KR20010056978A - Photocatalytic coating composition containing silicon adhesive - Google Patents
Photocatalytic coating composition containing silicon adhesive Download PDFInfo
- Publication number
- KR20010056978A KR20010056978A KR1019990058692A KR19990058692A KR20010056978A KR 20010056978 A KR20010056978 A KR 20010056978A KR 1019990058692 A KR1019990058692 A KR 1019990058692A KR 19990058692 A KR19990058692 A KR 19990058692A KR 20010056978 A KR20010056978 A KR 20010056978A
- Authority
- KR
- South Korea
- Prior art keywords
- formula
- coating composition
- titanium oxide
- photocatalyst
- photocatalyst coating
- Prior art date
Links
- 239000008199 coating composition Substances 0.000 title claims abstract description 38
- 239000000853 adhesive Substances 0.000 title claims abstract description 18
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 16
- 230000001070 adhesive effect Effects 0.000 title abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title description 2
- 229910052710 silicon Inorganic materials 0.000 title description 2
- 239000010703 silicon Substances 0.000 title description 2
- 239000011941 photocatalyst Substances 0.000 claims abstract description 49
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 25
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 23
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- -1 organo-silane compound Chemical class 0.000 claims abstract description 11
- 125000003118 aryl group Chemical group 0.000 claims abstract description 3
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims abstract 2
- 239000000758 substrate Substances 0.000 claims description 31
- 239000010409 thin film Substances 0.000 claims description 13
- 239000003054 catalyst Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000007859 condensation product Substances 0.000 claims description 2
- 239000002798 polar solvent Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 claims 1
- 230000035699 permeability Effects 0.000 abstract description 4
- 229920000642 polymer Polymers 0.000 abstract description 2
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 abstract 1
- 239000010419 fine particle Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 17
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 15
- 238000013032 photocatalytic reaction Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 239000012153 distilled water Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- STZCRXQWRGQSJD-GEEYTBSJSA-M methyl orange Chemical compound [Na+].C1=CC(N(C)C)=CC=C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-GEEYTBSJSA-M 0.000 description 3
- 229940012189 methyl orange Drugs 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000809 air pollutant Substances 0.000 description 1
- 231100001243 air pollutant Toxicity 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000009849 deactivation Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- STZCRXQWRGQSJD-UHFFFAOYSA-M sodium;4-[[4-(dimethylamino)phenyl]diazenyl]benzenesulfonate Chemical compound [Na+].C1=CC(N(C)C)=CC=C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 STZCRXQWRGQSJD-UHFFFAOYSA-M 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229920006163 vinyl copolymer Polymers 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
-
- B01J35/39—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
Abstract
Description
본 발명은 실리콘계 화합물로 이루어진 부착제 및 산화티탄 광촉매를 포함하는 광촉매 코팅 조성물에 관한 것이다.The present invention relates to a photocatalyst coating composition comprising an adhesive made of a silicon-based compound and a titanium oxide photocatalyst.
산업의 발달과 더불어 산업체 및 가정에서 수많은 유해물질과 난분해성 물질을 포함하는 각종 폐수와 대기오염 물질들이 배출되고 있지만, 이를 완벽하게 처리하기 위해서는 기존의 처리기술과 방법으로는 한계가 있다. 반도체 광촉매, 특히 산화 티탄을 이용한 광촉매 반응은 기존의 기술과 달리 오염 물질의 완전분해가 가능하며, 2차 환경오염물질을 발생시키지 않는다는 점에서 첨단 환경기술로 주목을 받고 있다.With the development of the industry, various wastewaters and air pollutants, including many harmful and hardly decomposable substances, are being discharged from the industry and the home, but there are limitations to existing treatment techniques and methods for the complete treatment. Photocatalytic reactions using semiconductor photocatalysts, especially titanium oxide, are drawing attention as advanced environmental technologies in that they can completely decompose pollutants and do not generate secondary environmental pollutants, unlike conventional technologies.
