KR20020061136A - a manufacturing of electrolytic arrangement for see water technigue - Google Patents
a manufacturing of electrolytic arrangement for see water technigue Download PDFInfo
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- KR20020061136A KR20020061136A KR1020010002397A KR20010002397A KR20020061136A KR 20020061136 A KR20020061136 A KR 20020061136A KR 1020010002397 A KR1020010002397 A KR 1020010002397A KR 20010002397 A KR20010002397 A KR 20010002397A KR 20020061136 A KR20020061136 A KR 20020061136A
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
- C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
- C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/46109—Electrodes
- C02F2001/46133—Electrodes characterised by the material
- C02F2001/46138—Electrodes comprising a substrate and a coating
- C02F2001/46142—Catalytic coating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Abstract
Description
본 발명은 해수전해 설비용 백금양극의 제조방법에 관한 것으로서, 더욱 상세히는 해수(바닷물)를 가지고 발전소 설비나 기타 대형설비 등에서 냉각수를 얻기위하여 백금양극을 이용한 해수전해설비가 필수적으로 요구되는데, 이때 전기 분해시 사용되는 백금양극의 물성을 기존 제품보다 뛰어난 양질의 백금양극을 제공하여 해수분해효율을 더욱 극대화시킴은 물론 고가의 제품인 백금양극의 자체결함을 줄여 오랜 수명이 유지될 수 있도록 하는 해수전해 설비용 백금양극의 제조방법에 관한 것이다.The present invention relates to a method of manufacturing a platinum anode for seawater electrolysis equipment, and more specifically, to obtain cooling water in power plant equipment or other large facilities with seawater (sea water), a seawater electrolysis facility using platinum anode is required. Platinum anode used in electrolysis provides better quality platinum anode than existing products to maximize the efficiency of seawater decomposition and seawater electrolysis to maintain long life by reducing self-defect of expensive product, platinum anode The manufacturing method of the platinum anode for equipment.
해수전해설비란 함은 해수를 이용한 냉각수 즉, 냉각수 관로에 부착되는 해양생물 등을 제거하기 위해 사용되는 차아염소산나트륨을 해수에서 전기분해하여 얻는데 이때 사용되는 설비를 말한다. 통상적으로 상기 전기분해시 백금을 기본으로 한 촉매가 많이 사용되고 있는 것은 일반적이다.The seawater electrolysis facility refers to a facility used for electrolyzing sodium hypochlorite used in seawater to remove cooling water using seawater, that is, marine life attached to a cooling water pipe. In general, a platinum-based catalyst is commonly used in the electrolysis.
따라서 종래에는 백금에 복합물질을 첨가하여 paste형태로 제조한 다음 paste상의 백금족 화합물을 Ti에 수회 도포한 후 고온에서 건조시켜 제조를 하여 사용하고 있다.Therefore, conventionally, a composite material is added to platinum to form a paste, and then a platinum group compound on paste is applied to Ti several times, followed by drying at high temperature.
그러나 이러한 종래 방법은 열응력 등으로 인하여 표면에 많은 균열을 유발시켜 해수의 분해 능력이 극히 제한적일 수밖에 없었을 뿐 아니라 해수 분해시 많은 량을 단시간에 분해시킬 수 없었으며, 또 오랜 수명을 갖지 못하는 등의 문제점이 있었다.However, such a conventional method causes a lot of cracks on the surface due to thermal stress, so that the seawater has a very limited ability to decompose, and it cannot decompose a large amount of seawater in a short time, and has a long lifespan. There was a problem.
이에 본 발명에서는 상기와 같은 종래의 제반 문제점을 일소하기 위하여 창안한 것으로서 전기도금법에서 pulse 도금법을 적용하여 더욱 도금효율을 극대화시킬 수 있는 한편 전처리공정에서 plasma cleaning방법을 적용하여 균열 등과 같은 결함을 감소시켜 더욱 우수한 품질이 제공될 수 있는 백금양극의 제조방법에 주안점을 두고 그 기술적 과제로서 완성한 것이다.Therefore, in the present invention, the invention has been devised to eliminate the above-mentioned problems, and the plating efficiency can be further maximized by applying the pulse plating method in the electroplating method, while reducing defects such as cracks by applying the plasma cleaning method in the pretreatment process. The main focus is on the manufacturing method of platinum anode, which can provide more excellent quality, and completed as the technical problem.
