KR20000008100A - Metal bonding method using nickel+phosphorus, nickel+boron, or nickel+silicon plated layer - Google Patents
Metal bonding method using nickel+phosphorus, nickel+boron, or nickel+silicon plated layer Download PDFInfo
- Publication number
- KR20000008100A KR20000008100A KR1019980027776A KR19980027776A KR20000008100A KR 20000008100 A KR20000008100 A KR 20000008100A KR 1019980027776 A KR1019980027776 A KR 1019980027776A KR 19980027776 A KR19980027776 A KR 19980027776A KR 20000008100 A KR20000008100 A KR 20000008100A
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- KR
- South Korea
- Prior art keywords
- nickel
- plating
- boron
- phosphorus
- bonding
- Prior art date
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K1/00—Soldering, e.g. brazing, or unsoldering
- B23K1/008—Soldering within a furnace
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/24—Preliminary treatment
Abstract
Description
본 발명은 니켈+인, 니켈+붕소 또는 니켈+실리콘 도금층을 이용한 금속 접합 방법으로서 예를들어 냉동 공조용 라디에이터 등을 제조하는 박판 및 소형 복잡 형상 제품의 접합에 적합하게 한 것이다.The present invention is a metal bonding method using nickel + phosphorus, nickel + boron, or nickel + silicon plating layer, for example, suitable for joining thin plates and small complex shaped products for producing a radiator for refrigeration and air conditioning.
종래에는 상기와 같은 대상 금속을 접합할 때는 브레이징 공법을 사용하였기 때문에 브레이징용 필러(flller)금속이 소모되고 접합 공정이 매우 복잡하며 필러금속 적용이 곤란한 박판이나 매우 복잡한 형상을 갖는 금속간의 접합시는 매우 불리하였다.In the past, the brazing method was used to join the target metals as described above. Therefore, the brazing filler metal is consumed, the bonding process is very complicated, and the bonding between the thin plates or the metals having a very complicated shape is difficult. It was very disadvantageous.
또한 브레이징 공법은 접합의 균일성이 보장되지 않고 브레이징 필러 금속의 과부족에 의한 접합 불량 발생 가능성이 상존하였다.In addition, the brazing method does not guarantee the uniformity of the bonding, and the possibility of bonding failure due to the excessive shortage of the brazing filler metal has always existed.
본 발명은 박판 및 소형 복합 제품 형상의 금속의 접합면에 대하여 전해 또는 무전해 도금으로 5-50㎛범위로 도금하는 단계와 이를 맞대어 환원성 분위기의 연속로에서 무가압 또는 물리적 가압한 상태에서 900-1250℃로 5-30분간 가열하는 단계로서 서로 용융 접합시키는 것이다.The present invention is a step of plating in the range of 5-50㎛ by electrolytic or electroless plating on the joining surface of the metal of the thin plate and the small composite product shape to meet the 900- in a pressureless or physically pressurized state in a continuous furnace in a reducing atmosphere 5-30 minutes heating to 1250 ° C to melt bonding to each other.
이하 발명의 요지를 그 실시예인 제조 공정에 의하여 항목별로 상세히 설명하면 다음과 같다.Hereinafter, the gist of the present invention will be described in detail by item by the manufacturing process as an example.
적용 도금 기술Applied plating technology
대상 : 박판 및 소형 복합 제품 형성의 금속Target: Metal of sheet and small composite product formation
종류 : 니켈+인, 니켈+붕소 또는 니켈+실리콘Type: Nickel + Phosphorus, Nickel + Boron or Nickel + Silicon
도금 방법 : 전해 및 무전해도금Plating method: electrolytic and electroless plating
* 전해 도금 : 도금층의 균일도는 다소 떨어지나 경제성 양호* Electrolytic plating: Uniformity of plating layer is somewhat reduced but good economic efficiency
* 무전해도금 : 도금층의 균일성이 매우 우수함* Electroless plating: Excellent uniformity of plating layer
도금 공정 기술 : 기존에 실시하고 있는 방법으로 접합면에 실시하며 그 상세한 설명은 관용기술이므로 생략함Plating process technology: It is applied to the joint surface by the existing method and the detailed description is omitted because it is a conventional technology.
