KR20010021222A - Probe contact state detecting method and probe contact state detecting apparatus - Google Patents
Probe contact state detecting method and probe contact state detecting apparatus Download PDFInfo
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- KR20010021222A KR20010021222A KR1020000045239A KR20000045239A KR20010021222A KR 20010021222 A KR20010021222 A KR 20010021222A KR 1020000045239 A KR1020000045239 A KR 1020000045239A KR 20000045239 A KR20000045239 A KR 20000045239A KR 20010021222 A KR20010021222 A KR 20010021222A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/04—Housings; Supporting members; Arrangements of terminals
- G01R1/0408—Test fixtures or contact fields; Connectors or connecting adaptors; Test clips; Test sockets
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/025—Measuring very high resistances, e.g. isolation resistances, i.e. megohm-meters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/26—Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables
- G01R27/2605—Measuring capacitance
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2801—Testing of printed circuits, backplanes, motherboards, hybrid circuits or carriers for multichip packages [MCP]
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Abstract
Description
본 출원은 1999년 8월 6일자로 일본국 특허청에 출원된 특허출원 제1999-224479호에 개시된 내용을 기초로 파리조약상의 우선권을 주장하여 이루어진 것이다.This application is made by claiming priority under the Paris Treaty on the basis of the contents disclosed in Japanese Patent Application No. 1999-224479 filed with the Japan Patent Office on August 6, 1999.
본 발명은 복수의 칩부품이 내장된 다중 칩의 칩단자간의 절연저항, 혹은 칩저항의 저항치를 측정하기 위하여 각 칩단자에 접촉시킨 프로브의 접촉상태를 검출하는 프로브 접촉상태 검출방법 및 프로브 접촉상태 검출장치에 관한 것이다.The present invention provides a probe contact state detection method and a probe contact state for detecting a contact state of a probe in contact with each chip terminal in order to measure insulation resistance between chip terminals of a plurality of chip components having a plurality of chip components therein or the resistance value of the chip resistance. It relates to a detection device.
전자기기가 소형 및 경량화 됨에 따라 저항이나 콘덴서 등과 같은 복수의 칩부품이 동일 패키지 내에 수납된 다중 칩이 보급되고 있다. 다중 칩은, 협소한 공간에 복수의 칩부품을 수납하기 때문에 절연의 불량 등과 같은 문제가 일어나기 쉽다. 이 때문에, 다중 칩을 제조한 후에는 다중 칩내부의 칩간의 절연저항을 측정하여 절연이 불량한지를 검사한다.As electronic devices become smaller and lighter, multiple chips, in which a plurality of chip parts such as resistors and capacitors are housed in the same package, have become popular. Since multiple chips store a plurality of chip components in a narrow space, problems such as poor insulation are likely to occur. Therefore, after the manufacture of the multiple chips, the insulation resistance between the chips inside the multiple chips is measured to check whether the insulation is poor.
절연저항의 측정에는 절연 저항 측정기가 이용된다. 절연 저항 측정기는 다중 칩 등의 피 검사체에 접촉되는 프로브와 직류전원과 전류계를 구비하며, 프로브를 피 검사체의 단자에 접촉시킨 상태에서 피 검사체에 전압을 인가하고 프로브간에 흐르는 누설 전류(leakage current)를 측정하여 절연저항을 구한다.An insulation resistance measuring instrument is used to measure insulation resistance. The insulation resistance measuring instrument includes a probe contacting an object under test, such as a multi-chip, a DC power supply, and an ammeter. The insulation resistance measuring device applies a voltage to the object under test while the probe is in contact with a terminal of the test object, Obtain the insulation resistance by measuring leakage current.
이 때, 프로브가 피검사체의 단자에 확실히 접촉되어 있지 않으면, 절연저항을 고정밀도로 측정할 수 없기 때문에, 절연저항을 측정하기 전에 프로브의 접촉상태를 검출하는 것이 일반적이다.At this time, if the probe is not surely in contact with the terminal of the object under test, the insulation resistance cannot be measured with high accuracy. Therefore, it is common to detect the contact state of the probe before measuring the insulation resistance.
접촉상태를 검출하는 방법으로는 다음의 ①,②의 방법이 알려져 있다.As a method for detecting a contact state, the following methods 1 and 2 are known.
① 피 검사체가 콘덴서인 경우, 프로브의 접촉유무에 따라 프로브간의 용량(캐패시턴스)이 변화한다는 점에 주목하여 콘덴서의 용량변화를 통해 접촉상태를 검출한다.① If the test object is a condenser, note that the capacitance (capacitance) between probes varies depending on whether or not the probe is in contact with each other.
