between the charges.

2B is a structure in which the insulator electrode cap 14 is attached to the end of the tubular electrode 13. In this structure, both conductive and non-conductive specimens can be treated, but in the case of conductive specimens, plasma uniformity is relatively reduced.

FIG. 2C is a structure in which a predetermined insulator tube 14b is inserted into the tubular electrode 13, thereby suppressing generation of plasma that is concentrated at the center thereof, thereby making the specimen surface uniform to some extent.

FIG. 2D shows that the lens and the erasing electrode 13b are additionally installed under the insulator electrode cap, and the plasma is deposited on the specimen and the density of the plasma emitted by controlling the current by adjusting the voltage applied to the lens and the erasing electrode. Ensures uniformity.

In the present invention, as in the case of Fig. 2b to 2d, a predetermined insulator electrode cap is provided on the lower side of the tubular electrode, the important function of the insulator electrode cap is as follows.

The first is the ability to control the current so that it can be operated at the desired current density depending on the geometry. For example, in the case of a conductive specimen, an AC barrier type using a dielectric developed by T. Yokoyama et al. To control the current, but Yu. There is no need to use dielectric or resistors as in the resistor type developed by S. Akishev et al. In addition, the Perforated Dielectric or Capillary types developed by Erich E. Kunhardt et al., Although some current control is possible, are not complete, and there must be a separate device for controlling the current with the dielectric or resistor. . If the diameter of the perforated dielectric or the tubular tube is less than the mean free path length of the electron, plasma cannot be formed inside the tubular tube, which is the same as the conventional dielectric barrier type AC barrier type. If the path length is greater than the free path, the plasma is transferred to an arc and the plasma in other areas is not generated, making it difficult to use. However, the insulator electrode cap of the present invention can safely control the current.

The second is that the diameter D2 of the open hole of the insulator electrode cap is smaller than the inner diameter D1 of the tubular electrode, as shown in FIG. 2B, thereby allowing the formation of a more uniform plasma by controlling the propagation of electrons or ions occurring at the end of the tubular electrode. If conductive specimens are used and there is no insulator electrode cap (structure of FIG. 2A), plasma is mainly generated at the end of the tubular electrode, which is not useful because a plasma in very non-uniform fibrous mode is formed.

Third, in the small open hole of the insulator electrode cap, the plasma density is very high and the plasma itself diffuses toward the lower density with self repulsion by the potential of the plasma itself. That is, since the plasma is spread out of the insulator electrode cap, it is possible to ensure a uniform plasma in the specimen.

Fourth, the small hole in the insulator electrode cap saves working gas.

The principle of controlling the current by the insulator electrode cap is as follows. One is the self control function of the current. The principle will be described with reference to the explanatory diagrams and graphs of FIGS. 3A to 3F and FIGS. 4A and 4B in the case of the configuration of FIG.

3A to 3F are explanatory views of self control of current by the insulator electrode cap when AC power is applied in the configuration of FIG. 2C, and FIGS. 4A and 4B are respective states of FIGS. 3A to 3F. Is a diagram showing the positions of the corresponding AC power supplies in equilibrium.

For example, in FIG. 3A, if the tubular electrode is the cathode, electrons are emitted from the tubular electrode at the beginning of plasma generation to start generating plasma. As it progresses to an increasingly strong discharge (a state in FIGS. 4A and 4B), electrons gradually accumulate on the surface of the inner surface A (shown in FIG. 2B) of the insulator electrode cap by the electric field, as in FIG. The electric field is gradually dissipated between the inner surface A of the insulator electrode cap 14, and when a certain moment is reached, the plasma is stopped (b state of FIGS. 4A and 4B). In other words, the charge is accumulated on the inner surface A of the insulator electrode cap 14 in proportion to the increase in the plasma density, thereby self-controlling the plasma transition to the arc. As shown in FIG. 3C, when the tube electrode is changed to the anode and the counter electrode is changed to the cathode, electrons accumulated on the surface of the inner surface A of the insulator electrode cap 14 are discharged to the tube electrode and the accumulated electrons are erased (see FIGS. 4A and 4B). c state), and then plasma proceeds between the counter electrode and the tube electrode as shown in FIG. 3d (d state in FIGS. 4a and 4b), and as the density of the plasma increases, the surface of the inner surface A of the insulator electrode cap 14 is increased. As the positive charge ions gradually accumulate as shown in Fig. 3E, the electric field with the positive electrode of the tube is dissipated, the plasma is stopped (e state in Figs. 4A and 4B). When changed to the positive electrode, positively charged ions accumulated on the surface of the inner surface A of the insulator electrode cap 14 discharge with the tube electrode of the negative electrode to be erased (f state in FIGS. 4A and 4B). As described above, the processes a to f of FIGS. 4A and 4B are continuously repeated. An important factor in determining the amount of current by controlling the current is the surface area of the inner surface A of the insulator electrode cap 14 and its geometric structure.

