KR20020046328A - Method and apparatus of improving strength of ceramic ware products - Google Patents

Abstract

PURPOSE: A method is provided to manufacture a glass, metal or nonmetal product strength of which is more improved by depositing a thin film containing metallic nano-particles on the surface of the product. CONSTITUTION: The strength improving apparatus comprises a chamber(10) at the inner part of which a product is rested; a pressure reduction unit(20) reducing a pressure inside the chamber(10) to the vacuum state of a certain pressure or less; a plurality of gas storage units having gas valves(34,35,36) selectively supplying one or more gases into the chamber(10) respectively; a nano-particle storage unit which has a nano-particle valve(37) selectively supplying a nano-particle material into the chamber(10), and in which nano-particles having a particle size of tens of nanometers are stored; and a control part which controls the pressure reduction unit(20) to reduce a pressure inside the chamber(10), impresses a high pressure to the chamber after supplying inert gases into the chamber(10) through the gas valves(34,35,36) so as to form a thin film on the surface of the product, and ejects the nano-particles having a particle size of tens of nanometers stored in the nano-particle storage unit onto the product inside the chamber(10) through the nano-particle valve(37), wherein each of the plurality of gas storage units store nitrogen, oxygen and argon gases respectively, and the nano-particle storage unit stores one material selected from Fe and W in the nano-particle state having a particle size of tens of nanometers.

Description

Method for improving strength and apparatus thereof {Method and apparatus of improving strength of ceramic ware products}

The present invention relates to a method for manufacturing a product made of glass or metal and non-metal materials, and more particularly, to an apparatus and a method for increasing the strength of such a product in the production of products of the various materials described above.

In recent years, as science advances, the field of new material development that converts a substance having one physical quantity into a substance having a different physical quantity is rapidly growing, and the rapid growth of this new material field has advantages of each different substance having different characteristics. It has led to the development of the deposition field to take the form of a more improved device and this deposition method is currently being used in various fields of the industry.

Among these deposition methods, thin film deposition is a method of implementing an improved device by coating and depositing a material having a different physical quantity on the surface of a device having a certain physical quantity in the form of a thin film, and the thin film deposition method is a material constituting a thin film component. Or variously classified according to the environment or other criteria constituting the thin film.

Among these various thin film deposition methods, the plasma vacuum deposition method which is excellent in its characteristics and widely used is introduced.

The plasma vacuum deposition method is basically a vacuum deposition method, which vacuum evaporation of a metal, a metal compound or an alloy in a vacuum to vaporize the evaporated metal or evaporated metal compound on the surface of the target material to form a thin film In particular, a thin film deposition method using sputtering as a condensation process constituting such a thin film is called plasma vacuum deposition.

This plasma vacuum deposition method is generally performed in a reaction vessel called a chamber, in which a target material having an inert gas, an evaporation source, a target material on which a thin film is to be deposited, and a thin film component is formed. do.

When the electrons extracted by applying a voltage to the evaporation source of the chamber having such a configuration collide with the inert gas, some of the collided gas molecules are ionized, but most of them cannot be ionized and are returned to a stable state after excitation. Glow (Glow) discharge is caused, the gas by the glow discharge is transformed into plasma (plasma).

At this time, the ions (Ar +) in the plasma are accelerated by the negative electrode and have a high kinetic energy. When the atoms having such high kinetic energy collide with the target material, which is a negative electrode material, the atoms invade the solid and the atom inside the solid. A continuous chain collision of and atoms occurs, and the target material atoms bounce off into space and scatter as a result of being deposited as a thin film on the target material.The phenomenon of sputtering of metal atoms by colliding ions and metals is called sputtering. .

In particular, the electric field may be formed to maintain the above-described glow discharge, and a method of improving the stuttering by forming the electric field is called magnetron sputtering. The magnetron sputtering has high power efficiency and low impact on the thin film material. It has such advantages.

