KR19990057965A - Adsorption type gas scrubber for treating gas generated during semiconductor manufacturing - Google Patents

Abstract

The present invention relates to an adsorptive gas scrubber that can increase the processing efficiency of gases generated during the manufacture of semiconductor devices by shortening the downtime of the apparatus. Adsorption type gas scrubber according to the present invention comprises a rectangular shaped cabinet; An induction pipe connected to an intake pipe to which a first pressure gauge for measuring a pressure of the gas to be intake is installed; Located adjacent to the induction pipe, a plurality of catalytic adsorbents for adsorbing the gas supplied from the induction pipe are stacked and connected with the exhaust pipe for discharge through the exhaust pipe equipped with a second pressure gauge for measuring the pressure of the treated gas. An adsorption case; A gas passage provided at the bottom for initially supplying gas from the induction pipe to the catalyst adsorbent located at the bottom of the adsorption case; By operating according to the pressure difference between the first pressure gauge and the second pressure gauge, gas passage means for supplying and shutting off gas from the induction pipe to each catalyst adsorbent laminated to the adsorption case is included.

Description

Adsorption type gas scrubber for treating gas generated during semiconductor manufacturing

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas scrubber for treating a gas generated during semiconductor manufacturing, and more particularly, to treat a gas by passing a corresponding catalyst adsorbent among catalyst adsorbents in which a gas generated during semiconductor manufacturing is laminated in multiple layers. The present invention relates to an adsorption type gas scrubber for purification.

In the semiconductor device manufacturing process, various harmful, corrosive and flammable gases are used. For example, in semiconductor manufacturing processes such as chemical vapor deposition (CVD), low pressure CVD, plasma enhanced CVD, plasma corrosion and epitaxy deposition, large amounts of silane (SiH ₄ ), dichlorosilane (SiH ₂ Cl ₂ ), ammonia ( 4NH ₃ ), nitric oxide (NO), arsine (AsH ₃ ), phosphine (PH ₃ ), diborin (B ₂ H ₆ ), boron trichloride (BCl ₃ ), etc. This is used.

Thus, waste gases generated during this semiconductor manufacturing process include silane (SiH ₄ ), dichlorosilane (SiH ₂ Cl ₂ ), ammonia (4NH ₃ ), arsine (AsH ₃ ), phosphine (PH ₃ ), di Borin (B ₂ H ₆ ), boron trichloride (BCl ₃ ), tungsten hexafluoride (WF ₆ ), phosphorus tribromide (PBr ₃ ), tetraethyl organosilicate ((C ₂ H ₅ O) ₄ Si) Toxic substances, such as triisobutylaluminum ((C ₄ H ₉ ) ₃ Al) and other organic metals, are contained in relatively high concentrations, so that these gases are not released into the atmosphere before they are released into the atmosphere to prevent air pollution from the gases. It is legally mandatory to remove these toxic substances contained in the gas.

There are three ways to treat harmful gases emitted during the semiconductor device manufacturing process: Firstly, pyrophoric gas containing mainly hydrogen groups and the like is decomposed, reacted or combusted in a combustion chamber at a high temperature of about 500 ° C to 800 ° C. The burning method is the second method, and the second method is a wetting method in which a water-soluble gas is dissolved and treated in water while passing water stored in the tank. Finally, a harmful gas that does not ignite or is insoluble in water absorbs the adsorbent. During the passage, there is an adsorption scheme which purifies by physical or chemical adsorption to the adsorbent.

In the burning scheme as described above, for example, the silane contained in the gas can be burned with oxygen or air to produce silicon dioxide particles.

Unfortunately, however, silane combustion causes a number of problems: first, silicon dioxide particles form extremely fine powders as a result of gas phase reactions, which can clog burners and In some cases, the combustion device may fail. Second, the silicon dioxide particles described above are typically collected by water washing, at which time the used wash water must be treated prior to disposal to remove the particles and various water soluble contaminants.

