KR19990014161A - Radiation-sensitive coloring composition - Google Patents

Radiation-sensitive coloring composition Download PDF

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KR19990014161A
KR19990014161A KR1019980029871A KR19980029871A KR19990014161A KR 19990014161 A KR19990014161 A KR 19990014161A KR 1019980029871 A KR1019980029871 A KR 1019980029871A KR 19980029871 A KR19980029871 A KR 19980029871A KR 19990014161 A KR19990014161 A KR 19990014161A
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radiation
group
pigment
sensitive
composition according
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KR1019980029871A
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KR100535902B1 (en
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노부오 스즈키
쯔토무 오키타
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무네유키 마사유키
후지샤신휘루무 카부시키가이샤
타키모토 마사아키
후지휘루무오린 카부시키가이샤
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041Optical brightening agents, organic pigments
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Abstract

고안료 농도에서도 노광부분이 충분하게 경화되고, 더욱이 현상성이 양호한 감방사선성 착색조성물을 제공하는 것. 특정의 구조를 가지는 s-트리아진계의 광중합개시제를 함유하는 감방사선 착색조성물.To provide a radiation-sensitive colored composition that is sufficiently cured at the exposure material concentration and develops well. A radiation-sensitive coloring composition containing an s-triazine-based photopolymerization initiator having a specific structure.

Description

감방사선성 착색조성물Radiation-sensitive coloring composition

본 발명은 감방사선선 착색조성물, 상세하게는 액정소자나 고체촬상소자에 사용되는 컬러필터를 제작하기에 적합한 감방사선성 착색조성물에 관한 것이다.The present invention relates to a radiation-sensitive coloring composition suitable for producing a radiation-sensitive coloring composition, specifically a color filter for use in liquid crystal devices or solid-state imaging devices.

액정표시소자나 고체촬상소자에 사용되어지는 컬러필터를 제작하는 방법으로서는 염색법, 인쇄법, 전착법 및 안료분산법이 알려지고 있다.As a method of manufacturing the color filter used for a liquid crystal display element or a solid-state image sensor, the dyeing method, the printing method, the electrodeposition method, and the pigment dispersion method are known.

이들 중, 안료분산법은 안료를 여러 가지 감방사선성 성분으로 분산시킨 감방사선성 착색조성물을 이용하여 광석판인쇄법에 의해 컬러필터를 제작하는 방법이다. 이 방법은 안료를 사용하기 때문에 비교적 빛이나 열 등에 안정함과 동시에, 포트린법에 의해 본떠서 만들어지기 때문에, 위치정도도 충분하게 큰 화면, 고정밀 컬러디스플레이용 컬러필터의 제작에 적당한 방법이다.Among these, the pigment dispersion method is a method of manufacturing a color filter by the ore plate printing method using the radiation sensitive coloring composition which disperse | distributed the pigment to various radiation sensitive components. Since this method uses a pigment, it is relatively stable to light, heat, and the like, and is produced by the Portrin method. Therefore, this method is suitable for manufacturing a screen with a sufficiently large position and color filters for high-precision color display.

한편, 레지스트용의 감방사선성 조성물의 감방사선성 성분으로서의 광중합 개시제로서 여러가지가 제안되어지고 있다. 이들 중에서 컬러필터 작성용의 감방사선성 착색조성물에 범용되어지는 광중합개시제로서는 (4-몰포리노페닐)벤질부타놀(특개평4-340965호 공보참조), 2-(p-메톡시스티릴)-4,6-비스(트리클로로메틸)-S-트리아진(특개평6-201913호 공보), 디에틸티옥산톤(특개평6-51499호 공보 참조), 일가큐아-369, -651, -907(이상 상품명, Ciba-Geigy사에서 제작) 등의 벤조일 화합물 등을 들 수 있다.On the other hand, various are proposed as a photoinitiator as a radiation sensitive component of the radiation sensitive composition for resists. Among these, photopolymerization initiators commonly used in radiation-sensitive coloring compositions for creating color filters include (4-morpholinophenyl) benzylbutanol (see Japanese Patent Application Laid-Open No. 4-340965) and 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -S-triazine (Japanese Patent Application Laid-Open No. Hei 6-201913), diethyl thioxanthone (see Japanese Patent Application Laid-Open No. Hei 6-51499), Ilgacua-369, -651, Benzoyl compounds, such as -907 (above brand name, the Ciba-Geigy company make), etc. are mentioned.

최근 높은 색순도를 확보하기 위해 안료 농도를 높인 컬러필터의 개발이 요구되어지고 있고, 따라서, 안료 농도가 높아져도 충분하게 경화된 레지스트를 부여하는 감방사선 착색조성물의 출현이 요구되고 있다. 그러나, 컬러필터 작성용으로 널리 사용되고 있는 상기 광중합 개시제로는 상기 요망으로 충분하게 대응될 수 없고, 어떠한 광중합 개시제를 사용하면 좋을지 잘 알수 없었던 것이 현실이었다.In order to secure high color purity, development of a color filter having a high pigment concentration is required in recent years, and therefore, the appearance of a radiation-sensitive coloring composition which imparts a sufficiently cured resist even when the pigment concentration is high is required. However, it was a reality that the photoinitiator widely used for color filter creation could not be sufficiently met by the above requirements, and it was difficult to know what kind of photoinitiator should be used.

또한, 컬러필터제조 공정의 단축을 위해서 산소차단막이 없어도 충분하게 경화하는 감방사선성 착색조성물, 저노광량으로 충분하게 경화하는 감방사선성 착색조성물이 요구되고 있다.Furthermore, in order to shorten a color filter manufacturing process, the radiation sensitive coloring composition which fully hardens | cures even without an oxygen barrier film, and the radiation sensitive coloring composition which fully hardens with low exposure amount is calculated | required.

더욱이, 안료분산법에 의해 제조되어진 컬러필터가 비교적 내열성, 내광성에 우수하고, 또한, 열변색이 적고, 장기간 사용하여도 광퇴색이 적은 컬러필터를 부여하는 감방사선성 착색조성물이 요구되어지고 있다.Furthermore, there is a need for a radiation-sensitive coloring composition that provides a color filter produced by the pigment dispersion method, which is relatively excellent in heat resistance and light resistance, and which gives a color filter that has less thermal discoloration and less light fading even after long-term use. .

본 발명의 목적은 컬러필터의 제조에 호적하게 사용되는 감방사선성 착색조성물을 제공하는 것이다.An object of the present invention is to provide a radiation-sensitive coloring composition which is preferably used for the production of color filters.

상세하게는, 본 발명의 목적은 고안료 농도에서도 노광부분이 충분하게 경화되고, 또한 현상성이 양호한 감방사선성 착색조성물을 제공하는 것이다.Specifically, it is an object of the present invention to provide a radiation-sensitive colored composition in which the exposed portion is sufficiently cured even at a high concentration of a design material and has good developability.

본 발명의 다른 목적은 저노광량으로 충분하게 경화하여 얻는 감방사선성 착색조성물을 제공하는 것이다.Another object of the present invention is to provide a radiation-sensitive colored composition obtained by sufficiently curing at a low exposure amount.

본 발명의 더욱 다른 목적은 산소차단막이 없어도 충분하게 경화하여 얻는 감방사선성 착색조성물을 제공하는 것이다.A further object of the present invention is to provide a radiation-sensitive colored composition obtained by curing sufficiently without an oxygen barrier film.

본 발명의 더욱 다른 목적은 열백생이 적고, 또한, 장기간 사용하여도 광퇴색이 적은 컬러필터를 부여할 수 있는 감방사선성 착색조성물을 제공하는 것이다.A further object of the present invention is to provide a radiation-sensitive coloring composition which can give a color filter which is less than ten times life and has little light fading even after long-term use.

본 발명자는 상기 목적을 달성하기 위해 연구한 바, 감방사선성 착색조성물, 특히 컬러필터의 제조용의 감방사선성 착색조성물에는 사용되는 것이 아닌 특정한 광중합 개시제를 사용하는 것에 의해 상기 목적이 달성되는 것이 밝혀졌다.The present inventors have studied to achieve the above object and found that the above object is achieved by using a specific photopolymerization initiator which is not used in the radiation-sensitive coloring composition, especially the radiation-sensitive coloring composition for the production of color filters. lost.

본 발명에 의하면, 하기 구성에 의해 본 발명의 상기 목적이 달성되어지는 것이 나타난다.According to this invention, it turns out that the said objective of this invention is achieved by the following structures.

(1) 감방사선성 성분, 결착수지, 안료, 및 용제를 함유하는 감방사선성 착색조성물에 있어서,(1) A radiation sensitive colored composition containing a radiation sensitive component, a binder resin, a pigment, and a solvent,

상기 감방사선성 성분이 하기 화학식(Ⅰ)∼(Ⅳ)으로 나타나는 화합물로 이루어진 군으로부터 선택된 적어도 1종의 광중합 개시제를 함유하는 것을 특징으로 하는 감방사선성 착색조성물.A radiation-sensitive colored composition, wherein the radiation-sensitive component contains at least one photopolymerization initiator selected from the group consisting of compounds represented by the following formulas (I) to (IV).

[화학식 중, R1은 복수 존재할 때는 각각 독립으로, 수소원자, 히드록시기, 탄소원자 1개 내지 3개의 알킬기 또는 알콕시기를 나타내고, R2및 R3는 각각 독립으로, 수소원자 또는 탄소원자 1개 내지 3개의 알콕시기를 나타내고, R2및 R3의 어느것이 한쪽은 알콕시기이고; R4는 수소원자, 탄소원자 1개 내지 3개의 알킬기 또는 알콕시기를 나타내고, R5및 R6는 각각 독립으로 탄소원자 1개 내지 3개의 알킬기를 나타내고; R7은 수소원자, 히드록시기, 탄소원자 1개 내지 3개의 알킬기 또는 알콕시기를 나타내고; T는 하기 화학식으로 나타나는 기를 나타내고: m은 1∼3의 정수이고, n은 1∼4의 정수이다.][In the formula, each R 1 independently represent a hydrogen atom, a hydroxy group, a carbon atom of 1 to 3 alkyl group or an alkoxy group, R 2 and R 3 each independently represent a hydrogen atom or a carbon atom of 1 to Three alkoxy groups, one of R 2 and R 3 is an alkoxy group; R 4 represents a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or an alkoxy group, and R 5 and R 6 each independently represent an alkyl group having 1 to 3 carbon atoms; R 7 represents a hydrogen atom, a hydroxy group, an alkyl group of 1 to 3 carbon atoms or an alkoxy group; T represents a group represented by the following formula: m is an integer of 1-3 and n is an integer of 1-4.]

(2) 안료의 평균입자 지름이 0.01㎛∼0.1㎛이고, 또한 안료농도가 고형분환산으로 30중량% 이상인 상기(1)에 기재된 감방사선성 착색조성물.(2) The radiation sensitive colored composition as described in said (1) whose average particle diameter of a pigment is 0.01 micrometer-0.1 micrometer, and a pigment concentration is 30 weight% or more in conversion of solid content.

(3) 결착수지가 카르복실기를 가지고, 또한, 30∼200의 산가를 가지는 상기 (1) 또는 (2)에 기재된 감방사선성 착색조성물.(3) The radiation sensitive colored composition according to the above (1) or (2), wherein the binder resin has a carboxyl group and has an acid value of 30 to 200.

상기 (Ⅰ)∼(Ⅳ)으로 나타내어지는 특정 구성을 가지는 s-트리아진계의 광중합 개시제는 감방사선성 착색조성물, 특히 컬러필터 제조용의 감방사선성 착색조성물에 사용되어지는 것은 아니고, 상기 광중합 개시제를 사용하는 것에 의해 본 발명의 상기 목적, 예를들면 고안료 농도에서도 본 발명의 감방사선성 착색조성물이 노광에 의해 충분하게 경화되고 또한, 현상성이 충분하게 됨과 동시에 공기를 차단하는 보호막을 설치하지 않고도 또는 저노광량에서도 충분하게 경화하는 것 등은 예측할 수 없었던 놀랄만한 일이었다.The s-triazine-based photopolymerization initiator having a specific structure represented by the above (I) to (IV) is not used in a radiation-sensitive coloring composition, in particular, a radiation-sensitive coloring composition for producing a color filter. By using the same, the radiation sensitive colored composition of the present invention is sufficiently cured by exposure even at the above-mentioned object of the present invention, for example, the design material concentration, and developability is sufficient. Sufficient curing without or at low exposure doses was surprising.