The plasma vacuum deposition method for depositing a thin film using the sputtering phenomenon is relatively simple in the overall configuration of the apparatus, can be easily applied to various kinds of materials, and has excellent properties such as step coverage of the film during thin film formation. It is a thin film material that can be applied to both metals and non-metals and is used in various industrial fields today. In particular, the plasma vacuum deposition method has a high strength because a metal material is generally used as a target material. Since the target material component of the metal in a low target material can be deposited in a thin film to increase the strength of the target material, it is also used in the field of coating a thin film of metal with an organic material such as porcelain or glass as a target material.

However, even when the thin film is formed using the conventional plasma vacuum deposition method, since the size of the thin film is small, the strength of the glass, metal, and nonmetallic products cannot be greatly increased, while the thickness of the thin film is increased to increase the strength. In case of thick deposition, there is a problem in that it injures the inherent advantages of the product.

In order to solve the above problems, an object of the present invention is to provide a strength improving apparatus and method for realizing a product of glass or metal and non-metal materials that can have a greater strength without increasing the thickness of the thin film. .

1 is a block diagram showing a schematic configuration of a strength improving apparatus according to the present invention.

Figure 2 is a cross-sectional view schematically showing the internal structure of the chamber that is part of the strength improvement apparatus according to the present invention,

3 is a cross-sectional view of the chamber of FIG. 2, FIG.

4 is a cross-sectional view showing the rack driving mechanism cut along the line I-I of FIG.

<Explanation of symbols for the main parts of the drawings>

10 chamber 20 pressure reducing device

34, 35, 36: gas valve 37: nanoparticle valve

51 titanium rod 52 magnetron

53: cold plate 54: titanium plate

55: grid rod 60: rack

61: spindle 62: reduction gear

63: upper plate 64: rack shaft

65: main gear 66: fluid gear

67: support plate 68: vertical support bar

M: motor

The present invention and the chamber is the product seated therein to achieve the above object; A decompression device for depressurizing the inside of the chamber to a vacuum below a predetermined pressure; A plurality of gas storage devices each having a gas valve for selectively supplying at least one gas into the chamber; A nanoparticle storage device having a nanoparticle valve for selectively supplying nanoparticle materials in the chamber and storing tens of nanoscale nanoparticles therein; A pressure reducing device is controlled to reduce the inside of the chamber, an inert gas is supplied through the gas valve, and a high pressure is applied to form a thin film on the surface of the product, and at the same time stored in the nanoparticle storage device. It provides a strength improving device comprising a control unit for spraying nanoparticles of several tens of nano-size to the product inside the chamber through the nanoparticle valve.

Particularly, the plurality of gas storage devices store nitrogen, oxygen, and argon gas, respectively, and the nanoparticle storage device is a nanoparticle state in which a material selected from iron (Fe) and tungsten (W) has tens of nanometers in size. It is characterized by storing as.

The present invention also provides a chamber comprising a cathode made of titanium, a magnetron that emits electrons from the cathode and forms an electric field, a target made of titanium hit by the emitted electrons, and a product to be processed between the cathode and the target. Wow; A decompression device for depressurizing an internal pressure of the chamber; A gas injection device for injecting gas into the chamber; CLAIMS 1. A method for improving strength using a strength improving device including a nano particle injecting device for injecting nanoparticles into the chamber, the method comprising: depressurizing the chamber by the pressure reducing device; Injecting gas into the chamber through the gas injection device; The target material is applied to the magnetron to emit electrons from the cathode and collide with the injected gas molecules to cause the gas to turn into a plasma to cause a glow discharge, and to cause the plasma gas to strike the target to be scattered from the target. Depositing the component molecules in a thin film on the article; It provides a strength improving apparatus comprising the step of depositing a thin film containing nanoparticles in a product to be processed by injecting nanoparticles of several tens of nanoscale state through the nanoparticle injection device in the chamber.

In particular, the gas is at least one selected from nitrogen, oxygen, and argon gas, and the nanoparticles injected into the chamber are nanoparticles in which one selected from iron (Fe) and tungsten (W) has tens of nanometers. It features.