5A to 5D illustrate the self control of the current in the insulator electrode cap 14 by the pulsed erase power supply when DC power is applied to the tubular electrode and the counter electrode in the configuration of FIG. 2D. . 6 is a view showing the position in the waveform of the erase power corresponding to each state of FIGS. 5A to 5D, wherein Vt is a DC voltage applied to the tubular electrode and Ve is a pulse applied to the lens and the erase electrode. Type voltage. 5A corresponds to a in FIG. 6, FIG. 5B corresponds to b in FIG. 6, FIG. 5C corresponds to c in FIG. 6, and FIG. 5D corresponds to d in FIG. 6. In this case, the principle of controlling the current is as follows.

In FIG. 5A, as the plasma is generated and the density gradually increases, ions gradually accumulate on the inner surface A of the insulator electrode cap 14 by the lens and the erasing electrode 13b. At this time, the lens and the erasing electrode act as a lens to the plasma to spread the plasma and at the same time to accumulate ions. This state corresponds to process a in FIG. 6.

Thereafter, when ions are sufficiently accumulated on the inner surface A of the insulator electrode cap 14, the electric field is weakened inside the tubular electrode 13, and the plasma is stopped as shown in FIG. 5B. That is, the plasma is stopped before it transitions to an arc of overcurrent. This state is process b in FIG. When a pulse voltage is applied to the lens and the erasing electrode 13b as shown in FIG. 6C, ions accumulated on the inner surface A of the insulator electrode cap 14 are discharged from the tubular electrode 13 as shown in FIG. 5C, and the inside of the insulator electrode cap is discharged. Ions accumulated on surface A are erased. The lens and the erasing electrode 13b at this time function as erasing. In the d position in FIG. 6, only a few ions are left on the inner surface A of the insulator electrode cap 14 as shown in FIG. 5D. When the voltage of the lens and the erasing electrode 13b drops to the a state in FIG. 6 again, discharge is started as in FIG. 5A. As described above, as the pulse is applied to the lens and the erasing electrode 13b, the processes a to d of FIG. 6 are repeated. An important factor for determining the amount of current here is the surface area of the inner surface A of the insulator electrode cap 14 and its geometric structure, and the current can be controlled by adjusting the voltages of the lens and the erasing electrode 13b.

Another principle of controlling the current is to control the current by adjusting the size of the diameter D2 of the opened hole of the insulator electrode cap 14 shown in FIG. 2B, for example. If the end of the open hole of the insulator electrode cap 14 in Fig. 2b, that is, the length of (L3-L1) in Fig. 10A is zero or less than the mean free path length of the electron, the diameter D2 of the open hole is the mean free path of the electron. Even if it is smaller than the length, electrons or ions can flow and plasma can be continuously formed. In the plasma formation, if a constant potential is applied to the tubular electrode and the counter electrode, the average speed of the electrons or ions is constant by the constant electric field. The plasma itself is always potential, and the plasma diffuses by the self repulsion of the plasma, so that the density of the plasma present within the limited small open pore area becomes finite. In other words, the finite density and constant speed of the plasma mean a constant current, that is, the current of the plasma can be controlled by adjusting the diameter of the open hole of the insulator electrode cap 14. In particular, such a small hole size can save working gas.

As mentioned above, the role of the insulator electrode cap 14 is very important. Since the mean free path of electrons is different according to the pressure and gas type of the working environment, the diameter D2 of the open hole of the insulator electrode cap is generally 0.005-50 mm when it is vacuumed from normal pressure.

FIG. 7 is a diagram illustrating a plasma distribution by computer simulation in the electrode form of FIG. 2B according to the present invention, and FIG. 8 is a diagram showing a distribution diagram of plasma by computer simulation in the electrode form of FIG. 2C according to the present invention. FIG. 9 is a diagram illustrating a plasma distribution by computer simulation in the form of the electrode of FIG. 2D according to the present invention. FIG.

