KR20030061589A - A substrate for liquid crystal display - Google Patents
A substrate for liquid crystal display Download PDFInfo
- Publication number
- KR20030061589A KR20030061589A KR1020020002231A KR20020002231A KR20030061589A KR 20030061589 A KR20030061589 A KR 20030061589A KR 1020020002231 A KR1020020002231 A KR 1020020002231A KR 20020002231 A KR20020002231 A KR 20020002231A KR 20030061589 A KR20030061589 A KR 20030061589A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- liquid crystal
- crystal display
- static electricity
- conductive film
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 27
- 239000010408 film Substances 0.000 claims abstract description 20
- 239000010409 thin film Substances 0.000 claims abstract description 15
- 239000004020 conductor Substances 0.000 claims description 3
- 230000005611 electricity Effects 0.000 abstract description 22
- 230000003068 static effect Effects 0.000 abstract description 22
- 238000004519 manufacturing process Methods 0.000 abstract description 18
- 238000007599 discharging Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/22—Antistatic materials or arrangements
Abstract
Description
본 발명은 액정 표시 장치용 기판에 관한 것으로서, 더욱 상세하게는 제조 공정시 발생하는 정전기를 효과적으로 방출시킬 수 있는 액정 표시 장치용 기판에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for a liquid crystal display device, and more particularly, to a substrate for a liquid crystal display device capable of effectively releasing static electricity generated during a manufacturing process.
액정 표시 장치는 현재 가장 널리 사용되고 있는 평판 표시 장치 중 하나로서, 전극이 형성되어 있는 두 장의 기판과 그 사이에 삽입되어 있는 액정층과 두 기판의 바깥쪽에 부착되어 있는 편광판으로 이루어져, 전극에 전압을 인가하여 액정층의 액정 분자들을 재배열시킴으로써 투과되는 빛의 양을 조절하는 표시 장치이다.The liquid crystal display is one of the most widely used flat panel display devices. It consists of two substrates on which electrodes are formed, a liquid crystal layer interposed therebetween, and a polarizing plate attached to the outside of the two substrates. The display device is applied to rearrange the liquid crystal molecules of the liquid crystal layer to control the amount of light transmitted.
이러한 액정 표시 장치는 주사 신호 또는 영상 신호를 전달하기 위한 배선,영상 신호를 제어하기 위한 박막 트랜지스터, 영상 신호가 전달되는 화소 전극 및 적, 녹, 청의 컬러 필터 등이 배치되어 있는 화면 표시부와 외부로부터 전기적인 신호가 전달되는 패드가 형성되어 있는 패드부를 포함한다. 이때, 패드부에는 제조 공정 중에 발생하는 정전기로부터 박막 트랜지스터와 같은 구동 소자가 파괴되는 것을 방지하기 위한 정전기 보호 회로가 형성되어 있다. 이러한 정전기 보호 회로는 박막 트랜지스터를 여러 단자로 연결하거나 기판의 외곽에 금속 배선을 형성하여 화면 표시부로 정전기가 유입되는 것을 방지하는 기능을 가지거나 다수의 배선을 모두 전기적으로 연결하여 정전기를 분산시킴으로써 박막 트랜지스터가 파괴되는 것을 보호하는 기능을 가진다.The liquid crystal display device includes a wiring for transmitting a scan signal or an image signal, a thin film transistor for controlling the image signal, a pixel electrode through which the image signal is transmitted, and a screen display unit on which red, green, and blue color filters are disposed. And a pad part having a pad through which an electrical signal is transmitted. In this case, an electrostatic protection circuit is formed in the pad part to prevent the driving element such as the thin film transistor from being destroyed from static electricity generated during the manufacturing process. Such an electrostatic protection circuit has a function of preventing the inflow of static electricity to the screen display by connecting the thin film transistors to the various terminals or forming the metal wiring on the outside of the substrate, or distributing the static electricity by electrically connecting all the plurality of wirings. It has a function of protecting the transistor from being destroyed.
그러나, 이러한 정전기 보호 회로는 제조 공정시 발생하는 정전기를 기판의 외부로 정전기를 완전히 방출시키는 기능을 가지고 있지 않기 때문에 작은 양의 정전기가 발생하는 경우에는 효과적이지만, 많은 양의 정전기가 발생하는 경우에는 정전기 보호 회로를 통하여 박막 트랜지스터가 파괴되는 것을 방지하는 것이 불가능하다.However, such an electrostatic protection circuit is effective in generating a small amount of static electricity because the static electricity generated in the manufacturing process does not have a function of completely discharging static electricity to the outside of the substrate. It is impossible to prevent the thin film transistor from being destroyed through the static electricity protection circuit.
본 발명이 이루고자 하는 기술적 과제는 제조 공정시 정전기로부터 박막 트랜지스터가 파괴되는 것을 방지하기 위한 액정 표시 장치용 기판을 제공하는 것이다.An object of the present invention is to provide a substrate for a liquid crystal display device for preventing the thin film transistor from being destroyed from static electricity during the manufacturing process.
