KR20000003187A - Liquid crystal display device and manufacturing method - Google Patents

Liquid crystal display device and manufacturing method Download PDF

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Publication number
KR20000003187A
KR20000003187A KR1019980024353A KR19980024353A KR20000003187A KR 20000003187 A KR20000003187 A KR 20000003187A KR 1019980024353 A KR1019980024353 A KR 1019980024353A KR 19980024353 A KR19980024353 A KR 19980024353A KR 20000003187 A KR20000003187 A KR 20000003187A
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South Korea
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liquid crystal
insulating layer
crystal display
bus line
display device
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KR1019980024353A
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Korean (ko)
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김서윤
김재민
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김영환
현대전자산업 주식회사
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Priority to KR1019980024353A priority Critical patent/KR20000003187A/en
Publication of KR20000003187A publication Critical patent/KR20000003187A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)

Abstract

PURPOSE: Conventional liquid crystal display device has possibility to damage backward membrane when scrub rubbing bract and backward membrane, destruction of unit cell by static electricity. CONSTITUTION: Liquid crystal display device is modified to provide arrangement of liquid crystal molecule without rubbing process by forming many insulating layers having grooves bottom of pixel. So it eliminates rubbing process, prevents destruction of backward membrane and static electricity. Liquid crystal display device is composed of circuit board, liquid crystal having many molecules, gate bus line forming lattice pattern, thin transistor, insulating layer. It reduces the number of process because one photolithography process is needed to form double domain.

Description

액정 표시 장치 및 그 제조방법Liquid Crystal Display and Manufacturing Method Thereof

본 발명은 액정 표시 장치 및 그 제조방법에 관한 것으로, 보다 구체적으로는, 배향막의 러빙없이도 액정 분자를 용이하게 배열시킬 수 있는 액정 표시 장치 및 그 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method for manufacturing the same, and more particularly, to a liquid crystal display device and a method for manufacturing the same, which can easily arrange liquid crystal molecules without rubbing the alignment film.

일반적으로, 액정 표시 장치는 대향하는 상하부 기판과, 상하부 기판 사이에 개재되는 액정을 포함한다. 여기서, 상하부 기판의 대향면 각각에는 액정 구동 전극과, 배향막이 형성된다.In general, the liquid crystal display device includes an upper and lower substrate facing each other and a liquid crystal interposed between the upper and lower substrates. Here, a liquid crystal drive electrode and an alignment film are formed in each of the opposing surfaces of the upper and lower substrates.

배향막은 일종의 레진막으로서, 액정 분자의 초기 배열방향을 결정하는 역할을 한다. 이때, 배향막은 액정 분자들을 일정한 방향으로 배열시키기 위하여, 러빙 공정을 실시하는데, 이 러빙 공정은 러빙포(布)로 배향막을 문질러서, 배향막에 소정의 골을 형성하여 주는 것이다.The alignment film is a kind of resin film that determines the initial alignment direction of the liquid crystal molecules. At this time, the alignment film performs a rubbing process in order to arrange the liquid crystal molecules in a predetermined direction. The rubbing process rubs the alignment film with a rubbing cloth to form a predetermined valley in the alignment film.

그러나, 상기와같이, 액정 분자를 배열시키기 위하여 배향막에 러빙 공정을 실시하게 되면, 다음과 같은 문제점이 발생된다.However, as described above, when the rubbing process is performed on the alignment layer to align the liquid crystal molecules, the following problem occurs.

첫째로, 러빙포와 배향막을 문지르는 공정시 배향막이 손상될 위험이 높다.First, there is a high risk that the alignment film is damaged during the process of rubbing the rubbing cloth and the alignment film.

둘째로는, 러빙포와 배향막 사이에 정전기가 발생되어, 단위셀이 파괴될 수 있다.Secondly, static electricity may be generated between the rubbing cloth and the alignment layer to destroy the unit cell.