As shown in the computer simulation of FIG. 7, when the non-conductive conductive specimen 15 is used, as shown in FIG. 2B, only the insulator electrode cap 14 has a difficulty in securing plasma uniformity. As shown in Fig. 7, it can be seen that the density of the plasma 17 is high in the center.

In order to improve the above point, as shown in FIG. 2C, the insulator tube 14b is inserted into the tubular electrode 13 to suppress the generation of plasma concentrated at the center, thereby providing uniformity of the plasma on the specimen surface. When the insulator tube 14b was inserted, it was shown in FIG. 8 by computer simulation. It is shown that a uniform plasma 17 also occurs in the conductive specimen 15. The exposed electrode length L2 inside the tubular electrode 13 is very important to obtain a uniform plasma. The L2 length can ensure a uniform plasma in a region within 0.8 to 1.4 times the tubular electrode inner diameter D1.

In addition, in FIG. 2D, the lens and the erasing electrode 13b are formed or installed on the insulator electrode cap 14 in FIG. 2C. The importance of the lens and erase electrode 13b is that, first, as described above, the current of the plasma can be adjusted by adjusting the lens and the erase voltage. Second, the electric field may be modified by the lens and the erasing electrode 13b to spread the plasma to obtain a uniform plasma, or conversely, to concentrate the plasma in a small area. Third, a strong electric field may be induced between the tubular electrode 13 and the lens electrode 13b to lower the driving voltage and the sustain voltage. FIG. 9 shows that the plasma 17 is more diffused by the lens and the erasing electrode 13b by computer simulation than in the case of the plasma of FIG. 8. It can be seen that the electric field between the tubular electrode 13 and the lens and the erasing electrode 13b is also formed more densely than in the case of FIG. 8. In FIG. 2D, L3 is the distance from the end of the tubular electrode 13 to the lens and erase electrode 13b, L4 is the thickness of the lens and erase electrode 13b, and D3 is the inner diameter of the lens and erase electrode 13b. Indicates. The degree of diffusion of the plasma is related to L3, L4, D3, and the size of D3 should always be larger than the open hole diameter D2 of the insulator electrode cap 14.

10A to 10J illustrate cross-sectional views of various structures of the insulator electrode cap 14. As mentioned above, the geometry of the insulator electrode cap can determine the amount of current to control the plasma density and uniformity. In FIGS. 10A to 10J, when the length of L3-L1 is large, plasma does not spread much and energy loss increases. Accordingly, in the case of FIG. 10J, the plasma converses.

10A and 10B, one end 203, 213 is formed from the tubular electrode insertion holes 201 and 211 of the insulator electrode caps 200 and 210 to the holes 202 and 212 through which plasma is emitted. It is.

In the case of FIG. 10A, the tubular electrode insertion hole 201 is formed to be inclined at a predetermined angle from the beginning of the inner circumferential surface of the hole 202.

In addition, FIG. 10B has a structure in which the block 214 is formed horizontally in the tubular electrode insertion hole 211 without having an inclined surface, and then 213 is formed to have a predetermined inclined surface to the hole 212 through which the plasma is emitted.

In the case of FIGS. 10C and 10D, two ends are formed from the tubular electrode insertion holes 221 and 231 of the insulator electrode caps 220 and 230 to the holes 222 and 232 through which plasma is emitted.

In the case of FIG. 10C, after the first end 223 is formed horizontally without the inclined surface at the tubular electrode insertion hole 221, the second end 224 is formed to have a predetermined inclined surface to the hole 222 through which the plasma is emitted. It has a structure.

In addition, FIG. 10D illustrates that both the first and second ends 233 and 234 are formed horizontally without having an inclined surface. Of course, both FIGS. 10C and 10D are formed such that the holes 222 and 232 through which the plasma is discharged have a predetermined depth L3-L1.

10E, the insulator electrode cap 240 of FIG. 10E is formed to have one horizontal end 243 formed to extend directly from the tubular electrode insertion hole 241 to the hole 242 through which the plasma is emitted. In this case, L1 becomes the depth of the hole 242 from which the plasma of the insulator electrode cap 240 is discharged.