도 1은 본 발명의 제1 실시예에 따른 액정 표시 장치용 기판의 구조를 도시한 도면이고,1 is a view showing the structure of a substrate for a liquid crystal display device according to a first embodiment of the present invention,
도 2는 본 발명의 제2 실시예에 따른 액정 표시 장치용 기판의 구조를 도시한 도면이다.2 is a diagram illustrating a structure of a substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.
이러한 과제를 해결하기 위하여 본 발명에서는 배선 및 박막 트랜지스터 또는 컬러 필터가 형성되지 않을 면에 정전기가 방출될 수 있는 정전기 방지용 도전막을 형성한다.In order to solve this problem, the present invention forms an antistatic conductive film capable of emitting static electricity on the surface where the wiring and the thin film transistor or the color filter are not formed.
이때, 정전기 방지용 도전막은 기판의 측면까지 연장되어 형성될 수 있으며, 정전기 방지용 도전막은 투명한 도전 물질로 이루어진 것이 바람직하다.At this time, the antistatic conductive film may be formed to extend to the side of the substrate, the antistatic conductive film is preferably made of a transparent conductive material.
그러면, 첨부한 도면을 참고로 하여 본 발명의 실시예에 따른 액정 표시 장치용 기판에 대하여 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 상세히 설명한다.Next, a liquid crystal display substrate according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings so that a person skilled in the art may easily implement the present invention.
도 1은 본 발명의 제1 실시예에 따른 액정 표시 장치용 기판의 구조를 도시한 도면이다.1 is a view showing the structure of a substrate for a liquid crystal display according to a first embodiment of the present invention.
먼저, 도 1에서 보는 바와 같이, 본 발명의 제1 실시예에 따른 액정 표시 장치용 기판에는 제1 면(101) 및 제1 면(101)과 마주하는 제 2면(102)을 포함하는 투명한 절연 기판(100)으로 이루어져 있다. 이때 제1 면(101)에는 제조 공정시 발생하는 정전기를 기판(100)의 외부로 방출시키기 위한 정전기 방지용 도전막(110)이 형성되어 있다.First, as shown in FIG. 1, the liquid crystal display substrate according to the first embodiment of the present invention includes a first surface 101 and a transparent surface including a second surface 102 facing the first surface 101. It consists of an insulating substrate 100. At this time, the first surface 101 is formed with an antistatic conductive film 110 for discharging the static electricity generated during the manufacturing process to the outside of the substrate 100.
이때, 정전기 방지용 도전막(110)은 박막 트랜지스터가 형성되지 않는 제1 면(101)의 상부에 ITO(indium tin oxide) 또는 IZO(indium zinc oxide)와 같은 투명 도전 물질로 형성되어 있으며, 액정 표시 장치용 기판의 제조 공정에서 주사 신호 또는 영상 신호를 전달하기 위한 배선, 영상 신호를 제어하는 박막 트랜지스터 및 영상 신호가 전달되는 화소 전극은 제1 면(101)과 마주하는 제2 면(102)에 형성하기 전에 형성하는 것이 바람직하다.In this case, the antistatic conductive film 110 is formed of a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) on the first surface 101 on which the thin film transistor is not formed, and the liquid crystal display In the process of manufacturing a substrate for an apparatus, wiring for transmitting a scan signal or an image signal, a thin film transistor for controlling the image signal, and a pixel electrode to which the image signal is transmitted are disposed on the second surface 102 facing the first surface 101. It is preferable to form before forming.
한편, 정전기 방지용 도전막(110)은 박막 트랜지스터가 형성되는 면을 제외한 나머지 면에 모두 형성될 수도 있으며, 이에 대하여 도면을 참조하여 설명하기로 한다.Meanwhile, the antistatic conductive film 110 may be formed on all the surfaces except the surface on which the thin film transistor is formed, which will be described with reference to the drawings.
도 2는 본 발명의 제2 실시예에 따른 액정 표시 장치용 기판의 구조를 도시한 도면이다.2 is a diagram illustrating a structure of a substrate for a liquid crystal display according to a second exemplary embodiment of the present invention.
도 2에서 보는 바와 같이, 본 발명의 제2 실시예에 따른 액정 표시 장치용 기판에는 제1 면(101)뿐아니라, 제1 면(101)과 제2 면(102) 사이의 측면(103)에도 정전기 방지용 도전막(120)이 형성되어 있다. 이러한 구조에서는 기판(200)의 측면(103)에도 정전기 방지용 도전막(120)이 형성되어 있어 제조 공정시 발생하는 정전기를 보다 신속하게 방전시킬 수 있다.As shown in FIG. 2, not only the first surface 101 but also the side surface 103 between the first surface 101 and the second surface 102 of the substrate for a liquid crystal display according to the second embodiment of the present invention. An antistatic conductive film 120 is also formed. In this structure, the anti-static conductive film 120 is formed on the side surface 103 of the substrate 200, so that the static electricity generated during the manufacturing process can be discharged more quickly.