② 프로브의 접촉 및 비접촉시의 절연저항차(또는 전류차)를 통해 접촉상태를 검출한다.② Contact state is detected through insulation resistance difference (or current difference) during probe contact and non-contact.
상기 ①의 방법에서는 각 칩부품의 양 단자간의 용량을 측정하기 때문에 원래 용량이 작은 칩부품에 대해서는 접촉을 고정밀도로 검출할 수 없다.In the above method, since the capacitance between both terminals of each chip component is measured, the contact cannot be detected with high precision for the chip component with a small original capacity.
또, 상기 ②의 방법에서는 칩간의 절연저항이 원래부터 매우 큰 경우에는, 프로브의 접촉 및 비접촉시에 절연저항에 차이가 없어지기 때문에 접촉을 검출할 수 없게 된다.In the method of (2) above, when the insulation resistance between the chips is originally very large, the contact resistance cannot be detected because there is no difference in insulation resistance at the contact and non-contact of the probe.
이와 같이 상기 ①,②의 방법모두 접촉을 고정밀도로 검출할 수 없다.In this manner, neither of the methods (1) and (2) above can detect the contact with high accuracy.
한편, 상기 ①,②의 방법보다 고정밀도로 접촉을 검출할 수 있는 방법으로서 도 1에 도시된 방법이 알려져 있다.On the other hand, the method shown in FIG. 1 is known as a method which can detect a contact with high precision rather than the method of (1) and (2).
도 1은 4개의 칩 저항이 내장된 다중 칩의 단자(a, b)간의 절연저항을 측정하는 예이다. 단자(a, b)간에는 절연 저항 측정기(2)의 프로브(6a, 6b)가 접촉되며, 단자(a)를 가지는 칩저항에서의 다른 단자(c)와, 단자(b)를 가지는 칩저항에서의 다른 단자(d)에는 각각 접촉 검출 회로(11)가 접속되어 있다.1 is an example of measuring the insulation resistance between the terminals (a, b) of a multi-chip with four chip resistors. The probes 6a and 6b of the insulation resistance measuring device 2 are in contact between the terminals a and b, and the other terminals c of the chip resistor having the terminal a and the chip resistors having the terminal b are connected. The contact detection circuits 11 are connected to the other terminals d of Rs.
절연 저항 측정기(2)는 직렬 접속된 전지(4)와 전류계(5)를 구비하며, 접촉 검출 회로(11)는 직렬 접속된 저항(12)과 전환 스위치(13)를 구비한다.The insulation resistance measuring device 2 includes a battery 4 and an ammeter 5 connected in series, and the contact detection circuit 11 includes a resistor 12 and a switching switch 13 connected in series.
우선, 전환 스위치(13)를 온(폐쇄회로)으로 하면, 절연 저항 측정기(2)와 접촉 검출 회로(11)에 의해 폐쇄회로가 형성된다. 만일, 프로브(6a,6b)가 단자(a, b)에 확실히 접촉되어 있다면, 전류계(5)에는 직류전원(4)과 저항(12)에 따른 전류가 흐르게 된다. 한편, 프로브(6a,6b)와 단자(a, b)의 접촉이 불완전하다면, 그 부분에서 접촉 저항이 발생하기 때문에 전류계(5)에서 검출되는 전류가 작아진다.First, when the changeover switch 13 is turned on (closed circuit), a closed circuit is formed by the insulation resistance measuring device 2 and the contact detection circuit 11. If the probes 6a and 6b are firmly in contact with the terminals a and b, current flows through the DC power source 4 and the resistor 12 through the ammeter 5. On the other hand, if the contact between the probes 6a and 6b and the terminals a and b is incomplete, the contact resistance is generated at that portion, so that the current detected by the ammeter 5 becomes small.
이와 같이, 도 1에 도시된 회로에서는 전류계(5)에서 검출되는 전류의 크기에 따라 프로브(6a,6b)의 접촉상태를 검출할 수 있다.As described above, in the circuit shown in FIG. 1, the contact state of the probes 6a and 6b can be detected according to the magnitude of the current detected by the ammeter 5.