In addition, in order to treat the waste gas discharged during the semiconductor manufacturing process, the wet chemical solution, and the wet method by the dry chemical is to dissolve the water-soluble components in the exhaust gas by water washing, insoluble or poorly soluble in water Chemical cleaning methods can be used for adult contaminants.

However, while the above-described wetting method is effective in treating the gas generated during the semiconductor manufacturing process, in accordance with the trend of stricter regulations on water pollution, water or chemical adsorbents must be pretreated before being discharged from the workplace. As a result, the wetting method gradually decreased in use preference.

In addition, the gas adsorption method is a hazardous gas while the harmful gas is formed of carbon (C) or alumina oxide (Al ₂ O ₃ ) particles or particles coated with a metal oxide group and passed through a catalyst adsorbent composed of one particle mass. Is adsorbed to the adsorbent to treat hazardous substances in the gas by physical or chemical reactions such as:

2SiH ₄ + WF ₆ → WSi ₂ + 6HF + H ₂

SiH ₄ → Si + 2H ₂

B ₂ H ₆ → 2B + 3H ₂

However, if the adsorbent is used for a certain period of time to purify the harmful components in the gas, a large amount of harmful gas is adsorbed and agglomerated at the contact portion of the adsorbent, so that the pores between the particles through which the gas passes by the adsorbent material As a result of the blockage, the passing rate of harmful gases is lowered and the adsorbents need to be replaced frequently.

Therefore, the gas treatment apparatus using the conventional adsorption method is inconvenient to replace the adsorbent case for accommodating the adsorbent, and thus requires a lot of down time, resulting in a low processing efficiency of the gas generated during the manufacture of the semiconductor device. There was.

Accordingly, an object of the present invention is to reduce the downtime of the apparatus by having a structure in which the adsorbent case containing the catalyst adsorbent can be easily exchanged, thereby increasing the processing efficiency of the gas generated during the manufacture of the semiconductor device. To provide an adsorption type gas scrubber.

1 is a perspective view of an adsorption type gas scrubber according to the present invention;

2 is a cross-sectional view of the adsorption case of the adsorption type gas scrubber shown in FIG. 1.

3 is a side view of the catalyst adsorbent case installed in the adsorption case;

Figure 4 is a cross-sectional view of the valve piston for opening and closing the passage of the gas in the adsorption type gas scrubber according to the present invention.

(Explanation of symbols for the main parts of the drawing)

1: adsorption type gas scrubber 2: cabinet

3: induction tube 4: adsorption case

5: intake pipe 6: exhaust pipe

7: gas passage means 8: first tubular member

9,16 flange 10: second tubular member

11 piston member 12 passage member

13 valve member 14 bracket member

15 gas passage 17 disc

18: protrusion tube 19: tubular body

20: catalyst adsorbent case 21: lead member

25: support 26: gas passage hole

29: first valve 30: second valve

31 connector 33 catalyst adsorbent

P1: first pressure gauge P2: second pressure gauge

The object as described above, the rectangular shaped cabinet; An induction pipe connected to an intake pipe to which a first pressure gauge for measuring a pressure of the gas to be intake is installed; Located adjacent to the induction pipe, a plurality of catalyst adsorbents for adsorbing the gas supplied from the induction pipe is stacked and discharged through the exhaust pipe is provided with a second pressure gauge for measuring the pressure of the treated gas; A suction case connected to the suction case; A gas passage provided at the lowermost portion for initially supplying gas from the induction pipe to the catalytic adsorbent located at the lowermost portion of the adsorption case; Operating according to the pressure difference between the first pressure gauge and the second pressure gauge to include gas passage means for supplying and shutting off gas from the induction pipe to each catalyst adsorbent laminated to the adsorption case. It is achieved by the adsorptive gas scrubber according to the present invention.