이하, 본 발명에 있어서 상세하게 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.

본 발명의 감방사선성 착색조성물은 감방사선성 성분, 결착수지, 안료, 및 제제로 구성된다. 그래서 상기 감방사선성 성분은 광중합개시제와 감방사선성 중합성분을 함유한다.The radiation sensitive coloring composition of this invention consists of a radiation sensitive component, a binder resin, a pigment, and a formulation. Thus, the radiation sensitive component contains a photoinitiator and a radiation sensitive polymerization component.

우선, 감방사선성 성분인 광중합 개시제에 대해서 설명한다.First, the photoinitiator which is a radiation sensitive component is demonstrated.

본 발명에서는 광중합개시제로서 상기 화학식(Ⅰ)∼(Ⅳ)으로 나타나는 화합물 중 적어도 1종을 사용한다.In the present invention, at least one of the compounds represented by the above formulas (I) to (IV) is used as the photopolymerization initiator.

화학식(Ⅰ)∼(Ⅳ)에 있어서, 알킬기로서는 메틸기, 에틸기, n- 또는 i-프로필기 등을 들 수 있다. 알콕시기로서는 메톡시기, 에톡시기, n- 또는 i-프로폭시기 등을 들 수 있다.In general formula (I)-(IV), a methyl group, an ethyl group, n- or i-propyl group, etc. are mentioned as an alkyl group. As an alkoxy group, a methoxy group, an ethoxy group, n- or i-propoxy group, etc. are mentioned.

R1으로서는 수소원자가 바람직하다. R2및 R3로서는 에톡시기가 바람직하다. R4로서는 메틸기가 바람직하다. R5및 R6로서는 에틸기가 바람직하다. R7로서는 히드록시기가 바람직하다.As R 1 , a hydrogen atom is preferable. As R <2> and R <3>, an ethoxy group is preferable. As R 4, a methyl group is preferable. As R 5 and R 6, an ethyl group is preferable. As R <7>, a hydroxyl group is preferable.

상기 광중합 개시제의 바람직한 구체예로서 하기 화학식(1)∼(6)으로 나타나는 것을 들 수 있다.As a preferable specific example of the said photoinitiator, what is represented by following General formula (1)-(6) is mentioned.

그 중에서도 화학식(Ⅰ)∼(Ⅳ)으로 나타나는 광중합 개시제가 바람직하다.Especially, the photoinitiator represented by general formula (I)-(IV) is preferable.

이들은 1종 단독 또는 2종 이상 조합하여 사용할 수 있다.These can be used individually by 1 type or in combination of 2 or more types.

또한, 상기 화학식(Ⅰ)∼(Ⅳ)으로 나타나는 화합물은 그 자체가 알려지고 있는 화합물이지만, 감방사선성 착색조성물, 특히 컬러필터 작성용의 감방사선성 착색조성물에 사용되는 예는 지금까지는 아니다.In addition, although the compound represented by the said general formula (I)-(IV) is a compound known by itself, the example used for a radiation sensitive coloring composition, especially the radiation sensitive coloring composition for color filter preparation is not so far.

본 발명에서는 광중합 개시제로서 상기 화학식(Ⅰ)∼(Ⅳ)으로 나타나는 화합물 중 적어도 1종을 사용하는 것을 필수로 하지만, 더욱이 상기 이외의 광중합 개시제(이하「그 외의 광중합 개시제」로 함)를 병용할 수 있다.In the present invention, it is essential to use at least one of the compounds represented by the above formulas (I) to (IV) as the photopolymerization initiator. However, a photopolymerization initiator other than the above (hereinafter referred to as "other photopolymerization initiator") may be used in combination. Can be.

병용하여도 좋은 그 외의 광중합개시제로서는 하기의 것을 들 수 있다.The following are mentioned as another photoinitiator which may be used together.

(1) 할로메틸옥사디아졸 화합물, 할로메틸-s-트리아진 화합물로부터 선택된 적어도 하나의 활성할로겐 화합물(단, 상기 화학식(Ⅰ)∼(Ⅳ)으로 나타나는 화합물을 제거), 및 3-아릴치환쿠마린 화합물.(1) at least one active halogen compound selected from a halomethyloxadiazole compound and a halomethyl-s-triazine compound (excluding the compounds represented by formulas (I) to (IV)), and 3-aryl substitution Coumarin compound.

(2) 적어도 1종의 로핀 2량체.(2) at least one ropin dimer.

할로메틸-s-트리아진계 화합물의 광중합 개시제로서는 특공소59-1281호 공보에 기재된 하기 화학식(Ⅷ)으로 나타나는 비닐할로메틸-s-트리아진 화합물, 특개소53-133428호 공보에 기재된 하기 화학식(Ⅸ)으로 나타나는 2-(나프토-1-일)-4,6-비스-할로메틸-s-트리아진 화합물 및 하기 화학식(Ⅹ)으로 나타나는 4-(p-아미노페닐)-2,6-디-할로메틸-s-트리아진 화합물을 포함한다.As a photoinitiator of a halomethyl-s-triazine type compound, a vinyl halomethyl-s-triazine compound represented by following formula (i) described in Unexamined-Japanese-Patent No. 59-1281, and the following formula described in Unexamined-Japanese-Patent No. 53-133428 2- (naphtho-1-yl) -4,6-bis-halomethyl-s-triazine compound represented by (iii) and 4- (p-aminophenyl) -2,6 represented by the following formula (iii) -Di-halomethyl-s-triazine compound.

화학식(Ⅷ) 중, Q3은 Br, Cl, P는 -CQ3, -NH2, -NHR, -N(R)2, -OR(여기서, R은 페틸 또는 알킬기), W는 임의로 치환된 방향족, 복소환식 핵 또는 화학식(ⅧA)으로 나타나는 것으로, 화학식(ⅧA) 중 Z는 -O- 또는 -S-이고, R은 상기와 동의이다. 또는 n은 0∼3의 정수이다.In formula (VII), Q 3 is Br, Cl, P is -CQ 3 , -NH 2 , -NHR, -N (R) 2 , -OR (where R is a petyl or alkyl group), W is optionally substituted It is represented by an aromatic, heterocyclic nucleus, or general formula (VIIA) in which Z is -O- or -S- and R is synonymous with the above. Or n is an integer of 0 to 3;

화학식(Ⅸ) 중, X는 -Br, -Cl을 나타내고, m, n은 0∼3의 정수이고, R'는 하기 화학식(ⅨA)으로 나타내고, R1은 H 또는 ORc(Rc는 알킬, 시클로알킬, 알케닐, 아릴기), R2는 -Cl, Br 또는 알킬, 알케닐, 아릴, 알콕시기를 나타낸다.Formula (Ⅸ), X is represents -Br, -Cl, m, n is an integer of 0~3, R 'is represented by the formula (ⅨA) to, R 1 is H or ORc (Rc is alkyl, cycloalkyl Alkyl, alkenyl, aryl group), R 2 represents —Cl, Br or an alkyl, alkenyl, aryl, alkoxy group.

화학식(Ⅹ) 중 R1, R2는 -H, 알킬기, 치환알킬기, 아릴기, 치환아릴기 또는 하기 화학식(ⅩA), (ⅩB)로 나타난다. R3, R4는 -H, 할로겐원자, 알킬기, 알콕시기를 나타낸다. X, Y는 -Cl, -Br을 나타내고, m, n은 0, 1 또는 2를 나타낸다.R <1> , R <2> in general formula (i) is represented by -H, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or the following general formula (VII), (XB). R <3> , R <4> represents -H, a halogen atom, an alkyl group, and an alkoxy group. X, Y represents -Cl, -Br, and m, n represents 0, 1 or 2.

하기 화학식(XA), (ⅩB) 중, R5, R6, R7은 알킬기, 치환알킬기, 아릴기, 치환아릴기를 나타낸다. 치환알킬기 및 치환아릴기에 있어서의 치환기의 예로서는 페닐기 등의 아릴기, 할로겐원자, 알콕시기, 카르보알콕시기, 카르보아릴록시기, 아실기, 니트로기, 디알킬아미노기, 술포닐 유도체 등을 들 수 있다.R <5> , R <6> , R <7> represents an alkyl group, a substituted alkyl group, an aryl group, and a substituted aryl group in the following general formula (XA) and (XB). Examples of the substituent in the substituted alkyl group and the substituted aryl group include aryl groups such as phenyl groups, halogen atoms, alkoxy groups, carboalkoxy groups, carboaryloxy groups, acyl groups, nitro groups, dialkylamino groups, sulfonyl derivatives, and the like. have.

화학식(Ⅹ)에 있어서, R1과 R2가 그와 결합하는 질소원자와 함께 비금속원자로 이루어진 이절환(異節環)을 형성하여도 좋고, 그 결과 이절환으로서는 하기에 나타내는 것을 들 수 있다.In general formula (VIII), R <1> and R <2> may form the bicyclic ring which consists of a nonmetallic atom with the nitrogen atom couple | bonded with it, As a result, what is shown below as a bicyclic ring is mentioned.

화학식(Ⅷ)의 구체적인 예로서는 2,4-비스(트리클로로메틸)-6-p-메톡시스티릴-s-트리아진, 2,4-비스(트리클로로메틸)-6-(1-p-디메틸아미노페닐-1,3-부타디에닐)-s-트리아진, 2-트리클로로메틸-4-아미노-6-p-메톡시스티릴-s-트리아진 등을 들 수 있다.Specific examples of the formula (VII) include 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine and 2,4-bis (trichloromethyl) -6- (1-p- Dimethylaminophenyl-1,3-butadienyl) -s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, and the like.

화학식(Ⅸ)의 구체적인 예로서는 2-(나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4-메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4-에톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4-부톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-[4-(2-메톡시에틸)-나프토-1-일]-4,6-비스-트리클로로메틸-s-트리아진, 2-[4-(2-에톡시에틸)-나프토-1-일]-4,6-비스-트리클로로메틸-s-트리아진, 2-[4-(2-부톡시에틸)-나프토-1-일]-4,6-비스-트리클로로메틸-s-트리아진, 2-(2-메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(6-메톡시-5-메틸-나프토-2-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(6-메톡시-나프토-2-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(5-메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4,7-디메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(6-에톡시-나프토-2-일)-4,6-비스-트리클로로메틸-s-트리아진, 2-(4,5-디메톡시-나프토-1-일)-4,6-비스-트리클로로메틸-s-트리아진 등을 들 수 있다.Specific examples of the formula (VII) include 2- (naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4-methoxy-naphtho-1-yl) -4 , 6-bis-trichloromethyl-s-triazine, 2- (4-ethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4- Butoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, 2- [4- (2-methoxyethyl) -naphtho-1-yl] -4,6 -Bis-trichloromethyl-s-triazine, 2- [4- (2-ethoxyethyl) -naphtho-1-yl] -4,6-bis-trichloromethyl-s-triazine, 2- [4- (2-Butoxyethyl) -naphtho-1-yl] -4,6-bis-trichloromethyl-s-triazine, 2- (2-methoxy-naphtho-1-yl)- 4,6-bis-trichloromethyl-s-triazine, 2- (6-methoxy-5-methyl-naphtho-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (6-methoxy-naphtho-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (5-methoxy-naphtho-1-yl) -4,6 -Bis-trichloromethyl-s-triazine, 2- (4,7-dimethoxy-naphtho-1-yl) -4 , 6-bis-trichloromethyl-s-triazine, 2- (6-ethoxy-naphtho-2-yl) -4,6-bis-trichloromethyl-s-triazine, 2- (4, 5-dimethoxy-naphtho-1-yl) -4,6-bis-trichloromethyl-s-triazine, etc. are mentioned.

