KR200177303Y1 - Burn-in chamber apparatus of semiconductor - Google Patents

Burn-in chamber apparatus of semiconductor Download PDF

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Publication number
KR200177303Y1
KR200177303Y1 KR2019970027300U KR19970027300U KR200177303Y1 KR 200177303 Y1 KR200177303 Y1 KR 200177303Y1 KR 2019970027300 U KR2019970027300 U KR 2019970027300U KR 19970027300 U KR19970027300 U KR 19970027300U KR 200177303 Y1 KR200177303 Y1 KR 200177303Y1
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chamber
fan
air
burn
equipment
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KR2019970027300U
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KR19990013983U (en
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오경승
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김영환
현대반도체주식회사
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/286External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2862Chambers or ovens; Tanks
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/2872Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
    • G01R31/2874Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature

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  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

본 고안에 의한 반도체의 번-인 챔버장비는 내부에 번-인 보드를 구비한 챔버와, 상기 챔버의 일측 상부 및 타측 하부에 설치하여 챔버내부의 공기를 순환시키는 팬모터 및 팬과, 상기 팬의 앞쪽에 장착되는 히터와, 상기 각각 팬의 맞은편 챔버 측벽에 형성한 공기흡입구와, 상기 챔버의 일측 상단부에 설치한 배기구로 구성되어, 챔버의 측면에서 서로 엇갈리도록 팬이 동작하여 온도의 분포특성이 좋아지고, 온도의 상승시간과 하강시간이 종래의 반으로 줄여주어, 장비의 생산시간을 단축하므로 장비의 생산성을 향상시키도록 하였다.The burn-in chamber apparatus of the semiconductor according to the present invention includes a chamber having a burn-in board therein, a fan motor and a fan installed at one upper side and the other lower side of the chamber to circulate air in the chamber, and the fan A heater mounted on the front side of the chamber, an air inlet formed in the side wall of the chamber opposite to the fan, and an exhaust port installed at the upper end of one side of the chamber. The characteristics are improved, and the rise time and fall time of the temperature are reduced by half, and the production time of the equipment is shortened, thereby improving the productivity of the equipment.

Description

반도체의 번-인 챔버장비Burn-in chamber equipment of semiconductor

본 고안은 반도체의 번-인(burn-in) 챔버장비에 관한 것으로, 특히 챔버의 측면에서 서로 엇갈리도록 팬이 동작하여 온도의 분포특성이 좋아지고, 온도의 상승시간과 하강시간이 종래의 반으로 줄여주어, 장비의 생산시간을 단축하므로 장비의 생산성을 향상시키도록 한 반도체의 번-인 챔버장비에 관한 것이다.The present invention relates to a burn-in chamber device of a semiconductor, and in particular, the fan is operated to cross each other at the side of the chamber, so that the temperature distribution characteristic is improved, and the rise time and fall time of the temperature are in the conventional The present invention relates to a semiconductor burn-in chamber device that can reduce the cost of the device and shorten the production time of the device, thereby improving the productivity of the device.

종래의 기술에 의한 반도체의 번-인 챔버장비를 도 1을 참고로 설명한다.The burn-in chamber equipment of a semiconductor according to the prior art will be described with reference to FIG. 1.

챔버(10)내부의 공기를 순환시키는 팬모터(3)와, 팬(8)이 챔버(10)의 상단이나 측단에 부착되어 있다. 팬(8)의 앞쪽에 히터(4)가 장착된다. 팬모터(3)와 팬(8)에 의한 공기의 순환을 위해 팬의 반대편에 공기조절판(6)이 위치한다. 온도의 하강시 공기가 배출되는 배출구(2)가 챔버(10)의 일측 상단에 있다. 또한 온도 하강시 챔버(10)내의 원활한 배출을 위해 공기흡입구(5)가 챔버(10)의 측면에 위치해서 공기의 원활한 배출이 이루어 지도록 하였다.The fan motor 3 which circulates air in the chamber 10 and the fan 8 are attached to the upper end or side end of the chamber 10. The heater 4 is mounted to the front of the fan 8. An air conditioning plate 6 is located opposite the fan for circulation of the air by the fan motor 3 and the fan 8. At the top of one side of the chamber 10 is an outlet 2 through which air is discharged when the temperature drops. In addition, the air inlet (5) is located on the side of the chamber 10 for the smooth discharge of the chamber 10 when the temperature is lowered to facilitate the discharge of air.