따라서, 본 발명의 목적은 상술한 종래의 문제점을 해결하기 위하여, 러빙 공정없이도 액정 분자들을 용이하게 배향시킬 수 있는 액정 표시 장치 및 그 제조방법을 제공하는 것이다.Accordingly, an object of the present invention is to provide a liquid crystal display device and a method for manufacturing the same, which can easily align liquid crystal molecules without a rubbing process, in order to solve the above-mentioned conventional problems.

도 1은 본 발명의 일실시예에 따른 액정 표시 장치의 평면도.1 is a plan view of a liquid crystal display according to an exemplary embodiment of the present invention.

도 2a 및 도 2b는 본 발명에 따른 액정 표시 장치의 제조방법을 설명하기 위한 도면.2A and 2B are views for explaining a method of manufacturing a liquid crystal display device according to the present invention.

도 3은 본 발명의 다른 실시예에 따른 액정 표시 장치의 평면도.3 is a plan view of a liquid crystal display according to another exemplary embodiment of the present invention.

(도면의 주요 부분에 대한 부호의 설명)(Explanation of symbols for the main parts of the drawing)

1 - 게이트 버스 라인 3 - 데이터 버스 라인1-Gate Bus Line 3-Data Bus Line

5 - 절연층 7 - 화소 전극5-insulating layer 7-pixel electrode

상기한 본 발명의 목적을 달성하기 위하여, 본 발명의 일 견지에 따른 액정 표시 장치는, 기판, 상기 기판상에 배치되며, 수개의 분자를 갖는 액정, 기판 표면에 격자 형태로 배치된 게이트 버스 라인과 데이터 버스 라인, 상기 게이트 버스 라인과 데이터 버스 라인의 교차점 부근에 배치되는 박막 트랜지스터, 상기 게이트 버스 라인과 데이터 버스 라인으로 둘러싸여진 공간에 각각 배치되며, 상기 박막 트랜지스터와 콘택되는 화소 전극 및 상기 화소 전극 저부에 배치되며, 소정 방향으로 연장된 수개의 홈을 구비하는 절연층을 포함하는 것을 특징으로 한다.In order to achieve the above object of the present invention, a liquid crystal display device according to one aspect of the present invention, a substrate, a liquid crystal disposed on the substrate, a liquid crystal having a number of molecules, a gate bus line disposed in the form of a lattice on the substrate surface And a thin film transistor disposed near an intersection point of the data bus line, the gate bus line and the data bus line, a pixel electrode disposed in a space surrounded by the gate bus line and the data bus line, and contacted with the thin film transistor. It is characterized in that it comprises an insulating layer disposed on the bottom of the electrode having a plurality of grooves extending in a predetermined direction.

또한, 본 발명의 다른 견지에 따른 액정 표시 장치의 제조방법은, 기판상에 절연층을 형성하는 단계와, 상기 절연층 상에 홈 형성용 레지스트 패턴을 형성하는 단계와, 레지스트 패턴을 마스크로 하여, 상기 절연층을 상기 기판이 노출되도록 에칭하는 단계와, 상기 레지스트 패턴을 제거하는 단계와, 상기 패터닝된 절연층 표면에 화소 전극을 형성하는 단계를 포함하는 것을 특징으로 한다.According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, including forming an insulating layer on a substrate, forming a groove pattern resist pattern on the insulating layer, and using the resist pattern as a mask. And etching the insulating layer to expose the substrate, removing the resist pattern, and forming a pixel electrode on a surface of the patterned insulating layer.

본 발명에 의하면, 화소 전극 하단에 러빙방향과 일치하는 다수의 홈을 갖는 절연층을 형성하여, 러빙 공정없이도 액정 분자를 일정한 방향으로 배열시킨다.According to the present invention, an insulating layer having a plurality of grooves coincident with the rubbing direction is formed at the lower end of the pixel electrode to arrange liquid crystal molecules in a constant direction without a rubbing process.

