KR20030003450A - An plating method of arc discharge for forming plating layers in various colors on stainless steel - Google Patents

An plating method of arc discharge for forming plating layers in various colors on stainless steel Download PDF

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Publication number
KR20030003450A
KR20030003450A KR1020010039268A KR20010039268A KR20030003450A KR 20030003450 A KR20030003450 A KR 20030003450A KR 1020010039268 A KR1020010039268 A KR 1020010039268A KR 20010039268 A KR20010039268 A KR 20010039268A KR 20030003450 A KR20030003450 A KR 20030003450A
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South Korea
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plating layer
evaporation source
nitrogen
stainless steel
mixed gas
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KR1020010039268A
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Korean (ko)
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이규원
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한산고진공산업 주식회사
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Priority to KR1020010039268A priority Critical patent/KR20030003450A/en
Publication of KR20030003450A publication Critical patent/KR20030003450A/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon

Abstract

PURPOSE: An arc discharge ion plating method is provided to obtain a various colored stainless steel sheet having superior durability and acid and abrasion resistance by injecting a mixed gas of nitrogen and acetylene, thereby forming the plating layer having a specific color on the surface of the steel sheet according to mixing ratio thereof. CONSTITUTION: The arc discharge ion plating method for forming a plating layer of various colors on a stainless steel sheet is characterized in that a plating layer of a specific color is formed on the surface of a material to be plated according to a mixing ratio of the gases by injecting a mixed gas of nitrogen and acetylene that are mixed in different ratios respectively when metal ions, an evaporation source, are emitted, a brown plating layer is formed by using titanium as the evaporation source and the mixed gas injected comprising 20 to 30 wt.% of acetylene and 80 to 70 wt.% of nitrogen, a bronze plating layer is formed by using titanium as the evaporation source and the mixed gas injected comprising 30 to 60 wt.% of acetylene and 70 to 40 wt.% of nitrogen, a black plating layer is formed by using titanium as the evaporation source and the mixed gas injected comprising 70 to 90 wt.% of acetylene and 30 to 10 wt.% of nitrogen, a gold plating layer is formed by using titanium as the evaporation source and injecting 100 wt.% of nitrogen as the mixed gas injected, and the plating layer of various colors is formed on a stainless steel sheet using zirconium as the evaporation source.

Description

스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기 위한 아크방전 이온도금방법{An plating method of arc discharge for forming plating layers in various colors on stainless steel}An plating method of arc discharge for forming plating layers in various colors on stainless steel}

본 발명은 아크방전에 의하여 발생되어진 도금물의 금속이온을 피도금물인 스테인레스 강판 표면에 증착시켜 도금물의 피막을 형성시키는 이온도금방법에 관한 것으로, 특히 서로 다른 비율의 질소와 아세틸렌 혼합 가스를 주입시켜 다양한 색상의 도금층을 형성시킬 수 있도록 한 것이다.The present invention relates to an ion plating method for forming a coating film by depositing metal ions of a plating product generated by arc discharge on the surface of a stainless steel plate to be plated, and in particular, by injecting a mixture of nitrogen and acetylene in different ratios. It is to be able to form a plating layer of various colors.

종래에 스테인레스 강판에 칼라 도금층을 형성토록 하기 위해서는 피도금물의 표면에 도금물인 금속이온이 수용액 상태로 석출토록 하는 습식도금에 의하여이루어지도록 하였으나 도금폐수 발생에 따른 수질오염의 문제점이 있고, 밀착성이 떨어져 약한 내구성에 의한 하자율이 높고, 특정 색상을 나타내기 위한 금, 단동, 황동 등의 비싼 원자재의 사용으로 제조 원가가 상승되는 문제점이 있었다.Conventionally, in order to form a color plated layer on a stainless steel sheet, a metal ion, which is a plated material, is formed on the surface of the plated material by wet plating to precipitate in an aqueous solution state, but there is a problem of water pollution due to plating waste water, and adhesion. As a result, the defect rate is high due to weak durability, and manufacturing costs are increased due to the use of expensive raw materials such as gold, single copper, and brass to express a specific color.

