KR200143498Y1 - A semiconductor device cleaning solution analysis apparatus - Google Patents
A semiconductor device cleaning solution analysis apparatus Download PDFInfo
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- KR200143498Y1 KR200143498Y1 KR2019960007968U KR19960007968U KR200143498Y1 KR 200143498 Y1 KR200143498 Y1 KR 200143498Y1 KR 2019960007968 U KR2019960007968 U KR 2019960007968U KR 19960007968 U KR19960007968 U KR 19960007968U KR 200143498 Y1 KR200143498 Y1 KR 200143498Y1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Abstract
본 고안은 반도체세정액의 낭비를 방지하는 반도체세정액 분석장치에 관한 것으로, 반도체세정액이 저장된 세정액용기와, 상기 세정액용기로부터 제공된 세정액의 이온성분을 검출하는 제1세정액성분검출부 및 상기 세정액의 유기물성분을 검출하는 제2세정액성분검출부, 그리고 상기 세정액용기로부터 제공된 세정액을 상기 제1및 제2세정액성분검출부로 각각 공급하는 제1세정액공급라인 및 제2세정액공급라인을 구비한 반도체세정액 분석장치에 있어서, 상기 제2세정액공급라인은 상기 제1세정액성분검출부에 연결되어 상기 제1세정액검출부로부터 약액을 공급받는다. 이와같은 장치에 의해서, 한 번의 세정액 공급으로 이온검출부와 유기물검출부에 세정액을 공급할 수 있고, 따라서 세정액이 이온검출부와 유기물검출부에서 각각 배출되므로서 유발되는 세정액의 낭비를 막을 수 있다. 아울러 두 번의 샘플링과 로딩 작업에 의해 한 종류의 세정액의 성분을 분석하는 데 소요되는 시간을 줄일 수 있고, 또한 샘플링 시차에 의해 분석결과가 달라지는 문제점을 해결할 수 있다.The present invention relates to a semiconductor cleaning liquid analyzing apparatus for preventing the waste of the semiconductor cleaning liquid. The cleaning liquid container in which the semiconductor cleaning liquid is stored, the first cleaning liquid component detecting unit detecting the ionic component of the cleaning liquid provided from the cleaning liquid container, and the organic component of the cleaning liquid A semiconductor cleaning liquid analyzing apparatus having a second cleaning liquid component detecting unit for detecting and a first cleaning liquid supplying line and a second cleaning liquid supplying line for supplying a cleaning liquid provided from the cleaning liquid container to the first and second cleaning liquid component detecting units, respectively. The second washing liquid supply line is connected to the first washing liquid component detection unit and receives the chemical liquid from the first washing liquid detection unit. With such a device, the cleaning liquid can be supplied to the ion detecting unit and the organic detecting unit by one supply of the cleaning liquid, thereby preventing the waste of the cleaning liquid caused by being discharged from the ion detecting unit and the organic detecting unit, respectively. In addition, it is possible to reduce the time required to analyze the components of one type of cleaning liquid by two sampling and loading operations, and also to solve the problem that the analysis results are changed by the sampling time difference.
Description
제1도 및 제2도는 종래 반도체세정액 분석장치의 구성을 개략적으로 보여주고 있는 도면.1 and 2 schematically show the structure of a conventional semiconductor cleaning liquid analysis apparatus.
제3도 및 제4도는 본 고안의 실시예에 따른 반도체세정액 분석장치의 구성을 개략적으로 보여주고 있는 도면.3 and 4 schematically show the configuration of a semiconductor cleaning liquid analysis apparatus according to an embodiment of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
10,50 : 세정액용기 12,22,52 : 세정액공급라인10,50: Cleaning solution container 12,22,52: Cleaning solution supply line
33 : 3포트2방향밸브 14,20,24,30,54,60 : 방향밸브33: 3 port 2-way valve 14, 20, 24, 30, 54, 60: Directional valve
16,26,56 : 샘플루프라인 40,48,70 : 전기전도도검출부16, 26, 56: sample loop lines 40, 48, 70: electrical conductivity detection unit
18,28,58 : 샘플루프 34,42,64 : 이동상용액펌프18, 28, 58: sample loop 34, 42, 64: mobile phase liquid pump
[산업상의 이용분야][Industrial use]
본 고안은 반도체세정액의 분석에 관한 것으로, 좀 더 구체적으로는 반도체세정액의 낭비를 방지하는 반도체세정액 분석장치에 관한 것이다.The present invention relates to the analysis of a semiconductor cleaning liquid, and more particularly to a semiconductor cleaning liquid analysis apparatus for preventing the waste of the semiconductor cleaning liquid.