챔버(10)의 측면이나 위쪽에 설치되어 있는 팬모터(3)가 팬(8)을 작동시키고, 팬(8)에 의한 공기의 흐름이 공기조절판(6)의 풍향조절기능에 의해 챔버(10)의 각 부분으로 순환된다. 이때 팬(8)의 앞부분에 히터(4)가 장착되어 있어, 더워진 공기가 순환하게 된어 전체적으로 온도가 상승하게 된는 것이다.The fan motor 3 installed on the side or the upper side of the chamber 10 operates the fan 8, and the flow of air by the fan 8 is controlled by the wind direction control function of the air conditioner 6. Cycles to each part of At this time, the heater 4 is mounted to the front of the fan 8, so that the heated air circulates, thereby increasing the temperature as a whole.

물론 위쪽의 배출구(2) 부분은 온도의 상승시에는 닫히게 되고, 온도의 하강시에는 히터(4)가 오프된고, 상기 배출구(2)가 열리게 되어, 챔버(10)안의 더운 공기가 배출된다. 특히 온도의 하강시에는 공기의 원활한 순환을 위해 공기흡입구(5)가 열리어 챔버(10)안의 더운 공기가 빠르고 쉽게 밖으로 배출되도록 돕는 역할을 한다.Of course, the upper portion of the outlet 2 is closed when the temperature rises, and when the temperature decreases, the heater 4 is turned off, and the outlet 2 is opened, so that hot air in the chamber 10 is discharged. In particular, when the temperature falls, the air inlet 5 serves to help the hot air in the rear chamber 10 to be quickly and easily discharged out for smooth circulation of the air.

도면중 미설명 부호 1은 번-인 보드를 나타내고, 9는 온도조절용 센서를 나타내며, 7은 배출구조절판을 나타낸다.In the drawings, reference numeral 1 denotes a burn-in board, 9 denotes a temperature control sensor, and 7 denotes an exhaust structure discharging plate.

그러나, 이러한 종래의 기술에서는 번-인챔버의 온도분포 특성이 ±5℃정도로 나타나며, 온도의 상승시간과 하강시간이 한시간 정도 소요된다. 이는 챔버(10) 내부의 공기순환이 좋지 않음을 나타내게 되고, 공기 순환을 위한 팬(8)의 영향력이 챔버(10)내에 골고루 미치지 않는다는 것을 나타내며, 또한 온도 하강시 밖으로 더운공기를 배출하는 출력도 낮게 되는 문제점이 있다.However, in this conventional technique, the temperature distribution characteristic of the burn-in chamber is represented by ± 5 ° C., and the rise time and fall time of the temperature take about one hour. This indicates that the air circulation inside the chamber 10 is poor, and that the influence of the fan 8 for air circulation is not evenly distributed in the chamber 10, and also the output of discharging hot air out when the temperature decreases. There is a problem that becomes low.

따라서, 본 고안의 목적은 상기와 같은 문제점을 고려하여 안출한 것으로, 챔버의 측면에서 서로 엇갈리도록 팬이 동작하여 온도의 분포특성이 좋아지고, 온도의 상승시간과 하강시간이 종래의 반으로 줄여주어, 장비의 생산시간을 단축하므로 장비의 생산성을 향상시키도록 한 반도체의 번-인 챔버장비를 제공함에 있다.Therefore, the object of the present invention is devised in consideration of the above problems, the fan is operated to cross each other in the side of the chamber to improve the temperature distribution characteristics, the temperature rise time and fall time is reduced to half of the conventional The present invention provides a burn-in chamber device for semiconductors that improves the productivity of the equipment by reducing the production time of the equipment.

도 1은 종래의 기술에 의한 반도체의 번-인 챔버장비를 나타내는 내부 구성도.1 is an internal configuration showing a burn-in chamber equipment of a semiconductor according to the prior art.

도 2는 본 고안에 의한 반도체의 번-인 챔버장비를 나타내는 내부 구성도.Figure 2 is an internal configuration showing the burn-in chamber equipment of the semiconductor according to the present invention.