The adsorption type gas scrubber according to the present invention includes: a connecting pipe connecting the intake pipe and the exhaust pipe, and a first opening / closing valve installed on a path from the intake pipe to the induction pipe; It may further include a second on-off valve installed in the connecting pipe.

The gas passage means is fixed to an outer circumferential surface of the adsorption case, and includes a multilayer piston member operated when a difference between the induction gas pressure and the exhaust gas pressure measured by the first and second pressure gauges is greater than a predetermined value; Communicating with the piston member, the tubular member provided in one part of the induction pipe and the tubular member provided in the multilayer part in one side of the adsorption case to communicate with each of the catalyst adsorbents stacked in the adsorption case. It includes a plurality of passage members each provided with a valve member.

The passage member has one end connected to the induction pipe, the middle portion is connected to the suction case, and the valve member is located at the other end of the passage member when the guide tube and the suction case are in communication. .

The catalyst adsorbent is provided to an adsorbent case formed of a cylindrical container fixed to an inner surface of the adsorption case by a support and having an open top, and the adsorbent case has a tubular member connected to an intermediate portion of the passage member on one side thereof. Have

The catalyst adsorbent is carbon (C) or alumina oxide (Al ₂ O ₃ ) particles or particles coated with a metal oxide group.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a perspective view of an adsorption type gas scrubber according to the present invention, and FIG. 2 is a cross-sectional view of an adsorption case of the adsorption type gas scrubber shown in FIG. 1.

As shown in Figs. 1 and 2, the adsorptive gas scrubber 1 according to the present invention includes a cabinet 2 of a rectangular shape. The cabinet 2 is provided at one side with a door (not shown) that can be opened and closed from the outside. The gas generated in the manufacture of the semiconductor device is led to the induction pipe 3 located in the cabinet 2 through the intake pipe 5 penetrating the upper part of the cabinet 2. The gas guided through the intake pipe 5 is measured by the first pressure gauge P1 provided in the intake pipe 5. The induction pipe 3 is connected to the intake pipe 5 and the flange joint in the upper part, and is detachably fixed to the bottom of the cabinet 2 in the closed state of the lower part.

A cylindrical suction case 4 is positioned adjacent to the induction pipe 3, and the suction case 4 has an upper portion sealed by a disc 17, and an exhaust pipe 6 and Protruding pipe 18 is formed to be connected. The lower part of the suction case 4 is detachably supported at the bottom of the cabinet 2 via a plurality of brackets 27, and wheels 28 are provided to be taken out of the cabinet 2 through the door.

In the adsorption case 4, a plurality of catalyst adsorbents 33 for adsorbing the gas supplied from the induction pipe 3 are stacked in the adsorbent case 20 (see FIG. 3), and the adsorption case 4 As described above, the exhaust pipe 6 for discharging the gas adsorbed by the catalyst adsorbent 33 is detachably connected by means such as a clamp. The exhaust pipe 6 is provided with a second pressure gauge P2 for measuring the pressure of the treated gas.

In addition, the induction pipe 3 and the suction case 4 are provided with a plurality of first and second tubular members 8 and 10 at one side, as shown in FIG. 1, and the first and second tubular members ( Flanges 9 and 16 are formed at the ends of 8 and 10, respectively. The first tubular member 8, which is located at the bottom of the induction pipe 3, is provided at the initial stage of operation by way of the adsorption case through the gas passage 15 such that gas is supplied to the catalyst adsorbent 33 located at the bottom of the adsorption case 4. The second tubular member 10 provided at the bottom of (4) is detachably connected by connecting means such as a clamp.

The gas passage 15 is composed of a solid tubular element 15a and a flexible tubular element 15b which is flanged to the solid tubular member 15a as shown in the figure, which is a flexible tubular element 15b. The distance between the induction pipe 3 and the adsorption case 4 is advantageous in that it is possible to provide elasticity with respect to the connection distance when the fluidity is somewhat fluid.

