KR20030052786A - Method for forming spacer of liquid crystal display - Google Patents

Abstract

PURPOSE: A method for forming spacers of a liquid crystal display is provided to form spacers having uniform size at desired positions. CONSTITUTION: An alignment film(201) is formed on a substrate(200). A mask(204) having a spacer hole pattern is aligned on the mask on which the alignment film is formed. UV rays are irradiated to the alignment film on the substrate through the spacer holes(203) of the mask. A spacer material(206) is filled in the spacer holes of the mask. The spacer material is hardened to form spacers on the substrate. The mask is removed. The spacer material is a liquid photo-acryl.

Description

Spacer formation method of liquid crystal display device {METHOD FOR FORMING SPACER OF LIQUID CRYSTAL DISPLAY}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a spacer of a liquid crystal display, and more particularly, to a liquid crystal display having a uniform cell-gap and suitable for preventing light leakage around the spacer. It relates to a formation method.

In general, a liquid crystal display device displays a desired image by individually supplying data signals according to image information to liquid crystal cells arranged in a matrix form, and adjusting a light transmittance of the liquid crystal cells. to be.

Accordingly, a liquid crystal display device includes: a liquid crystal panel in which liquid crystal cells in pixel units are arranged in a matrix form; A driver integrated circuit (IC) for driving the liquid crystal cells is provided.

The liquid crystal panel includes a color filter substrate and a thin film transistor array substrate facing each other, and a liquid crystal layer filled in a spaced interval between the color filter substrate and the thin film transistor array substrate.

On the thin film transistor array substrate of the liquid crystal panel, a plurality of data lines for transmitting the data signal supplied from the data driver integrated circuit to the liquid crystal cells and a scan signal supplied from the gate driver integrated circuit for the liquid crystal cells are provided. The plurality of gate lines are orthogonal to each other, and liquid crystal cells are defined at each intersection of these data lines and the gate lines.

The gate driver integrated circuit sequentially supplies scan signals to a plurality of gate lines so that the liquid crystal cells arranged in a matrix form are sequentially selected one by one, and the data driver integrated circuit is included in the selected one line of liquid crystal cells. The data signal is supplied from.

Meanwhile, a common electrode and a pixel electrode are formed on opposite inner surfaces of the color filter substrate and the thin film transistor array substrate to apply an electric field to the liquid crystal layer. In this case, the pixel electrode is formed for each liquid crystal cell on the thin film transistor array substrate, while the common electrode is integrally formed on the entire surface of the color filter substrate. Therefore, by controlling the voltage applied to the pixel electrode in a state where a voltage is applied to the common electrode, it is possible to individually control the light transmittance of the liquid crystal cells.

As described above, in order to control the voltage applied to the pixel electrode for each liquid crystal cell, a thin film transistor used as a switching element is formed in each liquid crystal cell.

The components of the liquid crystal display as described above will be described in detail with reference to the accompanying drawings.

First, FIG. 1 is a plan view of a unit pixel of a general liquid crystal display.

Referring to Fig. 1, the gate wirings 4 are arranged in a row at regular intervals on the substrate, and the data wirings 2 are arranged in columns at regular intervals. Therefore, the gate wiring 4 and the data wiring 2 are arranged in matrix form. In this case, the unit liquid crystal cell is defined at each intersection of the data line 2 and the gate line 4, and includes a thin film transistor TFT and a pixel electrode 14.

The gate electrode 10 of the thin film transistor TFT is formed by extending from a predetermined position of the gate line 4, and the source electrode 8 extends from the data line 2, thereby providing the gate electrode 10. And the predetermined area is overlapped.

In addition, a drain electrode 12 is formed at a position corresponding to the source electrode 8 with respect to the gate electrode 10, and the pixel electrode (through the drain contact hole 16 formed on the drain electrode 12). 14 is in electrical contact with the drain electrode 12.

The thin film transistor TFT may include a semiconductor layer for forming a conductive channel between the source electrode 8 and the drain electrode 12 by a scan signal supplied to the gate electrode 10 through the gate line 4. Not shown).