[종래 기술 및 그의 문제점][Private Technology and His Issues]
제1도는 종래 반도체세정액 분석장치의 구성을 개략적으로 보여주고있다.1 schematically shows the configuration of a conventional semiconductor cleaning liquid analysis apparatus.
제1도에서, 참조번호 A는 반도체세정액의 이온성분을 검출하는 이온검출부를 나타내고, 이 이온검출부(A)는 양이온 성분을 검출하는 양이온검출부(A')와 음이온검출부(A)로 구성되며, 참조번호 B는 반도체세정액의 유기물성분을 검출하는 유기물검출부를 나타낸다. 그리고, 참조번호 10, 50은 세정액용기를 나타내고, 14, 20, 24, 30, 54, 60은 각각 제1, 제2, 제3, 제4, 제5, 제6방향밸브, 12, 22, 52는 제1, 제2, 제3세정액 공급라인, 32, 62는 이온부세정액배출라인과 유기물부세정액배출라인, 16, 26, 56은 제1, 제2, 제3 샘플루프라인, 18, 28, 58은 제1, 제2, 제3샘플루프, 34, 42, 64는 제1, 제2, 제3이동상용액펌프, 36, 44, 66은 제1, 제2, 제3이동상용액공급라인, 38, 46, 68은 제1, 제2, 제3이동상용액배출라인, 40, 48, 70은 제1, 제2, 제3전기전도도검출부를 나타낸다.In FIG. 1, reference numeral A denotes an ion detecting unit for detecting an ionic component of a semiconductor cleaning liquid, and the ion detecting unit A is composed of a cation detecting unit A 'and an anion detecting unit A for detecting a cationic component. Reference numeral B denotes an organic substance detection unit for detecting an organic substance component of the semiconductor cleaning liquid. Reference numerals 10 and 50 denote cleaning liquid containers, and 14, 20, 24, 30, 54 and 60 denote first, second, third, fourth, fifth and sixth directional valves, 12, 22, Reference numeral 52 is a first, second and third cleaning liquid supply line, 32, 62 are ion cleaning liquid discharge line and organic material cleaning liquid discharge line, 16, 26, 56 are the first, second, third sample loop line, 18, 28, 58 are the first, second and third sample loops, 34, 42 and 64 are the first, second and third mobile phase liquid pumps, and 36, 44 and 66 are the first, second and third mobile phase liquid supplies. Lines 38, 46, and 68 represent first, second, and third mobile phase liquid discharge lines, and 40, 48, and 70 represent first, second, and third electrical conductivity detection units.
상술한 바와같은 구성을 갖는 반도체세정액 분석장치의 동작은 다음과 같다.The operation of the semiconductor cleaning liquid analyzing apparatus having the above configuration is as follows.
먼저, 이온검출부(A)에 있어서, 세정액용기(10)로부터 공급된 세정액은 제1세정액공급라인(12) 및 제1방향밸브(14)를 관통하여 제1샘플루프라인(16)으로 공급되고, 다음, 제2방향밸브(20)를 통해 음이온검출부(B)로 세정액을 공급하는 제2세정액공급라인(22)으로 공급된다.First, in the ion detection unit (A), the cleaning liquid supplied from the cleaning liquid container (10) passes through the first cleaning liquid supply line (12) and the first direction valve (14) and is supplied to the first sample loop line (16). Then, it is supplied to the second cleaning liquid supply line 22 for supplying the cleaning liquid to the negative ion detection unit (B) through the second direction valve (20).
이어서, 제2세정액공급라인(22)을 관통한 상기 세정액은 제3방향밸브(24)와 연결된 제2샘플루프라인(26)을 거쳐 제4방향밸브(30)의 제어에 의해 이온부세정액배출라인(32)으로 배출된다. 이때, 상기 제1 및 제2세정액샘플루프라인(16,26)의 제1 및 제2샘플루프(18,28)에는 상기 세정액이 채워져 있게 된다.Subsequently, the cleaning liquid passing through the second cleaning liquid supply line 22 is discharged through the second sample loop line 26 connected to the third direction valve 24 to discharge the ion cleaning liquid under the control of the fourth direction valve 30. Is discharged to line 32. At this time, the cleaning liquid is filled in the first and second sample loops 18 and 28 of the first and second cleaning solution sample lines 16 and 26.