따라서 우수한 밀착성과 치밀성을 요하는 절삭 공구용 재료, 반도체용 재료, 항공기용 재료 등을 비롯하여 고급 건축재료와 장식품 등에는 이러한 습식도금에 의한 도금층의 형성보다 이온도금방법 등의 건식도금을 적용하게 되는 것이다.Therefore, dry plating, such as ion plating, is applied to cutting tool materials, semiconductor materials, aircraft materials, and other high-grade building materials and ornaments that require excellent adhesion and compactness, rather than the formation of plating layers by wet plating. will be.

그러나 이를 위한 전형적인 이온도금방법으로서, 아르곤(Ar) 등의 불활성 기체를 방전가스로 주입시켜 아르곤에 의한 불활성 가스 분위기에서 도금물을 증발시키고, 이때 도금물의 증발물질은 (-)의 고전압에 걸려진 피도금물과 주위에 지속적으로 발생되어지는 글로우 방전의 플라즈마 영역을 통과하는 동안 전자에 얻어맞고 (+)이온으로 대전되어 (-)의 피도금물 표면에 이끌려 충돌토록 함으로서 증착되어 도금토록 하는 방법은 물성이 우수한 코팅층을 형성시킬 수 있으나, 이온화율이 낮고, 기판에 높은 전압이 걸려 기판의 온도를 상승시킴으로서 도금물의 표면에 형성되어진 피막을 손상시키는 문제점이 있었던 것이다.However, as a typical ion plating method for this purpose, an inert gas such as argon (Ar) is injected into the discharge gas to evaporate the plating material in an inert gas atmosphere by argon, and the evaporation material of the plating material is subjected to a high voltage of (-). While passing through the plasma region of the glow discharge continuously generated around the workpiece and surroundings, it is deposited by plating by attracting electrons, being charged with (+) ions, and being attracted to the surface of the (-) workpiece to collide with it. Although it is possible to form a coating layer having excellent physical properties, the ionization rate is low, and a high voltage is applied to the substrate to increase the temperature of the substrate, thereby causing a problem of damaging the film formed on the surface of the plating material.

또한 증발원과 기판 사이에 방출 필라멘트(접지)와 보조양극을 삽입하여 증발원들이 저 에너지 열 전자군에 의하여 이온화되도록 하는 방법에 있어서는 증발물의 이온화를 조절하여 높은 이온화율을 얻을 수 있고, 방전가스를 도입하지 않아도 고진공하에서 이온도금이 가능토록 할 수 있으나 고주파를 사용함으로서 공정이 복잡해지고, 가격이 비싼 단점이 있다.In addition, in the method of inserting the filament (ground) and the auxiliary anode between the evaporation source and the substrate so that the evaporation sources are ionized by the low energy thermal electron group, the ionization of the evaporate can be controlled to obtain a high ionization rate, and a discharge gas is introduced. Although it is possible to do ion plating under high vacuum, the process is complicated by using a high frequency and has a disadvantage of being expensive.

따라서 본 발명은 상기한 종래의 문제점을 해결하기 위하여 안출한 것으로, 아크방전식 이온도금에 있어서, 도금물의 금속이온이 방출될 때 서로 다른 비율로 구성되어진 질소와 아세틸렌 혼합가스를 주입시켜 혼합비율에 따라 특정 색상의 도금층이 피도금물인 스테인레스 광폭 강판 표면에 형성토록 함으로서 내구, 내산, 내마모성이 우수한 다양한 색상의 스텐레스 강판을 제공하고자 한 것이다.Therefore, the present invention has been made to solve the above-mentioned problems, in the arc discharge ion plating, when the metal ions of the plating is released injecting nitrogen and acetylene mixed gas composed of different ratios in the mixing ratio Accordingly, it is to provide a stainless steel sheet of various colors excellent in durability, acid resistance, and wear resistance by forming a plating layer of a specific color on the surface of the stainless steel sheet to be plated.