As such, the thin film transistor TFT forms a conductive channel between the source electrode 8 and the drain electrode 12 in response to the scan signal supplied from the gate wiring 4, and thus, the source electrode 8 through the data wiring 2. Is transmitted to the drain electrode 12.

Meanwhile, the pixel electrode 14 connected to the drain electrode 12 through the drain contact hole 16 is formed of a transparent indium tin oxide (ITO) material having high light transmittance. In this case, the pixel electrode 14 generates an electric field in the liquid crystal layer together with a common transparent electrode (not shown) formed on the color filter substrate by a data signal supplied from the drain electrode 12.

When an electric field is applied to the liquid crystal layer as described above, the liquid crystal rotates by dielectric anisotropy and transmits light emitted from the backlight to the color filter substrate through the pixel electrode 14, and the amount of light transmitted is determined by the voltage value of the data signal. Adjusted.

The storage electrode 20 connected to the pixel electrode 14 through the storage contact hole 22 is deposited on the gate wiring 4 to form a storage capacitor 18, and the storage electrode 20 and the gate wiring A gate insulating film (not shown) is deposited between the portions 4 to be deposited during the formation of the thin film transistor TFT.

The storage capacitor 18 as described above is turned off after the voltage value of the scan signal is charged during the turn-on period of the thin film transistor to which the scan signal is applied to the gate wiring 4. The driving of the liquid crystal is maintained by supplying the charged voltage to the pixel electrode 14 during the turn-off period.

FIG. 2 is an exemplary view showing a cross section of a unit pixel cut along the line II ′ of FIG. 1, wherein the color filter substrate 60 is bonded to face the thin film transistor array substrate 50; A spacer (70) spaced apart from the thin film transistor array substrate (50) and the color filter substrate (60); The liquid crystal layer 80 is filled with liquid crystal in a space spaced between the thin film transistor array substrate 50 and the color filter substrate 60.

The manufacturing process of the thin film transistor TFT is described in detail with reference to the exemplary diagram of FIG. 2 as follows.

First, a metal material such as Mo, Al, or Cr is deposited on the thin film transistor array substrate 50 by a sputtering method, and then patterned through a first mask to form a gate electrode 10.

In addition, an insulating material such as SiNx is deposited on the thin film transistor array substrate 50 on which the gate electrode 10 is formed to form a gate insulating film 30.

On the gate insulating layer 30, a semiconductor layer 32 made of amorphous silicon and an ohmic contact layer 34 made of n + amorphous silicon doped with phosphorus (P) in a high concentration are successively formed. Deposition and then patterning through a second mask to form the active layer 36 of the thin film transistor TFT.

In addition, a metal material is deposited on the gate insulating layer 30 and the ohmic contact layer 34, and then patterned through a third mask to form a source electrode 8 and a drain electrode 12 of the TFT. . In this case, the source electrode 8 and the drain electrode 12 are patterned to be spaced apart corresponding to each other on the upper portion of the active layer 36.

Accordingly, the ohmic contact layer 34 over the active layer 36 is exposed, and the ohmic contact layer 34 exposed during the patterning of the source electrode 8 and the drain electrode 12 is removed.

As the ohmic contact layer 34 is removed, the semiconductor layer 32 is exposed, and the exposed semiconductor layer 32 is defined as a channel region of the thin film transistor TFT.

The SiNx material may be formed through a chemical vapor deposition (CVD) method on the gate insulating layer 30 including the exposed semiconductor layer 32 and the source electrode 8, the drain electrode 12, and the like. A passivation film 38 is deposited on the entire surface. At this time, an inorganic material such as SiNx is mainly used as a material of the protective film 38, and in recent years, an organic material having a low dielectric constant such as benzocyclobutene (BCB), spin on glass (SOG) or acryl to improve the opening ratio of the liquid crystal cell Is being used.

A portion of the passivation layer 38 on the drain electrode 12 is selectively etched through a fourth mask to form a drain contact hole 16 exposing a portion of the drain electrode 12.

Then, the transparent electrode material is sputter deposited and deposited on the passivation layer 38, and then patterned through a fifth mask to form a pixel electrode 14, wherein the pixel electrode 14 is drained through the drain contact hole 16. Patterned so as to be connected to the electrode 12.