도 1에 도시된 회로에 있어서, 프로브(6a,6b)의 접촉상태가 양호하다고 판단되면, 다음으로 전환 스위치(13)를 오프(개방회로)로 한다. 이로써, 접촉 검출 회로(11)는 전기적으로 분리되고, 절연 저항 측정기(2) 내부의 전류계(5)에서 검출되는 전류 값에 따라 단자(a, b)간의 절연저항이 측정된다.In the circuit shown in FIG. 1, when it is judged that the contact state of the probes 6a and 6b is good, the changeover switch 13 is turned off (open circuit) next. Thereby, the contact detection circuit 11 is electrically disconnected, and the insulation resistance between the terminals a and b is measured according to the current value detected by the ammeter 5 inside the insulation resistance measuring instrument 2.
도 1에 도시된 회로는 상기 ①, ②의 방법보다 고정밀도로 프로브(6a,6b)의 접촉상태를 검출할 수 있는 반면 회로가 복잡해진다. 또한, 프로브(6a,6b)의 접촉상태를 검출할 때와 절연저항을 측정할 때, 전환 스위치(13)를 전환시켜야만 한다는 불편이 따른다.The circuit shown in FIG. 1 can detect the contact state of the probes 6a and 6b with higher accuracy than the methods of 1 and 2, whereas the circuit is complicated. In addition, when the contact state of the probes 6a and 6b is detected and when the insulation resistance is measured, the changeover switch 13 must be switched.
한편, 칩저항의 저항치를 측정할 때, 각 칩단자에 접촉되는 프로브와 칩단자간의 접촉이 불완전한 경우에도 칩저항의 저항치를 고정밀도로 측정할 수 없다.On the other hand, when measuring the resistance value of the chip resistance, the resistance value of the chip resistance cannot be measured with high accuracy even when the contact between the probe and the chip terminal in contact with each chip terminal is incomplete.
본 발명은, 상기한 점을 감안하여 이루어진 것으로서, 그 목적은 간단한 구성과 절차로 프로브의 접촉상태를 검출할 수 있는 프로브 접촉상태 검출방법 및 프로브 접촉상태 검출장치를 제공하는 데 있다.SUMMARY OF THE INVENTION The present invention has been made in view of the above, and an object thereof is to provide a probe contact state detection method and a probe contact state detection apparatus capable of detecting a contact state of a probe with a simple configuration and procedure.
상기한 목적을 달성하기 위해, 복수의 칩부품이 내장된 다중 칩내부의 다른 칩부품의 각 칩단자에 각각 접촉되는 제 1 및 제 2 프로브간에 흐르는 전류를 검출하여, 이 전류를 통해 상기 제 1 및 제 2 프로브가 접촉된 칩 단자간의 절연저항을 검출할 때, 상기 제 1 및 제 2 프로브와 절연저항의 측정대상인 칩단자간의 접촉이 양호한지를 검출하는 프로브 접촉상태 검출방법은,In order to achieve the above object, a current flowing between the first and second probes respectively contacting each chip terminal of the other chip component in the multiple chip having a plurality of chip components therein is detected, and the first through the current. And a probe contact state detecting method for detecting whether the contact between the first and second probes and the chip terminal to be measured of the insulation resistance is good when detecting the insulation resistance between the chip terminals in contact with the second probe.
절연저항의 측정대상인 제 1 및 제 2 칩단자에 각각 상기 제 1 및 제 2 프로브를 접촉시키고, 상기 제 1 및 제 2 칩단자에 관련 있는 제 3 및 제 4 칩단자간에 콘덴서를 접속시킨 상태에서 상기 제 1 및 제 2 프로브간의 캐패시턴스를 측정하는 단계와,The first and second probes are brought into contact with the first and second chip terminals, which are the measurement target of the insulation resistance, respectively, and a capacitor is connected between the third and fourth chip terminals related to the first and second chip terminals. Measuring a capacitance between the first and second probes;
측정된 캐패시턴스의 크기에 따라 상기 제 1 및 제 2 프로브와 그에 대응되는 상기 제 1 및 제 2 칩단자의 접촉이 양호한지를 검출하는 단계를 구비한다.Detecting whether the contact between the first and second probes and the corresponding first and second chip terminals is good according to the measured capacitance.
