KR20000019254A - Device for improving thin film thickness uniformity of cvd - Google Patents

Device for improving thin film thickness uniformity of cvd Download PDF

Info

Publication number
KR20000019254A
KR20000019254A KR1019980037242A KR19980037242A KR20000019254A KR 20000019254 A KR20000019254 A KR 20000019254A KR 1019980037242 A KR1019980037242 A KR 1019980037242A KR 19980037242 A KR19980037242 A KR 19980037242A KR 20000019254 A KR20000019254 A KR 20000019254A
Authority
KR
South Korea
Prior art keywords
thin film
sealing
shower head
device
showerhead
Prior art date
Application number
KR1019980037242A
Other languages
Korean (ko)
Inventor
석창길
최진광
이현정
강창훈
Original Assignee
석창길
주식회사 울텍
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 석창길, 주식회사 울텍 filed Critical 석창길
Priority to KR1019980037242A priority Critical patent/KR20000019254A/en
Publication of KR20000019254A publication Critical patent/KR20000019254A/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45565Shower nozzles

Abstract

PURPOSE: A device for improving a thin film thickness uniformity of CVD does not fix a shower head of CVD, rotates the shower head, and improves a uniform thickness of thin film. CONSTITUTION: A device for improving a thin film thickness uniformity mounts a vacuum sealing shower head rotation shaft(8) and a vacuum sealing rotation transmission device(9) to a shower head of CVD, and mounts a rpm control motor. Thereby, a rotation number of a shower head(5) is accurately controlled, and a thin film of uniform thickness is made.

Description

화학 기상 증착 장치의 박막 두께 균일도 개선을 위한 장치 Device for improving the film thickness uniformity of the chemical vapor deposition apparatus

화학 기상 증착 장치는 반응 가스들의 화학적 반응을 이용하여 금속막, 고유전율 박막, 저유전율 박막과 같은 반도체 박막을 증착하는데 사용되는 장치이다. The chemical vapor deposition apparatus is an apparatus using the chemical reaction of reactive gases used to deposit a semiconductor thin film such as a metal film, a high dielectric thin film, a low dielectric constant film.

종래의 화학 기상 증착 장치는 샤워헤드와 전기히터 모두가 고정되어 있는 방식이나, 샤워헤드는 고정되어 있고 전기히터를 회전시키는 방식이 사용되고 있다. Conventional chemical vapor deposition apparatus and method, a shower head with both the showerhead and the electric heater is fixed is fixed and has been used a method for rotating an electric heater. 전기히터의 온도균일도가 증착되는 박막의 두께 균일도에 영향을 미친다. The temperature uniformity of the electric heater affects the thickness uniformity of the thin film to be deposited. 웨이퍼에 증착되는 박막의 두께는 웨이퍼의 중앙부분이 웨이퍼의 바깥부분보다 두껍게 증착된다. The thickness of the thin film deposited on the wafer is the center portion of the wafer is deposited thicker than the outer portions of the wafer. 샤워헤드와 전기히터 모두가 고정되어 있는 방식의 경우에는 박막의 두께 균일도를 개선하기 위해서는 히터의 온도균일도가 개선이 되어야 한다. For a way that both the showerhead and the electric heater is fixed, in order to improve the thickness uniformity of the thin film and the temperature uniformity of the heater it must be improved. 샤워헤드를 고정시키고 전기히터를 회전시키는 방식의 경우에는 전기히터를 회전시키기 위해서 전기히터와 연결되어 있는 진공장치, 전선, 냉각장치, 온도 조절장치등과 같은 구성품들이 복잡하게 구성되어져야 하고, 전기히터의 상·하 이동장치와 동시에 장착이 될 경우에는 전기히터 회전장치의 설치 공간이 제약을 받을 수 있다. For a manner as to secure the showerhead to rotate the electric heater, the components such as the vacuum device is associated with an electric heater, wires, cooling, temperature control, etc. have to be the complex configuration to rotate the electric heater, and the electrical If the mounting at the same time as the upper and the lower the mobile unit of the heater has a heater footprint of an electrical rotating device can be constrained.