Finally, as described above, the alignment layer 51 is formed on the entire surface of the resultant in which the thin film transistor TFT is formed, followed by rubbing, and the opposite surface of the glass substrate 1 corresponding to the alignment layer 51. By forming the first polarizing plate 52 in the above, the fabrication of the thin film transistor array substrate 50 is completed. At this time, rubbing refers to a process of determining the initial alignment direction of the liquid crystal by rubbing the cloth with the surface of the alignment layer 51 at a uniform pressure and speed so that the polymer chains on the surface of the alignment layer 51 are aligned in a predetermined direction.

Meanwhile, the manufacturing process of the storage capacitor region will be described in detail with reference to the exemplary diagram of FIG. 2.

First, the gate line 4 is patterned on the thin film transistor array substrate 50, and a gate insulating layer 30 is formed on the gate line 4.

The storage electrode 20 is patterned on the gate insulating layer 30. In this case, the storage electrode 20 is formed during the patterning of the source electrode 8 and the drain electrode 12 of the thin film transistor TFT.

The storage electrode 20 overlaps a portion of the gate line 4 with the gate insulating layer 30 therebetween to function as a storage capacitor 18.

The storage contact hole 22 exposing a portion of the storage electrode 20 by forming a passivation layer 38 on the gate insulating layer 30 on which the storage electrode 20 is formed and then etching a portion of the passivation layer 38. ). In this case, the passivation layer 38 is formed in the process of forming the passivation layer 38 in the TFT region, and the storage contact hole 22 forms the drain contact hole 16 of the TFT. Is formed in the process.

The pixel electrode 14 is patterned on the passivation layer 38, and the pixel electrode 14 is connected to the storage electrode 20 through the storage contact hole 22. In this case, the pixel electrode 14 is formed during the patterning process of the pixel electrode 14 formed in the TFT region.

Meanwhile, the manufacturing process of the color filter substrate 60 will be described in detail with reference to the exemplary view of FIG. 2 as follows.

First, a black matrix 62 is spaced apart at regular intervals on the color filter substrate 60.

In addition, a color filter 63 of red (R), green (G), and blue (B) colors is formed on the glass substrate 61 in which the black matrix 62 is spaced apart from the color filter 63. Is extended to a predetermined area above the black matrix 62.

Then, a metal material is formed on the upper surface of the color filter 63 including the black matrix 62 and then patterned to form a common electrode 64.

Then, the alignment film 65 is formed on the upper surface of the resultant, followed by rubbing, and the second polarizing plate 66 is formed on the opposite surface of the color filter substrate 60 corresponding to the alignment film 65. Production of the filter substrate 60 is completed.

As described above, when fabrication of the thin film transistor array substrate 50 and the color filter substrate 60 is completed, a sealing material (not shown) is printed on the thin film transistor array substrate 50, and the color is printed. The spacer 70 is scattered on the filter substrate 60. In this case, the spacer 70 may be scattered on the thin film transistor array substrate 50 according to the manufacturer's intention, and the sealing material may be printed on the color filter substrate 60.

When the sealing material printing and the spacer 70 are completed, the thin film transistor array substrate 50 and the color filter substrate 60 are bonded to each other.

The bonded thin film transistor array substrate 50 and the color filter substrate 60 are cut into a unit liquid crystal panel. At this time, the step of cutting into a unit liquid crystal panel is required because a plurality of liquid crystal panels are simultaneously formed on a large glass substrate to improve the yield of the liquid crystal display device.

The liquid crystal is injected into the cut unit liquid crystal panel, and the injection hole is sealed, so that the liquid crystal is spaced apart from each other by the alignment layers 51 and 65 of the thin film transistor array substrate 50 and the color filter substrate 60 facing each other. The filled liquid crystal layer 80 is formed. In the manufacturing process of the initial liquid crystal display, liquid crystal was injected into a plurality of liquid crystal panels and then cut into a unit liquid crystal panel. However, as the size of the unit liquid crystal panel increases, it is difficult to control the process for uniform liquid crystal injection. Due to the poor productivity of the product is reduced to cut the unit liquid crystal panel and then the liquid crystal is injected.