또한, 복수의 칩부품이 내장된 다중 칩내부의 다른 칩부품의 각 칩단자에 각각 접촉되는 제 1 및 제 2 프로브간을 흐르는 전류를 검출하여, 이 전류를 통해 상기 제 1 및 제 2 프로브가 접촉된 칩단자간의 절연저항을 검출할 때, 상기 제 1 및 제 2 프로브와 절연저항의 측정대상인 칩단자간의 접촉이 양호한 지를 검출하는 프로브 접촉상태 검출장치는,In addition, a current flowing between the first and second probes that are in contact with each chip terminal of another chip component in a plurality of chip components in which a plurality of chip components are embedded is detected, and the first and second probes When detecting the insulation resistance between the contacted chip terminals, the probe contact state detection device for detecting whether the contact between the first and second probes and the chip terminal to be measured of the insulation resistance is good,
절연저항의 측정대상인 제 1 및 제 2 칩단자에 각각 상기 제 1 및 제 2 프로브를 접촉시키고, 상기 제 1 및 제 2 칩단자에 관련 있는 제 3 및 제 4 칩단자간에 콘덴서를 접속시킨 상태에서 상기 제 1 및 제 2 프로브간의 캐패시턴스를 측정하는 캐패시턴스 측정수단과,The first and second probes are brought into contact with the first and second chip terminals, which are the measurement target of the insulation resistance, respectively, and a capacitor is connected between the third and fourth chip terminals related to the first and second chip terminals. Capacitance measuring means for measuring capacitance between the first and second probes;
측정된 캐패시턴스의 크기에 따라 상기 제 1 및 제 2 프로브와 그에 대응되는 상기 제 1 및 제 2 칩단자의 접촉이 양호한지를 검출하는 접촉검출수단을 구비한다.And contact detecting means for detecting whether contact between the first and second probes and the corresponding first and second chip terminals is good according to the measured capacitance.
도 1은 종래의 프로브 접촉상태 검출장치의 일례를 나타낸 회로도,1 is a circuit diagram showing an example of a conventional probe contact state detection apparatus;
도 2는 본 발명에 관계된 프로브 접촉상태 검출장치의 제 1 실시형태를 나타낸 회로도,2 is a circuit diagram showing a first embodiment of a probe contact state detection device according to the present invention;
도 3은 다중 칩의 일례를 나타낸 도면,3 is a diagram illustrating an example of multiple chips;
도 4는 프로브와 콘덴서를 동일한 칩단자에 접속한 예를 나타낸 도면,4 is a view showing an example in which a probe and a capacitor are connected to the same chip terminal;
도 5는 본 발명에 관계된 프로브 접촉상태 검출장치의 제 2 실시형태를 나타낸 회로도이다.Fig. 5 is a circuit diagram showing a second embodiment of the probe contact state detection device according to the present invention.
*도면의 주요부분에 대한 부호의 설명** Description of the symbols for the main parts of the drawings *
1 : 다중 칩 2 : 절연 저항 측정기1: multi chip 2: insulation resistance meter
3 : 콘덴서 4 : 직류전원3: condenser 4: DC power
5 : 전류계5: ammeter
6a : 프로브 6b : 프로브6a: Probe 6b: Probe
a : 단자 b : 단자a: terminal b: terminal
이하에서는, 본 발명에 관계된 프로브 접촉상태 검출방법 및 프로브 접촉상태 검출장치에 관하여 도면을 참조하면서 구체적으로 설명하도록 한다.Hereinafter, a probe contact state detection method and a probe contact state detection apparatus according to the present invention will be described in detail with reference to the drawings.
(제 1 실시형태)(1st embodiment)
도 2는 본 발명에 관계된 프로브 접촉상태 검출장치의 제 1 실시형태를 나타낸 회로도이다. 도 2의 프로브 접촉상태 검출장치는, 칩저항, 칩 콘덴서 및 페라이트 칩 등의 복수의 칩부품이 내장된 다중 칩의 칩단자간의 절연저항을 측정할 때 이용되는 것이다.2 is a circuit diagram showing a first embodiment of a probe contact state detection device according to the present invention. The probe contact state detecting apparatus of FIG. 2 is used when measuring the insulation resistance between chip terminals of multiple chips in which a plurality of chip components such as chip resistance, chip capacitor and ferrite chip are embedded.
도 3은 다중칩(1)의 일례를 나타낸 도면으로서, 4개의 페라이트 칩이 내장된 다중 칩(1)의 예를 나타낸다. 이하에서는 도 3에 도시된 다중 칩(1)의 칩단자(a, b)간의 절연저항을 측정하는 예에 관하여 설명하도록 한다.FIG. 3 shows an example of the multichip 1, and shows an example of the multichip 1 in which four ferrite chips are embedded. Hereinafter, an example of measuring the insulation resistance between the chip terminals a and b of the multiple chip 1 shown in FIG. 3 will be described.