도 1은 본 발명의 아크방전 이온도금장치구성을 나타낸 개략도.1 is a schematic view showing the configuration of the arc discharge ion plating apparatus of the present invention.

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

1: 진공챔버 2: 피도금판거치대1: vacuum chamber 2: plated plate holder

3: 이동간 4: 아크소스3: movement time 4: arc source

5: 가스 도입구5: gas inlet

본 발명은 아크방전식 이온도금에 있어서, 증발원인 금속이온이 방출될 때 서로 다른 비율로 구성되어진 질소와 아세틸렌 혼합가스를 주입시켜 혼합비율에 따라 특정 색상의 도금층이 피도금물인 스테인레스 광폭 강판 표면에 형성토록 한 것이다.In the arc discharge type ion plating, when a metal ion as an evaporation source is released, a mixture of nitrogen and acetylene composed of different ratios is injected to inject a stainless steel plate having a specific color plating layer according to a mixing ratio. To form.

이하에서는 첨부 도면을 참조하여 본 발명의 가장 바람직한 일 실시 예를 상세히 설명하기로 한다. 우선, 각 도면을 설명함에 있어, 동일한 구성 요소들에 한해서는 비록 다른 도면상에 도시되더라도 동일한 참조부호를 갖으며 서로 대칭되는 부분에 대해서는 부호 및 설명을 생략한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. First, in describing each of the drawings, only the same components, even if shown on the other drawings have the same reference numerals and reference numerals and descriptions are omitted for the parts that are symmetrical with each other.

도 1은 본 발명을 달성하기 위한 아크방전식 이온도금장치의 일례를 나타낸 것으로서, 반응을 진행시키기 위한 진공챔버(1)와 도금하고자 하는 광폭 스텐레스 판이 거치될 수 있는 피도금판거치대(2) 및 이를 회전시키면서 진공챔버(1)내로 출입시킥 위한 이송간(3) 도금을 위한 아크소스(4)와 적절한 가스의 공급을 위한 가스도입구(5)로 구성된다.1 shows an example of an arc discharge type ion plating apparatus for achieving the present invention, and a plated plate holder 2 on which a vacuum chamber 1 for advancing a reaction and a wide stainless steel plate to be plated can be mounted. It consists of an arc source 4 for plating the transfer chamber 3 for entry and exit into the vacuum chamber 1 and a gas inlet 5 for supplying an appropriate gas while rotating it.

이때 상기 피도금판거치대(2)는 통상적으로 사용되고 있는 형태로 제작되며스파터링에 의한 시편 청결 및 이온도금이 가능토록 절연되어 진공챔버(1)에 고정되고, 온도조절장치를 통하여 가열토록 되고, 피도금판거치대(2)의 간극은 대략 15 ~ 35cm 내외의 간격으로 설치된다.At this time, the plated plate holder (2) is manufactured in the form that is commonly used and is insulated so that the specimen cleanliness and ion plating by spattering is fixed to the vacuum chamber (1), and to be heated through a temperature control device, The gap between the plated base 2 is provided at intervals of about 15 to 35 cm.

또한 상기 아크소스(4)는 증발물질이 놓여지는 곳으로 상기 피도금판거치대(2)에 대향으로 설치되며, 증발용 전원이 인가되게 되어 아크소스(4)의 타켓을 음극으로 하고 진공챔버(1)를 양극으로 할 때 촉발전극이 순간적으로 타켓에 접촉하여 아크방전이 발생토록 되고, 가스 도입구(5)를 통하여 도입되어진 혼합가스와의 반응에 의하여 피도금물에 다양한 색상의 도금층을 형성시킬 수 있게 된다.In addition, the arc source (4) is the place where the evaporation material is placed opposite to the plated plate holder 2, the evaporation power is applied to the target of the arc source (4) as a cathode and the vacuum chamber ( When 1) is used as the anode, the triggering electrode instantly contacts the target to generate arc discharge, and forms a plated layer of various colors on the plated material by reaction with the mixed gas introduced through the gas inlet 5. You can do it.