Since the unit liquid crystal panel has a fine cell-gap of several micrometers in an area of several hundred cm 2, the vacuum injection method using the pressure difference between the inside and the outside of the unit liquid crystal panel is most commonly used to effectively inject liquid crystal.

The distribution of the spacer 70 during the manufacturing process of the liquid crystal display as described above will be described in detail as follows.

The spacer 70 is used to precisely and uniformly maintain the cell-gap of the thin film transistor array substrate 50 and the color filter substrate 60, and as shown in FIG. 3A, a solvent such as alcohol. It can be divided into a wet dispersion in which the spacer 70 is mixed and sprayed on it, and a dry dispersion in which only the spacer 70 is dispersed through nitrogen (N ₂ ) gas as shown in FIG. 3B. At this time, the spacer 70 scatters particles such as glass beads and plastic beads having a predetermined particle diameter on the thin film transistor array substrate 50 or the color filter substrate 60 with a uniform density.

However, since the spacer 70 formed by the above-described spreading method is randomly scattered on the thin film transistor array substrate 50 or the color filter substrate 60, the spacer 70 exists in the effective pixel portion. In some cases, there is a problem that the image quality of the liquid crystal display device is deteriorated due to the occurrence of light leakage due to the spacer 70 shining or scattering incident light and the alignment of the alignment layer in the area where the spacer 70 is scattered. In a large-area liquid crystal display, due to a phenomenon in which scattered spacers are aggregated together, image quality defects such as galaxy stain are generated.

In view of the problems described above, a method of forming a patterned spacer through photolithography has been proposed.

That is, a photoresist film is applied to a substrate, ultraviolet rays are irradiated through a predetermined mask, and then developed to form a spacer.

Thus, the patterned spacer can selectively form spacers in portions other than the effective pixel portion.

In addition, since the cell gap between the thin film transistor array substrate and the color filter substrate can be adjusted by the thickness of the photoresist film, there is a feature of high accuracy.

Referring to the sequential cross-sectional view of Figures 4a to 4d with the conventional method for forming a patterned spacer as described above in detail as follows.

First, as shown in FIG. 4A, a resist film 101 made of a photosensitive resin material is coated on a substrate 100 by a spin-coating method.

As shown in FIG. 4B, ultraviolet rays are selectively irradiated onto the resist film 101 through a mask 102 in which light transmitting and blocking regions are patterned, and then developed to selectively retain the resist film 101. Let's do it. At this time, the selectively remaining resist film 101 functions as a spacer for maintaining a constant cell gap between the thin film transistor substrate and the color filter substrate of the liquid crystal display.

On the other hand, when the positive type (positive type) in which the ultraviolet irradiation region is selectively removed by the development to the resist film 101 is applied, the area where the spacer of the resist film 101 is to be formed by the mask 102 Should be blocked.

In addition, in the case where a negative type in which the ultraviolet irradiation region remains selectively due to development is applied to the resist film 101, the region where the spacer of the resist film 101 is to be formed is lighted by the mask 102. It must be transparent.

As shown in FIG. 4C, rubbing is performed on the substrate 100 where the resist film 101 remains to have a desired orientation when the liquid crystal is filled.

Thereafter, as shown in FIG. 4D, the resist film 101 remaining on the substrate 100 and serving as a spacer allows a constant cell-gap to be maintained when the other substrate 103 is bonded.

However, in the conventional method of forming a patterned spacer of the liquid crystal display device as described above, since the resist film is applied by the spin-coating method, the material is consumed and the photolithography process for exposing and developing the resist film is complicated. It has become a factor of lowering productivity.

In addition, since the photolithography process for exposing and developing the resist film destroys orientation, a resist film serving as a spacer is first formed on the substrate and then aligned.

However, when the alignment is performed on the substrate on which the resist film is formed as described above, an alignment defect occurs along one side of the resist film due to the step difference of the resist film, resulting in a light leakage phenomenon. there was.

Accordingly, the present invention has been made to solve the above-mentioned conventional problems, and an object of the present invention is to provide a liquid crystal display device having a uniform cell-gap, and to prevent light leakage around a spacer. A method of forming a spacer in an apparatus is provided.

1 is a plan view of a unit pixel of a general liquid crystal display.