도 2에 도시된 프로브 접촉상태 검출장치는, 절연 저항 측정기(2)와 콘덴서(3)를 구비한다. 절연 저항 측정기(2)는 직류전원(4)과 전류계(전류 검출 수단 ; 5)를 가지며, 직류전원(4)과 전류계(5)에는 각각 측정용 프로브(6a,6b)가 접속되어 있다. 절연 저항 측정기(2)는 프로브(6a, 6b)를 피 검사체인 다중 칩(1)의 칩단자에 접촉시킨 상태에서 전류계(5)에 흐르는 전류를 검출하고, 검출된 전류를 통해 절연저항을 측정한다. 또한, 도 2의 절연 저항 측정기(2)는 프로브(6a,6b)간의 용량을 측정할 수도 있다.The probe contact state detection device shown in FIG. 2 includes an insulation resistance measuring device 2 and a capacitor 3. The insulation resistance measuring device 2 has a direct current power source 4 and an ammeter (current detecting means; 5), and the measuring probes 6a and 6b are connected to the direct current power source 4 and the ammeter 5, respectively. The insulation resistance measuring device 2 detects a current flowing through the ammeter 5 while the probes 6a and 6b are in contact with the chip terminal of the multiple chip 1 to be inspected, and measures the insulation resistance through the detected current. do. In addition, the insulation resistance meter 2 of FIG. 2 may measure the capacitance between the probes 6a and 6b.
절연 저항 측정기(2)의 프로브(6a,6b)는 다중 칩(1)의 칩단자(a, b)에 접촉된다. 또한, 콘덴서(3)의 일단에 접속된 프로브(7a)는 칩단자(a)를 가지는 칩부품의 다른 단자(c)에 접촉되며, 콘덴서(3)의 타단에 접속된 프로브(7b)는 칩단자(b)를 가지는 칩부품의 다른 단자(d)에 접촉된다.The probes 6a and 6b of the insulation resistance measuring instrument 2 are in contact with the chip terminals a and b of the multiple chip 1. In addition, the probe 7a connected to one end of the capacitor 3 is in contact with the other terminal c of the chip component having the chip terminal a, and the probe 7b connected to the other end of the capacitor 3 is a chip. The other terminal d of the chip component having the terminal b is contacted.
콘덴서(3)의 용량(캐패시턴스)은, 절연 저항을 측정할 때 피 검사체에 대한 전압의 인가시간을 가능한 한 짧게 하기 위하여, 절연 저항 측정기(2)가 프로브(6a,6b)의 접촉을 검출할 수 있는 최소한의 값(가령, 2pF정도)으로 설정하는 것이 바람직하다. 또한, 콘덴서(3)는 절연성이 높고 입수가 용이한 재료로 형성하는 것이 바람직하다.The capacitance (capacitance) of the condenser 3 is such that the insulation resistance meter 2 detects the contact of the probes 6a and 6b in order to make the application time of the voltage to the test object as short as possible when measuring the insulation resistance. It is recommended to set the minimum value possible (for example, about 2pF). In addition, the capacitor 3 is preferably formed of a material having high insulation and easy availability.
다음으로, 도 2에 도시된 프로브 접촉상태 검출장치의 동작에 관하여 설명하도록 한다. 다중 칩(1)의 칩단자(a, b)간의 절연저항을 측정할 때에는 우선, 절연저항의 측정대상인 칩단자(a, b)간에 절연 저항 측정기(2)의 프로브(6a,6b)가 확실히 접촉되어 있는지 그 접촉 상태를 검출한다.Next, the operation of the probe contact state detection apparatus shown in FIG. 2 will be described. When measuring the insulation resistance between the chip terminals a and b of the multiple chips 1, first, the probes 6a and 6b of the insulation resistance measuring instrument 2 are surely connected between the chip terminals a and b as the measurement target of the insulation resistance. It detects whether or not there is contact.
구체적으로는, 칩단자(a, b)에 절연 저항 측정기(2)의 프로브(6a,6b)를 접촉시키는 동시에, 칩단자(a)를 가지는 칩부품의 다른 칩단자(c)에 콘덴서(3)의 일단에 접속된 프로브(7a)를 접촉시키고, 칩단자(b)를 가지는 칩부품의 다른 칩단자(d)에 콘덴서(3)의 타단에 접속된 프로브(7b)를 접촉시킨다.Specifically, while the probes 6a and 6b of the insulation resistance measuring device 2 are brought into contact with the chip terminals a and b, the capacitor 3 is connected to another chip terminal c of the chip component having the chip terminal a. The probe 7a connected to one end of the () is brought into contact with each other, and the probe 7b connected to the other end of the capacitor 3 is brought into contact with another chip terminal d of the chip component having the chip terminal b.