화학식(Ⅹ)의 구체예로서는 4-[p-N,N-디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-메틸-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-에톡시카르보닐아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-에톡시카르보닐메틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-[p-N,N-디(페닐)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-(p-N-클로로에틸카보닐아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-[p-N-(p-메톡시페닐)카르보닐아미노페닐]2,6-디(트리클로로메틸)-s-트리아진, 4-[m-N,N--디(에톡시카르보닐메틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-플로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-브로모-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-클로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[o-플로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리크로로메틸)-s-트리아진, 4-[m-브로모-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-클로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-[m-플로로-p-N,N-디(클로로에틸)아미노페닐]-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-브로모-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-클로로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(m-플로로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-브로모-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-클로로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진, 4-(o-플로로-p-N-클로로에틸아미노페닐)-2,6-디(트리클로로메틸)-s-트리아진 등을 들 수 있다.Specific examples of formula (VII) include 4- [pN, N-di (ethoxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [pN, N-di (Chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-methyl-pN, N-di (chloroethyl) aminophenyl] -2,6-di ( Trichloromethyl) -s-triazine, 4- (pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (pN-ethoxycarbonylaminophenyl)- 2,6-di (trichloromethyl) -s-triazine, 4- (pN-ethoxycarbonylmethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- [pN , N-di (phenyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- (pN-chloroethylcarbonylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- [pN- (p-methoxyphenyl) carbonylaminophenyl] 2,6-di (trichloromethyl) -s-triazine, 4- [mN, N-di (e) Oxycarbonylmethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4 -[o-fluoro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-bromo-pN, N-di ( Chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [o-chloro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloro Rhomethyl) -s-triazine, 4- [o-fluoro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [ m-bromo-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-chloro-pN, N-di (chloroethyl) Aminophenyl] -2,6-di (trichloromethyl) -s-triazine, 4- [m-fluoro-pN, N-di (chloroethyl) aminophenyl] -2,6-di (trichloromethyl ) -s-triazine, 4- (m-bromo-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-chloro-pN-chloroethyl Aminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (m-fluoro-pN-chloroethylaminophenyl) -2,6-di (trickle Romethyl) -s-triazine, 4- (o-bromo-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-chloro-pN- Chloroethylaminophenyl) -2,6-di (trichloromethyl) -s-triazine, 4- (o-fluoro-pN-chloroethylaminophenyl) -2,6-di (trichloromethyl) -s -Triazine and the like.

이들 개시제에는 이하의 증감제를 병용할 수 있다.The following sensitizers can be used together in these initiators.

그 구체예로서 벤조일, 벤조인메틸에테르, 벤조인, 9-플루오레논, 2-클로로-9-플루오레논, 2-메틸-9-플루오레논, 9-안트론, 2-브로모-9-안트론, 2-에틸-9-안트론, 9,10-안트라퀴논, 2-에틸-9,10-안트라퀴논, 2-t-부틸-9,10-안트라퀴논, 2,6-디클로로-9,10-안트라퀴논, 크산톤, 2-메틸크산톤, 2-메톡시크산톤, 티옥산톤, 벤질, 벤잘아세톤, p-(디메틸아미노)페닐스티린케톤, p-(디메틸아미노)페닐-p-메틸스티릴케톤, 벤조페논, p-(디메틸아미노)벤조페논(또는 미힐러케톤), p-(디에틸아미노)벤조페논, 벤조안트론 등이나 특공소51-48516호 공보에 기재된 벤조티아졸계 화합물을 들 수 있다.Specific examples thereof include benzoyl, benzoin methyl ether, benzoin, 9-fluorenone, 2-chloro-9-fluorenone, 2-methyl-9-fluorenone, 9-anthrone, 2-bromo-9-an Tron, 2-ethyl-9-anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone, 2-t-butyl-9,10-anthraquinone, 2,6-dichloro-9, 10-anthraquinone, xanthone, 2-methylxanthone, 2-methoxyxanthone, thioxanthone, benzyl, benzalacetone, p- (dimethylamino) phenylstyrene ketone, p- (dimethylamino) phenyl-p- Methyl styryl ketone, benzophenone, p- (dimethylamino) benzophenone (or Michler's ketone), p- (diethylamino) benzophenone, benzoanthrone and the benzothiazole system described in Japanese Unexamined Patent Publication No. 51-48516. The compound can be mentioned.

3-아릴 치환 쿠마린 화합물은 하기 화학식(ⅩⅠ)으로 나타나는 화합물을 가리킨다. R8은 수소원자, 탄소원자 1개 내지 8개의 알킬기, 탄소원자 6개 내지 10개의 아릴기(바람직하게는 수소원자, 메틸기, 에틸기, 프로필기, 부틸기)를, R9은 수소원자, 탄소원자 1개 내지 8개의 알킬기, 탄소원자 6개 내지 10개의 아릴기, 하기의 화학식(ⅩⅠA)으로 나타나는 기(바람직하게는 메틸기, 에틸기, 프로필기, 부틸기, 특히 바람직하게는 화학식(ⅩⅠA)으로 나타나는 기)를 나타낸다.The 3-aryl substituted coumarin compound refers to a compound represented by the following general formula (XI). R 8 is a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, 6 to 10 aryl groups (preferably a hydrogen atom, a methyl group, an ethyl group, a propyl group, a butyl group), R 9 is a hydrogen atom, carbon An alkyl group having 1 to 8 atoms, an aryl group having 6 to 10 carbon atoms, and a group represented by the following general formula (VIIA) (preferably methyl group, ethyl group, propyl group, butyl group, particularly preferably as general formula (VIII)) Appearing groups).

R10, R11은 각각 수소원자, 탄소원자 1개 내지 8의 알킬기(예를들면, 메틸기, 에틸기, 프로필기, 부틸기, 옥틸기), 탄소원자 1개 내지 8개의 할로알킬기(예를들면, 클로로메틸기, 플로로메틸기, 트리플로로메틸기 등), 탄소원자 1개 내지 8개의 알콕시기(예를들면, 메톡시기, 에톡시기, 부톡시기), 치환되어도 좋은 탄소원자 6개 내지 10개의 아릴기(예를들면, 페닐기), 아미노기, N(R16)(R17), 할로겐(예를들면, -Cl, -Br, -F)을 나타낸다. 바람직하게는 수소원자, 메틸기, 에틸기, 메톡시기, 페닐기, -N(R16)(R17), -Cl이다. R12는 치환되어도 좋은 탄소원자 6개 내지 16개의 아릴기(예를들면, 페닐기, 나프틸기, 토릴기, 쿠밀기)를 나타낸다. 치환기로서는 아미노기, -N(R16)(R17), 탄소원자 1개 내지 8개의 알킬기(예를들면, 메틸기, 에틸기, 프로필기, 부틸기, 옥틸기), 탄소원자 1개 내지 8개의 할로알킬기(예를들면, 클로로메틸기, 플로로메틸기, 트리플로로메틸기 등), 탄소원자 1개 내지 8개의 알콕시기(예를들면 메톡시기, 에톡시기, 부톡시기), 히드록시기, 시아노기, 할로겐(예를들면, -Cl, -Br, -F)을 들 수 있다. R13, R14, R16, R17은 각각 수소원자, 탄소원자 1개 내지 8개의 알킬기(예를들면 메틸기, 에틸기, 프로필기, 부틸기, 옥틸기)를 나타낸다. R13과 R14및 R16과 R17은 또한 서로 결합하여 질소원자와 함께 복소환(예를들면, 피페리딘고리, 피페라진고리, 몰포린고리, 피라졸고리, 디아졸고리, 트리아졸고리, 벤조트리아졸고리 등)을 형성하여도 좋다. R15는 수소원자, 탄소원자, 1개 내지 8개의 알킬기(예를들면, 메틸기, 에틸기, 프로필기. 부틸기, 옥틸기), 탄소원자 1개 내지 8개의 알콕시기(예를들면, 메톡시기, 에톡시기, 부톡시기), 치환되어도 좋은 탄소원자 6개 내지 10개의 아릴기(예를들면 페닐기), 아미노기, N(R16)(R17), 할로겐(예를들면, -Cl, Br, -F)을 나타낸다. Zb는 =O, =S 또는 =C(R18)(R19)를 나타낸다. 바람직하게는 =O, =S, =C(CN)2이고, 특히 바람직하게는 =O이다. R18, R19는 각각 시아노기, -COOR20, -COR21을 나타낸다. R20, R21은 각각 탄소원자 1개 내지 8개의 알킬기(예를들면, 메틸기, 에틸기, 프로필기, 부틸기, 옥틸기), 탄소원자 1개 내지 8개의 할로알킬기(예를들면 클로로메틸기, 플로로메틸기, 트리플로로메틸기 등), 치환되어도 좋은 탄소원자 6개 내지 10개의 아릴기(예를들면 페닐기)를 나타낸다.R 10, R 11 are each a hydrogen atom, the carbon atoms 1 to 8 alkyl group (e.g., methyl group, ethyl group, propyl group, butyl group, octyl group), the carbon atoms 1 to 8 haloalkyl group (for example, For example, a chloromethyl group, a fluoromethyl group, a trifluoromethyl group, etc., 1-8 carbon atoms (eg, methoxy group, ethoxy group, butoxy group), and 6-10 carbon atoms which may be substituted Aryl groups (e.g., phenyl groups), amino groups, N (R 16 ) (R 17 ), halogens (e.g., -Cl, -Br, -F). Preferably a hydrogen atom, a methyl group, an ethyl group, a methoxy group, a phenyl group, -N (R 16) (R 17), -Cl. R 12 represents a 6 to 16 aryl group (eg, phenyl group, naphthyl group, toryl group, cumyl group) which may be substituted. Examples of the substituent include amino group, -N (R 16 ) (R 17 ), alkyl group having 1 to 8 carbon atoms (e.g., methyl group, ethyl group, propyl group, butyl group, octyl group), and halogen atom having 1 to 8 carbon atoms. Alkyl groups (e.g., chloromethyl groups, fluoromethyl groups, trifluoromethyl groups, etc.), 1-8 carbon atoms (e.g., methoxy groups, ethoxy groups, butoxy groups), hydroxy groups, cyano groups, halogens ( For example, -Cl, -Br, -F) can be mentioned. R 13 , R 14 , R 16 and R 17 each represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms (eg, methyl group, ethyl group, propyl group, butyl group, octyl group). R 13 and R 14 and R 16 and R 17 are also bonded to each other to form a heterocyclic ring with a nitrogen atom (e.g. piperidine ring, piperazine ring, morpholin ring, pyrazole ring, diazol ring, triazole). Ring, benzotriazole ring, etc.) may be formed. R 15 represents a hydrogen atom, a carbon atom, 1 to 8 alkyl groups (eg, methyl, ethyl, propyl, butyl, octyl), or 1 to 8 alkoxy groups (eg, methoxy) , Ethoxy group, butoxy group), 6-10 carbon atoms which may be substituted (eg phenyl group), amino group, N (R 16 ) (R 17 ), halogen (eg -Cl, Br, -F). Zb represents = O, = S or = C (R 18 ) (R 19 ). Preferably it is = O, = S, = C (CN) 2 , Especially preferably, it is = O. R 18 and R 19 represent a cyano group, -COOR 20 and -COR 21 , respectively. R 20 and R 21 each represent one to eight alkyl groups (eg, methyl, ethyl, propyl, butyl, octyl groups), one to eight haloalkyl groups (eg, chloromethyl groups, A fluoro group, a trifluoromethyl group, etc.) and 6-10 aryl groups (for example, a phenyl group) which may be substituted.

특히 바람직한 3-아릴치환 쿠마린 화합물은 화학식(ⅩⅡ)으로 나타나는 {(s-트리아진-2-일)아미노}-3-아릴쿠마린 화합물류이다.Particularly preferred 3-arylsubstituted coumarin compounds are {(s-triazin-2-yl) amino} -3-arylcoumarin compounds represented by the general formula (XII).

(3) 로핀 이량체는 2개의 로핀잔기로 이루어진 2,4,5-트리페닐이미다조릴 이량체를 의미하고, 그 기본구조를 하기에 나타낸다.(3) Ropin dimer means a 2,4,5-triphenylimidazolyl dimer consisting of two lopin residues and the basic structure thereof is shown below.

그 구체예로서는 2-(o-크롤페닐)-4,5-디페닐이미다졸릴2량체, 2-(o-플루오로페닐)-4,5-디페닐이미다졸릴2량체, 2-(o-메톡시페닐)-4,5-디페닐이미다졸릴2량체, 2-(p-메톡시페닐)-4,5-디페닐이미다졸릴2량체, 2-(p-디메톡시페닐)-4,5-디페닐이미다졸릴2량체, 2-(2,4-디메톡시페닐)-4,5-디페닐이미다졸릴2량체, 2-(p-메르캅토페닐)-4,5-디페닐이미다졸릴2량체를 들 수 있다.Specific examples thereof include 2- (o-crophenyl) -4,5-diphenylimidazolyl dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazolyl dimer, and 2- (o -Methoxyphenyl) -4,5-diphenylimidazolyl dimer, 2- (p-methoxyphenyl) -4,5-diphenylimidazolyl dimer, 2- (p-dimethoxyphenyl)- 4,5-diphenylimidazolyl dimer, 2- (2,4-dimethoxyphenyl) -4,5-diphenylimidazolyl dimer, 2- (p-mercaptophenyl) -4,5- Diphenyl imidazolyl dimer is mentioned.