초기의 광촉매 연구는 주로 분말형태의 촉매를 반응물과 혼합한 슬러리 형태의 반응(대한민국 특허공개 제 96-702419 호)이 이루어졌으나, 이후 촉매 분리 공정을 제거하고 기상 반응의 응용을 할 수 있는 촉매 고정화 연구가 진행되었다. 기존의 분말형 촉매를 다양한 지지체에 고정화하는 연구도 많이 진행되었는데 이경우 촉매의 접착력이 떨어지는 단점이 있었다. 따라서 이런 문제점을 극복하기 위한 예로서, 대한민국 특허공개 제 94-703710 호는 유약으로 처리된 타일에 산화티탄 박막을 형성시켜 병실이나 거주 공간의 내벽에 설치하고, 형광등과 같은 일반 조명용 광원을 조사함으로써 박막에 부착된 세균이나 화합물을 광분해하는 것을 특징으로 하고 있다. 또한 대한민국 특허공개 제 95-216 호는 비닐 에스테르 및 비닐 에테르와 플루오로올레핀의 공중합체를 함유하는 플루오르화 중합체, 또는 규소계 중합체 또는 시멘트와 같은 분해성이 적은 접착제를 사용하여 산화티탄 광촉매 입자를 부착하는 광촉매 복합체를 개시한 바 있고, 대한민국 특허공개 제 96-33549 호는 유출유 처리용 산화티탄 광촉매의 지지체로 사용되는 다공성 글라스 담체에 관하여 개시하였으며, 대한민국 특허공개 제 97-700057 호는 유리와 같은 투광성 기판에 실리카 박막 등으로 이루어진 프리코트 박막을 형성하고 그 위에 산화티탄박막을 입혀 광촉매 작용과 동시에 투과성을 나타내는 것을 특징으로 한다. 또한, 촉매 입자의 크기가 작을수록 촉매활성이 증가하므로, 분말형 촉매를 사용하여 고정화하는 대신 졸-겔(sol-gel) 공정에 의해 작은 입자(<10nm)를 제조한 후 물리, 화학적 방법으로 이를 고정화하는 기술이 크게 대두되고 있다.Early photocatalyst research mainly carried out slurry reactions in which powder-type catalysts were mixed with reactants (Korea Patent Publication No. 96-702419), but then catalyst immobilization to remove the catalyst separation process and to apply gas phase reactions. The study was conducted. Many studies have also been conducted to immobilize the conventional powder catalyst on various supports. In this case, the adhesion of the catalyst is poor. Therefore, as an example for overcoming this problem, Korean Patent Publication No. 94-703710 forms a thin film of titanium oxide on a glazed tile and installs it on the inner wall of a hospital room or living space, and irradiates a light source for general lighting such as a fluorescent lamp. It is characterized by photolysis of bacteria and compounds adhering to a thin film. Also, Korean Patent Publication No. 95-216 discloses titanium oxide photocatalyst particles by using fluorinated polymers containing vinyl esters and copolymers of vinyl ethers and fluoroolefins, or low-degradable adhesives such as silicon-based polymers or cements. The photocatalyst complex has been disclosed, and Korean Patent Publication No. 96-33549 discloses a porous glass carrier used as a support for a titanium oxide photocatalyst for treating effluent oil, and Korean Patent Publication No. 97-700057 discloses A precoat thin film made of a silica thin film or the like is formed on a light-transmissive substrate, and a titanium oxide thin film is coated thereon to exhibit photocatalytic action and transmittance. In addition, since the catalytic activity increases as the size of the catalyst particles decreases, instead of immobilization using a powdered catalyst, small particles (<10 nm) are produced by a sol-gel process and then physically and chemically The technology to fix this is emerging.
부착제를 이용한 광촉매의 고정화에 관한 미국 특허 제 5,755,867 호에서는 R1 2SiX2, R1SiX3및 SiX4(이 때 R1은 수소원자 또는 1 내지 4개의 탄소원자를 갖는 1가의 유기기, X는 염소, 브롬 또는 1 내지 4 개의 탄소원자를 갖는 알콕시기이다)로 표기되는 실리콘 화합물을 각각 1 내지 40 몰%, 30 내지 80 몰% 및 0 내지 20 몰%로 혼합하여 부분 축중합하여 오가노폴리실록산을 합성하고, 여기에 실리카 졸을 첨가하거나 이렇게 제조된 용액에 에탄올과 프로필렌 글라이콜 모노메틸 에테르가 혼합된 유기용매에 산화 티탄 졸을 분산시켜 기판에 코팅하는 방법을 사용하여 부착성을 향상시킨 바 있으나, 광촉매 활성이 저해되었다는 문제점이 있다.U.S. Pat.No. 5,755,867, which relates to the immobilization of photocatalysts using an adhesive, discloses R 1 2 SiX 2 , R 1 SiX 3 and SiX 4 , wherein R 1 is a hydrogen atom or a monovalent organic group having 1 to 4 carbon atoms, X Is a chlorine, bromine or an alkoxy group having 1 to 4 carbon atoms) and partially condensation-polymerizes the organopolysiloxane by mixing 1 to 40 mol%, 30 to 80 mol% and 0 to 20 mol%, respectively. Synthesis was performed by adding a silica sol or dispersing a titanium oxide sol in an organic solvent mixed with ethanol and propylene glycol monomethyl ether in the solution thus prepared and coating it on the substrate. However, there is a problem that photocatalytic activity is inhibited.