이하 상기 아크방전식 이온도금장치의 실행방법과 그에 따른 작용효과를 설명하면 다음과 같다.Hereinafter, a method of implementing the arc-discharge type ion plating apparatus and its effect will be described.

우선, 펌프를 사용하여 6 x 10-3Pa 까지 펌핑하여 진공챔버(1)의 내부를 진공상태를 만든 후, 혼합가스를 투입하여 n x 10-1~ n x 10-2Pa 의 진공상태를 유지한다.First, the pump is pumped to 6 x 10 -3 Pa to make a vacuum inside the vacuum chamber 1, and then mixed gas is added to maintain a vacuum of nx 10 -1 to nx 10 -2 Pa. .

이때 아크소스(4) 타켓은 음극으로 하고 진공챔버(1)는 양극으로 하면 촉발전극이 순간적으로 타켓에 접촉하여 아크방전이 발생되게 되고, 이 현상은 타켓 표면에 불규칙으로 이동하는 수많은 아크반전이 형성되는데 이 반점은 매우 큰 전류밀도와 이동속도를 갖고 있으며 매개반점은 증발원이 되어 전자, 금속이온, 중성입자와 액체알맹이를 발사한다.At this time, if the target of the arc source (4) is the cathode and the vacuum chamber (1) is the anode, the arcing electrode is instantaneously contacted with the target to generate an arc discharge. This phenomenon causes a large number of arc inversions moving irregularly on the target surface. These spots have very large current densities and moving speeds, and each spot serves as an evaporation source, emitting electrons, metal ions, neutral particles, and liquid kernels.

이중 금속양이온은 타켓 표면 부근에서 강한 전기마당을 형성하며 이 전기마당의 작용에 의하여 전자는 타켓 표면에서 이탈되고 양이온은 음극 타켓 표면을 충격하여 타켓 국부를 고온 증발시킨다.The double metal cation forms a strong electric field near the target surface. The electrons are released from the target surface by the action of the electric field, and the cations impact the cathode target surface to evaporate the target portion at high temperature.

이때 매개반점의 지속시간은 아주 짧으며 다시 분열되어 에너지 함수가 적은 곳으로 이동하여 새로운 반점을 형성한다.At this time, the duration of the intermediate spot is very short and it splits again and moves to the place where the energy function is small to form new spot.

상기와 같은 연속적인 순환으로 아크전류를 일정하게 하고 플라즈마 상태를 지속시킨다.The continuous circulation as described above makes the arc current constant and maintains the plasma state.

이때 기판에 바이어스(bias)를 가하여 전기마당이 형성토록 하면 증발 혹은 반사된 도금물의 금속이온이 고에너지로 피도금물의 표면을 충격, 증착하여 피막을 형성토록 함으로서 도금층이 형성되게 되는 것이고, 전자는 진공챔버(1)에 흡수된다.At this time, when a bias is applied to the substrate to form an electric field, the metal layer of the evaporated or reflected plating metal is formed to form a film by impacting and depositing the surface of the plated material with high energy. Is absorbed into the vacuum chamber (1).