본 발명은 상기한 바와 같은 종래의 기술의 문제점을 보완하여 웨이퍼에 증착되는 박막의 두께 균일도 저해 요인을 개선하기 위한 것으로 샤워헤드를 회전시켜 박막의 두께 균일도를 개선하고자 한다. The present invention is intended to improve the thickness uniformity of the thin film by rotating the shower head as to improve the thickness uniformity of the thin film deposited on the wafer impeding factors to compensate for problems of conventional techniques as described above.

도 1은 본 발명에 관련하는 반응기와 샤워헤드의 구성도 1 is a configuration of a reactor and a showerhead according to the present invention;

도 2는 본 발명에 관련하는 진공 씰링(sealing) 샤워헤드 회전축과 진공 씰링(sealing) 회전 전달장치의 상세도 Figure 2 is a detail of the vacuum sealing (sealing) the shower head rotation axis and a vacuum seal (sealing) the rotation transmission device according to the present invention;

1 : 반응기, 2: 전기히터, 3 : 전기히터 상·하 이동장치, 4 : 웨이퍼, 1: reactor, 2: an electric heater, 3: Electric heater upper and the lower the mobile unit, 4: a wafer,

5 : 샤워헤드, 6 : 회전 벨트, 7 : 회전수 제어용 모터, 5: shower head, 6: rotating belt, 7: rotational speed control motors,

8 : 진공 씰링(sealing) 샤워헤드 회전축, 8: vacuum sealing (sealing) a showerhead rotating shaft,

9 : 진공 씰링(sealing) 회전 전달장치, 10 : 반응 가스 유입구, 9: a vacuum seal (sealing) a rotation transmitting device, 10: reaction gas inlet;

11 : 가스 혼합기, 11: gas mixer,

본 발명은 기존의 화학 기상 증착 장치를 변형하여 샤워헤드가 회전이 가능하도록 구성한 것으로 웨이퍼에 증착되는 박막의 두께 균일도 개선을 목표로 하고 있다. The invention aims to improve thickness uniformity of the thin film deposited on the wafer that is configured to transform a conventional chemical vapor deposition apparatus of the shower head so as to be rotated.

샤워헤드를 통해 반응 가스를 반응기로 유입 시키면서 샤워헤드를 회전시키면 원심력에 의해 샤워헤드에서 반응기로 유입되는 반응 가스의 흐름이 웨이퍼의 중앙부분보다는 웨이퍼의 바깥부분으로 치우쳐짐으로써 박막이 웨이퍼의 중앙부분에 더 두껍게 증착되는 현상을 개선할 수 있다. By while flowing the reactive gas through the showerhead to the reactor by rotating the shower head shifted to the outside of the wafer than the center portion of the flow of the wafers in the reaction gas that flows into the reactor from a shower head by a centrifugal force load center of the thin wafer a phenomenon that can improve the thicker deposition. 반응 가스의 흐름이 웨이퍼의 바깥쪽부분으로 치우쳐지는 정도는 샤워헤드의 회전수를 조절함으로써 조절이 가능하다. The degree of flow of the reaction gas being concentrated on the outer portion of the wafer can be controlled by controlling the number of revolutions of the showerhead. 샤워헤드의 회전수는 모터의 회전수를 제어함으로써 조절이 가능하다. The number of revolutions of the showerhead can be controlled by controlling the number of revolutions of the motor. 샤워헤드의 회전수를 증가 시키면 반응 가스의 흐름이 바깥쪽으로 치우쳐지는 정도가 증가하고 샤워헤드의 회전수를 감소 시키면 반응 가스의 흐름이 바깥쪽으로 치우쳐지는 정도가 감소한다. Increasing the number of revolutions of the showerhead increases the degree to which the flow of the reaction gas to be shifted to the outside and reducing the number of revolutions of the showerhead decreases the extent that the flow of reaction gas biased outwardly.

