KR20000021922A - Rod for fixing clamp ring of ion implanter - Google Patents
Rod for fixing clamp ring of ion implanter Download PDFInfo
- Publication number
- KR20000021922A KR20000021922A KR1019980041202A KR19980041202A KR20000021922A KR 20000021922 A KR20000021922 A KR 20000021922A KR 1019980041202 A KR1019980041202 A KR 1019980041202A KR 19980041202 A KR19980041202 A KR 19980041202A KR 20000021922 A KR20000021922 A KR 20000021922A
- Authority
- KR
- South Korea
- Prior art keywords
- rod
- base plate
- clamp ring
- hole
- ion implantation
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
본 발명은 반도체 장치 제조설비의 이온 주입설비에 관한 것으로서, 더욱 상세하게는 베이스 플레이트에 클램프 링을 고정하는 로드와 베이스 플레이트와의 결합상태를 개선하여 설비의 백업(back up)시간을 단축하는 한편 파트(part)의 페일(fail)을 방지할 수 있도록 하는 이온 주입설비의 로드 클램프 링(rod clamp ring of ion implanter)에 관한 것이다.The present invention relates to an ion implantation facility of a semiconductor device manufacturing facility, and more particularly, to improve the coupling state of the rod and the base plate for fixing the clamp ring to the base plate to reduce the back-up time of the facility The present invention relates to a rod clamp ring of ion implantation equipment for preventing failure of a part.
종래의 이온 주입설비에서는 로봇 로딩 시스템을 이용하여 웨이퍼를 로딩/언로딩을 실시하게 되는 데, 이 로딩/언로딩을 수행하기 위해서는 클램프 링과 베이스 플레이트에 연결된 로드 클램프 링을 이용하여 웨이퍼를 로딩/언로딩하게 된다.In a conventional ion implantation facility, a wafer loading / unloading is performed using a robot loading system. To perform this loading / unloading, a wafer is loaded / loaded using a clamp ring and a rod clamp ring connected to a base plate. It will be unloaded.
즉, 로드 클램프 링은 도1에서와 같이, 베이스 플레이트(103)에 로드(102)가 삽입 고정되어 있고, 이 로드(102)의 상부에는 보울트에 의해 클램프 링(101)이 나사 결합되어 있다.That is, in the rod clamp ring, as shown in Fig. 1, the rod 102 is inserted and fixed to the base plate 103, and the clamp ring 101 is screwed to the upper portion of the rod 102 by bolts.
그러나, 로드 클램프 링의 베이스 플레이트의 접속상태가 로드를 베이스 플레이트에 삽입하는 방법으로 고정되어 있기 때문에 로드와 베이스 플레이트의 결합부분(A)에 결함 발생시 로드 클램프 링을 사용할 수 없게 되어 파트를 폐기 처분해야 하거나, 설비의 백업시간이 길어지는 문제점이 있다.However, since the connection state of the base plate of the rod clamp ring is fixed by inserting the rod into the base plate, the rod clamp ring cannot be used in the event of a defect in the joint portion (A) of the rod and the base plate. Or there is a problem that the backup time of the equipment is long.
상기한 바와 같은 결점을 해결하기 위해 제안된 본 발명의 목적은 베이스 플레이트(base plate)에 클램프 링을 고정하는 로드와 베이스 플레이트와의 결합상태를 개선하여 설비의 백업시간을 단축하는 한편 파트의 페일을 방지할 수 있도록 하는 이온 주입설비의 로드 클램프 링을 제공함에 있다.The object of the present invention, which is proposed to solve the above-mentioned drawbacks, is to improve the coupling state between the rod and the base plate fixing the clamp ring to the base plate, thereby reducing the backup time of the equipment and failing the parts. To provide a rod clamp ring of the ion implantation facility to prevent the.
도1은 종래의 이온 주입설비의 로드 클램프 링을 나타내는 정면도이다.1 is a front view showing a rod clamp ring of a conventional ion implantation facility.
도2는 본 발명에 따른 이온 주입설비의 로드 클램프 링을 나타내는 정면도이다.Figure 2 is a front view showing a rod clamp ring of the ion implantation facility according to the present invention.
