KR19990039399A - Clean Room Mask - Google Patents

Abstract

The present invention relates to a mask for a clean room.

The mask for a clean room according to the present invention includes a support member having rigidity so that a free space can be formed between the face and the mask when the mask for the clean room is worn.

The material of the support member is a high molecular compound or composite or shape memory.

Therefore, the lining of the mask for the clean room is spaced apart from the face to prevent the phenomenon that the clean room mask is wet by the breathing occurs in the mouth has the effect of preventing the performance degradation of the mask for the clean room and deterioration of fit.

Description

Clean Room Mask

The present invention relates to a mask for a clean room, and more particularly, to a mask for a clean room including a support member that forms a space between the face and the mask when the clean room mask is worn.

In the era of high-tech industry, clean technology is the key technology to improve the performance and production yield of high-tech products according to the trend of ultra precision, high purity and aseptic production.

The clean room, a facility that cleans the environment of the production space based on such a clean technology, is not a local but overall concept. Semiconductor, liquid crystal display, electronics, new materials, precision machinery, and chemicals for semiconductors It is also used in chemical plants, food industry, agriculture, and space development.

Currently, 64MRAM is being mass-produced in semiconductor devices, and 1GDRAM and 4GDRAM are being accelerated with preparation of 256MRAM.

In addition, the thin film thickness of the silicon oxide film to be laminated is 8 nm or less, and the state of the art ultrafine processing technology must be utilized. Supporting such ultra-fine processing technology is clean room technology.

The clean state of the clean room is important for the clean room technicians, but the worker's clothing is also an important factor. Therefore, the worker should wear dustproof clothes and work. In order to wear the anti-vibration clothing, the worker should be equipped with a dust cap and a mask for a clean room. The clean room mask serves to prevent the particles and moisture discharged from the nose and mouth of the operator is formed in the clean room.

1 is a schematic configuration diagram showing a state of a mask for a clean room according to a conventional method.

As shown in Fig. 1, the mask for clean room 2 is located at the upper end of the mask for clean room 2 so as not to leak upwards, and is made of soft wire so that the iron core 4 is fixed when bent. It is formed on the left and right sides of the folded portion (6), the left side of the clean room mask (2), the mask surface of the clean room mask (2), has a softness to reduce pain in the ear and to fix the mask for the clean room on the face It consists of an earring 8, a left band 14 forming the left and right sides of the mask 2 for the clean room, a right band 10, and a lower end 12 of the mask 2 for the clean room.

FIG. 2 is a cross-sectional view taken along the line AA ′ of FIG. 1. FIG.

As shown in FIG. 2, the mask is composed of an iron core 4, a folded portion 6, an outer fabric 22, a filter 24, and an inner fabric 26. As shown in FIG.

In the clean room mask, a phenomenon occurs that the surface of the mask sticks around the mouth when worn for a long time. The reason why the clean room mask is attached around the mouth is that the water vapor emitted from the nose or mouth when talking or breathing while wearing the clean room mask is absorbed by the surface fiber tissue of the clean room mask and is in contact with the lining of the face. This is because the mask for the clean room gradually becomes wet.

If you continue to wear the clean room mask while wet, it will not be able to effectively block particles and bacteria that are contaminants from the mouth by reducing the characteristics of the clean room mask and make breathing more difficult than a dry clean room mask. There is a problem that makes the worker offended by sharply drop fit.

An object of the present invention is to solve the problems of the prior art by inserting a support member that allows the space formed between the face and the mask to reduce the contamination of the clean room, the operator is uncomfortable and wear a good mask for clean room To provide.

1 is a schematic configuration diagram showing a state of a mask for a clean room according to a conventional method.

FIG. 2 is a cross-sectional view taken along the line AA ′ of FIG. 1. FIG.

3 is a schematic configuration diagram showing a state of a mask for a clean room according to the present invention.

FIG. 4 is a cross-sectional view taken along the line BB ′ of FIG. 3.

※ Explanation of symbols for main parts of drawing

30; Clean room mask 32; Iron core

34; Folded part 36; Support member

38; Earrings 40; Right band

42; Bottom 44; Left band

52; Outer shell 54; filter

56; lining

Mask for clean room used in the clean room (Clean Room) according to the present invention for achieving the above object is rigid so that a free space can be formed between the face and the mask for the clean room when wearing the mask for the clean room It comprises a support member having a.

The support member is preferably formed in the middle portion of the mask for the clean room.

The material of the support member is preferably a polymer compound or a composite.