이로써, 절연 저항 측정기(2)와 콘덴서(3)에 의해 폐쇄회로가 형성되어 절연저항 측정기(2)내부의 직류전원(4)으로부터 콘덴서(3)를 향하여 전류가 흐르고, 콘덴서(3)에 전하가 충전된다.As a result, a closed circuit is formed by the insulation resistance measuring device 2 and the condenser 3 so that a current flows from the DC power supply 4 inside the insulation resistance measuring device 2 toward the condenser 3, and charges the condenser 3. Is charged.
이 상태에서, 절연 저항 측정기(2)는 프로브(6a,6b)간의 용량을 측정하고, 그 용량의 크기에 따라 프로브(6a,6b)의 접촉상태를 검출한다. 구체적으로는, 칩단자(a, b)에 대한 프로브(6a,6b)의 접촉이 불완전한 경우, 절연 저항 측정기(2)에 의해 측정되는 용량 값이 작아진다. 따라서, 절연 저항 측정기(2)는 측정된 용량 값이 규정치 보다 크면 접촉이 양호하다고 판단하고, 작으면 접촉이 불량하다고 판단한다.In this state, the insulation resistance measuring instrument 2 measures the capacitance between the probes 6a and 6b and detects the contact state of the probes 6a and 6b according to the magnitude of the capacitance. Specifically, when the contact of the probes 6a and 6b to the chip terminals a and b is incomplete, the capacitance value measured by the insulation resistance measuring instrument 2 becomes small. Therefore, the insulation resistance measuring device 2 judges that the contact is good when the measured capacitance value is larger than the prescribed value, and determines that the contact is poor when it is small.
접촉이 양호하다고 판단한 경우에는, 도 2의 결선상태 그대로 전류계(5)에서 검출된 전류 값에 따라 절연저항을 연산한다. 절연저항은 (직류전원(4)의 전압) /(전류계(5)에서 검출된 전류치)로 연산된다.If it is determined that the contact is good, the insulation resistance is calculated according to the current value detected by the ammeter 5 as it is in the wiring state of FIG. The insulation resistance is calculated as (voltage of the DC power supply 4) / (current value detected by the ammeter 5).
이와 같이, 본 실시형태에서는 다중 칩(1)의 칩단자간의 절연저항을 측정할 때, 측정대상인 칩단자에 절연 저항 측정기(2)의 프로브(6a,6b)를 접촉시키는 동시에, 측정대상인 칩단자에 대응되는 타단측의 칩단자간에 콘덴서(3)를 접속시킨 상태에서 측정대상인 칩단자간의 용량을 측정하기 때문에, 용량의 크기에 따라 프로브(6a,6b)의 접촉상태를 고정밀도로 측정할 수 있다.As described above, in the present embodiment, when measuring the insulation resistance between the chip terminals of the multiple chips 1, the probe terminals 6a and 6b of the insulation resistance measuring device 2 are brought into contact with the chip terminals to be measured and the chip terminals as the measurement targets. Since the capacitance between the chip terminals to be measured is measured while the capacitors 3 are connected between the chip terminals on the other end side corresponding to, the contact state of the probes 6a and 6b can be measured with high accuracy according to the size of the capacitance. .
또한, 프로브(6a,6b)의 접촉상태가 양호하다고 판단된 경우, 타단측에 접속된 콘덴서(3)를 떼어내지 않고 칩단자간의 절연저항을 측정할 수 있기 때문에, 도 1과 같은 전환 스위치가 불필요하여 부품비용을 절감할 수 있는 동시에 측정절차를 간략화할 수 있다.In addition, when it is judged that the contact state of the probes 6a and 6b is good, the insulation resistance between the chip terminals can be measured without removing the capacitor 3 connected to the other end. This eliminates unnecessary component cost savings and simplifies the measurement process.
또, 도 2에서는 측정대상인 칩단자의 타단측 칩단자에 콘덴서(3)를 접속하는 예를 설명하였으나, 도 4에 도시된 바와 같이 프로브(6a,6b)와 콘덴서(3)를 동일한 칩단자에 접속하여도 무방하다.2 illustrates an example in which the capacitor 3 is connected to the chip terminal of the other end of the chip terminal to be measured, but as shown in FIG. 4, the probes 6a and 6b and the capacitor 3 are connected to the same chip terminal. You may connect.