이러한 본 발명의 제1 및 제2 실시예에 따른 액정 표시 장치용 기판을 통하여 정전기가 방전되는 경로를 구체적으로 설명하면 다음과 같다,The path of discharge of static electricity through the liquid crystal display substrates according to the first and second embodiments of the present invention will be described in detail as follows.
우선, 본 발명의 제1 및 제2 실시예에 따른 액정 표시 장치용 기판에는 배선 또는 박막 트랜지스터가 형성되지 않을 제1 면(101) 또는 측면(103)에 정전기 방지용 도전막(110, 120)이 형성되어 있어, 액정 표시 장치용 박막 트랜지스터 기판 또는 컬러 필터 기판의 제조 공정 중에 정전기 방지용 도전막(110, 120)은 증착 설비, 식각 설비 등의 액정 표시 장치용 제조 장치의 일부분에 접하게 된다. 그러면, 제조 공정시에 발생하는 정전기가 기판(100)에 유입되었을 때, 정전기는 정전기 방지용 도전막(110, 120)을 통하여 액정 표시 장치용 제조 장치로 빠져나가며, 제조 장치는 외부로 접지되어 있으므로 제조 장치에 유입된 정전기는 완전히 방전되어, 결과적으로 기판 내에는 정전기가 잔류하지 않게 된다.First, in the liquid crystal display substrates according to the first and second embodiments of the present invention, the antistatic conductive films 110 and 120 are formed on the first surface 101 or the side surface 103 on which no wiring or thin film transistor is to be formed. The conductive films 110 and 120 for preventing static electricity are in contact with a portion of a manufacturing apparatus for a liquid crystal display, such as a deposition apparatus and an etching apparatus, during the manufacturing process of a thin film transistor substrate or a color filter substrate for a liquid crystal display. Then, when static electricity generated during the manufacturing process flows into the substrate 100, the static electricity is discharged to the manufacturing apparatus for the liquid crystal display device through the antistatic conductive films 110 and 120, and the manufacturing apparatus is grounded to the outside. The static electricity introduced into the manufacturing apparatus is completely discharged, resulting in no static electricity remaining in the substrate.
이와 같은 본 발명의 실시예에 따른 정전기 방지용 도전막(110, 120)은 전면에 형성되어 있지만 특정한 모양으로 패터닝될 수도 있으며, 그밖에 다른 반도체 장치용 기판의 제조 과정에서 정전기 방지 회로를 대신하는 수단으로 사용될 수 있다.The antistatic conductive films 110 and 120 according to the embodiment of the present invention are formed on the front surface, but may be patterned in a specific shape, and as a means to replace the antistatic circuit in the manufacturing process of other substrates for semiconductor devices. Can be used.
이와 같이 본 발명에서는 박막 트랜지스터 또는 배선 형성 전에 박막 트랜지스터 또는 배선이 형성되지 않은 면에 정전기 방지용 도전막을 형성하여 제조 공정시 정전기 방지용 도전막을 접지되어 있는 제조 설비에 접촉시킴으로써 제조 공정시에 발생하는 정전기를 액정 표시 장치용 기판으로부터 완전히 방전시킬 수 있다.As described above, in the present invention, an antistatic conductive film is formed on the surface where the thin film transistor or the wiring is not formed before the thin film transistor or the wiring is formed, and the static electricity generated during the manufacturing process is contacted with the antistatic conductive film to a grounded manufacturing facility. It can discharge completely from the board | substrate for liquid crystal display devices.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020020002231A KR100848111B1 (en) | 2002-01-15 | 2002-01-15 | A substrate for liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020020002231A KR100848111B1 (en) | 2002-01-15 | 2002-01-15 | A substrate for liquid crystal display |
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| Publication Number | Publication Date |
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| KR20030061589A true KR20030061589A (en) | 2003-07-22 |
| KR100848111B1 KR100848111B1 (en) | 2008-07-24 |
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| KR1020020002231A KR100848111B1 (en) | 2002-01-15 | 2002-01-15 | A substrate for liquid crystal display |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR960014651B1 (en) * | 1993-05-07 | 1996-10-19 | 현대전자산업 주식회사 | Making method of liquid crystal display element |
| US5605446A (en) * | 1994-10-18 | 1997-02-25 | Graco Inc. | High viscosity material pump having valved priming piston |
| KR100250797B1 (en) * | 1996-11-29 | 2000-04-01 | 김영환 | Liquid crystal display element |
| KR20000066090A (en) * | 1999-04-13 | 2000-11-15 | 김영환 | ESD structure in LCD device |
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| KR100848111B1 (en) | 2008-07-24 |
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