Hereinafter, an apparatus for improving strength through a plasma vacuum deposition method and a method thereof will be described in detail.

The present invention is characterized by the use of particles having a size of nano (nano: 1 billion billion meters) unit, in particular in order to greatly improve the strength of the product, such as from several nanometers to hundreds of nanometers The structure of the branched nanoparticles is generally referred to as nanoparticle structured or nanophase material.

These nanomaterials have atoms or molecules with continuous electron densities or discontinuous electron energy densities, with particle sizes much smaller than the wavelength of visible light and forming larger grain boundaries relative to the particle mass. Unlike the bulk state, they have unique properties that they do not have.

That is, nanomaterials have superior strength and chemical stability because more atoms or molecules are located at the interface than bulk materials, and the present invention is characterized by greatly increasing the strength of a product using such nanomaterials.

Best Mode for Carrying Out the Invention A preferred embodiment according to the present invention will be described in more detail with reference to the drawings.

Strength improvement apparatus according to the present invention, as shown in Figure 1, the cylindrical chamber having a door 11 that can be opened and closed on the front and the inside of the chamber 10 to reduce the pressure below a certain pressure Decompression device 20, a plurality of gas storage devices (30, 31, 32) for injecting an inert gas into the chamber 10, and a nano particle storage device 33 for injecting nanoparticle material into the chamber (10) It is configured to include).

In particular, the chamber 10 has a predetermined internal device therein, and includes a motor M and a cooling device 15 for cooling a part of the internal device to drive a part of the internal device. Doing.

In addition, the strength improvement apparatus according to the present invention, the plurality of gas storage devices (30, 31, 32) and the nanoparticle storage device 33 to adjust the amount of inert gas and nanoparticles introduced into the chamber 10 To this end, each of the gas valves 34, 35, 36 connected to each gas storage device, and one nanoparticle valve 37, which has a motor (M), a cooling device (15) and a pressure regulator ( 20) and a control unit 40 for controlling the nanoparticle valve 37 and the plurality of gas valves (34, 35, 36).

The plurality of inert gas storage devices 30, 31, and 32 described above are preferably argon gas tanks storing argon gas, nitrogen gas tanks storing nitrogen gas, and oxygen gas tanks storing oxygen gas, respectively.

Strength improvement method for improving the strength of the product consisting of glass or metal and non-metal material through the strength improvement apparatus having such a configuration through FIG. 2 is a cross-sectional view of the internal configuration shown in FIG. Explain in more detail.

The chamber 10 preferably has a cylindrical shape so as to make maximum use of its internal volume, and such internal space can control the pressure by the pressure reducing device 20, and in the center of the bottom surface of the chamber 10, A cathode means consisting of a titanium rod 51 is installed upright along the central axis direction, the upper end of the titanium rod 51 emits electrons from the titanium rod 51 to strike the target, the chamber 10 The magnetron 52 which forms an electric field is provided in the inside.

In addition, the titanium plate 54 is located on the side surface of one side of the inside of the chamber 10 as the target means, and is fixedly opposed to the titanium rod 51 described above. Between the side surface of the chamber and the titanium plate is a cooling plate 53, which is a means for cooling the titanium plate 54, and the cooling plate 53 is provided with cooling water from the cooling device 15 shown in FIG. It consists of a structure that is supplied and passed through.

On the side of the chamber 10 having such a configuration, a plurality of gas injection holes 34, 35, 36 and nano particle injection holes 37 through which gas and nanoparticles are injected are located, and the titanium rod 51 and the titanium plate ( Between the 54), the grid rod 55 is preferably provided.

In addition, the chamber 10 having such a configuration includes a support plate 67 to be processed, for example, an organic product placed in a vertical layer in a vertical direction, and a plurality of racks 60 fixing the support plate. It is installed so as to rotate and rotate along the circumference of the titanium rod 51 by the motor (M) installed in, this configuration is cut along the line II of Fig. 2, the cross-sectional view of the chamber and Fig. It will be described in detail with reference to Figure 4 which is a cross-sectional view showing a cross section.