따라서 상기한 아크방전 이온도금은 방전기체가 필요 없이 증발된 금속자체가 방전기체로 되기 때문에 10-3Pa에서도 안정된 플라즈마가 형성되게 되는 것이고, 이때 증발된 금속자체가 이온화되게 되는 높은 이온화율에 의하여 피도금물의 표면에 형성되어지는 피막의 결합력이 우수하게 되고, 도입되는 혼합가스와의 반응률이 높게 되어 혼합가스의 구성성분인 질소와 아세틸렌의 비율에 따라 특정되어지는 다양한 색상의 도금막을 형성시킬 수 있게 되는 것이다.Therefore, in the arc discharge ion plating, since the evaporated metal itself becomes a discharge gas without the need for a discharge gas, stable plasma is formed even at 10 -3 Pa. The bonding strength of the film formed on the surface of the forbidden body is excellent, and the reaction rate with the mixed gas to be introduced is high, so that the plating film of various colors specified by the ratio of nitrogen and acetylene, which is a component of the mixed gas, can be formed. Will be.

이하, 상기에서 설명한 실행방법에 의하여 스테인레스 강판 표면에 다양한 색상의 도금막을 형성시킨 실시예는 다음과 같다.Hereinafter, an embodiment in which a plated film of various colors is formed on the surface of a stainless steel sheet by the above-described method is as follows.

{실시예 1}{Example 1}

피도금물 : 스테인레스 광폭 강판Plated: Stainless wide steel

아크소스(4) 또는 증발원 : 티타늄(Ti) 또는 지리코늄(Zr)Arc source (4) or evaporation source: titanium (Ti) or zirconium (Zr)

도입가스 : 아세틸렌 20 ~ 30%, 질소 80 ~70% 의 혼합가스Inlet gas: 20 to 30% acetylene, 80 to 70% mixed gas

진공챔버(1)의 진공도 : 5x10-2~ 7x10-1PaVacuum degree of the vacuum chamber (1): 5x10 -2 to 7x10 -1 Pa

아크소스(4) 또는 증발원에 흐르는 전류 : 50 ~ 60ACurrent flowing through the arc source (4) or evaporation source: 50 to 60 A

가열온도 : 150 ~ 200℃Heating temperature: 150 ~ 200 ℃

실행시간 : 16분Running time: 16 minutes

*** 결과 : 스테인레스 강판 표면에 갈색(brown)으로 반응되어진 티타늄(Ti) 또는 지리코늄(Zr)의 도금층이 형성되었다.*** Result: A plated layer of titanium (Ti) or zirconium (Zr) was formed on the surface of the stainless steel sheet.

{실시예 2}{Example 2}

피도금물 : 스테인레스 광폭 강판Plated: Stainless wide steel

아크소스(4) 또는 증발원 : 티타늄(Ti) 또는 지리코늄(Zr)Arc source (4) or evaporation source: titanium (Ti) or zirconium (Zr)

도입가스 : 아세틸렌 30 ~ 60%, 질소 70 ~40% 의 혼합가스Inlet gas: mixed gas of acetylene 30 ~ 60%, nitrogen 70 ~ 40%

진공챔버(1)의 진공도 : 5x10-2~ 7x10-1PaVacuum degree of the vacuum chamber (1): 5x10 -2 to 7x10 -1 Pa

아크소스(4) 또는 증발원에 흐르는 전류 : 50 ~ 60ACurrent flowing through the arc source (4) or evaporation source: 50 to 60 A

가열온도 : 150 ~ 200℃Heating temperature: 150 ~ 200 ℃

실행시간 : 16분Running time: 16 minutes

결과 : 스테인레스 강판 표면에 청동색(bronze)으로 반응되어진 티타늄(Ti) 또는 지리코늄(Zr)의 도금층이 형성되었다.Results: A plated layer of titanium (Ti) or zirconium (Zr) was formed on the surface of the stainless steel sheet in bronze.