그리고, 상기 유기물검출부(B)는 세정액용기(50)로부터 공급된 세정액이 제5방향밸브(54)와 연결된 제3샘플루프라인(56)을 관통하고, 이어 제6방향밸브(60)와 연결된 유기물부세정액배출라인(62)으로 배출된다. 여기에서도 상기 이온검출부(A)와 마찬가지로 제3샘플루프(58)에 세정액이 남아 있게 된다.In addition, the organic material detecting unit B is connected to the sixth directional valve 60 through which the cleaning liquid supplied from the cleaning liquid container 50 passes through the third sample line 56 connected to the fifth directional valve 54. It is discharged to the organic matter washing liquid discharge line 62. Here, similarly to the ion detection unit A, the cleaning solution remains in the third sample 58.
제2도는 반도체세정액 분석장치에 공급된 세정액의 이온성분 및 유기물성분 검출과정을 개략적으로 보여주고 있다.2 schematically shows a process of detecting ionic and organic components of a cleaning liquid supplied to a semiconductor cleaning liquid analyzer.
제2도를 참조하면, 제1도 반도체세정액 공급을 마친 후, 상기 이온검출부(A)의 양이온검출부(A') 및 음이온검출부(A)의 상기 제1샘플루프라인(16)과 제1이동상용액공급라인(36) 및 제1이동상용액배출라인(38), 그리고 제2샘플루프라인(26)과 제2이동상용액공급라인(44)및 제2이동상용액배출라인(46)이 서로 연결되도록 상기 제1, 제2, 제3, 그리고 제4방향밸브(14, 20, 24, 30)를 제어한다. 마찬가지로 상기 유기물검출부(B)의 제3샘플루프라인(58)과 제3이동상용액공급라인(66) 및 제3이동상용액배출라인(68)이 연결되도록 상기 제5, 제6방향밸브(54, 60)를 제어한다.Referring to FIG. 2, after supplying the semiconductor cleaning solution of FIG. 1, the first sample loop line 16 and the first mobile phase of the cation detection unit A 'and the anion detection unit A of the ion detection unit A are completed. The solution supply line 36 and the first mobile solution discharge line 38 and the second sample loop line 26 and the second mobile solution supply line 44 and the second mobile solution discharge line 46 are connected to each other. The first, second, third, and fourth directional valves 14, 20, 24, 30 are controlled. Similarly, the fifth and sixth directional valves 54 and the third sample loop line 58, the third mobile phase liquid supply line 66, and the third mobile phase liquid discharge line 68 are connected to each other. 60).
그리고, 상기 이온검출부(A)와 유기물검출부(B)에 각각 설치된 제1, 제2, 그리고 제3이동상용액펌프(34, 42, 64)를 가동하여 제1 및 제2, 제3이동상용액공급라인(36, 44, 66)으로 각각 이동상용액을 공급한다. 이 이동상용액은 이온검출부(A)에서는 각각 제2 및 제4방향밸브(20, 30), 유기물검출부(B)에서는 제6방향밸브(60)를 거쳐 상기 제1 및 제2, 그리고 제3샘플루프라인(16, 26, 56)으로 각각 공급되어서 상기 제1, 제2, 제3샘플루프(18, 28, 58)내에 남아있는 세정액을 배출시키게 된다.Then, the first, second, and third mobile phase solution pumps 34, 42, and 64 respectively installed in the ion detector A and the organic substance detector B are operated to supply the first, second, and third mobile phase solutions. The mobile phase solution is supplied to lines 36, 44, and 66, respectively. The mobile phase solution is passed through the second and fourth directional valves 20 and 30 in the ion detection unit A, and the sixth directional valve 60 in the organic matter detection unit B, respectively. It is supplied to the roof lines 16, 26 and 56, respectively, to discharge the cleaning liquid remaining in the first, second and third sample loops 18, 28 and 58.