도 1은 본 발명의 백금양극 제조공정도1 is a platinum anode manufacturing process chart of the present invention
도 2는 종래 paste방식과 본 발명의 전기도금방식을 비교한 물성평가그래프2 is a property evaluation graph comparing the conventional paste method and the electroplating method of the present invention
위의 기술적 과제를 이루기 위하여 본 발명의 해수 전해설비용 백금양극 제조방법은 첨부된 제조공정도 및 각종 측정결과표에 의거하여 구체적으로 설명하면 하기와 같다.Platinum anode manufacturing method for seawater electrolysis facility of the present invention to achieve the above technical problem is described in detail based on the accompanying manufacturing process chart and various measurement results table as follows.
먼저 판형태의 Ti를 준비 및 가공하고, 표면의 이물질을 제거하기 위하여 약 50℃의 탈지액에서 초음파를 이용하여 탈지를 한 다음 flow형태의 수세조에서 순수물을 사용하여 3회 가량 수세를 한다.First, prepare and process Ti in the form of plate, degrease by using ultrasonic wave in degreasing liquid at about 50 ℃ to remove foreign substances on the surface, and then rinse three times using pure water in the flow type washing tank. .
상기 수세 후 황산계열의 산을 이용하여 표면 산세처리를 함과 동시 순수 수세조에서 수세를 3회 실시한 다음 수 볼트의 전위를 가해 전해탈지를 실시한다.After washing with water, the surface is pickled using an acid of sulfuric acid and washed three times in a pure water washing tank, followed by electrolytic degreasing by applying a potential of several volts.
이후 표면의 이 물질을 제거하기 위해 다시 수세조에서는 초음파를 이용하여 탈지를 하고 난 다음 진공상태에서 Plasma Cleaning을 하여 표면 처리를 한 후 pulse rectifier에서 전류를 pulse로 변조한 다음 백금도금 욕조에서 도금하고자하는 소재와 백금사이에 pulse형태의 전기를 가하여 소재에 백금을 도금한다.Then, in order to remove this substance from the surface, the degreaser was degreased using ultrasonic waves, and then plasma treated in a vacuum, and then surface treated. Then, the pulse rectifier modulated the current into pulses and plated in a platinum plating bath. Platinum is plated on the material by applying pulsed electricity between the material and platinum.
상기 전기도금이 끝이 나면 다시 한번 순수수세를 3회 가량 실시한 다음 건조기를 통하여 표면을 건조시키고, 표면 개질과 물성을 향상시키기 위해 저온에서 열처리하여 완성된다.After the end of the electroplating is carried out three times pure water washing once again, and then dried the surface through a dryer, and finished by heat treatment at low temperature to improve surface modification and physical properties.
상기한 공정에서 pulse형태의 전기를 가하여 소재에 백금을 도금하는 것으로 하고 있으나 상기 pulse 도금공정 대신에 도금하고자하는 소재에 음극을 걸고 백금에 양극을 걸어 전기적으로 소재에 백금을 도금하는 DC도금법을 사용한 도금공정을 적용하거나 백금도금공정 대신에 plasma 분위기에서 백금을 coating하는 방법으로 하여도 기존방법(백금족화합물을 paste상태로 제조하여 소재의 표면에 붓으로 칠한 후 열처리로 에서 가열제조하는 방법)에 비하여 상당한 효과를 발휘할 수 있다.In the above process, platinum is plated on the material by applying pulse-type electricity, but instead of the pulse plating process, DC plating is used to electrically plate platinum on the material by hanging a cathode on a material to be plated and an anode on platinum. Even if the plating process is applied or the platinum is coated in the plasma atmosphere instead of the platinum plating process, it is compared with the existing method (preparation of platinum group compound, painting with the brush on the surface of the material and heating in the heat treatment furnace). It can have a significant effect.