이에 본 발명자들은 부착성과 투과성이 우수하면서도 광촉매 활성이 우수한 광촉매 코팅 조성물을 제조하기 위해 계속 연구를 진행한 결과, 광촉매 조성물에 특정의 오가노실란 화합물을 주성분으로 하는 부착제를 첨가함으로써 이를 해결할 수 있음을 발견하여 본 발명을 완성하였다.Accordingly, the present inventors have continued to research a photocatalytic coating composition having excellent adhesion and permeability and excellent photocatalytic activity, and thus, the present inventors can solve this problem by adding an adhesive mainly composed of a specific organosilane compound to the photocatalyst composition. The present invention was completed by finding out.
본 발명의 목적은 상기 문제점을 해결하여 부착성과 투과성이 향상됨과 동시에 광촉매 활성이 극대화된 광촉매 코팅 조성물을 제공하는 것이다.An object of the present invention to solve the above problems is to provide a photocatalyst coating composition with improved adhesion and transmittance and at the same time maximize the photocatalytic activity.
도 1은 본 발명의 산화티탄 광촉매 코팅 조성물이 코팅된 기판 구조의 단면도를 나타낸 것이고,1 shows a cross-sectional view of a substrate structure coated with the titanium oxide photocatalyst coating composition of the present invention,
도 2는 기판에 코팅된 산화티탄 광촉매 박막에 대한 X-선 회절 스펙트럼을 나타낸 것이고,2 shows an X-ray diffraction spectrum of a titanium oxide photocatalyst thin film coated on a substrate,
도 3은 광촉매 반응 장치의 한 예를 도시한 개략도이고,3 is a schematic diagram showing an example of a photocatalytic reaction device,
도 4는 본 발명의 코팅 조성물의 반응시간에 따른 광촉매 반응 결과를 나타낸 그래프이다.Figure 4 is a graph showing the photocatalytic reaction results according to the reaction time of the coating composition of the present invention.
상기 목적을 달성하기 위해, 하기 화학식 1의 오가노실란 화합물과, 하기 화학식 2 또는 3의 오가노실란 화합물, 또는 이들의 혼합물과의 부분 축중합물을 주성분으로 하는 부착제 및 미립 산화티탄 광촉매를 1:0.5 내지 1:5의 중량비로 포함하는 광촉매 코팅 조성물을 제공한다:In order to achieve the above object, an adhesive and a particulate titanium oxide photocatalyst having a partial condensation product of an organosilane compound represented by the following Chemical Formula 1, an organosilane compound represented by the following Chemical Formula 2 or 3, or a mixture thereof as a main component It provides a photocatalyst coating composition comprising a weight ratio of: 0.5 to 1: 5:
화학식 1Formula 1
R1 2SiR2 2 R 1 2 SiR 2 2
화학식 2Formula 2
R1SiR2 3 R 1 SiR 2 3
화학식 3Formula 3
SiR2 4 SiR 2 4
상기 식에서, R1은 C1-4알킬, 바람직하게는 메틸기 또는 아릴기이며, R2는 C1-4알콕시기, 바람직하게는 메톡시기 또는 에톡시기이다.Wherein R 1 is C 1-4 alkyl, preferably methyl or aryl, and R 2 is C 1-4 alkoxy, preferably methoxy or ethoxy.
이하 본 발명을 좀더 상세하게 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명의 광촉매 코팅 조성물은 부착제 성분으로서 상기 화학식 1의 오가노실란 화합물을 필수성분으로 하고, 여기에 화학식 2 또는 3의 화합물, 또는 이들의 혼합물을 선택적으로 혼합한 혼합물을 부분 중축합시킨 생성물을 포함한다.The photocatalyst coating composition of the present invention is a product obtained by partially polycondensing a mixture of an organosilane compound of Formula 1 as an essential ingredient as an adhesive component, and optionally a mixture of a compound of Formula 2 or 3 or a mixture thereof It includes.