계속해서, 상기 제1 및 제2이동상용액공급라인(36, 44)으로 이동상용액을 지속적으로 공급하면 상기 이온검출부(A)의 제1 및 제2샘플루프(18, 28)내의 세정액이 각각 제1 및 제3방향밸브(14, 24), 그리고 제1 및 제2이동상용액배출라인(38, 46)을 관통하여, 각각 양이온성분과 음이온성분을 검출하는 제1 및 제2전기전도도검출부(40, 48)로 공급된다. 마찬가지로 상기 유기물검출부(B)의 제3샘플루프(58)내의 세정액도 상기 제5방향밸브(54)와 제3이동상용액배출라인(68)을 거쳐 세정액의 유기물성분을 검출하는 제3전기전도도검출부(70)로 공급된다.Subsequently, when the mobile phase solution is continuously supplied to the first and second mobile phase solution supply lines 36 and 44, the cleaning liquids in the first and second sample loops 18 and 28 of the ion detector A are respectively removed. First and second conductivity detectors 40 through the first and third directional valves 14 and 24 and the first and second mobile phase liquid discharge lines 38 and 46 to detect cationic and anionic components, respectively. , 48). Similarly, the cleaning liquid in the third sample loop 58 of the organic material detecting unit B also passes through the fifth directional valve 54 and the third mobile phase liquid discharge line 68 to detect the organic component of the cleaning liquid. Supplied to 70.
이후, 상기 제1 및 제2전기전도도검출부(40, 48)로 공급된 상기 세정액의 전기전도도를 측정하여 제1전기전도도검출부(40)에서는 세정액의 양이온성분을 검출하고, 제2전기전도도검출부(48)에서는 세정액의 음이온성분을 검출하며, 제3전기전도도검출부(70)에서는 세정액의 유기물성분을 검출하게 된다.Subsequently, the electrical conductivity of the cleaning liquid supplied to the first and second electrical conductivity detecting units 40 and 48 is measured, and the first electrical conductivity detecting unit 40 detects the cation component of the cleaning liquid, and the second electrical conductivity detecting unit ( 48, the anion component of the cleaning liquid is detected, and the third electrical conductivity detection unit 70 detects the organic component of the cleaning liquid.
그러나, 이와같은 반도체세정액 분석장치에 있어서 세정액의 이온성분과 유기물성분을 검출하기 위하여 이온검출부와 유기물검출부에 같은세정액을 각각의 세정액공급라인을 통해 공급한다.However, in such a semiconductor cleaning liquid analyzing apparatus, the same cleaning liquid is supplied to the ion detecting unit and the organic detecting unit through the respective cleaning liquid supply lines in order to detect the ionic and organic components of the cleaning liquid.
이로 인해, 이온검출부와 유기물검출부에서 세정액이 각각 배출되므로서 많은량의 세정액이 낭비되고 있을 뿐만아니라, 두 번의 샘플링과 로딩작업에 의해 한 종류의 세정액의 성분을 분석하는 데 많은 시간이 소요되고, 또한 샘플링 시차에 의해 세정액의 분석결과가 달라지는 문제점이 발생된다.As a result, a large amount of cleaning solution is wasted as the cleaning solution is discharged from the ion detection unit and the organic detection unit, respectively, and a large amount of time is required to analyze the components of one type of cleaning solution by two sampling and loading operations. In addition, a problem arises in that the analysis result of the cleaning liquid is changed by sampling parallax.
[고안의 목적][Purpose of designation]
따라서, 상술한 문제점을 해결하기 위해 제안된 본 고안은 반도체세정액의 낭비를 방지할 수 있는 반도체세정액 분석장치를 제공하는 데 그 목적이 있다.Accordingly, an object of the present invention is to provide a semiconductor cleaning liquid analyzing apparatus capable of preventing waste of semiconductor cleaning liquid.
[고안의 구성][Composition of design]
상술한 목적을 달성하기 위한 본 고안의 특징에 의하면, 반도체세정액이 저장된 세정액용기와, 상기 세정액용기로부터 제공된 세정액의 이온성분을 검출하는 제1세정액성분검출부 및 상기 세정액의 유기물성분을 검출하는 제2세정액성분검출부, 그리고 상기 세정액용기로부터 제공된 세정액을 상기 제1 및 제2세정액성분검출부로 각각 공급하는 제1세정액공급라인 및 제2세정액공급라인을 구비한 반도체세정액 분석장치에 있어서, 상기 제2세정액공급라인은 상기 제1세정액성분검출부에 연결되어 상기 제1세정액검출부로부터 약액을 공급받는다.According to a feature of the present invention for achieving the above object, a cleaning liquid container in which a semiconductor cleaning liquid is stored, a first cleaning liquid component detecting unit for detecting an ionic component of the cleaning liquid provided from the cleaning liquid container and a second cleaning component for detecting an organic substance component of the cleaning liquid. A semiconductor cleaning liquid analyzing apparatus comprising a cleaning liquid component detection unit and a first cleaning liquid supply line and a second cleaning liquid supply line for supplying a cleaning liquid provided from the cleaning liquid container to the first and second cleaning liquid component detection units, respectively. The supply line is connected to the first cleaning liquid component detection unit and receives the chemical liquid from the first cleaning liquid detection unit.