10F and 10G have one end 253, 263 inside the tubular electrode insertion holes 251, 261 of the insulator electrode caps 250, 260, and the lower side forms a predetermined conical groove 254, 264. The conical grooves 254 and 264 have a diameter smaller than that of the insulator electrode caps 250 and 260.

In the case of 10f, since the end portion 253 of the tubular electrode insertion hole 251 and the end portion of the conical groove 254 are formed to meet at one point, they are formed so that there is no depth of the hole 252 where the plasma is emitted. In this case, L3-L1 is the depth to the hole through which the plasma of the conical groove is discharged.

In the case of FIG. 10G, since the portion where the conical groove 264 ends and the portion where the end 263 formed inside the insulator electrode cap 260 ends does not meet, the hole 262 where the plasma is emitted is somewhat deep. It is formed to have.

10H is formed in a conical shape in which the lower portion of the insulator electrode cap 270 protrudes, and the inner end 273 is formed in a corresponding direction even if the angle is not equal to the protruding conical portion.

10I is formed so that the diameter of the tubular electrode insertion hole 281 of the insulator electrode cap 280 and the hole 282 through which the plasma is discharged coincide with each other.

FIG. 10J shows that a step is not formed and the diameter of the hole 292 through which plasma is emitted is larger than that of the tubular electrode insertion hole 291 of the insulator electrode cap 290. The cross section of the hole 292 is formed in the conical groove. It was to have a shape.

11A and 11B are diagrams illustrating an integrated insulator electrode cap type plasma generator according to another embodiment of the present invention. FIG. 11A is a side cross-sectional view of the integrated insulator electrode cap type plasma generator. Side view of an integrated insulator electrode cap type plasma generator.

11A shows that the insulator electrode cap 114 forms at least one or more holes D2 therein in one piece, and the structure of the holes may be formed in various structures as in FIGS. 10A to 10J. FIG. 11B is a view illustrating a lens and erase electrode 13b and an insulator plate 111b for fixing thereto in FIG. 11A.

12A and 12B illustrate a plasma generator in a state in which an integrated insulator electrode cap is applied to a hole-shaped plate electrode according to still another embodiment of the present invention, and FIG. 12A illustrates an integrated insulator electrode in a plate-shaped electrode with holes. Fig. 12B is a cross sectional view of the side surface of the plasma generator of the insulator electrode cap type integral with the plate-shaped electrode having a hole with the lens and the erasing electrode.

12A shows at least one hole in the plate-shaped electrode 123 instead of the tubular electrode described above, and the plate-shaped insulator electrode cap 124 is assembled therein. This structure is easy to manufacture, but there is energy loss in AC power, which is advantageous when using DC power. 12B is a structure in which a lens and an erasing electrode 13b are added in FIG. 12A, and the insulator plate 121b is for fixing the lens and the erasing electrode 13b.

13A and 13B are diagrams of an individual voltage-applied tube-type plasma generating apparatus according to still another embodiment of the present invention, and FIG. 13A is a cross-sectional view of an individual voltage-applied tube-type plasma generating apparatus, and FIG. 13B is an individual voltage-applied tube type. It is a three-dimensional view of the head part of a plasma generating apparatus.

As shown in FIGS. 13A and 13B, when power is supplied from the AC power supply 131, the high-pressure distribution device 132 generates high-voltage individual power, and each of the tube electrodes 13 through each wire 133. Each type is to supply high voltage power individually. A feature of this structure is that it can electrically control the plasma current regardless of the shape of the insulator electrode cap. Details of the circuit configuration of the high pressure distribution device 132 are shown in Figs. 14A and 14B. When AC power is supplied from the AC power supply 131, the high voltage transformer 141 generates high pressure AC, and the high voltage passes through the choke coil 142 to control the plasma current. 14A and 14B, reference numeral 143 denotes insulating oil, and 144 denotes a high pressure distribution device container. In FIG. 14A, the current drawn through the choke coil 142 is converted into DC high voltage through the DC rectifier 145 and the capacitor 146 and supplied to each tube electrode 13. In FIG. 14B, a high-pressure alternating current power source from each choke coil 142 is directly connected to each tube electrode 13.

FIG. 15 is a cross-sectional view of a side surface of a plasma generating apparatus by a tubular electrode having a plasma reactor according to another embodiment of the present invention, which is generated inside the insulator container 151 when a working gas enters through the gas injection tube 12. The first reaction furnace is chemically reacted or activated by the plasma 154, and is sprayed together with the plasma 17 to the surface of the specimen 16 through the tubular electrode 13. Used to modify or deposit specimen surfaces. Reactor electrode 152 is immersed in insulator container 151. Here, reference numeral 153 denotes a metal plate for fixing the tubular electrode, and 155 denotes a power supply device.