본 발명에 따른 부착제 제조시 화학식 1의 화합물은 30 내지 70 몰%의 양으로 사용되고, 화학식 2의 화합물은 0 내지 50몰%의 양으로 사용되며, 화학식 3의 화합물은 0 내지 70 몰%의 양으로 사용될 수 있으며, 상기 부착제는 상기 오가노실란 화합물들을 용매 및 물 중에서 20 내지 80℃, 바람직하게는 30 내지 60℃의 온도에서 가수분해 촉매의 존재하에 축중합하여 제조될 수 있다. 바람직한 극성용매로는 알콜, 또는 알콜 및 증류수의 중량비가 5:1 내지 50: 1인 알콜 수용액을 들 수 있고, 가수분해 촉매로는 예를 들면 산을 사용할 수 있다.In preparing the adhesive according to the present invention, the compound of formula 1 is used in an amount of 30 to 70 mol%, the compound of formula 2 is used in an amount of 0 to 50 mol%, and the compound of formula 3 is 0 to 70 mol% It may be used in an amount, and the adhesive may be prepared by condensation of the organosilane compounds in the presence of a hydrolysis catalyst at a temperature of 20 to 80 ° C, preferably 30 to 60 ° C in a solvent and water. Preferred polar solvents include alcohols or aqueous solutions of alcohols in which the weight ratio of alcohols and distilled water is 5: 1 to 50: 1. For example, an acid can be used as the hydrolysis catalyst.
본 발명의 광촉매 코팅 조성물에는 광촉매로서 미립 산화티탄을 사용하는데, 이 때 입자의 평균크기는 2 내지 20nm인 것이 바람직하다.In the photocatalyst coating composition of the present invention, fine titanium oxide is used as the photocatalyst, and the average size of the particles is preferably 2 to 20 nm.
본 발명의 광촉매 코팅 조성물은 상기 부착제, 첨가용매, 및 산화티탄 졸을 1 : 0.5 : 0.5 내지 1 : 2 : 5의 무게비, 바람직하게는 약 1 : 1.3 : 1.6의 무게비로 혼합하여 교반한 후 초음파 파쇄(sonication)하여 수득할 수 있다. 상기 첨가 용매는 예를 들면 알콜(바람직하게는 이소프로필알콜) 수용액이며, 이 때 알콜은 30 내지 90 중량%로 혼합되는 것이 바람직하다.The photocatalyst coating composition of the present invention is mixed with the adhesive, the additive solvent, and the titanium oxide sol in a weight ratio of 1: 0.5: 0.5 to 1: 2: 5, preferably in a weight ratio of about 1: 1.3: 1.6, followed by stirring It can be obtained by sonication. The additive solvent is, for example, an aqueous alcohol (preferably isopropyl alcohol) solution, wherein the alcohol is preferably mixed at 30 to 90% by weight.
본 발명의 광촉매 코팅 조성물에는 광촉매 활성을 더욱 증진시키기 위해 본 발명의 효과를 해치지 않는 범위내에서 추가의 성분들, 예를 들면 V, Cr, Mn, Fe, Co, Ni, Cu, Mo, Rh, Pd, Tr, Pt 등의 금속을 첨가할 수 있다.The photocatalyst coating composition of the present invention may further contain additional components such as V, Cr, Mn, Fe, Co, Ni, Cu, Mo, Rh, to the extent that the effects of the present invention are not impaired in order to further enhance the photocatalytic activity. Metals, such as Pd, Tr, and Pt, can be added.
본 발명의 광촉매 코팅 조성물을 기판, 예를 들어 유리 또는 플라스틱 기판에 코팅하는 데에는 통상적인 코팅방법이 모두 적용가능하며, 예를 들어 침지(dipping)법, 스프레이법, 스핀 코팅법 등을 사용할 수 있다. 기판에 코팅 조성물을 코팅한 후 상온에서 건조시킨 다음 50 내지 150℃의 온도에서 2 내지 12 시간 동안 경화시켜 광촉매 박막을 형성시킬 수 있다. 기판에 코팅된 부착제 함유 광촉매 박막은 20 내지 200nm의 두께를 갖는 것이 바람직하며, 박막 중의 산화티탄은 10 내지 50 nm 범위의 평균입경을 갖고 아나타제 결정형을 갖는 것이 바람직하다.In order to coat the photocatalyst coating composition of the present invention on a substrate, for example, a glass or plastic substrate, all conventional coating methods may be applied. For example, a dipping method, a spray method, a spin coating method, or the like may be used. . After coating the coating composition on the substrate, it is dried at room temperature and then cured at a temperature of 50 to 150 ℃ for 2 to 12 hours to form a photocatalyst thin film. The adhesive-containing photocatalyst thin film coated on the substrate preferably has a thickness of 20 to 200 nm, and the titanium oxide in the thin film preferably has an average particle diameter in the range of 10 to 50 nm and has an anatase crystalline form.