이 특징의 바람직한 실시예에 있어서, 상기 반도체세정액 분석장치는 상기 제2세정액공급라인상에 설치된 3포트2방향밸브를 부가하여 상기 제1세정액성분검출부와 제2세정액성분검출부에 선택적으로 세정액이 공급되도록 한다.In a preferred embodiment of this aspect, the semiconductor cleaning liquid analyzing apparatus selectively adds a three-port two-way valve installed on the second cleaning liquid supply line to supply the cleaning liquid to the first cleaning liquid component detecting unit and the second cleaning liquid component detecting unit. Be sure to
[작용][Action]
이와같은 장치에 의해서, 한 번의 세정액 공급으로 이온검출부와 유기물검출부에 세정액을 공급할 수 있고, 따라서 세정액이 이온검출부와 유기물검출부에서 각각 배출되므로서 유발되는 세정액의 낭비를 막을 수 있다. 아울러 두 번의 샘플링과 로딩 작업에 의해 한 종류의 세정액의 성분을 분석하는 데 소요되는 시간을 줄일 수 있고, 샘플링 시차에 의해 분석결과가 달라지는 문제점을 해결할 수 있다.With such a device, the cleaning liquid can be supplied to the ion detecting unit and the organic detecting unit by one supply of the cleaning liquid, thereby preventing the waste of the cleaning liquid caused by being discharged from the ion detecting unit and the organic detecting unit, respectively. In addition, it is possible to reduce the time required to analyze the components of one type of cleaning liquid by two sampling and loading operations, and solve the problem that the analysis results are changed by the sampling time difference.
[실시예]EXAMPLE
이하, 본 고안의 실시예를 첨부도면 제3도 및 제4도에 의거해서 상세히 설명한다.Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS. 3 and 4 of the accompanying drawings.
제3도를 참고하면, 본 고안의 바람직한 실시예에 따른 반도체세정액 분석장치는, 세정액용기와, 세정액의 이온성분을 검출하는 제1세정액성분검출부 및 세정액의 유기물성분을 검출하는 제2세정액성분검출부, 그리고 상기 세정액용기로부터 제공된 세정액을 상기 제1 및 제2세정액성분검출부로 각각 공급하는 제1세정액공급라인 및 제2세정액공급라인을 구비한 반도체세정액 분석장치에 있어서, 상기 제2세정액공급라인은 상기 제1세정액성분검출부에 연결되어 상기 제1세정액검출부로부터 약액을 공급받는다. 이러한 장치에 의해서, 한 번의 세정액 공급으로 이온검출부와 유기물검출부에 세정액을 공급할 수 있고, 따라서 세정액이 이온검출부와 유기물검출부에서 각각 배출되므로서 유발되는 세정액의 낭비를 막을 수 있다.Referring to FIG. 3, a semiconductor cleaning liquid analyzing apparatus according to a preferred embodiment of the present invention includes a cleaning liquid container, a first cleaning liquid component detector for detecting an ionic component of the cleaning liquid, and a second cleaning liquid component detector for detecting an organic component of the cleaning liquid. And a first cleaning liquid supply line and a second cleaning liquid supply line for supplying the cleaning liquid provided from the cleaning liquid container to the first and second cleaning liquid component detection units, respectively, wherein the second cleaning liquid supply line comprises: It is connected to the first cleaning liquid component detection unit and receives the chemical liquid from the first cleaning liquid detection unit. With this apparatus, the cleaning liquid can be supplied to the ion detecting unit and the organic detecting unit by one supply of the cleaning liquid, thereby preventing the waste of the cleaning liquid caused by being discharged from the ion detecting unit and the organic detecting unit, respectively.
제3도 및 제4도에 있어서, 제1도 및 제2도에 도시된 반도체세정액 분석 장치와 동일한 기능을 갖는 구성요소에 대해서는 동일한 참조번호를 병기한다.In FIG. 3 and FIG. 4, the same reference numerals are given together about the component which has the same function as the semiconductor cleaning liquid analyzer shown in FIG. 1 and FIG.