{실시예 3}{Example 3}

피도금물 : 스테인레스 광폭 강판Plated: Stainless wide steel

아크소스(4) 또는 증발원 : 티타늄(Ti) 또는 지리코늄(Zr)Arc source (4) or evaporation source: titanium (Ti) or zirconium (Zr)

도입가스 : 아세틸렌 70 ~ 90%, 질소 30 ~10% 의 혼합가스Inlet gas: mixed gas of acetylene 70 ~ 90%, nitrogen 30 ~ 10%

진공챔버(1)의 진공도 : 5x10-2~ 7x10-1PaVacuum degree of the vacuum chamber (1): 5x10 -2 to 7x10 -1 Pa

아크소스(4) 또는 증발원에 흐르는 전류 : 50 ~ 60ACurrent flowing through the arc source (4) or evaporation source: 50 to 60 A

가열온도 : 150 ~ 200℃Heating temperature: 150 ~ 200 ℃

실행시간 : 16분Running time: 16 minutes

결과 : 스테인레스 강판 표면에 흙색(black)으로 반응되어진 티타늄(Ti) 또는 지리코늄(Zr)의 도금층이 형성되었다.Results: A plating layer of titanium (Ti) or zirconium (Zr) was formed on the surface of the stainless steel sheet.

{실시예 4}{Example 4}

피도금물 : 스테인레스 광폭 강판Plated: Stainless wide steel

아크소스(4) 또는 증발원 : 티타늄(Ti) 또는 지리코늄(Zr)Arc source (4) or evaporation source: titanium (Ti) or zirconium (Zr)

도입가스 : 질소 1000%Introductory gas: nitrogen 1000%

진공챔버(1)의 진공도 : 5x10-2~ 7x10-1PaVacuum degree of the vacuum chamber (1): 5x10 -2 to 7x10 -1 Pa

아크소스(4) 또는 증발원에 흐르는 전류 : 50 ~ 60ACurrent flowing through the arc source (4) or evaporation source: 50 to 60 A

가열온도 : 150 ~ 200℃Heating temperature: 150 ~ 200 ℃

실행시간 : 16분Running time: 16 minutes

결과 : 스테인레스 강판 표면에 황색(gold)으로 반응되어진 티타늄(Ti) 또는 지리코늄(Zr)의 도금층이 형성되었다.Results: A plating layer of titanium (Ti) or zirconium (Zr) reacted with gold was formed on the surface of the stainless steel sheet.

상기한 실시예에서 입증된 바와 같이 본 발명은 이온도금 시, 도입된 혼합가스인 질산과 아세틸렌의 혼합비율에 따라 스테인레스 광폭 표면에 특정 색상으로 반응되어지는 다양한 색상의 도금층을 형성시킬 수 있게 되는 것이다.As demonstrated in the above embodiment, the present invention is capable of forming a plating layer of various colors reacted in a specific color on a wide surface of stainless steel according to the mixing ratio of nitric acid and acetylene which are mixed gases introduced during ion plating. .

상술한 바와 같이 본 발명의 아크방전식 이온도금방법은 내구, 내산, 내마모성이 우수함은 물론 칼라 도금층을 형성을 위한 고가의 원자재를 사용하지 않고 도입되어지는 질소와 아세틸렌의 혼합비율에 따라 다양한 색상의 도금층을 형성시킬 수 있게 됨으로서 가격이 저렴하고, 건식으로 처리되어 수질오염의 발생 가능성이 전혀 없게 되는 것이다.As described above, the arc-discharge ion plating method of the present invention is excellent in durability, acid resistance, and wear resistance, and of various colors according to the mixing ratio of nitrogen and acetylene introduced without using expensive raw materials for forming a color plating layer. Since the plating layer can be formed, it is inexpensive and dry, so that there is no possibility of water pollution.