본 발명의 실리콘계 부착제가 첨가된 광촉매 코팅 조성물은 장시간에 걸쳐 광촉매적 기능을 유지할 뿐만 아니라 중온 범위에서도 열처리가 가능하기 때문에 플라스틱과 같이 내열성이 떨어지는 기질에도 적용가능하며 열처리를 위한 특별한 장치가 필요하지 않고 고온에서의 열처리로 야기될 수 있는 광촉매의 활성 저하를 방지할 수 있다. 또한 기질상에 투명한 박막을 형성함으로써 광조사 효율을 증대시킴과 동시에 투명성이 요구되는 다양한 구조물, 특히 유리창이나 타일 등에 적용하여 특별한 장치를 사용하지 않고도 획기적인 광촉매 효과를 얻을 수 있다.The photocatalyst coating composition to which the silicone-based adhesive agent of the present invention is added is not only maintains a photocatalytic function for a long time but also can be heat-treated in a medium temperature range, so that it is applicable to a substrate having low heat resistance, such as plastic, and does not require a special device for heat treatment. It is possible to prevent the deactivation of the photocatalyst which may be caused by the heat treatment at a high temperature. In addition, by forming a transparent thin film on the substrate to increase the light irradiation efficiency and at the same time can be applied to a variety of structures that require transparency, in particular glass windows or tiles, it can achieve a breakthrough photocatalytic effect without using a special device.
이하 본 발명을 하기 실시예에 의하여 더욱 상세하게 설명하고자 한다. 단, 하기 실시예는 본 발명을 예시하기 위한 것일 뿐, 본 발명의 범위가 이들만으로 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the following examples. However, the following examples are only for illustrating the present invention, and the scope of the present invention is not limited thereto.
제 조 예 : 부착제의 제조Preparation Example: Preparation of Adhesive
이소프로필알콜을 용매로하여 디메틸디메톡시실란과 테트라에톡시실란을1:0.56의 중량비로 혼합한 후, 여기에 이소프로필알콜 및 증류수가 20:1의 중량비로 혼합되고 질산을 첨가하여 pH를 2로 맞춘 알콜 수용액을 조금씩 액적하여 오가노폴리실록산 화합물을 합성하였다. 이 때 반응온도는 30 내지 60℃로 유지하고 2 내지 4 시간 동안 반응시켰다.Dimethyldimethoxysilane and tetraethoxysilane were mixed in a weight ratio of 1: 0.56 using isopropyl alcohol as a solvent, and then, isopropyl alcohol and distilled water were mixed in a weight ratio of 20: 1, and nitric acid was added to pH 2 The aqueous solution of alcohol adjusted with quenched drops little by little to synthesize an organopolysiloxane compound. At this time, the reaction temperature was maintained at 30 to 60 ℃ and reacted for 2 to 4 hours.
광촉매 코팅 조성물의 제조Preparation of Photocatalyst Coating Composition
실 시 예 1Example 1
상기 제조예 1에서 제조된 부착제 조성물, 이소프로필알콜 및 증류수가 7:1의 중량비로 혼합된 용액 및 입자상 산화티탄이 30% 함유된 산화티탄 졸을 1:1.3:1.6의 중량비로 혼합하여 교반한 후 20 내지 30분 동안 초음파 파쇄하여 본 발명에 따른 광촉매 코팅 조성물을 제조하였다.The adhesive composition prepared in Preparation Example 1, isopropyl alcohol and a solution of distilled water mixed at a weight ratio of 7: 1 and titanium oxide sol containing 30% of particulate titanium oxide were mixed and stirred at a weight ratio of 1: 1.3: 1.6. After the ultrasonic crushing for 20 to 30 minutes to prepare a photocatalyst coating composition according to the present invention.
실 시 예 2Example 2
이소프로필알콜 및 증류수가 7:10의 중량비로 혼합된 용액을 사용하는 것을 제외하고는 상기 실시예 1과 동일한 방법으로 광촉매 코팅 조성물을 제조하였다.A photocatalyst coating composition was prepared in the same manner as in Example 1, except that a solution mixed with isopropyl alcohol and distilled water at a weight ratio of 7:10 was used.
비 교 예 1Comparative Example 1
부착제를 첨가하지 않는 것을 제외하고는 상기 실시예 1과 동일한 방법으로 광촉매 코팅 조성물을 제조하였다.A photocatalyst coating composition was prepared in the same manner as in Example 1 except that no adhesive was added.