On the other hand, as shown in the figure, a gas passage means 7 is provided for connecting the first and second tubular members 8, 10 and the second or more from the bottom of the guide tube 3 and the suction case 4. This gas passage means 7 is provided for supplying and shutting off the gas led to the induction pipe 3 to the catalyst adsorbent 33 located in the second or more layers of the adsorption case 4.

As shown in more detail in FIG. 4, the gas passage means 7 includes a multilayer piston member 11 fixed to an outer circumferential surface of the suction case 4 and a multilayer agent provided on one side of the induction pipe 3. The piston member communicates with the first tubular member 8 and the second tubular member 10 provided in multiple layers on one side of the adsorption case 4 so as to communicate with each of the catalyst adsorbents 33 stacked on the adsorption case 4. A multi-layer passage member 12 provided with a valve member 13 interlocking with 11, wherein the piston member 11 is an induction gas measured by the first and second pressure gauges P1, P2. It is activated when the difference between the pressure and the exhaust gas pressure is greater than the predetermined value.

The piston member 11 and the passage member 12 have a piston member 11 and a passage member 12 connected to each other through the bracket member 14, the tubular member 8 of the guide pipe 3 and the suction case. Another tubular member 10 formed on the outer circumferential surface of (4) is detachably connected to each other. The passage member 12 can also provide elasticity with respect to the connecting distance between the induction pipe 3 and the suction case 4 by having the same configuration as the gas passage 15.

The catalyst adsorbent 33 used in the present invention is carbon (C) or alumina oxide (Al ₂ O ₃ ) particles or particles coated with a metal oxide group. The catalyst adsorbent 33 formed of such particles is accommodated in the catalyst adsorbent case 20 as shown in FIG. 3, and the catalyst adsorbent case 20 is inserted into the second tubular member 10 of the catalyst adsorbent 33. The tubular body 19 to be formed has a form of a container formed on one side. The catalyst adsorbent case 20 is covered by the one-lead member 21 in a state where the catalyst adsorbent 33 is accommodated, and the lead member 21 has a hole 24 and a catalyst through which the fastening bolt 22 penetrates in the center portion. A plurality of gas passage holes 26 are formed so that the gas passing through the adsorbent 33 is discharged to the top, and the catalyst adsorbent case 20 also has a hole 27 through which the bolt 22 penetrates at the bottom center.

By the above-described configuration, in the state where the catalyst adsorbent 33 is fully accommodated in the catalyst adsorbent case 20, the bolt 22 is formed in the hole 24 and the catalyst adsorbent case 20 formed in the lead member 21. The lead member 21 is connected to the catalyst adsorbent case by the nut 23 being fastened to the end of the bolt 22 in the state where it penetrates the formed hole 27 and protrudes through the bottom of the catalyst adsorbent case 20. It is fixedly coupled to 20. Therefore, the catalyst adsorbent 33 can be reliably accommodated in the catalyst adsorbent case 20.

As described above, the lowermost catalyst adsorbent case 20a containing the catalyst adsorbent 33 is supported on the bottom of the cabinet 2 through the support 25 as shown in FIG. 2, and the second or more catalyst adsorbents. The cases 20b, c, and d are supported by the catalyst adsorbent case 20 directly below the support 25. In order to prevent the flow of the supports 25, it is preferable that grooves or holes through which the supports 25 are inserted are formed on the surface of the lid member 21 and the bottom surface of the catalyst adsorbent case 20.

On the other hand, the intake pipe 5 communicates with the exhaust pipe 6 through a connecting pipe 31 connected by a connecting means such as a clamp, and the connecting pipe 31 and the exhaust pipe 6 are also connected by a connecting means such as a clamp. It is detachably connected. The first valve 29 is provided in the intake pipe 5, and the second valve 30 is provided in the connection pipe 31, and is formed in all catalyst adsorbents 33 installed in the adsorption case 4, for example. When the gas passage space is closed by foreign matter and the desorption efficiency of the gas decreases, when the catalyst adsorbent 33 is exchanged, the gas sucked into the intake pipe 5 can be bypassed to the exhaust pipe 6.