FIG. 2 is an exemplary view showing a cross section of a unit pixel cut along the line II ′ of FIG. 1; FIG.

Figure 3a is an exemplary view showing a wet dispersion of the conventional spacer.

Figure 3b is an illustration showing the dry dispersion of the conventional spacer.

4A to 4D are exemplary views showing a conventional method for forming a patterned spacer in a sequential cross section.

5A to 5E are exemplary views showing a spacer forming method of a liquid crystal display according to an exemplary embodiment of the present invention in a sequential cross section.

6 is an exemplary view showing a planar configuration of a mask in FIG.

7 is an exemplary view showing a planar configuration of a color filter substrate on which a spacer is manufactured according to an embodiment of the present invention.

8 is an exemplary view showing a cross-sectional configuration taken along the line II-II 'of FIG.

9A to 9E are exemplary views showing, in sequential cross-section, a spacer forming method of a liquid crystal display according to another exemplary embodiment of the present invention.

*** Explanation of symbols for main parts of drawing ***

203: Spacer hole 204: Mask

According to an aspect of the present invention, there is provided a method of forming a spacer of a liquid crystal display, the method comprising: aligning a mask on which a spacer hole is patterned on a substrate; Filling a spacer material into the spacer hole of the mask; Curing the filled spacer material to form a spacer on a substrate; And removing the mask.

An embodiment of the spacer forming method of the liquid crystal display according to the present invention as described above will be described in detail with reference to the sequential cross-sectional view shown in FIGS. 5A to 5E.

First, as shown in FIG. 5A, the alignment layer 201 is formed on the substrate 200, and then the mask 204 patterned with the spacer holes 203 is aligned. Here, the substrate 200 may be a thin film transistor array substrate or a color filter substrate applied to the liquid crystal display, and the alignment layer 201 is subjected to rubbing to determine the initial alignment of the liquid crystal.

The mask 204 patterned with the spacer hole 203 may apply the mask 204 applied to form a patterned spacer through a conventional photolithography method, and thus, the cost of manufacturing a separate mask Is not added.

As shown in FIG. 5B, ultraviolet rays are irradiated onto the aligned mask 204 to planarize the alignment layer 201 exposed through the spacer hole 203, and further, adhesion to the spacer material 206 to be described later. To improve.

5C, a spacer material 206 is formed on the mask 204 through a spacer material supply 205, and a spacer material is formed in the spacer hole 203 through a spacer filler 207. Fill (206). In this case, the spacer material 206 may apply a liquid photo acryl material, or may include a material containing glass beads or plastic beads in a solvent.

The spacer filler 207 is composed of a rubber roller or a doctor blade to print the spacer material 206 formed on the mask 204 from one side of the mask 204 to the other side. The spacer material 206 is filled in the spacer hole 203.

Meanwhile, the spacer material 206 is formed on the front surface of the mask 204 through the spacer material supply 205, and the spacer material 206 is formed in the spacer hole 203 on the mask 204 through the spacer filler 207. ), The material of the spacer material 206 is wasted, so that the spacer material supply 205 and the spacer filler 207 are paired with each other to minimize the material consumption of the spacer material 206. Can be.

5D, ultraviolet rays are irradiated onto the mask 204 filled with the spacer material 206 in the spacer hole 203 to cure the spacer material 206. In this case, the spacer material 206 decreases in volume while being cured by ultraviolet rays, and thus is fixed on the alignment layer 201, thereby functioning as a spacer for bonding the liquid crystal panel.

The spacer material 206 is preferably cured for a sufficient time so as not to be affected by a subsequent heat treatment process.

Then, the mask 204 is removed as shown in Fig. 5E.

In the mask 204, a spacer hole 203 is patterned at a position where a spacer of the liquid crystal display is to be formed, as shown in the exemplary diagram of FIG.

In the method of forming a spacer of the liquid crystal display according to the exemplary embodiment of the present invention, a spacer material is selectively filled in a patterned spacer hole on a mask and cured to form a spacer to form a spacer having a uniform size at a desired position. It can be formed accurately.

Therefore, the process is simplified compared to the method of forming the patterned spacer through the conventional photolithography process, and the spin-coating of the resist film is not applied, thereby minimizing the consumption of the material.