광촉매 코팅 조성물의 적용Application of the Photocatalyst Coating Composition
실 시 예 3Example 3
유리기판을 증류수로 세척하고 아세톤 중에서 30분 동안 표면을 초음파 세척한 다음, 상기 실시예 1에서 제조된 광촉매 코팅 조성물을 유리기판에 침지-코팅(dip-coating)한 후, 상온에서 충분히 건조시키고, 80 내지 150℃의 온도에서 2 내지 12 시간 동안 경화시켰다.After washing the glass substrate with distilled water and ultrasonically washing the surface in acetone for 30 minutes, the photocatalyst coating composition prepared in Example 1 was dip-coated on the glass substrate, and then sufficiently dried at room temperature, Curing was carried out at a temperature of 80 to 150 ° C. for 2 to 12 hours.
도 1은 산화 티탄 광촉매 코팅 조성물이 코팅된 기판 구조의 단면도를 나타낸 것이고, 도 2는 기판에 코팅된 산화티탄 광촉매 박막에 대한 X-선 회절 스펙트럼을 나타낸 것이다.FIG. 1 shows a cross-sectional view of a substrate structure coated with a titanium oxide photocatalyst coating composition, and FIG. 2 shows an X-ray diffraction spectrum of a titanium oxide photocatalyst thin film coated on a substrate.
실 시 예 4Example 4
상기 실시예 2에서 제조된 광촉매 코팅 조성물을 사용하는 것을 제외하고는 상기 실시예 3과 동일한 방법으로 광촉매 코팅 조성물을 유리기판에 적용하였다.The photocatalyst coating composition was applied to the glass substrate in the same manner as in Example 3 except that the photocatalyst coating composition prepared in Example 2 was used.
비 교 예 2Comparative Example 2
상기 비교예 1에서 제조된 광촉매 코팅 조성물을 사용하는 것을 제외하고는 상기 실시예 3과 동일한 방법으로 광촉매 코팅 조성물을 유기기판에 적용하였다.The photocatalyst coating composition was applied to the organic substrate in the same manner as in Example 3, except that the photocatalyst coating composition prepared in Comparative Example 1 was used.
광촉매 반응시험Photocatalytic Reaction Test
시 험 예 1Test Example 1
메틸오렌지를 증류수에 희석시켜 12 ppm의 메틸오렌지 수용액을 조제하고, 도 3에 나타낸 광촉매 반응장치를 이용하여, 이를 테플론 재질의 반응조에 주입한 후, 광촉매 코팅 조성물이 적용된 상기 실시예 3의 유리기판을 반응조에 함침하고, 10 W, 파장 254nm인 UV 램프 1개를 상단에서 조사하여 광촉매 반응시험을 수행하였다.After diluting methyl orange in distilled water to prepare a 12 ppm aqueous methyl orange solution, using the photocatalytic reactor shown in FIG. 3, injecting it into a Teflon reactor, and then applying the photocatalyst coating composition to the glass substrate of Example 3 Was impregnated in a reaction tank, and a photocatalytic reaction test was conducted by irradiating one UV lamp having a wavelength of 254 nm with 10 W.
반응 시간에 따른 메틸오렌지의 농도를 UV-분광광도계(spectrometer)를 이용하여 분석하였으며, 이를 도 4에 나타내었다.The concentration of methyl orange over the reaction time was analyzed using a UV-spectrometer, which is shown in FIG. 4.
시 험 예 2Test Example 2
본 발명의 광촉매 코팅 조성물이 적용된, 상기 실시예 4의 유리기판을 사용하는 것을 제외하고는 상기 시험예 1와 동일한 방법으로 광촉매 반응시험을 수행하였으며, 그 결과는 도 4에 나타내었다.The photocatalytic reaction test was conducted in the same manner as in Test Example 1, except that the glass substrate of Example 4, to which the photocatalyst coating composition of the present invention was applied, was shown in FIG. 4.
시 험 예 3Test Example 3
10 W, 파장 365nm인 UV 램프를 사용하는 것을 제외하고는 상기 시험예 1과 동일한 방법으로 실시예 3의 유리기판을 사용하여 광촉매 반응시험을 수행하였으며, 그 결과는 도 4에 나타내었다.A photocatalytic reaction test was performed using the glass substrate of Example 3 in the same manner as in Test Example 1, except that a UV lamp having a wavelength of 10 W and a wavelength of 365 nm was used, and the results are shown in FIG. 4.