도금 두께 : 5-50㎛범위Plating thickness: 5-50㎛ range
* 경제성과 접합 특성을 고려하여 10㎛ 정도* About 10㎛ considering economical and bonding characteristics
접합 기술Bonding technology
적용 가열로의 분위기 : 진공 또는 환원성 분위기로Atmosphere in Applied Furnace: Into Vacuum or Reducing Atmosphere
* 스테인레스 판재 브레이징의 경우 진공로의 사용하여야 하는 본 발명의 기술을 환원성 분위기의 연속로에서 작업이 가능하므로 양산성이 우수함* In the case of stainless steel plate brazing, the technology of the present invention, which should be used in a vacuum furnace, can be operated in a continuous furnace in a reducing atmosphere, and thus excellent in mass productivity.
가열 온도 :Heating temperature:
* 니켈+인 도금 : 900-1050℃Nickel + phosphorus plating: 900-1050 ℃
* 니켈+붕소 도금 : 1050-1150℃Nickel + Boron Plating: 1050-1150 ℃
* 니켈+실리콘 도금 : 1150-1250℃* Nickel + Silicon Plating: 1150-1250 ℃
가열 시간 : 도금 종류 및 제품에 따라 5-30분유지Heating time: 5-30 minutes depending on plating type and product
기타 : 접합시 무가압 상태에서도 충분한 접합력을 얻을 수 있으나 접합력을 더욱 향상시키기 위해서는 물리적인 가압을 추가적으로 실시할Other: Although sufficient bonding strength can be obtained even under no pressure during bonding, additional physical pressure may be applied to further improve the bonding strength.
수 있음.May be.
이와 같은 공정으로서 도금층이 박판에 도금된 상태에서 용융 되어 용융 도금층이 서로 접합됨으로 이후 서냉하면 박판이 자연적으로 도금층에 의해 접합되는 것이다.As such a process, the plating layer is melted in the state where it is plated on the thin plate, and the hot dip galvanizing layers are bonded to each other.
상기한 바와 같은 본 발명은 기존 브레이징용 필러(flller)금속을 사용하지 않기 때문에 접합공정이 매우 간단하여 필러금속의 적용이 곤란한 박판이나 매우 복잡한 형상을 갖는 금속간의 접합시 특히 유리 하고 또한 도금층의 균일성이 보장됨으로써 기존 브레이징시 필러금속의 과부족에 의한 접합 불량 발생 가능성을 극소화 할 수 있음으로서 해당 산업 분야에 실용화 보급할 수 있는 것이다.As described above, the present invention does not use a conventional filler metal for brazing, so the bonding process is very simple, and it is particularly advantageous when bonding between thin plates or metals having a very complicated shape, which is difficult to apply the filler metal, and uniform plating layer. As it is guaranteed, it is possible to minimize the possibility of joining defects caused by excessive shortage of filler metal during existing brazing, and thus it can be practically distributed in the relevant industrial fields.
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Application Number | Priority Date | Filing Date | Title |
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KR1019980027776A KR100276172B1 (en) | 1998-07-10 | 1998-07-10 | Metal joining method with surface layers deposited by ni+p, ni+b or ni+si plating |
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KR1019980027776A KR100276172B1 (en) | 1998-07-10 | 1998-07-10 | Metal joining method with surface layers deposited by ni+p, ni+b or ni+si plating |
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KR20000008100A true KR20000008100A (en) | 2000-02-07 |
KR100276172B1 KR100276172B1 (en) | 2000-12-15 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100505534B1 (en) * | 2002-05-27 | 2005-08-03 | 주식회사 스펙 | A Machining And Brazing Methood Of Thin Metal Plate With Micro Flow Path And Pattern |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5874291A (en) * | 1981-10-30 | 1983-05-04 | Hitachi Ltd | Diffusion bonding method |
JPH01278977A (en) * | 1988-04-28 | 1989-11-09 | Japan Steel Works Ltd:The | Manufacture of copper-nickel clad material |
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1998
- 1998-07-10 KR KR1019980027776A patent/KR100276172B1/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100505534B1 (en) * | 2002-05-27 | 2005-08-03 | 주식회사 스펙 | A Machining And Brazing Methood Of Thin Metal Plate With Micro Flow Path And Pattern |
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