본 발명에서는 이상의 개시제의 다른 공지의 것도 사용할 수 있다.In this invention, the other well-known thing of the above initiator can also be used.

미국특허 제2,367,660호 명세서에 개시된 비시날폴리케톨알도닐화합물, 미국특허 제2,367,661호 및 제2,367,670호 명세서에 개시된 α-카르보닐화합물, 미국특허 제2,448,828호 명세서에 개시된 아시로인에테르, 미국특허 제2,722,512호 명세서에 개시된 α-탄화수소로 치환된 방향족 아시로인 화합물, 미국특허 제3,046,127호 및 제2,951,758호 명세서에 개시되어 있는 다핵퀴논 화합물, 미국특허 제3,549,367호 명세서에 개시되어 있는 토리아릴이미다졸다이머/p-아미노페닐케톤의 조합, 특공소51-48516호 공보에 개시되어 있는 벤조티아졸계 화합물/트리할로메틸-s-트리아진계 화합물.Bisinal polyketolaldonyl compounds disclosed in US Pat. No. 2,367,660, α-carbonyl compounds disclosed in US Pat. Nos. 2,367,661 and 2,367,670, asyroinethers disclosed in US Pat. No. 2,448,828, US Pat. Aromatic acyloin compounds substituted with α-hydrocarbons disclosed in US Pat. Nos. 2,722,512, polynuclear quinone compounds disclosed in US Pat. Nos. 3,046,127 and 2,951,758, toriarylimidazoles disclosed in US Pat. No. 3,549,367. A benzothiazole compound / trihalomethyl-s-triazine-based compound disclosed in Japanese Unexamined Patent Publication No. 51-48516, a combination of an imer / p-aminophenyl ketone.

본 발명의 감방사선성 착색조성물에 있어서, 필수성분인 상기 화학식(Ⅰ)∼(Ⅵ)으로 나타나는 광중합 개시제의 사용량은 광중합 개시제의 전체 사용량에 대해서 5∼10중량%, 특히 20∼100중량%가 바람직하다.In the radiation-sensitive coloring composition of the present invention, the amount of the photopolymerization initiator represented by the above formulas (I) to (VI) as essential components is 5 to 10% by weight, particularly 20 to 100% by weight, based on the total amount of the photopolymerization initiator. desirable.

또한, 광중합 개시제의 전체 사용량은 감방사선성 중합성에 대해서 바람직하게는 1∼30중량%, 보다 바람직하게는 3∼15중량%이다. 과잉의 광중합 개시제의 사용은 광중합에 의해 형성되는 중합체의 분자량이 낮아지고 막강도가 약해지고, 또한, 노광에서 분해하지 않아서 막 중에 남은 개시제는 내광성을 열화시킴으로 바람직하지 않다.The total amount of photopolymerization initiator used is preferably 1 to 30% by weight, more preferably 3 to 15% by weight, based on the radiation sensitive polymerizability. The use of excess photopolymerization initiator is not preferable because the molecular weight of the polymer formed by photopolymerization is low and the film strength is weakened, and the initiator remaining in the film because it does not decompose in exposure deteriorates light resistance.

다음으로, 본 발명의 감방사선성 착색조성물로서 사용되는 감방사선성 중합성분에 대해서 설명한다.Next, the radiation sensitive polymerization component used as a radiation sensitive coloring composition of this invention is demonstrated.

상기 감방사선성 중합성분으로서는 적어도 1개의 부가중합 가능한 에틸렌성 불포화기를 지니고, 융점이 상압에서 100℃ 이상의 화합물이 바람직하고, 그 중에서도, 4관능 이상의 아크릴레이트 화합물이 보다 바람직하다.As said radiation sensitive polymerization component, the compound which has at least 1 addition-polymerizable ethylenically unsaturated group, melting | fusing point is 100 degreeC or more at normal pressure, and a tetrafunctional or more functional acrylate compound is especially preferable.

적어도 1개의 부가중합 가능한 에틸렌성 불포화기를 지니고, 융점이 상압에서 100℃ 이상의 화합물로서는 폴리에틸렌글리콜모노(메타)아크릴레이트, 폴리프로필렌글리콜모노아크릴레이트, 페녹시에틸렌(메타)아크릴레이트 등의 단관능기의 아크릴레이트나 메타크릴레이트; 폴리에틸렌글리콜디(메타)아크릴레이트, 트리메틸올에탄트리(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 펜타에리트스리톨트리(메타)아크릴레이트, 펜타에리스리톨(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트, 헥산디올(메타)아크릴레이트, 트리메틸올프로판트리(아크릴로일록시프로필)에테르, 트리(아크릴로일록시에틸)이소시아노레이트, 글리세린, 트리메티롤에탄, 디펜타에리스리톨 등의 다관능알콜에 에틸렌옥사이드나 프로필렌옥사이드를 부가시킨 후 (메타)아크릴레이트화된 것, 펜타에리스리톨 또는 디펜타에리스리톨의 폴리(메타)아크릴레이트화된 것, 특공소48-41708호, 공보, 특공소50-6034호 공보, 특개소51-37193호 공보 각 공보에 기재되어 있는 우레탄아크릴레이트류, 특개소48-64183호 공보, 특공소49-43191호 공보, 특공소52-30490호 공보에 기재된 폴리에스테르아크릴레이트류, 에폭시수지와 (메타)아크릴산의 반응생성물인 에폭시아크릴레이트류 등의 다관능의 아크릴레이트나 메타아크릴레이트를 포함하는 것이 이루어졌다. 더욱이, 일본접착협회지 Vol. 20, No.7,300∼308항에 광경화성 단위체 및 올리고머로서 소개되어 있는 것도 사용될 수 있다.Compounds having at least one addition-polymerizable ethylenically unsaturated group and having a melting point of 100 ° C. or higher at normal pressure include monofunctional groups such as polyethylene glycol mono (meth) acrylate, polypropylene glycol monoacrylate, and phenoxyethylene (meth) acrylate. Acrylates and methacrylates; Polyethylene glycol di (meth) acrylate, trimethylol ethane tri (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol (meth) acrylate, dipenta Erythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexanediol (meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) isocyano (Meth) acrylated, poly (meth) acrylated of pentaerythritol or dipentaerythritol after addition of ethylene oxide or propylene oxide to polyfunctional alcohols such as latex, glycerin, trimetholethane and dipentaerythritol Urethane acrylate described in Japanese Unexamined Patent Publications No. 48-41708, Japanese Unexamined Publications, Japanese Unexamined Publications 50-6034, and Japanese Unexamined Patent Publications No. 51-37193 Polyester acrylates described in JP-A-48-64183, JP-A-49-43191, JP-A-52-30490, and epoxy acrylates that are reaction products of epoxy resins and (meth) acrylic acid. What contained polyfunctional acrylate and methacrylate was performed. Moreover, the Japan Adhesion Society Vol. 20, Nos. 7,300 to 308, which are introduced as photocurable units and oligomers, can also be used.

그 중에서도, 디펜타에리스티톨펜타(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트 및 이들의 아크릴로일기가, 에틸렌글리콜, 프로필렌글리콜 잔기를 사이에 끼운 구조가 바람직하다.Especially, the structure in which dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, and these acryloyl groups sandwiched ethylene glycol and a propylene glycol residue is preferable.

이들의 감방사선성 중합성분은 1종 단독으로 또는 2종류 이상을 조합하여 사용할 수 있다.These radiation sensitive polymerization components can be used individually by 1 type or in combination of 2 or more types.

이들 감방사선성 중합성분의 사용량은 감방사선성 착색조성물의 전체 고형분에 대해서, 바람직하게는 5∼90중량%, 보다 바람직하게는 10∼50중량%이다.The usage-amount of these radiation sensitive polymerization components is 5 to 90 weight% with respect to the total solid of a radiation sensitive coloring composition, More preferably, it is 10 to 50 weight%.

광중합개시제, 감방사선성 중합성분 및 원하는 만큼 사용되어진 증감제를 포함하여 감방사선성 성분은 전체 조성물 중의 고형분에 대해서 10∼90중량%, 특히, 30∼80중량%의 비율인 것이 바람직하다.It is preferable that the radiation sensitive component, including a photoinitiator, a radiation sensitive polymerization component, and a sensitizer used as desired, is 10 to 90 weight%, especially 30 to 80 weight% with respect to solid content in the whole composition.

다음으로, 본 발명 감방사선성 착색조성물에 배합되어지는 결착수지에 대해서 설명한다.Next, the binder resin mix | blended with the radiation sensitive coloring composition of this invention is demonstrated.

본 발명에서 사용 가능한 결착수지로서는 선형 유기고분자 중합체로, 유기용제에 가용이고, 약 알칼리 수용액에서 현상되는 것이 바람직하다. 이와 같은 선형 유기고분자 중합체로서는 측쇄에 카르본산을 가지는 중합체, 예를들면 특개소 59-44615호 공보, 특공소54-34327호 공보, 특공소58-12577호 공보, 특공소54-25957호 공보, 특개소59-53836호 공보, 특개소59-71048호 공보에 기재되어 있는 메타크릴산 공중합체, 아크릴산공중합체, 이타콘산 공중합체, 크로톤산 공중합체, 말레인산 공중합체, 부분 에스테르화 말레인산 공중합체 등이 있고, 또한 동일한 형상으로 측쇄에 카르본산을 가지는 산성 셀룰로오즈 유도체가 있다. 이 밖에 수산기를 가지는 중합체에 산무수물을 부가시킨 것 등도 유용하다. 특히 이들 중에서 벤질(메타)아크릴레이트/(메타)아크릴산 공중합체나 벤질(메타)아크릴레이트/(메타)아크릴산/ 및 다른 단위체의 다원 공중합체가 호적하다. 이 밖에 수용성 중합체로서 2-히드록시에틸메타크릴레이트, 폴리비닐피롤리돈이나 폴리에틸렌옥시드, 폴리비닐알콜 등도 유용하다. 또한, 경화피막의 강도를 높이기 위해서 알코올 가용성 나일론이나 2,2-비스-(4-히드록시페닐)-프로판과 에피크롤히드린의 폴리에테르 등도 유용하다. 이들 중합체는 임의의 양을 혼합시킬 수 있다.The binder resin usable in the present invention is a linear organic polymer, soluble in an organic solvent, and preferably developed in a weak alkaline aqueous solution. As such a linear organic polymer polymer, a polymer having carboxylic acid in the side chain, for example, Japanese Patent Application Laid-Open No. 59-44615, Japanese Patent Application Laid-Open No. 54-34327, Japanese Patent Application Laid-Open No. 58-12577, Japanese Patent Application Publication No. 54-25957, Methacrylic acid copolymers, acrylic acid copolymers, itaconic acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers and the like described in Japanese Patent Application Laid-Open Nos. 59-53836 and 59-71048 And acidic cellulose derivatives having carboxylic acid in the side chain in the same shape. In addition, what added the acid anhydride to the polymer which has a hydroxyl group is also useful. Especially among these, the benzyl (meth) acrylate / (meth) acrylic acid copolymer, the benzyl (meth) acrylate / (meth) acrylic acid /, and the multicomponent copolymer of another unit are suitable. In addition, 2-hydroxyethyl methacrylate, polyvinylpyrrolidone, polyethylene oxide, polyvinyl alcohol, etc. are also useful as a water-soluble polymer. In addition, alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, etc. are also useful in order to raise the strength of a cured coating film. These polymers can be mixed in any amount.

또한, 특개평7-140654호 공보에 기재된 공중합체, 공중합체, 공중합체 등을 들 수 있다.Moreover, the copolymer, copolymer, copolymer, etc. of Unexamined-Japanese-Patent No. 7-140654 are mentioned.

더욱이, 사용할 수 있는 결착수지로서 특개평9-258445호에 기재된 하기 화학식(ⅩⅢ)으로 나타나는 폴리비닐아세탈 수지 또는 변성 폴리비닐아세탈 수지를 들 수 있다.Moreover, as a binder resin which can be used, the polyvinyl acetal resin or modified polyvinyl acetal resin represented by following General formula (XIII) of Unexamined-Japanese-Patent No. 9-258445 is mentioned.