16A and 16B are diagrams illustrating an integrated insulator electrode cap type plasma generator having a coplanar electrode structure according to still another embodiment of the present invention, and FIG. 16A is a unitary insulator electrode cap exposing a coplanar counter electrode. 16B is a cross-sectional view of the side surface of the plasma generator of an integral insulator electrode type in which a coplanar counter electrode is submerged in a dielectric.

16A is a structure in which the counter electrode 165 disposed in the same planar shape is exposed. Even if the specimen 16 is a non-conductive material, a strong plasma may be formed thereon. That is, in the counter electrode structure as shown in FIG. 11, if the specimen 16 is a non-conductive material, the plasma current is controlled by the dielectric constant and thickness of the material so that the plasma state is dependent on the material and generally a strong plasma is obtained. Can't. However, in the coplanar structure of the electrode as shown in FIG. 16A, a strong constant plasma can be secured regardless of the material state of the specimen 16. FIG. 16B is a structure in which the coplanar counter electrode 165 is immersed in the dielectric, which is weaker than the plasma density of FIG. 16B, but has an advantage of securing a more uniform plasma.

17A and 17B are cross-sectional views of a side surface of an integrated insulator electrode cap type plasma generating apparatus having a lens and an erasing electrode in a coplanar counter electrode structure according to still another embodiment of the present invention. Side view of the plasma generator of the integral insulator electrode cap type with a lens and an erasing electrode in an integrated structure, and FIG. 17B is an integral insulator electrode cap type with a lens and an erasing electrode in a structure in which a coplanar counter electrode is locked in a dielectric. It is sectional drawing of the plasma generation apparatus side of the. In the case of FIG. 17A, the lens and the erasing electrode 13b may be used to operate the driving power source by DC, and the plasma and the erasing electrode 13b may be used to obtain a more uniform plasma than the apparatus of FIG. 16. In the case of FIG. 17B, the plasma density is weaker than that of FIG. 17A, but a more uniform plasma may be secured.

18A and 18B are diagrams of a plasma generator having a coplanar electrode structure having a gas outlet, FIG. 18A is a cross-sectional view of a plasma generator having a counter electrode exposed, and FIG. 18B is a type in which a counter electrode is immersed inside a dielectric. It is sectional drawing of the plasma generation apparatus side of the. The structure of FIG. 18A can form a strong plasma by the exposed counter electrode 185 and suppresses plasma formation in an unnecessary space by forming a plasma only on the surface of the processing specimen by the gas ejected from the gas ejection opening 168. The efficiency can be increased and a uniform plasma can be obtained. FIG. 18B is a structure in which a plasma density is lower than that of FIG. 18A, but a more uniform plasma is obtained. In particular, even when an oxidant gas such as oxygen is used, damage is not applied to the electrodes 185 and 189 immersed in the dielectric.

19A to 19C are diagrams of a plasma generation apparatus of a type 2 gas use according to still another embodiment of the present invention, and FIG. 19A is a plasma generation of an integral insulator electrode cap type in which a coplanar counter electrode of type 2 gas is exposed. Fig. 19B is a side cross-sectional view of a plasma generator of an integral insulator electrode cap type having a lens and an erasing electrode in a structure in which a coplanar counter electrode of two types of gas is exposed, and FIG. 19C is a type of two gases. A cross-sectional side view of a plasma generator of a type in which a counter electrode of is exposed.

FIG. 19A is a structure in which another gas chamber 194 and another gas delivery tube 195 are added in FIG. 16A, and FIGS. 19B and 19C have different gas structures as in FIGS. 19A and 18A in FIG. 19A. Added structure.

19A and 19B, the working gas is injected through the gas injection tube 12, filled into the working gas chamber 193 with the working gas, and injected through the tubular electrode 13 onto the specimen surface. At the same time, another gas is also injected into the other gas chamber 194 through the other gas injection tube 191 and is ejected onto the specimen 16 from the other gas blowing hole 196 through the other gas delivery tube 195. Here, select a gas whose breakdown voltage of the working gas is lower than that of the other gases.