In addition, the spacer forming method of the liquid crystal display according to the exemplary embodiment of the present invention may form the spacer on the rubbed alignment layer, thereby forming a patterned spacer through a conventional photolithography process and then performing alignment. When implemented, it is possible to prevent the occurrence of orientation defects along one side of the spacer.

As described above, a planar configuration and a cross-sectional configuration of a color filter substrate of a liquid crystal display device having a spacer according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

7 is an exemplary view showing a planar configuration of a color filter substrate on which a spacer is manufactured according to an embodiment of the present invention, and FIG. 8 is an exemplary view showing a cross-sectional configuration taken along a line II-II 'of FIG. 7. .

7 and 8, the black matrix 301 is patterned along the edge of the pixel region of the liquid crystal display on the substrate 300, and the R, G, B color filters 302 are formed on the substrate 300. Are overlapped with the black matrix 301 and are formed for each pixel area of the liquid crystal display.

In addition, a common transparent electrode 303 and an alignment layer 304 are sequentially formed on the upper surface of the R, G, and B color filters 302, and rubbing is performed on the alignment layer 304 to change the initial alignment direction of the liquid crystal. Decide

A spacer 305 is formed on each of the defined positions of the color filter substrate on the alignment layer 304.

Meanwhile, in the method for forming a spacer of the liquid crystal display according to the exemplary embodiment of the present invention, an alignment layer is formed on a thin film transistor array substrate or a color filter substrate, followed by rubbing, and a spacer is formed on the alignment layer. In another embodiment of the present invention, a spacer may be formed on the common transparent electrode of the color filter substrate, which will be described in detail with reference to the sequential cross-sectional view of FIGS. 9A to 9E.

First, as shown in FIG. 9A, the black matrix 401 is uniformly patterned on the substrate 400 along the edge of the pixel region of the liquid crystal display, and then R for each pixel region of the liquid crystal display on the substrate 400. The G, B color filters 402 are formed to overlap the black matrix 401.

As shown in FIG. 9B, a common transparent electrode 403 is formed on the upper surface of the R, G, and B color filters 402, and then the mask 405 in which the spacer hole 404 is patterned is aligned. In this case, the mask 405 in which the spacer hole 404 is patterned may be applied to the mask 405 applied to form the patterned spacer through the conventional photolithography method as in the exemplary embodiment of the present invention. Therefore, the cost of manufacturing a separate mask is not added.

9C, a spacer material 407 is formed on the aligned mask 405 through the spacer material supply 406, and the spacer hole 404 is formed through the spacer filler 408. The spacer material 407 is filled. In this case, the spacer material 407 may apply a liquid photoacrylic material, or a material containing glass beads or plastic beads in a solvent.

The spacer filler 408 is composed of a rubber roller or a doctor blade, and the spacer material 407 formed on the mask 405 is printed from one side of the mask 405 to the other side of the spacer to the spacer hole 404. Allow material 407 to be filled.

Meanwhile, the spacer material 407 is formed on the entire surface of the mask 405 through the spacer material supply 406, and the spacer material 407 is formed in the spacer hole 404 on the mask 405 through the spacer filler 408. ), The material of the spacer material 407 is wasted, so that the spacer material supply 406 and the spacer filler 408 interlock with each other to minimize the material consumption of the spacer material 407. Can be.

As shown in FIG. 9D, ultraviolet rays are irradiated onto the mask 405 filled with the spacer material 407 in the spacer hole 404 to cure the spacer material 407. In this case, the spacer material 407 decreases in volume while being cured by ultraviolet rays and is fixed on the common transparent electrode 403, thereby functioning as a spacer for bonding the liquid crystal panel.

The spacer material 407 is preferably cured for a sufficient time so as not to be affected by a subsequent heat treatment process.

As shown in FIG. 9E, the mask 405 is removed to form a spacer material 407.

Subsequently, an alignment layer is formed on the common transparent electrode 403 on which the spacer material 407 is cured, and alignment is performed to fabricate the color filter substrate of the liquid crystal display.