(도면의 주요부분에 대한 부호의 설명)(Explanation of symbols for the main parts of the drawing)

1 ; 번-인 보드 2 ; 배기구One ; Burn-in board 2; Air vent

7 ; 배기구 조절판 10 ; 챔버7; Exhaust outlet control plate 10; chamber

21,24 ; 팬모터 22,25 ; 팬21,24; Fan motors 22,25; Pan

23,26 ; 히터 27 ; 공기흡입구23,26; Heater 27; Air intake

28 ; 풍향조절판28; Wind direction control board

이러한, 본 고안의 목적은 내부에 번-인 보드를 구비한 챔버와, 상기 챔버의 일측 상부에 설치하여 챔버내부의 공기를 순환시키는 팬모터 및 팬과, 상기 팬의 앞쪽에 장착되는 히터와, 상기 챔버의 타측 하부에 설치하여 챔버내부의 공기를 순환시키는 팬모터 및 팬과, 상기 팬의 앞쪽에 장착되는 히터와, 상기 각각 팬의 맞은편 챔버 측벽에 형성한 공기흡입구와, 상기 챔버의 일측 상단부에 설치하여 온도의 하강시 챔버내부의 공기를 배출하는 배기구와, 상기 배기구의 전면에 설치한 배기구 조절판에 의해 달성된다.The object of the present invention is a chamber having a burn-in board therein, a fan motor and a fan installed at one side of the chamber to circulate air in the chamber, a heater mounted to the front of the fan, A fan motor and a fan installed under the other side of the chamber to circulate air in the chamber, a heater mounted to the front of the fan, an air inlet formed on the side wall of the chamber opposite the fan, and one side of the chamber It is achieved by an exhaust port installed at the upper end and discharging air in the chamber when the temperature decreases, and an exhaust port control plate provided at the front of the exhaust port.

이하, 본 고안에 의한 반도체의 번-인 챔버장비를 첨부도면에 도시한 실시예에 따라서 설명한다.Hereinafter, the burn-in chamber equipment of the semiconductor according to the present invention will be described according to the embodiment shown in the accompanying drawings.

도 2는 본 고안에 의한 반도체의 번-인 챔버장비를 나타내는 내부 구성도를 보인 것으로, 이에 도시한 바와 같이, 본 고안에 의한 반도체의 번-인 챔버장비는 내부에 번-인 보드(1)를 구비한 챔버(10)와, 상기 챔버의 일측 상부에 설치하여 챔버내부의 공기를 순환시키는 팬모터(21) 및 팬(22)과, 상기 팬(22)의 앞쪽에 장착되는 히터(23)와, 상기 챔버(10)의 타측 하부에 설치하여 챔버(10)내부의 공기를 순환시키는 팬모터(24) 및 팬(25)과, 상기 팬(25)의 앞쪽에 장착되는 히터(26)와, 상기 각각 팬(22)(25)의 맞은편 챔버(10) 측벽에 형성한 공기흡입구(27)와, 상기 챔버의 일측 상단부에 설치하여 온도의 하강시 챔버내부의 공기를 배출하는 배기구(2)와, 상기 배기구의 전면에 설치한 배기구 조절판(7)으로 구성된다.Figure 2 shows an internal configuration showing the burn-in chamber equipment of the semiconductor according to the present invention, as shown in this, the burn-in chamber equipment of the semiconductor according to the present invention burn-in board (1) A chamber 10 having a chamber, a fan motor 21 and a fan 22 installed at an upper portion of the chamber to circulate air in the chamber, and a heater 23 mounted to the front of the fan 22. And a fan motor 24 and a fan 25 installed under the other side of the chamber 10 to circulate air in the chamber 10, and a heater 26 mounted in front of the fan 25. And air inlets 27 formed at side walls of the chambers 10 opposite the fans 22 and 25, respectively, and exhaust ports 2 installed at upper ends of one side of the chamber to discharge air in the chambers when the temperature decreases. ) And an exhaust port control plate 7 provided in front of the exhaust port.

상기 공기흡입구(27)의 전면에 공기흐름을 조절하는 풍향조절판(28)을 설치한다.On the front of the air inlet 27 is installed a wind direction control plate 28 for adjusting the air flow.

또한 상기 챔버의 내부에는 온도조절용 센서가 설치되어 있다.In addition, a temperature control sensor is installed inside the chamber.

본 고안의 동작을 설명하면 다음과 같다.Referring to the operation of the present invention is as follows.