시 험 예 4Test Example 4
40 W, 파장 365nm인 UV 램프를 사용하는 것을 제외하고는 상기 시험예 1과 동일한 방법으로 실시예 3의 유리기판을 사용하여 광촉매 반응시험을 수행하였으며, 그 결과는 도 4에 나타내었다.A photocatalytic reaction test was conducted using the glass substrate of Example 3 in the same manner as in Test Example 1, except that a UV lamp having a wavelength of 40 W and a wavelength of 365 nm was used, and the results are shown in FIG. 4.
시 험 예 5Test Example 5
상기 비교예 2의 유리기판을 사용하는 것을 제외하고는 상기 시험예 1과 동일한 방법으로 광촉매 반응시험을 수행하였으며, 그 결과는 도 4에 나타내었다.A photocatalytic reaction test was conducted in the same manner as in Test Example 1, except that the glass substrate of Comparative Example 2 was used, and the results are shown in FIG. 4.
도 4에서 보듯이, 본 발명의 광촉매 코팅 조성물이 코팅된 유리기판의 광촉매 활성은 비교예 2에서 제조된 유리기판에 비하여 메틸오렌지를 분해하는 효율이 높은 것을 알 수 있다.As shown in Figure 4, it can be seen that the photocatalytic activity of the glass substrate coated with the photocatalyst coating composition of the present invention has a higher efficiency of decomposing methyl orange as compared to the glass substrate prepared in Comparative Example 2.
투과성 시험Permeability test
시 험 예 6Test Example 6
광직선 투과율 측정기(일본 Shimadzu Corporation사 제품 UV-3100PC)에 상기 실시예 3 및 4, 및 비교예 2의 유리기판을 장착한 후, 550nm의 파장에서의 광의 직선 투과율(%)을 측정하여 그 결과를 하기 표 1에 나타내었다.After attaching the glass substrates of Examples 3 and 4 and Comparative Example 2 to an optical linear transmittance meter (UV-3100PC manufactured by Shimadzu Corporation, Japan), the linear transmittance (%) of light at a wavelength of 550 nm was measured and the result was obtained. It is shown in Table 1 below.
여기에서 보듯이, 본 발명의 광촉매 코팅 조성물의 광직선 투과율은 비교에 2의 유리기판에 비하여 현저하게 높은 것을 알 수 있다.As shown here, it can be seen that the light linear transmittance of the photocatalyst coating composition of the present invention is remarkably higher than that of the glass substrate of 2 in comparison.
부착성 시험Adhesion test
시 험 예 7Test Example 7
상기 실시예 3 및 4, 및 비교예 2의 유리기판을 3H 및 H 연필로 긁어 광촉매 코팅 조성물의 부착성을 측정하였다. 그 결과, 본 발명의 실시예 3 및 4의 유리기판에서는 광촉매 코팅 조성물이 3H 연필에 의해 벗겨졌으며, 비교예 2의 유리기판에서는 광촉매 코팅 조성물이 H 연필로도 쉽게 벗겨져, 본 발명의 광촉매 코팅 조성물이 기판에 대한 부착성이 높음을 알 수 있다.The glass substrates of Examples 3 and 4 and Comparative Example 2 were scraped with 3H and H pencils to measure the adhesion of the photocatalyst coating composition. As a result, in the glass substrates of Examples 3 and 4 of the present invention, the photocatalyst coating composition was peeled off by the 3H pencil, and in the glass substrate of Comparative Example 2, the photocatalyst coating composition was easily peeled off even with the H pencil, and the photocatalyst coating composition of the present invention was It can be seen that the adhesion to the substrate is high.
본 발명에 따른 부착제가 포함된 광촉매 코팅 조성물은 부착성 및 투명성이 우수하면서도 광촉매 반응 효율이 극대화되어 다양한 대기처리 기술에 폭넓게 응용될 수 있으며, 공기 정화용 장치나 대기 중의 휘발성 유기용매나 악취물질, 기타 오염물질을 효과적으로 제거하기 위한 코팅제로 응용될 수 있다.The photocatalyst coating composition including the adhesive according to the present invention is excellent in adhesion and transparency while maximizing the photocatalytic reaction efficiency, so that it can be widely applied to various air treatment technologies, air purification devices, volatile organic solvents or odorous substances in the air, and the like. It can be applied as a coating to effectively remove contaminants.