단, 화학식(ⅩⅢ) 중, R1은 치환기를 가지도 있어도 좋은 알킬기 또는 수소원자, R2는 치환기를 가지고 있어도 좋은 알킬기, R3는 카르본산기를 가지고 있는 지방족 또는 방향족 탄화수소기, R4는 적어도 1개의 히드록실기 또는 니트릴기를 가지고, 더욱 다른 치환기를 가져도 좋은 지방족 또는 방향족 탄화수소기를 나타내고, n1, n2, n3, n4, n5는 각 반복단위의 몰%를 나타내고, 각각 다음의 범위이다. n1=5∼85, n2=1∼60, n3=1∼20, n4=0∼60, n5=0∼10.In the formula (XIII), R 1 is an alkyl group or hydrogen atom which may have a substituent, R 2 is an alkyl group which may have a substituent, R 3 is an aliphatic or aromatic hydrocarbon group having a carboxylic acid group, and R 4 is at least The aliphatic or aromatic hydrocarbon group which has one hydroxyl group or a nitrile group and may have another substituent is shown, n1, n2, n3, n4, n5 represent the mol% of each repeating unit, and are respectively the following ranges. n1 = 5 to 85, n2 = 1 to 60, n3 = 1 to 20, n4 = 0 to 60, n5 = 0 to 10.

본 발명에 있어서 바람직한 결착수지는 카르복실기를, 특히 곁사슬에 가지는 것이고, 그 중에서도 벤질메타크릴레이트-메타크릴산 공중합체가 바람직하다. 그리고, 노광 후의 현상성 및 도포성을 양호하게 유지하는 관점으로부터 산가가 30∼200인 것이 바람직하고, 50∼150이 보다 바람직하다.Preferable binder resin in this invention has a carboxyl group in a side chain especially, and the benzyl methacrylate-methacrylic acid copolymer is especially preferable. And from an viewpoint of maintaining developability and applicability | paintability after exposure favorable, it is preferable that it is 30-200, and 50-150 are more preferable.

본 발명의 결착수지의 총량은 감방사선성 착색조성물의 전체고형분에 대해서 5∼80중량%이다. 바람직하게는 20∼60중량%이다. 결착수지의 총량이 5중량%보다 적고 막강도가 저하되고 또한, 80중량%보다 많으면, 산성분이 많아지므로, 용해성의 콘트롤이 어려워지고, 또 상대적으로 안료가 적어지므로 충분한 화상농도가 얻어지지 않는다.The total amount of the binder resin of the present invention is 5 to 80% by weight based on the total solids of the radiation-sensitive coloring composition. Preferably it is 20-60 weight%. If the total amount of the binder resin is less than 5% by weight and the film strength is lowered, and more than 80% by weight, the acid component is increased, so that the solubility is difficult to control and the pigment is relatively low, so that sufficient image concentration is not obtained.

다음으로, 본 발명 감방사선성 착색조성물에 배합하는 안료에 대해서 설명한다.Next, the pigment mix | blended with the radiation sensitive coloring composition of this invention is demonstrated.

본 발명에 사용할 수 있는 안료로서는 종래 공지의 각종 무기안료 또는 유기안료를 사용할 수 있다.As a pigment which can be used for this invention, various conventionally well-known inorganic pigments or organic pigments can be used.

또한, 안료는 무기안료이든 유기안료이든 고투과율인 것이 바람직하다는 것을 고려한다면 가능하다면 세밀한 것이 사용되지만, 취급성을 고려한다면, 바람직하게는 평균지름입자 0.01㎛∼0.1㎛, 보다 바람직하게는 0.01㎛∼0.08㎛의 안료가 사용된다.In addition, if the pigment is considered to have a high transmittance, preferably inorganic pigments or organic pigments, fine ones are used if possible, but considering the handleability, the average diameter particles are preferably 0.01 μm to 0.1 μm, more preferably 0.01 μm. Pigment of -0.08 micrometer is used.

무기안료로서는 금속산화물, 금속착염 등으로 나타나는 금속 화합물이고, 구체적으로는 철, 코발트, 알루미늄, 카드뮴, 납, 구리, 티탄, 마그네슘, 크롬, 아연, 안티몬 등의 금속산화물, 및 상기 금속의 복합산화물을 들 수 있다.Inorganic pigments are metal compounds represented by metal oxides, metal complex salts, and the like, specifically, metal oxides such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, and antimony, and composite oxides of the metals. Can be mentioned.

유기안료로서는As organic pigment

등을 들 수 있다.Etc. can be mentioned.

본 발명에서는 특히 안료의 구성식 중에 염기성의 N원자를 가지는 것을 바람직하게 사용할 수 있다. 이들 염기성의 N원자를 가지는 안료는 본 발명의 조성물 중에서 양호한 분산성을 나타낸다. 이 원인에 있어서는 충분히 해명되지 않지만, 감방사선성 중합성분과 안료 친화성의 양호함이 영향이 있다고 추정된다.Especially in this invention, what has basic N atom can be used preferably in the structural formula of a pigment. Pigments having these basic N atoms exhibit good dispersibility in the compositions of the present invention. Although it is not elucidated sufficiently in this cause, it is presumed that the radiation-sensitive polymerization component and the goodness of the pigment affinity are affected.

이들 안료로서 이하의 것을 들 수 있지만, 이들에 한정되지 않는다.Although these pigments are mentioned as these pigments, It is not limited to these.

이들 유기안료는 단독 또는 색순도를 높이기 위해 각종 조합으로 사용된다. 구체적인 예를 이하에 나타낸다.These organic pigments are used alone or in various combinations to increase color purity. Specific examples are shown below.

적색 안료로서는 안트라퀴논계 안료, 페릴렌계 안료 단독 또는 그들 중 적어도 1종과 디스아조계 황색안료 또는 이소이소드린계 황색안료의 혼합이 사용된다. 예를 들면, 안트라퀴논계 안료로서는 C.I. 피그멘트 레드 177, 페릴렌계 안료로서는 C.I. 피그멘트 레드155, C.I. 피그멘트 레드224를 들 수 있고, 색재현성의 점에서 C.I. 피그멘트 옐로우-83 또는 C.I. 피그멘트 엘로우-139의 혼합이 양호하다. 적색안료와 황색안료의 중량비는 100:5로부터 100:50이 양호하다. 100:4 이하에서는 400㎚부터 500㎚의 빛투과율을 억제시키는 것이 완성되지 않은 색순도를 높이게 된다. 또한 100:51 이상에서는 주파장이 단파장보다 NTSC목표색상으로부터 맞지 않음이 커진다. 특히 100:10부터 10:30의 범위가 최적으로 된다.As the red pigment, an anthraquinone pigment, a perylene pigment alone or a mixture of at least one of them and a disazo yellow pigment or isoisodrin yellow pigment is used. For example, as an anthraquinone pigment, C.I. Pigment Red 177, a perylene pigment, C.I. Pigment Red 155, C.I. Pigment red 224, and C.I. Pigment Yellow-83 or C.I. The mixing of Pigment Yellow-139 is good. The weight ratio of red pigment and yellow pigment is preferably 100: 5 to 100: 50. At 100: 4 or less, suppressing the light transmittance of 400 nm to 500 nm increases the color purity which is not completed. In addition, at 100: 51 or more, the dominant wavelength does not fit the NTSC target color more than the short wavelength. In particular, the range of 100: 10 to 10:30 is optimal.

적색의 안료로서는 할로겐화 프탈로시아닌계 안료 단독 또는 디스아조계 황색안료 또는 이소이소드린계 황색안료의 혼합이 사용되고, 예를 들면, C.I. 피그멘트 그린7,36, 37과 C.I.피그멘트 옐로우-83 또는 C.I.피그멘트 옐로우-139의 혼합이 양호하다. 녹색안료와 황색안료의 중량비는 100:5로부터 100:40이 양호하다. 100:4 이하에서는 400㎚로터 450㎚의 광투과율을 억제할 수 없고, 색수도를 높일 수 없다. 또한, 100:41 이상에서는 주파장이 장파장보다 NISC목표색상으로부터 맞지 않음이 커진다. 특히, 100:5부터 100:20의 범위가 최적이다.As the red pigment, halogenated phthalocyanine-based pigments alone or a mixture of disazo-based yellow pigments or isoisodrin-based yellow pigments are used. For example, C.I. Pigment Green 7,36, 37 and C.I. Pigment Yellow-83 or C.I.Pigment Yellow-139 are preferred. The weight ratio of green pigment to yellow pigment is from 100: 5 to 100: 40. At 100: 4 or less, the light transmittance of 400 nm to 450 nm cannot be suppressed and chromaticity cannot be increased. Further, at 100: 41 or more, the dominant wavelength does not fit from the NISC target color more than the long wavelength. In particular, the range of 100: 5 to 100: 20 is optimal.

청색의 안료로서는 프탈로시아닌계 안료 단독 또는 디옥사딘계 자색안료의 혼합이 사용되며, 예를 들면, C.I.피그멘트 블루-15:6과 C.I.피그멘트 바이올렛23의 혼합으로 된다. 청색안료와 자색안료의 중량비는 100:5부터 100:50이 바람직하다. 100:4 이하에서는 400㎚로부터 420㎚의 광투과율을 억제할 수 없고, 색순도를 높일 수 없다. 100:51 이상에서는 주파장에 의해 NTSC 목표 색상으로부터의 어긋남이 커진다. 특히 100:5부터 100:20의 범위가 최적이다.As the blue pigment, a phthalocyanine-based pigment alone or a mixture of dioxadine-based purple pigments is used. For example, C.I. Pigment Blue-15: 6 and C.I.Pigment Violet 23 are mixed. The weight ratio of the blue pigment to the purple pigment is preferably 100: 5 to 100: 50. In 100: 4 or less, the light transmittance of 400 nm to 420 nm cannot be suppressed, and color purity cannot be improved. Above 100: 51, the deviation from the NTSC target color increases due to the dominant wavelength. In particular, the range from 100: 5 to 100: 20 is optimal.

더욱이 상기 안료를 아크릴계 수지, 말레인산계 수지, 염화비닐 초산비닐공중합체 및 에틸셀룰로오스 수지 등으로 미분산시킨 분말상 가공 안료를 사용하는 것에 의해 분산성 및 분산안정성의 양호한 안료를 함유하는 감광수지를 얻을 수 있다. 블랙매트릭스용의 안료로서는 카본, 티탄카본, 산화철 단독 또는 혼합이 사용되고, 카본과 티탄카본의 경우가 양호하다. 중량비는 100:5부터 100:40의 범위가 양호하다. 100:4 이하에서 장파장의 광투과율이 커진다. 100:41 이하에서는 분산안정성이 문제가 된다.Furthermore, by using a powdered processing pigment obtained by finely dispersing the pigment with an acrylic resin, maleic acid resin, vinyl chloride acetate copolymer, ethyl cellulose resin, or the like, a photosensitive resin containing a good pigment having good dispersibility and dispersion stability can be obtained. have. As the pigment for the black matrix, carbon, titanium carbon, iron oxide alone or a mixture is used, and carbon and titanium carbon are preferable. The weight ratio is preferably in the range of 100: 5 to 100: 40. Below 100: 4, the light transmittance of long wavelength increases. Below 100: 41, dispersion stability becomes a problem.

이하에 안료의 처리법에 대해 설명한다.The processing method of a pigment is demonstrated below.

일반적으로, 이들 안료는 합성 후, 여러 가지 방법으로 건조시켜 공급된다. 보통 수매체(水媒體)로부터 건조시켜서 분말체로서 공급되지만, 물이 건조되기 위해서는 큰 증발잠열을 필요로 하기 때문에 건조되어 분말로서 되게 하기 위해서 큰 에너지를 부여한다.In general, these pigments are supplied after drying by various methods. Usually, it is dried from an aqueous medium and supplied as a powder, but since a large latent heat of evaporation is required for water to dry, great energy is imparted to make it dry and powdered.

이 때문에 안료는 일차입자가 집합된 응집체(이차입자)를 형성하는 것이 일반적이다.For this reason, pigments generally form aggregates (secondary particles) in which primary particles are aggregated.