상기한 실시형태에서는, 복수의 페라이트 칩이 내장된 다중 칩(1)을 예로 들어 설명하였으나, 본 발명은 각종 다중 칩(1)에 적용가능하며 다중 칩(1)의 형상도 도 3에 도시된 것에 한정되지 않는다.In the above embodiment, the multi-chip 1 in which a plurality of ferrite chips are embedded has been described as an example, but the present invention is applicable to various multi-chips 1, and the shape of the multi-chip 1 is also shown in FIG. It is not limited to this.
(제 2 실시형태)(2nd embodiment)
제 2 실시형태에서는, 칩저항의 양단에 프로브를 접촉시켜 저항치를 측정할 때, 프로브가 칩단자에 확실히 접촉되어 있는지를 검출하는 것이다.In the second embodiment, when the resistance is measured by bringing the probe into contact with both ends of the chip resistance, it is detected whether the probe is firmly in contact with the chip terminal.
도 5는 본 발명에 관계된 프로브 접촉상태 검출장치의 제 2 실시형태를 나타낸 회로도이다. 도 5에 도시된 프로브 접촉상태 검출장치는, 측정대상인 칩저항(21)의 양단에 각각 접촉되는 프로브(7a,7b)와 프로브(7a,7b)간에 접속된 콘덴서(3)와 저항 측정기(22)를 구비한다.Fig. 5 is a circuit diagram showing a second embodiment of the probe contact state detection device according to the present invention. The probe contact state detection device shown in FIG. 5 includes a capacitor 3 and a resistance meter 22 connected between the probes 7a and 7b and the probes 7a and 7b respectively contacting both ends of the chip resistor 21 to be measured. ).
저항 측정기(22)의 프로브(22a,22b)는, 칩저항(21)의 양단에 각각 접촉된다. 또, 저항 측정기(22)의 내부에는 직렬 접속된 직류 전압 공급원(4)과 전류계(5)가 설치되어 있다. 저항 측정기(22)는 프로브(22a,22b)간의 용량(캐패시턴스)을 측정할 수 있는 것이다.The probes 22a and 22b of the resistance meter 22 are in contact with both ends of the chip resistor 21, respectively. In addition, the resistance measuring instrument 22 is provided with a DC voltage supply source 4 and an ammeter 5 connected in series. The resistance meter 22 can measure the capacitance (capacitance) between the probes 22a and 22b.
다음으로 도 5에 도시된 프로브 접촉상태 검출장치의 동작에 관하여 설명하도록 한다. 우선, 측정대상인 칩저항(21)의 양 칩단자에 프로브(7a,7b, 22a, 22b)를 각각 접촉시킨다. 이 상태에서 저항 측정기(22)의 프로브(22a,22b)가 대응되는 칩단자에 확실히 접촉되어 있는지를 검출한다.Next, the operation of the probe contact state detection apparatus shown in FIG. 5 will be described. First, the probes 7a, 7b, 22a and 22b are brought into contact with both chip terminals of the chip resistor 21 to be measured. In this state, it is detected whether the probes 22a and 22b of the resistance meter 22 are in firm contact with the corresponding chip terminal.
구체적으로는, 저항 측정기(22)를 통해 프로브(22a,22b)간의 용량을 측정하고, 그 용량의 크기에 따라 프로브(22a,22b)의 접촉상태를 검출한다. 프로브(22a,22b)가 칩단자에 확실히 접촉되어 있다고 판단된 경우에는 저항 측정기(22)에 의해 칩저항(21)의 저항치를 측정한다.Specifically, the capacitance between the probes 22a and 22b is measured through the resistance measuring instrument 22, and the contact state of the probes 22a and 22b is detected according to the magnitude of the capacitance. When it is determined that the probes 22a and 22b are firmly in contact with the chip terminal, the resistance value of the chip resistor 21 is measured by the resistance meter 22.
이와 같이 제 2 실시형태에서는, 칩저항(21)의 저항치 측정용 프로브(22a,22b)가 칩단자에 확실히 접촉되어 있는지를 프로브(22a,22b)간의 용량을 통해 판단하기 때문에, 프로브(22a,22b)의 접촉을 간단하고 고정밀도로 검출할 수 있다. 또 본 제 2 실시형태는 높은 저항치를 측정하는 데 특히 적합하지만, 낮은 저항치를 측정할 때에도 적용할 수 있다.As described above, in the second embodiment, it is determined through the capacitance between the probes 22a and 22b whether the probes 22a and 22b for resistance value measurement of the chip resistor 21 are firmly in contact with the chip terminals. The contact of 22b) can be detected simply and with high accuracy. Moreover, although this 2nd Embodiment is especially suitable for measuring a high resistance value, it is applicable also when measuring a low resistance value.