도 1에서처럼 샤워헤드에 진공 씰링(sealing) 샤워헤드 회전축을 연결하고 여기에 진공 씰링(sealing) 회전 전달장치를 설치한다. Connected to vacuum sealing (sealing) the shower head rotational axis to the showerhead, as shown in 1, and mount the vacuum sealing (sealing) rotation transmission device here. 진공 씰링(sealing) 회전 전달장치는 회전 제어용 모터와 벨트로 연결되어 모터의 회전수를 진공 씰링(sealing) 샤워헤드 회전축에 전달하게 된다. Vacuum sealing (sealing) the rotation transmission device is connected to the rotation control of the motor and the belt is passed the number of revolutions of the motor on the vacuum sealing (sealing) a showerhead rotating shaft. 본 발명에 사용되는 모터는 회전수를 제어할 수 있도록 제작된 것이다. Motor used in the present invention is designed to control the number of revolutions. 따라서 모터의 회전수를 변화 시킴으로써 샤워헤드의 회전수의 조절이 가능하다. Therefore, it is possible to control the number of revolutions of the shower head by changing the number of revolutions of the motor. 도 2에서처럼 본 발명에서 사용되는 진공 씰링(sealing) 샤워헤드 회전축은 중앙의 축에 구멍을 뚫어 관의 형태로 가공하였다. FIG vacuum sealing (sealing) a showerhead rotating shaft used in the present invention, as shown in 2, was processed in the form of a tube pierced in the central axis. 가스 혼합기로 들어온 반응가스는 관의 형태로 가공된 회전축을 통해 샤워헤드와 반응기로 들어가게 된다. The reaction gas enters the gas mixture is put through a machining axis of rotation in the form of a tube with a showerhead and reactor. 가스 혼합기는 가스 유입구를 통해 유입된 이종의 가스 또는 기화된 유기 금속 소스와 반응가스 등을 혼합시켜 주는 혼합기의 역할을 하게 된다. Gas mixture is to act as a mixer to be mixed with the two kinds of gases or vaporized organic metal source and a reaction gas, introduced through the gas inlet. 모터를 회전 시켰을때 반응 가스 유입구와 가스 혼합기는 회전시키지 않고 진공 씰링(sealing) 회전 전달장치와 진공 씰링(sealing) 샤워헤드 회전축만 회전시켜 진공을 유지하면서 샤워헤드가 회전될 수 있도록 구성하였다. A reaction gas inlet and the gas mixture when the motor is rotated to rotate without rotating only vacuum sealing (sealing) the rotation transmission device and a vacuum seal (sealing) a showerhead rotating shaft while maintaining the vacuum was configured such that the shower head can be rotated.

이상 설명한 바와 같이 본 발명은 박막 두께 균일도 개선을 위한 장치는 회전모터와 진공 씰링(sealing) 회전 전달 장치와 진공 씰링(sealing) 샤워헤드 회전축을 사용함으로써 진공을 유지하기 위한 별도의 장치를 설치하지 않아도 되므로 설치가 용이하고, 회전수를 제어할 수 있는 모터를 사용함으로써 샤워헤드의 회전수를 정확하게 제어하여 박막의 두께 균일도를 보다 쉽게 개선할 수 있는 효과가 있다. The present invention as described above is a device for improving uniformity of the film thickness is no need to install separate device for maintaining a vacuum by using a rotary motor and a vacuum seal (sealing) the rotation transmission device and a vacuum seal (sealing) a showerhead rotating shaft since there is an effect that the installation can easily and, by using the motor capable of controlling the rotational speed to accurately control the number of revolutions of the showerhead easier to improve the thickness uniformity of the thin film.