Breakdown voltage of working gas 〈Other Make breakdown voltage of gas.

When a voltage higher than the breakdown voltage of the working gas and lower than the breakdown voltage of another gas is applied between the tubular electrode 13 and the coplanar counter electrode 165, the plasma is not generated in the other gas region 197 having a high breakdown voltage. Plasma can only be formed on the surface of the specimen in which working gas with a low breakdown voltage is present. That is, the thickness of the plasma can be adjusted by adjusting the injection speed of the working gas and other gases. It is a structure that maximizes energy efficiency by generating plasma in the smallest space necessary. Also in FIG. 19C, the working gas is injected through the working gas ejection hole 198 formed through the counter electrode 185, and the operating principle and characteristics thereof are the same as described above.

Meanwhile, although various embodiments have been described in the detailed description of the present invention, it will be apparent to those skilled in the art that various modifications may be made without departing from the scope of the present invention.

Plasma generator according to the present invention is capable of self-controlling the current using a tubular electrode and an insulator electrode cap at its end, so that a uniform and high-density plasma is generated on the conductive or non-conductive specimen at low pressure as well as at normal pressure. There is an effect that can be released.

Claims (66)

In the plasma generating apparatus for processing a predetermined specimen, At least one tubular electrode is formed in a gas container to which a gas injection tube for injecting a predetermined working gas is attached, and a counter electrode is disposed at an opposite portion of the tubular electrode to establish plasma between the tubular electrode and the counter electrode. Plasma generator, characterized in that for generating. The plasma generating apparatus of claim 1, further comprising an insulator electrode cap having a predetermined hole through which plasma can be emitted. 3. The plasma generating apparatus of claim 2, wherein the hole through which the plasma of the insulator electrode cap is discharged is larger, equal to, or smaller in diameter than the inner diameter of the tubular electrode. The plasma generating apparatus of claim 1 or 2, wherein an insulator tube having a predetermined length is inserted into the tubular electrode. 5. The plasma generating device of claim 4, wherein the length of the exposed electrode in the tubular electrode is approximately 0.1 to 5 times the inner diameter of the tubular electrode. 3. The plasma generating apparatus of claim 2, wherein a predetermined lens and an erase electrode are further provided on the lower side of the insulator electrode cap. 7. The plasma generating apparatus of claim 6, wherein diameters of the lens and the erase electrode are larger than diameters of holes through which the plasma of the insulator electrode cap is discharged. The plasma generating device of claim 1, wherein the specimen is positioned between the tubular electrode and the counter electrode. The apparatus of claim 1, wherein a predetermined dielectric plate is interposed between the counter electrode and the specimen. The insulated electrode cap of the plate shape is provided on the lower side of the tubular electrode, and each hole corresponding to the tubular electrode of the insulated electrode cap of the plate shape has a predetermined hole through which plasma can be emitted. Plasma generator, characterized in that forming. 11. The plasma generating apparatus of claim 10, wherein the hole through which the plasma of the insulator electrode cap is discharged is equal to or smaller than the inner diameter of the tubular electrode. The apparatus of claim 1, wherein a choke coil is electrically connected to each tubular electrode to control plasma current by the choke coil. The plasma generating apparatus according to claim 1, wherein a reaction plasma is generated in the gas container by further inserting a predetermined reactor electrode in the gas container. The plasma generating apparatus of claim 1, wherein the tubular electrode uses an electrically conductive material such as metal, carbon, ITO, TiN, TiC, TiB2, and the like. The plasma generating apparatus of claim 1, wherein one or more of argon, helium, air, nitrogen, oxygen, water vapor, methane, acetylene, metal organisms, and fluorine-based gas is used as the working gas. The method of claim 1, And the pressure of the working gas is in the range of 10-5 to 1520 Torr. The plasma generating apparatus of claim 1, wherein an inner diameter of the tubular electrode is in a range of about 0.01 to 50 mm. The plasma generating apparatus according to claim 2 or 10, wherein the diameter of the hole through which the plasma of the insulator electrode cap is discharged is in a range of about 0.005 to 50 mm. The plasma generating apparatus according to claim 1 or 10, wherein an alternating current or direct current power of all waveforms is applied to the tubular electrode and the counter electrode. 