제3도는 본 고안의 실시예에 따른 반도체세정액 분석장치의 구성을 개략적으로 보여주고 있다.3 schematically illustrates the configuration of a semiconductor cleaning liquid analysis apparatus according to an embodiment of the present invention.
제3도에서, 참조번호 A는 반도체세정액의 이온성분을 검출하는 이온검출부를 나타내고, 이 이온검출부(A)는 양이온 성분을 검출하는 양이온검출부(A')와 음이온검출부(A)로 구성되고, 참조번호 B는 반도체세정액의 유기물성분을 검출하는 유기물검출부를 나타낸다. 그리고, 참조번호 10은 세정액용기를 나타내고, 14, 20, 24, 30, 54, 60은 각각 제1, 제2, 제3, 제4, 제5, 제6방향밸브, 12, 22, 52는 제1, 제2, 제3세정액 공급라인, 32, 62는 이온부세정액배출라인과 유기물세정액배출라인, 33은 세정액의 공급을 제어하는 3포트2방향밸브, 16, 26, 56은 제1, 제2, 제3샘플루프라인, 18, 28, 58은 제1, 제2, 제3샘플루프, 34, 42, 64는 제1, 제2, 제3이동상용액펌프, 36, 44, 66은 제1, 제2, 제3이동상용액공급라인, 38, 46, 68은 제1, 제2, 제3이동상용액배출라인, 40, 48, 70은 제1, 제2, 제3전기전도도검출부를 나타낸다.In Fig. 3, reference numeral A denotes an ion detecting unit for detecting an ionic component of a semiconductor cleaning liquid, and the ion detecting unit A is composed of a cation detecting unit A 'and an anion detecting unit A for detecting a cationic component. Reference numeral B denotes an organic substance detection unit for detecting an organic substance component of the semiconductor cleaning liquid. In addition, reference numeral 10 denotes a cleaning liquid container, and 14, 20, 24, 30, 54 and 60 denote first, second, third, fourth, fifth and sixth directional valves, 12, 22 and 52, respectively. The first, second, and third cleaning liquid supply lines, 32 and 62, are the ion buoyant liquid draining line and the organic material washing liquid draining line, 33 are three port two-way valves for controlling the supply of the cleaning liquid, and 16, 26, 56 are the first, 2nd, 3rd sample line, 18, 28, 58 are 1st, 2nd, 3rd sample loop, 34, 42, 64 are 1st, 2nd, 3rd mobile phase liquid pump, 36, 44, 66 are The first, second, and third mobile phase liquid supply lines, 38, 46, and 68 are the first, second, and third mobile phase liquid discharge lines, and 40, 48, and 70 are the first, second, and third electrical conductivity detectors. Indicates.
상술한 바와같은 구성을 갖는 반도체세정액 분석장치의 동작은 다음과 같다.The operation of the semiconductor cleaning liquid analyzing apparatus having the above configuration is as follows.
먼저, 이온검출부(A)의 세정액용기(10)로부터 공급된 세정액은 제1세정액공급라인(12) 및 제1방향밸브(14)를 관통하여 제1샘플루프라인(16)으로 공급되고, 다음, 제2방향밸브(20)를 통해 음이온검출부(B)로 세정액을 공급하는 제2세정액공급라인(22)으로 공급된다.First, the cleaning liquid supplied from the cleaning liquid container 10 of the ion detecting unit A is supplied to the first sample loop line 16 through the first cleaning liquid supply line 12 and the first direction valve 14. The second cleaning liquid is supplied to the second cleaning liquid supply line 22 which supplies the cleaning liquid to the anion detector B through the second direction valve 20.
이어서, 제2세정액공급라인(22)을 관통한 상기 세정액은 제3방향밸브(24)와 연결된 제2샘플루프라인(26)을 거쳐 제4방향밸브(30)의 제어에 의해 이온검출부(A)의 이온부세정액배출라인(32)으로 공급된다.Subsequently, the cleaning liquid penetrating the second cleaning liquid supply line 22 passes through the second sample loop line 26 connected to the third direction valve 24 to control the fourth direction valve 30. ) Is supplied to the ion wash liquid discharge line (32).
그리고, 상기 세정액은 유기물검출부(B)에 세정액을 공급하는 제3세정액공급라인(52)을 거쳐 제5방향밸브(54)와 연결된 제3샘플루프라인(56)을 관통하고, 이어 제6방향밸브(60)와 연결된 유기물부세정액배출라인(62)으로 배출된다.Then, the cleaning liquid passes through the third sample loop line 56 connected to the fifth direction valve 54 through the third cleaning solution supply line 52 for supplying the cleaning solution to the organic matter detection unit B, and then in the sixth direction. It is discharged to the organic matter washing liquid discharge line 62 connected to the valve (60).