Claims (2)

  1. 화학 기상 증착 장치의 샤워헤드에 진공 씰링(sealing) 샤워헤드 회전축과진공 씰링(sealing) 회전 전달장치 그리고, 회전수 제어용 모터를 설치하여 진공을 유지하면서 샤워헤드를 회전시키는 장치. Vacuum sealing (sealing) to the showerhead shower head rotation axis and a vacuum seal (sealing) of the rotation transmission device and a chemical vapor deposition apparatus, by installing a motor rotation speed control apparatus for maintaining a vacuum rotating the showerhead.
  2. 청구항1의 장치를 이용하여 도입된 가스가 일정하게 분포되게 하여 웨이퍼에 증착되는 박막의 두께 균일도를 개선시킬 수 있는 장치. Devices with the gas introduced by using the apparatus in accordance with claim 1 to improve the thickness uniformity of the thin film deposited on the wafer to be uniformly distributed.
KR1019980037242A 1998-09-08 1998-09-08 Device for improving thin film thickness uniformity of cvd KR20000019254A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019980037242A KR20000019254A (en) 1998-09-08 1998-09-08 Device for improving thin film thickness uniformity of cvd

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019980037242A KR20000019254A (en) 1998-09-08 1998-09-08 Device for improving thin film thickness uniformity of cvd

Publications (1)

Publication Number Publication Date
KR20000019254A true KR20000019254A (en) 2000-04-06

Family

ID=19550127

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980037242A KR20000019254A (en) 1998-09-08 1998-09-08 Device for improving thin film thickness uniformity of cvd

Country Status (1)

Country Link
KR (1) KR20000019254A (en)