Claims (7)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-1999-0058692A KR100380550B1 (en) | 1999-12-17 | 1999-12-17 | Photocatalytic coating composition containing silicon adhesive |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-1999-0058692A KR100380550B1 (en) | 1999-12-17 | 1999-12-17 | Photocatalytic coating composition containing silicon adhesive |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20010056978A true KR20010056978A (en) | 2001-07-04 |
| KR100380550B1 KR100380550B1 (en) | 2003-04-16 |
Family
ID=19626674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-1999-0058692A KR100380550B1 (en) | 1999-12-17 | 1999-12-17 | Photocatalytic coating composition containing silicon adhesive |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR100380550B1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010100052A (en) * | 2001-08-03 | 2001-11-14 | 위승용 | Paint for antibiosis and removal of volatile organic compound |
| JP2012140621A (en) * | 2010-12-31 | 2012-07-26 | Eternal Chemical Co Ltd | Coating composition and uses thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3444012B2 (en) * | 1995-03-24 | 2003-09-08 | 松下電工株式会社 | Method of forming inorganic paint film |
| JP3682506B2 (en) * | 1996-10-30 | 2005-08-10 | Ｊｓｒ株式会社 | Coating composition |
| JPH10176140A (en) * | 1996-12-18 | 1998-06-30 | Sumitomo Chem Co Ltd | Photocatalyst coating composition and photocatalyst |
| JPH1161044A (en) * | 1997-08-07 | 1999-03-05 | Jsr Corp | Building material |
-
1999
- 1999-12-17 KR KR10-1999-0058692A patent/KR100380550B1/en not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20010100052A (en) * | 2001-08-03 | 2001-11-14 | 위승용 | Paint for antibiosis and removal of volatile organic compound |
| JP2012140621A (en) * | 2010-12-31 | 2012-07-26 | Eternal Chemical Co Ltd | Coating composition and uses thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100380550B1 (en) | 2003-04-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Addamo et al. | Photocatalytic thin films of TiO2 formed by a sol–gel process using titanium tetraisopropoxide as the precursor | |
| KR101021567B1 (en) | Photocatalyst, preparing method thereof and process for decomposing volatile organic composite using the same | |
| WO2002038272A1 (en) | Preparation of firmly-anchored photocatalitically-active titanium dioxide coating films with non-gelled organic-doped precursors | |
| KR100364729B1 (en) | Method for preparing Titanium dioxide film on polymer substrate | |
| JP4771574B2 (en) | Photocatalyst composition | |
| KR100380550B1 (en) | Photocatalytic coating composition containing silicon adhesive | |
| JPWO2003033144A1 (en) | Photocatalyst composite, coating solution for forming photocatalyst layer, and photocatalyst carrying structure | |
| JP3791067B2 (en) | Photocatalyst composition and glass article | |
| JPH09613A (en) | Article with silica film containing powder of functional substance | |
| KR101990338B1 (en) | Visible-light responsive photocatalytic coating composition and preparation methods thereof | |
| KR20160123188A (en) | Visible-light responsive photocatalytic coating composition and preparation methods thereof | |
| JPH09248467A (en) | Composition for forming titanaium oxide membrane and photocatalyst structure using the same | |
| JP3103975B2 (en) | Photochemical reactor element containing microencapsulated titanium oxide photocatalyst | |
| KR100482649B1 (en) | Direct adhesion method of photocatalyst on substrate | |
| JP2000302422A (en) | Coating composition for forming photocatalyst film | |
| JP2006136758A (en) | Photocatalyst composition and photocatalyst member | |
| JP4849862B2 (en) | Novel heteropolyacid salt, photocatalyst using the same, and photocatalytic functional member | |
| JP3806998B2 (en) | PHOTOCATALYST COMPOSITION, FORMING AGENT THEREOF, AND SUBSTRATE WITH PHOTOCATALYST COMPOSITION | |
| US6805739B2 (en) | Component and manufacture of a photo-catalyst | |
| KR20090090585A (en) | Method for decomposing volatile organic compound using novel titanium dioxide catalyst with the increased specific surface | |
| JP2013107068A (en) | Method for manufacturing visible light response-type titanium dioxide-silicon dioxide-based photocatalyst coating solution and visible light response-type titanium dioxide-silicon dioxide-based photocatalyst coating solution | |
| JP5065636B2 (en) | Method for producing optical semiconductor fine particles | |
| KR100332366B1 (en) | Photocatalyst-coating on polymer substrates for UV protection and self cleanning, and the method of preraration of photocatalyst sol | |
| JP2000102733A (en) | Use of photolysis catalyst and production of hydrogen | |
| JPH11290696A (en) | Photocatalyst base material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E701 | Decision to grant or registration of patent right | ||
| GRNT | Written decision to grant | ||
| FPAY | Annual fee payment |
Payment date: 20060403 Year of fee payment: 4 |
|
| LAPS | Lapse due to unpaid annual fee |