7. The plasma generating apparatus of claim 6, wherein an alternating current or direct current power such as pulse wave and sine wave is applied to the lens and the erasing electrode. In the plasma generating apparatus for processing a predetermined specimen, A plate-shaped electrode having at least one or more tubular holes is formed in a gas container to which a gas injection tube for injecting a predetermined working gas is attached, and a counter electrode is disposed at a portion opposite to the plate-shaped electrode. And generating a plasma between the electrode and the counter electrode. The method of claim 21, A plate-shaped insulator electrode cap is installed between the plate-shaped electrode and the counter electrode, and a plasma can be emitted at each position corresponding to the tubular hole of the plate-shaped electrode of the plate-shaped insulator electrode cap. Plasma generating device characterized in that it has a hole. 23. The plasma generating apparatus of claim 22, wherein the hole in which the plasma of the insulator electrode cap is discharged is formed to be smaller than the diameter of the tubular hole formed in the plate-shaped electrode. 23. The plasma generating apparatus according to claim 21 or 22, wherein an insulator tube having a predetermined length is inserted into the tubular hole of the plate-shaped electrode. 25. The plasma generating apparatus of claim 24, wherein the length of the electrode exposed in the tubular hole of the plate-shaped electrode is in a range of 0.1 to 5 times the inner diameter of the tubular hole. 23. The plasma generating apparatus of claim 22, wherein a predetermined lens and an erasing electrode are further interposed between the plate-shaped insulator electrode cap and the counter electrode. 27. The plasma generating apparatus of claim 26, wherein the diameter of the lens and the erasing electrode is larger than the diameter of the hole through which the plasma of the plate-shaped insulator electrode cap is discharged. 22. The plasma generating apparatus according to claim 21, wherein a reaction plasma is generated in the gas container by further inserting a predetermined reactor electrode in the gas container. The plasma generating apparatus of claim 21, wherein the plate-shaped electrode having a tubular hole uses an electrically conductive material such as metal, carbon, ITO, TiN, TiC, TiB2, and the like. 22. The plasma generating apparatus of claim 21, wherein the working gas uses one or more of argon, helium, air, nitrogen, oxygen, water vapor, methane, acetylene, metal organisms, and fluorine-based gas. 31. The apparatus of claim 30, wherein the pressure of the working gas is in the range of 10-5 to 1520 Torr. 22. The plasma generating apparatus of claim 21, wherein an inner diameter of the tubular hole of the plate-shaped electrode is in a range of about 0.01 to 50 mm. 23. The plasma generating apparatus of claim 22, wherein a diameter of a hole for emitting plasma of the plate-shaped insulator electrode cap is in a range of 0.005 to 50 mm. 22. The plasma generating apparatus of claim 21, wherein an alternating current or direct current power of all waveforms is applied to the plate-shaped electrode and the counter electrode. 27. The plasma generating apparatus of claim 26, wherein an alternating current or direct current power such as pulse wave and sine wave is applied to the lens and the erasing electrode. In the plasma generating apparatus for processing a predetermined specimen, At least one side of the gas container with a gas inlet tube for injecting a predetermined working gas consists of a dielectric plate, inserting at least one tubular electrode on the dielectric plate, and a counter electrode on the dielectric plate between the tubular electrodes. And forming at least one gas outlet on the dielectric plate between the tubular electrode and the counter electrode. 37. The plasma generating apparatus of claim 36, wherein a predetermined hole for emitting plasma is formed on the dielectric plate corresponding to the tubular electrode, and has a diameter smaller than the inner diameter of the tubular electrode. 37. The apparatus of claim 36, wherein an insulator tube of a predetermined length is inserted into the tubular electrode. 37. The plasma generating device of claim 36, wherein a predetermined lens and an erasing electrode are further provided between the tubular electrode and the specimen. 40. The plasma generating device according to any one of claims 36 to 39, wherein the counter electrode is provided to be immersed in the dielectric plate. 41. The plasma generating device of claim 36, wherein the specimen is positioned in front of the tubular electrode and the counter electrode. 37. The plasma generating device of claim 36, wherein an inner diameter of the tubular electrode is in a range of about 0.01 to 50 mm. 38. The plasma generating device of claim 37, wherein a diameter of a hole for emitting plasma on the dielectric plate is in a range of about 0.005 to 50 mm. 37. The plasma generating apparatus of claim 36, wherein the tubular electrode and the counter electrode use an electrically conductive material such as metal, carbon, ITO, TiN, TiC, TiB2, and the like. 37. The plasma generating apparatus of claim 36, wherein the working gas uses one or more of argon, helium, air, nitrogen, oxygen, water vapor, methane, acetylene, metal organisms, and fluorine-based gas. 46. The apparatus of claim 45, wherein the pressure of the working gas is in the range of 10-5 to 1520 Torr. 37. The plasma generating apparatus of claim 36, wherein an alternating current or direct current power of all waveforms is applied to the tubular electrode and the counter electrode. 