제4도는 반도체세정액 분석장치에 공급된 세정액의 이온성분 및 유기물성분 검출과정을 개략적으로 보여주고 있다.4 schematically illustrates a process of detecting ionic and organic components of a cleaning liquid supplied to a semiconductor cleaning liquid analyzer.
제4도를 참조하면, 제3도 반도체세정액 공급을 마친 후, 상기 이온검출부(A)의 양이온검출부(A')및 음이온검출부(A)의 상기 제1샘플루프라인(16)과 제1이동상용액공급라인(36)및 제1이동상용액배출라인(38), 그리고 제2샘플루프라인(26)과 제2이동상용액공급라인(44)및 제2이동상용액배출라인(46)이 서로 연결되도록 상기 제1, 제2, 제3, 그리고 제4방향밸브(14, 20, 24, 30)를 제어한다. 마찬가지로 상기 유기물검출부(B)의 제3샘플루프라인(56)과 제3이동상용액공급라인(66)및 제3이동상용액배출라인(68)이 연결되도록 상기 제5, 제6방향밸브(54, 60)를 제어한다.Referring to FIG. 4, after supplying the semiconductor cleaning solution to FIG. 3, the first sample loop line 16 and the first mobile phase of the cation detection unit A 'and the anion detection unit A of the ion detection unit A are completed. The solution supply line 36 and the first mobile solution discharge line 38 and the second sample loop line 26 and the second mobile solution supply line 44 and the second mobile solution discharge line 46 are connected to each other. The first, second, third, and fourth directional valves 14, 20, 24, 30 are controlled. Similarly, the fifth and sixth directional valves 54 and the third sample loop line 56 and the third mobile phase liquid supply line 66 and the third mobile phase liquid discharge line 68 are connected to each other. 60).
그리고, 상기 이온검출부(A)와 유기물검출부(B)에 각각 설치된 제1, 제2, 그리고 제3이동상용액펌프(34, 42, 64)를 가동하여 제1및 제2, 제3이동상용액공급라인(36, 44, 66)으로 각각 이동상용액을 공급한다. 이 이동상용액은 이온검출부(A)에서는 제2 및 제4방향밸브(20, 30), 유기물검출부(B)에서는 제6방향밸브(60)를 거쳐 상기 제1 및 제2, 그리고 제3샘플루프라인(16, 26, 56)으로 각각 공급되어서, 상기 제1, 제2, 제3샘플루프(18, 28, 58)내에 남아있는 세정액을 밀어내게 된다.Then, the first, second, and third mobile phase liquid pumps 34, 42, and 64 respectively installed in the ion detector A and the organic substance detector B are operated to supply the first, second, and third mobile phase solutions. The mobile phase solution is supplied to lines 36, 44, and 66, respectively. The mobile phase solution is passed through the first and second and third sample loops through the second and fourth directional valves 20 and 30 in the ion detection unit A and the sixth directional valve 60 in the organic matter detection unit B. Lines 16, 26 and 56 are respectively supplied to push out the cleaning liquid remaining in the first, second and third sample loops 18, 28 and 58.
계속해서, 상기 제1 및 제2이동상용액공급라인(36, 44)으로 이동상용액을 지속적으로 공급하면 상기 이온검출부(A)의 제1 및 제2샘플루프(18, 28)내의 세정액이 각각 제1 및 제3방향밸브(14, 24), 그리고 제1 및 제2이동상용액배출라인(38, 46)을 관통하여, 각각 양이온성분과 음이온성분을 검출하는 제1 및 제2전기전도도검출부(40, 48)로 공급된다. 마찬가지로 상기 유기물검출부(B)의 제3샘플루프(58)내의 세정액도 상기 제5방향밸브(54)와 제3이동상용액배출라인(68)을 거쳐 세정액의 유기물성분을 검출하는 제3전기전도도검출부(70)로 공급된다.Subsequently, when the mobile phase solution is continuously supplied to the first and second mobile phase solution supply lines 36 and 44, the cleaning liquids in the first and second sample loops 18 and 28 of the ion detector A are respectively removed. First and second conductivity detectors 40 through the first and third directional valves 14 and 24 and the first and second mobile phase liquid discharge lines 38 and 46 to detect cationic and anionic components, respectively. , 48). Similarly, the cleaning liquid in the third sample loop 58 of the organic material detecting unit B also passes through the fifth directional valve 54 and the third mobile phase liquid discharge line 68 to detect the organic component of the cleaning liquid. Supplied to 70.