(실시예)(Example)

이하 첨부한 도면에 의거하여 본 발명의 바람직한 실시예를 자세히 설명하도록 한다.Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

첨부한 도면 도 1은 본 발명의 일실시예에 따른 액정 표시 장치의 평면도이고, 도 2a 및 도 2b는 본 발명에 따른 액정 표시 장치의 제조방법을 설명하기 위한 도면이며, 도 3은 본 발명의 다른 실시예에 따른 액정 표시 장치의 평면도이다.1 is a plan view of a liquid crystal display according to an exemplary embodiment of the present invention, FIGS. 2A and 2B are views for explaining a method of manufacturing a liquid crystal display according to the present invention, and FIG. A plan view of a liquid crystal display according to another exemplary embodiment.

먼저, 도 1에 도시된 바와 같이, 하부 기판(10) 상부에 게이트 버스 라인(1)과 데이터 버스 라인(3)이 교차 배열된다. 게이트 버스 라인(1)과 데이터 버스 라인(3)의 교차점 부근에는 박막 트랜지스터(TFT)가 배치된다. 게이트 버스 라인(1)과 데이터 버스 라인(3)으로 둘러싸여진 공간에는 박막 트랜지스터(TFT)와 콘택되도록 화소 전극(7)이 배치된다.First, as shown in FIG. 1, the gate bus line 1 and the data bus line 3 are cross-aligned on the lower substrate 10. The thin film transistor TFT is disposed near an intersection point of the gate bus line 1 and the data bus line 3. The pixel electrode 7 is disposed in contact with the thin film transistor TFT in a space surrounded by the gate bus line 1 and the data bus line 3.

화소 전극(7)의 저부에는 서로 등간격으로 평행한 다수개의 홈을 갖는 절연층(5)이 구비된다. 이때, 화소 전극(7)의 홈은 러빙 방향과 평행하도록 형성된다. 본 실시예는 게이트 버스 라인과 45도 각도를 갖도록 사선 형태로 배치된다. 또한, 화소 전극(7)은 상기 절연층(5) 상부에 형성되므로, 이 절연층(5)의 형태로 형성된다.The bottom of the pixel electrode 7 is provided with an insulating layer 5 having a plurality of grooves parallel to each other at equal intervals. At this time, the groove of the pixel electrode 7 is formed to be parallel to the rubbing direction. The present embodiment is disposed diagonally so as to have a 45 degree angle with the gate bus line. In addition, since the pixel electrode 7 is formed on the insulating layer 5, the pixel electrode 7 is formed in the form of the insulating layer 5.

도 2a 및 도 2b는 이러한 액정 표시 장치에서 절연층(5) 및 화소 전극(7)의 제조방법을 설명하기 위한 것으로, 먼저, 도 2a에 도시된 바와 같이, 하부 기판(10) 상부에 절연층(5)을 증착한다. 이어서, 절연층(5) 상부에 홈을 형성하기 위한 레지스트 패턴(6)을 형성한다.2A and 2B illustrate a method of manufacturing the insulating layer 5 and the pixel electrode 7 in the liquid crystal display. First, as shown in FIG. 2A, the insulating layer is formed on the lower substrate 10. (5) is deposited. Subsequently, a resist pattern 6 for forming a groove on the insulating layer 5 is formed.

그후, 도 2b에 도시된 바와 같이, 레지스트 패턴(6)을 마스크로 하여, 절연층(5)을 기판(10)이 노출되도록 에칭하여, 홈(H1)을 형성한다. 이때, 절연층(5)은 오버 에칭되어, 단면이 삼각형 형태가 되도록 형성된다. 이어서, 레지스트 패턴(6)을 공지의 방식으로 제거한다음, 절연층(5) 상부에 화소 전극(7)을 형성한다. 그러면, 화소 전극(7)은 절연층(5)의 형상과 같이 홈(H1)을 구비한 형태로 형성된다.Thereafter, as shown in FIG. 2B, the insulating layer 5 is etched to expose the substrate 10 using the resist pattern 6 as a mask to form the groove H1. At this time, the insulating layer 5 is over-etched and formed so that a cross section may become triangular form. Subsequently, the resist pattern 6 is removed in a known manner, and then the pixel electrode 7 is formed on the insulating layer 5. Then, the pixel electrode 7 is formed in the form of the groove H1 in the form of the insulating layer 5.