온도상승시에는 배기구(2)가 닫히게 되고, 팬 모터(21)(24)에 의해 팬이 가동되면서, 히터(23)(26)의 열을 챔버 내부 전체로 공기의 순환에 의해 전달한다. 이때, 챔버측면의 공기조절판(28)에 의해 순환이 원활히 이루어 지도록 조절된다. 온도의 하강시에는 배기구(2)가 열리게 되며, 배기조절판(7)도 오픈이 되고, 히터(23)(26)가 오프되어 모터(21)(24)에 의한 팬(23)(25)의 동작으로 공기가 내부에서 순환된다. 측면의 공기흡입구(27)로 부터 외부의 공기가 흡입되므로 배기구(2)로의 공기배출이 빠른 속도로 이루어 진다.When the temperature rises, the exhaust port 2 is closed, and the fan is driven by the fan motors 21 and 24, thereby transferring the heat of the heaters 23 and 26 by the circulation of air to the entire inside of the chamber. At this time, the circulation is adjusted smoothly by the air control plate 28 of the chamber side. When the temperature decreases, the exhaust port 2 is opened, the exhaust control plate 7 is also opened, the heaters 23 and 26 are turned off, and the fans 23 and 25 by the motors 21 and 24 are turned off. In operation, air is circulated inside. Since the outside air is sucked from the air inlet 27 on the side, the air is discharged to the exhaust port 2 at a high speed.

이상에서 설명한 바와 같이, 본 고안에 의한 반도체의 번-인 챔버장비는 내부에 번-인 보드를 구비한 챔버와, 상기 챔버의 일측 상부 및 타측 하부에 설치하여 챔버내부의 공기를 순환시키는 팬모터 및 팬과, 상기 팬의 앞쪽에 장착되는 히터와, 상기 각각 팬의 맞은편 챔버 측벽에 형성한 공기흡입구와, 상기 챔버의 일측 상단부에 설치한 배기구로 구성되어, 챔버의 측면에서 서로 엇갈리도록 팬이 동작하여 온도의 분포특성이 좋아지고, 온도의 상승시간과 하강시간이 종래의 반으로 줄여주어, 장비의 생산시간을 단축하므로 장비의 생산성을 향상시키도록 한 효과가 있다.As described above, the burn-in chamber equipment of the semiconductor according to the present invention is a chamber having a burn-in board therein, and a fan motor installed in one upper part and the other lower part of the chamber to circulate air in the chamber. And a fan, a heater mounted to the front of the fan, an air inlet formed in the side wall of the chamber opposite the fan, and an exhaust port provided at an upper end of one side of the chamber, so that the fan is staggered from the side of the chamber. This operation improves the temperature distribution characteristic, and the rise time and fall time of the temperature is reduced to half of the conventional, thereby reducing the production time of the equipment has the effect of improving the productivity of the equipment.

Claims (2)

내부에 번-인 보드를 구비한 챔버와, 상기 챔버의 일측 상부에 설치하여 챔버내부의 공기를 순환시키는 팬모터 및 팬과, 상기 팬의 앞쪽에 장착되는 히터와, 상기 챔버의 타측 하부에 설치하여 챔버내부의 공기를 순환시키는 팬모터 및 팬과, 상기 팬의 앞쪽에 장착되는 히터와, 상기 각각 팬의 맞은편 챔버 측벽에 형성한 공기흡입구와, 상기 챔버의 일측 상단부에 설치하여 온도의 하강시 챔버내부의 공기를 배출하는 배기구와, 상기 배기구의 전면에 설치한 배기구 조절판으로 구성된 것을 특징으로 하는 반도체의 번-인 챔버장비.A chamber having a burn-in board therein, a fan motor and a fan installed at an upper portion of the chamber to circulate air in the chamber, a heater mounted in front of the fan, and a lower portion of the chamber A fan motor and a fan for circulating air in the chamber, a heater mounted in front of the fan, an air intake formed in the side wall of the chamber opposite the fan, and a lower portion of the chamber by lowering the temperature. Burn-in chamber equipment of the semiconductor, characterized in that consisting of an exhaust port for discharging the air inside the chamber and an exhaust control plate installed in front of the exhaust port. 제1항에 있어서, 상기 공기흡입구의 전면에 공기흐름을 조절하는 풍향조절판을 설치한 것을 특징으로 하는 반도체의 번-인 챔버장비.According to claim 1, Burn-in chamber equipment of the semiconductor, characterized in that the wind direction control plate for adjusting the air flow in front of the air inlet.
KR2019970027300U 1997-09-30 1997-09-30 Burn-in chamber apparatus of semiconductor KR200177303Y1 (en)

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