Cited By (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8137466B2 (en) 2009-08-24 2012-03-20 Samsung Mobile Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8486737B2 (en) 2009-08-25 2013-07-16 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8536057B2 (en) 2009-06-25 2013-09-17 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light emitting device by using the same
US8707889B2 (en) 2011-05-25 2014-04-29 Samsung Display Co., Ltd. Patterning slit sheet assembly, organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus, and the organic light-emitting display apparatus
US8709161B2 (en) 2009-08-05 2014-04-29 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8802200B2 (en) 2009-06-09 2014-08-12 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US8833294B2 (en) 2010-07-30 2014-09-16 Samsung Display Co., Ltd. Thin film deposition apparatus including patterning slit sheet and method of manufacturing organic light-emitting display device with the same
US8846547B2 (en) 2010-09-16 2014-09-30 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the thin film deposition apparatus, and organic light-emitting display device manufactured by using the method
US8871542B2 (en) 2010-10-22 2014-10-28 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus manufactured by using the method
US8882920B2 (en) 2009-06-05 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8882921B2 (en) 2009-06-08 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8907326B2 (en) 2009-06-24 2014-12-09 Samsung Display Co., Ltd. Organic light-emitting display device and thin film deposition apparatus for manufacturing the same
US8916237B2 (en) 2009-05-22 2014-12-23 Samsung Display Co., Ltd. Thin film deposition apparatus and method of depositing thin film
US8921831B2 (en) 2009-08-24 2014-12-30 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US8945979B2 (en) 2012-11-09 2015-02-03 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus by using the same, and organic light-emitting display apparatus manufactured by the method
US8945974B2 (en) 2012-09-20 2015-02-03 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display device using an organic layer deposition apparatus
US8951349B2 (en) 2009-11-20 2015-02-10 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8951610B2 (en) 2011-07-04 2015-02-10 Samsung Display Co., Ltd. Organic layer deposition apparatus
US8956697B2 (en) 2012-07-10 2015-02-17 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus and organic light-emitting display apparatus manufactured by using the method
US8962360B2 (en) 2013-06-17 2015-02-24 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the organic layer deposition apparatus
US8993360B2 (en) 2013-03-29 2015-03-31 Samsung Display Co., Ltd. Deposition apparatus, method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus
US9012258B2 (en) 2012-09-24 2015-04-21 Samsung Display Co., Ltd. Method of manufacturing an organic light-emitting display apparatus using at least two deposition units
US9018647B2 (en) 2010-09-16 2015-04-28 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US9040330B2 (en) 2013-04-18 2015-05-26 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus
US9051636B2 (en) 2011-12-16 2015-06-09 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus
US9121095B2 (en) 2009-05-22 2015-09-01 Samsung Display Co., Ltd. Thin film deposition apparatus
US9136476B2 (en) 2013-03-20 2015-09-15 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus, and organic light-emitting display apparatus manufactured by the method
US9150952B2 (en) 2011-07-19 2015-10-06 Samsung Display Co., Ltd. Deposition source and deposition apparatus including the same
US9174250B2 (en) 2009-06-09 2015-11-03 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US9206501B2 (en) 2011-08-02 2015-12-08 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus by using an organic layer deposition apparatus having stacked deposition sources
US9224591B2 (en) 2009-10-19 2015-12-29 Samsung Display Co., Ltd. Method of depositing a thin film
US9234270B2 (en) 2011-05-11 2016-01-12 Samsung Display Co., Ltd. Electrostatic chuck, thin film deposition apparatus including the electrostatic chuck, and method of manufacturing organic light emitting display apparatus by using the thin film deposition apparatus
US9257649B2 (en) 2012-07-10 2016-02-09 Samsung Display Co., Ltd. Method of manufacturing organic layer on a substrate while fixed to electrostatic chuck and charging carrier using contactless power supply module
US9260778B2 (en) 2012-06-22 2016-02-16 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US9306191B2 (en) 2012-10-22 2016-04-05 Samsung Display Co., Ltd. Organic light-emitting display apparatus and method of manufacturing the same
US9347886B2 (en) 2013-06-24 2016-05-24 Samsung Display Co., Ltd. Apparatus for monitoring deposition rate, apparatus provided with the same for depositing organic layer, method of monitoring deposition rate, and method of manufacturing organic light emitting display apparatus using the same
US9453282B2 (en) 2010-03-11 2016-09-27 Samsung Display Co., Ltd. Thin film deposition apparatus
US9461277B2 (en) 2012-07-10 2016-10-04 Samsung Display Co., Ltd. Organic light emitting display apparatus
US9466647B2 (en) 2012-07-16 2016-10-11 Samsung Display Co., Ltd. Flat panel display device and method of manufacturing the same
US9496524B2 (en) 2012-07-10 2016-11-15 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US9496317B2 (en) 2013-12-23 2016-11-15 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus
US9534288B2 (en) 2013-04-18 2017-01-03 Samsung Display Co., Ltd. Deposition apparatus, method of manufacturing organic light-emitting display apparatus by using same, and organic light-emitting display apparatus manufactured by using deposition apparatus
US9593408B2 (en) 2009-08-10 2017-03-14 Samsung Display Co., Ltd. Thin film deposition apparatus including deposition blade
US9624580B2 (en) 2009-09-01 2017-04-18 Samsung Display Co., Ltd. Thin film deposition apparatus
US9748483B2 (en) 2011-01-12 2017-08-29 Samsung Display Co., Ltd. Deposition source and organic layer deposition apparatus including the same
US9777364B2 (en) 2011-07-04 2017-10-03 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US10246769B2 (en) 2010-01-11 2019-04-02 Samsung Display Co., Ltd. Thin film deposition apparatus