이후, 상기 제1및 제2전기전도도검출부(40, 48)로 공급된 상기 세정액의 전기전도도를 측정하여 제1전기전도도검출부(40)에서는 세정액의 양이온성분을 검출하고, 제2전기전도도검출부(48)에서는 세정액의 음이온성분을 검출하며, 제3전기전도도검출부(70)에서는 세정액의 유기물성분을 검출하게 된다.Subsequently, the electrical conductivity of the cleaning liquid supplied to the first and second electrical conductivity detecting units 40 and 48 is measured, and the first electrical conductivity detecting unit 40 detects the cation component of the cleaning liquid, and the second electrical conductivity detecting unit ( 48, the anion component of the cleaning liquid is detected, and the third electrical conductivity detection unit 70 detects the organic component of the cleaning liquid.
[고안의 효과][Effect of design]
종래 반도체세정액 분석장치에 의하면, 세정액의 이온성분과 유기물성분을 검출하기 위하여 이온검출부와 유기물검출부에 각각의 세정액공급라인을 통해 세정액을 공급하였다.According to the conventional semiconductor cleaning liquid analysis apparatus, in order to detect the ionic component and the organic component of the cleaning liquid, the cleaning liquid was supplied through the cleaning liquid supply lines to the ion detection unit and the organic detection unit.
이로 인해, 이온검출부와 유기물검출부에서 세정액이 각각 배출되므로서 많은 량의 세정액이 낭비되었을 뿐만아니라, 두 번의 샘플링과 로딩 작업에 의해 한 종류의 세정액의 성분을 분석하는 데 많은 시간이 소요되었다.As a result, a large amount of cleaning solution was wasted as the cleaning solution was discharged from the ion detection unit and the organic detection unit, respectively, and a large amount of time was required for analyzing the components of one type of cleaning solution by two sampling and loading operations.
이와같은 문제점을 해결하기 위해 제안된 본 고안은, 이온검출부의 세정액배출라인과 유기물검출부의 세정액공급라인을 서로 연결하고, 이 연결된 부위에 3포트2방향밸브를 설치한다.The present invention proposed to solve the above problems, connecting the cleaning liquid discharge line of the ion detection unit and the cleaning liquid supply line of the organic detection unit with each other, a three-port two-way valve is installed in this connected portion.
그러므로, 이온검출부에서 세정액이 배출되지 않고 유기물검출부에 공급되므로서 한 번의 세정액 공급으로 샘플링작업이 완료된다.Therefore, the cleaning operation is not discharged from the ion detection unit and supplied to the organic substance detection unit, so that the sampling operation is completed by one supply of the cleaning liquid.
따라서, 세정액이 이온검출부와 유기물검출부에서 각각 배출되므로서 유발되는 세정액의 낭비를 막을 수 있다. 아울러 두 번의 샘플링과 로딩 작업에 의해 한 종류의 세정액의 성분을 분석하는 데 소요되는 시간을 줄일 수 있고 또한, 샘플링 시차에 의해 분석결과가 달라지는 문제점을 해결할 수 있다.Therefore, it is possible to prevent waste of the cleaning liquid caused by being discharged from the ion detecting unit and the organic detecting unit, respectively. In addition, it is possible to reduce the time required for analyzing the components of one type of cleaning liquid by two sampling and loading operations, and also to solve the problem that the analysis results are changed by the sampling time difference.
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| KR (1) | KR200143498Y1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100687161B1 (en) * | 1999-11-26 | 2007-02-27 | 소니 가부시끼 가이샤 | Method of cleaning wafer carrier |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112735980A (en) * | 2020-12-25 | 2021-04-30 | 北京北方华创微电子装备有限公司 | Control method of semiconductor cleaning process and semiconductor cleaning equipment |
-
1996
- 1996-04-13 KR KR2019960007968U patent/KR200143498Y1/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100687161B1 (en) * | 1999-11-26 | 2007-02-27 | 소니 가부시끼 가이샤 | Method of cleaning wafer carrier |
Also Published As
| Publication number | Publication date |
|---|---|
| KR970059836U (en) | 1997-11-10 |
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