The spacer forming method of the liquid crystal display according to another exemplary embodiment of the present invention as described above selectively fills a spacer material in a patterned spacer hole on a mask and hardens the spacer material to form a spacer, thereby forming a spacer having a uniform size. It can be formed accurately at the desired position.

Therefore, the process is simplified compared to the method of forming the patterned spacer through the conventional photolithography process, and the spin-coating of the resist film is not applied, thereby minimizing the consumption of the material.

In addition, according to another embodiment of the present invention, a method of forming a spacer of a liquid crystal display includes forming a spacer on an alignment layer by forming a spacer on a common transparent electrode formed on a color filter substrate of the liquid crystal display. In comparison, the UV irradiation step for flattening the alignment layer and improving the adhesion between the alignment layer and the spacer can be omitted.

According to the method of forming a spacer of the liquid crystal display according to the present invention as described above, by filling a spacer material into a patterned spacer hole on a mask and curing the spacer material, the spacer having a uniform size can be accurately positioned at a desired position. It can be formed.

Therefore, the process is simplified compared to a method of forming a patterned spacer through a conventional photolithography process, and since spin-coating of the resist film is not applied, the consumption of materials can be minimized and the productivity can be improved. have.

In addition, the spacer forming method of the liquid crystal display according to the exemplary embodiment of the present invention may form the spacer on the rubbed alignment layer, thereby forming a patterned spacer through a conventional photolithography process and then performing alignment. In this case, an alignment defect may occur along one side of the spacer to prevent light leakage from appearing, thereby improving image quality of the liquid crystal display.

In addition, according to another embodiment of the present invention, a method of forming a spacer of a liquid crystal display includes forming a spacer on an alignment layer by forming a spacer on a common transparent electrode formed on a color filter substrate of the liquid crystal display. In comparison, since the UV irradiation step for flattening the alignment layer and improving the adhesion between the alignment layer and the spacer can be omitted, a spacer having a uniform size can be accurately formed at a desired position through a simpler process.

Claims (10)

Aligning a mask patterned with spacer holes on the substrate; Filling a spacer material into the spacer hole of the mask; Curing the filled spacer material to form a spacer on a substrate; Removing the mask; and forming a spacer of the liquid crystal display. Forming an alignment film on the substrate and performing alignment; Aligning a mask patterned with spacer holes on a substrate on which the alignment layer is formed; Irradiating ultraviolet rays to the alignment layer on the substrate through the spacer hole of the mask; Filling a spacer material into the spacer hole of the mask; Curing the filled spacer material to form a spacer on a substrate; Removing the mask; and forming a spacer of the liquid crystal display. Patterning the black matrix on the substrate along the edge of the pixel region of the liquid crystal display; Forming R, G, and B color filters on the substrate for each pixel area of the liquid crystal display; Forming a common transparent electrode on an upper surface of the R, G, and B color filters; Aligning a mask patterned with spacer holes on the common transparent electrode; Filling a spacer material into the spacer hole of the mask; Curing the filled spacer material to form a spacer on a common transparent electrode; Removing the mask; and forming a spacer of the liquid crystal display. 4. The method of any one of claims 1 to 3, wherein filling the spacer material into the spacer hole of the mask comprises forming a spacer material on the mask through a spacer material supply and forming a spacer into the spacer hole on the mask through the spacer filler. A method of forming a spacer of a liquid crystal display, characterized in that the material is filled. 5. The method of claim 4, wherein the filling of the spacer material comprises forming a spacer material formed on the mask through a spacer material feeder from one side of the mask through a spacer filler such as a rubber roller or doctor blade. A method of forming a spacer of a liquid crystal display, characterized in that to fill the spacer material into the spacer hole by printing to the other side. The method of claim 5, wherein the spacer filler is paired with the spacer material supply. The method of forming a spacer of a liquid crystal display device according to any one of claims 1 to 5, wherein the spacer material is a liquid photoacrylic material. The method of claim 1, further comprising irradiating ultraviolet rays after aligning a mask patterned with spacer holes on the substrate. The method of claim 3, further comprising forming an alignment layer on the common transparent electrode on which the spacer is formed after the mask is removed and performing alignment. 4. The method of claim 1, wherein the spacer material is cured by ultraviolet irradiation.