※ 도면의 주요 부분에 대한 부호의 설명※ Explanation of codes for main parts of drawing
1 : 클램프 링 2 : 로드1: clamp ring 2: rod
3 : 베이스 플레이트 4 : 연장 로드3: base plate 4: extension rod
5 : 보울트5: Bolt
상기 목적을 달성하기 위한 본 발명의 이온 주입설비의 로드 클램프 링은 로드에 의해 베이스 플레이트에 클램프 링을 고정 설치하도록 된 이온 주입설비의 로드 클램프 링에 있어서, 이 로드의 하단으로부터 연장되며 하향지게 나사공이 형성되어 있는 연장로드와, 이 로드가 입설되는 베이스 플레이트의 일측에 상하로 관통되게 천공되어 있는 관통공과, 이 관통공을 통해 연장로드의 나사공에 나합되어 로드를 베이스 플레이트에 고정하게 되는 보울트를 구비하는 것을 특징으로 한다.The rod clamp ring of the ion implantation facility of the present invention for achieving the above object is a rod clamp ring of the ion implantation facility to fix the clamp ring to the base plate by the rod, extending from the lower end of the rod screw An extension rod having a ball formed therein, a through hole perforated vertically through one side of the base plate on which the rod is placed, and a bolt which is screwed into the screw hole of the extension rod through the through hole to fix the rod to the base plate; Characterized in having a.
이하, 본 발명의 구체적인 실시예를 첨부한 도면을 참조하여 상세히 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도2를 참조하면, 로드(2:rod)의 하단에는 나사공이 하향지게 형성된 연장로드(4)가 연장되어 있고, 이 로드(2)의 상단에는 클램프 링(1)이 안착되어 보울트에 의해 고정되어 있으며, 이 연장로드(4)의 나사공과 베이스 플레이트(3)에 형성된 관통공이 일직선이 되도록 베이스 플레이트(3) 위에 로드(2)가 입설되어 있으며, 보울트(5)가 베이스 플레이트(3)의 관통공을 통해 연장로드(4)의 나사공에 나합되어 베이스 플레이트(3) 위에 로드(2)가 입설되어 있다.Referring to Figure 2, the lower end of the rod (2: rod) is extended by an extension rod (4) formed with a screw hole downward, the clamp ring (1) is seated on the upper end of the rod (2) is fixed by the bolt The rod 2 is placed on the base plate 3 so that the threaded hole of the extension rod 4 and the through hole formed in the base plate 3 are aligned, and the bolt 5 is disposed on the base plate 3. The rod 2 is mounted on the base plate 3 after being screwed into the screw hole of the extension rod 4 through the through hole.
이에 따라 기계적인 진동이나 외부로부터 가해지는 충격에 의해 로드(2)와 베이스 플레이트(3)의 결합부분에 결함 발생시 연장로드(4)의 나사공으로부터 보울트(5)를 해제한 후 새로운 로드나 베이스 플레이트를 망실되지 않은 베이스 플레이트와 로드에 결합함으로써, 설비의 백업시간을 단축할 수 있는 것이다.Accordingly, when a defect occurs in the coupling portion of the rod 2 and the base plate 3 by mechanical vibration or an impact from the outside, the bolt 5 is released from the screw hole of the extension rod 4, and then a new rod or base By coupling the plate to the base plate and rod, which are not lost, the backup time of the installation can be shortened.
따라서, 본 발명에 의하면 로드와 베이스 플레이트의 결합부분에 결함 발생시 설비의 백업시간을 단축할 수 있으며, 또한 파트의 페일을 방지할 수 있는 효과가 있다.Therefore, according to the present invention, it is possible to shorten the backup time of the equipment when a defect occurs in the coupling portion of the rod and the base plate, and also to prevent the failure of the part.
이상에서 본 발명은 기재된 구체예에 대해서만 상세히 설명되었지만 본 발명의 기술사상 범위 내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속함은 당연한 것이다.Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.
Claims (1)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019980041202A KR20000021922A (en) | 1998-09-30 | 1998-09-30 | Rod for fixing clamp ring of ion implanter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019980041202A KR20000021922A (en) | 1998-09-30 | 1998-09-30 | Rod for fixing clamp ring of ion implanter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20000021922A true KR20000021922A (en) | 2000-04-25 |
Family
ID=19552842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019980041202A KR20000021922A (en) | 1998-09-30 | 1998-09-30 | Rod for fixing clamp ring of ion implanter |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20000021922A (en) |
-
1998
- 1998-09-30 KR KR1019980041202A patent/KR20000021922A/en not_active Application Discontinuation
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