이 형상인 응집체를 형성하는 안료를 미립자로 분산하는 것은 쉽지 않다. 이를 위해서 안료를 미리 여러 가지 수지로 처리하는 것이 바람직하다.It is not easy to disperse | distribute the pigment which forms this shape aggregate into microparticles | fine-particles. For this purpose, it is preferable to treat the pigment with various resins in advance.

이들 수지로서는 상술의 결착수지를 들 수 있다.These binders include the above-mentioned binder resins.

처리 방법으로서는 플러싱 처리나 니더(kneader), 엑스톨더, 볼 밀(ball mill), 2체 또는 3체 롤 밀 등에 의한 혼련법이 있다. 이 중, 플러싱처리나 2체 또는 3체 롤 밀 등에 의한 혼련법이 미립자화에 적당하다.As a treatment method, there is a kneading method using a flushing treatment, a kneader, an extender, a ball mill, a two or three roll mill, or the like. Among these, a kneading method using a flushing treatment or a two or three roll mill or the like is suitable for atomization.

플러싱처리는 일반적으로 안료의 물분산 액과 물과 혼합하지 않는 용매에 용해된 수지용액을 혼합하고, 수매체 중으로부터 유기매체 중으로 안료를 추출하고, 안료를 수지에서 처리하는 방법이다. 이 방법에 의하면, 안료를 건조시키지 않으므로, 안료의 응집을 방지할 수 있고, 분산이 용이하다.In general, the flushing treatment is a method of mixing a water dispersion of a pigment and a resin solution dissolved in a solvent which is not mixed with water, extracting a pigment from an aqueous medium into an organic medium, and treating the pigment in a resin. According to this method, since the pigment is not dried, aggregation of the pigment can be prevented and dispersion is easy.

2체 또는 2체 롤 밀에 의한 혼련에서는 안료와 수지 또는 수지 용액을 혼합한 후, 높은 시어(shear)(전단력)를 가하여 안료와 수지를 혼련하는 것에 의해 안료 표면에 수지를 코팅하는 것으로서 안료를 처리하는 방법이다. 이 과정으로 응집된 안료 입자는 보다 낮은 차원의 응집체로부터 일차 입자까지 분산된다.In kneading with a two- or two-piece roll mill, the pigment is coated on the surface of the pigment by mixing the pigment with the resin or the resin solution, and then kneading the pigment with the resin by applying a high shear (shear force). That's how to handle it. Pigment particles aggregated in this process are dispersed from the lower dimension of aggregates to the primary particles.

또한, 본 발명에 있어서는 미리 아크릴수지, 염화비닐초산비닐수지, 말레인산수지, 에틸셀룰로오스수지, 니트로셀룰로오스수지 등으로 처리한 가공안료도 바람직하게 사용될 수 있다.In the present invention, processed pigments previously treated with acrylic resins, vinyl chloride vinyl acetate resins, maleic acid resins, ethyl cellulose resins, nitrocellulose resins and the like can also be preferably used.

본 발명에 있어서, 상기 여러 가지 처리된 가공안료의 형태로서는 수지와 안료가 균일하게 분산되어 있는 분말, 페이스트상, 펠릿상이 바람직하다. 또한, 수지가 겔화된 불균일한 덩어리 형상의 것은 바람직하지 않다.In the present invention, as the form of the various processed pigments, powders, pastes, and pellets in which resins and pigments are uniformly dispersed are preferable. Moreover, the thing of the non-uniform lump shape in which resin gelatinized is not preferable.

이 형태로서 얻어진 착색분산체는 감방사선성 성분과 혼합하여 감방사선성 착색조성물로서 제공된다.The colored dispersion obtained in this form is mixed with the radiation-sensitive component and provided as a radiation-sensitive coloring composition.

또한, 안료의 감방사선성 착색조성물의 전체 고형분 중의 안료 농도는 특히 한정되어 있는 것은 아니지만, 일반적으로 5∼80중량%이다. 본 발명의 방사선성 착색조성물의 경우, 안료농도가 30중량% 이상으로 되어도 노광에 의한 충분한 경화가 이루어지고, 안료농도가 35중량% 이상이면, 상기 효과가 한층 높아진다. 그러나, 80중량%를 넘게 사용하는 것은 비화상부의 바닥오염(地汚)이나 막잔사가 생기는 등의 다른 문제가 발생한다.In addition, although the pigment concentration in the total solid of the radiation-sensitive coloring composition of a pigment is not specifically limited, Generally, it is 5 to 80 weight%. In the case of the radioactive colored composition of the present invention, even when the pigment concentration is 30% by weight or more, sufficient curing is achieved by exposure, and the above effect is further enhanced when the pigment concentration is 35% by weight or more. However, the use of more than 80% by weight causes other problems such as bottom contamination of the non-image part and film residue.

본 발명에 있어서, 안료의 분산성을 향상시키는 목적으로 종래 공지의 안료분산제나 계면활성제를 첨가할 수 있다.In the present invention, a conventionally known pigment dispersant and a surfactant can be added for the purpose of improving the dispersibility of the pigment.

이들 분산제로서는 많은 종류의 화합물이 사용되지만, 예를 들면, 프탈로시아닌유도체(시판품EFA-745(에프카사제)), 솔스파스5000(세네카제); 오르가노실록산폴리머-KP341(신에츠화학공업제), (메타)아크릴산계(공)중합체폴리프로-No. 75, No. 90, No. 95(교에샤유지화학공업제), W001(유우쇼우제)등의 양이온계 계면활성제; 폴리옥시에틸렌라우릴에테르, 폴리옥시에틸렌스테아릴에테르, 폴리옥시에틸렌올레일에테르, 폴리옥시에틸렌옥틸페닐에테르, 폴리옥시에틸렌노닐페닐에테르, 폴리에틸렌글리콜디라우레이트, 폴리에틸렌글리콜디스테아레이트, 소르비탄지방산에스테르 등의 비이온계 계면활성제; 에프톱EF301, EF303, EF352(신슈우텐카세이제), 메가팝크F171, F172, F173(다이니폰잉크제), 플로라드FC430, FC431(스미토모스리엠제), 아사히 가이드 AG710, 사플론S382, SC-101, SC-102, SC-103, SC-104, SC-105, SC-1068(아사히가라스제)등의 불소계계면활성제; W004, W005, W017(유우쇼오제)등의 음이온계 계면활성제; EFKA-46, EFKA-47, EFKA-47EA, EFKA폴리머100, EFKA폴리머400, EFKA폴리머401, EFKA폴리머-450(이상 모리시타산업제), 디스파스에이드6, 디스파스에이드8, 디스파스에이드15, 디스파스에이드9100(산노푸코제)등의 고분자분산제; 솔스파스3000, 5000, 9000, 12000, 13240, 13940, 17000, 24000, 26000, 28000 등의 각종 솔스파스분산제(세네카주식회사제); 아데카플로닉L31, F38, L42, L44, L61, L64, F68, L72, P95, F77, P84, F87, P94, L101, P103, F108, L121, P123(아사히 덴까제) 및 이소넥트S-20(산요오카제이 제)을 들 수 있다.Although many kinds of compounds are used as these dispersing agents, For example, Phthalocyanine derivative | guide_body (commercially available EFA-745 (made by Efca Co.)) and Sol spas 5000 (made by Seneca); Organosiloxane Polymer-KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid-based (co) polymer polypro-No. 75, no. 90, no. Cationic surfactants such as 95 (manufactured by Kyoeisha Oil Chemical Co., Ltd.) and W001 (manufactured by Yusho); Polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid Nonionic surfactants such as esters; F top EF301, EF303, EF352 (made in Shinshu Uto Kasei), mega pop F171, F172, F173 (made in Dainippon ink), flora FFC430, FC431 (product made in Sumitomo M), Asahi guide AG710, Saffron S382, SC-101 Fluorine-based surfactants such as SC-102, SC-103, SC-104, SC-105, and SC-1068 (manufactured by Asahi Glass); Anionic surfactant, such as W004, W005, W017 (made by Yusho); EFKA-46, EFKA-47, EFKA-47EA, EFKA Polymer 100, EFKA Polymer 400, EFKA Polymer 401, EFKA Polymer-450 (from Morishita Industries), Dispersade 6, Dispersade 8, Disperside 15, Polymer dispersants such as dispasade 9100 (manufactured by Sanofoko); Various kinds of Sol-Spas dispersants (manufactured by Seneca Corporation) such as Sol-Spas 3000, 5000, 9000, 12000, 13240, 13940, 17000, 24000, 26000, 28000; Adekaplanic L31, F38, L42, L44, L61, L64, F68, L72, P95, F77, P84, F87, P94, L101, P103, F108, L121, P123 (Asahi Denkaze) and Isonex S-20 ( San-Yo-ka-Jase) is mentioned.

본 발명의 감방사선성 착색조성물에는 필요에 따라서 각종 첨가물, 예컨대 충전제, 상기 결착수지 이외의 고분자 화합물, 계면활성제, 밀착촉진제, 산화방지제, 자외선흡수제, 응집방지제 등을 배합할 수가 있다.In the radiation-sensitive coloring composition of the present invention, various additives such as fillers, polymer compounds other than the binder resin, surfactants, adhesion promoters, antioxidants, ultraviolet absorbers, anti-agglomerating agents and the like can be blended as necessary.

이들의 첨가물의 구체예로서는, 유리, 알루미나 등의 충전제; 폴리비닐알코올, 폴리아크릴산, 폴리에틸렌글리콜모노알킬에테르, 폴리플로로알킬아크릴레이트 등의 바인더 중합체(A) 이외의 고분자화합물; 비이온계, 양이온계, 음이온계 등의 계면활성제; 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴록시프로필트리메톡시실란, 3-메르캅토프로필트리메톡시실란 등의 밀착촉진제: 2,2-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-t-부틸페놀 등의 산화방지제: 2-(3-t-부틸-5-메틸-2-히드록시페닐)-5-클로로벤조트리아졸, 알콕시벤조페논 등의 자외선 흡수제: 및 폴리아크릴산 나트륨 등의 응집 방지제를 들 수 있다.Specific examples of these additives include fillers such as glass and alumina; Polymer compounds other than binder polymer (A) such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, and polyfluoroalkyl acrylate; Surfactants such as nonionic, cationic and anionic systems; Vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclo Adhesion promoters such as hexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, and 3-mercaptopropyltrimethoxysilane : Antioxidants, such as 2, 2- thiobis (4-methyl-6- t-butyl phenol) and 2, 6- di-t- butyl phenol: 2- (3-t- butyl- 5-methyl- 2-) Ultraviolet absorbers such as hydroxyphenyl) -5-chlorobenzotriazole and alkoxybenzophenone; and anti-aggregation agents such as sodium polyacrylate.

또한, 방사선 미조사부의 알칼리 용해성을 촉진시키고, 본 발명의 조성물의 현상성을 더욱 향상시키는 경우는 본 발명의 조성물에 유기 탄산, 바람직하게는 분자량 1000 이하의 저분자량 유기 카르본산의 첨가를 행할 수 있다. 구체적으로는 예를들면, 유사산, 초산, 프로필온산, 락산, 길초산, 피발산, 카프론산, 디에틸초산, 에난트산, 카프릴산 등의 지방족 모노카르본산; 수산, 말론산, 숙신산, 글루탈산, 아디핀산, 피메린산, 수베린산, 아제라인산, 세바신산, 브라신산, 메틸말론산, 에틸말론산, 디메틸말론산, 메틸숙신산, 테트라메틸숙신산, 시트라콘산 등의 지방족 디카본산; 트리카바릴산, 아코니트산, 캄포론산 등의 지방족 트리카본산; 안식향산, 톨루일산, 쿠민산, 헤메리트산, 메시틸렌산 등의 방향족 모노카본산; 프탈산, 이소프탈산, 텔레프탈산, 트리메리트산, 트리메신산, 메로판산, 피로메리트산 등의 방향족 폴리카르본산; 페닐초산, 히드로아트로파산, 히드로케이파산, 만델산, 페닐숙신산, 아트로파산, 계피산메틸, 계피산벤질, 신나미리덴초산, 쿠말산, 운벨산 등의 그 밖의 카본산을 들 수 있다.In addition, when promoting the alkali solubility of the non-irradiated portion and further improving the developability of the composition of the present invention, it is possible to add an organic carbonic acid, preferably a low molecular weight organic carboxylic acid having a molecular weight of 1000 or less, to the composition of the present invention. have. Specifically, For example, aliphatic monocarboxylic acids, such as a pseudo acid, an acetic acid, a propyl acid, a lactic acid, a gil acetic acid, a pivalic acid, a capronic acid, a diethyl acetate, an enanthic acid, a caprylic acid; Fisheries, malonic acid, succinic acid, glutaric acid, adipic acid, pimeric acid, suberic acid, azeline acid, sebacic acid, bracinic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, sheet Aliphatic dicarboxylic acids such as laconic acid; Aliphatic tricarboxylic acids such as tricarbaric acid, aconitic acid and camphoronic acid; Aromatic monocarboxylic acids such as benzoic acid, toluic acid, cuminic acid, hemeric acid, and mesitylene acid; Aromatic polycarboxylic acids such as phthalic acid, isophthalic acid, telephthalic acid, trimellitic acid, trimesic acid, meropanic acid and pyromellitic acid; And other carboxylic acids such as phenylacetic acid, hydroatroic acid, hydrokepaic acid, mandelic acid, phenylsuccinic acid, atroic acid, methyl cinnamic acid, cinnamic acid benzyl, cinnamilidene acetic acid, coumalic acid and unbelic acid.