Claims (6)

아크방전식 이온도금에 있어서, 증발원인 금속이온이 방출될 때 서로 다른 비율로 구성되어진 질소와 아세틸렌 혼합가스를 주입시켜 혼합비율에 따라 특정 색상의 도금층이 피도금물의 표면에 형성토록 함을 특징으로 하는 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기 위한 아크방전 이온도금방법.In arc-discharge type ion plating, when a metal ion as evaporation source is released, nitrogen and acetylene mixed gas composed of different ratios are injected to form a plating layer having a specific color on the surface of the plated material according to the mixing ratio. Arc discharge ion plating method for forming a plating layer of various colors on a stainless steel sheet. 제 1항에 있어서, 상기 증발원으로서 티타늄(Ti)이 사용되고, 주입되는 혼합가스는 아세틸렌 20~30%, 질소 80~70% 로 구성되어 갈색(brown)의 도금층을 형성시킴을 특징을 하는 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기 위한 아크방전 이온도금방법.The stainless steel sheet according to claim 1, wherein titanium (Ti) is used as the evaporation source, and the mixed gas injected comprises 20-30% of acetylene and 80-70% of nitrogen to form a brown plating layer. Arc discharge ion plating method for forming a plated layer of various colors on. 제 1항에 있어서, 상기 증발원으로서 티타늄(Ti)이 사용되고, 주입되는 혼합가스는 아세틸렌 30~60%, 질소 70~40% 로 구성되어 청동색(bronze)의 도금층을 형성시킴을 특징을 하는 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기 위한 아크방전 이온도금방법.The method of claim 1, wherein titanium (Ti) is used as the evaporation source, and the injected mixed gas is composed of acetylene 30 to 60% and nitrogen 70 to 40% to form a bronze plated layer. Arc discharge ion plating method for forming plating layers of various colors on steel sheets. 제 1항에 있어서, 상기 증발원으로서 티타늄(Ti)이 사용되고, 주입되는 혼합가스는 아세틸렌 70~90%, 질소 30~10% 로 구성되어 흙색(black)의 도금층을 형성시킴을 특징을 하는 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기위한 아크방전 이온도금방법.The stainless steel sheet according to claim 1, wherein titanium (Ti) is used as the evaporation source, and the mixed gas to be injected is composed of acetylene 70 to 90% and nitrogen 30 to 10% to form a black plating layer. Arc discharge ion plating method for forming a plating layer of various colors on the surface. 제 1항에 있어서, 상기 증발원으로서 티타늄(Ti)이 사용되고, 주입되는 혼합가스는 질소 100%로 구성되어 가스를 주입하여 황색(gold)의 도금층을 형성시킴을 특징을 하는 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기 위한 아크방전 이온도금방법.The method of claim 1, wherein titanium (Ti) is used as the evaporation source, and the mixed gas to be injected is composed of 100% nitrogen to inject a gas to form a gold plating layer of various colors on the stainless steel sheet. Arc discharge ion plating method for forming a plating layer. 제 1항에 있어서, 상기 증발원으로서 지리코늄(Zr)을 사용하여 스테인레스 강판에 다양한 색상의 도금층을 형성토록 하기 위한 아크방전 이온도금방법.The arc discharge ion plating method according to claim 1, wherein a zirconium (Zr) is used as the evaporation source to form a plating layer having various colors on a stainless steel sheet.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07157896A (en) * 1993-12-03 1995-06-20 Honda Motor Co Ltd Composite plating method of inside surface of hollow member
KR970058968A (en) * 1996-01-31 1997-08-12 김희용 Manufacture of decorative color for metal products
KR19980074194A (en) * 1997-03-21 1998-11-05 선호천 Dry plating method on ABS resin and plastic
JP2000119845A (en) * 1998-10-15 2000-04-25 Mishima Kosan Co Ltd Small article made of colored hard metal and its manufacture

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07157896A (en) * 1993-12-03 1995-06-20 Honda Motor Co Ltd Composite plating method of inside surface of hollow member
KR970058968A (en) * 1996-01-31 1997-08-12 김희용 Manufacture of decorative color for metal products
KR19980074194A (en) * 1997-03-21 1998-11-05 선호천 Dry plating method on ABS resin and plastic
JP2000119845A (en) * 1998-10-15 2000-04-25 Mishima Kosan Co Ltd Small article made of colored hard metal and its manufacture

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