40. The plasma generating apparatus of claim 39, wherein an alternating current or direct current power such as a pulse wave and a sine wave is applied to the lens and the erasing electrode. In the plasma generating apparatus for processing a predetermined specimen, At least one side of the gas container with a gas inlet tube for injecting a predetermined working gas is composed of a dielectric plate, and at least one plate-shaped electrode is immersed in the dielectric plate and placed on a dielectric plate between the plate-shaped electrodes. And a counter electrode, and forming at least one gas outlet on a dielectric plate between the plate-shaped electrode and the counter electrode. 50. The apparatus of claim 49, wherein the counter electrode is provided to have a coplanar electrode structure coinciding with the surface of the dielectric plate. 50. The plasma generating device of claim 49, wherein the counter electrode is installed to sneak into the dielectric plate. 52. The plasma generating device of any one of claims 49 to 51, wherein the specimen is positioned in front of the plate-shaped electrode and the counter electrode. 50. The apparatus of claim 49, wherein the counter electrode is formed of an electrically conductive material such as metal, carbon, ITO, TiN, TiC, TiB2, and the like. 50. The plasma generating apparatus of claim 49, wherein the working gas uses one or more of argon, helium, air, nitrogen, oxygen, water vapor, methane, acetylene, a metal organism, and a fluorine-based gas. 55. The apparatus of claim 54, wherein the pressure of the working gas is in the range of 10-5 to 1520 Torr. The apparatus of claim 49, wherein an alternating current power of all waveforms is applied to the plate-shaped electrode and the counter electrode. In the plasma generating apparatus for processing a predetermined specimen, Another gas container having another gas inlet tube; A working gas container installed in the other gas container, the working gas container including at least one surface of a dielectric plate, the working gas chamber not mixed with the other gas, and having a working gas injection tube; At least one tubular electrode mounted on the dielectric plate; A counter electrode provided on the dielectric plate between the tubular electrodes; At least one formed on a dielectric plate between the counter electrode and the tubular electrode, the plasma including another gas ejection hole for extending another gas delivery tube for delivering another gas thereon and for emitting another gas; Generating device. 59. The plasma generating apparatus of claim 57, wherein a predetermined hole for plasma emission is formed on the dielectric plate corresponding to the tubular electrode, and has a diameter smaller than the inner diameter of the tubular electrode. 59. The apparatus of claim 57, wherein an insulator tube of a predetermined length is inserted into the tubular electrode. 59. The plasma generating device of claim 57, wherein the counter electrode is provided to have a coplanar electrode structure coinciding with a surface of the dielectric plate. 58. The plasma generating device of claim 57, wherein a predetermined lens and an erasing electrode are further provided between the tubular electrode and the specimen. In the plasma generating apparatus for processing a predetermined specimen, Another gas container having another gas inlet tube; A working gas container installed in the other gas container, the working gas container including at least one surface of a dielectric plate, the working gas chamber not mixed with the other gas, and having a working gas injection tube; At least one plate-like electrode immersed on the dielectric plate; At least one counter electrode disposed on a dielectric plate between the plate electrodes; At least one or more gas ejection holes formed on at least one dielectric plate between the counter electrode and the plate-shaped electrode and extended with another gas delivery pipe for delivering another gas thereon to discharge another gas; And at least one working gas ejection hole formed in the dielectric plate between the counter electrodes. 63. The plasma generating device of claim 62, wherein the counter electrode is provided to have a coplanar electrode structure coinciding with a surface of the dielectric plate. 64. The apparatus of claim 62 or 63, wherein the specimen is positioned in front of the plate-shaped electrode and the counter electrode. 63. The plasma generating device of claim 62, wherein the counter electrode uses an electrically conductive material such as metal, carbon, ITO, TiN, TiC, TiB2, and the like. 63. The plasma generator as set forth in claim 62, wherein an alternating current or pulsed power of all waveforms is applied to the plate-shaped electrode and the counter electrode.