Cited By (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9873937B2 (en) 2009-05-22 2018-01-23 Samsung Display Co., Ltd. Thin film deposition apparatus
US9121095B2 (en) 2009-05-22 2015-09-01 Samsung Display Co., Ltd. Thin film deposition apparatus
US8916237B2 (en) 2009-05-22 2014-12-23 Samsung Display Co., Ltd. Thin film deposition apparatus and method of depositing thin film
US8882920B2 (en) 2009-06-05 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US8882921B2 (en) 2009-06-08 2014-11-11 Samsung Display Co., Ltd. Thin film deposition apparatus
US9174250B2 (en) 2009-06-09 2015-11-03 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US8802200B2 (en) 2009-06-09 2014-08-12 Samsung Display Co., Ltd. Method and apparatus for cleaning organic deposition materials
US8907326B2 (en) 2009-06-24 2014-12-09 Samsung Display Co., Ltd. Organic light-emitting display device and thin film deposition apparatus for manufacturing the same
US8536057B2 (en) 2009-06-25 2013-09-17 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light emitting device by using the same
US8709161B2 (en) 2009-08-05 2014-04-29 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US9593408B2 (en) 2009-08-10 2017-03-14 Samsung Display Co., Ltd. Thin film deposition apparatus including deposition blade
US8921831B2 (en) 2009-08-24 2014-12-30 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US8137466B2 (en) 2009-08-24 2012-03-20 Samsung Mobile Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8193011B2 (en) 2009-08-24 2012-06-05 Samsung Mobile Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8486737B2 (en) 2009-08-25 2013-07-16 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US9624580B2 (en) 2009-09-01 2017-04-18 Samsung Display Co., Ltd. Thin film deposition apparatus
US9224591B2 (en) 2009-10-19 2015-12-29 Samsung Display Co., Ltd. Method of depositing a thin film
US8951349B2 (en) 2009-11-20 2015-02-10 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US9660191B2 (en) 2009-11-20 2017-05-23 Samsung Display Co., Ltd. Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US10246769B2 (en) 2010-01-11 2019-04-02 Samsung Display Co., Ltd. Thin film deposition apparatus
US10287671B2 (en) 2010-01-11 2019-05-14 Samsung Display Co., Ltd. Thin film deposition apparatus
US9453282B2 (en) 2010-03-11 2016-09-27 Samsung Display Co., Ltd. Thin film deposition apparatus
US8833294B2 (en) 2010-07-30 2014-09-16 Samsung Display Co., Ltd. Thin film deposition apparatus including patterning slit sheet and method of manufacturing organic light-emitting display device with the same
US9018647B2 (en) 2010-09-16 2015-04-28 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US8846547B2 (en) 2010-09-16 2014-09-30 Samsung Display Co., Ltd. Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the thin film deposition apparatus, and organic light-emitting display device manufactured by using the method
US8871542B2 (en) 2010-10-22 2014-10-28 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus manufactured by using the method
US9748483B2 (en) 2011-01-12 2017-08-29 Samsung Display Co., Ltd. Deposition source and organic layer deposition apparatus including the same
US9234270B2 (en) 2011-05-11 2016-01-12 Samsung Display Co., Ltd. Electrostatic chuck, thin film deposition apparatus including the electrostatic chuck, and method of manufacturing organic light emitting display apparatus by using the thin film deposition apparatus
US9076982B2 (en) 2011-05-25 2015-07-07 Samsung Display Co., Ltd. Patterning slit sheet assembly, organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus, and the organic light-emitting display apparatus
US8707889B2 (en) 2011-05-25 2014-04-29 Samsung Display Co., Ltd. Patterning slit sheet assembly, organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus, and the organic light-emitting display apparatus
US9777364B2 (en) 2011-07-04 2017-10-03 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
US8951610B2 (en) 2011-07-04 2015-02-10 Samsung Display Co., Ltd. Organic layer deposition apparatus
US9150952B2 (en) 2011-07-19 2015-10-06 Samsung Display Co., Ltd. Deposition source and deposition apparatus including the same
US9206501B2 (en) 2011-08-02 2015-12-08 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus by using an organic layer deposition apparatus having stacked deposition sources
US9051636B2 (en) 2011-12-16 2015-06-09 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus
US9260778B2 (en) 2012-06-22 2016-02-16 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US9257649B2 (en) 2012-07-10 2016-02-09 Samsung Display Co., Ltd. Method of manufacturing organic layer on a substrate while fixed to electrostatic chuck and charging carrier using contactless power supply module
US9496524B2 (en) 2012-07-10 2016-11-15 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus using the same, and organic light-emitting display apparatus manufactured using the method
US9461277B2 (en) 2012-07-10 2016-10-04 Samsung Display Co., Ltd. Organic light emitting display apparatus
US8956697B2 (en) 2012-07-10 2015-02-17 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus and organic light-emitting display apparatus manufactured by using the method
US9466647B2 (en) 2012-07-16 2016-10-11 Samsung Display Co., Ltd. Flat panel display device and method of manufacturing the same
US8945974B2 (en) 2012-09-20 2015-02-03 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display device using an organic layer deposition apparatus
US9012258B2 (en) 2012-09-24 2015-04-21 Samsung Display Co., Ltd. Method of manufacturing an organic light-emitting display apparatus using at least two deposition units
US9306191B2 (en) 2012-10-22 2016-04-05 Samsung Display Co., Ltd. Organic light-emitting display apparatus and method of manufacturing the same
US8945979B2 (en) 2012-11-09 2015-02-03 Samsung Display Co., Ltd. Organic layer deposition apparatus, method of manufacturing organic light-emitting display apparatus by using the same, and organic light-emitting display apparatus manufactured by the method
US9136476B2 (en) 2013-03-20 2015-09-15 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus, and organic light-emitting display apparatus manufactured by the method
US8993360B2 (en) 2013-03-29 2015-03-31 Samsung Display Co., Ltd. Deposition apparatus, method of manufacturing organic light emitting display apparatus, and organic light emitting display apparatus
US9040330B2 (en) 2013-04-18 2015-05-26 Samsung Display Co., Ltd. Method of manufacturing organic light-emitting display apparatus
US9534288B2 (en) 2013-04-18 2017-01-03 Samsung Display Co., Ltd. Deposition apparatus, method of manufacturing organic light-emitting display apparatus by using same, and organic light-emitting display apparatus manufactured by using deposition apparatus
US8962360B2 (en) 2013-06-17 2015-02-24 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the organic layer deposition apparatus
US9347886B2 (en) 2013-06-24 2016-05-24 Samsung Display Co., Ltd. Apparatus for monitoring deposition rate, apparatus provided with the same for depositing organic layer, method of monitoring deposition rate, and method of manufacturing organic light emitting display apparatus using the same
US9496317B2 (en) 2013-12-23 2016-11-15 Samsung Display Co., Ltd. Method of manufacturing organic light emitting display apparatus