That is, by closing the first valve 29 to block the gas flow from the intake pipe 5 to the induction pipe 3, and at the same time open the second valve 30 provided in the connecting pipe 31, The gas sucked into the intake pipe 5 is bypassed to the exhaust pipe 6 through the connecting pipe 31.

The connecting pipe 31 has elasticity with respect to the connecting distance between the intake pipe 5 and the exhaust pipe 6 by having a flexible tubular body similar to the passage member 12 and the gas passage 15 as shown in the drawing. Can have

The operation of the adsorption type gas scrubber 1 according to the present invention having the configuration as described above will be described.

First, the gas initially introduced into the induction pipe 3 through the intake pipe 5 is transferred from the induction pipe 3 to the catalyst adsorbent 33 positioned at the bottom of the adsorption case 4 through the passage member 12. Supplied. While passing through the passageway space between the particles of the catalyst adsorbent 33, the gas is chemically and physically adsorbed to the catalyst adsorbent 33, thereby causing chemical and physical reactions as described above, And the gas which has been treated with harmful components by physical reaction and purified, is discharged to the upper portion through the gas passage hole 26 formed in the lid member 21 which seals the upper portion of the catalyst adsorbent case 20.

On the other hand, the particles of the catalyst adsorbent 33 are adsorbed by harmful gas in the gas as the gas continuously passes through the catalyst adsorbent 33, and the adsorption of such harmful components causes the particles between the catalyst adsorbent 33 to adsorb. The passage space becomes clogged, and the passage amount of harmful gas becomes small.

As described above, when the passage space between the particles of the catalyst adsorbent 33 is blocked by adsorption of harmful components in the gas to the catalyst adsorbent 33, it passes through the catalyst adsorbent 33 and passes through the exhaust pipe 6. The pressure of the discharged gas is lowered, and the pressure of this gas is measured by the second pressure gauge P2 provided in the exhaust pipe 6.

The pressure of the gas measured by the second pressure gauge P2 is compared with the induction gas pressure measured by the first pressure gauge P1 provided in the intake pipe 5 to obtain a pressure difference. At this time, when the obtained pressure difference becomes larger than the set pressure difference, the piston member 11 of the gas passage means 7 located directly above the gas passage 15 is operated. The operation of this piston member 11 is already programmed in the main device of the adsorptive gas scrubber according to the invention so that the gas passage means 7 located immediately above is operated when the pressure difference obtained as described above becomes larger than the set pressure difference. do.

When the pressure difference between the pressure value measured by the second pressure gauge P2 and the induced gas pressure value measured by the first pressure gauge P1 is larger than the set pressure difference, the valve member of the gas passage means 7 concerned. 13 is moved from the induction pipe 3 to the lower position of the suction case 4 by moving from the solid line position shown in FIG. 4 by the operation of the piston member 11 to the position shown by the dashed line. The gas supply to the catalytic adsorbent 33 is started, and performs the same operation as the catalyst adsorbent 33 located at the bottom.

The process as described above is repeated up to the catalyst adsorbent 33 located at the top of the adsorption case 4, and if the catalyst adsorbent 33 located at the top deteriorates the adsorption efficiency for harmful components in the gas, i.e. the top The pressure of the gas passing through the catalyst adsorbent 33 of the gas discharged through the exhaust pipe 6 is measured by the second pressure gauge P2 and compared with the induced gas pressure value measured by the first pressure gauge P1. When the pressure difference is greater than the set pressure difference, all the catalyst adsorbents 33 installed in the adsorption case 4 must be replaced with a new catalyst adsorbent 33.

The exchange of the catalyst adsorbent 33 is carried out by a number of components connected to the adsorption case 4 by means of connecting means such as clamps, for example exhaust pipes 6, gas passage means 7, gas passage 15 and connections. After the pipe 31 or the like is separated from the suction case 4, the suction case 4 is made out of the cabinet 2.