Preferably, the material of the support member is a shape memory.

The support member is preferably placed in the transverse or longitudinal direction of the mask for the clean room.

The length of the support member is preferably 70% to 100% of the length or length of the mask for the clean room.

The width of the support member is preferably 3 mm to 10 mm.

The thickness of the support member is preferably 0.5 mm to 1.5 mm.

The support member is preferably fixed to be positioned over the left and right bands of the mask for the clean room.

The support member is preferably attached to the outer surface of the outer fabric (Outer Fabric) of the mask for the clean room.

The support member is preferably located between the outer fabric and the filter of the mask for the clean room.

The support member is preferably located between the filter and the inner fabric of the mask for the clean room.

Hereinafter, with reference to the accompanying drawings a specific embodiment of the present invention will be described in detail.

3 is a schematic configuration diagram showing a state of a mask for a clean room according to the present invention.

As shown in FIG. 3, the clean room mask 30 is located at the upper end of the clean room mask 30 so as not to leak upwards, and is made of soft wire so that the iron core 32 is fixed when bent. The support member 36 is fixedly positioned over the folded portion 34 of the mask 30 of the clean room mask 30, the left band 44 and the right band 40 of the mask 30 for clean room. , Earrings 38 formed on the left and right sides of the clean room mask 30 to reduce the pain in the ear by having a softness and fixing the mask 30 for the clean room to the face, and the left and right sides of the clean room mask 30 for the clean room. The left band 44, the right band 40 and the lower portion 42 is formed.

Since the support member 36 is made of a polymer compound and has rigidity, the support member 36 is bent to the outside of the face when the mask 30 for the clean room is worn, so that a space is provided between the masks 30 for the clean room. It is formed to prevent the clean room mask 30 is wetted by the operator's breathing to reduce the contamination of the clean room and to make the operator feel uncomfortable and good to wear.

FIG. 4 is a cross-sectional view taken along the line BB ′ of FIG. 3.

As shown in FIG. 4, the mask for the clean room includes an iron core 32, a folded portion 34, an outer fabric 52, a filter 54, a support member 36, and an inner fabric. It consists of 56. The support member 36 is located between the filter 54 and the lining 56. The support member 36, like the iron core 32, is formed between the surface of the outer fabric 52 or the outer fabric 52 and the filter 54 or a filter 54. It may be located between the 54 and the inner fabric (56).

Therefore, according to the present invention, when the clean room mask is worn on the face as described above, the clean room mask pulled by the earrings becomes a parabolic shape by a support member, whereby the lining of the clean room mask is fixed on the face. As a result of the breathing occurring in the mouth, the clean room mask reduces the wet time, thereby preventing the performance of the clean room mask and the deterioration of wearing comfort.

Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications are within the scope of the appended claims.

Claims (14)

In a clean room mask used in a clean room, And a support member having rigidity so that a free space can be formed between the face and the mask when the mask for the clean room is worn. The method of claim 1, The support member is a mask for the clean room, characterized in that formed in the middle portion of the mask for the clean room. The method of claim 1, The material for the support member is a mask for the clean room, characterized in that the polymer compound or composite. The method of claim 1, The material of the support member is a mask for the clean room, characterized in that the shape memory. The method of claim 1, The support member is a mask for the clean room, characterized in that placed in the transverse direction of the mask for the clean room. The method of claim 1, The support member is a mask for the clean room, characterized in that placed in the longitudinal direction of the mask for the clean room. The method of claim 1, The length of the support member is a mask for the clean room, characterized in that 70% to 100% of the horizontal length of the mask for the clean room. The method of claim 1, The length of the support member is the mask for the clean room, characterized in that 70% to 100% of the longitudinal length of the mask for the clean room. The method of claim 1, The width of the support member is the mask for the clean room, characterized in that 3 mm to 10 mm. The method of claim 1, The thickness of the support member is the mask for the clean room, characterized in that 0.5mm to 1.5mm. The method of claim 1, The support member is a mask for the clean room, characterized in that fixedly positioned over the left and right bands of the mask for the clean room. The method of claim 1, The support member is a mask for the clean room, characterized in that attached to the outer surface of the outer fabric (Outer Fabric) of the mask for the clean room. The method of claim 1, The support member is a mask for the clean room, characterized in that located between the outer fabric (Outer Fabric) of the clean room mask and the filter. The method of claim 1, The support member is a mask for the clean room, characterized in that located between the filter and the lining (Inner Fabric) of the mask for the clean room.