이와같이 절연층(5)에 홈(H1)을 형성하는 것은 결과적으로 종래의 배향막에 골을 형성하여주는 것과 동일한 효과를 발휘한다. 즉, 종래에는 러빙포를 문질러서 골을 형성하였지만, 본 실시예에서는 절연층(5)을 식각처리하여 인위적인 골(홈)을 형성하는 것이므로, 액정 분자(도시되지 않음)들은 상기 홈(H1)이 진행 방향으로 배열된다. 따라서, 별도의 러빙 공정 없이도 액정 분자들을 배열시키게 된다.Forming the groove H1 in the insulating layer 5 in this way has the same effect as forming a valley in the conventional alignment film. That is, although a valley is formed by rubbing a rubbing cloth in the related art, in this embodiment, since the insulating layer 5 is etched to form artificial valleys (grooves), liquid crystal molecules (not shown) are formed in the grooves H1. Arranged in the direction of travel. Therefore, the liquid crystal molecules are arranged without a separate rubbing process.

도 3은 본 발명의 다른 실시예를 보인 것으로, 본 실시예에서는 화소 전극(7) 하단의 절연층(5)에 역 "V"자 형상의 홈(H2)이 형성된다. 이와같이 역 "V"자 형태의 홈(H2)이 형성되면, 액정 분자들이 결과적으로 역 V자 형태로 배열되므로 단위 화소 공간에 이중 도메인이 형성된다.3 shows another embodiment of the present invention. In this embodiment, an inverted " V " -shaped groove H2 is formed in the insulating layer 5 at the bottom of the pixel electrode 7. When the groove H2 having the inverted "V" shape is formed as described above, the liquid crystal molecules are eventually arranged in the inverted V shape, thereby forming a double domain in the unit pixel space.

본 실시예에 따르면, 공정 단계가 크게 단축된다. 즉, 일반적인 이중도메인 형성 공정은 두 번의 마스킹 공정, 두 번의 러빙 공정이 요구되었으나, 본 실시예에 의하면 한번의 포토리소그라피 공정으로 이중 도메인을 형성할 수 있다.According to this embodiment, the process step is greatly shortened. That is, the general double domain formation process requires two masking processes and two rubbing processes, but according to the present embodiment, the dual domain may be formed by one photolithography process.

본 발명은 상기한 실시예에 국한되는 것만은 아니다. 본 실시예에서는 예를들어, 사선형태, 역 V형태로 홈을 형성하였지만, "X" 형태등 다양한 형태로 변경,실시할 수 있다.The present invention is not limited to the above embodiment. In the present embodiment, for example, the grooves are formed in an oblique line shape and an inverted V shape, but can be changed and implemented in various forms such as an "X" shape.

이상에서 자세히 설명된 바와 같이, 본 발명에 의하면, 화소 전극 하단에 러빙방향과 일치하는 다수의 홈을 갖는 절연층을 형성하여, 러빙 공정없이도 액정 분자를 일정한 방향으로 배열시킨다.As described in detail above, according to the present invention, an insulating layer having a plurality of grooves coincident with the rubbing direction is formed at the lower end of the pixel electrode to arrange liquid crystal molecules in a predetermined direction without a rubbing process.

이에따라, 러빙 공정이 생략되어, 배향막이 파손되거나, 정전기가 발생되지 않는다.Accordingly, the rubbing process is omitted, so that the alignment film is not broken or static electricity is not generated.

또한, 이중 도메인도 단일의 홈 형성공정으로 달성될수 있으므로, 제조 공정이 단순해진다.In addition, dual domains can also be achieved in a single groove forming process, thus simplifying the manufacturing process.