본 발명의 감방사선성 착색조성물에는 이상의 다른, 더욱 열중합방지제를 가해 주는 것이 바람직하고, 예를 들면, 하이드로키논, p-메톡시페놀, 디-t-부틸-p-크레졸, 피롤갈롤, t-부틸카테콜, 벤조키논, 4,4'-티오비스(3-메틸-6-t-부틸페놀), 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀), 2-메르캅토벤조이미다졸 등이 사용된다.To the radiation-sensitive colored composition of the present invention, it is preferable to add the above-mentioned other, further thermal polymerization inhibitors, for example, hydrokinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrrogalol, t Butylcatechol, benzokinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4-methyl-6-t-butylphenol), 2- Mercaptobenzoimidazole and the like are used.

본 발명의 감방사선성 착색조성물을 조제할 때에 사용하는 용매로서는 에스테르류, 예를 들면, 초산에틸, 초산-n-부틸, 초산이소부틸, 유사산아밀, 초산이소아밀, 초산이소부틸, 프로피온산부틸, 락산이소프로필, 락산에틸, 락산부틸, 알킬에스테르류, 유산메틸, 유산에틸, 옥시초산메틸, 옥시초산에틸, 옥시초산부틸, 메톡시초산메틸, 메톡시초산에틸, 메톡시초산부틸, 에톡시초산메틸, 에톡시초산에틸, 3-옥시프로피온산메틸, 3-옥시프로피온산에틸 등의 3-옥시프로피온산알킬에스테르류; 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 2-옥시프로피온산메틸, 2-옥시프로피온산에틸, 2-옥시프로피온산프로필, 2-메톡시프로피온산메틸, 2-메톡시프로피온산에틸, 2-메톡시프로피온산프로필, 2-에톡시프로피온산메틸, 2-에톡시프로피온산에틸, 2-옥시-2-메틸프로피온산메틸, 2-옥시-2-메틸프로피온산에틸, 2-메톡시-2-메틸프로피온산메틸, 2-에톡시-2-메틸프로피온산에틸, 피루빈산메틸, 피루빈산에틸, 피루빈산프로필, 아세토초산메틸, 아세토초산에틸, 2-옥소부탄산메틸, 2-옥소부탄산에틸 등; 에테르류, 예를 들면 디에틸렌글리콜디메틸에테르, 테트라히드로퓨란, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 디에틸글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노부틸에테르, 프로필렌글리콜메틸에테르아세테이트, 프로필렌글리콜에틸에테르아세테이트, 프로필렌글리콜프로필에테르아세테이트 등; 케톤류, 예를 들면, 메틸에틸케톤, 시크로헥사논, 2-헵타논, 3-헵타논 등; 방향족탄화수소류, 예를 들면, 톨루엔, 크실렌 등을 들 수 있다.As a solvent used when preparing the radiation-sensitive coloring composition of this invention, ester, For example, ethyl acetate, n-butyl acetate, isobutyl acetate, amyl ammonium acetate, isoamyl acetate, isobutyl acetate, propionic acid Butyl, isopropyl lactate, ethyl lactate, butyl lactate, alkyl esters, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, methoxyethyl acetate, methoxy butyl acetate, 3-oxypropionic acid alkyl esters such as methyl ethoxy acetate, ethyl ethoxy acetate, methyl 3-oxypropionate and ethyl 3-oxypropionate; Methyl 3-methoxy propionate, 3-methoxy ethylpropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, 2-methoxy Methyl propionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate , 2-methoxy-2-methylpropionate, 2-ethoxy-2-methylpropionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, 2-oxo part Methyl carbonate, ethyl 2-oxobutyrate and the like; Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethyl glycol monomethyl ether, diethylene glycol Monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate and the like; Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and the like; Aromatic hydrocarbons, for example, toluene, xylene and the like can be mentioned.

이들 중, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 에틸셀로솔브아세테이트, 유산에틸, 디에틸렌글리콜디메테르에테르, 초산부틸, 3-메톡시프로피온산메틸, 2-헵타논, 시클로헥사논, 에틸카르비톨아세테이트, 부틸카르비톨아세테이트, 프로필렌글리콜메틸에테르아세테이트 등이 바람직하게 사용되어지고 있다.Among them, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol diether ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexa Paddy fields, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether acetate and the like are preferably used.

이들 용매는 단독 또는 2종 이상 조합하여 사용하여도 좋다.You may use these solvent individually or in combination of 2 or more types.

본 발명의 감방사선성 착색조성물은 상기 주요 성분 더욱 필요에 따라서 사용하는 그외의 첨가제를 용매와 혼합하여 각종 혼합기, 분산기를 사용하여 혼합분산하는 것에 의해 조제할 수 있다.The radiation-sensitive colored composition of the present invention can be prepared by mixing and dispersing the above main components and other additives to be used as necessary, by mixing with a solvent and using various mixers and dispersers.

본 발명의 감방사선성 착색조성물은 기판에 회전도포, 유정도포, 롤도포 등의 도포방법에 의해 도포하여 감방사선성 조성물 층을 형성하여서 원하는 마스크 패턴을 통해 노광하고, 현상액으로 현상함으로서 착색된 패턴을 형성한다. 이 때, 사용하는 방사선으로서는 특히 g선, h선, i선 등이 자외선이 바람직하게 사용된다.The radiation-sensitive coloring composition of the present invention is coated on the substrate by a coating method such as rotary coating, oil coating, roll coating, etc. to form a radiation-sensitive composition layer, exposed through a desired mask pattern, and developed with a developing solution, thereby coloring the colored pattern. To form. At this time, particularly as the radiation to be used, ultraviolet rays are preferably used for g rays, h rays, i rays and the like.

기판으로서는 예를 들면, 액정표시소자 등으로 사용하는 소다글래스, 파이렉스글래스, 석영글래스 및 이들에 투명 도전막을 부착시킨 것이나, 고체촬상소자 등으로 사용하는 광전변환소자기판, 예를 들면, 실리콘 기판 등을 들 수 있다. 이들 기판은 일반적으로 각 화소를 격리하는 블록스트라이프가 형성된다.As the substrate, for example, soda glass, pyrex glass, quartz glass used in liquid crystal display devices, etc., and transparent conductive films attached thereto, or photoelectric conversion device substrates used in solid state imaging devices, for example, silicon substrates, etc. Can be mentioned. These substrates are generally formed with block stripes that isolate each pixel.

현상액으로서는 본 발명의 감방사선성 착색조성물을 용해하고, 한편 방사선 조사부를 용해하지 않는 조성물이면 어떠한 것도 사용할 수 있다. 구체적으로는 각종 유기용제의 조합이나 알칼리성 수용액을 사용할 수 있다.As the developing solution, any composition can be used as long as it is a composition in which the radiation-sensitive coloring composition of the present invention is dissolved and the radiation irradiation part is not dissolved. Specifically, combinations of various organic solvents and alkaline aqueous solutions can be used.

유기용제로서는 본 발명의 조성물을 조정할 때에 사용하는 상술의 용제를 들 수 있다.Examples of the organic solvent include the above-mentioned solvents used when adjusting the composition of the present invention.

알칼리로서는 예를 들면, 수산화나트륨, 수산화칼륨, 탄산나트륨, 규산나트륨, 메타규산나트륨, 암모니아수, 에틸아민, 디에틸아민, 디메틸에탄올아민, 테트라메틸암모늄히드록시드, 테트라에틸암모늄히드록시드, 콜린, 피롤, 피페리딘, 1,8-디아자비시클로-[5.4.0]-7-운데센 등의 알칼리성 화합물을 농도 0.001∼10중량%, 바람직하게는 0.01∼1중량%와 같이 하여 용해한 알칼리성 수용액이 사용되어진다. 또한, 이와 같은 알칼리성 수용액으로 이루어진 현상액을 사용할 경우에는 일반적으로 현상 후, 물에서 수세한다.As alkali, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, An alkaline aqueous solution in which alkaline compounds such as pyrrole, piperidine, and 1,8-diazabicyclo- [5.4.0] -7-undecene are dissolved at a concentration of 0.001 to 10% by weight, preferably 0.01 to 1% by weight. This is used. Moreover, when using the developing solution which consists of such alkaline aqueous solution, after image development, it washes with water generally.

(실시예)(Example)

이하, 본 발명을 실시예에 의해 더욱 구체적으로 설명하지만, 본 발명은 이하의 실시예에 한정되는 것은 아니다.Hereinafter, although an Example demonstrates this invention further more concretely, this invention is not limited to a following example.

(실시예1)Example 1

·결착수지: 벤질메타크릴레이트·메타크릴산 40부Bindering resin: 40 parts of benzyl methacrylate and methacrylic acid

공중합체(중량평균분자량 30000; 산가 120)Copolymer (weight average molecular weight 30000; acid value 120)

·C.I. 피그멘트 블루 #15:6 50부C.I. Pigment Blue # 15: 6 Part 50

·프로필렌글리콜모노메틸에테르아세테이트 200부200 parts of propylene glycol monomethyl ether acetate

를 센드밀로 하루 동안 분산한다.Disperse throughout the day with a send mill.

다음으로, 하기의 성분을 첨가한다.Next, the following component is added.

·아크릴레이트단위체 40부40 parts of acrylate unit

(1) 디펜타에리스리톨로 에틸렌옥시드를 6개 부가한 헥사아크릴레이트 15중량%(1) 15% by weight of hexaacrylate with six ethylene oxide added to dipentaerythritol

(2) 디펜타에리스리톨에 에틸렌옥시드를 6개 부가한 펜타아크릴레이트 85중량%(2) 85% by weight of pentaacrylate obtained by adding six ethylene oxides to dipentaerythritol

·상기 화학식(1)에 나타난 광중합개시제 3부Part 3 of the photopolymerization initiator represented by Formula (1)

·하이드록시논모노메틸에테르 0.01부0.01 parts of hydroxynonmonomethyl ether

·프로필렌글리콜모노메틸에테르아세테이트 150부150 parts of propylene glycol monomethyl ether acetate

상기 각 성분을 균일하게 혼합 후, 구멍 지름 1㎛의 필터로 여과하여, 본 발명의 감방사선성 착색조성물(컬러필터용 도료 조성물)을 얻는다. 이 조성물을 컬러필터용의 글래스 기판에 스핀코터로 건조막 두께가 1.5㎛으로 되도록 도포하여, 90℃에서 2분 간 건조시켜서 균일한 도막(塗膜)을 얻는다. 이 때의 안료 농도는 고형분 환산으로 37중량%이다. 또한, 평균입자크기는 0.07㎛이다.After mixing the said components uniformly, it filters by the filter of 1 micrometer of pore diameters, and obtains the radiation sensitive coloring composition (coating composition for color filters) of this invention. This composition is apply | coated to the glass substrate for color filters so that a dry film thickness may be set to 1.5 micrometers, it is made to dry at 90 degreeC for 2 minutes, and a uniform coating film is obtained. The pigment density | concentration at this time is 37 weight% in conversion of solid content. The average particle size is 0.07 mu m.

2.5Kw의 초고압수은등을 사용하여 20㎛ 폭의 마스크를 통하여 100mj/㎠의 노광량을 조사한다. 다음으로 0.1%의 탄산나트륨 수용액으로 침정하여 현상한다.The exposure amount of 100mj / cm <2> is irradiated through the mask of 20 micrometers width using the ultrahigh pressure mercury lamp of 2.5Kw. Next, it develops by immersing in 0.1% of sodium carbonate aqueous solution.