In the center of the upper surface of the chamber 10, the upper end is connected to the motor (M) through the reducer 62, the lower end is provided with a main shaft 61 through which the circular upper plate 63 is connected. On the bottom surface of the upper plate 63, a plurality of racks 60 having a predetermined interval along the circumferential direction are fixed to the rack shaft 64 passing through the upper plate 63, respectively, and the main shaft 61 The main gear 65 is fixedly installed on the rack shaft 64, and the planetary gears 66 external to the main gear 65 are fixed to the rack shafts 64. As the main shaft 61 rotates by a motor, The rack 60 rotates about the rack shaft 64 while pivoting around the main shaft 61.

At this time, each rack 60 is a plurality of support plates 67 are located in a plurality of layers at regular intervals in the vertical direction, such a plurality of multi-layer structure support plate 67 is removable by a plurality of vertical support bars (68). The edge part is inserted and installed so that it may be possible.

In addition, the motor (M) is electrically connected to the control unit 40 shown in FIG. 1 and rotated about the rack shaft 64 while revolving the racks 60 around the titanium rod 51 under operation control. do.

Strength improvement device according to the present invention having the above-described configuration is a device for coating a titanium thin film containing metal nanoparticles in order to increase the strength of the general glass or metal and non-metal products, the strength improvement device according to the present invention The method of increasing the strength of the product through will be described in detail with reference to FIGS.

First, for example, an organic product may be placed on each support plate 67 coupled to the rack 60 provided therein by opening and closing the door 11, which is located at the front of the chamber 10 having the above-described configuration. Top and close the door.

Thereafter, by operating the vacuum decompression device 20 by operating the control unit 40 to reduce the pressure in the chamber. Thus, the reason for depressurizing the inside of the chamber 10 may include electrons and plasma molecules generated in a subsequent process. In order to make the atoms, molecules, and ions of the thin film material move smoothly by lengthening the mean free path of atoms of the target means, and to form a pure thin film, it is preferable in the strength improving apparatus according to the present invention. The pressure is reduced to a vacuum of about 0.3 to 0.5 millitorr.

After the decompression is completed, the control unit 40 is operated to rotate and drive the motor M to engage with the motor M, the main gear 65 and the planetary gear 66 to rotate and revolve ( While rotating 60, the gas valves 34, 35, 36 are opened while turning around the titanium rod 51 to inject inert gas into the chamber 10.

Then, when the voltage is applied to the titanium rod 51 through the magnetron 52 and the electric field is formed, electrons are emitted from the titanium rod 51, and the emitted electrons collide with the inert gas in the chamber 10. Some of the inert gas molecules collided with the electrons are ionized, but most of them are not ionized and become excited and soon return to their original stable state, and emit a glow called glow to generate a plasma. do.

When such a glow discharge occurs, the emitted electrons are in a decompressed electric field in which the pressure in the chamber is about 0.3 to 0.5 millitorr, so that the temperature of the electrons continues to collide with the surrounding gas molecules while moving in a spiral direction. The glow discharge of 1000K or less is maintained.

In addition, the positive ions in the plasma move to the titanium plate 54 of the negative electrode by the force of the negative electrode, which is accelerated by the electric field formed by the magnetron 52 to fly to the target titanium plate 54 with high kinetic energy. .

When the particles impinge on the titanium plate 54 with such high kinetic energy, the titanium plate 54 may cause a collision between atoms and atoms, causing titanium atoms to fly into the air. While reacting with the inert gas, it is evenly deposited on the surface of the product which is placed on the rack 60 and rotates around the titanium rod 51.

The grid rod 55 serves to control the above reaction by increasing or decreasing the amount of electrons emitted from the titanium rod 51.

In this case, the nanoparticle valve 37 is opened to inject the nanoparticles into the chamber 10 to inject the nanoparticles stored in the nanoparticle storage device 33 into the chamber 10, and the nanoparticles injected into the chamber 10. Is preferably selected from one of Fe and W as a metal material.