Similar Documents

Publication Publication Date Title
US5500256A (en) Dry process apparatus using plural kinds of gas
JP4159128B2 (en) Method and apparatus for depositing a multi-layer film having a low dielectric constant
US6030460A (en) Method and apparatus for forming dielectric films
KR100905278B1 (en) Apparatus, method for depositing thin film on wafer and method for gap-filling trench using the same
CN102414794B (en) CVD apparatus for improved film thickness non-uniformity and particle performance
US8257789B2 (en) Film formation method in vertical batch CVD apparatus
US4615294A (en) Barrel reactor and method for photochemical vapor deposition
KR100800643B1 (en) Magnetron sputtering apparatus, a rotable magnetron, and a sputtering process
US6039834A (en) Apparatus and methods for upgraded substrate processing system with microwave plasma source
US5908672A (en) Method and apparatus for depositing a planarized passivation layer
US6019848A (en) Lid assembly for high temperature processing chamber
US5919332A (en) Plasma processing apparatus
US9526159B2 (en) Rotational antenna and semiconductor device including the same
US6114216A (en) Methods for shallow trench isolation
US20090191722A1 (en) Film formation method and apparatus for semiconductor process
US5935340A (en) Method and apparatus for gettering fluorine from chamber material surfaces
US5968587A (en) Systems and methods for controlling the temperature of a vapor deposition apparatus
US5963840A (en) Methods for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions
US6099647A (en) Methods and apparatus for forming ultra-shallow doped regions using doped silicon oxide films
US5935334A (en) Substrate processing apparatus with bottom-mounted remote plasma system
KR101141870B1 (en) Film formation method and apparatus for semiconductor process
JP5287592B2 (en) The film-forming apparatus
KR100696028B1 (en) A high temperature multi-layered alloy heater assembly and related methods
US6444037B1 (en) Chamber liner for high temperature processing chamber
KR101086588B1 (en) Film formation method and apparatus for semiconductor process, and computer readable medium

Legal Events

Date Code Title Description
A201 Request for examination
N231 Notification of change of applicant
E902 Notification of reason for refusal
E601 Decision to refuse application