At this time, the disc 17 which seals the upper part of the suction case 4 is separated from the suction case 4 by releasing the upper bolt 32, and the upper part of the suction case 4 is opened, and The adsorbent case 20 is separated from the adsorption case 4 in the order from the adsorbent case 20d positioned at the lower side through the upper part of the adsorption case 4 to the adsorbent case 20a positioned at the lower portion, and the new catalyst adsorbent An adsorbent case 20 on which 33 is mounted is installed in the adsorption case 4 in the reverse order of the above procedure.

The adsorption case 4 provided with the adsorbent case 20 with the new catalyst adsorbent 33 is installed into the cabinet 2 in the reverse order of the separation procedure of the adsorption case 4 described above.

As described above, according to the adsorption type gas scrubber according to the present invention, the semiconductor according to the shortening of the downtime of the device is provided by having a structure in which the adsorbent case containing the catalyst adsorbent can be easily and quickly exchanged from the adsorption case. The treatment efficiency of noxious gases generated during the manufacture of the device can be increased in proportion to the shortening of the downtime of the apparatus.

Claims (9)

A square shaped cabinet; An induction pipe connected to an intake pipe to which a first pressure gauge for measuring a pressure of the gas to be intake is installed; Located adjacent to the induction pipe, a plurality of catalyst adsorbents for adsorbing the gas supplied from the induction pipe is stacked and discharged through the exhaust pipe is provided with a second pressure gauge for measuring the pressure of the treated gas; A suction case connected to the suction case; A gas passage provided at the lowermost portion for initially supplying gas from the induction pipe to the catalytic adsorbent located at the lowermost portion of the adsorption case; Operating according to the pressure difference between the first pressure gauge and the second pressure gauge to include gas passage means for supplying and shutting off gas from the induction pipe to each catalyst adsorbent laminated to the adsorption case. Adsorption type gas scrubber characterized by the above-mentioned. According to claim 1, A connecting pipe for connecting the intake pipe and the exhaust pipe; A first opening / closing valve installed on a path from the intake pipe to the induction pipe; Adsorption gas scrubber, characterized in that it further comprises a second on-off valve installed in the connecting pipe. 2. The multilayer according to claim 1, wherein the gas passage means is fixed to an outer circumferential surface of the adsorption case, and is operated when the difference between induced gas pressure and exhaust gas pressure measured by the first and second pressure gauges is lower than a predetermined value. A piston member of; Communicating with the piston member, the tubular member provided in one part of the induction pipe and the tubular member provided in the multilayer part in one side of the adsorption case to communicate with each of the catalyst adsorbents stacked in the adsorption case. An adsorptive gas scrubber comprising multiple passage members each provided with a valve member. 4. The passage member according to claim 3, wherein one end portion of the passage member is connected to the induction pipe, an intermediate portion thereof is connected to the suction case, and the valve member is connected to the passage member when the guide tube and the suction case communicate. Adsorption type gas scrubber, characterized in that located on the other end. 2. The catalyst adsorbent according to claim 1, wherein the catalyst adsorbent is provided in an adsorbent case formed by a support and formed into a cylindrical container fixed to an inner surface of the adsorption case and having an open top, wherein the adsorbent case is at one side of the intermediate portion of the passage member. Adsorption type gas scrubber, characterized in that it has a tubular member connected with. 6. The adsorptive gas scrubber according to claim 5, wherein the catalytic adsorbent is carbon (C) particles. The gas scrubber of claim 5, wherein the catalyst adsorbent is carbon (C) particles coated with a metal oxide group. The gas scrubber of claim 5, wherein the catalytic adsorbent is alumina oxide (Al ₂ O ₃ ) particles. The gas scrubber of claim 5, wherein the catalyst adsorbent is alumina oxide (Al ₂ O ₃ ) particles coated with a metal oxide group.