현상 후의 막 두께와 선폭을 측정하여 그 결과를 표1에 나타낸다.The film thickness and line width after development were measured, and the results are shown in Table 1.

또한, 결착수지의 산가는 수지 1g을 아세톤/메틸에틸케톤 혼합용매(1:1 중량비) 200㎖로 용해하고, 더욱이 5㎖의 물을 가한 후 KOH수 용액으로 적정하여, 중화로 필요한 KOH양을 ㎎으로 나타낸다. 또한, 결착수지의 중량평균분자량은 GPC법(폴리스티렌환산)으로 한다.In addition, the acid value of the binder resin was dissolved in 200 ml of acetone / methyl ethyl ketone mixed solvent (1: 1 weight ratio), and 5 ml of water was added thereto, followed by titration with a KOH water solution to neutralize the amount of KOH required for neutralization. It is expressed in mg. In addition, the weight average molecular weight of binder resin is made into GPC method (polystyrene conversion).

(실시예2∼5, 비교예1∼3)(Examples 2 to 5 and Comparative Examples 1 to 3)

실시예1에 있어서, 광중합 개시제의 종류 및 배합비율을 하기와 같이 변경하는 이외에는 실시예1을 반복한다. 결과를 1에 나타낸다.In Example 1, Example 1 is repeated except having changed the kind and compounding ratio of a photoinitiator as follows. The results are shown in 1.

실시예2Example 2

상기 화학식(4)로 나타내는 광중합개시제 3부3 parts photoinitiator represented by the said General formula (4)

실시예3Example 3

상기 화학식(6)으로 나타내는 광중합개시제 5부5 parts photoinitiator represented by the said General formula (6)

실시예4Example 4

상기 화학식(5)로 나타내는 광중합개시제 5부5 parts photoinitiator represented by the said General formula (5)

실시예5Example 5

상기 화학식(2)로 나타내는 광중합개시제 5부5 parts photoinitiator represented by the said General formula (2)

비교예1Comparative Example 1

하기 구조의 광중합개시제(화합물B) 5부5 parts photopolymerization initiator (Compound B)

비교예2Comparative Example 2

옥산톤 5부Oxanthone part 5

비교예3Comparative Example 3

4-(p-클로로페닐)-2,6-비스(트리클로로메틸)-s-트리아진 5부4- (p-chlorophenyl) -2,6-bis (trichloromethyl) -s-triazine 5 parts

(실시예6∼8)(Examples 6 to 8)

실시예1에 있어서, 안료의 배합량을 변화시켜 안료농도를 표2에 나타낸 바와 같이 변경하는 이외에는 실시예1과 동일하게 행한다. 현상 후의 막두께를 실시예1의 막두께와 함께, 표2에 나타낸다.In Example 1, it is performed similarly to Example 1 except changing the compounding quantity of a pigment and changing a pigment concentration as shown in Table 2. The film thickness after development is shown in Table 2 together with the film thickness of Example 1.

(비교예3∼5)(Comparative Examples 3 to 5)

비교예1에 있어서, 안료의 배합량을 변화시켜 안료 농도를 표2에 나타내는 바와 같이 변경하는 이외에는 비교예1과 동일하게 행한다. 현상 후의 막두께를 비교예1의 막두께와 함께 표2에 나타낸다.In the comparative example 1, it carries out similarly to the comparative example 1 except changing the compounding quantity of a pigment and changing a pigment concentration as shown in Table 2. The film thickness after development is shown in Table 2 together with the film thickness of Comparative Example 1.

평가결과Evaluation results 개시제 종Initiator species 현상 후의 막 두께(㎛)Film thickness after development (µm) 선폭 감도(㎛)Linewidth Sensitivity (μm) 실시예1실시예2실시예3실시예4실시예5비교예1비교예2비교예3Example 1 Example 2 Example 3 Example 4 Example 5 Comparative Example 1 Comparative Example 2 Comparative Example 3 화합물(1)화합물(4)화합물(6)화합물(5)화합물(2)하기 화합물B티옥산톤화합물ACompound (1) Compound (4) Compound (6) Compound (5) Compound (2) Compound B Thioxanthone Compound A 1.481.461.471.451.420.890.801.051.481.461.471.451.420.890.801.05 23.023.223.323.223.013.112.114.023.023.223.323.223.013.112.114.0

화합물A: 4-(p-클로로페닐)-2,6-비스(트리클로로메틸)-s-트리아진Compound A: 4- (p-chlorophenyl) -2,6-bis (trichloromethyl) -s-triazine

안료농도Pigment concentration 현상후의 막두께Post-development film thickness 안료농도Pigment concentration 현상 후의 막두께Film thickness after development 실시예1실시예6실시예7실시예8Example 1 Example 6 Example 7 Example 8 37.0%32.0%28.0%20.0%37.0% 32.0% 28.0% 20.0% 1.48㎛1.421.401.421.48 μm 1.421.401.42 비교예1비교예4비교예5비교예6Comparative Example 1 Comparative Example 4 Comparative Example 5 Comparative Example 6 37.0%32.0%28.0%20.0%37.0% 32.0% 28.0% 20.0% 0.89㎛0.681.031.200.89 μm 0.681.031.20

화합물B: Compound B:

표1 및 표2의 결과로부터 본 발명에서 특정한 광중합개시제를 사용하는 것에 의해 안료농를 증가시켜서 막두께가 감소하는 것이고 충분한 선폭을 유지시킬 수 있어 우수한 패턴이 형성되어서 감도, 현상성이 우수한 것으로 나타난다.From the results of Table 1 and Table 2, by using a specific photoinitiator in the present invention, the pigment concentration is increased to reduce the film thickness, and a sufficient line width can be maintained, thereby forming an excellent pattern, which is excellent in sensitivity and developability.

본 발명의 감방사선성 착색조성물은 고안료 농도에서도 노광 부분이 충분하게 경화되고, 현상성이 양호하다. 따라서, 액정소자, 고체 촬상소자에 사용되는 컬러필터를 제작하는 데에 적합하게 사용된다.In the radiation sensitive colored composition of the present invention, the exposed portion is sufficiently cured even at the high concentration of the raw material, and developability is good. Therefore, it is used suitably for manufacturing the color filter used for a liquid crystal element and a solid-state image sensor.

Claims (14)

감방사선성 성분, 결착수지, 안료, 및 용제를 함유하는 감방사선성 착색조성물에 있어서, 상기 감방사선성 성분이 하기 화학식(Ⅰ)∼(Ⅵ)으로 나타나는 화합물로 이루어진 군으로부터 선택된 적어도 한 종의 광중합 개시제를 함유하는 것을 특징으로 하는 감방사선성 착색조성물.In a radiation sensitive coloring composition containing a radiation sensitive component, a binder resin, a pigment, and a solvent, the radiation sensitive component is at least one member selected from the group consisting of compounds represented by the following formulas (I) to (VI): A radiation sensitive coloring composition comprising a photopolymerization initiator. (화학식 중, R1은 여러개 존재할 때는 각각 독립으로, 수소원자, 히드록시기, 탄소원자 1개 내지 3개의 알킬기 또는 알콕시기를 나타내고; R2및 R3는 각각 독립으로 수소원자 또는 탄소원자 1개 내지 3개의 알콕시기를 나타내고, R2및 R3의 어느 한쪽은 알콕시기이고; R4는 수소원자, 탄소원자 1개 내지 3개의 알킬기 또는 알콕시기를 나타내고,; R5및 R6은 각각 독립으로 탄소원자 1개 내지 3개의 알킬기를 나타내고; R7은 수소원자 히드록시기, 탄소원자 1개 내지 3개의 알킬기 또는 알콕시기를 나타내고; T는 하기 화학식으로 나타내는 기를 나타내고; m은 1∼3의 정수이고, n은 1∼4의 정수이다.)(Wherein, R 1 each independently represents a hydrogen atom, a hydroxy group, a carbon atom having 1 to 3 alkyl groups or an alkoxy group; R 2 and R 3 are each independently a hydrogen atom or 1 to 3 carbon atoms; One alkoxy group, one of R 2 and R 3 is an alkoxy group, R 4 represents a hydrogen atom, one to three alkyl groups or an alkoxy group, and R 5 and R 6 are each independently a carbon atom 1 It represents one to three alkyl groups; R 7 represents a hydrogen atom, a hydroxy group, one carbon atom to 3 alkyl or alkoxy group; T represents a group represented by the following formula; m is an integer of 1~3, n is 1 to Is an integer of 4.) 제1항에 있어서, 광중합 개시제가 화학식(Ⅰ)∼(Ⅳ)으로부터 선택된 적어도 하나인 것을 특징으로 하는 감방사선성 착색조성물.A radiation sensitive colored composition according to claim 1, wherein the photopolymerization initiator is at least one selected from formulas (I) to (IV). 제1항에 있어서, 광중합개시제가 하기 화학식(1)∼(6)으로부터 선택된 적어도 하나인 것을 특징으로 하는 감방사선성 착색조성물The radiation-sensitive coloring composition according to claim 1, wherein the photopolymerization initiator is at least one selected from the following general formulas (1) to (6). 제1항에 있어서, 화학식(Ⅰ)∼(Ⅵ)으로부터 선택된 광중합개시제의 함유량이 조성물 중의 전체 광중합개시제에 대해서 5∼100중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive coloring composition according to claim 1, wherein the content of the photopolymerization initiator selected from general formulas (I) to (VI) is 5 to 100% by weight based on the total photopolymerization initiator in the composition. 제1항에 있어서, 화학식(Ⅰ)∼(Ⅵ)으로부터 선택된 광중합개시제의 함유량이 조성물 중의 전체 광중합개시제에 대해서 20∼100중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive coloring composition according to claim 1, wherein the content of the photopolymerization initiator selected from general formulas (I) to (VI) is 20 to 100% by weight relative to the total photopolymerization initiator in the composition. 제1항에 있어서, 조성물 중의 광중합개시제의 함유량이 감방사선성 성분에 대해서 1∼30중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation sensitive colored composition according to claim 1, wherein the content of the photopolymerization initiator in the composition is 1 to 30% by weight based on the radiation sensitive component. 제1항에 있어서, 조성물 중의 광중합개시제의 함유량이 감방사선성 성분에 대해서 3∼15중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation sensitive colored composition according to claim 1, wherein the content of the photopolymerization initiator in the composition is 3 to 15% by weight relative to the radiation sensitive component. 제1항에 있어서, 결착수지가 카르복실기를 가지고 또한 30∼200의 산가를 가지는 것을 특징으로 하는 감방사선성 착색조성물.The radiation sensitive colored composition according to claim 1, wherein the binder resin has a carboxyl group and has an acid value of 30 to 200. 제1항에 있어서, 결착수지가 곁사슬에 카르복실기를 가지는 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive colored composition according to claim 1, wherein the binder resin has a carboxyl group in the side chain. 제1항에 있어서, 결착수지의 함유량이 감방사선성 착색조성물의 전체 고형 성분에 대해서 5∼80중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive colored composition according to claim 1, wherein the content of the binder resin is 5 to 80% by weight based on the total solid components of the radiation-sensitive colored composition. 제1항에 있어서, 결착수지의 함유량이 감방사선성 착색조성물의 전체 고형성분에 대해서 20∼60중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive colored composition according to claim 1, wherein the content of the binder resin is 20 to 60% by weight based on the total solid components of the radiation-sensitive colored composition. 제1항에 있어서, 안료의 평균입자 지름이 0.01㎛∼0.1㎛이고, 또한 안료 농도가 고형분 환산으로 30중량% 이상인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive colored composition according to claim 1, wherein the average particle diameter of the pigment is 0.01 µm to 0.1 µm, and the pigment concentration is 30% by weight or more in terms of solid content. 제1항에 있어서, 안료의 평균입자 지름이 0.01㎛∼0.08㎛인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive colored composition according to claim 1, wherein the pigment has an average particle diameter of 0.01 µm to 0.08 µm. 제1항에 있어서, 안료 농도가 고형분 환산으로 35∼80중량%인 것을 특징으로 하는 감방사선성 착색조성물.The radiation-sensitive colored composition according to claim 1, wherein the pigment concentration is 35 to 80% by weight in terms of solid content.
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