또한, 상기한 제 1 및 제 2 실시형태에서는 콘덴서(3)에 접속된 프로브(7a,7b)를 칩단자에 접촉시키는 예에 관하여 설명하였으나, 프로브를 이용하지 않고 지그 등을 통해 칩단자에 콘덴서(3)를 접속하여도 무방하다.In the first and second embodiments described above, an example in which the probes 7a and 7b connected to the capacitor 3 are brought into contact with the chip terminals has been described. (3) may be connected.
본 발명에 따르면, 절연저항의 측정대상인 제 1 및 제 2 칩단자에 상관된 제 3 및 제 4 칩단자간에 콘덴서를 접속시킨 상태에서 제 1 및 제 2 프로브간의 캐패시턴스를 측정하고, 그 측정결과에 따라 프로브의 접촉상태를 검출하기 때문에, 칩부품의 캐패시턴스 등에 영향을 받지 않고 고정밀도로 프로브의 접촉상태를 검출할 수 있다.According to the present invention, the capacitance between the first and second probes is measured while the capacitor is connected between the third and fourth chip terminals correlated with the first and second chip terminals, which are the measurement targets of the insulation resistance, and the measurement result is Therefore, since the contact state of the probe is detected, the contact state of the probe can be detected with high accuracy without being influenced by the capacitance of the chip component.
또한, 프로브의 접촉상태를 검출한 후에 절연저항을 측정할 때에도 캐패시터를 떼어내지 않아도 무방하므로 전환 스위치 등이 불필요해져 부품 수를 절감할 수 있다.In addition, since the capacitor does not need to be removed even when the insulation resistance is measured after detecting the contact state of the probe, a changeover switch or the like is unnecessary, thereby reducing the number of parts.
마찬가지로, 칩저항의 저항치를 측정할 때에도 칩저항의 양단에 콘덴서를 접속시킨 상태에서 제 1 및 제 2 프로브간의 캐패시턴스를 측정하여, 그 측정결과에 따라 프로브의 접촉상태를 검출하기 때문에 고정밀도로 프로브의 접촉상태를 검출할 수 있다.Similarly, when measuring the resistance value of the chip resistance, the capacitance between the first and second probes is measured with the capacitor connected to both ends of the chip resistance, and the contact state of the probe is detected according to the measurement result. The contact state can be detected.
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JP6350775B1 (en) * | 2017-11-16 | 2018-07-04 | 三菱電機株式会社 | Probe card, semiconductor measuring device and semiconductor measuring system |
US10816583B2 (en) * | 2018-11-28 | 2020-10-27 | The Boeing Company | Differential capacitive probe for measuring contact resistance |
CN111157884A (en) * | 2020-01-03 | 2020-05-15 | 中广核工程有限公司 | Relay resistance measurement system and method |
CN113777405B (en) * | 2021-09-17 | 2024-03-29 | 长鑫存储技术有限公司 | Test method |
Family Cites Families (4)
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JPH0572245A (en) * | 1991-09-13 | 1993-03-23 | Fujitsu Ltd | Device for discriminating probe contact state |
US5696451A (en) * | 1992-03-10 | 1997-12-09 | Hewlett-Packard Co. | Identification of pin-open faults by capacitive coupling |
JPH07244105A (en) * | 1994-03-04 | 1995-09-19 | Hioki Ee Corp | Bridged solder detecting method by board inspecting device for mounting board |
JPH10115642A (en) * | 1996-10-09 | 1998-05-06 | Kokusai Electric Co Ltd | Resistivity measuring device |
-
1999
- 1999-08-06 JP JP22447999A patent/JP3675678B2/en not_active Expired - Lifetime
-
2000
- 2000-08-04 KR KR1020000045239A patent/KR100363294B1/en active IP Right Grant
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Cited By (1)
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---|---|---|---|---|
KR101288105B1 (en) * | 2011-11-21 | 2013-07-22 | 바이옵트로 주식회사 | Apparatus for measuring |
Also Published As
Publication number | Publication date |
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JP3675678B2 (en) | 2005-07-27 |
TW475989B (en) | 2002-02-11 |
KR100363294B1 (en) | 2002-12-05 |
JP2001050996A (en) | 2001-02-23 |
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