기타, 본 발명은 그 요지를 일탈하지 않는 범위에서 다양하게 변경하여 실시할 수 있다.In addition, this invention can be implemented in various changes within the range which does not deviate from the summary.

Claims (4)

기판;Board; 상기 기판상에 배치되며, 수개의 분자를 갖는 액정;A liquid crystal disposed on the substrate and having several molecules; 기판 표면에 격자 형태로 배치된 게이트 버스 라인과 데이터 버스 라인;Gate bus lines and data bus lines disposed in a lattice form on a substrate surface; 상기 게이트 버스 라인과 데이터 버스 라인의 교차점 부근에 배치되는 박막 트랜지스터;A thin film transistor disposed near an intersection point of the gate bus line and the data bus line; 상기 게이트 버스 라인과 데이터 버스 라인으로 둘러싸여진 공간에 각각 배치되며, 상기 박막 트랜지스터와 콘택되는 화소 전극; 및A pixel electrode disposed in a space surrounded by the gate bus line and the data bus line, the pixel electrode being in contact with the thin film transistor; And 상기 화소 전극 저부에 배치되며, 소정 방향으로 연장된 수개의 홈을 구비하는 절연층을 포함하는 것을 특징으로 하는 액정 표시 장치.And an insulating layer disposed at the bottom of the pixel electrode and having a plurality of grooves extending in a predetermined direction. 제 1 항에 있어서, 상기 홈의 연장 방향은 상기 액정내 분자들의 배열될 방향인 것을 특징으로 하는 액정 표시 장치.The liquid crystal display of claim 1, wherein the extending direction of the groove is a direction in which molecules in the liquid crystal are arranged. 기판상에 절연층을 형성하는 단계;Forming an insulating layer on the substrate; 상기 절연층 상에 홈 형성용 레지스트 패턴을 형성하는 단계;Forming a groove pattern resist pattern on the insulating layer; 상기 레지스트 패턴을 마스크로 하여, 상기 절연층을 상기 기판이 노출되도록 에칭하는 단계;Etching the insulating layer to expose the substrate using the resist pattern as a mask; 상기 레지스트 패턴을 제거하는 단계; 및Removing the resist pattern; And 상기 패터닝된 절연층 표면에 화소 전극을 형성하는 단계를 포함하는 것을 특징으로 하는 액정 표시 장치의 제조방법.Forming a pixel electrode on a surface of the patterned insulating layer. 제 3 항에 있어서, 상기 절연층을 에칭하는 단계시, 절연층 단면이 삼각형 형상이 되도록 오버 에칭하는 것을 특징으로 하는 액정 표시 장치의 제조방법.4. The method of claim 3, wherein in the etching of the insulating layer, the insulating layer is overetched so that the cross section of the insulating layer has a triangular shape.
KR1019980024353A 1998-06-26 1998-06-26 Liquid crystal display device and manufacturing method KR20000003187A (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05134247A (en) * 1991-11-13 1993-05-28 Stanley Electric Co Ltd Production of liquid crystal display element
JPH07120733A (en) * 1993-10-25 1995-05-12 Casio Comput Co Ltd High-molecular dispersion type liquid crystal display device
JPH07333634A (en) * 1994-06-10 1995-12-22 Sony Corp Liquid crystal display panel
KR19990026579A (en) * 1997-09-25 1999-04-15 윤종용 Multi-domain Vertical Orientation Twisted Nematic Liquid Crystal Display Using Organic Insulating Film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05134247A (en) * 1991-11-13 1993-05-28 Stanley Electric Co Ltd Production of liquid crystal display element
JPH07120733A (en) * 1993-10-25 1995-05-12 Casio Comput Co Ltd High-molecular dispersion type liquid crystal display device
JPH07333634A (en) * 1994-06-10 1995-12-22 Sony Corp Liquid crystal display panel
KR19990026579A (en) * 1997-09-25 1999-04-15 윤종용 Multi-domain Vertical Orientation Twisted Nematic Liquid Crystal Display Using Organic Insulating Film

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