As described above, when the nanoparticles are injected into the chamber 10 through the nanoparticle valve 37, the pressure of the nanoparticle storage device 33 is at a high pressure or an atmospheric pressure, and the nanoparticles are introduced. Since the pressure in the chamber 10 is reduced to about 0.3 to 0.5 millitorr, the nanoparticles ranging from several nanometers to several tens of nanometers are dispersed and scattered over the entire area of the chamber 10, where the motor Rotating and revolving the product supported by the rack 60 while (M) is rotated, so that the nanoparticles are uniformly deposited on the surface of the product.

The nanoparticle material of several tens of nanometers or less implanted in an environment in which a titanium thin film is deposited on a product is deposited by a self-aggregation method using the titanium molecule as a coupling agent medium on the surface of the product. The thin film is deposited on a titanium thin film containing silver nanoparticle material.

That is, the glass or metal and non-metallic products through the above-described process is coated with a titanium thin film having nanoparticles of iron (Fe) or tungsten (W) has a significantly improved strength.

In the above, an example of applying the apparatus of the present invention to an organic product has been described. However, the present invention may be variously applied to a product made of glass, metal, or nonmetallic material.

As described above, a product having a titanium thin film having nanoparticles deposited thereon by the strength improving device and the method according to the present invention can realize a product having substantially the same size as the general product but having an improved strength in terms of strength. do.

In addition, the finished product according to the strength improvement method according to the present invention is, for example, in the case of an organic product, a gas of 1 nanometer thick carburized inside the product, to form a titanium thin film containing nanoparticles on the surface Corrosion resistance and abrasion resistance is increased and the hardness is increased to 10,000Hv or more can have the characteristics close to the permanent material.

In particular, the use of the strength improvement device according to the present invention has the advantage that a thin film can be processed in a short time in a relatively simple process with a large amount of rigidity, and that even an inexperienced person can obtain a uniform quality product.

Claims (4)

A chamber in which a product is seated therein; A decompression device for depressurizing the inside of the chamber to a vacuum below a predetermined pressure; A plurality of gas storage devices each having a gas valve for selectively supplying at least one gas into the chamber; A nanoparticle storage device having a nanoparticle valve for selectively supplying nanoparticle materials in the chamber and storing tens of nanoscale nanoparticles therein; A pressure reducing device is controlled to reduce the inside of the chamber, an inert gas is supplied through the gas valve, and a high pressure is applied to form a thin film on the surface of the product, and at the same time stored in the nanoparticle storage device. Control unit for spraying dozens of nano-sized nanoparticles to the product inside the chamber through the nanoparticle valve Strength improvement device including The method according to claim 1, The plurality of gas storage devices store nitrogen, oxygen, and argon gas, respectively, and the nano-particle storage device stores nanoparticles in which one material selected from iron (Fe) and tungsten (W) has tens of nanometers in size. Strength improvement device A chamber comprising a titanium cathode, a magnetron that emits electrons from the cathode and forms an electric field, a titanium target to which the emitted electrons strike, and a product to be processed between the cathode and the target; A decompression device for depressurizing an internal pressure of the chamber; A gas injection device for injecting gas into the chamber; A strength improvement method using a strength improvement device including a nano particle injection device for injecting nano particles into the chamber, Depressurizing the chamber by the decompression device; Injecting gas into the chamber through the gas injection device; The target material is applied to the magnetron to emit electrons from the cathode and collide with the injected gas molecules to cause the gas to turn into a plasma to cause a glow discharge, and to cause the plasma gas to strike the target to be scattered from the target. Depositing the component molecules in a thin film on the article; Depositing a thin film including nanoparticles in a product to be processed by injecting nanoparticles having a nanoscale state into the chamber through the nanoparticle injection apparatus; Strength improvement device including The method according to claim 3, The gas is at least one selected from nitrogen, oxygen, and argon gas, and the nanoparticles injected into the chamber are nanoparticles in which the selected material of iron (Fe) and tungsten (W) has tens of nanometers in size. Device