상기와 같은 구성과 작용을 갖는 본 발명의 해수 전해설비용 백금양극 제조방법은 백금도금 공정에서 펄스형태의 전기도금방법을 취하고 있고, 전처리 과정에서 초음파 전해탈지를 함과 동시에 cleaning과정에서는 plasma cleaning을 함에 따라서, 고 품질의 백금양극을 제공할 수 있다.Platinum anode manufacturing method for the seawater electrolytic facility of the present invention having the configuration and action as described above is taking a pulse type electroplating method in the platinum plating process, and plasma cleaning in the cleaning process while performing ultrasonic electrolytic degreasing in the pretreatment process. As a result, it is possible to provide a high quality platinum anode.
즉, 전기적으로 도금을 수행하기 때문에 도금층이 전체적으로 균일할 뿐만 아니라 도금층의 두께를 조절할 수 있고, 모든 작업조건 및 재료성분 등이 데이터화가 가능함으로 물성의 재현 및 조정이 가능함은 물론 향후 신제품의 기술개발에 상당한 공헌을 할 것으로 기대된다.That is, because the plating is performed electrically, the plating layer is not only uniform, but the thickness of the plating layer can be adjusted, and all working conditions and material components can be converted into data to reproduce and adjust physical properties, as well as to develop new technologies in the future. It is expected to make a significant contribution.
또 많은 량의 해수를 우수한 분해능력으로 신속하게 처리될 수 있고, 표면의 결함을 감소시켜 백금양극의 수명을 대폭 증가될 수 있으며, 또 백금층의 명확한 계면으로 인하여 사용시간의 예측과 정확한 교체시기를 알 수 있어 해수 분해설비 유지에 상당한 도움을 줄 수 있고, 또 도금층을 박리하여 재사용 및 재활용이 가능하여 재료의 낭비를 줄임과 동시에 폐기물의 발생을 억제할 수 있는 등 그 기대되는 바가 실로 다대한 발명이다.In addition, a large amount of seawater can be processed quickly with excellent resolution, and the surface defects can be reduced to significantly increase the lifetime of the platinum anode, and due to the clear interface of the platinum layer, the use time is predicted and the time of replacement is correct. It can be very helpful in maintaining seawater decomposition facilities, and it can be reused and recycled by peeling off the plating layer to reduce the waste of materials and to suppress the generation of wastes. Invention.
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR880700103A (en) * | 1985-04-12 | 1988-02-15 | Electrolytic treatment electrode and method for manufacturing the electrode | |
JPH09125291A (en) * | 1995-11-01 | 1997-05-13 | Permelec Electrode Ltd | Electrode substrate |
JPH09148095A (en) * | 1995-11-24 | 1997-06-06 | Matsushita Electric Ind Co Ltd | Plasma cleaning device, plasma cleaning method, and circuit module |
JPH10125628A (en) * | 1996-10-24 | 1998-05-15 | Hitachi Ltd | Electrode-forming method of glass-coated semiconductor device |
JPH11221570A (en) * | 1998-02-05 | 1999-08-17 | Matsushita Electric Ind Co Ltd | Decomposition electrode for organic polluted water, decomposing method of organic polluted water using same and decomposing device of organic polluted water using same |
KR20000031786A (en) * | 1998-11-10 | 2000-06-05 | 구자홍 | Image control method of broadcast program for children |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR880700103A (en) * | 1985-04-12 | 1988-02-15 | Electrolytic treatment electrode and method for manufacturing the electrode | |
JPH09125291A (en) * | 1995-11-01 | 1997-05-13 | Permelec Electrode Ltd | Electrode substrate |
JPH09148095A (en) * | 1995-11-24 | 1997-06-06 | Matsushita Electric Ind Co Ltd | Plasma cleaning device, plasma cleaning method, and circuit module |
JPH10125628A (en) * | 1996-10-24 | 1998-05-15 | Hitachi Ltd | Electrode-forming method of glass-coated semiconductor device |
JPH11221570A (en) * | 1998-02-05 | 1999-08-17 | Matsushita Electric Ind Co Ltd | Decomposition electrode for organic polluted water, decomposing method of organic polluted water using same and decomposing device of organic polluted water using same |
KR20000031786A (en) * | 1998-11-10 | 2000-06-05 | 구자홍 | Image control method of broadcast program for children |
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